Abstract: Provided is a coated cutting tool, which includes a hard coating film containing a layer (b) formed of a nitride or a carbonitride, a layer (c) which is a layered coating film formed by alternately layering a nitride or carbonitride layer (c1) that contains 55 atom % or more and 75 atom % or less of Al, Cr having a second highest content percentage, and at least Si and a nitride or carbonitride layer (c2) that contains 55 atom % or more and 75 atom % or less of Al and Ti having a second highest content percentage, each layer having a film thickness of 50 nm or less, and a layer (d) that is a nitride or carbonitride that contains, with respect to a total amount of metal elements (including metalloid elements), 55 atom % or more and 75 atom % or less of Al, Cr having a second highest content percentage.

Abstract: A coated tool may include a base member and a coating layer located on the base member. The coating layer may include a plurality of AlTi layers and a plurality of AlCr layers. The AlTi layers may include at least one kind selected from nitride, carbide or carbonitride, each including aluminum and titanium. The AlCr layers may include at least one kind selected from nitride, carbide or carbonitride, each including aluminum and chromium. The coating layer may include a laminate structure in which the AlTi layers and the AlCr layers are alternately laminated one upon another. The AlCr layers may include a first AlCr layer and a second AlCr layer located farther away from the base member than the first AlCr layer. A content ratio of chromium in the second AlCr layer may be higher than a content ratio of chromium in the first AlCr layer.

Abstract: Provided is a coated cutting tool, which includes a hard coating film containing a layer (c) which is a layered coating film made by alternately layering a nitride or carbonitride layer (c1) that contains, with respect to the total amount of metal elements (including metalloid elements), at least 55 atom % aluminum (Al), chromium (Cr) having the second highest content percentage, and at least silicon (Si), and a nitride or carbonitride layer (c2) that contains, with respect to the total amount of metal elements (including metalloid elements), at least 55 atom % aluminum (Al) and titanium (Ti) having the second highest content, each layer having a thickness of 50 nm or less. A peak intensity Ih ascribable to an hcp (010) plane of AlN in the layer (c) and the total peak intensity Is ascribable to other predetermined crystal phases satisfy a relationship of Ih×100/Is?15.

Abstract: A composite beam apparatus includes an electron beam column for irradiating an electron beam onto a sample, a focused ion beam column for irradiating a focused ion beam onto the sample to form a cross section, and a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column for irradiating a neutral particle beam onto the sample to perform finish processing of the cross section. The electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point. A controller controls the electron beam column to irradiate and scan the electron beam on the sample during cross section processing by the focused ion beam column and during finish processing by the neutral particle beam column.

Abstract: A composite beam apparatus includes an electron beam column for irradiating an electron beam onto a sample, a focused ion beam column for irradiating a focused ion beam onto the sample to form a cross section, and a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column for irradiating a neutral particle beam onto the sample to perform finish processing of the cross section. The electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point. A controller controls the electron beam column to irradiate and scan the electron beam on the sample during cross section processing by the focused ion beam column and during finish processing by the neutral particle beam column.

Abstract: An alignment layer composition including a copolymer of a dianhydride compound and a diamine compound, the copolymer including a repeating unit represented by chemical formula (1); and a repeating unit represented by chemical formula (2): wherein R1 is a tetravalent organic group derived from an alicyclic dianhydride or an aromatic dianhydride, and wherein R1 includes a phenyl ester group.

Abstract: An alignment layer composition including a copolymer of a dianhydride compound and a diamine compound, wherein the copolymer includes a repeating unit represented by Formula 1: wherein each of Ar1 and Ar2 is independently a substituted or unsubstituted aromatic group comprising 6 to 30 carbon atoms, X is an electron donating group, and is an ester group, wherein “*” indicates a point of attachment to the aromatic groups Ar1 and Ar2.

Abstract: When injection of electrons into a sample supporting member causes a potential gradient between an insulative thin film and a conductive thin film at a site of electron beam injection, the potential barrier of the surface of the insulative thin film becomes thin, and an electron emission phenomenon is caused by tunnel effects. Secondary electrons caused in the insulative thin film tunnel to the conductive thin film along the potential gradient. The secondary electrons, having tunneled, reach a sample while diffusing in the conductive thin film. In the case where the sample is a sample with a high electron transmittance, such as a biological sample, the secondary electrons also tunnel through the interior of the sample. The secondary electrons are detected to acquire an SEM image in which the inner structure of the sample is reflected.

Abstract: A high surface area valve-metal capacitor electrode is formed on a moving substrate in vacuum by a continuous multilayer vapor-phase deposition process under conditions of substrate temperature and speed that produce continuously growing, uninterrupted dendritic structures. The process is carried out in an atmosphere of inert gas, preferably including He or Ar, with or without an impurity gas such as oxygen. The substrate may be a valve-metal foil or wire, a metal screen, a polymer film, an organic or inorganic fiber, or a composite material. The direction of motion of the moving substrate may be reversed during the deposition process in order to increase the porosity of the dendrites. The electrode may be passivated using an oxygen-containing plasma before exposure to air. The process may also be carried out under conditions that produce boundary-layer turbulence in order to promote the continuously growth of uninterrupted dendritic structures.

Abstract: The apparatus for thermolysis of waste plastics has a feeding system, a thermolysis reactor, an external circulation loop, and a product collecting system. The collecting and two-step product separation system includes a condenser, a product cooling system, a light fraction receiver with a gaseous product removing system, a crude heavy fraction receiver, and a vacuum evaporator. In the plastic waste thermolysis method, product vapors are removed continuously from the reactor and conducted to the condenser for condensation of vapors to yield a product mixture, which is separated into light oil and crude heavy oil. The light oil is conducted to the light oil receiver and a light oil tank for further processing. The crude heavy oil is pumped to a vacuum evaporator through a heat exchanger for separating into wax and heavy oil for further processing.

Abstract: Methods, apparatus, and systems for depositing materials with gaseous precursors are provided. In certain implementations, the methods involve providing a wafer substrate to a chamber of an apparatus. The apparatus includes a showerhead to deliver a gas to the chamber, a volume, and an isolation valve between the volume and the showerhead. A gas is delivered the volume when the isolation valve is closed, pressurizing the volume. The isolation valve is opened to allow the gas to flow to the showerhead when the gas is being delivered to the volume. A material is formed on the wafer substrate using the gas. In some implementations, releasing the pressurized gas from the volume reduces the duration of time to develop a spatially uniform gas flow across the showerhead.

Abstract: Functionalized multilayer structures are manufactured by a process whereby a substrate material is treated with a reactive-gas plasma to form an activated layer on the surface thereof, and then by depositing a liquid functional monomer on the activated layer to form a self-assembled functional layer. Any excess liquid monomer must be allowed to re-evaporate in order to obtain optimal functionality on the surface of the resulting structure. The deposition of the liquid layer is preferably carried out with high kinetic energy to ensure complete penetration of the monomer throughout the body of the substrate. For particular applications, prior to formation of the reactive layer the substrate may be coated with a high glass-transition temperature polymer or a metallic layer.

Abstract: Apparatuses are provided for controlling flow conductance of plasma formed in a plasma processing apparatus that includes an upper electrode opposite a lower electrode to form a gap therebetween. The lower electrode is adapted to support a substrate and coupled to a RF power supply. Process gas injected into the gap is excited into the plasma state during operation. The apparatus includes a ground ring that concentrically surrounds the lower electrode and has a set of slots formed therein, and a mechanism for controlling gas flow through the slots.

Abstract: Dental curing systems, apparatuses, and methods may include a light source, a perforated plate, and a dental composite. The perforated plate may be positioned between the light source and the dental composite. The perforated plate may include a plurality of perforations that convert a first curing light beam from the light source into multiple curing light beams before reaching the dental composite. The multiple curing light beams come in contact with the dental composite to begin the curing process at certain locations on the dental composite. The perforated plate may then be removed, and a second curing light beam from the light source may be applied to the dental composite to complete the curing process.

Abstract: A method for forming a coating on an ionic liquid includes placing an ionic liquid on a surface of a substrate, thereby forming an ionic liquid coated substrate. The ionic liquid coated substrate is introduced into a physical deposition chamber having a physical deposition target. One or more materials are directed from the physical deposition target onto the ionic liquid of the ionic liquid coated substrate by physical vapor deposition to form a coating on the ionic liquid of the ionic liquid coated substrate.

Abstract: The method of forming an organic film, includes: an organic film formation step of forming an organic film on a surface of a base member using a silane coupling agent; and a post-processing step including a water vapor introduction step of holding the base member on which the organic film has been formed in an atmosphere containing at least water vapor, and a dehydration processing step of holding the base member in an atmosphere having a smaller presence of water vapor than the atmosphere in the water vapor introduction step.

Abstract: Disclosed is a method for producing a polymer-based microfluidic device, including: forming a microstructure on a lower polymer matrix; coating the lower polymer matrix with TiO2 to perform patterning of TiO2; bonding the lower polymer matrix with an upper polymer matrix; and radiating UV lights thereto to convert TiO2-coated regions into hydrophilic regions. Disclosed also is a polymer-based microfluidic device obtained by the method. The method enables development of a microfluidic device having high stability and long-term durability.

Abstract: Provided is a method of manufacturing a semiconductor device. The method includes: loading a substrate into a process vessel; performing a process to form an film on the substrate by alternately repeating: (a) forming a layer containing an element on the substrate by supplying at least two types of source gases into the process vessel, each of the at least two types of source gases containing the element, and (b) changing the layer containing the element by supplying reaction gas into the process vessel, the reaction gas being different from the at least two types of source gases; and unloading the processed substrate from the process vessel.

Abstract: Embodiments of the invention provide methods of crosslinking various compounds and materials made by these methods. Materials made by embodiments of the invention include glucose sensors used in the management of diabetes.

Abstract: A method is provided for producing particles, such as nanoparticles. The method includes introducing an ionic liquid into a deposition chamber, and directing one or more material toward or depositing one or more materials onto the ionic liquid by physical vapor deposition to form nanoparticles in the ionic liquid.

Abstract: A cured organopolysiloxane resin film having gas barrier properties comprising a fiber-reinforced film made of a hydrosilylation-cured organopolysiloxane resin and having a transparent inorganic layer selected from silicon oxynitride layer, silicon nitride layer, and silicon oxide layer formed on the fiber-reinforced film wherein a layer of cured organopolysiloxane that contains an organic functional group, silanol group, hydrosilyl group, or an organic group produced by the polymerization of polymerizable organic functional groups is interposed between said fiber-reinforced film and inorganic layer. Also, a method of producing this cured organopolysiloxane resin film having gas barrier properties.

Abstract: Methods and apparatus are disclosed for the formation of vaporizing liquid precursor materials. The methods or apparatus can be used as part of a chemical vapor deposition apparatus or system, for example for forming films on substrates. The methods and apparatus involve providing a vessel for containing a liquid precursor and diffusing element having external cross-section dimensions substantially equal to the internal cross-sectional dimensions of the vessel.

Abstract: Copper plating baths containing a leveling agent that is a reaction product of a certain imidazole with a certain epoxide-containing compound that deposit copper on the surface of a conductive layer are provided. Such plating baths deposit a copper layer that is substantially planar on a substrate surface across a range of electrolyte concentrations. Methods of depositing copper layers using such copper plating baths are also disclosed.

Abstract: According to a method for forming a UV patternable conductive polymer film, vapor-phase polymerization (VPP) may be employed to synthesize a conductive polymer, and a UV-curable polymer resin may be used as a binder to form a conductive polymer film, the method including coating a mixed solution of a binder and an oxidant on a transparent substrate, synthesizing a conductive polymer by vapor-phase polymerization (VPP) on the coating to form a conductive polymer film and patterning the conductive polymer film with UV light. The conductive polymer film may be patterned in a relatively simple manner while maintaining increased conductivity, improved transparency and improved flexibility. Therefore, the conductive polymer film may be used as a material for transparent electrodes of a variety of display devices, e.g., LCD and PDP devices, and electronic devices, e.g., ELs and TFTs.

Abstract: In order to limit the negative effect of metal contamination on reflectivity within an EUV lithography device, a reflective optical element is proposed for the extreme ultraviolet and soft X-ray wavelength range with a reflective surface with an uppermost layer, in which the uppermost layer comprises one or more organic silicon compounds with a carbon-silicon and/or silicon-oxygen bond.

Abstract: In an embodiment, the invention is a single ply paper product comprising a paper substrate having a first surface and a second surface and comprising a web of fibers sufficiently refined to have a Canadian Standard Freeness value of greater than about 100 cm3 according to TAPPI standard test T 227, and having a weight of between about 20 lbs./3,000 ft.2 and about 45 lbs./3,000 ft.2; and a fluorochemical in an amount of at least 800 parts per million. In another embodiment, the invention is a method for processing a single ply paper product comprising the steps of folding a single ply paper product into a container. Processing of the single ply paper product includes at least one of folding, creasing, applying adhesive, applying a susceptor patch, and heat sealing. In another embodiment, the invention is an article comprising a single ply paper product and a charge of oil and popcorn.

Abstract: Methods for supplying one or more vapors, under reduced pressure, to an environment are provided. The vapor may comprise at least one polymerizable component. In some cases, at least two components may be combined to form the vapor. The components may be provided as separate vapor streams, which may be combined and homogenized. Methods of the invention may also be useful in the deposition of materials on the surface of a substrate. In some cases, the material may form a layer, such as a polymer layer, on the surface of a substrate. The present invention may be useful in applications that require the formation of homogeneous films on the surface of a substrate.

Abstract: Provided is a method of manufacturing a semiconductor device. The method includes: loading a substrate into a process vessel; performing a process to form an oxide, nitride, or oxynitride film on the substrate by alternately repeating: (a) forming a layer containing an element on the substrate by supplying and exhausting first and second source gases containing the element into and from the process vessel; and (b) changing the layer containing the element into an oxide, nitride, or oxynitride layer by supplying and exhausting reaction gas different from the first and second source gases into and from the process vessel; and unloading the substrate from the process vessel. The first source gas is more reactive than the second source gas, and an amount of the first source gas supplied into the process vessel is set to be less than that of the second source gas supplied into the process vessel.

Abstract: A thermal barrier coating system comprising a metal substrate, a metal bonding layer and a ceramics thermal barrier layer wherein the ceramics thermal barrier layer has a columnar structure of a stabilized zirconia containing a stabilizer or a stabilized ZrO2—HfO2 solid solution containing a stabilizer, and comprises 0.1 to 10 mol % of lanthanum oxide.

Abstract: A method for evaluating the spatial distribution of an ionomer in a fuel cell MEA. The method includes embedding the MEA in an epoxy, and then slicing thin sections from the MEA. The sliced sections are then exposed to a titanium tetrachloride vapor that stains the epoxy. The stained sections are then viewed with, for example, a transmission electron microscope (TEM) where the lighter regions in the TEM image show the ionomer distribution.

Abstract: A single ply paper product including a paper substrate having a first surface and a second surface and including a web of fibers sufficiently refined to have a Canadian Standard Freeness value of greater than about 100 cm3 according to TAPPI standard test T 227, and having a weight of between about 20 lbs./3,000 ft.2 and about 45 lbs./3,000 ft.2; and a fluorochemical in an amount of at least 800 parts per million.

Abstract: A method for forming a patterned noble metal coating on a gas diffusion medium substantially free of ionomeric components comprising subjecting an electrically conductive web with a patterned mask overlaid thereto to a first ion beam having an energy not higher than 500 eV, and to a second beam having an energy of at least 500 eV, containing the ions of at least one noble metal and a gas diffusion electrode.

Abstract: A nonwoven web or laminate having improved antistatic properties and alcohol repellency properties is generally provided, along with methods of making the same. The method includes forming a nonwoven web from a thermoplastic mixture of an antistatic agent and a thermoplastic polymer. A high energy treatment is applied to a surface of the nonwoven web. Then, a fluorinated agent is grafted to the surface of the spunbond web utilizing a monomer deposition process. The monomer deposition process can generally include evaporating a liquid fluorinated agent in a vacuum chamber, followed by depositing the fluorinated agent gas on a surface of the spunbond web, and exposing the surface to radiation.

Abstract: A method for forming a noble metal coating on a gas diffusion medium substantially free of ionomeric components comprising subjecting an electrically conductive web to a first ion beam having an energy not higher than 500 eV, then to a second beam having an energy of at least 500 eV, containing the ions of at least one noble metal and electrodes provided by the method.

Abstract: A low refractive index SiO2 film is provided which uses a starting material for forming an SiO2 film and has a lower refractive index than the conventional SiO2 film. A starting material gas comprising a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom is subjected to plasma CVD in a vacuum chamber 1 to form an SiO2 film on a web 2 in a plasma zone 5.

Abstract: A process for producing a coated substrate or a product having a coated substrate is provided. The process includes coating at least one metallic surface with a glass, the substrate being coated with an evaporation-coating glass at least on the metallic surface.

Abstract: The present invention is a turbine engine component comprising a superalloy substrate, a bond coat overlying the substrate having a thickness in the range of about 0.0005 inch to about 0.005 inch, a thin alumina scale overlying the bond coat, and a thermal barrier coating (TBC) overlying the thin alumina scale, the TBC having a thickness in the range of about 0.0025 inch to about 0.010 inch, and comprising at least mischmetal oxide.

Abstract: The present invention provides a polymer coating method. In the method, in a vacuum chamber, a low temperature monomer evaporation chamber is used to heat a liquid monomer and a cooled substrate at a temperature lower than the liquid monomer reservoir or vapor. The liquid monomer is allowed to condense on the cooled substrate surface where it is polymerized by a radiation source. The process depends on the vapor pressure difference between liquid in the monomer source and liquid condensed on the surface of the cooled substrate. The film thickness is dependent on the temperature difference between the monomer reservoir and the substrate, and the time that is required to move the coated substrate from the evaporation chamber to the cure station. The method is suitable for forming very thin, uniform, pinhole-free, polymer coatings from a variety of monomers, having at least two olefinic groups per molecule, on a variety of substrates.

Abstract: In an embodiment, the invention is a single ply paper product with a paper substrate having a first surface and a second surface and a web of fibers sufficiently refined to have a Canadian Standard Freeness value of greater than about 100 cm3 according to TAPPI standard test T 227, and having a weight of between about 20 lbs./3000 ft.2 and about 45 lbs./3,000 ft.2; and a fluorochemical in an amount of at least 800 parts per million. In another embodiment, the invention is a method for processing a single ply paper product including the steps of folding a single ply paper product into a container. Processing of the single ply paper product includes at least one of folding, creasing, applying adhesive, applying a susceptor patch, and heat sealing. In another embodiment, the invention is an article with a single ply paper product and a charge of oil and popcorn.

Abstract: The substrates of the present invention comprise a polyimide base polymer derived at least in part from collinear monomers together with crankshaft monomers. The resulting polyimide material has been found to provide advantageous properties, particularly for electronics type applications.

Abstract: A method for mask-free molecular or atomic patterning of surfaces of reactive solids is disclosed. Molecules adsorb at surfaces in patterns, governed by the structure of the surface, the chemical nature of the adsorbate, and the adsorbate coverage at the surface. The surface is patterned and then imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid, resulting in an imprint being formed in the vicinity of the adsorbate molecules. When the imprinted molecular patterns are conjugated chains containing ? bonds along which electrical charge can flow the molecular patterns constitute molecular wires or the imprinted molecules constitute a molecular-scale device. The surface of the substrate can be doped by including n- or p-type dopants in the adsorbate molecules. These molecular wires are anchored to the substrate by using conjugated chains which can be chemically bound at intervals along the chains to the substrates.

Abstract: A process is disclosed for forming a fluoropolymer layer on a thin film device, comprising contacting said thin film device with a gas phase fluoromonomer, and initiating polymerization of said fluoromonomer with a free radical polymerization initiator whereby said fluoromonomer polymerizes to form said fluoropolymer layer on said thin film device.

Abstract: A method for conformally coating a microtextured surface. The method includes flash evaporating a polymer precursor forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge polymer precursor plasma from the evaporate, cryocondensing the glow discharge polymer precursor plasma on the microtextured surface and crosslinking the glow discharge polymer precursor plasma thereon, wherein the crosslinking resulting from radicals created in the glow discharge polymer precursor plasma.

Abstract: The invention is based on a method for coating at least one wiper blade element (10) made of an elastomer material, in which first, the surface of the wiper blade element (10) is cleaned and activated by means of a plasma, and then in a CVD process, a coating material is brought into a plasma state and at least one protective coating (64) forms on the surface of the wiper blade element (10), where a high-frequency voltage is applied to the region of the wiper blade element (10) oriented away from the protective layer (64) by means of an electrode (56). The invention proposes that before being brought into a treatment chamber (32, 34, 36, 38, 40, 74), the wiper blade element (10) be cut to a useful length (66) from a profiled band and placed on an electrode plate (56) so that its wiper lip (18) stands approximately perpendicular to the electrode plate (56), which extends to both sides of the wiper blade element (10), and is subjected to a plasma flow (50).

Abstract: Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating layer on a surface of one or more substrates. The systems and methods also including a curing system operative to apply at least one of a plurality of curing environments to each of a plurality of regions associated with the at least one coating layer, the curing system comprising a plurality of waveguides each having a first end corresponding to at least one of the plurality of regions and a second end associated with at least one curing source. The combinatorial coating library comprising a predetermined combination of at least one of the plurality of materials and at least one of the plurality of curing environments associated with each of the plurality of regions.

Abstract: Methods, coatings and coated medical devices are provided, wherein a plasma-deposited aliphatic polymerized hydrocyclosiloxane membrane is deposited as a diffusion control barrier for a drug deliver component consisting of one or more therapeutic agents coated on a surface or contained within a matrix, preferably a polymeric matrix, coated on a surface. The plasma-polymerized hydrocyclosiloxane membrane coats all or substantially all of the drug delivery component in contact or communication with the exterior surface, such that all or substantially all of any drug or therapeutic agent must diffuse across the membrane in order to be released.

Abstract: The present invention relates to a method for reforming the surface of polymer, especially to a method for providing hydrophilicity or increasing hydrophobicity by reforming the surface of polymer or polymer membrane. The present invention is a method for reforming the surface of polymer membrane by irradiating it with energized ionic particles under the vacuum condition. The method including the steps of: a) manufacturing polymer membrane, including a surface activated, by inserting polymer membrane into a vacuum chamber, and by irradiating energized ionic particles on the surface of polymer membrane with an ion beam under a high vacuum; and b) manufacturing polymer membrane treated with a reactive gas on the surface of membrane, including the activated surface of step a), by infusing the reactive gas into a vacuum chamber after energized ionic particles of step a) have been irradiated.

Abstract: The present invention relates to an organic compound having acetylene group(s), a thin film formed by vacuum deposition polymerization using said organic compound, vacuum deposition polymerization to form said thin film, and an electroluminescence device containing said thin film. More particularly, the present invention relates to an organic compound having at least one acetylene groups, vacuum deposition polymerization in which said organic compound is deposited on the substrate and simultaneously or then polymerized by heat treatment or UV irradiation to form a polymer thin film, and an electroluminescence device using at least one layer of said thin film.

Abstract: The present invention relates to a process, preferably a continuous process, of coating a substrate, which allows water vapor and preferably air permeation, with a hydrophobic coating. The process preferably uses a thin film vacuum condensation step to create a monomer coating which is cured in situ after the coating. The process has the benefit of allowing continuous operation and providing an alternative to existing processes for hydrophobic coating. The substrates are coated such that the water vapour permeation sites are not blocked by the coating to maintain the desired breathability. The static water contact angle on the surface of such substrates is more than 95°.

Abstract: A method for plasma enhanced chemical vapor deposition of low vapor monomeric materials. The method includes flash evaporating a polymer precursor forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge polymer precursor plasma from the evaporate, and cryocondensing the glow discharge polymer precursor on a substrate as a cryocondensed polymer precursor layer, and crosslinking the cryocondensed polymer precursor layer thereon, the crosslinking resulting from radicals created in the glow discharge polymer precursor plasma.