Organosilicon Containing Coating Material Patents (Class 427/515)
  • Patent number: 8784947
    Abstract: To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. A silsesquioxane compound comprising organic groups each directly attached to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more urethane bonds and one (meth)acryloyloxy group.
    Type: Grant
    Filed: October 3, 2013
    Date of Patent: July 22, 2014
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Akinori Nagai, Yoshiaki Chino, Masami Kobata, Osamu Isozaki
  • Publication number: 20140186543
    Abstract: Disclosed are compositions that include: a) a thiol-terminated polymer; and b) a sulfur-containing ethylenically unsaturated silane. Related products, such as sealants, that include polymers derived from such compositions, are also disclosed.
    Type: Application
    Filed: March 7, 2014
    Publication date: July 3, 2014
    Applicant: PRC-DeSoto International, Inc.
    Inventors: Raquel Keledjian, Renhe Lin, Chandra Rao, Bruce Virnelson
  • Publication number: 20140186542
    Abstract: An anti-finger print hard coating resin composition is described that includes a high hardness ultra-violet (UV) curable resin having a weight percent of about 5% to about 99% and including at least one of siloxane compound and urethane acrylate compound; a UV curable fluoro-based compound having a weight percent of about 0.02% to about 2% with respect to the high hardness UV curable resin; an optical initiator having a weight percent of about 0.1% to about 10% with respect to the high hardness-UV curable resin; and an arylate monomer of residual amount.
    Type: Application
    Filed: December 11, 2013
    Publication date: July 3, 2014
    Applicant: LG Display Co., Ltd.
    Inventors: Hye-Ran PARK, Won-Jin CHOI
  • Publication number: 20140178698
    Abstract: A curable silsesquioxane polymer, a composition including such polymer, an article having a layer disposed thereon that includes the curable polymer and/or the cured polymer, and a method of forming a cured coating, wherein the curable silsesquioxane polymer includes a three-dimensional branched network having the formula: wherein: the oxygen atom at the * is bonded to another Si atom within the three-dimensional branched network; R is an organic group comprising an ethylenically unsaturated group; n is an integer of greater than 3; and the —OH groups are present in an amount of at least 15 wt-% of the polymer.
    Type: Application
    Filed: May 31, 2013
    Publication date: June 26, 2014
    Inventor: Jitendra S. Rathore
  • Publication number: 20140147598
    Abstract: A coating method for producing an electrically insulating coating on a bearing component, wherein, in a first step, a substance mixture comprising at least a) a silane and/or siloxane compound, b) a metal alcoholate, and c) PEEK and/or PTFE in the form of a dispersion is applied to the bearing component and, in a second step, is solidified on the component surface by means of a laser beam.
    Type: Application
    Filed: April 17, 2012
    Publication date: May 29, 2014
    Applicant: SCHAEFFLER TECHNOLOGIES AG & CO. KG
    Inventors: Juergen Windrich, Tim Matthias Hosenfeldt, Helmut Schillinger
  • Publication number: 20140134362
    Abstract: The present invention, provides a barrier laminate comprising an inorganic layer and an organic layer disposed on the surface of the inorganic layer, wherein the organic layer comprises a silane coupling agent denoted by general formula (1) below: The barrier laminate maintains both barrier properties and adhesion between an organic layer and an inorganic layer, even when incorporated into an element.
    Type: Application
    Filed: January 30, 2014
    Publication date: May 15, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Eijiro IWASE, Atsushi MUKAI, Jiro TSUKAHARA
  • Publication number: 20140127518
    Abstract: A water vapor barrier film that has high water vapor barrier performance, and further is excellent in water resistance, heat resistance, transparency, and smoothness; and a method for producing the same; and an electronic equipment using the same are provided. A water vapor barrier film containing at least one water vapor barrier layer, and at least one protective layer, on a base material having gas permeability, wherein the water vapor barrier layer is a layer formed by applying a coating liquid containing polysilazane, drying the applied coating liquid to form a film, and then by irradiating the film with vacuum ultraviolet light, and the protective layer is a layer formed by applying a coating liquid containing polysilozane, drying the applied coating liquid to form a film, and then by irradiating the film with vacuum ultraviolet light.
    Type: Application
    Filed: June 7, 2012
    Publication date: May 8, 2014
    Applicant: Konica Minolta , Inc.
    Inventor: Wataru Ishikawa
  • Patent number: 8703838
    Abstract: The invention provides an improved unsaturated polyester prepared from the polycondensation of unsaturated diacid monomers or unsaturated acid anhydride mononers and polyol monomers and, optionally, one or more saturated aliphatic or aromatic diacid monomers or anhydride monomers thereof. The improvement comprises 0.5 to 50 weight percent, based on the total monomer weight, of a hydroxyalkyl-functional siloxane of formula (1) below. The invention also relates to a UV curable coating formulation containing a siloxane-functional unsaturated polyester resin, a vinyl ether functional diluents and a photoinitiator. The invention further provides a method of preparing an article with a low-surface energy coating. According to the method, at least one surface of an article with a coating formulation of the invention; and the coating is then cured as described above with UV light to form a low-surface energy coating on the surface.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: April 22, 2014
    Assignee: NDSU Research Foundation
    Inventors: Dean C. Webster, Neena Ravindran, Ankit Vora
  • Publication number: 20140106151
    Abstract: Provided are a gas barrier film which has extremely excellent gas barrier performance and high durability, a manufacturing method thereof, and an electronic device using the same. The gas barrier film having at least two gas barrier layers which contain at least Si, O and N and are laminated on a substrate, in which the total thicknesswise composition distribution of the gas barrier layers includes both a thicknesswise continuous region which has a thickness of 20 nm or more and satisfies the following composition range (A) and a thicknesswise continuous region which has a thickness of 50 nm or more and satisfies the following composition range (B) in this order from the substrate side. (A): when the composition of the gas barrier layer is represented by SiOwNx, w?0.8, x?0.3, and 2w+3x?4, and (B): when the composition of the gas barrier layer is represented by SiOyNz, 0<y?0.55 and z?0.55, and 2y+3z?4.
    Type: Application
    Filed: June 13, 2012
    Publication date: April 17, 2014
    Applicant: KONICA MINOLTA , INC.
    Inventor: Takahiro Mori
  • Publication number: 20140093651
    Abstract: The invention describes methodological approach and process for preparation of variable compositions of water-(hydrophobic), oil- and dust-repellent multi-component mixtures containing non-cyclic silanes, siloxanes, hydrocarbons, silane-carbons), cyclic molecular compounds (cyclic-silanes, hydrocarbons, silane-carbons and their derivatives) and other hydrophobic molecular components (as separate molecular substances or as molecular substitutes within the silanes and/or the cyclic compound molecules). Such methodological approach offers best flexibility for repellant mixtures preparation in achieving highly repellant properties, durability and long-lasting (permanent) bonding for specific surface applications and for preparation of other subsequent types of repellant surfacing solutions such as paints or sealing agents, textiles and else.
    Type: Application
    Filed: July 20, 2013
    Publication date: April 3, 2014
    Inventors: Hristem Mitkov Dyanov, Paoula Hristemova Dyanova, Radu Chiorean
  • Patent number: 8668961
    Abstract: Methods of making titania coatings having self cleaning properties, and associated articles are provided. In certain example instances, a substrate supports a layer comprising titanium dioxide. The substrate may support multiple layers. In certain examples, the titanium dioxide layer is made using a process involving a titania precursor and a photomonomer. The titanium dioxide coating may be applied as a liquid directly or indirectly on a substrate, then permitted to cure. After curing using ultraviolet radiation and/or electron beams, the resulting coating may inhibit fouling, be antireflective, be highly durable, self cleaning and/or hydrophilic in certain instances.
    Type: Grant
    Filed: July 31, 2008
    Date of Patent: March 11, 2014
    Assignee: Guardian Industries Corp.
    Inventor: Desaraju V. Varaprasad
  • Publication number: 20140030441
    Abstract: To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. A silsesquioxane compound comprising organic groups each directly attached to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more urethane bonds and one (meth)acryloyloxy group.
    Type: Application
    Filed: October 3, 2013
    Publication date: January 30, 2014
    Applicant: Kansai Paint Co., Ltd.
    Inventors: Akinori Nagai, Yoshiaki Chino, Masami Kobata, Osamu Isozaki
  • Publication number: 20140010971
    Abstract: The present invention is drawn to a method for manufacturing antistatic UV-cured hard-coatings on optical articles, comprising (a) coating an organic or mineral optical substrate with an essentially anhydrous solution containing from 20% to 90% by weight, relative to the total dry matter of the solution, of at least one non hydrolyzed epoxyalkyltrialkoxysilane and at least 3.2% by weight, relative to the total dry matter of the solution, of at least one photoinitiator selected from the group consisting of triarylsulfonium salts, diaryliodonium salts, and mixtures thereof, (b) curing the resulting coating by irradiation with UV-radiation, said method not comprising any hydrolysis step before the UV curing step.
    Type: Application
    Filed: July 2, 2013
    Publication date: January 9, 2014
    Inventor: Robert Valeri
  • Publication number: 20140001075
    Abstract: A glass container and related methods of manufacturing and coating glass containers. The glass container includes an inorganic-organic hybrid coating over at least a portion of an exterior surface of a glass substrate.
    Type: Application
    Filed: July 2, 2012
    Publication date: January 2, 2014
    Inventors: Michael P. Remington, JR., Pramod K. Sharma, Daniel Baker
  • Publication number: 20140004360
    Abstract: Efficiently produced is a release liner including a plant-derived film as a substrate and having a good appearance, releasability, and adhesion. A method according to the present invention produces a release liner having a plant-derived film substrate and, on at least one side thereof, a release coat layer derived from a thermosetting silicone resin. The method includes the steps as follows: Step A of applying a thermosetting silicone release agent to at least one side of a plant-derived film substrate, the release agent containing 100 parts by weight of a thermosetting silicone resin and 0.05 to 0.55 part by weight of a curing catalyst; Step B of drying at 40° C. to 90° C. for 10 to 60 seconds after Step A; Step C of applying an ultraviolet ray at 50 to 300 mJ/cm2 after Step B; and Step D of aging at 30° C. to 70° C. for 12 to 240 hours after Step C.
    Type: Application
    Filed: March 7, 2012
    Publication date: January 2, 2014
    Applicant: NITTO DENKO CORPORATION
    Inventors: Hitoshi Takahira, Satomi Yoshie, Shigeki Ishiguro, Hiroki Senda
  • Publication number: 20140001181
    Abstract: A glass container and related methods of manufacturing and coating glass containers. The glass container includes an inorganic-organic hybrid coating over at least a portion of an exterior surface of a glass substrate.
    Type: Application
    Filed: July 2, 2012
    Publication date: January 2, 2014
    Inventors: Pramod K. Sharma, Carol A. Click
  • Publication number: 20130337161
    Abstract: An organic-inorganic composite film containing an organic-inorganic composite including an inorganic compound particle and a polymer bonded to the inorganic compound particles. A percentage of voids in the film is 3 to 70 volume % with reference to a volume of the film.
    Type: Application
    Filed: February 20, 2012
    Publication date: December 19, 2013
    Applicant: ASAHI KASEI CHEMICALS CORPORATION
    Inventors: Mitsuyo Akimoto, Kenya Tanaka
  • Patent number: 8603588
    Abstract: Disclosed is a composition comprising a hydrolysate of an alkoxysilane compound, a hydrolysate of a siloxane compound represented by Formula (1), a surfactant, and an element having an electronegativity of 2.5 or less. In Formula (1), RA and RB independently represent a hydrogen atom, a phenyl group, —CaH2a+1, —(CH2)b(CF2)cCF3 or —CdH2d?1, RA and RB are not both hydrogen atoms simultaneously, RC and RD independently represent a single bond that links a silicon atom and an oxygen atom to form a cyclic siloxane structure, or each independently represent a hydrogen atom, a phenyl group, —CaH2a+1, —(CH2)b(CF2)cCF3, or —CdH2d?1, a represents an integer of 1 to 6, b represents an integer of 0 to 4, c represents an integer of 0 to 10, d represents an integer of 2 to 4, and n represents an integer of 3 or greater.
    Type: Grant
    Filed: March 30, 2009
    Date of Patent: December 10, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Kazuo Kohmura, Hirofumi Tanaka
  • Publication number: 20130309412
    Abstract: A method for manufacturing a composite article of polytetrafluoroethylene and silicone includes: (a) providing a UV-curable silicone: (b) applying the UV-curable silicone to a polytetrafluoroethylene backing; and (c) exposing the UV-curable silicone to UV radiation sufficient to cure the silicone.
    Type: Application
    Filed: May 3, 2013
    Publication date: November 21, 2013
    Applicant: Momentive Performance Materials Inc.
    Inventors: Melvin Richard Toub, Vincent Joseph Colarossi
  • Patent number: 8563129
    Abstract: The invention relates polysilazane-containing coatings for increasing the light permeability of sun-facing covers of solar cells. The coating for surfaces contains at least one polysilazane of formula (1) —(SiRR?R?—NR??1)n- (1), wherein R?, R?, R?? are the same or different or represent an optionally substituted alkyl, aryl, vinyl or (trialkoxysilyl)alkyl group, n being an integer and n being chosen in such a manner that the perhydropolysilazane has a number average molecular weight of 150 to 150,000 g/mol, a solvent and a catalyst. The cured coating has a thickness of at least 0.50-10 micrometer, preferably 0.2 to 5 micrometer, especially preferred 0.5 to 1.5 micrometer. It is especially suitable as transmission-promoting coating for use in sun-facing covers of solar cells.
    Type: Grant
    Filed: April 17, 2009
    Date of Patent: October 22, 2013
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Klaus Rode, Hartmut Wiezer, Sandra Stojanovic, Hubert Liebe, Lars Blankenburg
  • Publication number: 20130260146
    Abstract: Methods of crossliiiking functional and nonfunctional silicones are described. The methods include exposing the silicones to ultraviolet radiation having a spectrum comprising at least one intensity peak below 240 nm in an inert atmosphere. Articles prepared by such methods, including release liners and adhesive articles are also described.
    Type: Application
    Filed: October 13, 2011
    Publication date: October 3, 2013
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Robin E. Wright, Margaux B. Mitera, Jayshree Seth
  • Patent number: 8541062
    Abstract: Methods for making multi-layered anti-reflective coatings are disclosed. Un-solgel precursor compositions may be prepared having inorganic oxide precursors and UV curable acrylic monomer mixtures, deposited on a substrate, and subsequently the coated substrate may be cured by exposure to electromagnetic radiation, such as UV radiation. The coating layers may be heated using a temperature sufficient to burn off organic content and form a multi-layer anti-reflective coating. Substrates comprising such coatings and photovoltaic devices comprising such substrates and coatings are also disclosed.
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: September 24, 2013
    Assignee: Guardian Industries Corp.
    Inventor: Desaraju V. Varaprasad
  • Patent number: 8518530
    Abstract: The present invention relates to a production method for an ultra-low-dielectric-constant film, in which ratios are optimised in a mixed solution having a matrix consisting of a poly (alkyl silsesquioxane) copolymer and a porogen represented by Chemical formula 1, and in which this mixed solution is subjected to ultraviolet curing during a heat treatment. The ultra-low-dieletric-constant film of the present invention can be used as an intermediate insulating film for next generation semiconductors instead of the SiO2 dielectric films currently used, since pores of from 1 to 3 nm are uniformly distributed at from 10 to 30% and a very high degree of mechanical elasticity of from 10.5 to 19 GPa is achieved at a low dielectric constant from 2.12 to 2.4.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: August 27, 2013
    Assignee: Industry-University Cooperation Foundation Sogang University
    Inventors: Hee-Woo Rhee, Hyun Sang Choi, Seong-Gyu Min, Bum Suk Kim, Bo ra Shin
  • Patent number: 8496849
    Abstract: Disclosed is a liquid crystal orientating agent which contains a liquid crystal orientating polyorganosiloxane obtained by reacting a specified reactive polyorganosiloxane typified by the hydrolysis condensate of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane and a reactive compound which includes a specified compound typified by stearic acid. The liquid crystal orientating agent of this invention can form liquid crystal orientating films which have excellent liquid crystal orientating properties, a high level of heat resistance and light resistance, exhibit little reduction of voltage retention even in high temperature environments and when irradiated with light of high intensity, and excellent residual image characteristics, and it also has excellent storage stability.
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: July 30, 2013
    Assignee: JSR Corporation
    Inventors: Kenichi Sumiya, Toshiyuki Akiike, Tsutomu Kumagai, Eiji Hayashi
  • Publication number: 20130190695
    Abstract: A medical article is provided including a chamber formed from a cyclic polyolefin having an inner surface in sliding engagement with an exterior surface of a sealing member, the inner surface of the chamber being coated with a composition including a first mixture of organopolysiloxanes having different molecular weights and a viscosity ranging from about 5,000 centistokes to about 100,000 centistokes; and a sealing member having an exterior surface coated with a second mixture of organopolysiloxanes having different molecular weights and having a viscosity ranging from about 10,000 centistokes to about 500,000 centistokes, the coatings being adhered to the surfaces by crosslinking induced by irradiation with an isotope, electron beam, or ultraviolet radiation.
    Type: Application
    Filed: March 11, 2013
    Publication date: July 25, 2013
    Applicant: BECTON, DICKINSON AND COMPANY
    Inventor: Becton, Dickinson and Company
  • Publication number: 20130092239
    Abstract: Disclosed is a method of manufacturing a gas barrier film possessing a substrate in the form of a belt and provided thereon, a gas barrier layer containing silicon oxide, possessing a coating step in which a coating solution comprising a polysilazane compound is coated on the substrate to form a coating film, and a UV radiation exposure step in which the coating film is exposed to the vacuum UV radiation emitted from the plural light sources facing the substrate while moving the substrate on which the coating film is formed relatively to the plural light sources, the plural light sources each exhibiting even illuminance along a width direction of the substrate to form a gas barrier layer, and provided is a method of manufacturing a gas barrier film by which the gas barrier film suitable for production coupled with roll-to-roll system, exhibiting excellent gas barrier performance can be prepared.
    Type: Application
    Filed: June 23, 2011
    Publication date: April 18, 2013
    Applicant: Konica Minolta Holdings, Inc.
    Inventor: Takahiro Mori
  • Publication number: 20130072592
    Abstract: A cured thin film may be easily prepared, by curing a photocurable silicone resin composition containing: (A) an organopolysiloxane having two or more alkenyl groups within each molecule, (B) an organohydrogenpolysiloxane having two or more hydrogen atoms bonded to silicon atoms within each molecule, and (C) a photoactive catalyst, by: (i) applying the composition to a substrate, (ii) obtaining a thin film in a semi-cured state by irradiating the applied coating with light, and (iii) heating the thin film in a semi-cured state to achieve complete curing, wherein the spectrum of the light irradiated in step (ii) has a maximum peak in a wavelength region from 300 nm to 400 nm, and the spectral irradiance of light of any wavelength within the wavelength region shorter than 300 nm is not more than 5% of the spectral irradiance of light of the maximum peak wavelength.
    Type: Application
    Filed: September 14, 2012
    Publication date: March 21, 2013
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kenichi INAFUKU, Miyuki WAKAO, Tsutomu KASHIWAGI
  • Patent number: 8399068
    Abstract: The present invention relates to a liquid crystal aligning agent which contains at least one selected from the group consisting of a polysiloxane having a structure represented by the following formula (S-0) and synthesized through the step of hydrolyzing or hydrolyzing/condensing a silane compound in the presence of an alkali metal compound or an organic base, a hydrolysate thereof and a condensate of the hydrolysate: (in the above formula (S-0), R is a group having an alkyl group with 4 to 20 carbon atoms, a fluoroalkyl group with 1 to 20 carbon atoms or a cyclohexyl group, or a group having 17 to 51 carbon atoms and a steroid skeleton, and YI is a hydroxyl group, an alkoxyl group having 1 to 10 carbon atoms, an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 10 carbon atoms).
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: March 19, 2013
    Assignee: JSR Corporation
    Inventors: Toshiyuki Akiike, Tsutomu Kumagai, Shoichi Nakata, Kenichi Sumiya, Eiji Hayashi
  • Patent number: 8394728
    Abstract: A film deposition method includes the steps of: coating a solution containing a polysilane compound on a substrate to form a coating film and then carrying out a first thermal treatment in an inert atmosphere, thereby forming the coating film into a silicon film; forming a coating film containing a polysilane compound on the silicon film and then carrying out a second thermal treatment in an inert atmosphere or a reducing atmosphere, thereby forming the coating film into a silicon oxide precursor film; and carrying out a third thermal treatment in an oxidizing atmosphere, thereby forming the silicon oxide precursor film into a silicon oxide film and simultaneously densifying the silicon film.
    Type: Grant
    Filed: January 27, 2010
    Date of Patent: March 12, 2013
    Assignee: Sony Corporation
    Inventors: Hirotaka Akao, Yuriko Kaino, Takahiro Kamei, Masaki Hara, Kenichi Kurihara
  • Patent number: 8394457
    Abstract: Disclosed is a precursor composition comprising: a compound selected from a compound represented by the formula: Si(OR1)4 and a compound represented by the formula Ra(Si)(OR2)4?a (in the formulas R1 represents a monovalent organic group; R represents a hydrogen atom, a fluorine atom or a monovalent organic group; R2 represents a monovalent organic group; and a is an integer ranging from 1 to 3, provided that R, R1 and R2 may be the same or different from one another) a thermally degradable organic compound; an element having a catalyst activity; urea; and the like. A porous thin film produced from the precursor composition is irradiated with ultraviolet ray, and then subjected to gas-phase reaction with a hydrophobic compound. A porous thin film thus prepared can be used for the manufacture of a semiconductor device.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: March 12, 2013
    Assignee: Ulvac, Inc.
    Inventors: Nobutoshi Fujii, Takahiro Nakayama, Kazuo Kohmura, Hirofumi Tanaka
  • Publication number: 20130059105
    Abstract: Methods for producing an at least partially cured layer by applying a layer including a (meth)acrylate-functional siloxane to a surface of a substrate, and irradiating the layer in a substantially inert atmosphere with a short wavelength polychromatic ultraviolet light source having a peak intensity at a wavelength of from about 160 nanometers to about 240 nanometers to at least partially cure the layer. Optionally, the layer is at a curing temperature greater than 25° C. In some embodiments, the layer has a thickness of about 0.1 micrometers to about 1 micrometer. In certain embodiments, the layer is substantially free of a photoinitiator and/or an organic solvent. In some particular embodiments, irradiating the layer with a short wavelength polychromatic ultraviolet light source takes place in an inert atmosphere including no greater than 50 ppm oxygen. The substantially cured layer may be a release layer or a low adhesion backsize (LAB).
    Type: Application
    Filed: August 21, 2012
    Publication date: March 7, 2013
    Inventors: Robin E. Wright, Margaux B. Mitera, Richard L. Walter, Jayshree Seth, Janet A. Venne
  • Patent number: 8377634
    Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: February 19, 2013
    Assignee: Dow Corning Corporation
    Inventors: John Dean Albaugh, Gregory Scott Becker, Sina Maghsoodi, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle
  • Patent number: 8361561
    Abstract: Provided may be a method of manufacturing a silicon (Si) film by using a Si solution process. According to the method of manufacturing the Si film, the Si film may be manufactured by preparing a Si forming solution. The ultraviolet rays (UV) may be irradiated on the prepared Si forming solution. The Si forming solution may be coated on a substrate and a solvent in the Si forming solution may be coated on the substrate. An electron beam may be irradiated on the Si forming solution from which the solvent is removed.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: January 29, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-hyun Lee, Dong-joon Ma
  • Publication number: 20130017497
    Abstract: The present disclosure relates to methods and systems for synthesis of bridged-hydropentacene, hydroanthracene and hydrotetracene from the precursor compounds pentacene derivatives, tetracene derivatives, and anthracene derivatives. The invention further relates to methods and systems for forming thin films for use in electrically conductive assemblies, such as semiconductors or photovoltaic devices.
    Type: Application
    Filed: July 2, 2012
    Publication date: January 17, 2013
    Applicant: ACADEMIA SINICA
    Inventors: Tahsin J. CHOW, Chung-Chih WU, Ta-Hsien CHUANG, Hsing-Hung HSIEH, Hsin-Hui HUANG
  • Publication number: 20130011617
    Abstract: A versatile silicone resin reflective substrate which exhibits high reflectance of high luminance light from an LED light source over a wide wavelength from short wavelengths of approximately 340-500 nm, which include wavelengths from 380-400 nm near lower limit of the visible region, to longer wavelength in the infra-red region. The silicone resin reflective substrate has a reflective layer which contains a white inorganic filler powder dispersed in a three-dimensional cross linked silicone resin, the inorganic filler powder having a high reflective index than the silicone resin. The reflective layer is formed on a support body as a film, a solid, or a sheet. The silicone resin reflective substrate can be easily formed as a wiring substrate, a packaging case or the like, and can be manufactured at low cost and a high rate of production.
    Type: Application
    Filed: December 24, 2010
    Publication date: January 10, 2013
    Applicant: ASAHI RUBBER INC.
    Inventors: Masutsugu Tasaki, Naoto Igarashi, Akira Ichikawa, Tsutomu Odaki, Maimi Yoshida
  • Publication number: 20130010245
    Abstract: The present invention provides a liquid crystal display device that can prevent a decrease in the VHR and image sticking on the display screen because of residual DC voltage, and also can produce favorable alignment conditions; and a production method thereof. The liquid crystal display device of the present invention includes: a pair of substrates; a liquid crystal layer that contains liquid crystal molecules and is disposed between the pair of substrates; and an alignment film that is disposed on a liquid crystal layer side of at least one of the pair of substrates, the alignment film containing a polyamic acid or a polyimide with an imidization ratio of less than 100%, the liquid crystal display device including a monomolecular film on the alignment film.
    Type: Application
    Filed: February 24, 2011
    Publication date: January 10, 2013
    Applicant: SHARP KABUSHIKI KAISHA
    Inventors: Masanobu Mizusaki, Youhei Nakanishi, Takeshi Noma
  • Patent number: 8349911
    Abstract: Production of a composition based on silanes for the scratch-resistant, hydrophobic, aqueous coating of metals, plastics, chemical products, ceramic materials, concrete and glass.
    Type: Grant
    Filed: July 2, 2008
    Date of Patent: January 8, 2013
    Assignee: Evonik Degussa GmbH
    Inventor: Adolf Kuehnle
  • Patent number: 8304031
    Abstract: The present invention relates to a liquid crystal aligning agent containing a radiation sensitive polyorganosiloxane which is obtained by reacting at least one selected from the group consisting of a polyorganosiloxane having a recurring unit represented by the following formula (1), a hydrolysate thereof and a condensate of the hydrolysis with a cinnamic acid derivative having at least one group selected from the group consisting of a carboxyl group, a hydroxyl group, —SH, —NCO, —NHR (R is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms), —CH?CH2 and —SO2Cl: (in the formula (1), X1 is a monovalent organic group having an epoxy group, and Y1 is a hydroxyl group, an alkoxyl group having 1 to 10 carbon atoms, an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms).
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: November 6, 2012
    Assignee: JSR Corporation
    Inventors: Toshiyuki Akiike, Tsutomu Kumagai
  • Publication number: 20120276394
    Abstract: A process for producing a resin substrate having a hard coating layer on at least one side of a resin substrate, comprising, in the following order, a step of applying a hard coating composition containing an organopolysiloxane to at least one side of the resin substrate to form a coating film of the composition, and then applying a first heat treatment to the coating film to form a cured film; an irradiation step of applying a Xe2 excimer light irradiation treatment to the cured film in an atmosphere having an oxygen concentration of at most 5 vol %; and a step of applying an oxidation treatment to the cured film obtained by the irradiation step and then further applying a second heat treatment to form the hard coating layer.
    Type: Application
    Filed: July 5, 2012
    Publication date: November 1, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Kyoko Yamamoto, Takashi Shibuya
  • Patent number: 8298622
    Abstract: Methods for producing a silica aerogel coating by: producing a wet gel formed by the hydrolysis and polymerization of an alkoxysilane having an ultraviolet-polymerizable unsaturated group; organically modifying the wet gel with an organic-modifying agent to obtain an organically modified silica having a modification ratio of 10-30% based on a total amount of Si—OH in the wet gel; coating a dispersion of the organically modified silica on a substrate to form a layer; and subjecting the layer of the organically modified silica to ultraviolet irradiation and baking, wherein the silica aerogel coating includes the organically modified silica and wherein the silica aerogel coating has a refractive index in the range of 1.05-1.2.
    Type: Grant
    Filed: April 21, 2006
    Date of Patent: October 30, 2012
    Assignee: Pentax Ricoh Imaging Company, Ltd.
    Inventors: Hiroyuki Nakayama, Kazuhiro Yamada, Yasuhiro Sakai, Maki Yamada
  • Patent number: 8298456
    Abstract: The present invention relates to a silicone resin composition including a silicone resin and metal oxide fine particles dispersed therein, the silicone resin being obtained by reacting a siloxane derivative having at least one selected from the group consisting of an alkoxysilyl group and a silanol group at a molecular end thereof and having a weight-average molecular weight (Mw) as determined by a gel permeation method of 300 to 6,000, with silica fine particles having silanol groups on a surface thereof.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: October 30, 2012
    Assignee: Nitto Denko Corporation
    Inventor: Keisuke Hirano
  • Patent number: 8277903
    Abstract: The present disclosure relates to methods and systems for synthesis of bridged-hydropentacene, hydroanthracene and hydrotetracene from the precursor compounds pentacene derivatives, tetracene derivatives, and anthracene derivatives. The invention further relates to are methods and systems for forming thin films for use in electrically conductive assemblies, such as semiconductors or photovoltaic devices.
    Type: Grant
    Filed: March 2, 2009
    Date of Patent: October 2, 2012
    Assignee: Academia Sinica
    Inventors: Tahsin J. Chow, Chung-Chih Wu, Ta-Hsien Chuang, Hsing-Hung Hsieh, Hsin-Hui Huang
  • Patent number: 8268403
    Abstract: A method of forming an organic silica film includes forming a coating including a silicon compound having an —Si—O—Si— structure and an —Si—CH2—Si— structure on a substrate, heating the coating, and curing the coating by applying ultraviolet radiation.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: September 18, 2012
    Assignee: JSR Corporation
    Inventors: Masahiro Akiyama, Hisashi Nakagawa, Tatsuya Yamanaka, Atsushi Shiota, Takahiko Kurosawa
  • Publication number: 20120219804
    Abstract: A layered body (1) is provided in which a first layer (3) is deposited at one side on at least one surface of a resin substrate (2), a second layer (4) is deposited on the other side of the first layer (3) opposite to the one side thereof at which the first layer (3) is deposited on the resin substrate (2), the first layer (3) is a first organic-inorganic hybrid layer containing a (meth)acrylic resin and a silane compound, and the second layer (4) is a second organic-inorganic hybrid layer obtained by curing a composition made of a solution obtained by hydrolysis and condensation using a composition which contains a silane compound (A) containing at least one epoxy group and represented by the following Formula (1), an aluminum alkoxide (B) represented by the following Formula (2) and a tetrafunctional silane compound (C) represented by the following Formula (3): Si(R1)p(OR2)4-p??Formula (1); Al(OR3)3??Formula (2); and Si(OR4)4??Formula (3).
    Type: Application
    Filed: February 28, 2011
    Publication date: August 30, 2012
    Inventors: Kazuho Uchida, Tsutomu Ando, Daisuke Nakajima, Jiong Liu, Ken Eberts
  • Publication number: 20120214003
    Abstract: This invention relates to a process for applying a shatterproof coating to the surface of a glass item, comprising the following steps: (a) applying, on at least one portion of the surface of a glass item, a polymerisable composition comprising (i) a resin selected from the group consisting of polyurethane resins, polyester resins, acrylic resins, silicone resins and/or their mixes, in water or in an organic solvent; (ii) an adhesion promoter based on an organosilane compound; (iii) possibly a UV photo-initiator; (b) evaporating the water or the organic solvent; (c) polymerising said composition, forming on the glass item a shatterproof coating film capable of containing the dispersion of the glass fragments that may form in the event of the breakage of the item. The process also preferably comprises a step for the application of an additional anti-wear coating film on top of the shatterproof coating.
    Type: Application
    Filed: February 16, 2012
    Publication date: August 23, 2012
    Applicant: BORMIOLI LUIGI S.P.A.
    Inventor: Simone Baratta
  • Patent number: 8247037
    Abstract: A coating for metals containing a polysilazane solution or a mixture of polysilazanes of the general formula (I) —(SiR?R?-NR??)n—??(1) wherein R?, R? and R?? are identical or different and independently represent hydrogen or an optionally substituted alkyl, aryl, vinyl or (trialkoxysilyl)alkyl radical, wherein n is a whole number and n is dimensioned in such a way that the polysilazane has a number-average molecular weight of 150 to 150 000 g/mol, in a solvent and at least one catalyst. The invention also relates to a method for the production of the coating.
    Type: Grant
    Filed: October 25, 2005
    Date of Patent: August 21, 2012
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.L.
    Inventors: Stefan Brand, Andreas Dierdorf, Hubert Liebe, Andreas Wacker
  • Publication number: 20120183784
    Abstract: Described is a UV-curable sealant composition, which is preferably a one part sealant. The one part sealant is made from urethane acrylate, acrylate ester, precipitated silica, and photoinitiator. More specifically, the one part sealant is made from about 15-35 weight percent aliphatic and/or alicyclic urethane acrylates, about 40-70 weight percent of acrylate esters, about 0-10 weight percent of precipitated silica, and about 3-8 weight percent of photoinitiator. Also described are methods of applying UV-curable sealant composition to a surface such as a floor and UV curing the UV-curable sealant composition, thereby extending the life of the surface.
    Type: Application
    Filed: July 28, 2009
    Publication date: July 19, 2012
    Applicant: PHOTOKINETIC COATINGS & ADHESIVES, LLC
    Inventor: Geoffrey Russell
  • Patent number: 8221878
    Abstract: A photocurable coating composition is provided comprising (1) porous or hollow inorganic oxide fine particles, (2) a hydrolytic condensate of a bissilane compound or a cohydrolytic condensate of a bissilane compound and another hydrolyzable organosilicon compound, and (3) a photoacid generator. Due to the presence of voids in the resin, the cured coating has a low refractive index.
    Type: Grant
    Filed: February 5, 2010
    Date of Patent: July 17, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Yoshikawa, Kazuharu Sato
  • Publication number: 20120147323
    Abstract: Described are methods for covalently attaching one or more functional compounds to an ophthalmic lens. The method involves (a) contacting the lens with a functional compound, wherein the functional compound comprises at least one group capable of forming a covalent bond with the lens upon exposing the lens to irradiation and/or heat; and (b) irradiating and/or heating the lens produced in step (a) to covalently attach the functional compound to the lens. Also described herein are ophthalmic lens produced by the methods described herein.
    Type: Application
    Filed: December 13, 2011
    Publication date: June 14, 2012
    Inventor: Angelika Maria Domschke
  • Publication number: 20120114869
    Abstract: Disclosed is a film-forming method wherein a manganese-containing film is formed on a substrate having a surface to which an insulating film and a copper wiring line are exposed. The film-forming method includes forming a manganese-containing film on the copper wiring line by a CVD method which uses a manganese compound.
    Type: Application
    Filed: January 13, 2012
    Publication date: May 10, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidenori MIYOSHI, Masamichi Hara