Processes Of Preparing A Solid Polymer From At Least One Silicon Containing Monomer; Or Compositions Therefore Patents (Class 522/172)
  • Publication number: 20140110888
    Abstract: A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and at least one stabilizer.
    Type: Application
    Filed: December 24, 2013
    Publication date: April 24, 2014
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Frances A. Houle, Hiroshi Ito
  • Patent number: 8703838
    Abstract: The invention provides an improved unsaturated polyester prepared from the polycondensation of unsaturated diacid monomers or unsaturated acid anhydride mononers and polyol monomers and, optionally, one or more saturated aliphatic or aromatic diacid monomers or anhydride monomers thereof. The improvement comprises 0.5 to 50 weight percent, based on the total monomer weight, of a hydroxyalkyl-functional siloxane of formula (1) below. The invention also relates to a UV curable coating formulation containing a siloxane-functional unsaturated polyester resin, a vinyl ether functional diluents and a photoinitiator. The invention further provides a method of preparing an article with a low-surface energy coating. According to the method, at least one surface of an article with a coating formulation of the invention; and the coating is then cured as described above with UV light to form a low-surface energy coating on the surface.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: April 22, 2014
    Assignee: NDSU Research Foundation
    Inventors: Dean C. Webster, Neena Ravindran, Ankit Vora
  • Patent number: 8685499
    Abstract: Coating of flexible materials with liquid compositions is disclosed. The compositions advantageously comprise one or more polyorganosiloxanes crosslinkable by polyaddition, by dehydrocondensation, by polycondensation, cationically or free-radically to form a protective coating or film having, in particular, release and/or water-repellency properties.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: April 1, 2014
    Assignee: Bluestar Silicones France SAS
    Inventors: Nadia Martin, Tania Ireland, Jean-Marc Frances, Martial Deruelle, Yassine Maadadi
  • Patent number: 8664291
    Abstract: Provided is an ultraviolet-curable ink jet ink composition with excellent curability and storage stability, the composition containing a monomer A represented by Formula (I): CH2?CR1—COOR2—O—CH?CH—R3 (wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C2-C20 divalent organic residue, and R3 represents a hydrogen atom or a C1-C11 monovalent organic residue); a (meth)acrylated amine compound; a hindered amine compound other than the (meth)acrylated amine compound; and a photopolymerization initiator.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: March 4, 2014
    Assignee: Seiko Epson Corporation
    Inventors: Hiroaki Kida, Chigusa Sato, Hiroyuki Kajimoto, Toru Saito
  • Patent number: 8658738
    Abstract: A curable resin composition, comprising 100 parts by mass of a (meth)acrylic polymer (A) having, at a terminal thereof, at least one crosslinkable silyl group; 0.1 to 100 parts by mass of a diamine compound (B) having a monovalent or bivalent aliphatic or alicyclic hydrocarbon group that has 8 or more carbon atoms and may be branched and having at least one primary amino group; and 0.1 to 100 parts by mass of a diamine compound (C) having a monovalent aliphatic or alicyclic hydrocarbon group that has 8 or more carbon atoms and may be branched, and having a crosslinkable silyl group and/or a (meth)acryloyl group.
    Type: Grant
    Filed: June 24, 2009
    Date of Patent: February 25, 2014
    Assignee: Kaneka Corporation
    Inventors: Jun Kotani, Nobuyuki Kobayashi, Hiroyuki Hosoda, Kazunori Ishikawa
  • Patent number: 8642673
    Abstract: The present invention relates to the use of alkoxysilane components in the presence of acid-generating photoinitiators in radiation-curable, free-radically crosslinkable formulations which in the cured state offer a particular degree of corrosion control for metallic substrates.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: February 4, 2014
    Assignee: Evonik Degussa GmbH
    Inventor: Emmanouil Spyrou
  • Patent number: 8637585
    Abstract: Photoinitiator compounds comprising both a photoactive moiety and an amine functionality, bonded to a polyhedral oligomeric silsesquioxane, which photoinitiator is represented by formula (1) or (1?) wherein n is 2m; m is an integer of 2 to 30; the sum of n?+a is an integer 4-60; n? is an even-numbered integer; a is an even- or uneven-numbered integer; and for example different A C1-C12alkyl, or a photoactive moiety Q1, or a group of formula (2); E for example is a direct bond, L is linear or branched C1-C3alkylene, preferably propylene; R1 and R2 for example are a photoactive moiety Q, or C2-20alkyl; Q is for example a group of formula (4); Z2 is for example C1-C6alkylene which is unsubstituted or substituted by one or more OR6; and R6, R12, R13 and R14 for example are hydrogen; are especially suitable as low-migrating photoinitiators.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: January 28, 2014
    Assignee: BASF SE
    Inventors: Markus Frey, Christophe Frossard, Katia Studer, Karin Powell, Jean-Luc Birbaum, Martin Müller
  • Publication number: 20130341671
    Abstract: A silicone resin composition contains a polysiloxane containing at least one pair of condensable substituted groups capable of condensation by heating and at least one pair of addable substituted groups capable of addition by an active energy ray.
    Type: Application
    Filed: June 7, 2013
    Publication date: December 26, 2013
    Inventors: Haruka ONA, Hiroyuki Katayama, Sadahiro Nakanishi
  • Publication number: 20130302623
    Abstract: Provided are a coating composition for low refractive layer including fluorine-containing compound of the following Chemical Formula 1, an anti-reflection film using the same, and a polarizer and an image display device including the same, wherein the fluorine-containing compound of the following Chemical Formula 1 has a low refractive index of 1.28 to 1.40, thereby making it possible to easily adjust a refractive index of the anti-reflection film and be usefully used as a coating material of the anti-reflection film having an excellent mechanical property such as durability, or the like.
    Type: Application
    Filed: November 1, 2012
    Publication date: November 14, 2013
    Applicant: SK INNOVATION CO., LTD.
    Inventor: SK INNOVATION CO., LTD.
  • Publication number: 20130288052
    Abstract: Adhesive compositions, including pressure sensitive adhesives, are the reaction product of free radically polymerizable mixtures. The free radically polymerizable mixtures include a free radically polymerizable urethane-based or urea-based oligomer, a free radically polymerizable segmented siloxane-based copolymer, and an initiator. The free radically polymerizable mixture may contain additional reactive and/or unreactive additives. The adhesive compositions can be used to prepare a variety of adhesive articles.
    Type: Application
    Filed: October 31, 2011
    Publication date: October 31, 2013
    Applicant: 3M Innovative Properties Company
    Inventors: Scott M. Tapio, Joan M. Noyola, Michael K. Gerlach, Jeffrey A. Keith
  • Publication number: 20130286604
    Abstract: A photocurable resin composition which hardly causes leakage and is easily formed into a desired shape and an image display device using this photocurable resin composition are provided. Namely, a photocurable resin composition comprises a compound (A) having a photopolymerizable functional group and an oil gelling agent (B), is provided. Also, an image display device having a laminate structure including an image display unit having an image display part, a transparent protective plate, and a resin layer existent between the image display unit and the transparent protective plate, wherein the resin layer is a cured material of the above-described photocurable resin composition, is provided.
    Type: Application
    Filed: March 21, 2013
    Publication date: October 31, 2013
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventor: Hitachi Chemical Company, Ltd.
  • Patent number: 8519019
    Abstract: The invention relates to dental compositions which can be used to produce dental prostheses and for dental restoration.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: August 27, 2013
    Assignee: Bluestar Silicones France SAS
    Inventors: Didier Dhaler, Jean-Marc Frances
  • Patent number: 8519018
    Abstract: A resin includes: an acrylate; and a curing agent to cure the acrylate. The resin is adapted to adhere to a degradable material selected from the group consisting of polylactic polymer (PLA), polyhydroxyalkonate (PHA), poly 3 hydroxybutrate co 3 hydroxyhexanote (PHBH), and paper. The curing agent includes a photoinitiator or a sensitizer that, when cured, form a hard coat when the resin is exposed to ultraviolet radiation or an electron beam.
    Type: Grant
    Filed: February 21, 2010
    Date of Patent: August 27, 2013
    Assignee: Innovative Bottles, LLC
    Inventor: Shantu Patel
  • Publication number: 20130214453
    Abstract: Provided is a photo-curable nanoimprint composition that has excellent properties in terms of etching resistance, dispersibility, and productivity. In addition, the photo-curable nanoimprint composition enables easy transcription of patterns even when a mold is pressed with a relatively low pressure. The photo-curable nanoimprint composition includes: (A) partial hydrolysate obtained by hydrolyzing a mixture of an organic silicon compound and a silicon compound containing (meth)acrylic groups with water in the molar amount of not less than 0.1 times but less than 1.0 times with respect to the number of moles of all alkoxy groups present in the mixture; (B) polymerizable monomer containing (meth)aclyic groups; and (C) pothopolymerization initiator. In addition, the mixture of partial hydrolysate (A) may include further partial hydrolysate of fluorinated silicone compound and/or metal oxide.
    Type: Application
    Filed: October 19, 2011
    Publication date: August 22, 2013
    Applicant: TOKUYAMA CORPORATION
    Inventors: Hideki Umekawa, Yuichiro Kawabata, Yuko Sasaki
  • Publication number: 20130195793
    Abstract: The present invention relates to radiation-curable antimicrobial coatings, to a process for preparation thereof, and to the use thereof.
    Type: Application
    Filed: January 25, 2013
    Publication date: August 1, 2013
    Inventors: Reinhold SCHWALM, Rupert Konradi, Christina Haaf, Herbert Platsch, Catharina Hippius
  • Publication number: 20130196079
    Abstract: The present invention relates to a radiation-curable antimicrobial coating composition, to a process for preparation thereof, and to the use thereof.
    Type: Application
    Filed: January 23, 2013
    Publication date: August 1, 2013
    Inventors: Reinhold Schwalm, Rupert Konradi, Herbert Platsch, Christina Haaf, Catharina Hippius
  • Patent number: 8481241
    Abstract: A radiation curing composition suitable for building a three-dimensional object by a solid freeform method is disclosed. The composition includes one or more mono-functional monomers where a respective polymer has a Glass Transition Temperature higher than about 60° C., one or more di-functional oligomers where a respective polymer has a Glass Transition Temperature lower than about 40° C. and a phase separation inducing component. The phase separation may be induced during curing, resulting in a non-clear cured material having an improved impact strength and higher elongation, when compared to similar compositions without a phase separation including component.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: July 9, 2013
    Assignee: Stratasys Ltd.
    Inventors: Eduardo Napadensky, David Brusilovsky
  • Patent number: 8440735
    Abstract: The instant invention pertains to a method and a fluid composition for producing contact lenses with improved lens quality and with increased product yield. The method of the invention involves adding a phospholipid into a fluid composition including a lens-forming material in an amount sufficient to reduce an averaged mold separation force by at least about 40% in comparison with that without the phospholipids.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: May 14, 2013
    Assignee: Novartis AG
    Inventors: John Dallas Pruitt, Lynn Cook Winterton, Bernhard Seiferling, Jüergen Vogt, Harald Bothe
  • Patent number: 8436066
    Abstract: Compositions that can be polymerized and/or crosslinked into coatings by cationic and/or radical irradiation contain at least one photoinitiator and at least one compound having at least one isocyanate function.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: May 7, 2013
    Assignee: Vencorex France
    Inventors: Jean-Marc Frances, Philippe Barbeau, Jean-Marie Bernard, Damien Bourgeois
  • Patent number: 8436069
    Abstract: The present invention provides an ink composition containing: a radical polymerizable compound; a photopolymerization initiator, and a chain transfer agent; and the radical polymerizable compound includes a monofunctional monomer at a ratio of 85% by weight or more in the total weight of the radical polymerizable compound.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: May 7, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Kazuhiro Yokoi
  • Publication number: 20130109776
    Abstract: There is disclosed a silicone rubber composition curable by a radial ray comprising, at least, (A) an organopolysiloxane shown by the following general formula (1), (B) a phenyl ester derivative having an acryl group, (C) a sensitizer sensitized by a radial ray, and (D) a photosensitive dye, wherein each R1, R2, and R3 independently represents a monovalent hydrocarbon group having 1 to 10 carbon atoms; X represents the same or different monovalent organic group having an acryl group or a methacryl group. As a result, there is provided a silicone rubber composition capable of being cured by irradiation of a radial ray whereby showing excellent adhesion with various substrates, capable of forming a cured film, and capable of easily distinguishing whether it is cured or not by observing appearance when not irradiated with a radial ray.
    Type: Application
    Filed: October 12, 2012
    Publication date: May 2, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: SHIN-ETSU CHEMICAL CO., LTD.
  • Publication number: 20130090408
    Abstract: Disclosed is a photocurable organopolysiloxane composition including (A) 100 parts by weight of diorganopolysiloxane having at least two silicon atoms having a hydroxyl group and/or hydrolyzable group attached thereto in one molecule; and (B) 0.1 to 30 parts by weight of a complex compound composed of titanium(meth)acrylate-trialkoxide and ?-diketone. It will find use as a sealing agent, adhesive, coating material. It is particularly suitable for micro pars and precision molding on account of its good curability and very little cure shrinkage.
    Type: Application
    Filed: October 4, 2012
    Publication date: April 11, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: SHIN-ETSU CHEMICAL CO., LTD.
  • Publication number: 20130072592
    Abstract: A cured thin film may be easily prepared, by curing a photocurable silicone resin composition containing: (A) an organopolysiloxane having two or more alkenyl groups within each molecule, (B) an organohydrogenpolysiloxane having two or more hydrogen atoms bonded to silicon atoms within each molecule, and (C) a photoactive catalyst, by: (i) applying the composition to a substrate, (ii) obtaining a thin film in a semi-cured state by irradiating the applied coating with light, and (iii) heating the thin film in a semi-cured state to achieve complete curing, wherein the spectrum of the light irradiated in step (ii) has a maximum peak in a wavelength region from 300 nm to 400 nm, and the spectral irradiance of light of any wavelength within the wavelength region shorter than 300 nm is not more than 5% of the spectral irradiance of light of the maximum peak wavelength.
    Type: Application
    Filed: September 14, 2012
    Publication date: March 21, 2013
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kenichi INAFUKU, Miyuki WAKAO, Tsutomu KASHIWAGI
  • Publication number: 20130065983
    Abstract: An ultraviolet-curable silicone resin composition including (A) a polyorganosiloxane having a mercaptoalkyl bonded to a silicon atom and having a viscosity at 23° C. of 20 to 25000 cP; (B) an organopolysiloxane having aliphatic unsaturated groups which includes (B1) a linear polyorganosiloxane having aliphatic unsaturated, and (B2) a branched organopolysiloxane which includes an SiO4/2 unit, an R?3SiO1/2 unit and an R?2SiO2/2 unit, and at least three of R? per one molecule are aliphatic unsaturated groups, provided that an amount of (B2) is an amount where a number of the aliphatic unsaturated groups in (B2) based on a total number of the aliphatic unsaturated groups in (B) is 50% or less; (C) a photoinitiator; and (D) a silane compound having an aliphatic unsaturated group.
    Type: Application
    Filed: December 6, 2011
    Publication date: March 14, 2013
    Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventors: Kazuhisa Ono, Koji Okawa
  • Publication number: 20130042972
    Abstract: A thermally conductive adhesive for use in connection with heat-generating electronic components includes an unsaturated carbonyl containing compound combined with a thiol containing compound blended with thermally conductive fillers. The adhesive is fully curable with UV light exposure or within 48 hours at room temperature. The combination of the two different cure methods in this adhesive facilitates rapid and energy efficient manufacturing.
    Type: Application
    Filed: August 16, 2011
    Publication date: February 21, 2013
    Inventors: John Timmerman, Sanjay Misra
  • Patent number: 8378003
    Abstract: Provided are substantially flat membranes that include a block or graft co-polymer and a water transport protein, such as Aquaporin-Z, or a synthetic mimic of such proteins. Also provided are methods of removing contaminants from a liquid, by contacting the liquid with a substantially flat membrane that includes a block or graft co-polymer and a water transport protein or synthetic mimic thereof. Also provided are methods of making such membranes. Further provided are compositions that include at least one active ingredient and vesicles surrounding the active ingredient, where the vesicles include a block or graft copolymer and a water transport protein or synthetic mimic surrounding the active ingredient. Also provided are methods that include administering such compositions to patients.
    Type: Grant
    Filed: December 4, 2008
    Date of Patent: February 19, 2013
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Kumar Manish, Clark Mark, Zilles L. Julie, Mariusz Grzelakowski, Rainer Nehring, WolfGang Meier
  • Patent number: 8377634
    Abstract: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: February 19, 2013
    Assignee: Dow Corning Corporation
    Inventors: John Dean Albaugh, Gregory Scott Becker, Sina Maghsoodi, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle
  • Patent number: 8378004
    Abstract: Silicone coatings and moldings are produced from a photocrosslinkable silicone mixture which contains (A) a polyorganosiloxane containing at least two carbon-carbon multiple bonds, (B) an organosilicon compound containing at least two SiH functions, and (C) a cyclopentadienyl-platinum complex catalyst be activatable by light of 200 to 500 nm, wherein the mixture is heated to 40° C. to 250° C., and then irradiated with light of 200 to 500 nm wavelength.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: February 19, 2013
    Assignee: Wacker Chemie AG
    Inventors: Klaus Angermaier, Philipp Mueller
  • Patent number: 8372999
    Abstract: Disclosed and claimed is a novel protective coating for metal surfaces. The protective coating includes one part by weight of the organosilane-modified silica nanoparticles made by the disclosed process and further includes from 0.3 to 3 parts by weight of the reaction product of (1) a compound comprising a polyamine in which a plurality of amine groups are bonded to at least one radical selected from the group consisting of hydrocarbon and hydrocarbon ether groups that separate nitrogen atoms of said amine groups by at least four intermediate atoms in a chain, and (2) a silane which carries a plurality of silicon-bonded hydrolyzable groups and a silicon-bonded organic group that is covalently reactive to and which bonds with said amine group, said silane also comprising hydrolyzable groups, to provide a reaction product molecule which comprises an average of 2.5 to 3.5 silane groups per molecule.
    Type: Grant
    Filed: January 27, 2012
    Date of Patent: February 12, 2013
    Assignee: Nalco Company
    Inventors: Brian T. Holland, Ji Cui, Timothy S. Keizer
  • Patent number: 8367190
    Abstract: The present invention relates to a composition for preparing an excellent protecting film with high strength, wear resistance, and excellent barrier property by low temperature hardening, a protecting film prepared therefrom, a substrate comprising the same, and a component or device comprising the same. The composition comprises an organosiloxane polymer a), a photobase generator b), and an organic solvent c).
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: February 5, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Jeong-Man Son, Minjin Ko, Myungsun Moon, Byung-Ro Kim, Jaeho Cheong
  • Publication number: 20130012612
    Abstract: The present invention pertains to a process for producing three-dimensional, self-supporting and/or substrate-supported formed pieces or structures on surfaces by means of site-selective solidification of a liquid to pasty, organic or organically modified material within a bath consisting of this material by means of two- or multiphoton polymerization, whereby the material has at least one compound that has both an organic radical polymerizable via two-photon or multiphoton polymerization and a biocompatible, biodegradable or bioresorbable group, and/or wherein the bath material additionally contains groups or radicals, which are available for an inorganic crosslinking or which are already inorganically crosslinked, providing that both an organic radical polymerizable via two-photon or multiphoton polymerization and a biocompatible, biodegradable or bioresorbable group must be contained in the material.
    Type: Application
    Filed: February 8, 2011
    Publication date: January 10, 2013
    Inventors: Ruth Houbertz-Krauss, Matthias Beyer, Joern Probst, Thomas Stichel
  • Patent number: 8349911
    Abstract: Production of a composition based on silanes for the scratch-resistant, hydrophobic, aqueous coating of metals, plastics, chemical products, ceramic materials, concrete and glass.
    Type: Grant
    Filed: July 2, 2008
    Date of Patent: January 8, 2013
    Assignee: Evonik Degussa GmbH
    Inventor: Adolf Kuehnle
  • Patent number: 8344039
    Abstract: There is provided a photo-curable composition that shows the suppression of a residual film formation and a high adhesion thereof to a substrate in a process for forming a three-dimensional pattern by a photo-imprinting method. A photo-curable composition for forming a three-dimensional pattern by a photo-imprinting method, comprises a monomer having a photopolymerizable group; an inorganic fine particle to which a dispersant is added; and a photopolymerization initiator. It is preferred that the inorganic fine particle (e.g., silica) has an average particle diameter of 1 to 1,000 nm, and the dispersant is a silane coupling agent, particularly a silane coupling agent containing an organic group having a carbon-carbon unsaturated bond or an organic group having an epoxy group.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: January 1, 2013
    Assignee: Nissan Chemical Industries, Ltd.
    Inventor: Makoto Hanabata
  • Publication number: 20120308802
    Abstract: The present invention relates to a novel fluorinated compound, a composition comprising the same, and a method for manufacturing a film by using the same, and more particularly a novel compound having a structure in which one or more fluorine and acrylate-based functional groups are substituted in a silane core, a composition comprising the compound and photoinitiator, and a method for manufacturing a film by using the same. If the composition comprising the compound according to the present invention is used, it is possible to manufacture a film in which a refractive index is low, reflectivity is reduced, and transmissivity is increased.
    Type: Application
    Filed: February 1, 2011
    Publication date: December 6, 2012
    Inventors: Soon-Hwa Jung, Jin-Young Park, Yeong-Rae Chang, Eun-Kyoung Kim
  • Patent number: 8293810
    Abstract: A resin composition suited for rapid prototyping is provided comprising (I) an actinic energy radiation-curable silicone composition, (II) an actinic energy radiation-sensitive polymerization initiator, and (III) an actinic energy radiation absorber. The resin composition experiences little viscosity buildup and maintains fluidity during long-term storage at elevated temperature, and is effective in rapid prototyping or shaping by stereolithography using any actinic energy radiation.
    Type: Grant
    Filed: August 29, 2005
    Date of Patent: October 23, 2012
    Assignees: Cmet Inc., Shin-Etsu Chemical Co., Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Toshiyuki Ozai, Takeshi Miyao
  • Patent number: 8278021
    Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
    Type: Grant
    Filed: July 10, 2008
    Date of Patent: October 2, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hoon Kang, Jae-sung Kim, Yang-ho Jung, Hi-kuk Lee
  • Patent number: 8273519
    Abstract: A hardmask composition includes a solvent and an organosilicon copolymer. The organosilicon copolymer may be represented by Formula A: (SiO1.5—Y—SiO1.5)x(R3SiO1.5)y??(A) wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group, a C1-C20 group containing a chain that includes an aromatic ring, a heterocyclic ring, a urea group or an isocyanurate group, or a C2-C20 group containing one or more multiple bonds.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: September 25, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Mi Young Kim, Sang Kyun Kim, Sang Hak Lim, Sang Ran Koh, Hui Chan Yun, Do Hyeon Kim, Dong Seon Uh, Jong Seob Kim
  • Patent number: 8263679
    Abstract: The invention provide a new class of silicone-containing prepolymers containing dangling polysiloxane-containing polymer chains. This class of silicone-containing prepolymer is capable of being actinically crosslinked to form a silicone hydrogel material with a relatively high oxygen permeability, a reduced elastic modulus, and a relatively high ion permeability. The present invention is also related to silicone hydrogel contact lenses made from this class of silicone-containing prepolymers and to methods for making the silicone hydrogel contact lenses.
    Type: Grant
    Filed: October 28, 2011
    Date of Patent: September 11, 2012
    Assignee: Novartis AG
    Inventors: Jian S. Zhou, Dawn A. Smith
  • Publication number: 20120225263
    Abstract: A curable composition for imprints, containing (A1) a polymerizable compound having at least one of a fluorine atom and a silicon atom, (A2) a polymerizable compound having an aromatic group and (B) a photopolymerization initiator, exhibits good patternability in repeated pattern transferring and solvent resistance.
    Type: Application
    Filed: November 10, 2010
    Publication date: September 6, 2012
    Applicant: FUJIFILM CORPORATION
    Inventor: Kunihiko Kodama
  • Patent number: 8247468
    Abstract: The present invention provides a composition for hard coat capable of forming a hard coat layer having the improved anti-staining property, anti-staining durability, scratch resistance, abrasion resistance, antistatic property and the like. A composition for hard coat comprising: an active energy ray-curable silicone-acrylic copolymer (A); an active energy ray-curable polyfunctional compound (B); and an electrically conductive material (C), wherein the active energy ray-curable silicone-acrylic copolymer (A) contains: a polysiloxane block (a-1), an acrylic block (a-2) containing an active energy ray-curable double bond group, and a fluoroalkyl group-containing acrylic block (a-3).
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: August 21, 2012
    Assignee: TDK Corporation
    Inventors: Kenji Yoneyama, Kazushi Tanaka, Hiroyuki Hashiguchi, Koichi Ueda
  • Patent number: 8247078
    Abstract: Photocurable fluorine compound, compatible with non-fluorine organic compounds, of formula (1), wherein: a is 1-4, b is 0-3, c is 1-4, provided that a+b+c is 3-5; e is 2-8; R1 has formula (2), (C4H8O)f(C3H6O)g(C2H4O)h(CH2O)iR3??(2) wherein f, g, h, and i are independently 0-100, and R1 has an MW of 30-3000, these repeating units may be sequenced at random, and R3 is C1-10 hydrocarbon; R2 is independently H, F, CH3, or CF3; Rf is a perfluoropolyether residue represented by the following formula (3), wherein j, k, l, and m are independently of each other integers of 0 to 50, provided that a molecular weight of Rf is in a range of 200 to 6000, X is F or CF3, and these repeating units may be sequenced at random; Z is a divalent organic group; and d is 0 or 1.
    Type: Grant
    Filed: July 28, 2009
    Date of Patent: August 21, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasunori Sakano, Noriyuki Koike
  • Publication number: 20120183752
    Abstract: A curable composition for imprints which comprises a polymerizable compound having at least one of a fluorine atom and a silicon atom, a photopolymerization initiator, and a compound having a functional group capable of bonding to a substrate exhibits good patternability in transferring patterns, particularly micropatterns.
    Type: Application
    Filed: September 29, 2010
    Publication date: July 19, 2012
    Applicant: FUJIFILM CORPORATION
    Inventor: Kunihiko Kodama
  • Publication number: 20120172484
    Abstract: An optical adhesive film prepared from an optical adhesive composition, an optical adhesive composition, and a display panel, the optical adhesive film having an elongation of about 200 to about 800% and a tensile strength of about 10 gf/mm2 or less, and the optical adhesive composition including a urethane (meth)acrylate copolymer, a reactive monomer, and an initiator.
    Type: Application
    Filed: December 27, 2011
    Publication date: July 5, 2012
    Inventors: Lee June KIM, Ji Hye KWON, Kyoung Jin HA, Kil Sung LEE
  • Publication number: 20120164564
    Abstract: Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration.
    Type: Application
    Filed: June 29, 2010
    Publication date: June 28, 2012
    Inventors: Nabil Amro, Raymond Sanedrin, Sandeep Disawal, Joseph S. Fragala
  • Publication number: 20120148809
    Abstract: There is provided an imprint material from which a film having a high hardness can be formed. An imprint material comprising a component (A), a component (B) and a component (C), the component (A) being a compound having, in the molecule thereof, five or more polymerizable groups, the component (B) being a compound having, in the molecule thereof, two polymerizable groups, and the component (C) being a photo-radical generator.
    Type: Application
    Filed: August 17, 2010
    Publication date: June 14, 2012
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Junpei Kobayashi, Taku Kato, Keisuke Shuto, Masayoshi Suzuki
  • Patent number: 8183303
    Abstract: Disclosed is an adhesive composition including a compound having a multi-functional urethane (meth)acrylate group and an adhesive film prepared by using it. The adhesive composition includes compounds represented by Chemical Formulae 1 to 3. The compound represented by Chemical Formulae 1 to 3 includes an urethane (meth)acrylate group represented by the Chemical Formula 1-1 or 1-2.
    Type: Grant
    Filed: August 11, 2009
    Date of Patent: May 22, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chul Ho Jeong, Yi Yeol Lyu, Sun Jin Song
  • Patent number: 8158694
    Abstract: The present invention provides a one-component dental adhesive composition which can exhibit excellent adhesion to both materials of a dental ceramics and an organic composite containing an inorganic compound, and is excellent in can-stability. More particularly, the present invention provides a one-component dental adhesive composition comprising 1 to 60 parts by weight of (a) a silane coupling agent, 1.0 to 20.0 parts by weight based on 100 parts by weight of the (a) component of (b) an acidic group-containing polymerizable monomer, and 28 to 99 parts by weight of (c) a volatile organic solvent.
    Type: Grant
    Filed: January 18, 2011
    Date of Patent: April 17, 2012
    Assignee: Kabushiki Kaisha Shofu
    Inventors: Hisaki Tanaka, Toshihide Fujii, Yutaka Yamaguchi, Mikito Deguchi
  • Publication number: 20120067236
    Abstract: A resin composition is provided that includes (Component A) a filler having an ethylenically unsaturated group, (Component B) a polymerizable compound having an ethylenically unsaturated group, and (Component C) a polymerization initiator. There are also provided a relief printing plate precursor, a process for producing a relief printing plate precursor that includes a layer formation step of forming a relief-forming layer and a crosslinking step of thermally crosslinking the relief-forming layer, and a process for making a relief printing plate that includes an engraving step of laser-engraving the crosslinked relief-forming layer so as to form a relief layer.
    Type: Application
    Filed: September 21, 2011
    Publication date: March 22, 2012
    Applicant: FUJIFILM CORPORATION
    Inventor: Hisao YAMAMOTO
  • Publication number: 20120064274
    Abstract: An adhesive system including a synergistic combination of a light curable silicone-containing adhesive composition and an amine-containing primer composition that provides desirable bond strength between two articles preferably one of the articles including a polyolefin or polyolefin-based thermoplastic elastomer. Methods of connecting articles, preferably those utilized in fluid transfer applications, utilizing the adhesive system and the resulting adhered assemblies are disclosed.
    Type: Application
    Filed: September 9, 2010
    Publication date: March 15, 2012
    Applicant: Teknor Apex Company
    Inventors: Kevin G. Cai, Darnell C. Worley, II
  • Patent number: 8133931
    Abstract: The present invention discloses an acrylate nanocomposite material which can apply to optoelectronic device encapsulation, dental restorations and light waveguide. The acrylate nanocomposite material comprises an inorganic nano-particle, an acrylate monomer with at least one acrylate group, an imidized acrylate oligomer and a photo-initiator. The acrylate nanocomposite material photopolymerizes to form an organic/inorganic 3D network wherein the absorption (%) is 0.01 to 5.00 and the permeability (g mm/m2 day) is 0.01 to 10.00 thereof. In addition, the transmittance of the nanocomposite is over 90%.
    Type: Grant
    Filed: August 20, 2009
    Date of Patent: March 13, 2012
    Assignee: National Taiwan University
    Inventors: Wei-Fang Su, Sheng-Hao Hsu, Chein-Chih Lin, Min-Huey Chen