Abstract: A constant force finishing system used to finish a surface of a workpiece includes at least a first movement device arranged to apply a first movement to a finishing tool, the first movement having a range of distance D1. The finishing system also includes a constant force device (CFD) in mechanical communication with the finishing tool, the CFD arranged to apply a second movement in conjunction with the first movement to the finishing tool, the second movement having a range of ?1, where D1>>?1.
Abstract: A composition and associated method for chemical mechanical planarization of a metal-containing substrate (e.g., a copper substrate) are described herein which afford high and tunable rates of metal removal as well as low within a wafer non-uniformity values and low residue levels remaining after polishing.
Type:
Grant
Filed:
December 7, 2009
Date of Patent:
April 9, 2013
Assignee:
Air Products and Chemicals, Inc.
Inventors:
Xiaobo Shi, Bentley J. Palmer, Rebecca A. Sawayda, Fadi Abdallah Coder, Victoria Perez
Abstract: A magnetic device having a magnetic feature, the magnetic feature including a magnetic portion comprising a magnetic material, a region of non-magnetic material adjacent to the magnetic portion, and a stop layer disposed above the region of non-magnetic material, defining a planar upper boundary of the magnetic portion.
Type:
Grant
Filed:
April 13, 2004
Date of Patent:
July 24, 2007
Assignee:
Seagate Technology LLC
Inventors:
Picheng Huang, Paul E. Anderson, Laura C. Stearns, Song S. Xue
Abstract: An apparatus for maintaining constant force engagement between a finishing tool and a workpiece. The apparatus includes a motor supported on a rotatable base. A tool holder coupled to the motor supports a finishing tool at as point offset from a rotational axis of the base. The apparatus further includes an actuator configured to rotate the base, whereby the finishing tool is caused to engage the workpiece with a constant and known force.