Abstract: The invention discloses an improvement in the photolithographic patterning method of a photoresist layer formed on a substrate surface with intervention of an anti-reflection coating film, in which the refractive index and the light-absorption coefficient of the anti-reflection coating film are controlled in such a way that, in a graph prepared by plotting the thickness of the anti-reflection coating film taken as the abscissa values and the reflectivity of the light for patterning exposure at the interface between the anti-reflection coating film and the photoresist layer thereon taken as the ordinate values, the range of the variation in the film thickness corresponding to an increment of 0.01 in the reflectivity in the vicinity of the minimum point on the thickness vs. reflectivity curve does not exceed ±0.01 &mgr;m.

Abstract: A method for etching a surface includes the steps of providing an under layer formed on the surface and a top layer formed on the under layer. The top layer is patterned to expose portions of the under layer, and a layer including silicon is formed on the exposed portions of the under layer. The top layer is removed to expose the under layer in portions other than the portions of the under layer having the silicon layer thereon, and the under layer is etched in portions other than the portions of the under layer having the silicon layer thereon to expose the surface.

Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.

Abstract: The invention provides a method for decreasing endpoint detection noise in a chemical-mechanical polishing process. In this method an anti-reflective layer is formed on the material whose reflected light interferes with the incident light. The anti-reflective layer can avoid light reflected by the material that would affect the detector. Thus, the end point of the chemical-mechanical polishing process can be easily verified and the quality of the devices is improved.

Abstract: Techniques are disclosed for fabricating a device using a photolithographic process. The method includes providing a first anti-reflective coating over a surface of a substrate. A layer which is transparent to a wavelength of light used during the photolithographic process is provided over the first anti-reflective coating, and a photosensitive material is provided above the transparent layer. The photosensitive material is exposed to a source of radiation including the wavelength of light. Preferably, the first anti-reflective coating extends beneath substantially the entire transparent layer. The complex refractive index of the first anti-reflective coating can be selected to maximize the absorption at the first anti-reflective coating to reduce notching of the photosensitive material.

Abstract: A heat mode recording element is disclosed comprising a metal recording layer, preferably a bismuth layer, and a layer containing a roughening agent underneath the metal layer. An image is formed by exposure with intense laser light and the presence of the roughening agent reduces or eliminates interference patterns. In an alternative embodiment a roughened support is used instead of a layer containing a roughening agent.

Abstract: In one aspect, the invention includes a semiconductor processing method. An antireflective material layer is formed over a substrate. At least a portion of the antireflective material layer is annealed at a temperature of greater than about 400° C. A layer of photoresist is formed over the annealed antireflective material layer. The layer of photoresist is patterned. A portion of the antireflective material layer unmasked by the patterned layer of photoresist is removed. In another aspect, the invention includes the following semiconductor processing. An antireflective material layer is formed over a substrate. The antireflective material layer is annealed at a temperature of greater than about 400° C. A layer of photoresist is formed over the annealed antireflective material layer. Portions of the layer of photoresist are exposed to radiation waves. Some of the radiation waves are absorbed by the antireflective material during the exposing.

Abstract: A silver halide photographic element comprises a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive protective layer, the light-insensitive protective layer comprising an ultraviolet absorbing layer closer to the support and an outermost protective layer, the ultraviolet absorbing layer comprising an ultraviolet aborbing dye, a high boiling organic solvent, and a hydrophilic binder, the outermost protective layer comprising insoluble matte particles having a mean particle size of larger than 0.5 &mgr;m, dispersed polymer particles having a mean size of less than 0.2 &mgr;m, and a glass transition temperature of at least 70° C., and a hydrophilic binder.

Abstract: The invention relates to an element consisting essentially of a photographic element comprising a base material having an upper surface comprising an oriented sheet, at least one photosensitive silver halide layer, and at least one sharpness enhancing agent above said photosensitive silver halide layer.

Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 &mgr;m or smaller) features.

Abstract: Thermally processable imaging elements in which the image is formed by imagewise heating or by imagewise exposure to light followed by uniform heating are comprised of a support, a thermographic or photothermographic imaging layer, a protective overcoat layer which is an outermost layer on the same side of the support as the imaging layer, a backing layer which is an outermost layer on the side of the support opposite to the imaging layer, and an electroconductive agent in at least one layer of the element. Each of the protective overcoat layer and the backing layer contains a fluorosurfactant in an amount sufficient to serve as a triboelectric charge control agent and effective in providing essentially the same triboelectric charging characteristics to the backing layer as to the protective overcoat layer.

Abstract: The invention relates to an imaging element comprising an imaging layer and a cellulose paper base wherein said base has an upper surface roughness of between 0.30 and 0.95 &mgr;m at a spatial frequency of between 200 cycles/mm and 1300 cycles/mm.

Abstract: The invention provides a photographic element comprising a light-sensitive silver halide emulsion layer having associated therewith a coupler based on a 1-aryl-3-arylpyrazol-5-one ring and represented by formula I: wherein the substituents are as described in the specification.

Abstract: The invention consists of a light absorbing top antireflective layer that reduces the swing curve amplitude for photoresist materials used in the semiconductor industry. The coating may be water based but is not necessarily so. The advantage of a water-based coating is its ease of use, since it can be applied without intermixing to the softbaked photoresist, and is removed in the development step, so that process complexity is only minimally increased. One problem that has been associated with the existing non-absorbing antireflective coatings is that the optimum swing curve reduction is only achieved at a very low refractive index. The advantages of a dyed coating are a) that the refractive index of the top coat can additionally be lowered by making use of anomalous dispersion effects if the dye is chosen judiciously, and b) that it is possible to achieve the optimum swing curve reduction at a higher refractive index of the top coat.

Abstract: In one aspect, the invention includes a semiconductor processing method. An antireflective material layer is formed over a substrate. At least a portion of the antireflective material layer is annealed at a temperature of greater than about 400° C. A layer of photoresist is formed over the annealed antireflective material layer. The layer of photoresist is patterned. A portion of the antireflective material layer unmasked by the patterned layer of photoresist is removed. In another aspect, the invention includes the following semiconductor processing. An antireflective material layer is formed over a substrate. The antireflective material layer is annealed at a temperature of greater than about 400° C. A layer of photoresist is formed over the annealed antireflective material layer. Portions of the layer of photoresist are exposed to radiation waves. Some of the radiation waves are absorbed by the antireflective material during the exposing.

Abstract: A method of exposing an integral imaging element having: an integral lens sheet with opposed front and back surfaces; a light sensitive layer positioned behind the back surface; and an anti-halation layer between the light sensitive layer and the back surface; the method comprising the steps of: simultaneously exposing a major portion of the area of the light sensitive layer with light from behind the light sensitive layer, or simultaneously exposing the light sensitive layer to all of an integral image from behind the light sensitive layer.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.

Abstract: KrF excimer laser beam is selectively irradiated to a resist film. At this time, an incident light (KrF excimer laser beam) is reflected at the surface of an antireflection film to be a first reflected light, and is reflected at the surface of a film to be patterned to be a second reflected light. A standing wave is obtained by interference between the incident light and the first and the second reflected light. A light intensity of this standing wave has extreme maximum and extreme minimum appearing alternately, and a pair of extreme minimum and extreme maximum is across the first interface. A reflection index of the first reflected light is a range of 10 to 20%. Also, the thickness of the antireflection film is adjusted so that the extreme maximum of the pair is located in the resist film and the extreme minimum of the pair is located in the antireflection film.

Abstract: The invention relates to a photographic element comprising a translucent base and a color forming layer comprising at least one silver halide emulsion layer and dye forming coupler, wherein said base comprises at least one polymer sheet comprising a transparent polymer sheet containing voids, with the proviso that said translucent sheet is substantially free of white light reflecting pigments and wherein said translucent sheet has a light transmission of between 15% and 85%.

Abstract: This invention comprises thermally processable imaging element comprising: (a) a support, (b) a thermally processable imaging layer on one side of the support; and (c) a protective layer comprising a binder and matte particles comprising a crosslinked polymer, wherein the protective layer has been applied as a solution of binder and matte particles in a coating solvent in which the binder is soluble and the matte particles are swellable to the extent of about 160 to about 390%.

Abstract: The invention is a method for forming semiconductor devices from a substrate having a non-planar surface. An anti-reflection coating is formed between the substrate and photoresist layer to alleviate the problems caused by non-uniform reflection at the substrate surface during exposure of the photoresist layer. Three-layer and two-layer stacks are described for use with UV and i-line exposure.

Abstract: A photosensitive silver halide film material is disclosed comprising a support and on one or both sides thereof one or more layer(s) comprising a photosensitive silver halide emulsion wherein tabular silver halide crystals having an average thickness of less than 0.25 &mgr;m and an average aspect ratio of 2 or more are present characterized in that said photosensitive silver halide emulsion layer(s) comprise(s) blue colored polymeric matting particles.

Abstract: The present invention is an imaging element which includes a support, an image forming layer superposed on the support; and at least one layer superposed on the support. The at least one layer superposed on the support is formed from a non-aqueous coating composition of a composite wax particle composed of a wax phase and a non-crosslinked polymer phase and an organic solvent. The wax phase includes a wax having a melting point of greater than 30° C. The wax comprises greater than 80% by weight of the wax phase. The wax phase to non-crosslinked polymer phase ratio is greater than 30/70 and less than 90/10.

Abstract: The present invention is an imaging element which includes a support, an image forming layer superposed on the support and at least one layer superposed on the support. The at least one layer is formed from a non-aqueous coating composition composed of a composite wax particle having a wax phase and a non-crosslinked polymer phase. The wax phase includes a wax having a melting point of greater than 30° C., the wax comprising greater than 80% by weight of the wax phase. The at least one layer has a dry coating weight of from 1 to 300 mg/m2.

Abstract: The present invention relates to an improved photolithography process particularly suitable for high-resolution optical lithography techniques using the g, h and i lines of the spectrum of mercury and short-wavelength UV, comprising, prior to deposition of the photosensitive resin on the layer of material to be lithographically patterned, the formation of an antireflective porous layer within the said layer to be lithographically patterned and on the surface of the latter.

Abstract: The present invention is a photographic element containing a support, at least one light sensitive emulsion layer superposed on the first side of the support, and an outermost lubricant layer superposed on the support. The outermost layer includes more than 80 percent by weight of a composite wax particle. The composite wax particle includes a wax phase and a non-crosslinked polymer phase. The wax phase is greater than 80 percent by weight of a wax which has a melting point of greater than 30° C. In one embodiment the lubricant layer contains a fluoro containing compound. It is envisioned that the lubricant layer overlies a transparent magnetic layer. The total coating weight of the composite wax particle in the lubricant layer is in the range of from 1 to 300 mg/m2. Preferably, the fluoro compound contains at least one type of an ionic group or a nonionic group.

Abstract: The invention relates to an imaging element comprising a photographic element comprising a base, at least one color forming layer comprising at least one silver halide emulsion layer, and one dye forming coupler, wherein said base comprises a transparent polymer sheet having laminated thereto a microvoided biaxially oriented polyolefin sheet and wherein said polymer sheet has an upper surface that has a roughness of between 0.3 and 2.0 .mu.m.

Abstract: The invention relates to an imaging element comprising a base consisting of an integral biaxially oriented polyolefin polymer sheet having an upper surface that binds to gelatin, a lower surface that has a matte surface, a stiffness of at least 120 millinewtons, and a thickness of greater than 160 mm.

Abstract: A photographic element is disclosed. The element comprises fine composite particles composed of fine inorganic particles bonded with a high boiling point compound. An excellent photographic element which exhibits high sensitivity, minimum fog, improved pressure resistance, no roller marks, and sufficient layer strength, all under low-replenished processing, protecting environmental pollution is obtained.

Abstract: A photothermographic material has a photosensitive layer containing a photosensitive silver halide, a binder, an organic silver salt and a reducing agent therefor on one surface of a support. An undercoat layer containing a styrene-butadiene copolymer is interleaved between the support and the photosensitive layer for improving the adhesion therebetween. The photosensitive layer is formed by applying an aqueous coating solution of the binder mainly composed of a polymer having an equilibrium moisture content of up to 2% by weight at 25.degree. C. and RH 60% and drying the coating.

Abstract: The invention relates to imaging elements comprising a back surface wherein said back surface has a low frequency roughness component having a roughness average of between 0.30 and 2.00 .mu.m when measured with a low pass cutoff filter of 500 cycles/mm and a high frequency component having a roughness average of 0.001 to 0.05 .mu.m when measured with a high pass cutoff filter of 500 cycles/mm.

Abstract: A method for attenuating within a microelectronics fabrication a standing wave photoexposure of a photoresist layer formed upon a reflective layer, and a microelectronics fabrication employed within the method. To practice the methods there is first provided a substrate employed within a microelectronics fabrication. There is then formed over the substrate a reflective layer. There is then formed upon the reflective layer a birefringent material layer. The birefringent material layer attenuates a standing wave photoexposure of a photoresist layer subsequently formed upon the birefringent material layer, where the photoresist layer is subsequently photoexposed with an actinic photoexposure radiation beam.

Abstract: In one embodiment, the present invention relates to a method of making a carbonized antireflection coating involving the steps of depositing a polymer layer on a semiconductor substrate; and carbonizing at least a portion of the polymer layer in an inert atmosphere to provide the carbonized antireflection coating. In another embodiment, the present invention relates to a method of improving critical dimensional control during lithography, involving the steps of providing a semiconductor substrate; depositing a polymer layer on the semiconductor substrate; carbonizing at least a portion of the polymer layer in an inert atmosphere to provide a carbonized antireflection coating; depositing a photoresist over the carbonized antireflection coating; and patterning the photoresist.

Abstract: An antireflective coating (ARC) or antireflective layer (ARL) is interposed between a photoresist layer and an underlying substrate. The ARC includes an optically absorptive polysilicon germanium or polysilicon first layer, deposited by low pressure chemical vapor deposition (LPCVD). An optically transmissive second layer is grown on the first layer by oxidizing it at low temperature. The low temperature oxidation accurately controls the thickness, and optical impedance, of the second layer. The optical impedances of the second and photoresist layers are matched for minimizing reflections and reducing photolithographic limitations such as swing effect and reflective notching. The low temperature oxidation is compatible with low thermal budget layers (e.g., aluminum or other metals), which are typically highly reflective at ultraviolet (UV) and deep ultraviolet (DUV) lithographic exposure wavelengths.

Abstract: The invention relates to an imaging element comprising a laminated base comprising a layer of biaxially oriented film sheet adhered to the top surface of a base wherein said laminated base has a surface roughness average of between about 0.5 to 2.5 .mu.

Abstract: In a photosensitive lithographic plate including a photosensitive layer coated on the surface of a substrate and a mat layer formed on the photosensitive layer, plural resinous protrusions are provided on the back surface of the substrate in the form of a layer. Deterioration of vacuum adhesion due to the mat collapsed in a production process of a photosensitive lithographic plate including a step of winding is prevented, consequently, a photosensitive lithographic plate with uniform quality is obtained regardless of its wound position.

Abstract: A thermographic recording element has a polyester-containing undercoat layer on a support and a thermographic recording layer, typically a photosensitive layer, on the undercoat layer. The undercoat layer enhances the adhesion between the support and the recording layer.

Abstract: The invention relates to a imaging element comprising a paper having a surface roughness average of between 0.13 and 0.44 micrometers.

Abstract: Spherical beads of critical dimensions and optical properties are combined with polarizing and photosensitive materials to produce a photographic film which unexpectedly collects apparent three dimensional information in the light carrying images into said film.

Abstract: The invention relates to a photographic member comprising at least one photosensitive silver halide layer on the top of said member and at least one photosensitive silver halide layer on the bottom of said member, a polymer sheet comprising at least one layer of voided polyester polymer and at least one layer comprising nonvoided polyester polymer, wherein the imaging member has a percent transmission of between 38 and 42%, the imaging member further comprises tints, and the nonvoided layer is at least twice as thick as the voided layer.

Abstract: A photographic member comprising a polymer sheet comprising at least one layer of voided polyester polymer and at least one layer comprising nonvoided polyester polymer, wherein the imaging member has a percent transmission of between 40 and 60%, the imaging member further comprises tints, and the nonvoided layer is at least twice as thick as the voided layer.

Abstract: A photosensitive imaging system comprising a photosensitive material and a developer material, the photosensitive material including a support having a layer of photosensitive microcapsules on the surface thereof, said photosensitive microcapsules including an internal phase containing a photosensitive composition and a color precursor wherein, upon image-wise exposing said photosensitive material and rupturing said microcapsules, said color precursor image-wise reacts with said developer material to form a color image, said support being a high opacity laminate of a black or brown film laminated between a pair of white pigmented films; in one embodiment the black or brown film is a magnetic recording layer.

Abstract: A imaging member comprising a polymer sheet comprising at least one layer of voided polyester polymer and at least one layer comprising polyethylene polymer, wherein said at least one polyethylene polymer layer comprises tints and wherein the imaging member has a percent transmission of less than 15%.

Abstract: The invention relates to a photographic element comprising a translucent base and a color forming layer comprising at least one silver halide emulsion layer and dye forming coupler, wherein said base comprises at least one polymer sheet comprising a transparent polymer sheet containing voids, with the proviso that said translucent sheet is substantially free of white light reflecting pigments and wherein said translucent sheet has a light transmission of between 15% and 85%.

Abstract: The present invention provides a method for the formation of a pattern, which comprises applying an antireflective coating film-forming composition solution comprising (A) a compound which undergoes crosslinking reaction when irradiated with actinic rays and (B) a dye to a substrate to form a coating film thereon, entirely irradiating the coating film with actinic rays to form an antireflective coating film, applying a resist solution to the antireflective coating film, drying the coated material to form a resist layer, and then subjecting the coated material to lithographic treatment to form a resist pattern on the antireflective coating film. The method enables the formation of a resist pattern having an excellent dimensional accuracy and section shape without causing the formation of an intermixed layer between the resist composition and antireflective coating film.

Abstract: A method of patterning conductive lines using a bottom anti-reflective coating (BARC) composed of Poly-p-phenylene sulfide (PPS) film 30 formed using a Physical Vapor Deposition (PVD) process. The PPS BARC 30 is easy to remove and has superior planarization. The method comprises:a) forming conductive layer 26 over a semiconductor structure 10;b) forming a Poly-p-phenylene sulfide (PPS) layer 30 over said conductive layer using a Physical Vapor Deposition (PVD) process;c) forming a photoresist pattern 34 over said Poly-p-phenylene sulfide (PPS) layer 30; said Poly-p-phenylene sulfide (PPS) layer acting as a bottom Anti-reflective coating (BARC);d) etching said conductive layer 26 using said photoresist pattern 34 and as a mask forming a conductive pattern;e) removing said photoresist pattern 34;f) removing said Poly-p-phenylene sulfide (PPS) layer by heating and vaporizing said Poly-p-phenylene sulfide (PPS) layer.

Abstract: Disclosed is a varnishing film and a method of adjusting the surface gloss of prepress color proof using the same for obtaining a color proof with the surface gloss in the particular areas of image adjusted, comprising the step of forming an image on matt surface having been formed using the varnishing film with an adhesive transparent resin layer containing transparent matting agent and a transparent photosensitive layer provided on a transparent supporter, on the prepress color proof formed by Surprint process. It is possible to form an image with difference in the surface glosses on the prepress color proof formed by Surprint process.

Abstract: The present invention is a photographic element which includes a support having a first side and a second side, at least one light sensitive emulsion layer superposed on the first side of the support, a transparent magnetic layer superposed on the second side of the support. The transparent magnetic layer includes magnetic particles and a film forming binder. An outermost abrasive lubricant layer overlies the transparent magnetic layer. The outermost abrasive lubricant layer is formed from a non-aqueous coating composition of a composite wax particle, an abrasive particle and an organic solvent. The composite wax particle is composed of a wax phase having a wax having a melting point of greater than 30.degree. C. the wax being greater than 80% by weight of the wax phase and a non-crosslinked polymer phase free of chemically bonded acid groups.

Abstract: The present invention is an imaging element which contains a support, an image forming layer superposed on the support and an outermost protective layer superposed on the support. The protective layer is a cellulosic material and a composite wax particle. The wax particle is composed of a wax phase and a non-crosslinked polymer phase. The wax phase includes a wax having a melting point of greater than 30.degree. C. The non-crosslinked polymer phase contains from 10% to 80% by weight of a mono-alpha, beta-ethylenically unsaturated monomer capable of addition polymerization to form a water soluble homopolymer. In a preferred embodiment the protective layer overlies an antistatic layer.

Abstract: This invention relates to antireflective coatings comprising polymeric polyoxyalkylenated colorants. More particularly, the present invention relates to antireflective coatings for utilization in forming thin layers between reflective substrates and photoresist coatings. Such antireflective coatings are very useful and beneficial within the production and fabrication of semiconductors through photolithographic procedures due to the liquid, non-crystallizing nature of polyoxyalkylenated colorants, and the lack of potentially damaging counterions, metals, and/or electrolytes within the inventive antireflective colored coatings. The inventive coatings may also be applied on lenses, mirrors, and other optical components. Methods of forming such antireflective coatings are also contemplated within this invention.