Specified Rate-affecting Material Contains A C-n=n-c-group Patents (Class 522/62)
  • Patent number: 6008296
    Abstract: A monomer composition characterized by being curable to form a resin suitable for optical products having a balanced refractive index and Abbe's number range and good tintability comprising a polyene monomer; a polyisocyanate, polyisothiocyanate, or an isocyanate monomer containing at least one isothiocyanate group; and a monomer having two or more active hydrogen groups such as polythiols, polyamines, and polyols. The invention also provides a special process for making the composition and for curing the composition to form a resin product.
    Type: Grant
    Filed: April 19, 1995
    Date of Patent: December 28, 1999
    Assignee: Optima, Inc.
    Inventors: Zhou Yang, Yin-Nian Lin, Zhenya Zhu, Brian George Risch
  • Patent number: 5945462
    Abstract: The present invention relates to an aqueous-based coating composition for forming strippable, protective coating for protecting surfaces, such as glass, metal, ceramic, plastic or other materials of construction. More specifically, the compositions and coatings formed therefrom of this invention are particularly useful in connection with protecting precision surfaces, such as optical lenses, including but not limited to ophthalmic lenses, telescopic lenses, microscopic lenses, and the like, which protection is desirably only of a temporary nature.
    Type: Grant
    Filed: October 2, 1997
    Date of Patent: August 31, 1999
    Assignee: Loctite Corporation
    Inventor: Peter A. Salamon
  • Patent number: 5939465
    Abstract: A photopolymerizable composition comprises (i) a compound represented by formula (I): ##STR1## wherein R.sup.1 and R.sup.2 each independently represents a hydrogen atom, a cyano group, a substituted carbonyl group, a substituted or unsubstituted, alkyl group, aryl group, alkenyl group, or alkynyl group; R.sup.3, R.sup.4 and R.sup.5 each independently represents a substituted or unsubstituted, alkyl group, aryl group, alkenyl group, or alkynyl group; Z represents a nonmetallic atom group necessary for forming a heterocyclic nucleus containing an N atom; n represents an integer of 0, 1 or 2; and G.sup.1 and G.sup.2 each independently represents a hydrogen atom, a cyano group, a substituted, carbonyl group, oxy group, amino group, thio group, sulfonyl group, sulfinyl group or an atomic group represented by formula (II) described in the specification, provided that G.sup.1 and G.sup.
    Type: Grant
    Filed: July 30, 1997
    Date of Patent: August 17, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuto Kunita, Yasuo Okamoto
  • Patent number: 5916981
    Abstract: This invention relates to pressure sensitive adhesive compositions which are obtained by a method comprising reacting a mixture of at least one polydiorganosiloxane, at least one silicone resin copolymer, at least one silanol condensation catalyst, and at least one solvent or plasticizer having a boiling point of at least 200.degree. C., to form a reaction product, and then adding an organic peroxide or azo compound to the resultant reaction product. The silicone pressure sensitive adhesives of this invention are useful in preparing articles such as pressure sensitive tapes, labels, emblems and other decorative or informational signs.
    Type: Grant
    Filed: March 24, 1997
    Date of Patent: June 29, 1999
    Assignee: Dow Corning Corporation
    Inventors: Martin Eric Cifuentes, William Neal Fenton
  • Patent number: 5861472
    Abstract: The present invention relates to a method of making silicone pressure sensitive adhesive compositions comprising the steps of heating a mixture of a polydiorganosiloxane, a silicone resin copolymer, and an equilibration catalyst, and then adding an organic peroxide or azo compound to the resultant reaction product. The silicone pressure sensitive adhesives prepared by the method of this invention are useful in preparing articles such as pressure sensitive tapes, labels, emblems and other decorative or informational signs.
    Type: Grant
    Filed: July 5, 1996
    Date of Patent: January 19, 1999
    Assignee: Dow Corning Corporation
    Inventors: Martin Eric Cifuentes, William Neal Fenton, Bianxiao Zhong
  • Patent number: 5858545
    Abstract: Free-radically polymerizable release coating compositions containing conductivity enhancers, which are capable of being electrosprayed onto a substrate. The compositions comprise (a) about 100 parts by weight of one or more free-radically polymerizable vinyl monomer(s), (b) from about 0.05 to about 250 parts by weight of one or more polydiorganosiloxane polymer(s) copolymerizable with the vinyl monomer(s), and (c) from about 0.10 to about 10 parts by weight, based on 100 parts by weight of (a) and (b), of one or more non-volatile conductivity enhancer(s), which are soluble in the monomer(s) and which do not interfere with polymerization, wherein the composition may be electrosprayed.The composition may further comprise from about 0.1 to about 5 parts by weight of one or more initiator(s) based on 100 parts by weight of monomer(s) and polydiorganosiloxane polymer(s).Another embodiment of the present invention further comprises at least 0.
    Type: Grant
    Filed: March 26, 1996
    Date of Patent: January 12, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Albert I. Everaerts, Mieczyslaw H. Mazurek, Albert E. Seaver
  • Patent number: 5723511
    Abstract: A process for the preparation of branched thermoplastic resins comprising: heating a mixture of a free radical initiator, at least one first free radical reactive monomer, at least one free radical reactive branching agent compound, and at least one stable free radical agent, to produce a linear or unbranched polymer product with a free radical initator fragment at one end and a covalently bonded stable free radical agent at the other end of the polymerized chain of monomers; and irradiating the unbranched polymer product in the presence of a reactive compound selected from the group consisting of a free radical reactive monomer, a branching agent compound, and mixtures thereof to form a branched polymeric product.
    Type: Grant
    Filed: June 17, 1996
    Date of Patent: March 3, 1998
    Assignee: Xerox Corporation
    Inventors: Peter M. Kazmaier, Barkev Keoshkerian, Karen A. Moffat, Michael K. Georges, Gordon K. Hamer, Richard P. N. Veregin
  • Patent number: 5691396
    Abstract: The invention provides a novel polysiloxane compound, typically polyhydroxybenzylsilsesquioxane, having some hydroxyl groups replaced by acetal groups and optionally acid labile groups. The polysiloxane compound is useful as an alkali soluble polymer for positive resist material.
    Type: Grant
    Filed: September 24, 1996
    Date of Patent: November 25, 1997
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Katsuya Takemura, Junji Tsuchiya, Osamu Watanabe, Toshinobu Ishihara
  • Patent number: 5654379
    Abstract: A process for the bromination of a copolymer of an isoolefin having from 4 to 7 carbon atoms and a para-alkystyrene comprising bromating the copolymer in the presence of bromine and a radical initiator thereby providing a brominated copolymer of the copolymer. The brominated copolymer is substantially free of ring bromine and backbone bromine.
    Type: Grant
    Filed: May 31, 1995
    Date of Patent: August 5, 1997
    Assignee: Exxon Chemicals Patent, Inc.
    Inventors: Kenneth William Powers, Hsien-Chang Wang
  • Patent number: 5484821
    Abstract: A novel photocrosslinkable polymeric system has been developed for processing into films having stable second-order nonlinear optical properties. In the present system, polymers bearing photo-crosslinkable chromophores, such as polyvinylcinnamate and are reacted with appropriately designed nonlinear optical molecules with the cinnamate or other photocrosslinkable functionalities for photocrosslinking at one, two or more points. The system can be poled and photocrosslinked in the poled state to yield a material with stable optical nonlinearity and large electro-optic coefficients.
    Type: Grant
    Filed: February 7, 1994
    Date of Patent: January 16, 1996
    Assignee: University of Lowell
    Inventors: Braja K. Mandal, Sukant K. Tripathy, Jan-Chan Huang, Jayant Kumar
  • Patent number: 5466722
    Abstract: Polymerization of ethylenically unsaturated monomers such as methyl methacrylate can be initiated in solutions containing monomer and a special non-polymeric initiator with intense ultrasound. The number average molecular weight of the poly(methyl methacrylate) that forms is about 300,000 gmol.sup.-1 as compared with polystyrene standards. The conversion of the polymerization is about 50% for poly(methyl methacrylate). Variations of the polymerization rate with time and the amount of the initiator are explained by a simple reaction mechanism.
    Type: Grant
    Filed: January 27, 1994
    Date of Patent: November 14, 1995
    Inventors: James O. Stoffer, Oliver C. Sitton
  • Patent number: 5429846
    Abstract: The present invention provides a photo-setting conductive coating composition which is used as an antistatic material constituting articles wherein static electrification must be avoided, such as storage vessels for semi-conductor wafers, electronic/electric parts, floor/wall coverings for a production factory of semi-conductors, etc.The photo-setting conductive coating composition comprising 100 parts by weight of an antimony oxide-containing tin oxide powder (a) having a particle size of 0.01 to 0.4 .mu.m, 10 to 100 parts by weight of a (meth)acrylate compound (b) having at least two (meth)acryloyl groups in a molecule, 10 to 100 parts by weight of an acetal resin (c) having a residual hydroxyl group of 20 to 80 molar %, 0.1 to 10 parts by weight of a photopolymerization initiator (d) and 100 to 1000 parts by weight of an organic solvent (e).
    Type: Grant
    Filed: October 25, 1994
    Date of Patent: July 4, 1995
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Toshiya Sugimoto, Minoru Suezaki, Kouji Maruyama
  • Patent number: 5283265
    Abstract: A photopolymerizable rubber being obtained by copolymerizing four compounds consisting of a dienic liquid rubber having hydroxyl groups, an ethylenically unsaturated monomer having hydroxyl groups, a dihydric alcohol having a molecular weight of less than 2,000 and a diisocyanate compound. The photocured product of this composition has higher tensile strength and elongation than that of the prior photopolymerizable rubbers.
    Type: Grant
    Filed: April 18, 1988
    Date of Patent: February 1, 1994
    Assignee: Hayakawa Rubber Company Limited
    Inventors: Tetsuya Kimura, Syuno Suto, Fujii Toshihiro, Toshihiro Fujii, Kimio Mori, Tsuguo Yamaoka
  • Patent number: 5236967
    Abstract: An optical molding composition is used for casting and does not cause irritation to the skin or possess a bad smell. This composition comprises1. an actinic radiation-curable, radical-polymerizable organic compound comprising(1) one or more polythiol compounds and(2) one or more polyene compounds each having at least two actinic radiation-reactive carbon-to-carbon double bonds in the molecule, and2. an actinic radiation-sensitive radical polymerization initiator.
    Type: Grant
    Filed: February 18, 1992
    Date of Patent: August 17, 1993
    Assignee: Asahi Denka Kogyo K.K.
    Inventors: Kazuo Ohkawa, Seiichi Saito
  • Patent number: 5021465
    Abstract: A photocurable resin composition comprising:(A) a curable polymer or oligomer having one or more (metha)acryloyl groups in its molecule;(B) a white pigment;(C) a radical-generating compound having a decomposition temperature of 60.degree. C. or lower at a half-life of 10 hours; and(D) a photo-initiator, as occasion demands, and a method of producing a decorative material using this resin composition.
    Type: Grant
    Filed: June 9, 1988
    Date of Patent: June 4, 1991
    Assignee: Showa Highpolymer Co., Ltd.
    Inventors: Eiichiro Takiyama, Katsuhisa Morita
  • Patent number: 4952711
    Abstract: A composition curable to a solid crosslinked polyorganosiloxane comprises:(a) an acrylic functional silicone prepolymer having a plurality of acrylic groups of the formula: ##STR1## bound to silicon atoms thereof, where R is H or methyl, and R.sup.1 is a divalent olefinically unsaturated hydrocarbon group,(b) a silicone prepolymer having a plurality of organothiol groups thereon, and(c) an effective amount of a thiol-ene cure catalyst.Particularly preferred formulations are photoinitiated formulations employing alkylthiol functional silicones in which the total number of thiol groups is between 0.5 and 1.5 times the total number of ene groups counting both the acrylic and the linking group R.sup.1 as ene groups.
    Type: Grant
    Filed: May 25, 1989
    Date of Patent: August 28, 1990
    Assignee: Loctite Corporation
    Inventors: Anthony F. Jacobine, Steven T. Nakos
  • Patent number: 4939065
    Abstract: Substrates, e.g., silicon wafers, coated with a UV-curable organopolysiloxane composition including a crosslinking catalyst therefor (e.g., a platinum group metal compound) and an amount of a crosslinking inhibitor (e.g., an azodicarboxylate) which is effective at ambient temperature, but ineffective to prevent crosslinking on exposure of the composition to ultraviolet radiation, are well adapted for the imaging of negative intelligence patterns thereon.
    Type: Grant
    Filed: July 11, 1988
    Date of Patent: July 3, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Jacques Cavezzan, Sylvianne Dumas, Louis Giral, Christian Prud'Homme, Francois Schue
  • Patent number: 4937175
    Abstract: Compositions comprising a free radical sensitive compound and a thermally stable substituted diazene which upon exposure to electromagnetic radiation is convertible to a thermally unstable substituted diazene may be formed and processed utilizing thermally intense techniques and thereafter the free radically initiated changes initiated by exposing the substituted diazene to light and heat.
    Type: Grant
    Filed: January 23, 1989
    Date of Patent: June 26, 1990
    Assignee: The Dow Chemical Company
    Inventors: Jerry E. White, Richard A. Wolf
  • Patent number: 4849461
    Abstract: Acryl functional silicone compounds are made by reacting an amine functional silicon compound with a di- or multi-functional acryl compound by a Michael-type addition reaction. These acryl functional silicone compounds are purer than others because no catalyst is used and no by-products are formed. These acryl functional silicone compounds can be used as adhesion promoters and as coating compositions which can be cured by ultraviolet radiation.
    Type: Grant
    Filed: March 18, 1987
    Date of Patent: July 18, 1989
    Assignee: Dow Corning Corporation
    Inventors: Chi-long Lee, Michael A. Lutz
  • Patent number: 4810731
    Abstract: Whereas the mechanism for the crosslink formation in the curable organopolysiloxane composition of the invention is the ultraviolet-induced addition reaction between alkenyl, e.g., vinyl, groups in a diorganopolysiloxane and mercaptoalkyl groups in another organopolysiloxane as in conventional compositions, the mercaptoalkyl-containing organopolysiloxane used in the invention is, differently from those in conventional compositions, an organopolysiloxane of a three-dimensionally branched molecular structure as composed of the siloxane units of the formulas R.sup.1.sub.3 SiO.sub.0.5, R.sup.1.sub.a (HSR.sup.2)SiO.sub.(3-a)/2 and SiO.sub.2, in which R.sup.1 is, for example, a methyl or phenyl group, R.sup.2 is, for example, --CH.sub.2 CH.sub.2 CH.sub.2 -- and a is zero, 1 or 2, in a specified proportion. In addition, the vinyl group-containing siloxane units in the vinyl-containing diorganopolysiloxane are localized in the molecular structure forming two blocks each bonded to one of the terminal silicon atoms.
    Type: Grant
    Filed: April 8, 1988
    Date of Patent: March 7, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshinori Hida, Shohei Kozakai
  • Patent number: 4780337
    Abstract: A method of protecting carbon/carbon composites against oxidation at high temperatures is disclosed. This comprises coating the composite with a hybrid metal alkoxide/organosilicon polymer. The hybrid polymer is prepared by a method comprising mixing an organosilicon polymer having a plurality of Si-H functional groups with a sufficient quantity to undergo a hydrosilylation reaction of a metal alkenoxide, wherein the metal alkenoxide comprises a metal, metalloid or silicon alkoxide containing at least one alkenoxy group; and initiating the hydrosilylation reaction to form the hybrid polymer.
    Type: Grant
    Filed: December 29, 1986
    Date of Patent: October 25, 1988
    Assignee: Massachusetts Institute of Technology
    Inventors: Dietmar Seyferth, Tom Targos
  • Patent number: 4762887
    Abstract: A process for preparing radiation polymerizable acrylate-functional organopolysiloxane-urethane copolymers by reacting aminofunctional polysiloxanes with acrylated urethane oligomers in the presence of a solvent.
    Type: Grant
    Filed: January 15, 1987
    Date of Patent: August 9, 1988
    Assignee: Wacker Silicones Corporation
    Inventors: Roy M. Griswold, Douglas G. Vanderlaan
  • Patent number: 4762862
    Abstract: A process for preparing particulate water-soluble cationic acrylic polymers having a high molecular weight, an excellent water solubility and a uniform particle size with a good productivity by adding a combined photoinitiator system of an azoguanyl compound and other usual photoinitiator to an aqueous monomer solution containing a cationic vinyl monomer, irradiating the aqueous monomer solution in the form of a thin layer on a moving support with ultraviolet rays in at least two stages, and finely dividing the produced aqueous polymer gel in a wet state by a roller cutter and then by a vertical cutter.
    Type: Grant
    Filed: March 4, 1987
    Date of Patent: August 9, 1988
    Assignee: Dai-ichi Kogyo Seiyaku Co. Ltd.
    Inventors: Akira Yada, Shusaku Matsumoto, Yoshihiro Kawamori, Yoshitugu Adachi, Yoshio Hatakawa
  • Patent number: 4719273
    Abstract: A method of forming preceramic polymers by mixing (A) an organic polysilane, preferably either a methylpolysilane of the formula [(RSiH).sub.x (RSi).sub.y ].sub.n, (where R is a lower alkyl group having from 1 to about 6 carbon atoms, a cycloalkyl group having from 3 to about 6 carbon atoms, a substituted or unsubstituted lower aryl group having from 6 to about 10 carbon atoms, a tri(lower)alkyl- or di(lower)alkylsilyl group x+y=1, (x and y are each >0 and also x=1, y=0), and n is an integer greater than 1) or a polycarbosilane having repeat units of the formula [R.sup.a Si(H)--(CH.sub.2).sub.q ], [R.sup.a Si(H)--CH.dbd.CH], and [R.sup.a Si(H)--C.tbd.C] (where R.sup.
    Type: Grant
    Filed: March 24, 1986
    Date of Patent: January 12, 1988
    Assignee: Massachusetts Institute of Technology
    Inventors: Dietmar Seyferth, Yuan-Fu Yu, Gudrun E. Koppetsch
  • Patent number: 4702990
    Abstract: The present invention provides a photosensitive resin composition used to form a top resist layer of a multilayer resist system, the composition comprising a photosensitive polyphenylsilsesquioxane represented by the following general formula (I) of: ##STR1## wherein X is selected from the group consisting of acryloyloxymethyl, methacryloyloxymethyl, and cinnamoyloxymethyl; and l, m and n are zero or positive integers but l and m do not take the value of zero simultaneously; and a bisazide compound added to act as a cross-linking agent.The photosensitive resin composition has high sensitivity to UV light and excellent resistance to reactive ion etching under oxygen gas (O.sub.2 RIE).
    Type: Grant
    Filed: May 10, 1985
    Date of Patent: October 27, 1987
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Akinobu Tanaka, Masao Morita, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure
  • Patent number: 4654292
    Abstract: A photoresist composition comprising a conjugated diene polymer or its cyclized product, a photocuring agent soluble in an organic solvent and a pyrazole compound having a skeleton represented by the following formula. ##STR1## Also provided is a method of forming a photoresist pattern using the aforesaid composition.
    Type: Grant
    Filed: September 17, 1985
    Date of Patent: March 31, 1987
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Masayuki Oie, Satoshi Ogawa, Sadao Sugimoto, Masahiro Yamazaki, Katsuhiro Fujino
  • Patent number: 4616045
    Abstract: A process of preparing a new contact lens material that is gas permeable, surface wettable, and relatively hard is disclosed. Also disclosed are contact lenses made of this new material, which are comfortable to wear. The new contact lens material is the copolymerization product of a reaction mixture comprising: (1) styrene or a ring substituted styrene; (2) a vinyl alcohol ester such as vinyl acetate; (3) a polyethylene glycol ester such as pentaethyleneglycol monomethacrylate; (4) a substituted polysiloxane such as dimethyl polysiloxane or a substituted silane; and, optionally, (5) a cross-linking agent such as divinyl benzene.
    Type: Grant
    Filed: May 13, 1985
    Date of Patent: October 7, 1986
    Assignee: GBF, Inc.
    Inventor: Billy T. Upchurch