Filters Ultraviolet Radiation Patents (Class 430/512)
  • Patent number: 6410209
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
    Type: Grant
    Filed: September 15, 1998
    Date of Patent: June 25, 2002
    Assignee: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III
  • Patent number: 6399290
    Abstract: Compounds suitable for use as acutance, antihalation and filter dyes in silver halide imaging materials having a nucleus represented by a compound comprising a nucleus represented by one of the following general formulae (I) and (II): in which; A and B independently represent those non-metallic atoms necessary to complete a neutral heterocyclic ring in which at least one ring atom is nitrogen, R represents hydrogen or an alkyl group, and Y represents a divalent aliphatic linking group.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: June 4, 2002
    Assignee: Eastman Kodak Company
    Inventors: Andrew W. Mott, Kevin P. Hall
  • Publication number: 20020064733
    Abstract: A photographic film having a long wavelength (LW) filter is disclosed. The LW filter is capable of blocking substantially all light in the infra-red (IR) portion of the light spectrum. In at least one embodiment, the LW filter is further capable of transmitting light in the visible part of the light spectrum. A LW filter may be placed in various positions on a photographic film, and/or included in one of a photographic film's emulsion layers.
    Type: Application
    Filed: March 9, 2001
    Publication date: May 30, 2002
    Inventor: Lorin C. Nash
  • Patent number: 6395463
    Abstract: The invention relates to a method of recording multiple images by providing an integral, lenticular, multilayer, color photographic element comprising a red light sensitive layer comprising a cyan dye forming coupler, a green light sensitive layer comprising a magenta dye forming coupler, a blue light sensitive layer comprising a yellow dye forming coupler, and an antihalation layer.
    Type: Grant
    Filed: May 26, 1999
    Date of Patent: May 28, 2002
    Assignee: Eastman Kodak Company
    Inventor: James L. Edwards
  • Publication number: 20020061480
    Abstract: The invention provides a photographic element comprising at least one light-sensitive silver halide emulsion layer having associated therewith at least one cyan dye-forming coupler, UV absorber and
    Type: Application
    Filed: August 21, 2001
    Publication date: May 23, 2002
    Applicant: Eastman Kodak Company
    Inventor: Danuta Gibson
  • Publication number: 20020061473
    Abstract: A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing a diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.
    Type: Application
    Filed: November 9, 2001
    Publication date: May 23, 2002
    Inventors: Jianhui Shan, Shuji Ding, Eleazar B. Gonzalez, Dinesh N. Khanna
  • Publication number: 20020048733
    Abstract: The present invention provides a silver halide color photographic photosensitive material having superior image sharpness and film strength. Disclosed is a silver halide color photographic photosensitive material in which a yellow-developing photosensitive silver halide emulsion layer on a support contains at least one dye-forming coupler represented by the following general formula (Y-1), and at least one layer of the non-photosensitive hydrophilic colloid layers on the support contains a dispersion of solid particles of a dye represented by the following general formula [I]. In the general formula (Y-1), Y represents a nitrogen-containing heterocycle; Z represents a substituted aryl group; X represents a hydrogen atom, or a group that leaves by the reaction with an oxidized form of a developing solution. In the general formula [I], D represents a residue of a compound having a chromophoric group; X represents a dissociative hydrogen atom or a group having a dissociative hydrogen atom.
    Type: Application
    Filed: March 12, 2001
    Publication date: April 25, 2002
    Inventors: Hidekazu Sakai, Yasuhiro Shimada
  • Patent number: 6376160
    Abstract: The present invention relates to photographic elements having a protective overcoat that resists fingerprints, common stains, and spills. The overcoat comprises an epoxy material, an acid polymer, and a water-soluble hydrophilic binder. In one embodiment, a photographic element includes a support, at least one silver halide emulsion layer superposed on the support and a processing-solution-permeable overcoat overlying the silver halide emulsion layer that becomes water-resistant in the final product without requiring lamination or fusing. The present invention is also directed to a method of making a print involving developing the photographic element.
    Type: Grant
    Filed: October 30, 2000
    Date of Patent: April 23, 2002
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Kevin M. O'Connor, Melvin M. Kestner, James L. Bello
  • Patent number: 6368781
    Abstract: The invention relates to a photographic element comprising a support and a silve halide emulsion layer wherein the silver halide emulsion contains at least one absorber dye and at least one sensitizing dye. The wavelength of maximum absorbance of said absorber dye and the wavelength of maximum sensitivity of the emulsion provided by the spectral sensitizing dye are substantially the same. The emulsion is chemically sensitized with a stable and water soluble AuI) complex. This provides manufacturing improvements, improved detail and sharpness, improved dodging and burning and lower cost without an unwanted increase in heat sensitivity.
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: April 9, 2002
    Assignee: Eastman Kodak Company
    Inventors: Pamela M. Ferguson, Roger Lok, Alton L. Chitty, Norman R. Oneal
  • Patent number: 6365333
    Abstract: An antireflective coating (ARC) or antireflective layer (ARL) is interposed between a photoresist layer and an underlying substrate. The ARC includes an optically absorptive polysilicon germanium or polysilicon first layer, deposited by low pressure chemical vapor deposition (LPCVD). An optically transmissive second layer is grown on the first layer by oxidizing it at low temperature. The low temperature oxidation accurately controls the thickness, and optical impedance, of the second layer. The optical impedances of the second and photoresist layers are matched for minimizing reflections and reducing photolithographic limitations such as swing effect and reflective notching. The low temperature oxidation is compatible with low thermal budget layers (e.g., aluminum or other metals), which are typically highly reflective at ultraviolet (UV) and deep ultraviolet (DUV) lithographic exposure wavelengths.
    Type: Grant
    Filed: July 17, 2001
    Date of Patent: April 2, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Leonard Forbes, Kie Y. Ahn
  • Publication number: 20020037483
    Abstract: A polyester film is disclosed comprising on its upper side a latex subbing layer, and a gelatin subbing layer which contains a black spacing agent. This polyester film can be advantageously used as support for several imaging elements, such as photographic materials, (photo)thermographic materials, and ink jet recording elements.
    Type: Application
    Filed: June 26, 2001
    Publication date: March 28, 2002
    Inventors: Roland Claes, Etienne Van Thillo
  • Publication number: 20020031735
    Abstract: The present invention refers to photographic elements having, coated on a support base, at least one silver halide emulsion layer sensitized to a radiation different from the blue one in addition to its intrinsic sensitivity to the blue region, and a yellow filter layer positioned between said at least one silver halide emulsion layer and the exposure source, where such yellow filter layer contains a yellow filtering dye represented by the formula (1): 1
    Type: Application
    Filed: June 8, 2001
    Publication date: March 14, 2002
    Applicant: Ferrania, S.P.A.,
    Inventors: Piero Cavalleri, Raffaella Biavasco, Stefano Parodi
  • Patent number: 6355400
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: March 12, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Publication number: 20020028413
    Abstract: A method for forming a dispersion of an oil-soluble photographically useful compound in water or a hydrophilic colloid composition is disclosed, comprising dispersing the compound in the presence of a water-soluble anionic group containing polymeric surfactant, wherein the polymeric surfactant comprises a copolymer obtained from the copolymerization of a maleic anhydride monomer and a copolymerizable ethylenically unsaturated hydrophobic monomer and the anionic groups of the polymeric surfactant comprise primarily carboxy groups obtained upon base hydrolysis of the anhydride groups of the copolymer. The use of hydrolyzed maleic anhydride derived copolymers in place of conventional small-molecule surfactants as a dispersing agent to stabilize photographically active water-insoluble dye couplers or other organic oil-soluble photographically useful compounds enables a dramatic reduction of crystallization of such organic molecules on long-term keeping.
    Type: Application
    Filed: September 5, 2001
    Publication date: March 7, 2002
    Applicant: Eastman Kodak Company
    Inventors: Julia S. Tan, Kurt M. Schroeder, Delaina A. Amos
  • Patent number: 6348591
    Abstract: This invention relates generally to red-shifted trisaryl-1,3,5-triazines and the use thereof to protect against degradation by environmental forces, inclusive of ultraviolet light, actinic radiation, oxidation, moisture, atmospheric pollutants and combinations thereof. The new class of trisaryl-1,3,5-triazines comprises an aryl ring attached to the triazine ring [and preferably an aryl ring containing a hydroxyl group, either free or blocked to form a latent stabilizer, ortho- to the point of attachment to the triazine ring (2-position) and a hydroxyl group or a moiety joined by an ether linkage para- to the point of attachment to the triazine ring (4-position)] substituted at the 3-position or disubstituted at the 3- and 5-positions with a group comprising an amide and/or an amine. These materials may be incorporated into formulations comprising coatings, polymers, resins, organic compounds and the like.
    Type: Grant
    Filed: June 18, 1999
    Date of Patent: February 19, 2002
    Assignee: Cytec Technology Corp.
    Inventors: Ram Baboo Gupta, Dennis John Jakiela
  • Patent number: 6346353
    Abstract: The present invention relates to imaged elements having a protective overcoat that resists fingerprints, common stains, and spills. In particular, an overcoat composition comprising water-dispersible epoxy-functional particles is coated over an imaging element, including photographic elements and recording media. In one embodiment, a photographic element includes a support, at least one silver halide emulsion layer superposed on the support and a processing-solution-permeable protective overcoat overlying the silver halide emulsion layer that, after fusing, becomes water-resistant in the final product. The present invention is also directed to a method of making a print involving developing the photographic element and subsequently fusing the overcoat.
    Type: Grant
    Filed: October 30, 2000
    Date of Patent: February 12, 2002
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Kevin M. O'Connor, Tiecheng A. Qiao
  • Patent number: 6346361
    Abstract: A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing an diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.
    Type: Grant
    Filed: October 6, 1999
    Date of Patent: February 12, 2002
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Jianhui Shan, Shuji Ding, Eleazar B. Gonzalez, Dinesh N. Khanna
  • Publication number: 20020015929
    Abstract: The invention is directed to a process for modifying a water soluble polymer, said process comprising
    Type: Application
    Filed: July 3, 2001
    Publication date: February 7, 2002
    Inventors: Sebastianus Gerardus J. M. Kluijtmans, Jan Bastiaan Bouwstra, Yuzo Toda
  • Publication number: 20020009656
    Abstract: This invention comprises dispersion comprising a solvent having dispersed therein a liquid-crystal forming dye of structural Formula I:
    Type: Application
    Filed: January 12, 2001
    Publication date: January 24, 2002
    Applicant: Eastman Kodak Company
    Inventors: Margaret J. Helber, William J. Harrison, Raymond P. Scaringe
  • Publication number: 20010046647
    Abstract: An antireflective coating (ARC) or antireflective layer (ARL) is interposed between a photoresist layer and an underlying substrate. The ARC includes an optically absorptive polysilicon germanium or polysilicon first layer, deposited by low pressure chemical vapor deposition (LPCVD). An optically transmissive second layer is grown on the first layer by oxidizing it at low temperature. The low temperature oxidation accurately controls the thickness, and optical impedance, of the second layer. The optical impedances of the second and photoresist layers are matched for minimizing reflections and reducing photolithographic limitations such as swing effect and reflective notching. The low temperature oxidation is compatible with low thermal budget layers (e.g., aluminum or other metals), which are typically highly reflective at ultraviolet (UV) and deep ultraviolet (DUV) lithographic exposure wavelengths.
    Type: Application
    Filed: July 17, 2001
    Publication date: November 29, 2001
    Applicant: Micron Technology, Inc.
    Inventors: Leonard Forbes, Kie Y. Ahn
  • Patent number: 6319640
    Abstract: This invention relates to an imaging element comprising an imaging layer having associated therewith a compound of Structure I: In the above Structure I, the substituents are as defined in the application. Such compounds have good reactivity and can by used to block photographically useful compounds such as developing agents until thermally activated under preselected conditions. Compounds according to the present invention are especially useful in color photothermographic imaging elements.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: November 20, 2001
    Assignee: Eastman Kodak Company
    Inventors: Wojciech K. Slusarek, Xiqiang Yang, David H. Levy
  • Publication number: 20010038978
    Abstract: A dispersion comprising an aqueous medium having dispersed therein an aggregated dye of the Formula (I): 1
    Type: Application
    Filed: December 7, 2000
    Publication date: November 8, 2001
    Inventors: Margaret Jones Helber, William James Harrison, Elizabeth Ann Gallo, Mary Christine Brick, Steven Wade Kortum, Gary Norman Barber
  • Publication number: 20010038979
    Abstract: A dispersion comprising an aqueous medium having dispersed therein an aggregated dye of the Formula (I): 1
    Type: Application
    Filed: December 7, 2000
    Publication date: November 8, 2001
    Inventors: Margaret Jones Helber, William James Harrison, Elizabeth Ann Gallo, Mary Christine Brick, Steven Wade Kortum, Gary Norman Barber
  • Patent number: 6312880
    Abstract: The invention relates to a multilayer photographic element comprising a reflective support wherein the color record 1 adjacent to the support comprises at least one light sensitive layer and a non-light sensitive dye-forming interlayer; and wherein color record 2 above said color record 1 comprises at least one light sensitive layer and at least two non-light sensitive dye-forming interlayers and wherein color record 3 above said color record 2 comprises at least one light sensitive layer and a non-light sensitive dye-forming interlayer; and a top overcoat layer comprising gelatin and ultraviolet absorbing material; and wherein each interlayer is substantially scavenger free, and color records 1, 2, and 3 comprise silver halide grains comprising greater than 90% silver chloride, and wherein the reciprocity characteristics of the silver halide grains are such that for a separation exposure of 1 microsecond and 0.4 sec, at least one color record develops to a density of at least 2.
    Type: Grant
    Filed: December 27, 1999
    Date of Patent: November 6, 2001
    Assignee: Eastman Kodak Company
    Inventors: Michael R. Roberts, Hwei-Ling Yau, Glenn M. Brown
  • Patent number: 6307671
    Abstract: An optical filter comprises a transparent support and a filter layer. The filter layer contains a dye and a binder polymer. The dye is a methine dye in an aggregated form. The transparent support, the filter layer or an optional layer further contains a specific ultraviolet absorbing agent represented by the formula (I), (II), or (III).
    Type: Grant
    Filed: May 31, 2000
    Date of Patent: October 23, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yoshiharu Yabuki
  • Patent number: 6306551
    Abstract: This invention relates to an imaging element comprising an imaging layer having associated therewith a compound of Structure I: wherein the substituents are as defined in the specification.
    Type: Grant
    Filed: December 30, 1999
    Date of Patent: October 23, 2001
    Assignee: Eastman Kodak Company
    Inventors: Zbyslaw R. Owczarczyk, Xiqiang Yang, David H. Levy, Mark E. Irving
  • Patent number: 6303281
    Abstract: A silver halide photographic element comprises a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive protective layer, the light-insensitive protective layer comprising an ultraviolet absorbing layer closer to the support and an outermost protective layer, the ultraviolet absorbing layer comprising an ultraviolet aborbing dye, a high boiling organic solvent, and a hydrophilic binder, the outermost protective layer comprising insoluble matte particles having a mean particle size of larger than 0.5 &mgr;m, dispersed polymer particles having a mean size of less than 0.2 &mgr;m, and a glass transition temperature of at least 70° C., and a hydrophilic binder.
    Type: Grant
    Filed: February 21, 1996
    Date of Patent: October 16, 2001
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Melvin Michael Kestner, Alfred Bruce Fant, Dennis Edward Smith
  • Patent number: 6300046
    Abstract: A dispersion comprising an aqueous medium having dispersed therein an aggregated dye of the Formula (I): wherein X is oxygen or sulfur; R1-R4 each independently represent an unsubstituted or substituted alkyl group, an unsubstituted or substituted aryl group or an unsubstituted or substituted heteroaryl group; L1, L2 and L3 each independently represent substituted or unsubstituted methine groups; M+ represents a proton or an inorganic or organic cation; and n is 0, 1, 2 or 3 and wherein the aggregated dye in the dispersion has an absorption halfbandwidth of less than 55 nm.
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: October 9, 2001
    Assignee: Eastman Kodak Company
    Inventors: Margaret Jones Helber, William James Harrison, Elizabeth Ann Gallo, Mary Christine Brick, Steven Wade Kortum, Gary Norman Barber
  • Patent number: 6300045
    Abstract: The present invention is an imaging element which includes a support, an imaging layer superposed on a side of said support and an overcoat overlying the imaging layer. The overcoat is composed of an organic polymer. The overcoat is discontinuous such that a fraction of the surface area of the imaging layer remains uncovered by said polymer, wherein the fraction of area not covered by the said polymer is from 0.02 to 0.98. The present invention is a photographic which includes a support, a silver halide emulsion layer superposed on a side of said support and an overcoat overlying the silver halide layer. The overcoat is composed of an organic polymer. The overcoat is discontinuous such that a fraction of the surface area of the silver halide emulsion layer remains uncovered by said polymer, wherein the fraction of area not covered by the said polymer is from 0.02 to 0.98. In one embodiment, the discontinuous overcoat is a series of parallel stripes.
    Type: Grant
    Filed: January 5, 2001
    Date of Patent: October 9, 2001
    Assignee: Eastman Kodak Company
    Inventors: Lloyd A. Lobo, Mridula Nair, Rukmini B. Lobo, Barry A. Fitzgerald
  • Patent number: 6277547
    Abstract: The invention relates to an element consisting essentially of a transparent polymer sheet, at least one emulsion adhering layer, and at least one light sensitive silver halide grain containing emulsion layer adhered to said emulsion adhering layer, wherein said polymer sheet is less than 40 &mgr;m in thickness.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: August 21, 2001
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Peter T. Aylward, Alphonse D. Camp, Thaddeus S. Gula
  • Patent number: 6268101
    Abstract: The present invention relates to imaging elements, including photographic elements and recording media, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a water permeable overcoat during image formation but that is water resistant in the final processed product. The overcoat, before formation of the image, comprises polyurethane particles in a gelatin-containing matrix. Subsequent to formation of the image, the overcoat is heat fused, resulting in the formation of a water-resistant continuous protective overcoat that provides excellent scratch and spill resistance.
    Type: Grant
    Filed: April 13, 2000
    Date of Patent: July 31, 2001
    Assignee: Eastman Kodak Company
    Inventors: Paul D. Yacobucci, Hwei-Ling Yau, Catherine A. Falkner, Lan B. Thai
  • Patent number: 6268116
    Abstract: The invention relates to a multilayer photographic element comprising a reflective support wherein the color record 1 adjacent to the support comprises at least one light sensitive layer and a non-light sensitive dye-forming interlayer; and wherein color record 2 above said color record 1 comprises at least one light sensitive layer and at least two non-light sensitive dye-forming interlayers and wherein color record 3 comprises at least one light sensitive layer and a non-light sensitive dye-forming interlayer; an optional UV dye containing interlayer and a top overcoat; and wherein each interlayer is completely or substantially scavenger free, silver halide grains comprising greater than 90% silver chloride, and wherein the reciprocity characteristics of the silver halide grains are such that for a separation exposure of 1 microsecond and 0.4 sec, each color record develops to a density of at least 2.0 within a log exposure range of 1.2 or less relative to the exposure point producing a density 0.
    Type: Grant
    Filed: December 27, 1999
    Date of Patent: July 31, 2001
    Assignee: Eastman Kodak Company
    Inventors: Michael R. Roberts, Gary J. McSweeney, Alphonse D. Camp
  • Patent number: 6261751
    Abstract: An antireflective coating (ARC) or antireflective layer (ARL) is interposed between a photoresist layer and an underlying substrate. The ARC includes an optically absorptive polysilicon germanium or polysilicon first layer, deposited by low pressure chemical vapor deposition (LPCVD). An optically transmissive second layer is grown on the first layer by oxidizing it at low temperature. The low temperature oxidation accurately controls the thickness, and optical impedance, of the second layer. The optical impedances of the second and photoresist layers are matched for minimizing reflections and reducing photolithographic limitations such as swing effect and reflective notching. The low temperature oxidation is compatible with low thermal budget layers (e.g., aluminum or other metals), which are typically highly reflective at ultraviolet (UV) and deep ultraviolet (DUV) lithographic exposure wavelengths.
    Type: Grant
    Filed: August 21, 2000
    Date of Patent: July 17, 2001
    Assignee: Micron Technology, Inc.
    Inventors: Leonard Forbes, Kie Y. Ahn
  • Patent number: 6255036
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: September 18, 2000
    Date of Patent: July 3, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Publication number: 20010005572
    Abstract: The present invention is an imaging element which includes a support, an imaging layer superposed on a side of said support and an overcoat overlying the imaging layer. The overcoat is composed of an organic polymer. The overcoat is discontinuous such that a fraction of the surface area of the imaging layer remains uncovered by said polymer, wherein the fraction of area not covered by the said polymer is from 0.02 to 0.98. The present invention is a photographic which includes a support, a silver halide emulsion layer superposed on a side of said support and an overcoat overlying the silver halide layer. The overcoat is composed of an organic polymer. The overcoat is discontinuous such that a fraction of the surface area of the silver halide emulsion layer remains uncovered by said polymer, wherein the fraction of area not covered by the said polymer is from 0.02 to 0.98. In one embodiment, the discontinuous overcoat is a series of parallel stripes.
    Type: Application
    Filed: January 5, 2001
    Publication date: June 28, 2001
    Inventors: Lloyd A. Lobo, Mridula Nair, Rukmini B. Lobo, Barry A. Fitzgerald
  • Patent number: 6235456
    Abstract: This invention provides methods for manufacturing anti-reflective barrier and/or polish-stop layers on semiconductors. The anti-reflective barrier and/or polish-stop layers permit more accurate photolithography during the manufacture of semiconductor devices. The barrier and/or polish-stop layers can comprise nitride and/or oxynitride films having non-stoichiometric ratios of silicon to nitrogen atoms within the film structure. The non-stoichiometry permits the films to be semi-transparent, decreasing transmission of electromagnetic radiation through the layers, thereby decreasing the reflection of the electromagnetic radiation back through the photoresist layers. By decreasing the reflection of the electromagnetic radiation through the photoresist materials, the effects of diffraction by mask edges and standing wave interference can be reduced, thereby permitting the more accurate, reproducible inscription of patterns onto semiconductor devices.
    Type: Grant
    Filed: December 9, 1998
    Date of Patent: May 22, 2001
    Assignee: Advanced Micros Devices, Inc.
    Inventor: Effiong E. Ibok
  • Patent number: 6232049
    Abstract: The present invention is a photographic element which includes a support, at least one silver halide emulsion layer superposed on the support and a processing solution permeable protective overcoat overlying the silver halide emulsion layer. The processing solution permeable overcoat is composed of a urethane-vinyl copolymer having acid functionalities wherein a weight ratio of a urethane component in the copolymer comprises from 20 to 100 percent and a weight ratio of a vinyl component in the copolymer comprises from 0 to 80 percent and a second polymer composed of polyvinyl alcohol, cellulose ethers, n-vinyl amides, polyesters, poly(ethylene oxide), starch, proteins, whey, albumin, poly(acrylic acid), alginates or gums. The present invention is a method of making a photographic element which includes providing an photographic element having a support, a silver halide emulsion layer superposed on the support and a processing solution permeable protective overcoat overlying the silver halide emulsion layer.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: May 15, 2001
    Assignee: Eastman Kodak Company
    Inventors: Mridula Nair, Tamara K. Jones, Tiecheng A. Qiao
  • Patent number: 6214499
    Abstract: This invention comprises dispersion comprising a solvent having dispersed therein a liquid-crystal forming dye of structural Formula I: [D-(X)m]-(Y)n wherein: D is a light-absorbing chromophore other than a cyanine dye or a barbituric acid oxonol dye; each Y contains an ionic or a nonionic solubilizing substituent or a group with a pKa value of less than 4 in water; each X is a nonionic substituent; n is 0 to 10; m is 0-10; and the resulting dye forms a liquid-crystalline phase in solvent. The dispersion is particularly useful in imaging and photographic elements.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: April 10, 2001
    Assignee: Eastman Kodak Company
    Inventors: Margaret J. Helber, William J. Harrison, Raymond P. Scaringe
  • Patent number: 6203964
    Abstract: A thermal recording medium comprising a ultraviolet absorber precursor represented by formula (1-A) or an image forming compound changing hue and an acid, which is high in thermal sensitivity, recordable with such a low output laser that no ablation takes place even when a thermal heat mode image recording system using a laser is utilized, requiring no different receiving sheet, and excellent in keeping quality: wherein P represents a protecting group for a hydroxyl group which is deblocked by heating to 250° C. or less in the presence of an acid; R1 and R2, which may be the same or different, each represents a substitutable group; and 1 and m each represents an integer of 0 to 4.
    Type: Grant
    Filed: March 13, 2000
    Date of Patent: March 20, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tatsuhiko Obayashi, Junichi Yamanouchi, Atsuhiro Ohkawa
  • Patent number: 6197485
    Abstract: A photographic assemblage comprising a silver halide photographic light-sensitive element comprising at least one sulfur and gold sensitized silver halide emulsion layer, said element comprising chlorinated s-triazine hardeners and photographically useful chemical compounds containing cyano groups, and a closed vessel in which the element is closed and stored at a constant relative humidity, is protected against HCN gas, which may evolve from photographic addenda included in the light-sensitive element to cause fog in the silver halide emulsion layers, by the addition of a palladium compound, in a silver halide emulsion layer and/or an adjacent layer thereto, as scavenger for HCN gas released from the element.
    Type: Grant
    Filed: September 27, 1993
    Date of Patent: March 6, 2001
    Assignee: Minnesota Mining & Manufacturing Company
    Inventors: Luigi Cellone, Brunella Fornasari, Giovanni Giusto
  • Patent number: 6197482
    Abstract: The present invention is an imaging element which includes a support, an imaging layer superposed on a side of said support and an overcoat overlying the imaging layer. The overcoat is composed of an organic polymer. The overcoat is discontinuous such that a fraction of the surface area of the imaging layer remains uncovered by said polymer, wherein the fraction of area not covered by the said polymer is from 0.02 to 0.98. The present invention is a photographic which includes a support, a silver halide emulsion layer superposed on a side of said support and an overcoat overlying the silver halide layer. The overcoat is composed of an organic polymer. The overcoat is discontinuous such that a fraction of the surface area of the silver halide emulsion layer remains uncovered by said polymer, wherein the fraction of area not covered by the said polymer is from 0.02 to 0.98. In one embodiment, the discontinuous overcoat is a series of parallel stripes.
    Type: Grant
    Filed: May 14, 1999
    Date of Patent: March 6, 2001
    Assignee: Eastman Kodak Company
    Inventors: Lloyd A. Lobo, Mridula Nair, Rukmini B. Lobo, Barry A. Fitzgerald
  • Patent number: 6194130
    Abstract: The present invention is a photographic element which includes a support, at least one silver halide emulsion layer superposed on the support and a processing-solution-permeable protective overcoat overlying the silver halide emulsion layer. The processing solution permeable overcoat is composed of a urethane-containing component having acid functionalities wherein a weight ratio of a polyurethane-containing component in the copolymer comprises from 20 to 100 percent and a weight ratio of an optional vinyl component in the copolymer comprises from 0 to 80 percent, which urethane-containing component of the overcoat may comprise either a single polyurethane polymer or an interpenetrating network comprising two or more polymers. The overcoat further comprises a polyvinyl alcohol polymer having a molecular weight of about 150,000 or less, with the proviso that the degree of hydrolysis is less than 95% when the molecular weight is more than about 100,000.
    Type: Grant
    Filed: November 23, 1999
    Date of Patent: February 27, 2001
    Assignee: Eastman Kodak Company
    Inventors: Mridula Nair, Tamara K. Jones, Tiecheng A. Qiao
  • Patent number: 6187518
    Abstract: The present invention is a photographic element which includes a support, at least one silver halide emulsion superposed on a front side of the support and an outermost backing layer superposed on a backside of the support. The outermost backing layer is composed of a hydrophobic binder and a hydrophilic binder wherein the backing layer has an advancing water contact angle of 70 or greater and a receding water contact angle of at least 40 less than the advancing water contact angle.
    Type: Grant
    Filed: October 23, 1998
    Date of Patent: February 13, 2001
    Assignee: Eastman Kodak Company
    Inventors: Raymond T. Jones, Ravi Sharma, Alfred B. Fant
  • Patent number: 6187521
    Abstract: The present invention is an imaging element which includes a support, an image forming layer superposed on the support; and at least one layer superposed on the support. The at least one layer superposed on the support is formed from a non-aqueous coating composition of a composite wax particle composed of a wax phase and a non-crosslinked polymer phase and an organic solvent. The wax phase includes a wax having a melting point of greater than 30° C. The wax comprises greater than 80% by weight of the wax phase. The wax phase to non-crosslinked polymer phase ratio is greater than 30/70 and less than 90/10.
    Type: Grant
    Filed: December 28, 1998
    Date of Patent: February 13, 2001
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Janglin Chen, Dwight W. Schwark, James L. Bello
  • Patent number: 6180295
    Abstract: This invention is a dispersion comprising a solvent having dispersed therein a liquid-crystal forming dye of structural Formula I: [D—(X)m]—(Y)n  I wherein: D is a merocyanine dye; each Y contains an ionic or a nonionic solubilizing substituent or a group with a pKa value of less than 4 in water; each X is a nonionic substituent; n is 1 to 10; m is 0-10; and the resulting dye forms a liquid-crystalline phase in solvent. The dispersion is particularly useful in imaging and photographic elements.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: January 30, 2001
    Assignee: Eastman Kodak Company
    Inventors: Margaret J. Helber, William J. Harrison, Richard L. Parton
  • Patent number: 6177239
    Abstract: The present invention is an imaging element which includes a support, an image forming layer superposed on the support and at least one layer superposed on the support. The at least one layer is formed from a non-aqueous coating composition composed of a composite wax particle having a wax phase and a non-crosslinked polymer phase. The wax phase includes a wax having a melting point of greater than 30° C., the wax comprising greater than 80% by weight of the wax phase. The at least one layer has a dry coating weight of from 1 to 300 mg/m2.
    Type: Grant
    Filed: December 28, 1998
    Date of Patent: January 23, 2001
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Janglin Chen, Dwight W. Schwark
  • Patent number: 6162588
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: November 15, 1999
    Date of Patent: December 19, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 6159673
    Abstract: An oxonol compound is represented by the following formula (I): ##STR1## in which Z is an atomic group that forms a cyclic amide ring; each of W.sup.1 and W.sup.2 independently is an atomic group that forms an acidic nucleus ring; and M is a cation. Other oxonol compounds, a light-sensitive material containing an oxonol compound and a process for the synthesis of an oxonol compound are also disclosed.
    Type: Grant
    Filed: January 20, 1999
    Date of Patent: December 12, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Junji Nishigaki, Yasuaki Deguchi
  • Patent number: RE37205
    Abstract: A silver halide color photographic material comprising a support having thereon a yellow color forming silver halide emulsion layer, a magenta color forming silver halide emulsion layer and a cyan color forming silver halide emulsion layer. The yellow color forming emulsion layer contains a silver halide emulsion having a silver chloride content of not less than 90 mol %, a yellow coupler and a bisphenol compound and optionally a difficultly water-soluble epoxy compound. One or more layers of the light-sensitive material may contain an ultraviolet light absorber.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: June 5, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hiroyuki Yoneyama
  • Patent number: RE37693
    Abstract: A color photographic light-sensitive material comprising a reflective support having thereon a plurality of silver halide emulsion layers of which the emulsion layer located farthest from said support has, on each of both the support side thereof and the uppermost side at least one nonlight-sensitive layer containing an effective amount of an ultraviolet absorbing agent, said ultraviolet absorbing agent being used in said nonlight-sensitive layer on the uppermost side of said emulsion layer being a 2-(2′-hydroxyphenyl)benzotriazole-type compound which is in the liquid form at normal room temperature.
    Type: Grant
    Filed: March 30, 1989
    Date of Patent: May 7, 2002
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masao Sasaki, Kaoru Onodera