Processes Of Preparing A Solid Polymer From At Least One Oxygen Containing Monomer; Or Compositions Therefore Patents (Class 522/178)
  • Patent number: 8309621
    Abstract: Disclosed is a radiation curable solid ink composition comprising: (a) a curable wax; (b) at least one curable monomer, oligomer, or prepolymer; (c) at least one photoinitiator; and (d) a pigment colorant; wherein the ink is a solid at a first temperature of about 25° C. or lower; and wherein the ink is a liquid at a second temperature of about 40° C. or higher; said ink being curable by free-radical polymerization.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: November 13, 2012
    Assignee: Xerox Corporation
    Inventors: Marcel P Breton, Michelle N Chretien, Barkev Keoshkerian
  • Patent number: 8304470
    Abstract: The present invention relates to a resin composition for optical components, which is an ultraviolet-curable transparent resin composition used as a material for an optical component, in which the resin composition includes (A) an epoxy resin having two or more epoxy groups in one molecule thereof, (B) an oxetane compound having one or more oxetanyl groups in one molecule thereof and (C) a photo-acid generator, and in which the component (C) is contained in an amount of 0.01 to 2.0 parts by weight based on 100 parts by weight of a total amount of the components (A) and (B). The present invention also relates to an optical component obtained by using the resin composition for optical components, and a production method thereof.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: November 6, 2012
    Assignee: Nitto Denko Corporation
    Inventors: Hiroshi Noro, Akiko Nakahashi, Hisataka Ito
  • Patent number: 8303862
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter including the same. The photosensitive resin composition for a color filter may include (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1 and a structural unit represented by the following Chemical Formula 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: November 6, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jae-Hyun Kim, Jun-Seok Kim, Sang-Won Cho, Gyu-Seok Han
  • Patent number: 8303838
    Abstract: There is provided novel curable ink compositions comprising inorganic oxide-coated magnetic metal nanoparticles. In particular, there is provided ultraviolet (UV) curable gel inks comprising at least the inorganic oxide-coated magnetic metal nanoparticles, one curable monomer, a radiation activated initiator that initiates polymerization of curable components of the ink. In particular the ink may include a gellant. The inks may also include optional colorants and one or more optional additives. These curable UV ink compositions can be used for ink jet printing in a variety of applications.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: November 6, 2012
    Assignee: Xerox Corporation
    Inventors: Gabriel Iftime, Naveen Chopra, Barkev Keoshkerian, Peter G. Odell, Marcel P. Breton
  • Patent number: 8298454
    Abstract: Disclosed are a photosensitive resin composition and a light blocking layer using the same. The photosensitive resin composition includes (A) a cardo-based monomer represented by the following Chemical Formula 1 or 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the detailed description, (B) a cardo-based resin, (C) a reactive unsaturated compound, (D) a pigment, (E) an initiator, and (F) a solvent.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: October 30, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Jun-Seok Kim, Kil-Sung Lee, Min-Sung Kim
  • Patent number: 8293149
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter may include (A) a copolymer including a structural unit represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: October 23, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Jun-Seok Kim, Kil-Sung Lee
  • Patent number: 8293809
    Abstract: An object of the present invention is to provide a novel cationic photopolymerization initiator that efficiently absorbs light and generates protons. As a means of achieving the object above, a preferred cationic photopolymerization initiator of the present invention includes an initiator comprising a bismuthonium salt represented by the following general formula (II): Wherein R11, R12, and R13 may be the same or different and are each an optionally substituted monocyclic aryl group or an optionally substituted monocyclic heteroaryl group, R14 is an optionally substituted fused polycyclic aromatic group or an optionally substituted fused polycyclic heterocyclic group, and X? is an anion associated with a cation.
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: October 23, 2012
    Assignee: Kyoto University
    Inventors: Yoshihiro Matano, Hiroshi Imahori
  • Patent number: 8288450
    Abstract: An adhesive composition and an optical member, the adhesive composition including 100 parts by weight of a polymer prepared by polymerization of (meth)acrylic ester containing monomers; 0.01 to about 3 parts by weight of an antistatic agent containing an ionic compound and/or a lithium salt; 0 to about 1 part by weight of a silane coupling agent; and about 3 to about 20 parts by weight of a benzotriazole group containing compound; and about 0.05 to about 5 parts by weight of a cross-linking agent, or about 3 to about 30 parts by weight of a multifunctional (meth)acrylate monomer, and 0 to about 5 parts by weight of an active energy-ray initiator.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: October 16, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Cheong Hun Song, Hiroshi Ogawa, Tatsuhiro Suwa
  • Patent number: 8277701
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: October 2, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Seong-Yong Uhm, Sang-Won Cho
  • Patent number: 8278021
    Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
    Type: Grant
    Filed: July 10, 2008
    Date of Patent: October 2, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hoon Kang, Jae-sung Kim, Yang-ho Jung, Hi-kuk Lee
  • Patent number: 8273270
    Abstract: Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, wherein the substituents of Chemical Formulae 1 and 2 are the same as defined in the specification, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: September 25, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Jung-Sik Choi
  • Patent number: 8273167
    Abstract: The present invention provides: a pigment dispersion composition including (A) an organic pigment, (B) a pigment derivative represented by Formula (I) below and (C) a polymer compound having a pigment-adsorptive functional group; a curable color composition including the pigment dispersion composition, a polymerizable compound and a polymerization initiator; and a color filter having a color region formed using the curable color composition and a method for producing the same. Q represents an organic colorant residue; A represents an ethylene group or the like; and R represents a hydroxyl group or a group represented by —NH-A-Z; Z represents —SO3H, —COOH or a salt thereof; and n represents an integer of from 1 to 4. When R represents —NH-A-Z, the structures represented by the two —NH-A-Zs bonded to the triazine ring contained in each of the n partial structures bonded to Q may be the same as each other or different from each other.
    Type: Grant
    Filed: October 24, 2008
    Date of Patent: September 25, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Koichi Sugihara, Kazuhiro Fujimaki
  • Patent number: 8263675
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and a color filter fabricated using the same. The photosensitive resin composition includes (a) an acrylic-based resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator, (d) a pigment, and (e) a solvent. The acrylic-based resin is a copolymer including a repeating unit of an ethylenic unsaturated monomer including a carboxyl group and a repeating unit of an ethylenic unsaturated monomer including an alkoxy 4-oxo butanoic acid group. The photosensitive resin composition for a color filter can have residue removing characteristics, and is capable of forming fine pixels and providing a color filter having high resolution.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: September 11, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Kil-Sung Lee, Jae-Hyun Kim, Chang-Min Lee, Eui-June Jeong
  • Patent number: 8258201
    Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. The photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).
    Type: Grant
    Filed: September 23, 2010
    Date of Patent: September 4, 2012
    Assignee: Asahi Glass Company, Limited
    Inventor: Yasuhide Kawaguchi
  • Patent number: 8252879
    Abstract: Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: August 28, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Han Soo Kim, Min Young Lim, Sung Hyun Kim, Yoon Hee Heo, Dae Hyun Kim, Ji Heum Yoo, Sun Hwa Kim
  • Patent number: 8222313
    Abstract: Radiation curable compositions, such as UV curable ink compositions, contain a polymeric dispersant, a curable material, that includes a carrier and at least one nanoscale fluorescent pigment particle and an optional non-fluorescent colorant. The fluorescent organic nanoparticle composition includes one or more fluorescent dyes dispersed in a polymeric matrix obtained by modified EA latex process or by emulsion polymerization. In a different embodiment, the nanoscale fluorescent pigment particle composition includes pigment molecules with at least one functional moiety, and a sterically bulky stabilizer compound including at least one functional group, the functional moiety of the pigment associates non-covalently with the functional group of the stabilizer, and the presence of the associated stabilizer limits the extent of particle growth and aggregation, to afford nanoscale-sized pigment particles.
    Type: Grant
    Filed: October 6, 2008
    Date of Patent: July 17, 2012
    Assignee: Xerox Corporation
    Inventors: Gabriel Iftime, C. Geoffrey Allen, Maria M. Birau, Christopher A. Wagner, Daryl W. Vanbesien, Jordan H. Wosnick, Peter G. Odell
  • Publication number: 20120171868
    Abstract: There is disclosed A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), one or more kinds of a compound represented by the following general formula (2), and one or more kinds of a compound, represented by the following general formula (3), and/or an equivalent body thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
    Type: Application
    Filed: December 5, 2011
    Publication date: July 5, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tsutomu OGIHARA, Takeru WATANABE, Yusuke BIYAJIMA, Daisuke KORI, Takeshi KINSHO, Toshihiko FUJII
  • Patent number: 8211623
    Abstract: The invention provides an ink composition having at least (A) a polymerization initiator, (B) an ester or amide of (meth)acrylic acid having a 1,3-dioxolane ring skeleton or a 1,3-dioxane ring skeleton or (B?) an ester or amide of (meth)acrylic acid having a 1,3-diketone structure, and (C) a colorant. The invention further provides an inkjet recording method and a method for producing a planographic printing plate, each of which includes at least (I) ejecting the ink composition onto a hydrophilic support and (II) curing the ink composition by irradiating the ejected ink composition with active radiation so as to form a hydrophobic image region on the hydrophilic support. The invention furthermore provides a planographic printing plate formed by the method for producing a planographic printing plate.
    Type: Grant
    Filed: August 5, 2010
    Date of Patent: July 3, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Ippei Nakamura, Masaharu Sugai
  • Patent number: 8193279
    Abstract: The present invention relates to new, radiation-curable coating compositions featuring high flexibility.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: June 5, 2012
    Assignee: BASF SE
    Inventors: Reinhold Schwalm, Klaus Menzel
  • Patent number: 8168689
    Abstract: A high optical contrast pigment and colorful photosensitive composition employing the same are disclosed. The composition comprises a solvent, an alkali-soluble resin, reactive monomer, and a modified pigment which has low crystallization. The low crystallization degree means that the grain size variation R is not more 80%, wherein the grain size variation R is represented by a formula R=G1/G0×100%, G0 is the original grain size, and G1 is the grain size after modification.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: May 1, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Chin-Cheng Weng, Kuo-Tung Huang, I-Jein Cheng, Ming-Tzung Wu, Yu-Ying Hsu, Chiang-Yun Li
  • Patent number: 8163813
    Abstract: To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface. A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.
    Type: Grant
    Filed: August 17, 2009
    Date of Patent: April 24, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Yasuhide Kawaguchi, Kentaro Tsunozaki
  • Patent number: 8158693
    Abstract: A process for preparing a radiation curable solid ink composition wherein a solid pigment and dispersant are added to a molten solid monomer including (a) heating a monomer that is solid at room temperature to a temperature above the monomer melting point to provide a molten solid monomer; (b) adding a curable component, a non-curable component, and a photoinitiator to the molten solid monomer to provide a molten ink base; (c) adding a dispersant to the molten ink base; and (d) a adding a pigment to the molten ink base with stirring to provide a curable pigmented ink composition. Included is a process for preparing a radiation curable solid ink composition wherein a liquid pigment concentrate or a solid pigment concentrate is added to an ink base.
    Type: Grant
    Filed: February 11, 2010
    Date of Patent: April 17, 2012
    Assignee: Xerox Corporation
    Inventors: Marcel P. Breton, Michelle N. Chretien, Barkev Keoshkerian, Peter G. Odell
  • Patent number: 8153744
    Abstract: There is provided a novel hyperbranched polymer in which the refractive index is precisely controlled while retaining its hyperbranched structure, and a method for producing the hyperbranched polymer. Further, there is also provided an optically and thermally stable novel hyperbranched polymer in which the desired refractive index is precisely controlled, and a method for producing the hyperbranched polymer. The hyperbranched polymer has, as a branched structure, a repeating unit structure produced from two dithiocarbamate compounds each having a vinyl structure, at the polymerization initiation site having a vinyl structure. A specific example of the hyperbranched polymer can be produced by subjecting to a living radical polymerization N,N-diethyldithiocarbamylmethylstyrene in the presence of N,N-diethyldithiocarbamylethyl methacrylate.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: April 10, 2012
    Assignees: Nissan Chemical Industries, Ltd., Tokyo Institute of Technology
    Inventors: Hiroki Takemoto, Masaaki Ozawa, Koji Ishizu
  • Publication number: 20120048184
    Abstract: Organic-inorganic hybrid materials may be inorganic-based materials including more inorganic material than organic material. The organic-inorganic hybrid materials may include a backbone material, a release material, and a photoinitiator. The backbone material may be formed of an inorganic material, and at least one of the release material and the photoinitiator may be formed of an organic material. The backbone material may include a compound (e.g., an oxide or a nitride) containing at least one selected from the group consisting of Si, In, Zn, Al, and Ti. The release material may include at least one selected from the group consisting of alkyl (CnH2n+1), C, F, and Si.
    Type: Application
    Filed: April 28, 2011
    Publication date: March 1, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Du-hyun Lee, Byung-kyu Lee, Woong Ko
  • Patent number: 8114920
    Abstract: The UV-curable aqueous coating composition is characterized by using a UV-curable aqueous emulsion obtained by urethane reaction with a mixture including a poly-carbonate polyol or polyester polyol; an isocyanate compound; a urethane-reactive carboxylic acid; a UV-curable acrylic oligomer having 2 to 9 functional acrylate groups; a UV-curable acrylic monomer; and a urethane-reactive acrylate without an organic solvent. The aqueous composition provides good environmental acceptability and satisfactory film properties comparable to those of the prior oily UV-curable coating composition and, therefore, it is useful for coating various plastics.
    Type: Grant
    Filed: January 15, 2007
    Date of Patent: February 14, 2012
    Assignee: Akzo Nobel Coatings International B.V.
    Inventors: Dong Soo Kim, Tae Yun Jeong, Su Dong Hong, Jung Hyun Oh
  • Patent number: 8106109
    Abstract: The invention concerns a dental filling material with dual hardening mechanism, wherein i) a first hardening mechanism is based on a photocuring reaction, preferably a radical reaction, and ii) a second hardening mechanism is dependent on H2O as a reactant, especially as a ligand. Preferably, the second hardening mechanism is a gypsum-type reaction. Owing to the expansion of the composition an excellent marginal seal can be achieved, while the first hardening mechanism allows for a rapid cure on demand.
    Type: Grant
    Filed: May 12, 2008
    Date of Patent: January 31, 2012
    Assignee: Coltene Whaledent AG
    Inventors: Ralf Böhner, Dierk Lübbers, Silvan Benz
  • Patent number: 8105679
    Abstract: The present invention relates to an active energy beam-curable ink comprising polymerizable monomers, wherein relative to the total of all the polymerizable monomers, the polymerizable monomers comprise from 95 to 99.99% by weight of a monofunctional monomer and from 0.01 to 5% by weight of a polyfunctional monomer, and a cured film of thickness 10 ?m formed using the active energy beam-curable ink exhibits a drawing ability exceeding 120% when stretched at a temperature of 170° C. at a strain rate of 2/min.
    Type: Grant
    Filed: July 21, 2006
    Date of Patent: January 31, 2012
    Assignee: Toyo Ink Mfg. Co., Ltd.
    Inventors: Kazuhiro Jonai, Yasuo Yoshihiro, Daisuke Nishida
  • Patent number: 8101673
    Abstract: The present invention relates to a UV-crosslinkable composition comprising a) unmodified, protonated silica nanoparticles; b) urethane acrylate; c) polar solvent; and d) UV initiator system, wherein the amount by weight of unmodified, protonated silica nanoparticles exceeds the content of urethane acrylate and is at least 50.1 wt. %, based on the dry weight of the coating, to the use of the composition in the coating of substrates, and to substrates coated with such formulations.
    Type: Grant
    Filed: January 15, 2009
    Date of Patent: January 24, 2012
    Assignee: Bayer MaterialScience AG
    Inventors: Karlheinz Hildenbrand, Peter Capellen, Eberhard Koch
  • Patent number: 8097661
    Abstract: A radiation-curable gel ink with reduced syneresis. The inks include a curable monomer, an organic gellant, a gel-forming wax, an optional photoinitiator, and an optional colorant. Also disclosed are methods of making such inks, and methods of forming images with such inks.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: January 17, 2012
    Assignee: Xerox Corporation
    Inventors: Naveen Chopra, Stephan V. Drappel, Michelle N. Chretien, Barkev Keoshkerian, Peter G. Odell
  • Patent number: 8063170
    Abstract: Radiation curable compositions comprising at least one radiation curable oligomer obtained from the reaction of one or more carboxyl functional polyester (a) having a glass transition temperature TG and/or melting temperature Tm of less than 30° C., with (b1) one or more (meth)acrylated mono-epoxide, and/or (b2) one or more polyepoxide and one or more ?, ? unsaturated carboxylic acid.
    Type: Grant
    Filed: February 2, 2007
    Date of Patent: November 22, 2011
    Assignee: Cytec Surface Specialities, S.A.
    Inventors: Isabelle Fallais, Thierry Randoux, Marc Decaux
  • Patent number: 8048979
    Abstract: The present invention involves the design of a radiation curable organic pre polymer resin material based on urethane acrylic linkage synthesized from the natural renewable resource cardanol or a derivative thereof, for coating application. These new molecules have a faster and better curing rate compared to the starting renewable resource—cardanol. This is brought about by the hydrogen bonding of the urethane linkage which leads to a pre organization of the molecules in such a way as to bring the cross linkable double bonds closer to each other. The present invention also involves a UV curable formulation of the above mentioned resins along with 2-10 parts by weight of a photopolymerization initiator. The resin, either in a formulation or alone turns into a cross linked film upon photopolymerization in presence of photoinitiator under a UV curable radiation source like a mercury vapor pressure lamp.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: November 1, 2011
    Assignee: Council of Scientific and Industrial Research
    Inventors: Asha Syamakumari, Chennakkattu Krishna Sadasivan Pillai
  • Patent number: 8034262
    Abstract: An optical element comprising: a first monomer polymerized while in the presence of a second monomer to form a first polymer intermixed with the second monomer, the first polymer having a spatially varying degree of cure that provides a predetermined refractive index profile; and the second monomer polymerized in the presence of the first polymer to form a second polymer intermixed with the first polymer, the second polymer stabilizing the refractive index profile.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: October 11, 2011
    Assignee: Ophthonix, Inc.
    Inventors: Shui T. Lai, Donald G. Bruns, Lawrence H. Sverdrup, Gomaa Abdel-Sadek
  • Patent number: 8022112
    Abstract: A plasticized ceramic-forming mixture and a method for stiffening the mixture, the mixture comprising a combination of inorganic powder, one or more plasticizing organic binders, a radiation-curable monomer, a photoinitiator, and water, and the method comprising stiffening the surfaces of extruded shapes of the mixture by applying electromagnetic energy to the surfaces following extrusion.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: September 20, 2011
    Assignee: Corning Incorporated
    Inventors: Michelle Dawn Fabian, Edward John Fewkes, Kevin Robert McCarthy
  • Patent number: 8017193
    Abstract: A monomeric formulation for creating self-propagating polymer optical waveguides and a system and a method of using the same. The monomeric formulation includes a plurality of unsaturated molecules, a molecule having a structure of R—X—H (e.g., X?O, S, N), and a photoinitiator. The monomeric formulation can further include a free radical inhibitor. The system includes a light source, a reservoir having a monomeric formulation and a patterning apparatus configured to guide a light beam from the light source into the monomeric formulation to form at least one self-propagating polymer waveguide.
    Type: Grant
    Filed: August 6, 2008
    Date of Patent: September 13, 2011
    Assignee: HRL Laboratories, LLC
    Inventors: Chaoyin Zhou, Alan J. Jacobsen
  • Patent number: 8008366
    Abstract: A process for producing a cured coating is provided that includes a step of forming on a substrate layer of a curable composition that includes at least one compound represented by Formula (I) and a step of curing the layer of the curable composition by irradiation with electron beam. In formula (I) , Q1 denoted a cyano group or a —COX2 group, X1 denoted a hydrogen atom, organic residue, or polymer chain bonded to carbon atom CA via a heteroatom, or a halogen atom, X2 denoted a hydrogen atom, organic residue, or polymer chain boned to the carbonyl group via a heteroatom, or a halogen atom, Ra and Rb independently denote a hydrogen atom, a halogen atom, a cyano group, or an organic residue, and X1 and X2, Ra and Rb, and X1 and Ra or Rb may be bonded to each other to form a cyclic structure. There is also provided an electron beam-curable composition that includes a compound represented by Formula (I).
    Type: Grant
    Filed: February 7, 2008
    Date of Patent: August 30, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Kazuto Kunita
  • Patent number: 7999014
    Abstract: A flame retardant suitable for manufacturing a polymer composition is provided. The polymer composition is used for forming a cured film in which a balance among flame retardancy, adhesion, chemical resistance, heat resistance, and elasticity, and so on, is provided. A flame-retardant polymer composition with an excellent balance among the above properties is also provided. The flame retardant of the invention has a structure of Formula (1), (2), or (3): (in which, R1 is hydrogen or methyl, R2 is C2-20 alkylene or C2-20 alkylene in which any —CH2— is replaced by —O—, R3 and R4 are C1-20 alkyl, phenyl, and phenyl substituted by C1-5 alkyl or phenyl, R3 and R4 may also be an integrally-formed cyclic group, and p and q are 0 or 1).
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: August 16, 2011
    Assignee: JNC Corporation
    Inventors: Ryota Mineo, Tomohiro Eto, Yosihiro Deyama, Hiroyuki Satou
  • Patent number: 7994232
    Abstract: The invention provides a photo-curable composition that addresses degradation in dispersibility caused by the use of a pigment, and has good color tone and high light fastness. The photo-curable composition includes: a polymerizable compound; a polymerization initiator; and a dye represented by Formula (1): in which, A1, A2 and A3 each represent a monovalent group, and Z represents a nitrogen atom, an oxygen atom, a sulfur atom, or a monovalent group-bonded carbon atom, the dye represented by Formula (1) having two azo groups in a molecule thereof.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: August 9, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Hideo Hanawa, Yoshiharu Yabuki
  • Publication number: 20110189253
    Abstract: The disclosure is directed to a composition includes a macromer having a polymeric backbone comprising units with a 1,2-diol or 1,3-diol structure and at least two pendant chains bearing crosslinkable groups, an amphiphilic comonomer, and a crosslinking initiator, wherein the composition has a setting time of less than about 3 minutes. The disclosure is further directed to a kit and a method of making the above-mentioned composition.
    Type: Application
    Filed: January 29, 2010
    Publication date: August 4, 2011
    Applicant: WARSAW ORTHOPEDIC, INC.
    Inventors: Sean M. Haddock, Susan J. Drapeau, Thomas Andrew Simonton
  • Patent number: 7977402
    Abstract: Radiation curable ink compositions for impulse printheads are described. The compositions include a photoinitiator system, containing both a photocation polymerization initiator and a free-radical photoinitiator, an acrylate ester of a carboxylic acid ester, and at least one radiation curable material.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: July 12, 2011
    Assignee: Collins Ink Corporation
    Inventors: Sudhakar Madhusoodhanan, Devdatt S. Nagvekar
  • Patent number: 7968618
    Abstract: A one-component self-etching self-priming dental adhesive composition is disclosed. The composition comprises glycerol phosphate di(meth)acrylate monomer, at least one mono-functional polymerizable monomer having just one ethylenically unsaturated group, at least one multi-functional polymerizable monomer having at least two ethylenically unsaturated groups, at least one aprotic solvent, at least one protic solvent, and at least one polymerization initiator.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: June 28, 2011
    Assignee: Kerr Corporation
    Inventors: Xiangxu Chen, Xuejun Qian
  • Patent number: 7956097
    Abstract: Various embodiments related to curable printing fluids are disclosed. One example embodiment provides a curable printing fluid composition for a thermal fluid ejection device, the composition comprising a curable liquid-phase monomer, a substantially nonaqueous volatile driver fluid capable of being vaporized by a thermal fluid ejection printhead, an initiator, a phosphate ester resistor protectant, and a colorant comprising a dye.
    Type: Grant
    Filed: June 9, 2010
    Date of Patent: June 7, 2011
    Assignee: ImTech, Inc.
    Inventors: Kenneth E. Trueba, William Allen Buskirk
  • Patent number: 7947336
    Abstract: An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): where: R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a t-butyl group; n represents an integer of 0 or more and 4 or less; and m represents an integer of 1 or more and 3 or less.
    Type: Grant
    Filed: June 4, 2010
    Date of Patent: May 24, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shimpei Otaka, Kazunari Ishizuka, Isamu Horiuchi, Isao Imamura
  • Patent number: 7943067
    Abstract: The present invention includes a method for preparing polymer hydrogel spherical particles on a nanometer scale (nanogels). The method includes encapsulating hydrogel-forming components into liposomes, diluting the large unilamellar liposomes suspension to prevent polymerization outside the liposomes, and polymerizing the encapsulated hydrogel-forming components. The lipid bilayer may be solubilized with detergent. The phospholipid and detergent molecules and their micelles may then be removed by dialysis. The resulting nanogels may then be dried by evaporation in a temperature gradient. Poly(acrylamide), poly(N-isopropylacrylamide), and poly(N-isopropylacrylamide-co-1-vinylimidazole) hydrogel particles with a diameter from 30 to 300 nm were detected and characterized by dynamic light scattering technique. The solvent, temperature, pH, and ionic sensitivities of the nanogels were studied.
    Type: Grant
    Filed: August 14, 2002
    Date of Patent: May 17, 2011
    Assignee: Polytechnic Institute of New York University
    Inventors: Sergey Kazakov, Marian Kaholek, Kalle Levon
  • Patent number: 7943680
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: May 17, 2011
    Assignee: The Regents of the University of Colorado
    Inventors: Christopher N. Bowman, Timothy F. Scott
  • Patent number: 7939578
    Abstract: Polymeric fibers and methods of making the polymeric fibers are described. The polymeric fibers are crosslinked hydrogels or dried hydrogels that are prepared from a precursor composition that contains polymerizable material having an average number of ethylenically unsaturated groups per monomer molecule greater than 1.0. The polymeric fibers can contain an optional active agent.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: May 10, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Robin E. Wright, Mahfuza B. Ali, Jessica M. Buchholz, Louis C. Haddad, Linda K. M. Olson, Matthew T. Scholz, Narina Y. Stepanova, Michael J. Svarovsky, Richard L. Walter, Caroline M. Ylitalo, Diane R. Wolk, Yifan Zhang
  • Patent number: 7935776
    Abstract: The present invention relates to a radiation curable and developable polyurethane which is characterized by having a carboxy group in its main chain and a acryloyl group in its side chain and comprising the following repeat units (I), (II), and (II) in a random arrangement: wherein R1, R2, R3, R4, and T are defined in the specification. The polyurethane has a weight molecular weight measured by GPC in a range of from 3,000 to 400,000; an acid value in a range of from 5 to 120 mgKOH/g. The present invention also relates to a radiation curable and developable composition containing the polyurethane.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: May 3, 2011
    Assignee: AGI Corporation
    Inventors: Wei Hsiang Huang, Ying Jen Chen, Jui Ming Chang, Chun Hung Kuo, Hong Ye Lin, Li Chung Chang
  • Patent number: 7935742
    Abstract: An ink composition is provided that includes (A) one type of compound (monomer (A)) selected from the group consisting of a difunctional (meth)acrylic acid ester or amide having an alkylene group of 6 to 12 carbons, and a difunctional vinyl ether having an alkylene group of 6 to 12 carbons, (B) a polymerization initiator, and (C) a colorant. There is also provided an inkjet recording method that includes a step (a) of discharging the ink composition onto a recording medium and a step (b) of irradiating the discharged ink composition with actinic radiation so as to cure the ink composition. Furthermore, a process for producing a lithographic printing plate is provided that includes a step (a?) of discharging the ink composition onto a hydrophilic support and a step (b?) of irradiating the discharged ink composition with actinic radiation so as to cure the ink composition, thus forming a hydrophobic image on the hydrophilic support by curing the ink composition.
    Type: Grant
    Filed: February 12, 2007
    Date of Patent: May 3, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Seishi Kasai
  • Patent number: 7935738
    Abstract: A transparent flexible film is provided, formed by curing a composition, comprising: about 40-75 parts by weight of a clay; about 15-45 parts by weight of a water-soluble polymer; about 1-10 parts by weight of a mono-functional acrylic oligomer of formula (I), wherein n1 is an integer 2-25, R1 is C1-10 alkyl or H, and R2 is H or CH3; and about 10-45 parts by weight of a bi-functional acrylic oligomer of formula (II), wherein n2 is an integer 3-50, R3 and R4 are H or CH3.
    Type: Grant
    Filed: May 22, 2008
    Date of Patent: May 3, 2011
    Assignee: Industrial Technology Research Institute
    Inventors: Chih-Kuang Chen, Shih-Ming Chen, Jia-Chi Huang, Young-Jen Lee, Li-Ching Wang
  • Patent number: 7923480
    Abstract: A composition usable as a moisture absorbent for an organic electroluminescence device. A photocurable hygroscopic composition comprising (a) a moisture-reactive organic metal compound, (b) a (meth)acrylate, (c) a carboxyl group-containing polymerizable monomer, and (d) a photopolymerization initiator. The proportion of the moisture-reactive organic metal compound (a) is from 5 to 70 wt % based on the entire composition, and the proportion of the carboxyl group-containing polymerizable monomer (c) is from 0.1 to 50 mol % based on the moisture-reactive organic metal compound (a).
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: April 12, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Jun Fujita, Takashi Yamasaki
  • Patent number: 7923482
    Abstract: The present invention is to provides an ultraviolet-curable resin composition which contains a composite resin (A) having a polysiloxane segment (a1) having a silanol group and/or a hydrolytic silyl group as well as a polymerizable double bond and a polymer segment (a2) other than the polysiloxane segment (a1), and a photo initiator (B). The ultraviolet-curable resin composition is able to form a cured coating film excellent in weatherability such as scratch resistance, acid resistance, alkali resistance and solvent resistance, without heating.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: April 12, 2011
    Assignee: DIC Corporation
    Inventors: Hiroshi Matsuzawa, Shinichi Kudo