Visible Imaging Including Step Of Firing Or Sintering Patents (Class 430/198)
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Patent number: 6723494Abstract: A conductor pattern is constructed to prevent corners from peeling and raising off a substrate. The conductor pattern has a spiral configuration and includes straight lines and corners connected to the straight lines. The bottom surface cross-sectional width of the conductor pattern is smaller than the top surface cross-sectional width thereof. Moreover, the bottom surface cross-sectional width of the corner is larger than the bottom surface cross-sectional width of the straight line.Type: GrantFiled: July 12, 2001Date of Patent: April 20, 2004Assignee: Murata Manufacturing Co., Ltd.Inventors: Yasuhiro Nakata, Keishiro Amaya
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Publication number: 20040033309Abstract: A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [(CH2)n, R′—Si(O)2]x—[Si(O)4]y—[R′—Si(O)3]z—[R″(CH2)n-M(O)3]w—[R′″(CH2)n—Si(O)3]v where O is oxygen, Si is silicon, M is a metal alkoxyde known to form bonds with organic compounds through oxygen donor ligands, and where , R″ and R′″ are photo cross-linkable groups, and where (CH2)n are alkyl spacers with n being an integer ≧0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.Type: ApplicationFiled: August 15, 2002Publication date: February 19, 2004Applicant: NP Photonics, Inc.Inventors: M.A. Fardad, Wei Liang, Yadong Zhang
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Patent number: 6692885Abstract: Disclosed is a method of fabricating barrier ribs in a plasma display panel using photosensitive glass powder includes the steps of preparing photosensitive glass powder by reducing a photosensitive glass material to fine powder, putting the photosensitive glass powder or the photosensitive glass powder mixed with a UV-ray transmitting organic material in a mold, aligning a photomask over the photosensitive glass powder and carrying out exposure thereon, carrying out first and second thermal treatment on the photosensitive glass powder so as to generate different crystalline phases at exposed and non-exposed portions, respectively, and forming barrier ribs by etching the portion where the crystalline phase is generated.Type: GrantFiled: December 28, 2001Date of Patent: February 17, 2004Assignee: LG Electronics Inc.Inventor: Myung-Won Lee
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Patent number: 6664029Abstract: A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern. (3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer, (4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.Type: GrantFiled: August 30, 2000Date of Patent: December 16, 2003Assignee: Kansai Paint Co., Ltd.Inventors: Genji Imai, Kengo Ohnishi, Hiroyuki Honma, Hideo Kogure
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Patent number: 6656665Abstract: The invention concerns a method for producing a pattern on a transparent substrate, particularly a glass or glass-ceramic substrate. According to the invention, there is deposited on at least one area of one face of the substrate, a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking d° such that it is able to absorb solid particles. Certain areas of said first layer are exposed to light, particularly in order to increase, in a controlled manner, the average degree of cross-linking do of said polymer so as to modulate its absorption capacity. On the first layer is deposited at least one second layer of a mineral-particle-based composition. The substrate is subjected to at least one treatment cycle, particularly in order to fix said mineral particles. The invention also concerns the substrate produced by this method and its applications.Type: GrantFiled: November 20, 2000Date of Patent: December 2, 2003Assignee: Saint-Gobain VitrageInventors: Yves Demars, Jean-Christophe Elluin, Gilles Longchampt
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Publication number: 20030215747Abstract: This invention relates to a photo-polymerization type photosensitive electrode paste composition for a plasma display panel that is capable of preventing a bubble from occurring on an electrode surface during an electrode paste printing process and a damage of an electrode pattern caused by adhesive strength reduction, and a method of fabricating the electrode using the same.Type: ApplicationFiled: November 27, 2002Publication date: November 20, 2003Applicant: LG Electronics Inc.Inventors: Sang Tae Kim, Seung Tae Park, Lee Soon Park, Jong Woo Park
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Patent number: 6638681Abstract: A method and structure to form a conductive pattern on a ceramic sheet deposits a photosensitive conductive material on a carrier and exposes a pattern of x-ray energy on the material and sinters the carrier and the material to the ceramic sheet so that only the conductive pattern of the material remains on the ceramic sheet. The structure has a conductive patterned material which includes a photosensitive agent.Type: GrantFiled: October 28, 2002Date of Patent: October 28, 2003Assignee: International Business Machines CorporationInventors: Lawrence A. Clevenger, David B. Goland, Louis L. Hsu, Joseph F. Shepard, Jr., Subhash L. Shinde
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Publication number: 20030175621Abstract: The present invention relates to a paste composition, including a bonding agent charged with a metallic powder, to be used in a prototyping procedure, a procedure for obtaining metallic products from said composition, and a metallic product obtained from said procedure.Type: ApplicationFiled: January 17, 2003Publication date: September 18, 2003Inventor: Catherine Hinczewski
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Publication number: 20030175614Abstract: Provision of a manufacturing method for forming lamination of a plurality of dielectric layers on a substrate of a plasma display panel. A forming process for forming a photosensitive glass material layer and a patterning process for exposing required regions of the resulting photosensitive glass material layer to light are repeated in each formation of a first photosensitive glass material layer L1 and a second photosensitive glass material layer L2. After completion of the individual forming process and the individual patterning process for each of the first and second photosensitive glass material layers L1 and L2, a developing process for removing the unexposed regions and a burning process following the developing process are each performed on both of the first and second photosensitive glass material layers L1 and L2 together.Type: ApplicationFiled: March 11, 2003Publication date: September 18, 2003Applicant: Pioneer Corporation & Shizuoka Pioneer CorporationInventors: Hirofumi Higashi, Shingo Ogane
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Ultraviolet/electron beam forming process for multi-layer electronic components and products thereof
Patent number: 6602766Abstract: A multilayered electronic component with or without inter-layer connections created by a process using radiation curing such as ultraviolet/electron beam curing techniques. UV light or electron beam curable binders are mixed with ceramic powders and metals powders to form a ceramic slurry and electrode ink, there is little or no solvent in the metal ink and ceramic slurry. Instead of drying, a UV or electron beam is used for curing the binders. These binders could contain UV/electron beam curable monomers or oligomers, photo initiators, and other additives to provide the desired chemical and physical properties in the forming process.Type: GrantFiled: November 27, 2001Date of Patent: August 5, 2003Assignee: AEM, Inc.Inventors: Daniel H. Chang, Xiang-Ming Li -
Patent number: 6599681Abstract: A shielded substrate manufacturing technique is described which creates a conductive pattern on at least one transparent surface. The resulting product provides for both EMI shielding and visual transparency. It is formed by placing a thick film photo-printable composition on a substrate, exposing the thick film to a photo mask having a desired grid pattern, developing, and then firing the assembly. The process is less wasteful and more environmentally friendly than prior art processes that rely upon vapor deposition of metal in etching processes to provide the grid and provides a more uniformly spaced grid than techniques that use preconstructed metal wire meshes.Type: GrantFiled: July 13, 2001Date of Patent: July 29, 2003Assignee: Shielding ExpressInventor: Jeffrey R. Gilson
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Publication number: 20030124461Abstract: The invention relates to a photoimageable composition comprising: finely divided particles of inorganic material comprising conductive particles selected from RuO2, ruthenium-based polynary oxides or mixtures thereof; inorganic binder having a glass transition temperature in the range of from 325 to 600° C., a surface area of no greater than 10 m2/g and at least 85 wt. % of the particles having a size of 0.Type: ApplicationFiled: September 27, 2002Publication date: July 3, 2003Inventors: Terry R. Suess, Jerome David Smith, Haixin Yang
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Patent number: 6576391Abstract: To provide a photosensitive paste that permits pattern formation with a high aspect ratio and a high accuracy and to provide a plasma display comprising said photosensitive paste, by using a photosensitive paste that comprises, as essential components, an inorganic particles and an organic component that contains a photosensitive compound with the difference between the average refractive index of the organic component and the average refractive index of the inorganic particles being 0.1 or less.Type: GrantFiled: September 7, 1999Date of Patent: June 10, 2003Assignee: Toray Industries, Inc.Inventors: Yuichiro Iguchi, Takaki Masaki, Keiji Iwanaga
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Patent number: 6573020Abstract: In a method for the manufacture, by means of lithography, of ceramic small and micro-parts, a pre-ceramic silicon containing polymer layer is deposited on a highly temperature resistant substrate and then dried at room temperature. The layer is then exposed in an image pattern to electromagnetic radiation and the exposed layer is developed in an organic solvent to remove the non-exposed areas. The preparation is then pyrolyzed at more than 900° C. and finally sintered at a temperature of at least 1600° C. to form a ceramic structured layer on the substrate.Type: GrantFiled: September 30, 2000Date of Patent: June 3, 2003Assignee: Forschungszentrum Karlsruhe GmbHInventors: Thomas Hanemann, Jürgen Hausselt
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Publication number: 20030073042Abstract: The invention is for a method and composition for forming one or more patterned layers of functional material over a substrate. The method comprising providing a coating composition comprising a photopatterning material containing a particulate filler of a functional material. The particulate filler is one that is essentially transparent to activating radiation. Once formed, the coating is exposed to activating radiation in an image pattern and developed to form the patterned layer of functional material. The organic components of the coating can be removed if desired.Type: ApplicationFiled: October 17, 2001Publication date: April 17, 2003Inventors: George J. Cernigliaro, Roger F. Sinta
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Patent number: 6544090Abstract: A method for chemically etching of a foam glass layer to provide at least one cavity pattern in the foam glass layer. The method utilizes a substrate with at least one major surface suitable for receiving a glass layer. At least one layer of a glass paste composition in then applied onto the major surface of the substrate. The substrate and glass paste composition are then heated to a temperature sufficient enough to obtain a foam glass layer bonded to the major surface of the substrate. At least a portion of the foam glass layer is chemically etched to obtain at least one cavity pattern in the foam glass layer. The chemical etching of the foam glass layer results in an anisotropic etching rate.Type: GrantFiled: June 16, 2000Date of Patent: April 8, 2003Assignee: E. I. du Pont de Nemours and CompanyInventors: Paul R. Anderson, Charles J. Barnhart, Randall J. Cutcher, Jill M. Wyse
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Publication number: 20030064313Abstract: A process for forming an image, the process including the steps of: forming, on a surface of an image receiving layer of an image receiving body A, an adhesive first image including an adhesive composition by using an electrophotographic technique; forming an inorganic pigment second image on the surface of the image receiving layer of the image receiving body A by transferring a transfer layer corresponding to the adhesive first image, transferring an inorganic pigment second image onto an image receiving body B, arranging the inorganic pigment second image on a surface of a ceramic material; and heating the ceramic material to sinter the inorganic pigment image onto the surface of the ceramic material.Type: ApplicationFiled: March 27, 2002Publication date: April 3, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Toshiaki Aono
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Patent number: 6531257Abstract: Provided is a photosensitive copper paste permitting the formation of a fine and thick copper pattern having high adhesion to a substrate, and having excellent preservation stability without causing gelation, and a method of forming a copper pattern, a circuit board and a ceramic multilayer substrate using the photosensitive copper paste. The photosensitive copper paste includes a mixture of an organic binder having an acid functional group, a copper powder and a photosensitive organic component. The copper powder has a surface layer having a thickness of at least 0.1 &mgr;m from the surface composed CuO as a main component. The copper powder also has an oxygen content of about 0.8% to 5% by weight.Type: GrantFiled: November 30, 2001Date of Patent: March 11, 2003Assignee: Murata Manufacturing Co. LtdInventor: Masahiro Kubota
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Publication number: 20030013048Abstract: A shielded substrate manufacturing technique is described which creates a conductive pattern on at least one transparent surface. The resulting product provides for both EMI shielding and visual transparency. It is formed by placing a thick film photo-printable composition on a substrate, exposing the thick film to a photo mask having a desired grid pattern, developing, and then firing the assembly. The process is less wasteful and more environmentally friendly than prior art processes that rely upon vapor deposition of metal in etching processes to provide the grid and provides a more uniformly spaced grid than techniques that use preconstructed metal wire meshes.Type: ApplicationFiled: July 13, 2001Publication date: January 16, 2003Applicant: Shielding Express, Inc.Inventor: Jeffrey R. Gilson
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Patent number: 6497985Abstract: The present invention relates to a method for marking metallic alloys using laser alloying. Specifically, the present invention is directed toward the use of laser alloying steel or aluminum alloys with a mark that provides protection against wear and corrosion and greater permanency.Type: GrantFiled: June 9, 1999Date of Patent: December 24, 2002Assignee: University of Tennessee Research CorporationInventors: Mary Helen McCay, T. Dwayne McCay, John A. Hopkins, Narendra B. Dahotre, C. Michael Sharp, John Brice Bible, Frederick A. Schwartz
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Publication number: 20020177065Abstract: A method of utilizing laser energy to mark on a coated substrate is disclosed, wherein the coating is dried at a temperature below that necessary to permanently affix the coating to the substrate prior to the coated substrate being exposed to said laser energy. The dried coating is selectively removed by the laser energy in precise patterns that can be quickly and widely varied. The method of the present invention can be incorporated as a component of time-critical manufacturing processes.Type: ApplicationFiled: March 21, 2001Publication date: November 28, 2002Inventor: Hussein M. Sahi
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Publication number: 20020135001Abstract: The invention relates to a crosslinked resin and to its application in the manufacture of ceramic or glass patterns at the surface of a substrate.Type: ApplicationFiled: March 7, 2002Publication date: September 26, 2002Inventor: Philippe Gaucher
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Patent number: 6436482Abstract: In the heating of a substrate in a lithographic process, temperature conditions for heating a substrate on which a resist is formed exert a large influence upon the pattern dimensions, and the pattern dimensions vary greatly in the heating from only one of the surfaces of the substrate. There is provided a substrate heating apparatus for heating a substrate before or after irradiation of light for performing a pattern by using a photosensitive material formed on a substrate or by using a material which is photosensitive to charged particles formed on the substrate. The substrate heating apparatus includes an upper heater which serves as a heat source for heating the substrate from the top surface thereof, a lower heater which serves as a heat source for heating the substrate from the bottom surface thereof, and a heat-conducting heater block provided on the lower heater, on which heater block the substrate is placed, making it possible to individually set the temperatures of the upper and lower heaters.Type: GrantFiled: December 19, 1996Date of Patent: August 20, 2002Assignee: Sony CorporationInventor: Mikio Katsumata
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Publication number: 20020106577Abstract: Provided is a photosensitive copper paste permitting the formation of a fine and thick copper pattern having high adhesion to a substrate, and having excellent preservation stability without causing gelation, and a method of forming a copper pattern, a circuit board and a ceramic multilayer substrate using the photosensitive copper paste. The photosensitive copper paste includes a mixture of an organic binder having an acid functional group, a copper powder and a photosensitive organic component. The copper powder has a surface layer having a thickness of at least 0.1 &mgr;m from the surface composed CuO as a main component. The copper powder also has an oxygen content of about 0.8% to 5% by weight.Type: ApplicationFiled: November 30, 2001Publication date: August 8, 2002Applicant: Murata Manufacturing Co., Ltd.Inventor: Masahiro Kubota
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Publication number: 20020090565Abstract: Electrically (and, possibly, mechanically) active patterns are applied using a colloidal suspension of nanoparticles that exhibit a desired electrical characteristic. The nanoparticles are surrounded by an insulative shells that may be removed by therefrom by application of energy (e.g., in the form of electromagnetic radiation or heat). The nanoparticle suspension is applied to a surface, forming a layer that is substantially insulative owing to the nanoparticle shells. The applied suspension is exposed to energy to remove the capping groups and fuse the particles into cohesion. If the nanoparticle suspension was deposited as a uniform film, the energy is applied in a desired pattern so that unexposed areas remain insulative while exposed areas exhibit the electrical behavior associated with the nanoparticles. If the nanoparticle suspension was deposited in a desired pattern, it may be uniformly exposed to energy.Type: ApplicationFiled: January 30, 2002Publication date: July 11, 2002Inventors: Saul Griffith, Joseph M. Jacobson, Scott Manalis
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Publication number: 20020076655Abstract: The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380°K. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser-induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.Type: ApplicationFiled: September 17, 2001Publication date: June 20, 2002Inventors: Nicholas F. Borrelli, Joseph F. Schroeder, Charlene M. Smith, Alexander Streltsov
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Patent number: 6391515Abstract: This invention discloses a manufacturing process for preparing sol-gel optical waveguides comprising the steps of solution preparation, an optical waveguide photoresist module process, and optical waveguide molding and sintering. The solution is prepared by mixing water and alcohol to form an alcoholic solution with a properly adjusted pH value followed by mingling with tetraethylorthosilicate (TEOS) at room temperature. The optical waveguide photoresist module process comprises the steps of soft baking, exposure, development, washing by deionized water, drying by a nitrogen gun, and hard baking. The optical waveguide molding and sintering comprises the steps of spinning, sintering, and photoresist module removal.Type: GrantFiled: May 15, 2000Date of Patent: May 21, 2002Assignees: Industrial Technology Research Institute, National Tsing Hua UniversityInventors: Jung-Chieh Su, Chien-Kang Kao, I-Nan Lin, Chuen-Horng Tsai, Cheng-Chung Chi, Yung-Sheng Liu
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Publication number: 20020048630Abstract: A conductor pattern is constructed to prevent corners from peeling and raising off a substrate. The conductor pattern has a spiral configuration and includes straight lines and corners connected to the straight lines. The bottom surface cross-sectional width of the conductor pattern is smaller than the top surface cross-sectional width thereof. Moreover, the bottom surface cross-sectional width of the corner is larger than the bottom surface cross-sectional width of the straight line.Type: ApplicationFiled: July 12, 2001Publication date: April 25, 2002Applicant: Murata Manufacturing Co., LtdInventors: Yasuhiro Nakata, Keishiro Amaya
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Patent number: 6348295Abstract: Electrically (and, possibly, mechanically) active patterns are applied using a colloidal suspension of nanoparticles that exhibit a desired electrical characteristic. The nanoparticles are surrounded by an insulative shells that may be removed by therefrom by application of energy (e.g., in the form of electromagnetic radiation or heat). The nanoparticle suspension is applied to a surface, forming a layer that is substantially insulative owing to the nanoparticle shells. The applied suspension is exposed to energy to remove the capping groups and fuse the particles into cohesion. If the nanoparticle suspension was deposited as a uniform film, the energy is applied in a desired pattern so that unexposed areas remain insulative while exposed areas exhibit the electrical behavior associated with the nanoparticles. If the nanoparticle suspension was deposited in a desired pattern, it may be uniformly exposed to energy.Type: GrantFiled: March 3, 2000Date of Patent: February 19, 2002Assignee: Massachusetts Institute of TechnologyInventors: Saul Griffith, Joseph M. Jacobson, Scott Manalis
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Publication number: 20020008470Abstract: A display member, particularly a plasma display member, can be produced by a process comprising applying a paste which comprises a urethane compound and inorganic fine particles onto a substrate and then firing the paste. The display member has a post-firing pattern without any defect.Type: ApplicationFiled: May 22, 2001Publication date: January 24, 2002Inventors: Hiroko Uegaki, Norikazu Tabata, Takaki Masaki, Hiromitsu Takahashi, Akihiko Tanaka, Mitsuyo Hashimoto
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Patent number: 6312864Abstract: Disclosed is a method for producing a patterned calcined inorganic film such as an electroconducting or insulating (non-conductive) film, particularly a plasma display panel, embracing a calcining step. To produce a patterned calcined inorganic film without inducing warpage, shrinkage of line width, or breakage of patterned lines, a patterned film formed on a substrate with a composition containing a heat decomposable binder and particles of an inorganic material is covered, prior to the calcining step, with a coating film of a heat decomposable resin composition capable of hardening or drying at a temperature lower than the temperature at which the heat decomposable binder is thermally decomposed and further capable of being burned off below the highest temperature of the calcining profile and thereafter the calcining step is performed.Type: GrantFiled: April 21, 2000Date of Patent: November 6, 2001Assignee: Taiyo Ink Manufacturing Co., Ltd.Inventors: Hiroyuki Tokai, Kazunobu Fukushima, Osamu Kawana, Nobuyuki Suzuki, Hideaki Kojima, Tsuyoshi Mitani, Kouichi Takagi
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Publication number: 20010036587Abstract: The present invention relates to a method for marking metallic alloys using laser alloying. Specifically, the present invention is directed toward the use of laser alloying steel or aluminum alloys with a mark that provides protection against wear and corrosion and greater permanency.Type: ApplicationFiled: June 9, 1999Publication date: November 1, 2001Inventors: MARY HELEN MCCAY, T. DWAYNE MCCAY, JOHN A. HOPKINS, NARENDRA B. DAHOTRE, C. MICHAEL SHARP, JOHN BRICE BIBLE, FREDERICK A. SCHWARTZ
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Publication number: 20010033985Abstract: A metal-containing toner is electrostatically printed on a semiconductor surface. Subsequently, this surface is annealed to achieve certain material modifications selectively at the regions where the toner is applied. If the toner contains a crystallization-catalyst metal, such as, Pd, Ni, Pt, and Cr, and is printed on an amorphous semiconductor film, annealing results in conversion of the printed regions to polycrystalline. If the metal-containing toner is printed on a silicon surface (i.e., amorphous/poly-Si layer or Si wafer) the printed regions are selectively converted to a metal-silicide (with the sufficient amount of metal applied on these regions) upon annealing.Type: ApplicationFiled: January 8, 2001Publication date: October 25, 2001Applicant: The Penn State Research FoundationInventors: Stephen J. Fonash, Ali Kaan Kalkan, Robert H. Detig
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Patent number: 6258506Abstract: The instant invention pertains to a curable composition comprising (a) substance that generates free radicals under the action of ultraviolet radiation and (b) polymer molecule bearing functionality capable of polymerization under the action of said free radicals wherein (a) is a benzoin ether and makes up from 0.001 to 10 wt % of the total composition and (b) has the following formula (R3SiO1/2)a(R′2SiO2/2)b(R″SiO3/2)c(SiO4/2)d in which R, R′, and R″ are each H or C1 to C10 hydrocarbyl possibly containing a heteroatom and at least 10 % is, for example, a vinyl group, and a+b+c+d=1. The composition of the instant invention is a storage-stable UV-curable composition that does not suffer from cure inhibition by air or oxygen, that is very efficiently cured by low doses of UV radiation, and provides a highly heat-resistant cured pattern by heating after pattern formation.Type: GrantFiled: June 1, 1999Date of Patent: July 10, 2001Assignee: Dow Corning Asia, Ltd.Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
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Patent number: 6218779Abstract: A partition of a plasma display device is fabricated by forming a dielectric layer on the surface of a rear substrate having an address electrode; forming a conductive layer and a photoconductive layer in order on the surface of said dielectric layer; charging the surface of said photoconductive layer; exposing aid photoconductive layer covered with a mask of a predetermined pattern to ultraviolet rays so that an electrostatic latent image can be formed on said photoconductive layer; developing the electrostatic latent image by allowing said photoconductive layer, on which the electrostatic latent image is formed, to be in contact with a charged liquid toner layer so that liquid toner can stick to the electrostatic latent image; drying the toner stuck to the electrostatic latent image and absorbing the toner remaining an area other than the electrostatic latent image; repeating three times the steps from said step of charging the surface of said photoconductive layer through to said step of drying and absorbiType: GrantFiled: October 22, 1998Date of Patent: April 17, 2001Assignee: Samsung Display Devices Co., Ltd.Inventor: Jong-ho Cho
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Patent number: 6214508Abstract: A circuit-forming charging powder allowing circuit patterns to resist being peeled off a printing object when the powder is used for printing a circuit pattern by an electrophotographic method on the object, wherein the circuit-forming charging powder has a conductive metal powder, a charge control agent and an adhesion reinforcing agent combined with a heat-melt resin and a method for producing the circuit-forming charging powder, as well as printed objects and multilayer wiring boards are described.Type: GrantFiled: March 2, 1999Date of Patent: April 10, 2001Assignee: Murata Manufacturing Co., Ltd.Inventors: Akihiko Kamada, Isao Kato, Norio Sakai
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Patent number: 6197480Abstract: To provide a photosensitive paste that permits pattern formation with a high aspect ratio and a high accuracy and to provide a plasma display including the photosensitive paste, by using a photosensitive paste that includes, as essential components, an inorganic particles and an organic component that contains a photosensitive compound with the difference between the average refractive index of the organic component and the average refractive index of the inorganic particles being 0.1 or less.Type: GrantFiled: July 21, 1997Date of Patent: March 6, 2001Assignee: Toray Industries, Inc.Inventors: Yuichiro Iguchi, Takaki Masaki, Keiji Iwanaga
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Patent number: 6156433Abstract: An electrode, for a plasma display panel, adapted for provision on a front or back plate of a plasma display panel, the electrode comprising a conductive paste.Type: GrantFiled: January 24, 1997Date of Patent: December 5, 2000Assignee: Dai Nippon Printing Co., Ltd.Inventors: Sakurako Hatori, Yasunori Kurima, Nobuaki Kimura, Yozo Kosaka, Satoru Kuramochi
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Patent number: 6120975Abstract: Disclosed is a method for producing a patterned calcined inorganic film such as an electroconducting or insulating (non-conductive) film, particularly a plasma display panel, embracing a calcining step. To produce a patterned calcined inorganic film without inducing warpage, shrinkage of line width, or breakage of patterned lines, a patterned film formed on a substrate with a composition containing a heat decomposable binder and particles of an inorganic material is covered, prior to the calcining step, with a coating film of a heat decomposable resin composition capable of hardening or drying at a temperature lower than the temperature at which the heat decomposable binder is thermally decomposed and further capable of being burned off below the highest temperature of the calcining profile and thereafter the calcining step is performed.Type: GrantFiled: October 29, 1998Date of Patent: September 19, 2000Assignee: TAIYO Ink Manufacturing Co., Ltd.Inventors: Hiroyuki Tokai, Kazunobu Fukushima, Osamu Kawana, Nobuyuki Suzuki, Hideaki Kojima, Tsuyoshi Mitani, Kouichi Takagi
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Patent number: 6090519Abstract: The present invention is directed to a process for obtaining permanent representations of full-tone, full-color photographs on bases such as ceramics, glass and plastic. This process contemplates the utilization of a set of transparent and opaque ceramic colors or mineral pigments in order to obtain the permanent representations of images on bases.Type: GrantFiled: December 9, 1992Date of Patent: July 18, 2000Assignee: Waldemar BaklarzInventor: Waldemar Baklarz
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Patent number: 6066431Abstract: There are provided a photosensitive resin film which can eliminate the step of development and the like, that is, can simplify the process, and in addition can form an even fluorescent substance layer in intimate contact with the surface of cells, and a back plate for PDP using the film. The photosensitive resin film comprises a substrate film and a pressure-sensitive adhesive, photosensitive resin layer provided on one side of the film, wherein the photosensitive resin layer comprises a photosensitive resin that contains a fluorescent substance and, upon exposure, causes the tackiness of exposed areas to be lowered.Type: GrantFiled: August 4, 1998Date of Patent: May 23, 2000Assignees: Dai Nippon Printing Co., Ltd., Tomoegawa Paper Co., Ltd.Inventors: Masaaki Asano, Takuma Hattori, Masami Yanagisawa
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Patent number: 5942376Abstract: Solution films of a photosensitive metal arylketone alcoholate are micro-patterned by exposure to ultraviolet radiation under a mask. The resultant patterns are developed in an apolar solvent and annealed to provide thin film metal oxides for use in integrated circuits.Type: GrantFiled: August 14, 1997Date of Patent: August 24, 1999Assignees: Symetrix Corporation, Mitsubishi Materials CorporationInventors: Hiroto Uchida, Nobuyuki Soyama, Kensuke Kageyama, Katsumi Ogi, Michael C. Scott, Larry D. McMillan, Carlos A. Paz de Araujo
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Patent number: 5909083Abstract: A process for producing a plasma display panel, involving the formation of a predetermined pattern for a plasma display panel, including an electrode pattern and a barrier for defining a discharge space, said process comprising the steps of:forming a predetermined pattern-forming material layer on a substrate;forming a mask pattern, comprising a main component of the material layer, on the pattern-forming material layer:etching the pattern-forming material layer with the mask pattern formed thereon, thereby patterning the pattern-forming material layer; andthen firing the pattern-forming material layer with the mask pattern provided thereon and the mask layer, thereby integrating the pattern-forming material layer and at least part of the mask layer with each other.Type: GrantFiled: February 18, 1997Date of Patent: June 1, 1999Assignee: Dai Nippon Printing Co., Ltd.Inventors: Masaaki Asano, Satoru Kuramochi, Yozo Kosaka
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Patent number: 5906527Abstract: The present invention provides a unique method of making a barrier rib structure for a plasma display panel. Instead of employing the traditional screen printing method of making barrier ribs, the present invention employs a section of low temperature cofired ceramic dielectric. The unique method includes the steps of providing a fusible dielectric composition in an organic binder, applying the composition on a glass sheet, applying a photoresist composition, placing a mask over the coated plate to provide a pattern of openings in the photoresist corresponding to the pattern of the picture subcells, using a laser to remove the portions of the coating not covered by the photoresist to form the color subcells and heating the resulting assembly to a sintering temperature to fuse the dielectric composition to form the barrier rib structure and to fuse the barrier rib structure to the glass plate.Type: GrantFiled: October 30, 1996Date of Patent: May 25, 1999Assignee: Ferro CorporationInventors: Aziz S. Shaikh, Kevin W. Allison, Todd K. Williams
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Patent number: 5891604Abstract: The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA.Type: GrantFiled: May 16, 1997Date of Patent: April 6, 1999Assignees: Nippon Hoso Kyokai, Dai Nippon Printing Co.,Ltd.Inventors: Toshihiro Katoh, Takao Kuriyama, Tatsuya Takei, Takashi Kawai, Hiroshi Murakami, Eiji Munemoto, Norio Ohta, Koji Shimada
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Patent number: 5863679Abstract: The present invention provides a method for forming a thin film pattern having an excellent accuracy of the pattern. The method comprises the steps of:(a) exposing a polysilane layer formed from a polysilane having a structure of the formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 indicate a group which is independently selected from the group consisting of a substituted or non-substituted aliphatic hydrocarbon residue, an alicyclic hydrocarbon residue and an aromatic hydrocarbon residue and m and n indicate an integer, provided on a substrate, to ultraviolet light selectively to form a latent image of the thin film pattern; and(b) dipping the polysilane layer in which the latent image of the thin film pattern is formed in a metal oxide sol and then drying.Type: GrantFiled: July 5, 1996Date of Patent: January 26, 1999Assignee: Nippon Paint Co., Ltd.Inventors: Hiroshi Tsushima, Iwao Sumiyoshi, Masaaki Yokoyama
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Patent number: 5824456Abstract: A composition for forming a metal oxide thin film pattern which is a solution containing one or more hydrolytic metal compounds selected from the group consisting of hydrolytic organometallic compounds (e.g., metal alkoxide) and metal halides, and a water generating agent which frees water under the effect of irradiation with active rays (e.g., o-nitrobenzyl alcohol and 2-nitroethanol) and, as required, an acid generating agent which frees acid under the effect of irradiation with active rays is disclosed. A thin film pattern is formed by coating the composition onto a substrate, irradiating active rays for forming an image on the resultant photosensitive coating film, developing the same with water or an alcoholic solvent to remove the non-exposed portion, and heat-treating the substrate to convert the remaining film into a metal oxide, thereby forming a negative-type metal oxide thin film pattern.Type: GrantFiled: January 16, 1997Date of Patent: October 20, 1998Assignee: Mitsubishi Materials CorporationInventors: Katsumi Ogi, Tsutomu Atsuki, Go Sasaki, Tadashi Yonezawa, Nobuyuki Soyama
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Patent number: 5672460Abstract: The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA.Type: GrantFiled: June 8, 1995Date of Patent: September 30, 1997Assignees: Nippon Hoso Kyokai, Dai Nippon Printing Co., Ltd.Inventors: Toshihiro Katoh, Takao Kuriyama, Tatsuya Takei, Takashi Kawai, Hiroshi Murakami, Eiji Munemoto, Norio Ohta, Koji Shimada
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Patent number: 5624782Abstract: To provide a method of manufacturing thick-film resistor elements that forms thick-film resistors having a uniform thickness on a substrate surface with high precision.A method of manufacturing thick-film resistor elements by applying a thick-film resistor composition, obtained by dispersing a conductive component and an inorganic binder in an organic medium and which has a specified rheology, through a clear relief image obtained by exposing, curing, and developing a resist layer of a photopolymerizable mixture formed on an insulating substrate according to the resist pattern, and the thick-film paste obtained at this time has almost the same thickness as the photopolymerizable layer on the surface of the insulating substrate and is patterned according to the high-precision pattern defined by the sharp, linear, lateral edge enclosed by the resist image removed by development.Type: GrantFiled: May 11, 1995Date of Patent: April 29, 1997Assignee: E. I. Du Pont de Nemours and CompanyInventors: Keiichiro Hayakawa, Jerome D. Smith, Hidehiro Yamada
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Patent number: 5576074Abstract: A process is described for providing a conductive metal circuit using a coherent radiation source. The circuit pattern is directly written onto a laser addressable element having a supercooling material layer. A conductive metal toner is then applied to the light struck areas and fired in a furnace to provide a conductive metal circuit.Type: GrantFiled: August 23, 1995Date of Patent: November 19, 1996Assignee: Minnesota Mining and Manufacturing CompanyInventors: David C. Weigel, David A. Morgan