Abstract: A method of producing a structural member having Prussian blue-type metal complex nanoparticles, the method including: constructing the structural member stabilized by a particular process in producing the structural member by providing nanoparticles consisting of Prussian blue-type metal complex onto a substrate; and a structural member having Prussian blue-type metal complex nanoparticles, the structural member having water-dispersible nanoparticles consisting of Prussian blue-type metal complex provided on a substrate and the structural member being stabilized in water by a particular process.

Abstract: The present invention provides a method of coating at least one surface of a substrate comprising the step of applying a coating comprising fibres onto the at least one surface of the substrate, wherein upon application of the coating on the at least one surface of the substrate, the surface exhibits hydrophilicity or greater hydrophilicity compared to an uncoated surface. The present invention also provides a coating for coating at least one surface of a substrate, wherein the coating comprises fibres, and wherein a surface coated with the coating exhibits hydrophilicity or greater hydrophilicity compared to an uncoated surface. The anti-wetting coating may have a high degree of transparency.

Abstract: A sublimation printing apparatus (1) which includes a tray (2) for receiving a three dimensional object (10) having a film (12) carrying sublimable ink, an infrared heater (3) mounted adjacent the tray (2) and a airflow inducing device (4). The infrared heater (3) is operable to direct infrared radiation toward the tray (2). The airflow inducing device (4) is operable to induce a flow of air across the film (12).

Abstract: A device for fabricating thin films on a substrate includes a vacuum chamber, a rotatable platen configured to hold one or more substrates within the vacuum chamber, and a housing disposed within the vacuum chamber. The housing contains a heating element and is configured to enclose an upper surface of the platen and a lower portion configured to partially enclose an underside surface of the platen which forms a reaction zone. A heated evaporation cell is operatively coupled to the lower portion of the housing and configured to deliver a pressurized metallic reactant to the reaction zone. The device includes a deposition zone disposed in the vacuum chamber and isolated from the reaction zone and is configured to deposit a deposition species to the exposed underside of the substrates when the substrates are not contained in the reaction zone.

Abstract: The invention includes the structure of a multilayer protective coating, which may have, among other properties, scratch resistance, UV absorption, and an effective refractive index matched to a polymer substrate such as polycarbonate. Each layer may contain multiple components consisting of organic and inorganic materials. The multilayer protective coating includes interleaved organic layers and inorganic layers. The organic layers may have 20% or more organic compounds such as SiOxCyHz. The inorganic layers may have 80% or more inorganic materials, such as SiO2, SiOxNy, and ZnO, or mixtures thereof. Each layer of the multilayer protective coating is a micro layer and may have a thickness of 5 angstroms or less in various embodiments. The multilayer protective coating may contain in the order of hundreds or thousands of micro layers, depending upon the design requirement of applications. In each micro layer, the components may have substantially continuous variations in concentration.

Abstract: The invention utilizes a metal halide generating reactor that permits the temperature of the generation of a metal halide from a gaseous halide compound, a halogen gas, or an interhalogen compound at controlled temperatures distinctly different from controlled temperatures of a deposition furnace where metal layers are deposited by CVD processes upon substrates. The method may be further expanded to provide additional layers or reactions on the surface of the substrates with secondary reactions between reactive gases or between species of a metal halide different from the first deposition. Metal halide gases may for example be generated at successive temperatures and with successive different halogen gases or compounds.

Abstract: A method includes forming ionic clusters of carbon-containing molecules, which molecules have carbon-carbon sp2 bonds, and accelerating the clusters. A surface of a substrate is irradiated with the clusters. A material is formed on the surface using the carbon from the molecules. The material includes carbon and may optionally include hydrogen. The material may include graphene. The material may form a monolayer. The molecules may include one or more material selected from the group consisting of graphene, carbon allotropes, ethylene, and hydrocarbon molecules containing ethylenic moieties. A fused region may be formed in the substrate as an interface between the substrate and the material. The clusters may have diameters of at least 20 nanometers and may be accelerated to an energy of at least 0.5 keV.

Abstract: A system for depositing two or more materials on a substrate is provided. The system comprises one or more susceptors configured to define two or more recesses for accommodating at least a first material and a second material respectively. The first and second materials are different. The system further comprises one or more heaters for heating the first material and the second material for sublimation of the first and second materials for deposition on the substrate. A method for depositing two or more materials on a substrate is also presented.

Abstract: Disclosed is a paste pattern formation method comprising the steps of: forming a transfer pattern material on a film base material to prepare a transfer film; sticking the transfer film on a substrate on which a transfer pattern is formed so that the transfer pattern material contacts the substrate; separating the film base material from the transfer pattern material; filling a paste into the transfer pattern depression; solidifying the paste; and removing the transfer pattern material.

Abstract: A method produces a hardened galvanization of a continuously-running rolled steel strip. The strip is immersed in a coating tank containing a bath of a liquid metal mixture, e.g. zinc and aluminum, to be deposited on the strip, and permanently circulated between the coating tank and a preparation device. The temperature of the liquid mixture is deliberately lowered in order to reduce the iron solubility threshold and sufficiently high for initiating, in the preparation device, the fusion of at least one Zn—Al ingot in an amount necessary for compensating for the liquid mixture used for deposition on the strip. The device is implemented so that the circuit for circulating the liquid mixture is thermally optimized.

Abstract: The invention provides a method for applying a material onto a substrate using a droplet printing technique wherein a gas stream is released into the direction of a substrate, which gas stream comprises a carrier gas and droplets of a suspension of the material or droplets of a solution of a precursor of the material or droplets of a precursor of the material as such, whereby the droplets in the gas stream are first maintained in a steady flow and subsequently in a converging flow before the droplets are contacted with the substrate. The invention further provides an apparatus for carrying out said method.

Abstract: A method includes forming ionic clusters of carbon-containing molecules, which molecules have carbon-carbon sp2 bonds, and accelerating the clusters. A surface of a substrate is irradiated with the clusters. A material is formed on the surface using the carbon from the molecules. The material includes carbon and may optionally include hydrogen. The material may include graphene. The material may form a monolayer. The molecules may include one or more material selected from the group consisting of graphene, carbon allotropes, ethylene, and hydrocarbon molecules containing ethylenic moieties. A fused region may be formed in the substrate as an interface between the substrate and the material. The clusters may have diameters of at least 20 nanometer s and may be accelerated to an energy of at least 0.5 keV.

Abstract: The invention relates to a method and a device for the coating of running substrates (25) moving along a run direction through a treatment zone (6), in which the vapour of a coating material is generated in a chamber (5), this vapour passing through a treatment aperture towards the treatment zone (6) where the coating material condenses on the surface of the substrates (25). The vapour flow through the treatment aperture is controlled by adjusting the extent to which the treatment aperture is shut off by at least one shutter (13), between an open position, in which said vapour flows through the treatment aperture towards the treatment zone (6), and a closed position, in which the vapour is prevented from flowing towards the treatment zone (6) through the treatment aperture.

Abstract: The invention is directed to a method for preparing a deposition on a substrate and to a method for manufacturing an electronic or optoelectronic device. The method of the invention comprises —providing an anode comprising electrolytically ionisable material and a cathode both in contact with an electrically conductive liquid, comprising anions capable of forming a molecule with the electrolytically ionised material; —electrolytically oxidising the ionisable material under formation of cations that dissolve in the liquid; —evaporating the molecules formed from the cations and the anions from the liquid; and —depositing the molecules on the substrate.

Abstract: A deposition method of fine particles, includes the steps of irradiating a fine particle beam formed by size-classified fine particles to an irradiated subject under a vacuum state, and depositing the fine particles on a bottom part of a groove structure formed at the irradiated subject.

Abstract: The present invention fundamentally differs from conventional methods in which an external force is directly applied to a surface of an article to be modified, and relates to a method of hydrophobilization (increasing a contact angle of water) which comprises bringing a hydrophobilization substance (a substance for increasing a contact angle of water) released from a material of another location into contact with a surface of an article, especially an article surface being hydrophilic (having a small contact angle of water) in its initial state without applying an external force on the article surface, further a method of control being capable of noncontact switching of a contact angle of water, which comprises conducting hydrophilization of an article surface subjected to hydrophobilization by the above-mentioned method in a noncontact manner and repeating these hydrophobilization and hydrophilization, and a method of pattern formation using the mentioned methods.

Abstract: The present invention relates to inks for silk-screen printing technique, as well as the corresponding printing technique, designed to bestow upon the reproduction obtained by means of the use of said inks on an appropriate substrate, preferably of a paper type, a particular feel, preferably a particular roughness or coarseness. In particular, the present invention relates to an ink for silk-screen printing of catalogues or advertising leaflets for products designed for decorative wall coatings that will reproduce also the feel of the final decoration applied on the wall substrate.

Abstract: The present invention provides a film forming method and a film forming apparatus each of which is capable of forming films at low cost. The film forming method of the present invention includes the steps of (i) melting a solid material 51 of a thin film to prepare a melted liquid, solidifying the melted liquid 51a to form a rod-shaped body 51b, and pulling out the rod-shaped body 51b, (ii) melting and supplying a part of the rod-shaped body 51b to a melted liquid (evaporation source) 51d, and (iii) using the melted liquid (evaporation source) 51d to form the thin film. The steps (i), (ii), and (iii) are carried out in vacuum.

Abstract: A method for producing a metallized image on a sheet material includes impregnating the material with a metal salts-containing solution and exposing the specified material points to a pulse laser radiation. The interaction of the pulses with the solution within a laser spot irritates a photochemical reaction resulting in a metal ion reduction into the elementary state thereof by associating the required number of electrons and deposition of metallic film which is firmly fixed to the filler of the sheet material in the laser spot area on the material surface. In case of sufficient laser radiation power, a recess is formed on the sheet material surface, and the metallic film is deposited on the bottom of the recess.

Abstract: An apparatus for manufacturing carbon nano tubes of an aspect of the present invention including an introducing unit commonly introducing a first carbon nano tube having first magnetic characteristics and a second carbon nano tube having second magnetic characteristics different from the first magnetic characteristics, first and second collecting units collecting the first and second carbon nano tubes, respectively, a transport unit transporting the first and second carbon nano tubes from the introducing unit to the first and second collecting units, and at least one of a magnetic field generating unit which is provided adjacent to the transport unit and applies a magnetic field to the first and second carbon nano tubes, wherein the first carbon nano tube and the second carbon nano tube are sorted by the magnetic field generating unit.

Abstract: Precursor compositions in the form of a tape that can be transferred to a substrate and converted to an electronic feature at a relatively low temperature, such as not greater than about 200° C. The tape composition can be disposed on a carrier to form a ribbon structure that is flexible and can be handled in a variety of industrial processes.

Abstract: A piezo-electric film forming method includes (1) a first moving step of moving a nozzle with respect to a substrate along a first direction to form a first piezo-electric band extending along the first direction, (2) a measuring step of measuring thickness distribution along the width of the first piezo-electric band, (3) a calculating step of calculating a shifting distance based on the thickness distribution, (4) a shifting step of moving the nozzle with respect to the substrate along a second direction by the calculated shifting distance, wherein the second direction intersects with the first direction, and (5) a second moving step of moving the nozzle with respect to the substrate along the first direction to form a second piezo-electric band extending along the first direction. The piezo-electric film is formed such that the first piezo-electric band and the second piezo-electric band are overlapped.

Abstract: The present invention provides a method of forming a nanostructured surface (NSS) on a polymer electrolyte membrane (PEM) of a membrane electrode assembly (MEA) for a fuel cell, in which a nanostructured surface is suitably formed on a polymer electrolyte membrane by plasma treatment by plasma-assisted chemical vapor deposition (PACVD), where catalyst particles or a catalyst layer are directly deposited on the surface of the polymer electrolyte membrane having the nanostructured surface.

Abstract: A method of making a layered component with an improved surface finish by a shape metal deposition process is provided. The method comprises the steps of discriminating a first set of vectors on an exterior portion of the component from a second set of vectors on an interior portion of the component, and depositing a layer of metal material based on the vectors discriminated at different rates, wherein the material is deposited on the exterior portion at a high resolution and a slow rate, and the material is deposited on the interior portion at a low resolution and a fast rate.

Abstract: A method of forming a coating on a powdered substrate, which method comprises introducing an atomized liquid and/or solid coating forming material and separately transporting a powdered substrate to be coated into an atmospheric plasma discharge and/or an ionized gas stream resulting therefrom, and exposing the powdered substrate to the atomized liquid and/or solid coating forming material.

Abstract: The invention is directed to a method for depositing particles on a substrate and to a fibrous web comprising deposited particles. A method is provided according to which particles are provided on a surface activated substrate by means of a plasma treatment. The method comprises the subsequent steps of -providing particles, preferably coating said particles; -subjecting said particles to a first plasma treatment before being deposited on said substrate; and -depositing said particles on said surface of said substrate, preferably using a second plasma treatment.

Abstract: A polymeric light-emitting diode (PLED) and methods of making same. In one embodiment, the PLED comprises a substrate, a layer of a first conductive material formed on a surface of the substrate, a layer of a conductive polymeric material deposited on the layer of the first conductive material, a layer of a luminescent polymeric material deposited on the layer of the conductive polymeric material, and a layer of a second conductive material formed on the layer of the luminescent polymeric material, wherein at least one of the layer of the conductive polymeric material and the layer of the luminescent polymeric material is deposited by the laser vapor deposition (LVD).

Abstract: Provided is a method for controlling a carbon nanowall (CNW) structure having improved corrosion resistance against high potential by varying the spacing between the carbon nanowall (CNW) walls so that its surface area and crystallinity are controlled. Also provided is a carbon nanowall (CNW) with a high surface arca and a carbon nanowall (CNW) with a high crystallinity, both of which have a controlled structure. According to the present invention, provided are: (1) a carbon nanowall, characterized by having a wall surface area of 50 cm2/cm2-substrate·?m or more; (2) a carbon nanowall, characterized by having a crystallinity such that the D band half value width in the Raman spectrum measured with an irradiation laser wavelength of 514.5 nm is 85 cm?1 or less: and (3) a carbon nanowall, characterized by having not only a wall surface area of 50 cm2/cm2-substrate·?m or more but also a crystallinity such that the D-band half value width in the Raman spectrum measured with an irradiation laser wavelength of 14.

Abstract: It has been discovered that a parasitic plasma problem which has existed with respect to incoming plasma source gases present in a source gas feed line to a plasma processing chamber can be avoided. The stability of a parasitic plasma is avoided by installing an RF resistor conduit in the source gas feed line and increasing the pressure in the RF resistor conduit through which the plasma source gases flow. Use of a variable surface restrictor in the RF resistor conduit or between the RF resistor conduit and the plasma processing chamber enables not only avoidance of the formation of a parasitic plasma in incoming plasma source gases, but also easier cleaning of the processing chamber plasma generation system when a remotely generated plasma is used for such cleaning.

Abstract: An object is to provide a deposition method of forming a film in a minute pattern on a deposition target substrate as well as reducing waste of material and increasing material use efficiency. Another object is to manufacture a high-definition light-emitting device at low cost by such a deposition method. Particles containing an organic compound material are dispersed over a deposition substrate having a light-absorbing layer formed over the deposition substrate and are fixed by heat treatment to form a material layer. The light-absorbing layer is irradiated with light which is transmitted through the deposition substrate, so that a material contained in the material layer is selectively deposited onto a deposition target substrate placed facing the deposition substrate. By selective formation of the light-absorbing layer, a film can be selectively deposited in a minute pattern reflecting a pattern of the light-absorbing layer onto the deposition target substrate.

Abstract: There is provided a recording ink containing: solid constituents, which contain a colorant and a resin, and stay solid in the ink having a temperature of 25° C.; liquid constituents, which have a higher boiling point than a boiling point of water, and stay liquid in the ink having a temperature of 25° C.; and water, wherein a total amount of the solid constituents in the recording ink is in the range of 2.0% by mass or more to less than 20% by mass, wherein a ratio A/B of a total amount of the liquid constituents in the recording ink A to the total amount of the solid constituents in the recording ink B is from 0.70 to 1.75, and wherein the viscosity of the recording ink at 25° C. is 10 mPa s or less.

Abstract: A film forming apparatus for forming a film according to an AD method in which separation of the film or generation of hillocks is suppressed when the film formed on a substrate is heat-treated. The apparatus includes: an aerosol generating unit (1-4) for dispersing raw material powder (20) with a gas, thereby aerosolizing the raw material powder (20); a processing unit (6) for processing the raw material powder (20) aerosolized by the aerosol generating unit (1-4) to reduce an amount of impurity, which generates a gas by being heated, adhering to or contained in the raw material powder (20); and an injection nozzle (9) for spraying the aerosolized raw material powder (20) processed by the processing unit (6) toward a substrate (30) to deposit the raw material powder (20) on the substrate (30).

Abstract: A method for producing composite, shelled, alloy and compound nanoparticles as well as nanostructured films of composite, shelled, alloy and compound nanoparticles by using laser ablation of microparticles is disclosed.

Abstract: A method for making a piezoelectric element including a piezoelectric film formed on a substrate by a gas deposition technique includes the steps of ejecting ultra-fine particles of a piezoelectric material having a perovskite structure from an ejecting device toward the substrate, and applying an electric field to the ultra-fine particles traveling to the substrate. The substrate may be composed of a metal or a resin.

Abstract: A method includes forming ionic clusters of carbon-containing molecules, which molecules have carbon-carbon sp2 bonds, and accelerating the clusters. A surface of a substrate is irradiated with the clusters. A material is formed on the surface using the carbon from the molecules. The material includes carbon and may optionally include hydrogen. The material may include graphene. The material may form a monolayer. The molecules may include one or more material selected from the group consisting of graphene, carbon allotropes, ethylene, and hydrocarbon molecules containing ethylenic moieties. A fused region may be formed in the substrate as an interface between the substrate and the material. The clusters may have diameters of at least 20 nanometer s and may be accelerated to an energy of at least 0.5 keV.

Abstract: The invention relates to a method for producing a layer (110) having nanoparticles (40), on a substrate (100). The invention is based on the object of specifying a method for producing a layer containing nanoparticles, which method can be carried out particularly easily and nevertheless offers a very wide degree of freedom for the configuration and the composition of the layer to be produced. According to the invention, this object is achieved in that nanoparticles (40) are released and a nanoparticle stream (50) is produced in a first process chamber (10), the nanoparticle stream (50) is passed into a second process chamber (80), and the nanoparticles (40) are deposited on the substrate (100) in the second process chamber (80).

Abstract: An apparatus is provided for applying a construction material, the apparatus having construction and an infrared heat emitter for providing infrared heat on the construction material. The construction material can be a roll of roofing material, which can be a roll of modified asphalt/bitumen roofing membrane material. The infrared emitter can be gas powered or electric powered. A method of applying a roofing membrane is also provided, where construction material is heated using infrared heat and applied onto a rooftop or other suitable surface.

Abstract: A process for the preparation of organic material comprising an organic substrate and at least one dielectric layer consisting of one or more oxides of a metal selected from groups 3 to 15 of the periodic table, which comprises the steps of: (a) suspending the organic material in an aqueous solution of fluorine scavenger; (b) adding an aqueous solution of one or more fluorine containing metal complexes which are the precursors of the desired metal oxide coating; and (c) subjecting said suspension to microwave radiation to deposit the metal oxide onto said organic material, wherein steps (b) and (c) can optionally be repeated using different fluorine containing metal complexes to produce one or more metal oxide layers. The substrate can be optionally dissolved with solvent to yield free metal oxide or mixed metal oxides that have a plane-parallel structure.

Abstract: The invention relates to a method for coating a support plate for carrying out functional tests on biological cells, to a support plate for carrying out functional tests on biological cells and to the use of corresponding support plates for carrying out functional tests on biological cells.

Abstract: A superconducting article and a method of making a superconducting article is described. The method of forming a superconducting article includes providing a substrate, forming a buffer layer to overlie the substrate, the buffer layer including a first buffer film deposited in the presence of an ion beam assist source and having a uniaxial crystal texture. The method further includes forming a superconducting layer to overlie the buffer layer.

Abstract: Methods and apparatus for controlling and delivering a vaporous element or compound, for example, selenium or sulfur, from a solid source to a work piece are provided. The methods and apparatus may be used in photovoltaic cell manufacturing. The apparatus may comprise a treatment chamber, for example, a box furnace or a tube furnace. The chamber may include an inner enclosure, an outer enclosure, and heating sources capable of independent thermal control, for example, in compliance with a predetermined heating schedule. The apparatus include devices and mechanisms for isolating the treatment chambers from the ambient environment. The methods and apparatus may be adapted to control metalloid vapor delivery in photovoltaic cell processing, for example, the processing of CIGS and CIGSS photovoltaic cells.

Abstract: A method of forming MgB2 films in-situ on a substrate includes the steps of (a) depositing boron onto a surface of the substrate in a deposition zone; (b) moving the substrate into a reaction zone containing pressurized, gaseous magnesium; (c) moving the substrate back into the deposition zone; and (d) repeating steps (a)-(c). In a preferred embodiment of the invention, the substrate is moved into and out of the deposition zone and the reaction zone using a rotatable platen.

Abstract: A composite structure forming method comprises the steps of first pre-treating brittle material fine particles to impart an internal strain to the brittle material fine particles, secondly causing the brittle material fine particles in which the internal strain has been created to collide with a substrate surface at high speed or applying a mechanical impact force to the brittle material fine particles containing the internal strain therein provided on the substrate surface, to deform or fracture the brittle material fine particles, re-joining the fine particles through active new surfaces generated by the deformation or fracture, forming an anchor section made of polycrystalline brittle material of which part bites into the substrate surface at a boundary section between the new surfaces and the substrate, and further forming a structure made of polycrystalline brittle material on the anchor section.

Abstract: To provide a film forming method and a film forming system, which efficiently use materials and forming a high-quality organic thin film, and an electronic device and an electronic apparatus that are manufactured using the method and the device, an organic thin film-forming system includes a solution supplying unit, a gas supplying unit, a soft ionizing unit, and an ion separating unit, a deflecting unit, and a film-forming unit. After organic materials to be converted in film become minute liquid droplets in the soft ionizing unit and the liquid droplets are ionized or charged, the liquid droplets are vaporized and thus pseudo-molecular ions of a vapor state are created. In the ion separating unit, an organic material pseudo-molecular ion is separated from the pseudo-molecular ions.

Abstract: The present invention provides a vapor deposition system for a film forming systems that promote an efficiency of utilizing an EL material and is excellent in uniformity or throughput of forming an EL layer and a vapor deposition method. According to the present invention, vapor deposition is carried out in a deposition chamber by moving an evaporation source holder 903 on which six containers 911 filled with an evaporation material are set at a certain pitch with respect to the substrate. The evaporation holder 903 is transported from an installation chamber 905 by a transport mechanism 902b. A heater is provided in a turntable 907. Throughput can be improved by heating the evaporation holder 903 in advance of transporting containers into the evaporation holder 903.

Abstract: An MgO protective layer formed on a front substrate of a plasma display panel and a method of manufacturing the protective layer are disclosed. The protective layer is manufactured by using an MgO pellet, which is simultaneously doped with a first doping material of BeO and/or CaO among alkali earth metals and a second material selected from the group consisting of Sc2O3, Sb2O3, Er2O3, Mo2O3, and Al2O3, as a deposition source through a vacuum deposition method. The protective layer remarkably improves a discharge efficiency of the PDP and shortens a discharge delay time, so that it is applied to a signal can PDP. Also, it lowers a manufacturing cost by reducing the number of electronic components.

Abstract: The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. This is accomplished by 1) providing a non-thermal or non-pyrolytic means of triggering the deposition reaction; 2) providing a means of depositing a purer film of higher density at lower temperatures; and, 3) providing a faster and more efficient means of modulating the deposition sequence and hence the overall process rate resulting in an improved deposition method.

Abstract: The invention includes methods of forming a metallic coating on a substrate which contains silicon. A metallic glass layer is formed over a silicon surface of the substrate. The invention includes methods of protecting a silicon substrate. The substrate is provided within a deposition chamber along with a deposition target. Material from the deposition target is deposited over at least a portion of the silicon substrate to form a protective layer or structure which contains metallic glass. The metallic glass comprises iron and one or more of B, Si, P and C. The invention includes structures which have a substrate containing silicon and a metallic layer over the substrate. The metallic layer contains less than or equal to about 2 weight % carbon and has a hardness of at least 9.2 GPa. The metallic layer can have an amorphous microstructure or can be devitrified to have a nanocrystalline microstructure.

Abstract: The invention relates to a method for coating a substrate with a layer of a material, such as a metal, in which a quantity of electrically conductive material is vaporized in a space with a low background pressure and energy is supplied to the material which is to be vaporized in order to vaporize this material. According to the invention, the material which is to be vaporized, while it is being vaporized, is kept floating, without support, in the space and is enclosed in an alternating electromagnetic field, the alternating electromagnetic field being generated with the aid of a high-frequency alternating current. The invention also relates to a device for coating a substrate and to a substrate.

Abstract: A Ti-based coating may have embedded defects. The defects may impart one or more structural weakness to the coating and coated part. The coating is subjected to a burnishing process to impart a residual compressive stress to mitigate one or more of these structural weaknesses.