One-way Work Traverse Patents (Class 451/299)
  • Patent number: 6299517
    Abstract: In a band grinding machine, especially well adapted for grinding wooden frames having transverse and longitudinal wooden pieces, a support table in the form of an endless belt transports the frames in an advancement direction, a transverse grinding assembly with a transversely moving grinding band extending over the width of the support table grinds the entire tops of frames, and two longitudinal grinding assemblies, located behind the transverse grinding assembly in the advancement direction, respectively grind the two longitudinal wooden pieces of each frame, with each longitudinal grinding assembly having a longitudinally moving grinding band with a width very small in comparison to the width of the table, and with at least one of the longitudinal grinding assemblies being adjustable transversely of the advancement direction to allow the spacing of the longitudinal grinding assemblies to be set to match the spacing of the longitudinal frame pieces.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: October 9, 2001
    Inventor: Georg Weber
  • Publication number: 20010021627
    Abstract: A method and apparatus for supporting, cleaning and/or drying a polishing pad used for planarizing a microelectronic substrate. In one embodiment, the apparatus can include a cleaning head positioned adjacent a post-operative portion of the polishing pad to clean and/or dry the rear surface of the polishing pad. The cleaning head can include a heat source, a mechanical contact element, and/or orifices that direct fluid and/or gas toward the rear surface. The apparatus can further include a vessel through which the rear surface of the polishing pad passes to clean the rear surface. The apparatus can also include a flow passage in fluid communication with a region between the polishing pad and a support pad upon which the polishing pad rests during planarization. Gas moves through the flow passage toward or away from an interface region between the polishing pad and the support pad to draw the polishing pad toward or away from the support pad.
    Type: Application
    Filed: May 7, 2001
    Publication date: September 13, 2001
    Inventor: Jason B. Elledge
  • Patent number: 6273796
    Abstract: A method and apparatus for planarizing a microelectronic substrate. In one embodiment, the apparatus can include an elongated, non-continuous polishing pad oriented at an angle relative to the horizontal to allow planarizing liquids and materials removed from the microelectronic substrate to flow off the polishing pad under the force of gravity. Two such polishing pads can be positioned opposite each other in a vertical orientation and can share either a common platen or a common substrate carrier. The polishing pads can be pre-attached to both a supply roll and a take-up roll to form a cartridge which can be easily removed from the apparatus and replaced with another cartridge.
    Type: Grant
    Filed: September 1, 1999
    Date of Patent: August 14, 2001
    Assignee: Micron Technology, Inc.
    Inventor: Scott E. Moore
  • Patent number: 6273800
    Abstract: A method and apparatus for planarizing a microelectronic substrate. In one embodiment, the apparatus can include an elongated polishing pad that is moved over a platen either between or during the planarization cycles, and a support pad that is moved along with the polishing pad. The support pad can be an elongated member that extends between a supply roller and a take-up roller, or can include a continuous member that extends around the spaced apart rollers. The platen can also be movable along with the support pad and can be supported by fluid jets, rollers, or a rotating bladder. Cleaning devices and/or milling devices can treat the surfaces of the polishing pad, the support pad and/or the platen to reduce the likelihood for contaminants to become caught between these components as they engage with each other.
    Type: Grant
    Filed: August 31, 1999
    Date of Patent: August 14, 2001
    Assignee: Micron Technology, Inc.
    Inventors: Michael A. Walker, Karl M. Robinson
  • Patent number: 6244944
    Abstract: A method and apparatus for supporting, cleaning and/or drying a polishing pad used for planarizing a microelectronic substrate. In one embodiment, the apparatus can include a cleaning head positioned adjacent a post-operative portion of the polishing pad to clean and/or dry the rear surface of the polishing pad. The cleaning head can include a heat source, a mechanical contact element, and/or orifices that direct fluid and/or gas toward the rear surface. The apparatus can further include a vessel through which the rear surface of the polishing pad passes to clean the rear surface. The apparatus can also include a flow passage in fluid communication with a region between the polishing pad and a support pad upon which the polishing pad rests during planarization. Gas moves through the flow passage toward or away from an interface region between the polishing pad and the support pad to draw the polishing pad toward or away from the support pad.
    Type: Grant
    Filed: August 31, 1999
    Date of Patent: June 12, 2001
    Assignee: Micron Technology, Inc.
    Inventor: Jason B. Elledge
  • Patent number: 6213845
    Abstract: Polishing pads, planarizing machines and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies. The polishing pads, for example, can be web-format pads, and the planarizing machines can be web-format machines. In a typical application, the web-format machines have a pad advancing mechanism and stationary table with a first dimension extending along a pad travel path, a second dimension transverse to the first dimension, and an illumination site from which a laser beam can emanate from the table. The pad advancing mechanism moves the pad along the pad travel path to replace worn portions of the pad with fresh positions. In one embodiment of the invention, a web-format polishing pad includes a planarizing medium and an optical pass-through system having a plurality of view sites through which a light beam can pass through the pad.
    Type: Grant
    Filed: April 26, 1999
    Date of Patent: April 10, 2001
    Assignee: Micron Technology, Inc.
    Inventor: Jason B. Elledge
  • Patent number: 6206763
    Abstract: A brush deburring machine includes upper and lower synchronized dogged conveyors that translate workpieces between a pair of cylindrical wire brushes to remove burrs from the ends of the workpieces. A first support surface is defined on each of the dogs of the upper conveyor, and a second support surface is defined on each of the dogs of the lower conveyor. Workpieces are retained between the first and second support surfaces to prevent the workpieces from becoming unstable and shifting diagonally between the wire brushes, yet are permitted to rotate with respect to the first and second support surfaces to cause the entire circumference of the ends of the workpieces to be deburred.
    Type: Grant
    Filed: March 23, 1999
    Date of Patent: March 27, 2001
    Assignee: Ohio Custom Machinery, Inc.
    Inventor: Allen E. Mackall
  • Patent number: 6179689
    Abstract: The device of this invention is made up by: a stage having an upper surface for which a section taken at a right angle to the longitudinal direction describes a concave arc; abrasive tape arranged on the stage at a right angle to the longitudinal direction; a mechanism for driving the abrasive tape; a mechanism that applies pressure and places the end face of the workpiece in contact with the abrasive tape such that the center of the radius of curvature of the section of the stage coincides with the center of rotation of a rod-like workpiece; a mechanism for giving the workpiece a reciprocating movement over the surface depression in the longitudinal direction of the stage while rotating the workpiece; arid a water-holding material that contains a grinding fluid that produces a thin and uniform film of grinding fluid on the surface of the abrasive tape.
    Type: Grant
    Filed: May 21, 1998
    Date of Patent: January 30, 2001
    Assignee: NEC Corporation
    Inventors: Kenichi Ohno, Masashige Mitsuhashi
  • Patent number: 6129615
    Abstract: A deburring machine having a work table with a side guide mounted thereto so as to define a first work zone for the lower peripheral edge of the cylindrical workpiece. A continuous elongated belt having an abrasive surface is mounted to the work table so as to engage the lower edge of the workpiece in the first work zone. A second side guide is spaced vertically from the work table in parallel alignment with the first side guide in conjunction with an overhead guide that engages the upper circular surface of the workpiece. The overhead guide and second side guide define a second work zone substantially in alignment with the first work zone, and a second continuous elongated abrasive belt engages the upper peripheral edge of the workpiece in the second work zone.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: October 10, 2000
    Assignee: Continental Machines, Inc.
    Inventor: Jeffrey P. Corman
  • Patent number: 6126527
    Abstract: A polishing tool uses a seal cavity containing a fluid that supports polishing pads against an object being polished. The boundaries of the cavity include a support structure, a portion of a polishing material, and a seal between the support structure and the polishing material. The polishing material moves relative to the support structure and seal. A variety of seal configurations can maintain the fluid within the cavity. In one embodiment the seal mechanism is a labyrinth seal including multiple ridges. In one embodiment, the seal mechanism is a face-sealing seal which includes a jacket with a u-shaped cross section with a compressible element positioned within it. The face-sealing seal is in a groove positioned outside of the cavity. Alternatively, the face-sealing seal forms the outer edge of the cavity. In a further embodiment, the seal is an o-ring seal positioned within a double dove-tailed groove.
    Type: Grant
    Filed: July 10, 1998
    Date of Patent: October 3, 2000
    Assignee: Aplex Inc.
    Inventors: Shu-Hsin Kao, William F. Lapson, Charles J. Regan, David E. Weldon
  • Patent number: 6106388
    Abstract: A belt guide member for guiding an abrasive belt on a rotary drum sander. The belt guide member includes a slot for accommodating an edge of the abrasive belt. The belt guide member may have two slots, such that when one slot of the member has been used and is worn out, the other slot can be used by turning around the member. A ridge between the slots helps prevent the edge of the belt from folding over between the slots. The member may have a magnet at its bottom face for attaching to the sander and for facilitating removal and exchange of the member. The belt guide member may be manufactured from a ceramic material.
    Type: Grant
    Filed: June 9, 1998
    Date of Patent: August 22, 2000
    Assignee: Performax Products Corporation
    Inventor: Gary L. Green
  • Patent number: 6102781
    Abstract: An improved method and device for performing setup and adjustment of pressure shoes used in an abrasive finishing machine. The setup of the pressure shoe stop limit device is performed automatically and remotely. The stop limit is hydraulically locked in place and limits subsequent shoe rotation. This automatically positionable travel limit stop takes into account the natural spring of the various machine components, including the innate springiness of the surfacing head elastic covering which wears and deforms over time. The pressure shoe is adjusted relative to the surfacing head, and accounts for the undefinable characteristics of the overall machine.
    Type: Grant
    Filed: July 9, 1996
    Date of Patent: August 15, 2000
    Assignee: Timesavers, Inc.
    Inventors: Chester Greathouse, Leroy E. Stump, Jerome Emmett Hansen
  • Patent number: 5997386
    Abstract: An apparatus for abrading or deburring a workpiece is provided and includes in combination a conveyor for moving the workpiece from a first position to a second position and at least two assemblies intermediate the first and second positions and opposite the conveyor for abrading one side of the workpiece in a plurality of directions. In an alternate embodiment of the invention, a third assembly may be provided which deburrs an opposite side of the workpiece as it is passed through the deburring assembly. The conveyor for moving the workpiece positively fixes the location of the workpiece with respect to the conveyor and translates the workpiece through the deburring assembly.
    Type: Grant
    Filed: December 16, 1997
    Date of Patent: December 7, 1999
    Assignee: Pridgeon & Clay, Inc.
    Inventors: Harvey Dumond, Jr., Timothy S. Jaspers, Douglas William Vanderwell
  • Patent number: 5964210
    Abstract: An apparatus and method for slicing a workpiece, in particular, a polysilicon or single crystal silicon ingot, utilizing a diamond impregnated wire saw in which either the workpiece (or ingot) is rotated about its longitudinal axis or the diamond wire saw is rotated about the longitudinal axis of the workpiece as the diamond wire is driven orthogonally to the longitudinal axis of the workpiece and advanced from a position tangentially adjoining the outer diameter ("OD") of the ingot to a position tangential to its center or inner diameter ("ID"). In this manner, the diamond wire cuts through the workpiece at a substantially tangential point to the circumference of the cut instead of straight through up to the entire diameter of the piece and single crystal silicon ingots of 300 mm to 400 mm or more may be sliced into wafers relatively quickly, with minimal `kerf" loss and less extensive follow-on lapping operations.
    Type: Grant
    Filed: December 18, 1997
    Date of Patent: October 12, 1999
    Assignee: Laser Technology West Limited
    Inventor: John B. Hodsden
  • Patent number: 5961372
    Abstract: This invention relates to a flexible membrane polishing belt against which a substrate, for example a semiconductor wafer, is polished using chemical mechanical polishing principles. A fluidized layer is provided on a surface of a polishing member backing assembly which urges the moving polishing membrane toward the substrate held in a polishing head to be polished. The linear motion of the belt provides uniform polishing across the full width of the belt and provides the opportunity for a chemical mechanical polishing to take place. Several configurations are disclosed. They include belts which are wider than the substrate being polished, belts which cross the substrate being polished, but which provide relative motion between the substrate and the polishing belt, and polishing belt carriers having localized polishing areas which are smaller than the total area of the substrate to be polished.
    Type: Grant
    Filed: December 5, 1995
    Date of Patent: October 5, 1999
    Assignee: Applied Materials, Inc.
    Inventor: Norm Shendon
  • Patent number: 5931726
    Abstract: An adjustment plate (10) is used for holding a fixture plate (12) adjustably on a grinder table (14). The adjustment plate (10) includes a shoulder bolt (30) that passes through the fixture plate (12) and threadably engages the adjustment plate (10). The adjustment plate (10) further includes a toggle bolt assembly (50) attached to the base of the adjustment plate to engage the fixture plate (12). The shoulder bolt (30) and the toggle bolt (50) allow the fixture plate (12) to be adjusted about the vertical axis of the adjustment plate (10). The adjustment plate (10) further includes a clamp (32) that is used to clamp the fixture plate (12) to the adjustment plate (10) when the fixture plate (12) is properly positioned. The adjustment plate (10) is attached to the grinder table (14) by a plurality of T-bolts (64) slidably received in T-bolt holes (70) in adjustment plate (10). A plurality of set screws (80) are threadably received in adjustment plate (10) and each engage the grinder table (14).
    Type: Grant
    Filed: December 19, 1997
    Date of Patent: August 3, 1999
    Inventor: Jeffrey T. Peters
  • Patent number: 5928068
    Abstract: A superfinishing apparatus has an abrasive film feed mechanism for feeding out and winding up an abrasive film (4). The apparatus includes a backup roll (2) for pressing and vibrating the film against a workpiece. A guide member (3) is provided for the film feed mechanism immediately before the backup roll (2). The guide member has two pairs of helical grooves (11, 12) and (13, 14) arranged opposite in turning direction to each other. The helical grooves are different in radius from the center from each other and are provided on both side faces of the guide member. Also, when the film has passed through the helical grooves (11 and 13 or 12 and 14), its traveling path is translated transversely of the guide member.
    Type: Grant
    Filed: September 16, 1997
    Date of Patent: July 27, 1999
    Assignee: Matsuda Seiki Co., Ltd.
    Inventors: Hiroshi Matsuda, Masazumi Fujihara
  • Patent number: 5864746
    Abstract: The surface of a fingernail is efficiently and uniformly ground by a grinder having an endless grinding belt that is adjustably supported between a rotating wheel mounted on a follower axle and a connecting portion of a driving axle carried by a connecting seat. The driving axle is rotated by a round axle disposed within a hollow pipe and rotated by a driving unit.
    Type: Grant
    Filed: January 29, 1998
    Date of Patent: January 26, 1999
    Inventor: Lin Wu Chang
  • Patent number: 5830042
    Abstract: Rice or like small objects is milled in a machine comprising a rotating vertical drum having an endless abrasive belt. Chambers are spaced about the drum so that the belt acts as a floor to the chambers with a slight gap in between. The objects are passed vertically downwards and abraded by the belt, surface material removed from the objects passing through the gap and falls out via a subsidiary outlet alongside the main outlet of each chamber.
    Type: Grant
    Filed: October 21, 1996
    Date of Patent: November 3, 1998
    Assignee: Koolmill Systems Limited
    Inventor: Alexander Stephen Anderson
  • Patent number: 5762542
    Abstract: An edge grinding device for rounding off edges of members which are passed through the grinding device. The device includes a main frame for supporting the structural member, and a grinding aggregate which is pivotably mounted on the frame about an axis running substantially parallel to the directional motion of the member, the grinding aggregate having a grinding element which has a convex grinding surface, wherein the grinding aggregate pivots the convex grinding surface about the edge which is to be round while the member is moving through the device.
    Type: Grant
    Filed: June 5, 1996
    Date of Patent: June 9, 1998
    Assignee: Grobi A/S
    Inventor: Arne Sandvold
  • Patent number: 5645471
    Abstract: The present invention relates to a method of texturing a rigid disk for magnetic media applications, using a coated abrasive article comprising a backing having at least two regions of abrasive coating bonded to one side of the backing. The at least two regions of abrasive coating have different abrasive natures.
    Type: Grant
    Filed: August 11, 1995
    Date of Patent: July 8, 1997
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Darlene N. Strecker
  • Patent number: 5613900
    Abstract: An abrading apparatus for cleaning an outer surface of an elongate member, such as a wire. An endless abrasive sanding belt is rotated about a plurality of rollers and orbited about the elongate member. Drive components for both rotating the belt about the rollers as well as orbiting the belt about the elongate member are isolated in an enclosed drive casing containing lubricating fluid, such as oil. A first roller which mounts the endless sanding belt is fixed in a rotatable eccentric support. This eccentric support allows the tension of the endless belt to be adjusted by rotating the eccentric support in one of two directions. One of the rollers includes a mounting portion and a belt supporting portion, with the mounting portion being axially offset or eccentric with respect to the belt supporting portion. A belt engagement and disengagement mechanism is connected to the eccentric mounting portion of the idler roller to allow rotation of the eccentric mounting portion in two directions.
    Type: Grant
    Filed: June 27, 1995
    Date of Patent: March 25, 1997
    Assignee: L&P Property Management Company
    Inventor: Henry Ramsey
  • Patent number: 5586926
    Abstract: Method for texturing a surface of a metallic thin film of a magnetic disk substrate comprising the steps of: (a) frictionally contacting the surface of the metallic thin film with an abrasive article, wherein the abrasive article comprises an abrasive coating including a water-soluble binder and abrasive particles, wherein the abrasive coating is adhesively attached to a flexible foraminous fibrous backing; and (b) abrading the surface of the metallic thin film by moving the metallic thin film and the abrasive article relative to one another with the abrasive coating in contact with an aqueous liquid solution to form scratches in the surface of the metallic thin film, wherein the liquid solution is free of abrasive particles before contact is initiated with the abrasive coating.
    Type: Grant
    Filed: September 6, 1994
    Date of Patent: December 24, 1996
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Eric D. Wedell, Darlene N. Strecker
  • Patent number: 5512009
    Abstract: A method and apparatus is provided for reducing optical chatter for use with a machine that is adapted to perform an operation on a surface of a workpiece by bringing a rotating roller into contact with the surface as the workpiece is advanced past the roller. The roller of the machine has a central axis and is powered to rotate about the central axis. The apparatus comprises an oscillation inducing device that is operably coupled to the roller for inducing an axial oscillation in the roller. The frequency of the induced oscillation of the roller is substantially greater than the frequency of rotation of the roller. The method for reducing optical chatter comprises the step of imparting axial oscillations to the roller during rotation of the roller, the imparted oscillations being of substantially greater frequency than the frequency of rotation of the roller.
    Type: Grant
    Filed: March 1, 1994
    Date of Patent: April 30, 1996
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Douglas E. Earl
  • Patent number: 5471796
    Abstract: A multiple purpose lathe which can include a special valve polishing device, a camshaft lap device and other mechanisms. The valve polishing device includes a pair of generally axially parallel, rotatable rollers positioned to bear against and support a valve stem held therein while being polished by a movable belt. The camshaft lap device includes, optionally, a movable wheel bearing against the polishing belt which, in turn, bears against the camshaft being polished.
    Type: Grant
    Filed: June 12, 1992
    Date of Patent: December 5, 1995
    Inventor: Gary F. Thompson