Plural, Terminal Unsaturation Patents (Class 430/288.1)
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Patent number: 7371783Abstract: Provided is an alkali-soluble maleimide-based copolymer which comprises, as essential constituents, 5 to 50% by mass of a maleimide monomer unit which is at least one unit selected from the group consisting of a N-cyclohexylmaleimide monomer unit, a N-benzylmaleimide monomer unit and a substituted N-benzylmaleimide monomer unit, 8 to 30% by mass of the (meth)acrylic acid monomer unit and 30 to 87% by mass of a (meth)acrylic acid ester monomer unit and which satisfies the condition represented by the formula: 0.4×X?Y?0.5×X+10 where X is the content, in % by mass, of the N-cyclohexylmaleimide monomer unit, the N-benzylmaleimide monomer unit and the substituted N-benzylmaleimide monomer unit and Y is the content, in % by mass, of the (meth)acrylic acid monomer unit. Also provided are a color filter and a liquid crystal display which are formed by using the ionizing radiation-curable resin composition.Type: GrantFiled: September 24, 2002Date of Patent: May 13, 2008Assignees: Nippon Shokubai Co., Ltd., Dainippon Printing Co., Ltd.Inventors: Masahiro Tatsuzawa, Kiyoshi Ito, Shinji Hayashi, Shunsuke Sega, Tomonobu Sumino, Minoru Yamaguchi, Tomomasa Kaneko, Kenichi Ueda
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Patent number: 7368215Abstract: The present invention provides a radiation sensitive composition suitable for us in on-press developable printing plates. The radiation sensitive composition comprises an initiator system including an onium salt and a radiation absorber. The initiator system is combined with a polymerizable material, and a polymeric binder including polyethylene oxide segments.Type: GrantFiled: May 12, 2003Date of Patent: May 6, 2008Assignee: Eastman Kodak CompanyInventors: Heidi M. Munnelly, Geoffrey Horne, Jianbing Huang
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Patent number: 7338747Abstract: This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.Type: GrantFiled: November 24, 2003Date of Patent: March 4, 2008Assignees: Industrial Technology Research Institute, Chang-Chun Plastics Co., Ltd.Inventors: Tsing-Tang Song, Chih-Shin Chuang, Wei-Chan Tseng, Kuen-Yuan Hwang, Tsung-Yu Chen
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Patent number: 7329478Abstract: To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an undulation phenomenon, and a method for formation of a resist pattern, a chemical amplification type positive photoresist composition comprising (A) an alkali soluble resin comprising a hydroxystyrene constituent unit (a1) and a styrene constituent unit (a2), (B) a crosslinking agent, (C) a photo acid generator, and an organic solvent is prepared and a resist pattern is formed by using the same.Type: GrantFiled: May 20, 2004Date of Patent: February 12, 2008Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yusuke Nakagawa, Shinichi Hidesaka, Kenji Maruyama, Satoshi Shimatani, Masahiro Masujima, Kazuyuki Nitta
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Publication number: 20080020323Abstract: Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer containing a polymerization initiator, a polymerizable ethylenically unsaturated compound, a polymeric binder, and a sensitizing dye, wherein the sensitizing dye is represented by formula (1),Type: ApplicationFiled: July 13, 2007Publication date: January 24, 2008Inventors: Kenji Goto, Toshiyuki Matsumura
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Patent number: 7316883Abstract: A heat-sensitive lithographic printing plate of the present invention, which enables image recording by infrared-ray scanning exposure based on digital data and has excellent on-press developability, high resistance to scumming and a long press life, the heat-sensitive lithographic printing plate having on a support with a hydrophilic surface an image-forming layer made up of microcapsules in which a reactive group-containing hydrophobic compound is enclosed, a light-to-heat converting agent and a water-soluble compound which has a reactive group capable of reacting with the hydrophobic compound and is situated outside the microcapsules.Type: GrantFiled: May 11, 2006Date of Patent: January 8, 2008Assignee: Fujilfilm Corporation, Ltd.Inventor: Toshifumi Inno
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Patent number: 7314698Abstract: The present invention provides a polymerizable composition comprising (A) a compound including a polymerizable unsaturated group and (B) a macromolecular compound including, at a side chain thereof, a structure represented by the following general formula (I): Z?M+??General formula (I) wherein Z? represents COCOO?, COO?, SO3?, or SO2—N?—R where R represents a monovalent organic group and M+ represents an onium cation. The present invention also provides a negative type planographic printing plate precursor responsive to an infrared laser, the precursor being superior in recording sensitivity and printing durability and using the polymerizable compound as a recording layer.Type: GrantFiled: February 10, 2006Date of Patent: January 1, 2008Assignee: FUJIFILM CorporationInventors: Kazuto Shimada, Takahiro Goto
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Patent number: 7306898Abstract: A planographic printing method including: providing a planographic printing plate precursor including a substrate and an image recording layer which is disposed on the substrate and contains (A) an infrared absorber, (B) a polymerization initiator and (C) a polymerizable compound; imagewise exposing the planographic printing plate precursor with an infrared laser; and supplying oil-based ink and an aqueous component to the exposed planographic printing plate precursor without any development treatment, so as to print an image. A region of the planographic printing plate precursor that has not been exposed with an infrared laser is removed during the printing. The polymerizable compound of (C) is represented by the following formula (1): wherein Ar1, R1, Z and n are as defined in the claims and the specification.Type: GrantFiled: February 4, 2005Date of Patent: December 11, 2007Assignee: Fujifilm CorporationInventor: Kazuto Shimada
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Patent number: 7303857Abstract: The present invention provides a photosensitive composition including a compound that generates a radical by application of light or heat, a polymer having a phenyl group substituted with a vinyl group on the side chain, a monomer having two or more phenyl groups substituted with a vinyl group, an infrared absorbing agent, and a compound having at least one carboxylic acid group and a weight average molecular weight of 3,000 or less. Additionally, the invention provides a planographic printing plate precursor including a substrate and a negative recording layer provided on the substrate and containing the above photosensitive composition.Type: GrantFiled: September 24, 2004Date of Patent: December 4, 2007Assignee: Fujifilm CorporationInventor: Takahiro Goto
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Patent number: 7300740Abstract: A lithographic printing plate precursor capable of forming an image without alkali development, comprising a hydrophilic support and a laser-sensitive photopolymerizable layer, wherein the photopolymerizable layer or other layer included in the lithographic printing plate precursor contains a copolymer containing at least a repeating unit having at least one ethylenically unsaturated bond and a repeating unit having at least two functional groups capable of interacting with a surface of the support or a copolymer containing at least a repeating unit having at least two ethylenically unsaturated bonds and a repeating unit having at least one functional group capable of interacting with a surface of the support.Type: GrantFiled: February 27, 2006Date of Patent: November 27, 2007Assignee: Fujifilm CorporationInventors: Sumiaki Yamasaki, Akihiro Endo
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Patent number: 7297460Abstract: A radiation curable ink composition comprising at least one initiator and at least one polyhedral oligomeric silsesquioxane (POSS) represented by the following empirical formula [R(SiO1.5)]n wherein n=4, 6, 8, 10, 12, 14, 16 and larger and each R is independently hydrogen, an inorganic group, an alkyl group, an alkylene group, an aryl group, an arylene group, or non-heterocyclic group-containing organo-functional derivatives of alkyl, alkylene, aryl or arylene groups; and a process for obtaining a colourless, monochrome or multicolour ink jet image comprising the steps of jetting one or more streams of ink droplets having the above-mentioned composition onto an ink-jet ink receiver material, and subjecting the obtained image to radiation curing.Type: GrantFiled: February 9, 2004Date of Patent: November 20, 2007Assignee: Agfa-GevaertInventors: Luc Vanmaele, Johan Loccufier, Roland Claes
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Patent number: 7291438Abstract: There are provided a negative-working photosensitive composition which can be cured by infrared rays and is less likely to suffer polymerization inhibition by oxygen during radical polymerization, and also exhibits high adhesion with a metal, and a negative-working photosensitive lithographic printing plate which is capable of directly forming images by irradiation with infrared rays from a solid or semiconductor laser based on digital signals, and also has high sensitivity and excellent printing durability. The negative-working photosensitive composition contains an infrared absorber (A), an organoboron compound (B) which functions as a polymerization initiator by using in combination with the infrared absorber (A), a compound having a polymerizable unsaturated group (C) and a diazo resin (D), and the negative-working photosensitive lithographic printing plate comprises a support, and a photosensitive layer containing the negative-working photosensitive composition formed on the support.Type: GrantFiled: June 17, 2004Date of Patent: November 6, 2007Assignee: Eastman Kodak CompanyInventors: Hideo Sakurai, Eiji Hayakawa
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Patent number: 7291444Abstract: The present invention relates to a photosensitive ceramic composite and a method for manufacturing a multilayer substrate using the composite. The photosensitive ceramic composite and manufacturing method of the present invention are applicable to circuit members and components for ceramic multilayer substrates for high-frequency wireless communication. The photosensitive ceramic composite contain inorganic particles and a photo sensitive organic components. The inorganic particles have at least surface sections containing an inorganic material having a refractive index less than that of inner sections of the inorganic particles.Type: GrantFiled: October 28, 2002Date of Patent: November 6, 2007Assignee: Toray Industries, Inc.Inventors: Tomoya Yamashiki, Takenori Ueoka, Mitsuyo Shimba
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Patent number: 7285375Abstract: Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.Type: GrantFiled: May 31, 2004Date of Patent: October 23, 2007Assignee: Konica Minolta Medical & Graphic, Inc.Inventors: Toshiyuki Matsumura, Norio Miura
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Patent number: 7282323Abstract: Disclosed is a negative type photosensitive resin composition comprising (A) a polyamide having a photopolymerizable unsaturated double bond, (B) a monomer having a photopolymerizable unsaturated double bond, (C) a photopolymerization initiator and (D) a melamine resin.Type: GrantFiled: July 10, 2003Date of Patent: October 16, 2007Assignee: Asahi Kasei EMD CorporationInventors: Ryuichiro Kanatani, Masashi Kimura, Kimiyuki Maruyama
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Patent number: 7282322Abstract: A novel photoimageable system for a two-chemistry system containing liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and an aluminum salt compound is disclosed. The photoimageable system has high dynamic range (M/#) and sensitivity and unexpectedly high temperature and high humidity resistance. The photoimageable system retains its dynamic range when exposed to 60° C. for 4 weeks while a composition without the aluminum salt compound lost 75% of its dynamic range under similar exposure conditions. In one embodiment, 2-10 weight % of a thio-butylacrylate dissolved in a two-component urethane matrix containing 0.002 to 1 weight % of the aluminum salt compound showed a dynamic range of greater than 5 for a 200 microns thick sample and retained more than 80% of the dynamic range after 4 weeks exposure at 60° C.Type: GrantFiled: May 29, 2003Date of Patent: October 16, 2007Inventors: Songvit Setthachayanon, Xuan T. Phan, Mark David Michaels, Benjamin C. Ihas
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Patent number: 7270938Abstract: Disclosed is a photopolymerizable composition containing an addition-polymerizable ethylenically unsaturated compound, a photopolymerization initiator, a polymer binder, and a sensitizing dye represented by the following formula (A), wherein R1, R2, R3, R4, R5 and X are as defined in the specification.Type: GrantFiled: January 3, 2006Date of Patent: September 18, 2007Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Keiko Ishidai
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Patent number: 7261996Abstract: The present invention provides a halogen-free dry film photosensitive resin composition, which comprises (a) 10˜60 wt % of at least two kinds of acrylic resins having unsaturated carboxylic acid monomers as polymerized units; (b) 5˜20 wt % of a photosensitive resin having at least two (meth)acrylate groups; (c) 0.1˜15 wt % of a photoinitiator; and (d) 0.5˜20 wt % of a thermo-curing agent. The resin composition of the invention is suitable for use as a photoresist in the process of producing printed circuit boards. The resin composition of the invention is particularly suitable for use in the surface of printed circuit boards or semiconductor packages as a protective dry film solder mask.Type: GrantFiled: January 26, 2006Date of Patent: August 28, 2007Assignee: Eternal Chemical Co., Ltd.Inventor: Feng-Yi Wang
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Patent number: 7252922Abstract: A negative-type image recording material comprising a support having a rear surface and an image recording layer disposed on the support, the image recording layer having a front surface and including (A) a radical-generating agent and (B) a radically polymerizable compound, wherein a static friction coefficient between the front surface and the rear surface is less than 0.50. In order to achieve such a specified static friction coefficient, it is preferable that the image recording layer contains (D) a compound represented by the following formula (1): R1—X ??(1) wherein R1 represents an optionally substituted hydrocarbon group having a total of 8 to 32 carbon atoms, and X represents CO—Y—R2, NH—CO—NH—R2, SO2—Y—R2, or Y—R3 in which Y represents O, S, NR4 or a single bond.Type: GrantFiled: March 21, 2002Date of Patent: August 7, 2007Assignee: Fujifilm CorporationInventors: Keitaro Aoshima, Kei Kikuchi
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Patent number: 7241557Abstract: A composition that is photopolymerizable upon absorption of light in the wavelength range from 300 to 450 nm, the composition comprising a binder, a polymerizable compound, a sensitizer and a photoinitiator, wherein the sensitizer is a fluorene compound that is conjugated via a double or triple bond with an aromatic or heteroaromatic group, and is characterized by a high sensitivity.Type: GrantFiled: July 29, 2005Date of Patent: July 10, 2007Assignee: Agfa Graphics NVInventors: Alexander Williamson, Paul Callant
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Patent number: 7232637Abstract: Disclosed are mesophasic optical articles, methods of making mesophasic articles and methods of using mesophasic articles. In particular, this invention relates to mesophasic optical articles that can be prepared in situ with out the need of calcination, sintering, solvent evaporation, or other common method.Type: GrantFiled: September 1, 2004Date of Patent: June 19, 2007Assignee: Inphase Technologies, Inc.Inventors: Michael C. Cole, Timothy J. Trentler
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Patent number: 7232650Abstract: A method for making an inorganic structure including: (a) applying a photoreactive composition to a substrate, wherein the composition includes: a reactive species, a photoinitiator system, and a plurality of substantially inorganic colloidal particles, wherein the particles have an average particle size of less than about 300 nm; (b) photopatterning the composition to define a structure; and (c) subjecting the structure to elevated temperature for a time sufficient to pyrolyze the reactive species and to at least partially fuse the particles.Type: GrantFiled: October 2, 2002Date of Patent: June 19, 2007Assignee: 3M Innovative Properties CompanyInventors: Catherine A. Leatherdale, Craig R. Schardt, D. Scott Thompson, Wendy L. Thompson
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Patent number: 7229741Abstract: A novel liquid photoreactive asymmetric acrylate compound containing sulfur, aromatic moieties, and optionally bromine, and having high dynamic range sensitivity is disclosed. The acrylate compound is a monomer for a photoimageable system. In one embodiment, when about 2–8% by weight of the acrylate compound is dissolved in a two-component urethane matrix system and incorporated in an optical article formed by reacting the two-component urethane matrix system, the optical article shows a sensitivity of about 4 or more and a shrinkage during the formation of the optical article of about 0.05% versus a sensitivity of 2.26 and a shrinkage of 0.13% when tribromophenyl acrylate, a commercial monomer, was used.Type: GrantFiled: May 29, 2003Date of Patent: June 12, 2007Assignee: InPhase Technologies, Inc.Inventors: Songvit Setthachayanon, Xuan T. Phan, Mark David Michaels, Benjamin C. Ihas
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Patent number: 7229737Abstract: Disclosed is a photopolymerizable composition containing a polymerizable compound having an addition-polymerizable unsaturated bond, an organic dye, and an organoboron compound represented by the following general formula (I), wherein at least one kind of the organoboron compound is included and the proportion thereof is one mole or more per mole of the organic dye B?R)4X?.Type: GrantFiled: June 29, 2001Date of Patent: June 12, 2007Assignee: Fujifilm CorporationInventors: Yuuichi Fukushige, Shintaro Washizu
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Patent number: 7220529Abstract: A photopolymerizable composition comprising at least a polymerizable compound having an ethylenically unsaturated bond, a photo-radical generator, and an amine compound represented by the following Formula (I): wherein R1 and R2 independently represent an optionally substituted aliphatic group, or may be bound to each other to form a ring, A represents an optionally substituted divalent aliphatic linking group, or may be bound to R1 or R2 to form a ring, B represents an optionally substituted divalent linking group selected from an amide linkage, a sulfonamide linkage and an ester linkage, or may be bound to R1 or R2 to form a ring, and Ar represents an optionally substituted aromatic group.Type: GrantFiled: February 18, 2005Date of Patent: May 22, 2007Assignee: Fujifilm CorporationInventor: Hirotaka Matsumoto
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Patent number: 7217489Abstract: A negative-type planographic printing plate having, disposed on a support, a recording layer comprising an image recording material which contains an infrared ray absorbing agent and can be recorded by irradiation with an infrared ray, in which, as for the infrared ray absorbing agent comprising a cyanine dye, at least one of substituents on nitrogen atoms at both ends was selected from the group consisting of the following substituents: —C(?X)R1; —C(?X)NR2R3; —CH?CR4R5; —C?CR6; —CHR7R8;—CR9R10R11; and —Ar, wherein X represents O, S or Se; R1 to R6 each independently represent H or a hydrocarbon group having 20 or fewer carbon atoms which may have a substituent; R7 to R11 each independently represent a hydrocarbon group having 20 or fewer carbon atoms which may have a substituent; and Ar represents an aromatic group which may have a substituent.Type: GrantFiled: March 18, 2003Date of Patent: May 15, 2007Assignee: Fujifilm CorporationInventors: Yukio Abe, Kazuto Shimada
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Patent number: 7214471Abstract: The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 ?m in an uncured state has a 365 nm radiation transmittance of not less than 10% and a 405 nm radiation transmittance of not less than 60%, contains the radiation-sensitive radical polymerization initiator (C) in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and has a dry film thickness of not less than 50 ?m. According to the photosensitive resin film, a high bump having a height of not less than 50 ?m can be readily formed on a chip substrate with high precision though formation of such a high bump is difficult by the conventional technique. Moreover, connection failure of an element can be inhibited, and reliability of an element can be enhanced.Type: GrantFiled: March 25, 2004Date of Patent: May 8, 2007Assignee: JSR CorporationInventors: Shin-ichiro Iwanaga, Tooru Kimura, Kouji Nishikawa
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Patent number: 7198884Abstract: The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 ?m and optionally laminate a protective film onto the photocurable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20–90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.Type: GrantFiled: July 1, 2003Date of Patent: April 3, 2007Assignee: Ciba Specialty Chemicals Corp.Inventors: Hidetaka Oka, Masaki Ohwa, James Philip Taylor
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Patent number: 7195861Abstract: A method for making a heat-sensitive negative-working lithographic printing plate precursor is disclosed comprising the steps of (i) preparing a coating solution comprising hydrophobic thermoplastic polymer particles and a hydrophilic binder; (ii) applying said coating solution on a support having a hydrophilic surface or which is provided with a hydrophilic layer, thereby obtaining an image-recording layer; (iii) drying said image-recording layer; characterized in that said hydrophobic thermoplastic polymer particles have an average particle size in the range from 45 nm to 63 nm, and that the amount of said hydrophobic thermoplastic polymer particles in the image-recording layer is at least 70% by weight relative to the dried image-recording layer.Type: GrantFiled: June 30, 2005Date of Patent: March 27, 2007Assignee: AGFA-GevaertInventors: Joan Vermeersch, Dirk Kokkelenberg, Huub Van Aert
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Patent number: 7195857Abstract: A resist curable resin material composed mainly of a curable prepolymer (for example, a photocurable resin material comprising a photosensitive prepolymer having an ethylenically unsaturated terminal group originating in an acrylic monomer (A), a compound having an ethylenically unsaturated group excluding the photosensitive prepolymer (B), and a photopolymerization initiator (C)) and a flame-retarding agent containing a hydrated metal compound and a brominated epoxy compound are mixed to produce a resist curable resin composition. Alternatively, the resist curable resin material described above and a hydrated metal compound surface-treated with a surface treating agent having an amphipathic property and a polarity are mixed to produce a resist curable resin composition.Type: GrantFiled: June 28, 2002Date of Patent: March 27, 2007Assignee: Showa Denko K.K.Inventors: Kenji Tamura, Motoyuki Hirata, Eikichi Kogure, Kenichi Yamada
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Patent number: 7192688Abstract: A composition comprising a polymer according to Structure 1 wherein R is H, Me, Et or C6H5; R? is H or Me; R? is H or Me; n=1 to 100; and Z=1 to 3, is disclosed. The composition can be cured and used in a wide range of articles such as a photopolymer printing plate, sealant, caulk, encapsulent, road marking paint, photoresist, binder, impact modifier, polymer modifier, oxygen or water vapor barrier coating, conformal coating, solder mask, pigment dispersion, stereolithograph, laminating resin, grafted co-polymer, composite, optical fiber coating, paper coating, metal coating, glass coating, plastic coating, wood coating, waterproofing material, electrical insulating material, automotive belt or hose, tire, engine mount, gasket, golf ball core, and rubber roll.Type: GrantFiled: September 10, 2004Date of Patent: March 20, 2007Assignee: Sartomer Technology, Inc.Inventors: Jeffrey A. Klang, Yuhong He, Gary W. Ceska, James P. Horgan
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Patent number: 7192693Abstract: In one aspect, the invention provides methods for forming a photopatterned hydrogel. In some embodiments, the methods comprise the step of exposing a solution comprising a monomer, a crosslinking agent, and a photoinitiator to a pattern of light comprising a first and a second light intensity for a period of time and under suitable conditions for the first light intensity to induce essentially complete conversion of polymerizable groups on the monomer and the crosslinking agent to form a patterned hydrogel, and for the second light intensity to induce partial conversion of the polymerizable groups on the monomer and the crosslinking agent to form partially polymerized polymers that remain soluble. In some embodiments, the first light intensity is lower than the second light intensity. In another aspect, the invention provides methods for forming porous, photopatterned hydrogels.Type: GrantFiled: February 24, 2005Date of Patent: March 20, 2007Assignee: University of WashingtonInventors: Stephanie J. Bryant, Kip D. Hauch, Buddy D. Ratner
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Patent number: 7172851Abstract: Disclosed is a light sensitive composition comprising an addition polymerizable ethylenically unsaturated monomer A), a photopolymerization initiator B), a polymer binder C), and a cation-polymerization compound D), wherein the photopolymerization initiator D) is an iron-arene complex.Type: GrantFiled: April 30, 2004Date of Patent: February 6, 2007Assignee: Konica Minolta Medical & Graphic, Inc.Inventors: Kazuhiko Hirabayashi, Norio Miura, Toshiyuki Matsumura
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Patent number: 7172847Abstract: The present invention provides a planographic printing plate precursor comprising a substrate and a negative image recording layer provided on the substrate containing: a compound that generates a radical or an acid by light or heat; a polymerizable compound or a crosslinking compound; and an infrared ray absorbing agent, wherein a dynamic friction coefficient of the outermost surface of the planographic printing plate precursor, at the side of the negative image recording layer being provided toward an inserting paper inserted into between the planographic printing plate precursors when the planographic printing plate precursors are laminated, is within a range from 0.2 to 0.7, as well as a planographic printing plate precursor laminate comprising the pluralty of the planographic printing plate precursors and inserting paper.Type: GrantFiled: March 28, 2003Date of Patent: February 6, 2007Assignee: Fuji Photo Film Co., Ltd.Inventor: Takahiro Goto
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Patent number: 7166412Abstract: A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive group. The photosensitive metal nanoparticles can easily form a conductive film or pattern having excellent conductivity upon exposure to UV, and thus can be applied for antistatic washable sticky mats or shoes, conductive polyurethane printer rollers, electromagnetic interference shielding, etc.Type: GrantFiled: December 15, 2003Date of Patent: January 23, 2007Assignee: Samsung Electronics Co., Ltd.Inventors: Jong Jin Park, Eun Jeong Jeong, Sang Yoon Lee
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Patent number: 7153627Abstract: A negative-working CTP plate which is superior in resolution and printing resistance of the image area of a press plate is provided, which is obtained by forming a latent image on a heat-sensitive layer in a heat-sensitive lithographic printing plate comprising a substrate having a hydrophilic surface and a heat-sensitive layer made of an alkali-soluble polymer formed on the surface of the substrate, using heat generated upon irradiation with laser light, and developing the heat-sensitive layer using an alkaline developing solution. In the heat-sensitive lithographic printing plate comprising a substrate having a hydrophilic surface, and a heat-sensitive layer made of an alkali-soluble polymer formed on the surface of the substrate, an advancing contact angle (?f1) of the surface of the heat-sensitive layer with water at 25° C. is within a range from 70° to 110°, a receding contact angle (?b2) of the surface of the heat-sensitive layer with water at 25° C. after heating at 150° C.Type: GrantFiled: September 12, 2003Date of Patent: December 26, 2006Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Yasuyuki Watanabe, Naohito Saito, Hisatomo Yonehara, Yasuyuki Suzuki
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Patent number: 7153631Abstract: There are disclosed a photosensitive resin composition which comprises (A) a polyamic acid having recurring units represented by the formula (I): ?wherein R1 represents and R2 represents a divalent organic group, and (B) an acryl compound having an amino group, and also a photosensitive resin composition for an i-line stepper which further comprises a photoinitiator in addition to the photosensitive resin composition.Type: GrantFiled: November 17, 2003Date of Patent: December 26, 2006Assignee: Hitachi Chemical Co., Ltd.Inventors: Hideo Hagiwara, Makoto Kaji, Masataka Nunomura
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Patent number: 7150958Abstract: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.Type: GrantFiled: June 4, 2002Date of Patent: December 19, 2006Assignee: Ciba Specialty Chemicals CorporationInventor: Michael Heneghan
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Patent number: 7141355Abstract: A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein: the alkali-soluble resin having an unsaturated group (A) is obtained by reacting: 100 parts by weight of a copolymer comprising 1 to 40 wt % structural units derived from (a) a radically polymerizable compound having a carboxyl group; 1 to 50 wt % structural units having a phenolic hydroxyl group which are derived from (b-1) a radically polymerizable compound having a phenolic hydroxyl group or (b-2) a radically polymerizable compound having a functional group convertible into a phenolic hydroxyl group after the copolymerization, other structural units of said copolymer being derived from (c) another radically polymerizable compound; with 0.1 to 20 parts by weight of (d) a radically polymerizable compound having an epoxy group.Type: GrantFiled: December 13, 2002Date of Patent: November 28, 2006Assignee: JSR CorporationInventors: Shin-ichiro Iwanaga, Satoshi Iwamoto, Tooru Kimura, Hiroko Nishimura, Koji Nishikawa
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Patent number: 7132216Abstract: An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.Type: GrantFiled: October 20, 2003Date of Patent: November 7, 2006Assignee: Brewer Science Inc.Inventors: Xie Shao, Robert Cox, Shreeram V. Deshpande, Tony D. Flaim, Rama Puligadda
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Patent number: 7122294Abstract: Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high acid strength, low volatility and low diffusivity. The present invention further relates to photoacid generators as they are used in photoinitiated or acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.Type: GrantFiled: May 22, 2003Date of Patent: October 17, 2006Assignee: 3M Innovative Properties CompanyInventor: William M. Lamanna
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Patent number: 7101649Abstract: A heat-sensitive lithographic printing plate of the present invention, which enables image recording by infrared-ray scanning exposure based on digital data and has excellent on-press developability, high resistance to scumming and a long press life, the heat-sensitive lithographic printing plate having on a support with a hydrophilic surface an image-forming layer made up of microcapsules in which a reactive group-containing hydrophobic compound is enclosed, a light-to-heat converting agent and a water-soluble compound which has a reactive group capable of reacting with the hydrophobic compound and is situated outside the microcapsules.Type: GrantFiled: February 13, 2004Date of Patent: September 5, 2006Assignee: Fuji Photo Film Co., Ltd.Inventor: Toshifumi Inno
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Patent number: 7101650Abstract: The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate copolymer obtained by selectively using specific compounds or controlling the ratio of unreacted monomers, and a 1,2-quinonediazide compound, which is excellent in several performance factors such as dielectric characteristics, flatness, transparency, developing performance, residual film rate, chemical resistance, and heat resistance, as well as sensitivity and resolution, and in particular it facilitates easy pattern formation into interlayer dielectrics, and it can be used as a photoresist in an LCD manufacturing process due to its excellent transmissivity even when prepared as a thick film.Type: GrantFiled: August 20, 2002Date of Patent: September 5, 2006Assignee: Dongjin Semichem Co., Ltd.Inventors: Byung-Uk Kim, Joon-Yeon Cho, Kyong-Il Kwon, Soo-Jung Park, Jae-Won Yoo
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Patent number: 7101653Abstract: A laser-engravable flexographic printing element comprising an elastomeric, relief-forming, laser-engravable, thermally and/or photochemically crosslinkable layer comprising, as binder, at least 5% by weight of syndiotactic 1,2-polybutadiene having a content of 1,2-linked butadiene units of from 80 to 100%, a degree of crystallinity of from 5 to 30% and a mean molecular weight of from 20,000 to 300,000 g/mol on a flexible, dimensionally stable support. The elastomeric, relief-forming, laser-engravable layer preferably comprises: (a) from 50 to 99.9% by weight of one or more binders as component A consisting of (a1) from 5 to 100% by weight of syndiotactic 1,2-polybutadiene having a content of 1,2-linked butadiene units of from 80 to 100%, a degree of crystallinity of from 5 to 30% and a mean molecular weight of from 20,000 to 300,000 g/mol as component A1, and (a2) from 0 to 95% by weight of further binders as component A2, (b) from 0.Type: GrantFiled: April 15, 2002Date of Patent: September 5, 2006Assignee: XSYS Print Solutions Deutschland GmbHInventors: Jürgen Kaczun, Jens Schadebrodt, Margit Hiller
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Patent number: 7090957Abstract: The present invention provides a polymerizable composition comprising (A) a compound including a polymerizable unsaturated group and (B) a macromolecular compound including, at a side chain thereof, a structure represented by the following general formula (I). The present invention also provides a negative type planographic printing plate precursor responsive to an infrared laser, the precursor being superior in recording sensitivity and printing durability and using the polymerizable compound as a recording layer. General Formula (I) Z?M+ wherein Z? represents COCOO?, COO?, SO3? or SO2—N?—R where R represents a monovalent organic group and M30 represents an onium cation.Type: GrantFiled: September 10, 2003Date of Patent: August 15, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuto Shimada, Takahiro Goto
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Patent number: 7087357Abstract: A photoreactive resin composition contains (a) a powdered base metal, (b) an organic binder, (c) a photosensitive organic component, and (d) a polycarboxylic acid-based dispersing agent with a molecular weight of about 1,500 or less. Also disclosed is a method for making a circuit substrate or a ceramic multilayer substrate including the step of forming a conductive pattern using the photoreactive resin composition.Type: GrantFiled: January 6, 2004Date of Patent: August 8, 2006Assignee: Murata Manufacturing Co., Ltd.Inventor: Masahiro Kubota
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Patent number: 7074546Abstract: Disclosed are a light sensitive planographic printing plate precursor and its processing method, the precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing a compound represented by the following formula (1) or (2) and a compound represented by the following formula (3) or (4):Type: GrantFiled: May 22, 2003Date of Patent: July 11, 2006Assignee: Konica CorporationInventor: Kazuhiko Hirabayashi
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Patent number: 7071243Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can give a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.Type: GrantFiled: May 20, 2004Date of Patent: July 4, 2006Assignee: Hitachi Chemical Company, Ltd.Inventors: Kuniaki Sato, Hiroaki Hirakura, Toshihiko Ito, Takao Hirayama, Toshizumi Yoshino
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Patent number: 7063936Abstract: A polymerizable composition comprising; a dendrimer having at least two polymerizable groups within a molecule; a radical initiator; and an alkali-soluble polymer, and an image recording material comprising a support and a recording layer comprising a polymerizable composition containing a dendrimer having at least two polymerizable groups within a molecule, a radical initiator and an alkali-soluble polymer.Type: GrantFiled: October 7, 2004Date of Patent: June 20, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Ryuki Kakino, Kazuto Kunita
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Patent number: 7052822Abstract: The present invention provides an infrared photosensitive composition including a binder polymer (A), a polymerizable compound (B), an infrared absorber (C), and a compound (D) which can generate radicals by the action of light or heat, wherein an acid value of a film produced from the composition is from 0.15 mmol/g to 0.8 mmol/g. The invention also provides a planographic printing plate precursor including a substrate having disposed thereon a recording layer that contains the infrared photosensitive composition.Type: GrantFiled: September 25, 2003Date of Patent: May 30, 2006Assignee: Fuji Photo Film Co., Ltd.Inventor: Takahiro Goto
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Patent number: 5125837Abstract: An apparatus for scaling of teeth and lavage of the gingival sulcus is provided. The apparatus comprises a base unit which contains reservoirs for the medicaments used in the lavage procedure, and a handpiece connected to the base unit by a conduit, which contains an insert for scaling of teeth. Switches on the base unit and a footswitch make it possible for the practitioner to use the apparatus for scaling only, lavage only, or for simultaneous lavage and scaling.Type: GrantFiled: August 7, 1990Date of Patent: June 30, 1992Assignee: Dentsply Management Corp.Inventors: George E. Warrin, Rene J. Perdreaux