Abstract: The present disclosure provides fluid barriers as well as systems and methods of forming fluid barriers. The method includes cleaning, via a blast media, a first side of a component and heating the component to a first temperature. Subsequently, the component is cleaned using a solvent. Subsequent to heating at least the component, a primer coating layer is formed on the first side of the component, and a topcoat layer is formed in contact with the primer coating layer. A primer coating material can be heated to a second temperature prior to formation of the primer coating layer. The first temperature can be different than the second temperature.

Abstract: A processing device, a sheet manufacturing apparatus, a processing method, and a sheet manufacturing method that suppress damage to a substrate when removing color material from the substrate, and are useful for recycling the substrate after color material is removed, are provided. A processing device has a color material removal device including at least one discharge nozzle configured to discharge particles containing cellulose to a substrate holding color material, and remove the color material from the substrate. The color material removal device preferably has a double-walled conduit construction having an internal conduit and an external conduit in which the internal conduit is inserted, at least one of an opening to the internal conduit and an opening to the external conduit functioning as the discharge nozzle.

Abstract: Polymer composites are provided, and more particularly, polymer composites of ground date pits disposed in a polymer matrix. The composites can be formed by a process of preparing reinforced polymer composites having a fibril melt fracture surface, including blending a mixture of date pit particulate with a thermoplastic polymer; melting the mixture; and forcing the melt through a die to produce the polymer composite having a fibril containing surface.

Abstract: Provided are a method of manufacturing an alumina-based abrasive grain, which includes preparing boehmite powder and activated alumina powder as starting materials, forming a sol by wet-blending and crushing the boehmite powder, the activated alumina powder, a solvent and a deflocculant, heating the sol at a first temperature which is higher than a room temperature and lower than a boiling point of the solvent and stirring the sol so as not to generate a precipitate, forming a gel by heating the sol at a second temperature higher than the first temperature at which a viscosity of the sol is increased and the sol becomes a paste, blending the gel with an organic solvent and performing wet crushing on the resulting mixture, preparing a powder by drying the wet-crushed gel, blending a binder and a solvent with the dried product, which is the powder, and molding the resulting mixture, calcining the molded product, performing dry crushing on the calcined product, and sintering the dry-crushed product to transform

Abstract: Provided is a polishing composition, which comprises abrasive grains, a water-soluble polymer, an aggregation inhibitor and water. The ratio R1/R2 is 1.3 or less, where R1 represents the average particle diameter of the particles present in the polishing composition and R2 represents the average particle diameter of the abrasive grains when the abrasive grains are dispersed in water at the same concentration as that of the abrasive grains in the polishing composition. The polishing composition can be used mainly for polishing the surface of a silicon substrate.

Abstract: A coated abrasive product includes a particulate material containing green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles, a nanoparticle binder, a dual function material, and a cross-linking agent. These green unfired abrasive aggregates can also be used in free abrasive products and bonded abrasive products.

Abstract: An abrasive article comprising an abrasive particle including a core comprising a compressible material, an intermediate layer comprising a binder material overlying an exterior surface of the core, and an outer layer comprising abrasive grains overlying the intermediate layer.

Abstract: An abrasive element consisting substantially of a glass material that is at least partially devitrified.

Abstract: The present invention provides an aqueous wiresaw cutting fluid composition that reduces the amount of hydrogen produced during a wiresaw cutting process. The composition is comprised of an aqueous carrier, a particulate abrasive, a thickening agent, and a hydrogen suppression agent.

Abstract: The polishing composition contains polyoxyethylene sorbitan mono-fatty acid ester, silicon dioxide, water soluble cellulose, an alkaline compound, and water. The content of polyoxyethylene sorbitan mono-fatty acid ester in the polishing composition is less than 0.0025% by mass. The polishing composition is appropriate for final polishing of silicon wafers.

Abstract: A coated abrasive product has a backing member, a layer of adhesive and a planar paper or cloth-like abrasive sheet attached to the backing member via the adhesive layer. The backing member is made of a pliant, malleable, metallic material, configured to be bent and shaped into a multitude of different, fixed shapes and configurations. In use during sanding operations, the abrasive sheet remains attached to the backing member, while conforming to the fixed configurations of the backing member.

Abstract: An intermediate product for use in the production of abrading or cutting tools has the form of a soft, easily deformable paste comprising powdery sinterable matrix material, binding agent and solvent for the binding agent, the paste having superabrasive particles dispersed therein, the superabrasive particles being individually encrusted within a coating of presintered material.

Abstract: The invention provides a composition for chemical-mechanical polishing. The composition comprises an abrasive, a first metal rate polishing modifier agent, a second metal rate polishing modifier agent, and a liquid carrier. In one embodiment, the first metal rate polishing modifier agent has a standard reduction potential less than 0.34 V relative to a standard hydrogen electrode, and the second metal rate polishing modifier agent has a standard reduction potential greater than 0.34 V relative to a standard hydrogen electrode. In other embodiments, the first and second metal rate polishing modifier agents are different oxidizing agents.

Abstract: An abrasive slurry, abrasive article, and method is provided for forming an abrasive coating on a surface of a backing. The abrasive slurry includes a continuous phase, a first discontinuous phase of abrasive particles dispersed in the continuous liquid phase, and a second discontinuous phase of binder precursor particles dispersed in the continuous liquid phase, so that the continuous liquid phase carries the first and second discontinuous phases. A coated abrasive article is formed by coating the abrasive slurry onto the surface of the backing, and then removing the continuous phase.

Abstract: A new industrial thermally stable polycrystalline diamond (TSP) is disclosed and described as a replacement of natural as well as synthetic diamond grit in concrete cutting, grinding, polishing, and surface-set grinding or core bit drilling applications. Conventional diamond is too strong and brittle for self-sharpening and polishing and has a lower thermal stability inferior to the industrial standard for high temperature tool segment bonding. TSP grits can be tailor-made having unique properties as well as an engineered shape of grits over naturally or synthetically produced diamond grits. The TSP grits have a high thermal stability of up to 1200° C. and are self-sharpening. Further, economical production of coarse TSP grit size up to 1-2 mm from 50/60 mesh size in almost any preferred shape such as blocky, round, hexagonal, thin elongated, spherical, needle like, and any desirable tailor-made shaped etc can be realized.

Abstract: Polycrystalline grits and methods of making grits which allow for a high degree of shape and size distribution control, as well as improved abrasive performance are described and disclosed. In one aspect, an abrasive slurry can be formed into a plurality of abrasive precursors arranged on a substrate using screen-printing or other techniques. The abrasive slurry can include a binder and a plurality of abrasive particles. The abrasive precursors on the substrate can then be covered with a pressure medium and then subjected to pressure and temperature conditions sufficient to cause sintering of the abrasive particles to form polycrystalline grits. The polycrystalline grits produced by such methods can have a substantially uniform shape and size distribution.

Abstract: The present invention provides an aqueous composition useful for polishing copper on a semiconductor wafer at a down force pressure of at least less than 20.68 kPa, comprising by weight percent oxidizer, 0.001 to 5 inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, 0.01 to 5 carboxylic acid polymer, 0.01 to 5 modified cellulose, 0.001 to 10 phosphorus-containing compound and 0.001 to 10 boehmite abrasive, wherein the boehmite increases the planarization rate of the copper.

Abstract: The present invention provides an aqueous slurry composition that comprises cerium oxide and/or cerium oxide-containing mixed rare earth oxide abrasive particles, a polyacrylate, and an agent that retards hard settling. The agent that retards hard settling is preferably a polysaccharide such as xanthan gum, microcrystalline cellulose and/or sodium alginate, the latter of which may be treated with a divalent metal salt such as calcium carbonate. The slurry composition according to the invention can be used to polish glass and glass ceramics at a high removal rate, but does not hard settle upon extended static conditions and can be easily resuspended. The present invention also provides a method of polishing a glass or glass ceramic substrate using the slurry composition.

Abstract: The polishing composition contains polyoxyethylene sorbitan mono-fatty acid ester, silicon dioxide, water soluble cellulose, an alkaline compound, and water. The content of polyoxyethylene sorbitan mono-fatty acid ester in the polishing composition is less than 0.0025% by mass. The polishing composition is appropriate for final polishing of silicon wafers.

Abstract: The invention provides a polishing pad for chemical-mechanical polishing comprising a body, a polishing surface, and a plurality of elongated pores, wherein about 10% or more of the elongated pores have an aspect ratio of about 3:1 or greater and are substantially oriented in a direction that is coplanar with the polishing surface. The invention further provides a method of polishing a substrate.

Abstract: A superfinishing grindstone suitable for precision grinding, that contains either RB (rice bran) ceramic fine grains or CRB (carbonized rice bran) ceramic fine grains or a combination of both, for use as abrasive grains. The grains of RB ceramic fine grains and CRB ceramic fine grains have multiple small pores which allow the grains to be easily removed from a finished structure. These fine grains have a high Vickers hardness, which makes them highly resistant to bending, scratching, abrasion or cutting.

Abstract: A polishing material is provided in which the dispersibility of the abrasive grains of the polishing material having, as a major component, rare earth oxides including cerium oxide is made better and the hardness of abrasive grain precipitates is reduced, and at the same time high efficiency of polishing can be achieved stably. According to the present invention, in a polishing material having, as the major component, rare earth oxides including cerium oxide, any one of crystalline cellulose, calcium secondary phosphate, a condensate of sodium &bgr;-naphthalenesulphonate and formalin, and synthetic silica is contained as an anti-solidification agent capable of softening abrasive grain precipitates of the polishing material when the abrasive grains of the polishing material are dispersed into a dispersion medium, and sodium hexametaphosphate or pyrophosphate is contained as a dispersant capable of dispersing the abrasive grains of the polishing material into the dispersion medium.

Abstract: An abrading composition and a process for abrading factory pre-finished surface coverings, wherein the abrading composition comprises an effective amount of wear-resistant particles, a rheology modifier, and a solvent. This invention further relates to a process to abrade wood floor surfaces and factory pre-finished wood floor surfaces, as well as a process for refinishing a factory pre-finished wood floor using the abrading composition.

Abstract: To provide a polishing composition which enables maintenance of excellent properties and high quality of the surface of a hard disk without lowering polishing rate during polishing of the surface, and which can provide a polished surface in which the amount of dub-off is considerably reduced as compared with that of a conventional level, a polishing composition containing water, a polishing material (particularly alumina), a polishing accelerator, and at least one of hydroxypropyl cellulose and hydroxyalkyl alkyl cellulose is provided.

Abstract: A polishing compound containing cocoon-shaped silica particles and crystal silica particles, and water-soluble polymers including; at least one type selected from the groups including ammonium nitrate and ammonium acetate, and at least one type selected from methylcellulose, carboxymethylcellulose, hydroxyethylcellulose, and the group including carboxymethylcellulose.

Abstract: There is provided a polishing compound for sheet metal coating comprising an polishing material and a surfactant in which a RB ceramics and/or CRB ceramics powder is used at least as a part of the polishing material, thereby shortening a stain removing process of a coated surface in reparative sheet metal coating work of cars, etc. without conducting a washing process thereafter.

Abstract: There is provided a polishing compound for sheet metal coating comprising an polishing material and a surfactant in which a RB ceramics and/or CRB ceramics powder is used at least as a part of the polishing material, thereby shortening a stain removing process of a coated surface in reparative sheet metal coating work of cars, etc. without conducting a washing process thereafter.

Abstract: Manufacture of a polishing pad for polishing a semiconductor substrate, involves, transporting a backing layer to successive manufacturing stations, supplying a fluid phase polymer composition onto the transported backing layer, shaping the fluid phase polymer composition into a surface layer having a measured thickness, and curing the polymer composition on the transported backing layer in a curing oven to convert the liquid phase polymer composition to a solid phase polishing layer attached to the transported backing layer.

Abstract: The object of the present invention is to provide a polishing agent for processing semiconductor, which can control coagulation and sedimentation and has stable and re-productive polishing properties under a proper dispersing condition to prevent generation of polishing flaw. The polishing agent for processing semiconductor comprises a compound having glucose structure, polishing particles and water.

Abstract: A method for making a polymeric blast media, and a product of this method. The first step involves blending a melamine compound with a cellulosic material and compression molding said first blend to produce a compression molded first blend. This first blend is then cooled and then ground. In the next step of this method, a urea compound is blended with a nano-clay material to produce a second blend and compression molded. This compression molded second blend is then ground to produce a particulate second blend. The particulate first blend is then blended with the particulate second blend. A blast media product of this method is also disclosed.

Abstract: Abrasive articles are provided having at least one of a backing material saturated with a saturant, a barrier coat, a make coat, a size coat layer or combinations thereof wherein the saturant and layers consisting essentially of 100% solids radiation-cured resin of one or more vinyl ether monomers and/or oligomers.

Abstract: A method for production of stone pattern processing mills including the steps of application of compression to resin, cellulose, and milling material in a mold module. The resin and milling material are combined to form milling granules to be bound to the cellulose substances so as to form a milling grain cellulose layer. The backside of the milling grain cellulose layer is covered with suitable flexible substances to form a hollow-set machine/grind cushion meant for coupling with a mill chassis for use. Alternatively, the backside of the machine/grind cushion may be filled with flexible or hard material so as to form a one-piece mill.

Abstract: A coated abrasive sheet material comprising (a) a backing substrate having at least one major surface, (b) a plurality of abrasive grains, (c) a binder bonding said plurality of abrasive grains to said at least one major surface of the backing substrate, wherein the backing substrate comprises paper having a basis weight of less than about 200 g/m.sup.2 which is essentially free of latex saturants and has on said at least one major surface with the plurality of abrasive grains, one or more extruded layers of a thermoplastic polymer, and a method of making the coated abrasive sheet material.

Abstract: A polishing composition is shown which includes (1) a polishing media particle; (2) a film forming binder for suspending the particle and forming a temporary film on an exposed surface of the workpiece, the temporary film being dissolvable in a subsequently applied polishing wash, whereby the polishing media particle is freed to polish the workpiece; (3) a solvent for suspending the polishing media particle in the film forming binder to facilitate forming the temporary film; and (4) a wetting agent to improve the wettability of the composition on the exposed surface of the workpiece.

Abstract: The present invention relates to an article of manufacture or polishing pad for altering a surface of a workpiece, such as polishing or planarizing a semiconductor device. The article includes a polymeric matrix impregnated with a plurality of polymeric microelements, each polymeric microelement having a void space therein. The article has a work surface and a subsurface proximate to the work surface. When the article is in contact with a working environment, polymeric microelements at the work surface of the article are less rigid than polymeric elements embedded in the subsurface. As the work surface of the article is abraded during use, the work surface of the pad may be continuously regenerated. In alternative preferred embodiments, the work surface may further include a minitexture and/or a macrotexture. Preferably, the minitexture is formed by fractal patterning at least a portion of the work surface.

Abstract: An abrasive is produced by crushing a cured product of a phenol resin composition into particles, and washing with water and drying the particles. The phenol resin composition may comprise as principal constituents a phenol resin and an organic filler, or a phenol resin, an organic filler and an inorganic filler.

Abstract: This invention relates to a composition comprising: water; particulate abrasive dispersed in said water, said abrasive having a Knoop scale hardness of at least about 1000 and an average particle size of from about 1 micron up to a U.S. Sieve Series Number of about 50; and an effective amount of at least one thickener to maintain a stable dispersion of said abrasive in said water. The inventive composition can contain one or more surfactants and/or one or more chelating agents. In one embodiment the invention provides for a water-based polish that can be used on any nonporous surface (e.g., glass, plastic, metal, painted surfaces, waxed surfaces, marble, ceramic, soft-precious and semi-precious stones, semi-conductor materials, metallurgical and geological specimens, Formica, etc.).

Abstract: A method of producing a composite diamond abrasive compact includes the steps of forming an unbonded assembly comprising a cemented carbide body, a layer of catalyst metal on a surface of the carbide body, a layer of carbide particles, alone or in admixture with other particles, on the catalyst metal layer, and a layer of diamond particles on the carbide layer and subjecting the unbonded assembly to conditions of elevated temperature and pressure at which diamond is crystallographically stable to form a composite diamond abrasive compact.

Abstract: A polishing method and abrasive pads used to polish of abrade, for example, lenses. The pad is manufactured with an abrasives such as grains of the mean diameter: 0.5-10 .mu.m of alumina, zirconium oxide, tin oxide, and cerium oxide, a kind of water-soluble cellulose ether selected from the group of hydroxypropylmethyl and the like, and a kind of insolubilizing agent such as glyoxal, citric acid, and the like. The substances above are blended and coated on a sheet-like substrate. In polishing process, only water is poured between the rotating abrasives pad and goods to be polished.

Abstract: The invention provides a method of making an abrasive product which comprises a layer of bonded ultra-hard abrasive particles bonded to a substrate. The abrasive product is typically a diamond or cubic boron nitride composite compact.

Abstract: The inventin provides a method of making an abrasive product which comprises a layer of bonded ultra-hard abrasive particles bonded to a substrate. This abrasive product is typically a composite abrasive compact.

Abstract: A surfacing pad is produced by dispersing abrasive particles in a flexible, water absorbent matrix that is secured on a flexible, fabric substrate, which functions as a reservoir for a liquid. By applying to the pad a small quantity of liquid sufficient to wet the matrix and to saturate the substrate, it is possible by rubbing the surfaces of a workpiece and the wetted matrix to create an abrasive surfacing gel between the workpiece and the pad substrate, thus eliminating the need for directing a slurry or other liquid onto the workpiece during a surfacing operation.

Abstract: An effective abrasive composition is provided for polishing a plastic article, particularly a plastic lens, to give a mirror surface thereto. This abrasive composition comprises water, an aluminous abrasive and at least one polishing accelerator selected from the group consisting of aluminum oxalate and aluminum lactate, optionally with at least one sedimentation preventing agent selected from the group consisting of crystalline cellulose and colloidal alumnia.

Abstract: An abrasive composition comprising: an aluminous abrasive, preferably having an average particle size of 0.5-10 .mu.m and a concentration of 1 to 25% by weight; nickel sulfamate and/or sulfate, preferably having a concentration of 0.5 to 10% by weight; magnesium nitrate, preferably having a concentration of 0.1 to 12% by weight and water, the composition preferably having a pH of 4 to 7. This abrasive composition produces a superior effect, particularly a reduction of protrusions and pits and deep scratches when used for polishing an aluminum-based substrate for a magnetic recording disc.

Abstract: A method of preparing abrasive articles exhibiting improved homogeneity and breakdown properties is disclosed. The method comprises admixing abrasive grits and a bond phase comprising silica particles, alumina, a flux and water, to form a slurry, such that the silica particles are on the average smaller than the average grit particles; drying the slurry to form a precursor powder; and compacting the precursor powder to form an abrasive greenware article. This abrasive greenware article can then be densified, for example, by sintering, to form a densified abrasive article. The resulting abrasive article has a porcelain bond composition. Because of the uniform bond composition attained with this invention, extremely fine abrasive grits can be employed.

Abstract: The present invention relates to a compound and method for polishing stone wherein the compound is a mixture of metallic oxides, a resin and a pre-prepared gel which compound is utilized in conjunction with sandpaper of varying grits to provide a smooth high-gloss finish to the cut, rough-edged stone or marble.

Abstract: A composite abrasive compact is produced by placing strips of suitable abrasive material on a cemented carbide substrate. The strips each comprise abrasive particles, optionally with a particulate second phase, in an organic binder. The organic binder is first removed by volatilization. Then, the cemented carbide substrate with the strips thereon is subjected to compact-producing conditions of elevated temperature and pressure.

Abstract: In this method of abrading woven material in a washing machine, the woven material is placed in the washing machine. A predetermined amount of abrasive unaltered mature pits are added to the washing machine. The washing machine is operated in the run mode for a predetermined time. The abraded woven material and the abrasive pits are removed from the washing machine.

Abstract: A cleaning tape comprising a support having coated thereon a cleaning layer containing a binder and an organic polymer powder is disclosed.

Abstract: The polishing composition for a centrifugal magnetic-abrasive machine for machining complex profiled workpieces. The composition exhibits ferro-magnetic properties and could be used in all centrifugal and magnetic-abrasive machines but more particularly in the combined centrifugal magnetic-abrasive machines wherein high roughness grades of the machined surfaces are obtained from comparatively low speeds of centrifugal packing and low magnetic field intensity. The composition is made of a 84-86% mixture of abrasive grains and iron-powder; 4-6% of a mixture of chromium sesquioxide, stearine, and oleic acid; 4-6% ground fruit pits or sawdust; and 4-6% of a 3% aqueous solution of triethanolamine soap. In their respective mixtures the abrasive grains are 5-40 mm in size and amount to 16-20%, the iron-powder amounts to 80-84%, the chromium sesquioxide of the 1-10 mm grain size amounts to 55-57%, the stearine amounts to 37-39%, and the oleic acid amounts to 5-7%.