Abstract: A substrate is first rotated at a first rotation speed, and a resist solution is applied. Rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. Rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. The solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution.

Abstract: Disclosed herein is a method of forming a low-k layer. The method includes the following steps. Tetraalkoxysilane, ethanol, tetraalkylammonium hydroxide and water are mixed in a molar ratio between 1:0.1:0.1:5 and 1:10:0.5:36 to form a first mixture. The first mixture is heated for a period of less than about 36 hours to form a second mixture containing a plurality of non-crystalline silicon-containing particles, wherein each of the non-crystalline silicon-containing particles has a particle size of smaller than about 10 nm. Subsequently, a surfactant is added to the second mixture to form a colloid solution, in which the surfactant has a concentration of about 1-20% by weight of the colloid solution. The colloid solution is coated on a substrate and thereby forming a colloid layer thereon. Then, the colloid layer is heated at a condition sufficient to transform the colloid layer into the low-k layer.

Abstract: A liquid treatment method includes: supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder; and thereafter supplying a second organic solvent to a substrate held by the substrate holder, the second solvent having a higher cleanliness than the first solvent.

Abstract: A polymeric product including at least two layers, wherein a functional layer includes a polymeric material and at least one anti-microbial substance, and a protective layer, including a polymeric material arranged outside the functional layer and completely covering the functional layer, wherein the protective layer does not include any anti-microbial substances. A method of producing the product, the use of the same and a kit for producing the product.

Abstract: A covered sample plate with wells holding samples to be dried. The cover has through holes that communicate with only a portion of each well. The covered plate is inserted into a cradle of an assembly of cradles that is rotated. The cradle assembly fits into a tub and when rotated the cradles present a sold wall that functions as a centrifugal fan that drives air out through an opening in the tub. The air is dried of solvent and re-circulated back through the through holes in the cover to the sample wells.

Abstract: The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.

Abstract: A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.

Abstract: Densifying a multi-layer substrate includes providing a substrate with a first dielectric layer on a surface of the substrate. The first dielectric layer includes a multiplicity of pores. Water is introduced into the pores of the first dielectric layer to form a water-containing dielectric layer. A second dielectric layer is provided on the surface of the water-containing first dielectric layer. The first and second dielectric layers are annealed at temperature of 600° C. or less. In an example, the multi-layer substrate is a nanoimprint lithography template. The second dielectric layer may have a density and therefore an etch rate similar to that of thermal oxide, yet may still be porous enough to allow more rapid diffusion of helium than a thermal oxide layer.

Abstract: Solutions of carbon nanotubes and methods for purifying the solutions are provided. The methods include mixing, for example, at least one complexing agents, at least one ionic species, and/or at least one buffer oxide etch (BOE) with a liquid medium containing carbon nanotubes and different types of contaminants, such as metal impurities, amorphous carbon, and/or silica particles, and performing a filtration process to the liquid medium so as to remove or reduce the contaminants in the liquid medium. As a result, carbon nanotube solutions of low contaminants are produced. In some embodiments, the solutions of this disclosure include a high concentration of carbon nanotubes and are substantially free from metal, amorphous carbon, and/or silica impurities.

Abstract: A composition includes a layer of nanoparticles and a layer of a second material.

Abstract: This invention relates to materials and processes for the preparation of high quality layers, for example for the fabrication of optical devices such as waveguides. In particular, the invention relates to the use of low volatility polymer materials for the deposition of high quality layers on large area substrates via a two-stage process, for example extrude-and-spin.

Abstract: Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films.

Abstract: The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.

Abstract: Provided is a micro electro mechanical systems (MEMS) device for use with an elongate structure. The MEMS device includes a generally planar substrate, a device wall layer formed upon the substrate, a septum cavity formed in the device wall layer, a channel formed in the device wall layer in fluid communication with the septum cavity, and a septum element disposed in the septum cavity. The septum element is formed of a viscoelastic material. The septum element defines a septum entry surface and a septum exit surface with the septum exit surface being exposed to the channel and disposed between the septum entry surface and the channel. The septum element is without any openings formed through the septum element extending between the septum entry and exit surfaces. Methods of manufacturing and interacting with the MEMS device are also provided.

Abstract: A composition includes a layer of nanoparticles and a layer of a second material.

Abstract: Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films.

Abstract: The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

Abstract: A coating composition for metal or refractories includes a polysilazane resin; and one or more additives that alter the thermal conductivity and/or the abrasion resistance of the cured polysilazane resin. The coating composition may be applied to a metal or refractory material substrate and heated to form a ceramic layer on the substrate. The ceramic layer exhibits lower thermal conductivity and increased abrasion resistance.

Abstract: Disclosed are coating apparatus and coating methods to uniformly coat complex objects. The coating apparatus comprises first, second and/or third gimbals connected to rotational mechanisms to allow rotation of the gimbals around or about first, second and/or third axis. When three gimbals are used, an object holder is connected to the third gimbal. When an object is present in the object holder, it can be immersed in a coating solution to form a coated object. After removal from the coating solution, the coated object is then rotated around or about two or three axes which produces a multidirectional centrifugal force which causes the coating solution to spread evenly over the surface of the object to produce a uniform thin film. Coating methods based on the forgoing are also disclosed.

Abstract: Provided are chlorine-free ink and coating compositions that demonstrate improved adherence when applied to untreated flexible plastic film substrates. The provided compositions eliminate the need for a separate step of pre-treating a plastic film before applying an ink or coating composition. Also provided are methods for producing a printed article using the provided ink and coating compositions and methods of adhering chlorine-free inks or coatings that exhibit improved adhesion characteristics to untreated plastic films.

Abstract: A substrate is rotated at a first rotation number (first step). The rotation of the substrate is decelerated to 1500 rpm that is a second rotation number and the substrate is rotated at the second rotation number for 0.5 seconds (second step). The rotation of the substrate is further decelerated to a third rotation number and the substrate is rotated at the third rotation number (third step). The rotation of the substrate is accelerated to a fourth rotation number and the substrate is rotated at the fourth rotation number (fourth step). A resist solution is continuously supplied to a center portion of the substrate from a middle of the first step to a middle of the third step.

Abstract: Technologies are generally described for a membrane that may incorporate a graphene layer perforated by a plurality of nanoscale pores. The membrane may also include a gas sorbent that may be configured to contact a surface of the graphene layer. The gas sorbent may be configured to direct at least one gas adsorbed at the gas sorbent into the nanoscale pores. The nanoscale pores may have a diameter that selectively facilitates passage of a first gas compared to a second gas to separate the first gas from a fluid mixture of the two gases. The gas sorbent may increase the surface concentration of the first gas at the graphene layer. Such membranes may exhibit improved properties compared to conventional graphene and polymeric membranes for gas separations, e.g., greater selectivity, greater gas permeation rates, or the like.

Abstract: The present invention supplies a solvent to a front surface of a substrate while rotating the substrate. The substrate is acceleratingly rotated to a first number of rotations, and a resist solution is supplied to a central portion of the substrate during the accelerating rotation and the rotation at a first number of rotations. The substrate is deceleratingly rotated to a second number of rotations, and after the number of rotations of the substrate reaches the second number of rotations, the resist solution is discharged to the substrate. The substrate is then acceleratingly rotated to a third number of rotations higher than the second number of rotations so that the substrate is rotated at the third number of rotations. According to the present invention, consumption of the resist solution can be suppressed and a high in-plane uniformity can be obtained for the film thickness of the resist film.

Abstract: Discloses herein is a method of forming a low-k layer. The method includes the following steps. Tetraalkoxysilane, ethanol, tetraalkylammonium hydroxide and water are mixed in a molar ratio between 1:0.1:0.1:5 and 1:10:0.5:36 to form a first mixture. The first mixture is heated for a period of less than about 36 hours to form a second mixture containing a plurality of non-crystalline silicon-containing particles, wherein each of the non-crystalline silicon-containing particles has a particle size of smaller than about 10 nm. Subsequently, a surfactant is added to the second mixture to form a colloid solution, in which the surfactant has a concentration of about 1-20% by weight of the colloid solution. The colloid solution is coated on a substrate and thereby forming a colloid layer thereon. Then, the colloid layer is heated at a condition sufficient to transform the colloid layer into the low-k layer.

Abstract: Provided is a gluing method for assembling an optical transceiver module. In the gluing method, a substrate, a lens and a lens barrel are provided. The lens barrel is mounted on the substrate and includes a top surface and an inner surface. The lens includes an upper surface. A rotatable platform is provided to hold the substrate. The lens is positioned in the lens barrel, with the upper surface being lower than the top surface relative to the substrate. A gluing syringe containing glue is positioned above the upper surface. The gluing syringe is moved toward the lens such that a syringe needle of the gluing syringe is closer to the substrate and is yet spaced from the upper surface. The syringe needle is then moved to contact the inner surface. The rotatable platform is rotated and the glue is output to glue the lens to the inner surface.

Abstract: A resin layer formation method and device for making a resin layer uniform on a substrate before lamination or on a substrate is provided. Adhesive is coated at an inner circumference side while rotating a substrate at low speed. A first adhesive layer is formed on the surface of the substrate by rotating at high speed. A step difference section is formed around a rotation center of the substrate by irradiating ultraviolet on an area in the inner circumference side of the first adhesive layer to hardening the area. Adhesive is coated at the rotation center side from the step difference section on the substrate, and a second adhesive layer is formed on the first adhesive layer by rotating the substrate at high speed. The first adhesive layer and the second adhesive layer are integrated to form a uniform adhesive layer.

Abstract: The present disclosure relates to a wafer chuck configured to provide a uniform photoresist layer on a workpiece. In some embodiments, the wafer chuck comprises a plurality of vacuum holes. The plurality of vacuum holes (i.e., more than one) are in fluid communication with a cavity that continuously extends along the top surface between the vacuum holes. A vacuum source, connected to each vacuum hole, is configured to remove gas molecules from the cavity located below the workpiece leaving behind a low pressure vacuum. The use of a plurality of vacuum holes increase the uniformity of the vacuum, thereby preventing the formation of high vacuum areas in close proximity to any specific vacuum hole. The reduction of high vacuum areas reduces wafer bending associated with the high vacuum areas.

Abstract: A lustrous electromagnetic wave transmissive coating film includes: metal nano-particles containing one or more kinds of metals; and a first resin containing an oxazoline group and, a second resin containing a carboxyl group, in the resin component the carboxyl group derived from the second resin being present in a molar ratio of 0.03 to 50 times the oxazoline group derived from the first resin; wherein the resin component is soluble in ethanol, or, when water is added to a diethylene glycol diethyl ether solution obtained by dissolving 0.5 g of the resin component in 10 ml of diethylene glycol diethyl ether, an addition amount of the water until the diethylene glycol diethyl ether solution becomes turbid is 1.5 ml or more.

Abstract: A substrate processing apparatus includes substrate holding unit that holds wafer W horizontally, rotation driving unit that rotates the substrate holding unit, first chemical liquid nozzle that discharges first chemical liquid toward the peripheral portion of wafer W, second chemical liquid nozzle that discharges second chemical liquid, which is different from the first chemical liquid, toward the peripheral portion of wafer, and first nozzle driving unit and second nozzle driving unit each moves the first chemical liquid nozzle and the second chemical liquid nozzle, respectively. Each chemical liquid nozzle is moved by each nozzle driving unit between processing position disposed when a chemical liquid is discharged toward the peripheral portion of wafer W, and stand-by position disposed when the chemical liquid is not discharged. Each stand-by position is disposed in the center side of wafer W compared to the processing position.

Abstract: Disclosed is a nanostructured device for the in-situ capture of fluid samples at selectable times. The device includes a porous anodic alumina substrate having a plurality of elongated pores and an erodible capping material covering the pores. The device is transported into and through a geological reservoir while suspended in an injected carrier fluid. The device can optionally include a polymeric coating to improve minimize flocculation and sedimentation and prevent adhesion to surfaces in the reservoir. Upon erosion of the capping material, the fluids can diffuse into and fill each exposed pore. After a period of time, the hot water of the medium causes swelling and closure of the pore, effectively locking the fluid sample inside the pore. The device may be retrieved and analyzed to determine the composition and properties of the captured fluids.

Abstract: Embodiments of the invention provide a method of manufacturing a patterned graphene film. The method comprises the following steps: Step 1: a photoresist layer/electron-beam resist layer is coated on a substrate and patterned, the photoresist layer/electron-beam resist layer in a region for forming the patterned graphene film is removed; Step 2: a solution of oxidized graphene is coated on the substrate formed with the photoresist layer/electro-beam resist layer patterned in Step 1, so that a film of oxidized graphene is formed; Step 3: the substrate obtained in Step 2 is placed in a hydrazine steam, so that the film of oxidized graphene formed in Step 2 is reduced and a graphene film is obtained; and Step 4: the photoresist layer/electron-beam resist layer and the graphene film on the photoresist layer/electrone-beam resist layer are removed, so that the patterned graphene film is obtained.

Abstract: A method for coating a work piece with resin including applying a controlled volume of liquid resin to the work piece with an applicator and allowing consecutive streams of resin to meld together to form a self leveling surface. The resin can be actively or passively cured. The work piece can be planar or cylindrical.

Abstract: A method of making a nanostructure by preparing a face centered cubic-ordered metal nanoparticle film from metal nanoparticles, such as gold and silver nanoparticles, exerting a hydrostatic pressure upon the film at pressures of several gigapascals, followed by applying a non-hydrostatic stress perpendicularly at a pressure greater than approximately 10 GPA to form an array of nanowires with individual nanowires having a relatively uniform length, average diameter and density.

Abstract: A method for manufacturing a field emission cathode is provided. A carbon nanotube array formed on a substrate in a container and a prepolymer are provided. The prepolymer is put into the container settled for a period of over 30 minutes to fill in clearances of the carbon nanotube array, and part of the prepolymer is covering a top end of the carbon nanotube array. The carbon nanotube array is rotated at a speed to push the part of the prepolymer into the clearances of the carbon nanotube array and a prepolymer film in the carbon nanotube array is obtained. The prepolymer film is then polymerized to form a polymer film.

Abstract: Disclosed is a chromium-free rust-inhibitive surface treatment agent to form a siliceous film that rarely cracks or peels off and yields an excellent rust-inhibitive performance on zinc surfaces of a metal part. The chromium-free rust-inhibitive surface treatment agent is an alcoholic solution of alkoxysilane oligomer having weight-averaged molecular weight of 1,000 to 10,000, and 2.5 to 15% of silicon in molecules of the alkoxysilane oligomer has been replaced with titanium. To prepare partly titanium-replaced alkoxysilane oligomer, titanium compound, in which about a half of alkoxy groups in titanium tetraalkoxide has been chelated, is reacted with tetraalkoxysilane monomer or alkoxysilane oligomer in the alcoholic solution.

Abstract: A process for efficiently forming a thick coating layer having a uniform thickness on the surface of a base material having a curved surface. The process comprises the steps of forming a coating film having a predetermined thickness by applying a coating agent containing a polymerizable monomer on the curved surface of a base material, and then curing the coating film in an atmosphere of an oxygen concentration of not more than 500 ppm by photo-polymerization while substantially maintaining the uniformity of the thickness of the coating film. Preferably, the photo-polymerization of the coating film is carried out while rotating the base material at a rotational speed of from 20 to 1500 rpm.

Abstract: A developer nozzle supplies a developer onto the surface of a substrate rotating around a vertical axis, while a pure water nozzle supplies pure water onto the surface of the rotating substrate. The pure water nozzle is spaced apart from the developer nozzle and located on an outer side of the substrate with respect to the developer nozzle. The pure water restricts flow of the developer on the substrate and causes the developer to spread toward a clockwise side of the substrate when the substrate rotates in a clockwise direction. A liquid film containing the developer and the pure water is formed on the substrate. The developer nozzle and the pure water nozzle are spaced apart from each other to suppress splattering of the developer and the pure water due to collision of the developer with the pure water.

Abstract: A method for patterning biomaterials is presented. The biomaterials exhibit biological activity after patterning. The use of bio-compatible imaging materials and solvents allows conventional lithographic patterning methods to be applied to patterning biomolecules. The method allows deposition of multiple layers without subsequent layers affecting earlier laid deposits and can pattern multiple different biomolecules on a single surface.

Abstract: Forming a hydrophobic layer on a surface can involve a mixture of a micropowder and a binder. The micropowder includes micrometer scale particles having diameters in a range of about 100 nm to about 50 ?m. The mixture is applied to the surface and is cured. A majority or at least some of the micrometer scale particles have nanometer scale features having a feature size greater than about 25 nm and less than about 100 nm.

Abstract: A super-hydrorepellent coating composition including a nano structure, polyorganosiloxane, a cross-linker, and a catalyst; a super-hydrorepellent coating layer including a cured product of the super-hydrorepellent coating composition; and a heat exchanger including the super-hydrorepellent coating layer.

Abstract: A composite includes a substrate, a binder layer disposed on a surface of the substrate; and a nanofiller layer comprising nanographene and disposed on a surface of the binder layer opposite the substrate. In addition, a nano-coating layer for coating a substrate includes multiple alternating layers of the binder layer and the nanofiller layer. Articles coated with the nano-coating layer prepared from alternating layers of nanofiller layer and binder layer have improved barrier properties, and may be used in down-hole applications.

Abstract: To provide a method for producing a thin film consisting of nanosheet monolayer film(s) and use of the thin film obtained thereby. The method for producing a thin film consisting of nanosheet monolayer film(s) by a spin coat method according to the invention comprises a step for preparing an organic solvent sol formed by allowing nanosheets obtained by the exfoliation of an inorganic layered compound to be dispersed in an organic solvent; and a step for dropping the organic solvent sol onto a substrate and rotating the substrate using a spin coater. Preferably, the nanosheet size, the organic solvent sol concentration and the spin coater rotation speed are controlled.

Abstract: Disclosed are compositions comprising unsaturated hydrofluorocarbons, an alkene with the formula of 1,1,1,4,4,5,5,6,6,6-decafluorohex-2-ene and its isomers (the “153-10 isomers”). The invention further relates to use of said compositions in methods to clean, degrease, deflux, dewater, deposit fluorolubricant, carrier fluid applications and heat transfer applications. The invention further relates to novel 153-10 isomer mixtures, their method of making and their use as cleaning compositions and in the methods listed above.

Abstract: The present invention provides a method to transfer block copolymers from water immiscible organic phase to aqueous phase using a phase transfer agent. At higher concentrations, micellar networks of the block copolymers were obtained in the aqueous solution that can be coated onto a variety of substrates. Block copolymer films showed very good antifouling properties. The phase transferred block copolymers can be used to synthesize encapsulated nanoparticle aggregates for biodiagnostic imaging applications. The phase transferred block copolymer micelles can be used to encapsulate active compounds. The invention has applications in drug delivery, crop protection, and medical device coating.

Abstract: The present invention relates to a method for producing a deposit of a material which is localized and has a defined shape on the surface of the substrate comprising the steps: (1) delimiting, by photolithography, on the surface of said substrate, at least one localized site and with a defined shape, wettable with a solution containing said material or from which said material is obtained, the areas delimiting and notably surrounding said site being non-wettable with said solution; (2) depositing on said site and said areas, said solution; whereby said material is deposited at said site.

Abstract: A coating method includes a step of forming a film of a coating solution having a larger thickness in a central region of a substrate than in an edge region of the substrate by discharging droplets of the coating solution from a plurality of nozzles formed on an inkjet head to the substrate, and a step of moving the coating solution in the film from the central region toward the edge region of the substrate by rotating the substrate. This reduces a difference in thickness of the film between the central region and the edge region of the substrate, thereby to make the film thickness substantially uniform. At the same time, the movement of the coating solution in the film can make the surface of the film smoother.

Abstract: In a coating step, a substrate is rotated at a high speed, and in that state a resist solution is discharged from a first nozzle to a central portion of the substrate to apply the resist solution over the substrate. Subsequently, in a flattening step, the rotation of the substrate is decelerated and the substrate is rotated at a low speed to flatten the resist solution on the substrate. In this event, the discharge of the resist solution by the first nozzle in the coating step is performed until a middle of the flattening step, and when the discharge of the resist solution is finished in the flattening step, the first nozzle is moved to move a discharge position of the resist solution from the central portion of the substrate. According to the present invention, the resist solution can be applied uniformly within the substrate.

Abstract: Metal imidazolate complexes are described where imidazoles ligands functionalized with bulky groups and their anionic counterpart, i.e., imidazolates are described. Compounds comprising one or more such polyalkylated imidazolate anions coordinated to a metal or more than one metal, selected from the group consisting of alkali metals, transition metals, lanthanide metals, actinide metals, main group metals, including the chalcogenides, are contemplated. Alternatively, multiple different imidazole anions, in addition to other different anions, can be coordinated to metals to make new complexes. The synthesis of novel compounds and their use to form thin metal containing films is also contemplated.

Abstract: A rare earth elements doping on yttrium oxide luminescent thin film containing conductive oxides and preparation methods thereof are provided. The said luminescent thin film is consisted of Y2O3:Re, Zn1-xAlxO, wherein 0<x?0.05, Re?Eu or Th. The said methods include the following steps: step 1, preparing colloid of Y and Eu or colloid of Y and Tb; step 2, preparing colloid of Zn1-xAlxO; step 3, mixing the colloid in step 1 and the colloid in step 2 to form complex colloid; step 4, coating the complex colloid in step 3 to form the luminescent thin film. The said luminescent thin film increases the conductivity and luminescent property of yttrium oxide luminescent thin film in the art.

Abstract: A functional fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”). The F-POSS, has a chemical structure: where Rf represents a nonreactive organic group and at least one of R1 and R2 represents a chain comprising at least three carbon atoms.