Abstract: The present invention is a CVD process for forming a thin film which includes a step of recovering an organometallic compound component from an exhaust gas which has been conventionally discarded, and a purifying step of purifying the recovered organometallic compound to thereby eliminate a by-product formed in a film forming step by CVD. According to this process, the organometallic compound is recycled. As a recovering technique, any of the followings is employed: a technique in which the exhaust gas is cooled and is recovered as a recovered content; a technique in which the exhaust gas is brought into contact with a solvent to dissolve the organometallic compound in the solvent; and a technique in which the exhaust gas is brought into contact with an adsorbent to thereby adsorb the organometallic compound.

Abstract: A process in which a base metal film is formed on the surface of a plastic film using a dry plating process, and a liquid containing an organic monomer is then brought in contact with the base metal film, thereby selectively forming a conductive organic polymer coating within any pinhole defects, and effectively filling the defects. A metal film is then formed on top of the base metal film using an electroplating process, thus forming a metal wet plating layer.

Abstract: A method to deposit a thin film on a flexible polymer substrate at room temperature comprising heating source vapor, which is vaporized by an evaporator, in a shower head in a reaction chamber so that the source vapor is thermally decomposed to be converted into the nano-size single phase; and depositing the source vapor in the nano-size single phase on the flexible polymer substrate which is not separately heated.

Abstract: According to a method for forming a coating system on a turbine engine component substrate that comprises a nickel-based superalloy substrate having at least one refractory metal included therein, a nickel-based layer is formed on the substrate, the nickel-based layer comprising at least one active material selected from the group consisting of elemental silicon and a silicon compound. The at least one active material is then diffused into the substrate. An yttrium-modified platinum aluminide bond coating, or a MCrAlX bond coating, may be then formed over the active material-modified nickel-based layer.

Abstract: Methods for evaporating (e.g., subliming) a material in the solid state. In one aspect, a mass of the material in the solid state is mixed with a plurality of packing units, wherein each of the packing units comprises an inert material. The structure of each of the packing units, or the structure of an aggregate of the packing units, comprises a plurality of non-smooth features. In one example, Pro-Pak™ metal meshes can be used, which have a plurality of various types of non-smooth features, including sharp edges, corners, and/or protrusions. These non-smooth features are believed to physically disrupt crust formation during the evaporation process. Also disclosed are other methods for evaporating a material and methods for fabricating an organic thin-film device.

Abstract: Disclosed is a method of forming a high-temperature corrosion-resistant film, which comprises placing a container containing a film-forming fine powder and a target member capable of being heated by an electric current heating process, in an atmosphere-controllable treatment chamber, and floating the fine powder and subjecting the target member to the electric current heating process to allow vapor of the fine powder generated by the heating to be diffused into the target member from a surface thereof so as to form a diffusion film layer, and allow the floated fine powder to be attached onto the surface so as to form a fine-powder film layer on the diffusion film layer. The target member may be masked to form the film only in a non-masked region of the target member. Alternatively, a specific region of the target member may be cooled at a temperature precluding the film formation to prevent the film from being formed in the specific region.

Abstract: A composition of (i) an organometallic precursor containing a hydrazine compound coordinating with a central metal thereof and (ii) an organometallic compound of a main group metal and a method of forming metal film or pattern using this composition.

Abstract: Method of forming different diffusion aluminide coatings on different surface regions of the same superalloy substrate involves positioning the substrate in a coating chamber having a aluminum-bearing coating gas flowing therein with a first substrate surface region enclosed in a masking enclosure having one or more coating gas entrance apertures communicating the interior of the enclosure to the coating gas in the coating chamber and with a second substrate surface region freely communicated to the coating gas in the coating chamber, and gas phase aluminizing the substrate by heating the substrate to an elevated coating temperature in the coating chamber having the coating gas therein to concurrently form an outwardly-grown diffusion aluminide coating on the first substrate surface region and to form an inwardly-grown, diffusion aluminide coating on the second substrate surface region of the same substrate.

Abstract: A shower head having a plurality of ejection holes for supplying an organic metal gas at uniform density to the surface of a substrate and a plurality of ejection holes for supplying an oxidizing gas at uniform density to the same is provided in a reaction furnace of an MOCVD system. A heater for heating the inside to a temperature higher than the thermal decomposition point of the organic metal gas but lower than the film forming temperature is provided in the vicinity of the substrate side surface of the shower head.

Abstract: The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. This is accomplished by 1) providing a non-thermal or non-pyrolytic means of triggering the deposition reaction; 2) providing a means of depositing a purer film of higher density at lower temperatures; and, 3) providing a faster and more efficient means of modulating the deposition sequence and hence the overall process rate resulting in an improved deposition method.

Abstract: A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the aluminum oxide layer having a surface comprising penetrating surface features; and a second aluminum oxide layer on the first aluminum oxide layer, the second aluminum oxide layer substantially completely filling the penetrating surface features of the first aluminum oxide layer. A method of forming the coated aluminum component is also described.

Abstract: A method of operating a gas phase growth system is disclosed. The method includes a processing stage and a stabilizer feeding stage. In a non-limiting embodiment of the disclosure, an organometallic complex is vaporized by a vaporizer, and subsequently fed to a reaction chamber through a gas line communicating the vaporizer with the reaction chamber, whereby a film is formed on a substrate in the reaction chamber. During the stabilizer feeding stage, a stabilizer for the organometallic complex is fed in a gaseous state during normal operation of the vaporizer, wherein the stabilizer feeding stage is executed when the vaporizer is not vaporizing the organometallic complex.

Abstract: An organometallic iridium compound having low melting point, excellent vaporization characteristic and low film formation temperature on a substrate, a process for producing the compound, and a process for preparing iridium-based films using the organometallic compound are provided. The organometallic iridium compound represented by the formula (1) (example of specific compound: (ethylcyclopentadienyl)bis(ethylene)iridium) is obtained by reacting a compound represented by the formula (4) with a compound represented by the formula (2) or (3) An iridium-based film is prepared using the compound as a precursor. In the formulae, R1 represents hydrogen atom or a lower alkyl group; R2 represents a lower alkyl group; X represents a halogen atom; and M represents an alkali metal.

Abstract: An improved component for use in a deposition chamber is constructed from ceramic zirconia and a stabilizing compound. The zirconia is preferably in a partially stabilized form and is coated with a metallic layer such as thermally sprayed aluminum. The surface of the zirconia is roughened to improve adhesion between the zirconia and the aluminum. Alternatively, an intermediate layer may be deposed between the zirconia and the metallic layer to improve the bonding between the layers. The coated zirconia component resists flaking when covered with materials that are being deposited in the deposition chamber and, thus, reduces the likelihood that devices being constructed in the deposition chamber will be contaminated by loose particles.

Abstract: A ruthenium compound from which high-quality film-like metal ruthenium can be obtained and a process for producing a metal ruthenium film from the ruthenium compound by chemical vapor deposition.

Abstract: Continuously operating furnace and method for obtaining thermal diffusion coating on the outside surface of metallic articles. The furnace is configured as a tunnel through which in succession are advanced closed containers filled with the processed articles and with powder mixture, containing diffusing specie. A chain conveyor, passing through the furnace, advances the containers along a transportation path. The furnace is provided with plurality of stopper means, capable to intermittently prevent the advancement of the containers and to retain them in discrete positions, situated along the transportation path. The containers advance in parallel being always directed perpendicularly to the transportation path and their retention in the discrete positions causes their rotation about their longitudinal axes. Continuous operation is associated with improved efficiency and increased capacity.

Abstract: A method directed to the use of a nonvolatile precursor, either a solid or liquid precursor, suitable for CVD, including liquid source CVD (LSCVD). Using the method of the invention the nonvolatile precursor is dissolved in a solvent. Choice of solvent is typically an inorganic compound that has a moderate to high vapor pressure at room temperature, which can be liquified by combination of pressure and cooling. The solution is then transported at an elevated pressure and/or a reduced temperature to the CVD chamber. The solution evaporates at a higher temperature and a lower pressure upon entry to the CVD chamber, and the nonvolatile precursor, in its gaseous state, along with a gas reactant, produces a product which is deposited on a semiconductor wafer. In LSCVD the liquid enters the chamber, contacts the wafer, evaporates, produces a product which is deposited as a thin film.

Abstract: A process for forming diffusion aluminide coatings on an uncoated surface of a substrate, without interdiffusing a sufficient amount of aluminum into a coating layer to adversely affect the coating growth potential and mechanical properties of said coating layer. A metal substrate is provided comprising an external surface and an internal passage therein defined by an internal surface, at least a portion of the external surface of the substrate being coated with a coating layer selected from the group consisting of ?-NiAl-base, MCrAlX, a line-of-sight diffusion aluminide, a non-line-of-sight diffusion aluminide, a pack diffusion aluminide, and a slurry diffusion aluminide on said substrate. The metal substrate is subjected to an aluminum vapor phase deposition process.

Abstract: A method of manufacturing a ceramic film includes a step of forming a ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state. The different types of raw materials differ from one another in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. According to this manufacturing method, a surface morphology of the ceramic film can be improved.

Abstract: Disclosed is a heat-resistant Ti alloy material excellent in high-temperature corrosion resistance and oxidation resistance, which comprises a base made of a heat-resistant Ti alloy and a surface layer formed on the surface of the base. The surface layer has a multilayer structure including an inner layer and an outer layer. The inner layer has three coexistent phases consisting of a ? phase, a ? phase and a Laves phase in the phase diagram of a Ti—Al—Cr based alloy, and the outer layer is made of an Al—Ti—Cr based alloy having an Al concentration of 50 atomic % or more.

Abstract: An article comprising a substrate formed of a silicon-comprising material, such as an article exposed to the hostile thermal environment of a gas turbine engine. The article further comprises an environmental barrier layer, e.g., an alkaline earth metal aluminosilicate, and a top coat comprising zirconia or hafnia stabilized with an oxide of a metal selected from the group consisting of magnesium, calcium, scandium, yttrium, and lanthanide metals, and mixtures thereof. The article further comprises a transition layer between the environmental barrier layer and the top coat, the transition layer comprising zirconia or hafnia stabilized with an oxide of a metal selected from the group consisting of magnesium, calcium, scandium, yttrium, and lanthanide metals; and a low CTE oxide selected from the group consisting of niobia and tantala; and mixtures thereof. A method for preparing a thermal/environmental barrier coating system on a substrate formed of a silicon-comprising material is also disclosed.

Abstract: An article comprising a substrate formed of a silicon-comprising material, such as an article exposed to the hostile thermal environment of a gas turbine engine. The article further comprises an environmental barrier layer, e.g., an alkaline earth metal aluminosilicate, and a top coat comprising zirconia or hafnia stabilized with up to about 10 mole % of an oxide of a metal selected from the group consisting of magnesium, calcium, scandium, yttrium, and lanthanide metals, and mixtures thereof. The article further comprises a transition layer between the environmental barrier layer and the top coat, the transition layer comprising zirconia or hafnia stabilized with up to about 10 mole % of an oxide of a metal selected from the group consisting of magnesium, calcium, scandium, yttrium, and lanthanide metals; and a low CTE oxide selected from the group consisting of niobia and tantala; and mixtures thereof.

Abstract: An article such as a hollow gas turbine blade has an internal cavity therein with an inlet and outlet. The outlet has an outlet minimum transverse dimension of from about 0.009 inch to about 0.012 inch. An aluminiding source powder has a minimum particle size of greater than about 0.0015 inch and not greater than about 0.005 inch. The aluminiding source powder is a mixture of from about 5 to about 15 percent by weight of a metallic aluminum-containing powder and from about 85 to about 95 percent by weight of a ceramic powder. The aluminiding source powder is flowed into the internal cavity through the inlet, and the article is heated with the aluminiding source powder in the internal cavity to a temperature of from about 1750° F. to about 2000° F., and for a time of from about 2 hours to about 12 hours, to deposit an aluminum-containing coating on the internal surface of the internal cavity. The aluminiding source powder is thereafter removed from the internal cavity through the inlet.

Abstract: A nickel-base superalloy substrate includes a surface region having an integrated aluminum content of from about 18 to about 24 percent by weight and an integrated platinum content of from about 18 to about 45 percent by weight, with the balance components of the substrate. The substrate is preferably a single-crystal advanced superalloy selected for use at high temperatures. The substrate may optionally have a ceramic layer deposited over the platinum-aluminide region, to produce a thermal barrier coating system. The platinum-aluminide region is produced by diffusing platinum into the substrate surface, and thereafter diffusing aluminum into the substrate surface.

Abstract: According to an embodiment of the invention, a method for repairing a coated high pressure turbine blade, which has been exposed to engine operation, to restore coated airfoil contour dimensions of the blade, is disclosed. The method comprises providing an engine run high pressure turbine blade including a base metal substrate made of a nickel-based alloy and having thereon a thermal barrier coating system. The thermal barrier coating system comprises a diffusion bond coat on the base metal substrate and a top ceramic thermal barrier coating comprising a yttria stabilized zirconia material. The top ceramic thermal barrier coating has a nominal thickness t. The method further comprises removing the thermal barrier coating system, wherein a portion of the base metal substrate also is removed, and determining the thickness of the base metal substrate removed. The portion of the base metal substrate removed has a thickness, ?t.

Abstract: Nanochannel electrophoretic and electrochemical devices having selectively-etched nanolaminates located in the fluid transport channel. The normally flat surfaces of the nanolaminate having exposed conductive (metal) stripes are selectively-etched to form trenches and baffles. The modifications of the prior utilized flat exposed surfaces increase the amount of exposed metal to facilitate electrochemical redox reaction or control the exposure of the metal surfaces to analytes of large size. These etched areas variously increase the sensitivity of electrochemical detection devices to low concentrations of analyte, improve the plug flow characteristic of the channel, and allow additional discrimination of the colloidal particles during cyclic voltammetry.

Abstract: A protection mask used during surface treatment for a turbomachine blade, including for example a sand blasting step and/or a metal coating step, includes at least one part matching the shape of a portion of the blade. The mask is designed to resist surface treatment effects and to be placed on the surface to be protected, and can form a removable and reusable tool according to the invention.

Abstract: A metal CVD process includes a step (A) of introducing a gaseous source material containing a metal carbonyl compound into a process space adjacent to a surface of a substrate to be processed in such a manner that the metal carbonyl compound has a first partial pressure, and a step (B) of depositing a metal film on the surface of the substrate by introducing a gaseous source material containing the metal carbonyl compound into the process space in such a mater that the metal carbonyl compound has a second, smaller partial pressure. The step (A) is conducted such that there is caused no substantial deposition of the metal film on the substrate.

Abstract: It is disclosed a method for strengthen the grain boundaries of an article (1) made from a Ni based superalloy while the article (1) is in the solid state and containing at least one grain boundary. A surface diffusion process is applied to the article (1) to enrich the at least one grain boundary with grain boundary strengthening elements of one or a combination of boron, hafnium, zirconium without forming brittle precipitates like borides or carbides.

Abstract: Bis(cyclopentadienyl)ruthenium complex havimg a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5 ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100 ppm of rhenium The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium-containing thin film.

Abstract: A method for applying an aluminide coating on a gas turbine engine blade having an external surface and an internal cooling cavity having an internal surface that is connected to the external surface by cooling holes. The method is conducted in a vapor coating container having a hollow interior coating chamber, and includes the steps of loading the coating chamber with the blade to be coated; providing an aluminide coating gas in the loaded coating chamber; maintaining the loaded coating chamber comprising the aluminide coating gas at a specified temperature and time to deposit an aluminide coating on the external surface of the blade; and then flowing an inert carrier gas into the loaded coating chamber comprising the aluminide coating gas at a specified gas flow rate and time to move the aluminide coating gas through the cooling holes and internal cooling cavity and deposit an aluminide coating on the internal surface of the blade.

Abstract: A method for manufacturing ceramics includes a step of forming a ceramic film on a substrate by mixing a fine particle of a raw material species which becomes at least part of raw materials for ceramics with an active species, and feeding the mixed fine particle and active species to the substrate. A manufacture device includes a disposing section which also serves as a heating section for a substrate, a raw material species feeding section for feeding a fine particle of a raw material species, an active species feeding section for feeding an active species, and a mixing section for mixing the raw material species and the active species.

Abstract: An aluminide coating is produced on a hollow article by furnishing an article having a hollow interior and an access opening to the hollow interior, placing an aluminide coating tape into the hollow interior through the access opening, and vapor phase aluminiding the hollow article using an external aluminum vapor source in addition to the aluminide coating tape.

Abstract: A metal-containing semiconductor layer having a high dielectric constant is formed with a method that avoids inclusion of contaminant elements that reduce dielectric constant of metals. The metal-containing semiconductor layer is formed overlying a substrate in a chamber. A precursor is introduced to deposit at least a portion of the metal-containing semiconductor layer. The precursor contains one or more elements that, if allowed to deposit in the metal-containing layer, would become impurity elements. A reactant gas is used to purify the metal-containing layer by removing impurity elements from the metal-containing layer which were introduced into the chamber by the precursor.

Abstract: Tantalum precursors useful in depositing tantalum nitride or tantalum oxides materials on substrates, by processes such as chemical vapor deposition and atomic layer deposition. The precursors are useful in forming tantalum-based diffusion barrier layers on microelectronic device structures featuring copper metallization and/or ferroelectric thin films.

Abstract: The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process. This invention also provides a process for making amino-imines and novel amino-imines.

Abstract: A surface of an article is protected by coating the surface with a silicon-containing coating by preparing a coating mixture of silicon, a halide activator, and an oxide powder, positioning the surface of the article in gaseous communication with the coating mixture, and heating the surface of the article and the coating mixture to a coating temperature of from about 1150° F. to about 1500° F. The article is preferably a component of a gas turbine engine made of a nickel-base superalloy.

Abstract: A coating and coating process for incorporating surface features on an air-cooled substrate surface of a component for the purpose of promoting heat transfer from the component. The coating process generally comprises depositing a first metallic coating material on the surface of the component using a first set of coating conditions to form a first environmental coating layer, and then depositing a second metallic coating material using a second set of coating conditions that differ from the first set, such that an outer environmental coating layer is formed having raised surface features that cause the surface of the outer environmental coating layer to be rougher than the surface of the first environmental coating layer.

Abstract: A mask suitable for protecting a portion of a substrate surface against diffusion coating of the substrate with a metal, which mask comprises a ceramic material comprising silica and an inert refractory diluent and a metal or metal alloy, wherein the metal or metal alloy is one which is reactive with silicon thereby minimising or preventing siliconisation of the substrate with silicon in the ceramic material under conditions of diffusion coating, and which is reactive with the metal being applied by diffusion coating thereby preventing diffusion coating of the portion of the substrate surface it is desired to protect.

Abstract: Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of a coating chamber.

Abstract: A method for forming an aluminide coating on a turbine engine component having an external surface and an internal cavity defined by an internal surface that is connected to the external surface by at least one hole. The method is conducted in a vapor coating container having a hollow interior coating chamber, and includes the steps of loading the coating chamber with the component to be coated; flowing a tri-alkyl aluminum coating gas into the loaded coating chamber at a specified temperature, pressure, and time to deposit an aluminum coating on the external and internal surfaces of the component; and heating the component in a nonoxidizing atmosphere at a specified temperature and time to form an aluminide coating on the external and internal surfaces. The coated component is typically then maintained at an elevated temperature in the presence of oxygen to form an oxide coating on the external and internal surfaces of the component.

Abstract: A method for providing activated species for a cyclical deposition process is provided. In one aspect, the method includes delivering a gas to be activated into a plasma generator, activating the gas to create a volume of reactive species, delivering a fraction of the reactive species into a processing region to react within a substrate therein, and maintaining at least a portion of the the gas remaining in the plasma generator in an activated state after delivering the fraction of the gas into the process region. The plasma generator may include a high density plasma (HDP) generator, a microwave generator, a radio-frequency (RF) generator, an inductive-coupled plasma (ICP) generator, a capacitively coupled generator, or combinations thereof.

Abstract: The present method provides tools for growing conformal metal nitride, metal carbide and metal thin films, and nanolaminate structures incorporating these films, from aggressive chemicals. The amount of corrosive chemical compounds, such as hydrogen halides, is reduced during the deposition of transition metal, transition metal carbide and transition metal nitride thin films on various surfaces, such as metals and oxides. Getter compounds protect surface sensitive to hydrogen halides and ammonium halides, such as aluminum, copper, silicon oxide and the layers being deposited, against corrosion. Nanolaminate structures (20) incorporating metal nitrides, such as titanium nitride (30) and tungsten nitride (40), and metal carbides, and methods for forming the same, are also disclosed.

Abstract: A process for coating hollow bodies, in which a powder mixture including a metal donor powder, an inert filler powder and an activator powder including a metal halide is provided, the powder mixture is brought into contact with an inner surface, which is to be coated, of the hollow body and is heated, in which process, in order to increase the internal layer thicknesses, the inert filler powder is provided with a mean particle size which is approximately the same as the mean particle size of the metal donor powder.

Abstract: A masking material and a method for applying the masking material to preselected surfaces of a component to protect the surfaces to which the masking material is applied from exposure to a vapor phase of aluminum gas while a protective environmental coating is applied to other surfaces of the component. The component, such as found in the hot section of a gas turbine engine, typically has intricate internal passageways. A ceramic material is applied as a mask over preselected surfaces while leaving remaining surfaces of a component exposed. The component typically is a superalloy component, and the exposed surfaces are to be coated with an environmental protective coating. The surfaces are preselected on the basis of whether coating is desired on the surface. The ceramic material forms a continuous, crack-free mask on these preselected surfaces without obstructing the internal passageways. The ceramic material which forms a mask is stable at the elevated temperatures of environmental coating application.

Abstract: The present invention is a CVD process for forming a thin film which includes a step of recovering an organometallic compound component from an exhaust gas which has been conventionally discarded, and a purifying step of purifying the recovered organometallic compound to thereby eliminate a by-product formed in a film forming step by CVD. According to this process, the organometallic compound is recycled. As a recovering technique, any of the followings is employed: a technique in which the exhaust gas is cooled and is recovered as a recovered content; a technique in which the exhaust gas is brought into contact with a solvent to dissolve the organometallic compound in the solvent; and a technique in which the exhaust gas is brought into contact with an adsorbent to thereby adsorb the organometallic compound.

Abstract: An organometallic compound having a low melting point, excellent vaporization characteristic and low film formation temperature on a substrate, for forming an iridium-containing thin film by the CVD process is provided. The organometallic iridium compound is represented by the following general formula (1) or (2): wherein R1 represents hydrogen or a lower alkyl group; R2 to R7 each represents hydrogen, a halogen, or the like, provided that specific combinations of R1 to R7 are excluded; R8 represents a lower alkyl group; R9 to R12 each represents hydrogen, a halogen, or the like, provided that specific combinations of R8 to R12 are excluded. Iridium-containing thin films are produced by using the compound as a precursor by CVD process.

Abstract: A thermal barrier coating system having an improved life as a result of a preoxidation treatment applied to a single phase platinum aluminide bond coat. After coating the substrate to form a diffusion platinum aluminum bond coat, the surface finish of the bond coat was grit blasted with an inert grit of preselected size at a preselected pressure to achieve a predetermined surface finish. After the grit blasting, but before application of the ceramic top coat of yttria-stabilized zirconia (YSZ), the coating was preoxidized to form a thin alumina scale by heat treating the diffusion platinum aluminide bond coat at an elevated temperature at a preselected partial pressure of oxygen.

Abstract: A system and method for that allows one part of an atomic layer deposition (ALD) process sequence to occur at a first temperature while allowing another part of the ALD process sequence to occur at a second temperature. In such a fashion, the first temperature can be chosen to be lower such that decomposition or desorption of the adsorbed first reactant does not occur, and the second temperature can be chosen to be higher such that comparably greater deposition rate and film purity can be achieved. Additionally, the invention relates to improved temperature control in ALD to switch between these two thermal states in rapid succession. It is emphasized that this abstract is provided to comply with rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract: The present invention provides methods for the preparation of compounds of the formula (Formula I): LyM(CO)z wherein M is Ru or Os, each L is independently a neutral ligand, y=1-4, and z=1-5. These methods involve the reaction of Ru3(CO)12 or Os3(CO)12 with a neutral ligand in a solvent system having a boiling point higher than that of benzene at atmospheric pressure.