Structurally Defined Patents (Class 430/11)
  • Publication number: 20010031427
    Abstract: A photopolymerizable composition for use in forming a photopolymer composition for use in forming the light transmissive regions of light transmissive devices, and such devices.
    Type: Application
    Filed: March 27, 2001
    Publication date: October 18, 2001
    Inventors: Chengjiu Wu, Michael J. McFarland, Karl W. Beeson
  • Publication number: 20010025061
    Abstract: A photopolymerizable composition for use in forming a photopolymer composition for use in forming the light transmissive regions of light transmissive devices, and such devices.
    Type: Application
    Filed: March 27, 2001
    Publication date: September 27, 2001
    Inventors: Chengjiu Wu, Michael J. McFarland, Karl W. Beeson
  • Patent number: 6270932
    Abstract: An exposed film package for preserving one strip of exposed photographic film includes a film sheath, which has plural pockets. Plural film pieces are formed by cutting the one strip of the exposed film, and contained respectively in the pockets in the film sheath. An index photograph is constituted of photographic paper, on which positive images of frames from the one strip of the exposed film are printed. The photographic paper has a size substantially equal to the film pieces. The positive images are formed in reducing a size of the frames, and grouped in association with the film pieces. Groups of the positive images are arranged in consideration of an order of exposure of the frames. The index photograph is contained in one of the pockets in association with the film pieces constituting the one strip.
    Type: Grant
    Filed: January 16, 2001
    Date of Patent: August 7, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Setsuji Tatsumi, Kazuhiro Tagawa, Toru Kurokawa, Katsumi Otake, Masashi Horiguchi, Toru Tsuji
  • Patent number: 6270935
    Abstract: An exposed film package for preserving one strip of exposed photographic film includes a film sheath, which has plural pockets. Plural film pieces are formed by cutting the one strip of the exposed film, and contained respectively in the pockets in the film sheath. An index photograph is constituted of photographic paper, on which positive images of frames from the one strip of the exposed film are printed. The photographic paper has a size substantially equal to the film pieces. The positive images are formed in reducing a size of the frames, and grouped in association with the film pieces. Groups of the positive images are arranged in consideration of an order of exposure of the frames. The index photograph is contained in one of the pockets in association with the film pieces constituting the one strip.
    Type: Grant
    Filed: January 16, 2001
    Date of Patent: August 7, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Setsuji Tatsumi, Kazuhiro Tagawa, Toru Kurokawa, Katsumi Otake, Masashi Horiguchi, Toru Tsuji
  • Patent number: 6270931
    Abstract: A method of exposing an integral imaging element having: an integral lens sheet with opposed front and back surfaces; a light sensitive layer positioned behind the back surface; and an anti-halation layer between the light sensitive layer and the back surface; the method comprising the steps of: simultaneously exposing a major portion of the area of the light sensitive layer with light from behind the light sensitive layer, or simultaneously exposing the light sensitive layer to all of an integral image from behind the light sensitive layer.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: August 7, 2001
    Assignee: Eastman Kodak Company
    Inventor: Roger Roy Morton
  • Patent number: 6251549
    Abstract: The fine dark features in the images projected from strong phase-shifting masks used for microdevice lithography are accompanied by 180° shifts in the optical phase, produced by a topography pattern distinct from the pattern of apertures that define the bright features. A generic topography pattern can be formed on the substrate underlying a continuous opaque mask layer which subsequently is patterned with a device-specific array of apertures. When the image projected from a phase-shifting mask comprised of the generic topography pattern and the device-specific aperture pattern is combined with a device-specific image projected from an associated conventional photomask, the photoresist pattern that results corresponds to desired device layers with the imaging advantages of strong phase-shifting masks, but without the need for specific patterning of the topography pattern.
    Type: Grant
    Filed: October 28, 1999
    Date of Patent: June 26, 2001
    Inventor: Marc David Levenson
  • Patent number: 6242142
    Abstract: The invention relates to a photographic element comprising a translucent base and a color forming layer comprising at least one silver halide emulsion layer and dye forming coupler, wherein said base comprises at least one polymer sheet comprising a transparent polymer sheet containing voids, with the proviso that said translucent sheet is substantially free of white light reflecting pigments and wherein said translucent sheet has a light transmission of between 15% and 85%.
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: June 5, 2001
    Assignee: Eastman Kodak Company
    Inventors: Alphonse D. Camp, Peter T. Aylward, Robert P. Bourdelais
  • Publication number: 20010001695
    Abstract: An exposed film package for preserving one strip of exposed photographic film includes a film sheath, which has plural pockets. Plural film pieces are formed by cutting the one strip of the exposed film, and contained respectively in the pockets in the film sheath. An index photograph is constituted of photographic paper, on which positive images of frames from the one strip of the exposed film are printed. The photographic paper has a size substantially equal to the film pieces. The positive images are formed in reducing a size of the frames, and grouped in association with the film pieces. Groups of the positive images are arranged in consideration of an order of exposure of the frames. The index photograph is contained in one of the pockets in association with the film pieces constituting the one strip.
    Type: Application
    Filed: January 16, 2001
    Publication date: May 24, 2001
    Inventors: Setsuji Tatsumi, Kazuhiro Tagawa, Toru Kurokawa, Katsumi Otake, Masashi Horiguchi, Toru Tsuji
  • Publication number: 20010001289
    Abstract: An exposed film package for preserving one strip of exposed photographic film includes a film sheath, which has plural pockets. Plural film pieces are formed by cutting the one strip of the exposed film, and contained respectively in the pockets in the film sheath. An index photograph is constituted of photographic paper, on which positive images of frames from the one strip of the exposed film are printed. The photographic paper has a size substantially equal to the film pieces. The positive images are formed in reducing a size of the frames, and grouped in association with the film pieces. Groups of the positive images are arranged in consideration of an order of exposure of the frames. The index photograph is contained in one of the pockets in association with the film pieces constituting the one strip.
    Type: Application
    Filed: January 16, 2001
    Publication date: May 17, 2001
    Inventors: Setsuji Tatsumi, Kazuhiro Tagawa, Toru Kurokawa, Katsumi Otake, Masashi Horiguchi, Toru Tsuji
  • Patent number: 6232033
    Abstract: A paper emulsion film product and method for producing the same is shown. The film product includes a first layer of editing tape, a second layer of editing tape, and a layer of paper emulsion formed from a paper reproduction of a photograph sandwiched between the respective layers of editing tape.
    Type: Grant
    Filed: June 12, 1991
    Date of Patent: May 15, 2001
    Inventor: Donna Cameron
  • Patent number: 6218059
    Abstract: This invention relates to a photographic element comprising at least one photosensitive layer, and a base material comprising an upper and lower biaxially oriented polymer sheet separated by a paper sheet, wherein said base material has a thickness of greater than 254 micrometers, a stiffness of greater than 325 millinewtons in any direction, and an upper surface roughness of less than 0.45 micrometers at a spatial frequency of between 0.30 and 6.35 millimeters, and a transmission percent of less than 15 percent.
    Type: Grant
    Filed: December 22, 1999
    Date of Patent: April 17, 2001
    Assignee: Eastman Kodak Company
    Inventors: Peter T. Aylward, Robert P. Bourdelais, Alphonse D. Camp
  • Patent number: 6210844
    Abstract: Element for laminating on color proofs, comprising a strippable support film A and a transparent, photoinsensitive protective layer B, containing at least one polymer having a melting point Tm of ≧50° C. and a glass transition temperature Tg of ≦0° C.
    Type: Grant
    Filed: June 16, 1999
    Date of Patent: April 3, 2001
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Manfred Adelhard Josef Sondergeld
  • Patent number: 6207330
    Abstract: Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser beam and is selectively etched when exposed to the laser beam. A preferred mask has an overcoat transparent layer. A cavity inspection mask is provided having a series of openings in the form of lines formed in the opaque pattern forming layer, the lines bounding the cavity walls, is the mask being used for determining if the cavity is centrally positioned on the substrate and/or that the cavity is of the desired size. Substrates containing identifying masks thereon which cannot be seen by the unaided eye for theft deterrence are also provided.
    Type: Grant
    Filed: March 30, 1999
    Date of Patent: March 27, 2001
    Assignee: International Business Machines Corporation
    Inventors: James Gregory Balz, Mark William Kapfhammer, Mark Joseph LaPlante, David C. Long
  • Patent number: 6171758
    Abstract: The present invention is a flexographic printing plate having a very low degree of thermal distortion during development. This flexographic printing plate comprises a dimensionally stable substrate and an image bearing relief layer, wherein the thermal distortion of the flexographic printing plate in both the machine and the transverse directions is less than 0.02% when the plate is developed at temperatures in the range from about 100° C. to about 180° C.
    Type: Grant
    Filed: November 8, 1994
    Date of Patent: January 9, 2001
    Assignee: DuPont Operations Worldwide, Inc.
    Inventors: Sudershan K. Bhateja, John A. Martens, Kurt F. Feil
  • Patent number: 6156462
    Abstract: For instance, when a washing-free yet low-residue type of flux is coated on a solder resist film, soldering can be carried out while no solder balls remain on a circuit substrate.A photosensitive resin composition comprises a photopolymerizable and photosensitive resin having at least one of a carboxyl group and an onium group, a photopolymerizable reactive diluent, a photopolymerization initiator, a thermosetting component, and an inorganic powder having an average particle size of 2 .mu.m to 20 .mu.m. A cured film thereof is used as a solder resist film for circuit substrate fabrication.A washing-free yet low-residue type of flux is so uniformly coated on the solder resist film that soldering can be carried out in the absence of any solder ball.
    Type: Grant
    Filed: August 14, 1998
    Date of Patent: December 5, 2000
    Assignee: Tamura Kaken Co., Ltd.
    Inventors: Makoto Yanagawa, Rinzo Tachibana, Hiroshi Yamamoto, Tetsuji Ishikawa, Tetsuo Kurokawa, Kohichi Ishida
  • Patent number: 6143451
    Abstract: Improved processes for laser thermal imaging and imaged laserable assemblages obtained using the improved processes of this invention are described. These improved processes operate effectively at high speeds and also afford high image densities and good durability of images present on receiver elements upon thermal imaging done in accordance with these improved processes.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: November 7, 2000
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Graciela Beatriz Blanchet-Fincher
  • Patent number: 6124074
    Abstract: Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation and are developable to form photoresist structures of high resolution and high etch resistance are enabled by the use of a combination of cyclic olefin polymer, photosensitive acid generator and a hydrophobic non-steroidal multi-alicyclic component containing plural acid labile linking groups. The cyclic olefin polymers preferably contain i) cyclic olefin units having polar functional moieties, ii) cyclic olefin units having acid labile moieties that inhibit solubility in aqueous alkaline solutions.
    Type: Grant
    Filed: March 11, 1999
    Date of Patent: September 26, 2000
    Assignee: International Business Machines Corporation
    Inventors: Pushkara Rao Varanasi, Joseph F. Maniscalco
  • Patent number: 6093508
    Abstract: The present invention is embodied in a process for creating a dual damascene structure. The process includes the steps of forming a photoresist film on a substrate, pattern exposing the photoresist film to form a first pattern in the photoresist film, and forming an etch resistant layer in the first pattern. The resistant layer is resistant to a further pattern exposure and etching. The photoresist film is pattern exposed a second time to form a second pattern in the photoresist film. The sections of the photoresist film corresponding to the second pattern are removed and the substrate is etched to form the second pattern in the substrate. The resistant layer is removed and the substrate is etched to form the first pattern in the substrate. Finally, the remaining photoresist film is removed from the substrate.
    Type: Grant
    Filed: January 6, 1999
    Date of Patent: July 25, 2000
    Assignee: International Business Machines Corporation
    Inventor: William J. Cote
  • Patent number: 6071655
    Abstract: The present invention pertains to a new type of continuous-tone, photographic print comprising a continuous-tone, photographic relief on a substrate, filled with translucent glaze in such a manner that the thickness of said glaze is determined at any given location on the surface of the substrate by the depth of said relief at that location, and the thickness of said glaze determines the optical density of said print at that same location. Hence, it provides a type of continuous-tone, photographic print that can be formed on the surface of any suitable material, that is intrinsic to the surface of said material and as durable and as colorfast as the materials of which it is formed.
    Type: Grant
    Filed: February 12, 1999
    Date of Patent: June 6, 2000
    Inventor: Keith Adams Faulconer
  • Patent number: 6071654
    Abstract: The invention relates to a photographic element comprising a translucent base and a color forming layer comprising at least one silver halide emulsion layer and dye forming coupler, wherein said base comprises at least one polymer sheet comprising a transparent polymer sheet containing voids, with the proviso that said translucent sheet is substantially free of white light reflecting pigments and wherein said translucent sheet has a light transmission of between 15% and 85%.
    Type: Grant
    Filed: September 17, 1998
    Date of Patent: June 6, 2000
    Assignee: Eastman Kodak Company
    Inventors: Alphonse D. Camp, Peter T. Aylward, Robert P. Bourdelais
  • Patent number: 6004719
    Abstract: A process for producing an image uses an imaging medium comprising an acid-generating layer or phase comprising a mixture of a superacid precursor, a sensitizing dye and a secondary acid generator, and a color-change layer comprising an image dye. The sensitizing dye has first and second forms, the first form having substantially greater substantial absorption in a first wavelength range than the second form. The superacid precursor is not capable, in the absence of the first form of the sensitizing dye, of being decomposed by radiation in the first wavelength range. The secondary acid generator is capable of thermal decomposition, catalyzed by superacid, to form a secondary acid. While at least part of the sensitizing dye is in its first form, the medium is imagewise exposed to radiation in the first wavelength range, thereby causing, in the exposed areas of the acid-generating layer, the formation of superacid.
    Type: Grant
    Filed: May 19, 1997
    Date of Patent: December 21, 1999
    Assignee: Polaroid Corporation
    Inventors: Russell A. Gaudiana, Robert W. Haddock, Serajul Haque, Iris B. Kliman Bloom, John L. Marshall, Socorro M. Ramos, Larry C. Takiff, Stephen J. Telfer, Michael A. Young
  • Patent number: 6004653
    Abstract: This invention discloses a method of planarizing a top surface with variations of profile heights above a substrate of a semiconductor chip. The method includes a step producing a polish-differentiating surface which has polishing rates proportional to the variations of the profile heights of the polish-differentiating surface above the substrate provided for performing a planarization process by applying a polishing process thereon. With the polishing differentiating surface the dishing effects of the semiconductor chip is substantially reduced when a one-time chemical mechanical polishing (CMP) process is applied for semiconductor chip planarization.
    Type: Grant
    Filed: February 18, 1997
    Date of Patent: December 21, 1999
    Assignee: Winbond Electronics Corp.
    Inventor: Chen-tsai Lee
  • Patent number: 5994005
    Abstract: The present invention is an imaged photographic element including a support, having at least one silver halide emulsion layer, and having at least one stain resistant overcoat layer. The stain resistant overcoat layer contains a fluoro(meth)acrylate interpolymer having two different segments, one of which is fluorinated and oleophobic and the other of which is hydratable. The stain resistant overcoat is applied to the photographic element after film processing.
    Type: Grant
    Filed: February 5, 1998
    Date of Patent: November 30, 1999
    Assignee: Eastman Kodak Company
    Inventors: Charles C. Anderson, Brian A. Schell
  • Patent number: 5981114
    Abstract: A photoresist check pattern structure in a semiconductor integrated circuit device has a pattern test region and a photoresist check pattern. The pattern test region has a plurality of step regions corresponding to surface steps developed during respective process steps for fabricating the semiconductor device. The surface steps are formed in a one-side concave shape in a plane view. The photoresist check pattern extends continuously across at least one of the surface steps in the pattern test region and which has substantially flat resist surfaces. The photo resist check patterns include a pattern formed in a dimension more severe than that according to design rules for semiconductor circuit elements on the substrate. With this, it is possible to check easily as to whether the exposure/development of photoresist films corresponding to respective interconnect layers has been carried out with the desired accuracy being maintained.
    Type: Grant
    Filed: December 30, 1996
    Date of Patent: November 9, 1999
    Assignee: NEC Corporation
    Inventor: Natsuki Sato
  • Patent number: 5965304
    Abstract: The present invention is an imaged photographic element which includes a support, at least one silver halide light-sensitive emulsion layer superposed on the support; and a protective overcoat furthest from the support. The protective overcoat is superposed on the silver halide light sensitive layer. The protective overcoat includes a first polymeric particle having a glass transition temperature of greater than or equal to 25.degree. C. and a particle size of from 5 to 500 nm and a second polymeric particle having a glass transition temperature of less than 25.degree. C. and a particle size of from 5 to 500 nm at a weight ratio of the first polymeric particle to the second polymeric particle of from 3:97 to 80:20 and wax particle having a size of from 0.01 .mu.m to 0.5 .mu.m. The protective overcoat is applied from an aqueous coating.
    Type: Grant
    Filed: November 6, 1997
    Date of Patent: October 12, 1999
    Assignee: Eastman Kodak Company
    Inventors: Hwei-ling Yau, Wendy S. Krzemien, Paul T. Lubberts
  • Patent number: 5952130
    Abstract: The present invention is an imaged photographic element which includes a support, at least one light sensitive silver halide emulsion layer superposed on the support, and an overcoat layer overlying the light sensitive silver halide emulsion layer. The protective overcoat includes a first water insoluble polymer having a Tg less than 25.degree. C. and a second water insoluble polymer having a Tg greater than 25.degree. C. The first or second polymer is composed of a monomer at a weight percent of 20 to 100 having the following formula ##STR1## wherein: X is selected from the group consisting of --Cl, --F, and --CN, and Y is each independently selected from the group consisting of H, Cl, F, CN, CF.sub.3, CH.sub.3, C.sub.2 H.sub.5, n--C.sub.3 H.sub.7, iso--C.sub.3 H.sub.7, n--C.sub.4 H.sub.9, n--C.sub.5 H.sub.11, n--C.sub.6 H.sub.13, OCH.sub.3, OC.sub.2 H.sub.5, phenyl C.sub.6 F.sub.5, C.sub.6 Cl.sub.5, CH.sub.2 Cl, CH.sub.2 F, C.sub.2 F.sub.5, n--C.sub.3 F.sub.7, iso--C.sub.3 F.sub.7, OCF.sub.3, OC.sub.2 F.
    Type: Grant
    Filed: August 19, 1998
    Date of Patent: September 14, 1999
    Assignee: Eastman Kodak Company
    Inventors: Hwei-Ling Yau, Tienteh Chen, Jeffrey F. Taylor, Elmer C. Flood, David E. Decker
  • Patent number: 5935743
    Abstract: The invention discloses that a photograph with a 3-dimensional image results when the non-angular reflector (of mercury) used in the Lippmann process of color photography is replaced by an angular reflector; the preferred form of the angular reflector is a retro-reflector.A photographic system is described which produces photographs with 3-dimensional images. The photo-sensitive element records the interference patterns of light waves, and the system is an improvement over the Lippmann process of color photography which produces photographs with 2-dimensional images. A photographic system is also described that produces a photograph with a 3-dimensional image from 2-dimensional cross sections of a subject; the system is useful in medical imaging. During exposure, motion of more than one wavelength of light is permissible between the subject and lens or the lens and the photo-sensitive element.These improvements result from the use of a particular type of angular reflector which is a retro-reflecting sheet.
    Type: Grant
    Filed: May 26, 1995
    Date of Patent: August 10, 1999
    Inventor: George M. Sawyer
  • Patent number: 5869175
    Abstract: A structure formed during processing of an integrated circuit. Two layers of photoresist are formed over a conductive layer to be patterned. The lower layer is thinner than the upper layer, and is dyed to have a lower transmittance. Both layers are used as a masking pattern for the underlying conductive layer.
    Type: Grant
    Filed: May 16, 1995
    Date of Patent: February 9, 1999
    Assignee: STMicroelectronics, Inc.
    Inventor: John C. Sardella
  • Patent number: 5853925
    Abstract: A diffusion confirming pattern for measuring a diffusion distance of an etch-resistant component during a transfer process of a semiconductor device, includes a first photoresist pattern formed on a substrate according to a first mask pattern, and a second photoresist pattern formed on the substrate according to a second mask pattern, wherein the first mask pattern is separated from the second mask pattern by a predetermined interval, the second photoresist pattern is separated from the first photoresist pattern by an interval, and the predetermined interval is compared with the interval between the first and second photoresist patterns to determine the diffusion distance of the etch-resistant component.
    Type: Grant
    Filed: February 20, 1997
    Date of Patent: December 29, 1998
    Assignee: LG Semicon Co., Ltd.
    Inventor: Hoon Huh
  • Patent number: 5807651
    Abstract: Unexpectedly good transfer of electrophotographically-produced images using small toner particles occurs when the image is developed on an electrostatographic recording member, preferably an organic photoconductive element, which has been overcoated with a thin (about 10 nm to about 10 .mu.m thick) layer of a material having a Young's modulus greater than 10 GPa and preferably greater than about 100 GPa. The image is then transferred to an intermediate member which is comprised of an elastomeric blanket between about 0.1 and about 3 cm thick, having a Young's modulus between about 0.5 MPa and about 50 MPa, and preferably between about 1 and about 10 MPa, and having an electrical resistivity between about 10.sup.6 ohm-cm and about 10.sup.12 ohm-cm, by applying an appropriate electrostatic potential between the transfer intermediate member and the photoconductive element.
    Type: Grant
    Filed: November 20, 1997
    Date of Patent: September 15, 1998
    Assignee: Eastman Kodak Company
    Inventors: Donald S. Rimai, Paul M. Borsenberger, Salvatore Leone, Marie B. O'Regan, Thomas N. Tombs
  • Patent number: 5789121
    Abstract: The present invention provides a method of ablative photodecomposition and forming metal pattern which attains high resolution, is convenient, and employs non-halogenated solvents. The present invention is directed to a process for forming a metal pattern, preferably circuitization on an organic substrate, preferably on a circuit board or component thereof, which comprises coating the substrate with an ablatively-removable coating comprising a polymer resin preferably an acrylate polymer resin and preferably an ultraviolet absorber. A pattern is formed in the polymer coating corresponding to the desired metal pattern by irradiating at least a portion of the polymer coating with a sufficient amount of ultraviolet radiation to thereby ablatively remove the irradiated portion of the polymer coating. Next the patterned substrate is coated with a conductive metal paste to define the metal pattern, and the conductive metal paste is cured.
    Type: Grant
    Filed: June 20, 1997
    Date of Patent: August 4, 1998
    Assignee: International Business Machines Corporation
    Inventors: Douglas Adam Cywar, Charles Robert Davis, Thomas Patrick Duffy, Frank Daniel Egitto, Paul Joseph Hart, Gerald Walter Jones, Edward McLeskey
  • Patent number: 5766808
    Abstract: A process is disclosed for forming multilayered polyimide structure from negative photosensitive polyimide precursors. An initial polyimide layer is deposited and imagewise exposed. The unexposed portions of the initial polyimide layer are inhibited and then a second polyimide layer is deposited and likewise imagewise exposed. The films are developed, thereby forming a multilayer polyimide structure. After formation of the multilayer polyimide structure, a conductive material is applied on a substrate and then the polyimide layers are lifted off thereby forming a desired pattern of metallization.
    Type: Grant
    Filed: January 31, 1997
    Date of Patent: June 16, 1998
    Assignee: International Business Machines Corporation
    Inventors: Harold George Linde, Rosemary Ann Previti-Kelly, Thomas Joseph Reen
  • Patent number: 5763128
    Abstract: Disclosed is an apparatus and method for creating simulated photographic-quality prints, including: (a)providing a coated transparent substrate having a wrong reading toner image formed thereon; (b)providing one surface of a backing substrate with a first coating of a polymeric adhesive binder having a glass transition temperature less than 55.degree. C. an antistatic agent, a lightfastness inducing agent and an optional filler; (c)providing the one surface of the backing substrate with a second coating in contact with the first coating wherein the second coating includes a polymer having a melting point of greater than 50.degree. C.; and a hydroxy functional anticurl agent and a liquid crystalline material; (d)providing another coating on the backing substrate opposite the one surface which has a fragrant aroma, antistatic agent, fire retardant material, and abrasion resistant material; and(e)adhering the substrates to each other by the application of heat and pressure.
    Type: Grant
    Filed: October 16, 1997
    Date of Patent: June 9, 1998
    Assignee: Xerox Corporation
    Inventor: Shadi L. Malhotra
  • Patent number: 5750291
    Abstract: A process for the formation of a patterned resist of a photocurable material on a circuit board, the uncured portion of which is water soluble. The process includes the steps of forming a layer of an aqueous emulsion of a photocurable material upon the circuit board, drying the layer to a substantially dry and non-tacky state, imagewise exposing the layer to radiation to cure portions of the layer exposed to the radiation, and removing unexposed portions of the layer by washing with water. In a preferred embodiment, the photocurable material is an organic solvent solution of an epoxy acrylate derived from an epoxy novolac resin which has been carboxylated to render it alkali-developable.
    Type: Grant
    Filed: June 13, 1996
    Date of Patent: May 12, 1998
    Assignee: Coates Brothers PLC
    Inventors: Nicholas Eric Ivory, Wrenford John Thatcher
  • Patent number: 5747198
    Abstract: A resist pattern formed on a substrate has a T-shaped cross section including a stem portion extending from the substrate surface and a cap portion connected to the stem portion and spaced from the substrate surface. Provided that .alpha. is a minimum of the angle which is defined between a tangent at the lower edge of the cap portion and the substrate surface, and h is the spacing between the lower edge of the cap portion and the substrate surface at an intermediate position, .alpha. and h fall within a range defined and encompassed by tetragon ABCD wherein A: .alpha.=0.degree., h=0.01 .mu.m, B: .alpha.=20.degree., h=0.01 .mu.m, C: .alpha.=20.degree., h=0.2 .mu.m, and D: .alpha.=0.degree., h=0.3 .mu.m.
    Type: Grant
    Filed: December 2, 1996
    Date of Patent: May 5, 1998
    Assignee: TDK Corporation
    Inventor: Akifumi Kamijima
  • Patent number: 5721078
    Abstract: A resist pattern formed on a substrate has a T-shaped cross section including a stem portion extending from the substrate surface and a cap portion connected to the stem portion and spaced from the substrate surface. Provided that .alpha. is a minimum of the angle which is defined between a tangent at the lower edge of the cap portion and the substrate surface, and h is the spacing between the lower edge of the cap portion and the substrate surface at an intermediate position, .alpha. and h fall within a range defined and encompassed by tetragon ABCD wherein A: .alpha.=0.degree., h=0.01 .mu.m, B: .alpha.=20.degree., h=0.01 .mu.m, C: .alpha.=20.degree., h=0.2 .mu.m, and D: .alpha.=0.degree., h=0.3 .mu.m.
    Type: Grant
    Filed: December 2, 1996
    Date of Patent: February 24, 1998
    Assignee: TDK Corporation
    Inventor: Akifumi Kamijima
  • Patent number: 5693437
    Abstract: Simulated photographic-quality prints are created using non-photographic imaging such as xerography and ink jet. Reverse reading toner images are formed on a transparent substrate which is adhered to a coated backing sheet. One side of the backing sheet is adhered to a transparent substrate containing a reverse reading image. The opposite surface of the backing sheet is coated with a composition including a hydrophobic material and a percentage of colloidal particle material which enables writing on that surface with pen or pencil and printing thereon using xerography or ink jet.
    Type: Grant
    Filed: January 11, 1996
    Date of Patent: December 2, 1997
    Assignee: Xerox Corporation
    Inventor: Shadi L. Malhotra
  • Patent number: 5672410
    Abstract: A process for preparing embossed, finely-divided, thin, bright-metal particles which process comprises forming an embossed release surface to at least one side of a carrier sheet, depositing a metal film onto the release surface so that the metal film conforms to the embossed surface, solubilizing the release surface, removing the metal film from the carrier sheet, and breaking the thin metal film into embossed particles having an average diameter of between 25 to 50 microns. The film may also take the form of an optical stack.
    Type: Grant
    Filed: February 9, 1993
    Date of Patent: September 30, 1997
    Assignee: Avery Dennison Corporation
    Inventors: Richard G. Miekka, Dennis R. Benoit, Richard M. Thomas, James P. Rettker, Karl Josephy
  • Patent number: 5658698
    Abstract: A microstructure comprising a substrate (1), a patterned structure (beam member) (2) suspended over the substrate (1) with an air-space (4) therebetween and supporting structure (3) for suspending the patterned structure (2) over the substrate (1).The microstructure is prepared by using a sacrificial layer (7) which is removed to form the space between the substrate (1) and the patterned structure (2) adhered to the sacrificial layer. In the case of using resin as the material of the sacrificial layer, the sacrificial layer can be removed without causing sticking, and an electrode can be provided on the patterned structure.The microstructure can have application as electrostatic actuator etc., depending on choice of shape and composition.
    Type: Grant
    Filed: January 26, 1995
    Date of Patent: August 19, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takayuki Yagi, Masatake Akaike
  • Patent number: 5639580
    Abstract: An integral image element, comprising:an integral lens sheet with opposed front and back surfaces, the front surface carrying convex surfaces of a plurality of lens elements;an integral image positioned behind the back surface; anda non-specular reflective layer positioned behind the integral image which layer reflects more than 80% of visible light reaching the reflective layer from in front of the layer, before penetrating the reflective layer a distance of 10 microns.A method of making the foregoing type of integral image element is also provided.
    Type: Grant
    Filed: February 13, 1996
    Date of Patent: June 17, 1997
    Assignee: Eastman Kodak Company
    Inventor: Roger Roy Adams Morton
  • Patent number: 5635318
    Abstract: There is provided a method for making a lithographic printing plate according to the DTR-process from a printing plate precursor comprising on a hydrophilic surface of a support in the order given a layer of physical development nuclei and a silver halide emulsion layer from an original containing continuous tones comprising the steps of:frequency modulation screening said original to obtain screened data,image-wise exposing said printing plate precursor according to said screened data,developing a thus obtained image-wise exposed lithographic printing plate precursor by means of an alkaline processing solution in the presence of a developing agent and a silver halide solvent yielding a lithographic printing plate, characterized in that the frequency modulated halftone dot with the greatest main dimension on said lithographic printing plate has a main dimension of more than 21 .mu.m.
    Type: Grant
    Filed: October 13, 1995
    Date of Patent: June 3, 1997
    Assignee: AGFA-Gevaert, N.V.
    Inventor: Johan Van Hunsel
  • Patent number: 5605784
    Abstract: The invention discloses that a photograph with a 3-dimensional image results when the non-angular reflector (of mercury) used in the Lippmann process of color photography is replaced by an angular reflector; the preferred form of the angular reflector is a retro-reflector.A photographic system is described which produces photographs with 3-dimensional images. The photo-sensitive element records the interference patterns of light waves, and the system is an improvement over the Lippmann process of color photography which produces photographs with 2-dimensional images. A photographic system is also described that produces a photograph with a 3-dimensional image from 2-dimensional cross sections of a subject; the system is useful in medical imaging. During exposure, motion of more than one wavelength of light is permissible between the subject and lens or the lens and the photo-sensitive element.These improvements result from the use of a particular type of angular reflector which is a retro-reflecting sheet.
    Type: Grant
    Filed: May 22, 1995
    Date of Patent: February 25, 1997
    Inventor: George M. Sawyer
  • Patent number: 5604073
    Abstract: In a bi-layer lift-off process, the adhesion characteristics of a PMGI release layer are substantially improved by the use of ortho-hydroxy substituted 4-phenylazo compounds (azo dyes), a class of nonactinic dyes, as an adhesion promoter additive. These azo dyes, due to their chemical structure, exhibit selective binding to various metals by acting as a chelating ligand to the metal surface. Formulations of a specific azo dye, Sudan Orange G, at concentrations from 0.25 to 1.0 percent (by weight) in PMGI exhibits no loss of adhesion at prebake temperature in the range of 120 to 160 degrees C.
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: February 18, 1997
    Assignee: International Business Machines Corporation
    Inventors: Mohamad T. Krounbi, Alfred F. Renaldo, Douglas J. Werner
  • Patent number: 5578360
    Abstract: The invention relates to a reinforcing structure for a thin film, particularly for an ultrathin film permeable to X-ray and ultraviolet radiation, and a method for manufacturing a reinforcing structure for a thin film with a thickness less than 5 micrometers. According to the invention, on the surface of the thin film, there is formed, in a bakeing treatment of at least one step, a reinforcing structure made of some photosensitive material such as polymer.
    Type: Grant
    Filed: May 23, 1995
    Date of Patent: November 26, 1996
    Assignee: Outokumpu Instruments Oy
    Inventor: Veli-Pekka Viitanen
  • Patent number: 5554467
    Abstract: A backside textured papermaking belt is disclosed which is comprised of a framework and a reinforcing structure. The framework has a first surface which defines the paper-contacting side of the belt, a second surface opposite the first surface, and conduits which extend between first and second surfaces of the belt. The first surface of the framework has a paper side network formed therein which defines the conduits. The second surface of the framework has a backside network with passageways that provide surface texture irregularities in the backside network. The papermaking belt is made by applying a coating of photosensitive resinous material to a reinforcing structure which has opaque portions, and then exposing the photosensitive resinous material to light of an activating wavelength through a mask which has transparent and opaque regions and also through the reinforcing structure.
    Type: Grant
    Filed: May 25, 1995
    Date of Patent: September 10, 1996
    Assignee: The Proctor & Gamble Company
    Inventors: Paul D. Trokhan, Glenn D. Boutilier
  • Patent number: 5534372
    Abstract: An IC card in which an IC chip is incorporated between a first and second base boards, comprises an image receiving layer on which an ink image is transferred by a thermal transfer method and a cushion layer provided between the IC chip and the image receiving layer so that the cushion layer smooths irregularity caused by the IC chip and improves a flatness of the image receiving layer.
    Type: Grant
    Filed: July 25, 1994
    Date of Patent: July 9, 1996
    Assignee: Konica Corporation
    Inventors: Kunihiro Koshizuka, Shigehiro Kitamura, Masataka Takimoto, Tomonori Kawamura
  • Patent number: 5518843
    Abstract: An optical film with a pattern formed by applying a photosensitive composition to the surface of a transparent film and by irradiating the photosensitive composition. The transparent film is made of a thermoplastic resin having a retardation of 30 nm or less, a deflection temperature under load of 100.degree. C. or higher, a transmittance in the visible light region of 85% or higher, and a refractive index of 1.45-1.59. The optical film has optical characteristics as excellent as glass. It has superior heat resistance, more flexible, more easily processed, and lighter in weight than glass bases.
    Type: Grant
    Filed: January 11, 1995
    Date of Patent: May 21, 1996
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Yasuo Hara, Hironobu Shinohara
  • Patent number: 5516394
    Abstract: A dry toner image is fixed to a thermoplastic layer on a receiving sheet by pressing a ferrotyping web against the image in the presence of sufficient heat to soften the layer. A curl preventing layer opposite the thermoplastic layer does not offset on a backing roller or the like because it has a melting point that is high compared to the thermoplastic layer.
    Type: Grant
    Filed: December 18, 1991
    Date of Patent: May 14, 1996
    Assignee: Eastman Kodak Company
    Inventors: Donald S. Rimai, Muhammad Aslam
  • Patent number: 5510216
    Abstract: The invention is directed to a process for patterning a substrate in a selective pattern. In one embodiment, the process comprises the steps of forming a patterned coating over a substrate surface whereby portions of the substrate are covered by the patterned coating and portions of the substrate remain uncoated. A layer of a ligating material is coated over at least those portions of the substrate free of the patterned coating. The ligating layer is one that is capable of ligating with an electroless metal plating catalyst. The article so formed is then contacted with an electroless metallization catalyst and then with an electroless plating solution to form a patterned metal deposit on the substrate.
    Type: Grant
    Filed: August 29, 1995
    Date of Patent: April 23, 1996
    Assignee: Shipley Company Inc.
    Inventors: Gary S. Calabrese, Jeffrey M. Calvert, Mu-San Chen, Walter J. Dressick, Charles S. Dulcey, Jacque H. Georger, Jr., John F. Bohland, Jr.
  • Patent number: 5503963
    Abstract: A process for manufacturing an optical data storage disk stamper includes the steps of providing a chemically vapor-deposited, silicon carbide substrate having a toughness of about 4.5 MPa.sqroot. m, a roughness of about 1 nm, and a flatness of about 6 .mu.m and depositing a negative photoresist on a surface of the substrate. The substrate has a diameter greater than about 120 mm and a thickness greater than about one mm. The negative photoresist then is exposed with a laser to form a negative, data pattern in the photoresist. The photoresist is developed, and the ceramic substrate is ion machined to form the data pattern, in the substrate, such that a spiral track of ridges and lands is formed wherein each ridge has a height of about in a range of 20 to 200 nm. After the data pattern has been ion machined into the substrate, the developed photoresist is stripped from the substrate.
    Type: Grant
    Filed: July 29, 1994
    Date of Patent: April 2, 1996
    Assignee: The Trustees of Boston University
    Inventor: Thomas G. Bifano