Visible Imaging Including Step Of Firing Or Sintering Patents (Class 430/198)
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Patent number: 5348843Abstract: The invention is directed to an improved method for making a porcelain enamel tag or sign. The process involves forming a single white porcelain enamel base coat over a suitable metal backing, and firing to bond the porcelain enamel to the metal, resulting in the formation of a porcelain coated metal blank. The blank is then coated with a photographic emulsion which contains a colored frit. The emulsion coating is allowed to dry, and is then ready to receive a printed image. The desired image or graphic to be reproduced is formed on a light transmitting backing, which is made in the form of a print. The print is then affixed to the porcelain enamel blank which contains the emulsion overcoating. The blank containing the image on its surface is then exposed to a source of activating radiation. Following exposure, the image containing blank is developed in a warm aqueous solution, whereby the water serves to develop the emulsion mixture.Type: GrantFiled: June 12, 1992Date of Patent: September 20, 1994Assignee: Permar Systems, Inc.Inventors: Edward W. Beck, Blair M. Brewster, Andrew M. Walker
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Patent number: 5260163Abstract: 1.Type: GrantFiled: May 7, 1992Date of Patent: November 9, 1993Assignee: E. I. Du Pont de Nemours and CompanyInventors: William J. Nebe, John K. Holzapfel
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Patent number: 5217829Abstract: A novel photomask structure and method of producing photomasks using a non-contacting spark-discharge recording apparatus. The recording constructions of the present invention comprise a conductive layer, a layer transparent to the radiation that will be used to expose the target photosensitive material and, optionally, a coating layer deposited over the metal layer.Type: GrantFiled: December 12, 1991Date of Patent: June 8, 1993Assignee: Presstek, Inc.Inventors: Michael T. Nowak, Thomas E. Lewis
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Patent number: 5204210Abstract: A method of forming a patterned, poly-crystalline diamond film on a substrate is disclosed. First, a photoresist layer is applied to a substrate. A diamond powder layer is formed on the photoresist layer either through spray-coating, dip-coating, spin-coating using a diamond-powder suspension, and the like. The photoresist layer is exposed to electromagnetic radiation through a mask either before or after the diamond powder layer is applied. Then, the photoresist layer is developed, after which the substrate is heated causing the photoresist layer to carbonize. The substrate is exposed to a mixture of hydrogen-containing and carbon-containing gases which are decomposed in a processing apparatus. Hydrogen in this gas mixture etches away at the carbonized photoresist layer leaving behind the patterned diamond powder layer. Carbon in these carbon-containing gases combines with the diamond particles in the diamond powder layer to form diamond structures on the substrate.Type: GrantFiled: December 7, 1990Date of Patent: April 20, 1993Assignee: Xerox CorporationInventors: Frank Jansen, Mary A. Machonkin
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Patent number: 5139818Abstract: Photochemical and electroless metallization techniques have been combined to create high resolution circuits with line widths and spaces of about one mil on alumina substrates. In this process, small amounts of a xylene-soluble platinum metallo-organic compound are first applied to the surface of the alumina substrate. A mask is then used to selectively expose the platinum metallo-organic compound to ultraviolet light in the areas that are to be metallized, so as to transform the platinum metallo-organic compound into a xylene-insoluble form. After a xylene rinse removes the original soluble platinum compound from the unexposed areas, the substrate is fired in air at about 450.degree. C. for about five minutes, so as to pyrolize the insoluble, irradiated platinum metallo-organic compound into catalytically active platinum. This is followed by electroless deposition of copper onto the ultraviolet-treated regions where the catalytically active platinum resides.Type: GrantFiled: June 6, 1991Date of Patent: August 18, 1992Assignee: General Motors CorporationInventor: Andrew M. Mance
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Patent number: 5116704Abstract: A barrier rib forming method for a PDP including a process of forming an emulsion layer as a filmed deposition upon a glass substrate having transparent electrodes thereon. Exposing the film to ultraviolet rays to produce electrodes with a proper pattern of an emulsion layer thereon. Printing, drying and heating a glass paste deposited on said emulsion. Ultrasonically vibrating the glass substrate to remove the emulsion layer and glass paste from the glass substrate.Type: GrantFiled: September 6, 1989Date of Patent: May 26, 1992Assignee: Samsung Electron Device Co., Ltd.Inventor: Ki-Duck Kwon
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Patent number: 5116271Abstract: A method for fabricating a plasma display includes forming an organic film on a pattern of discharge electrodes and preheating to a temperature lower than a temperature at which the organic film undergoes an exothermic phenomenon, for a given time. By this, in the firing treatment after application of an insulating material in between organic films, a gentle change in shape of the organic film during the process of burning off the organic film is effective in suppressing a change in shape of barrier ribs formed by the insulating material.Type: GrantFiled: December 13, 1990Date of Patent: May 26, 1992Assignee: Mitsubishi Denki Kabushiki KaishaInventor: Hironobu Arimoto
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Patent number: 5098815Abstract: Apertures with inclined sidewalls are produced in a dielectric layer by exposing a photoformable dielectric layer through a mask having a section without a sharp line of demarcation between opaque and transparent areas.Type: GrantFiled: June 16, 1989Date of Patent: March 24, 1992Assignee: E. I. Du Pont de Nemours and CompanyInventors: Andrzej Adamczyk, William E. Delaney
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Patent number: 5049480Abstract: A photosensitive aqueous developable photosensitive silver conductive composition is disclosed which is fireable in a nonoxidizing atmosphere and is developable in an aqueous solution containing 0.8 percent by weight sodium carbonate.Type: GrantFiled: February 20, 1990Date of Patent: September 17, 1991Assignee: E. I. Du Pont de Nemours and CompanyInventors: Willim J. Nebe, James J. Osborne
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Patent number: 5045437Abstract: Method for producing structured ceramic films (111) as well as ceramic members (1) manufactured therefrom and having interior cavities (2) upon empolyment of photolithographic structuring and liquid jet erosion (21).Type: GrantFiled: October 27, 1989Date of Patent: September 3, 1991Assignee: Siemens AktiengesellschaftInventor: Ulrich Bast
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Patent number: 5011754Abstract: A novel decorating pigment-transfer sheet 1 utilizing at least one photosensitive resin layer 3 and at least one pigment layer deposited thereon is provided for decorating heat-resistant articles 7 such as ceramics. The transfer sheet 1 comprises a water-absorbing substrate sheet 2; a water soluble paste layer 5 placed thereon; at least one and normally three photosensitive resin layers 3 placed thereon, each resin layer 3 having adhesive dot photo-images 3c produced by irradiating the resin layer 3 through a photographic dotted film 6; and at least one and normally three glaze-containing pigment layers (a, b, c) deposited on the adhesive dot images 3c of each resin layer 3. The three pigment layers (a,b,c) normally comprise each pigment of three primary colors, respectively. The heat-resistant article 7 is decorated by soaking the transfer sheet 1 in water, removing the substrate sheet 2, transferring the resin/pigment layers onto the article surface, followed by firing.Type: GrantFiled: April 24, 1990Date of Patent: April 30, 1991Assignee: INAX CorporationInventor: Masayuki Ono
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Patent number: 4990416Abstract: A method for the deposition of phosphor containing materials to CRT or VFD faceplates using reversal toning is dislosed. The method incudes the steps of charging the phosphor containing particles and the surface of a patterned photoresist with a charge of the same sign so that the particles are accurately deposited directly to an uncharged transparent surface electrode on the substrate.In a preferred embodiment, glass and/or polymeric binders may be included with the phosphor containing materials to enhance adherence to the substrate.Type: GrantFiled: June 19, 1989Date of Patent: February 5, 1991Assignee: Coloray Display CorporationInventor: John B. Mooney
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Patent number: 4983500Abstract: Disclosed is a radiation sensitive composition which comprises a radiation sensitive compound decreased in absorption of radiation upon irradiation with radiation and an organic polymer which, upon being formed into a film, changes in its solubility and decreases in solubility in a desired solvent due to the presence of decomposition product of said radiation sensitive compound which is produced by irradiation with the radiation. A process of formation of pattern using said composition is also disclosed. Fine resist pattern of 0.5 .mu.m line-and-space patterns or less can be formed with sufficiently high contrast.Type: GrantFiled: October 21, 1988Date of Patent: January 8, 1991Assignee: Hitachi, Ltd.Inventors: Shouichi Uchino, Takao Iwayanagi, Michiaki Hashimoto
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Patent number: 4942110Abstract: A technique for generating high resolution resistor or conductor patterns on uneven surfaces by focusing a CO.sub.2 laser beam to locally render insoluable suitable thick film resistor or conductor material that has been uniformly coated onto a substrate and oven-dried to remove organic coating solvents. Patterns are generated by scanning the laser beam across the coated substrate, and the coating is hardened and adheres to the substrate where it has been exposed by the laser beam.Type: GrantFiled: August 29, 1988Date of Patent: July 17, 1990Assignee: Xerox CorporationInventors: Frank C. Genovese, Thomas E. Orlowski
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Patent number: 4912019Abstract: A photosensitive ceramic coating composition which is fireable in a substantially nonoxidizing atmosphere comprising an admixture of:(a) finely divided particles of ceramic solids having a surface area-to-weight ration of no more than 10 m.sup.2 /g and at least 80 wt. % of the particles having a size of 1-10 .mu.m, and(b) finely divided particles of an inorganic biner having a glass transition temperature in the range from of 550.degree. to 825.degree. C., a surface area-to-weight ration of no more than 10 m.sup.2 /g and at least 90 wt. % of the particles having a size of 1-10 .mu.m, the weight ratio of (b) to (a) being in a range from 0.6 to 2, dispersed in an organic medium comprising(c) an organic polymeric binder, and(d) a photoinitiation system, dissolved in(e) photohardenable monomer, and(f) an organic mediumwherein the improvement comprises an organic polymeric binder containing a copolymer or interpolymer of a C.sub.1 -C.sub.10 alkyl acrylate, C.sub.1 -C.sub.Type: GrantFiled: May 31, 1988Date of Patent: March 27, 1990Assignee: E. I. Du Pont de Nemours and CompanyInventors: William J. Nebe, James J. Osborne
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Patent number: 4894317Abstract: A method of forming a printed circuit by use of a specified photo-curable coating composition. The photo-curable coating composition is a photo-curable or ionizing radiation-curable powder coating composition containing a thermoplastic resin in a solid state at normal temperature, and having 0.5 to 5 of a polymerizable unsaturated group per 1000 of number average molecular weight, as a film-forming component.Type: GrantFiled: April 1, 1988Date of Patent: January 16, 1990Assignee: Kansai Paint Co., Ltd.Inventors: Tsutomu Maruyama, Tadaaki Satoh
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Patent number: 4879202Abstract: A radiation image storage panel comprising a phosphor layer which comprises a stimulable phosphor, in which said phosphor layer consists essentially of a sintered stimulable phosphor and has a relative density of not less than 70%. Processes for the preparation for the same are also disclosed.Type: GrantFiled: July 13, 1987Date of Patent: November 7, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Yuichi Hosoi, Satoshi Arakawa, Kenji Takahashi
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Patent number: 4876179Abstract: A method for manufacturing piezo-electric ceramic materials having predetermined acoustic impedance, wherein internal cavities are generated by a photolithographic process, utilizing a foil stack of green ceramic foils.Type: GrantFiled: June 10, 1987Date of Patent: October 24, 1989Assignee: Siemens AktiengesellschaftInventors: Ulrich Bast, Wolfram Wersing
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Patent number: 4851320Abstract: A selected pattern of conductor runs is formed on a sheet having a surface layer of dielectric material, by forming an electrostatically charged image of the selected pattern on the surface layer. Toner powder, comprising core particles of conductive material coated with fusible dielectric material, is deposited on the surface layer and is fused to the sheet.Type: GrantFiled: May 23, 1988Date of Patent: July 25, 1989Assignee: Tektronix, Inc.Inventor: William W. Stein
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Patent number: 4847138Abstract: There is disclosed a method of producing a transition metal pattern on a glass or glass-ceramic substrate by selective exudation of a transition metal from a glass substrate containing the metal as an oxide. The selective exudation is effected by applying an intense, well-focused source of energy to a glass in a pattern corresponding to the desired metal pattern. This develops localized heating, and thereby causes corresponding localized metal exudation from the glass. The metal pattern may be rendered electroconductive, and may constitute a pattern of interconnecting lines for microcircuitry.Type: GrantFiled: October 7, 1987Date of Patent: July 11, 1989Assignee: Corning Glass WorksInventors: Elizabeth A. Boylan, Gerald D. Fong
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Patent number: 4828961Abstract: Electronic circuits are made with a ceramic body and electrical components which can be disposed in different layers. Interconnecting means can be provided which are disposed entirely within the body. The ceramic body and the electrical components are sintered to form a monolithic structure in a single firing. The electrical components are formed in layers by mixing the electrical component in a sinterable form with a radiation sensitive material which serves as a binder. After exposure to radiation in the desired pattern the layer is developed to form the desired pattern. Multiple patterns can be formed prior to firing.Type: GrantFiled: July 2, 1986Date of Patent: May 9, 1989Assignee: W. R. Grace & Co.-Conn.Inventors: John W. Lau, Kevin E. Bennet
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Patent number: 4732838Abstract: Patterned glass layers which are defect-free and have smooth surfaces are formed by a method wherein a mixture of glass frit and a photoresist composition is applied to the surface of the substrate; the layer is photolithographically patterned by exposing and developing predetermined areas of the layer; then after development and prior to firing of the glass frit, the layer of material is subjected to treatment with a suitable plasma at a temperature below the thermal decomposition temperature of the photoresist composition to remove the photoresist composition from the portion of the resist layer remaining on the substrate; and then the remainder of the layer, consisting essentially of glass frit, is fired to form a smooth, defect-free, patterned glass layer over the surface of the substrate.Type: GrantFiled: February 11, 1987Date of Patent: March 22, 1988Assignee: General Electric CompanyInventors: Franco N. Sechi, Paul F. Pelka, Katherine E. Pinkerton
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Patent number: 4717641Abstract: A method of passivating exposed junctions on a semiconductor device is provided by the use of fritted glass and a rapid heating device. The uniform distribution of heat from the rapid heating device is used to fire the fritted glass that is covering the exposed junction. The results of this combination is an increase in device yields due to less leakage across the junction.Type: GrantFiled: January 16, 1986Date of Patent: January 5, 1988Assignee: Motorola Inc.Inventors: Emanuel Belmont, Henry G. Hughes
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Patent number: 4650288Abstract: An electrically conductive photoresist electrode is formed by a combination of a photoresist and conductive black powder. This conductive photoresist has the properties of being photosensitive, electrically conductive, and black to avoid reflectivity by the electrode structure, as occurs in display devices.Type: GrantFiled: July 21, 1986Date of Patent: March 17, 1987Assignee: North American Philips CorporationInventor: Roger P. White
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Patent number: 4613560Abstract: A photosensitive ceramic coating composition which is fireable in a substantially nonoxidizing atmosphere comprising an admixture of:(a) finely divided particles of ceramic solids having a particularly defined surface area-to-weight ratio and particle size, and(b) finely divided particles of an inorganic binder having a particularly defined surface area-to-weight ratio and particle size, dispersed in an organic medium comprising(c) an organic polymeric binder and(d) a photoinitiation system, dissolved in(e) photohardenable monomer and(f) an volatile organic solvent.Type: GrantFiled: December 28, 1984Date of Patent: September 23, 1986Assignee: E. I. Du Pont de Nemours and CompanyInventors: Thomas E. Dueber, David H. Scheiber, Howard E. Simmons, III
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Patent number: 4485158Abstract: In a method for preparing a mosaic luminescent screen, islands of dry precoating material are adhered to a glass support surface at the sites of the mosaic parts of the screen. Then, the mosaic parts of the screen are deposited on the islands by the slurry-direct photographic method, including development with a turbulent aqueous developing medium. The use of islands provides the necessary adherence during development of the mosaic parts with a substantial reduction in the amount of precoating that must later be removed.Type: GrantFiled: October 17, 1983Date of Patent: November 27, 1984Assignee: RCA CorporationInventor: Stanley A. Harper
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Patent number: 4454167Abstract: A process for generating high resolution conductive patterns on an insulating substrate. A photosensitive resin coating applied to the surface of a substrate is exposed to a suitable light source through a mask. The unexposed portion of the coating defines the desired conductive pattern which is then coated with a low temperature melting glass powder. The substrate is fired to sinter the glass pattern and fuse it to the substrate. The substrate is then coated with a slurry of fine metal particles suspended in a volatilizable carrier. The substrate is again fired to sinter the metal into a united mass and causing it to fuse only with the low temperature melting glass pattern. The unadhered portions of the metal coating are removed by a washing operation. An exclusively metallic layer is thereby formed on a high resolution glass pattern intermediate layer supported by the substrate.Type: GrantFiled: July 6, 1982Date of Patent: June 12, 1984Assignee: Beckman Instruments, Inc.Inventors: Anthony J. Bernot, Kenneth Brown
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Patent number: 4454168Abstract: Process for preparation of printed circuits by applying particulate metal to tacky image areas, optionally removing excess particulate metal, and contacting the metallized image areas with an aqueous solution comprising cations of a plating metal to accomplish a metal-metal ion displacement reaction, the solution being substantially free of any chemical reducing agent for said cations. Preferably the conductive circuit is electroplated or soldered.Type: GrantFiled: September 29, 1982Date of Patent: June 12, 1984Assignee: E. I. Du Pont de Nemours and CompanyInventor: Herbert L. Fritz
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Patent number: 4430401Abstract: An optical recording medium for use with a recording apparatus of the type that focuses onto the medium, as the medium is moved in a prescribed fashion, a beam of light that is modulated in intensity in accordance with a data signal to be recorded. The recording medium includes a substrate having a smooth, planar upper surface, with a thin light-absorbing coating overlaying the surface, such coating including an explosive material such as nitrocellulose, and a light-absorbing dye. As the medium is moved with respect to the intensity-modulated beam, the explosive coating is selectively energized by the beam to induce spaced explosions threin, whereby corresponding optically readable irregularities, representative of the data signal, are formed in the outer surface of the coating.Type: GrantFiled: May 5, 1980Date of Patent: February 7, 1984Assignee: Discovision AssociatesInventor: Richard L. Wilkinson
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Patent number: 4416974Abstract: A radiation curable printing medium suitable for screen printing on glass, metal and ceramics which is to be cured and subsequently fired, comprising(a) 4 to 25% by weight of a polymerizable, liquid prepolymer containing at least about two ethylenically unsaturated end groups;(b) 4 to 15% by weight of at least one ethylenically unsaturated polymerizable monomer containing a polar functional group;(c) 60 to 90% by weight of a ceramic frit; and(d) 0.02 to 2% by weight of a polymerization inhibitor.Type: GrantFiled: November 5, 1981Date of Patent: November 22, 1983Assignee: Hercules IncorporatedInventor: Bernard J. Scheve
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Patent number: 4343875Abstract: A method of etching a silicon-substrate, wherein a protective layer is formed on the substrate and serves as an etching mask, at least one some areas of the surface of the substrate. A layer of mineral glass, adhering to the substrate, is used for this protective coating. The protective layer can be formed by the application of a mixture containing finely dispersed mineral glass and fixing agents, or a composition which will form mineral glass when heated, to the Si-substrate, by heating the mixture to form a layer of mineral glass adhering to the Si-substrate. If photo-polymerizable components are used in this mixture, the etching mask of glass may be produced by way of photolithography. The invention further includes a Si-substrate provided with a mineral glass protective layer.Type: GrantFiled: June 20, 1980Date of Patent: August 10, 1982Assignee: BBC Brown, Boveri & Company, LimitedInventor: Dieter Spickenreuther
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Patent number: 4336320Abstract: The present invention is directed to a process for complex, high density microcircuits in which thick film dielectric pastes are photolithography patterned into high resolution stencils to produce complementary conductor circuitry patterns, the voids of the developed dielectric stencil are filled with thick film conductor paste, and then there is a cofiring of the conductor and the dielectric. With this new process the number of separate firing operations is reduced. The reduction in the number of firings is important in multilevel hybrid structures.Type: GrantFiled: March 12, 1981Date of Patent: June 22, 1982Assignee: Honeywell Inc.Inventors: John P. Cummings, Janice D. Makos, David E. Pitkanen
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Patent number: 4309495Abstract: Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by exposing and developing a photographic emulsion on a sheet of glass and migrating silver ions from the emulsion into the surface of the glass under the influence of an electric field and moderately elevated temperatures.Type: GrantFiled: October 1, 1979Date of Patent: January 5, 1982Assignee: PPG Industries, Inc.Inventor: Fred M. Ernsberger
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Patent number: 4258086Abstract: A foil laminated board having a pattern formed in the metallic foil is placed in close contact with a metallized substrate such as a metallized plastic film. The two metal surfaces are subjected to a microwave energy field which duplicates or copies the foil pattern on the metallized substrate or film.Type: GrantFiled: December 26, 1979Date of Patent: March 24, 1981Assignee: General Mills, Inc.Inventor: Nelson J. Beall
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Patent number: 4225659Abstract: An orange colored photomask visually transmissive to yellow-orange light formed by heating an exposed and developed silver-halide emulsion coated photomask. At approximately 200.degree. C., black silver in the photomask begins to show evidence of conversion to a transparent red material. At a temperature of 250.degree. C. to 320.degree. C., the black silver opaque images are rapidly converted to orange, visually transmissive images which are essentially opaque to the ultraviolet light used to expose photoresist covered silicon wafers, while clear areas remain clear.Type: GrantFiled: April 10, 1979Date of Patent: September 30, 1980Assignee: Drexler Technology CorporationInventor: Jerome Drexler