Monomer Or Polymer Contains Initiating Group Patents (Class 522/904)
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Patent number: 6914086Abstract: A crosslinkable UV absorbing agent prepared by the following steps: (1) preparing a mixture of reactants comprising a UV absorbing compound (A) with multiple pendant hydroxyl groups and an unsaturated monoglycidyl compound (B) with both reactive glycidyl and vinyl groups; (2) mixing a base catalyst (C) with the mixture of reactants; (3) initiating a synthesis reaction of the crosslinkable UV absorbing agent under heating; and (4) recovering the resulting product after the synthesis reaction is completed. The crosslinkable UV absorbing agent is directly applicable in the lens formulation to replace conventional crosslinking agent and UV absorber used in the production of the soft contact lens without any purification or modification.Type: GrantFiled: June 24, 2003Date of Patent: July 5, 2005Inventor: Shinn-Gwo Hong
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Patent number: 6831114Abstract: Process for preparing UV crosslinkable acrylic pressure sensitive adhesives, which comprises reacting polyacrylates in the melt with UV-photoactive substances in a hotmelt process in a polymer-analogous reaction, the UV-photoactive substances being able to absorb radiation energy and transfer it to a reaction system.Type: GrantFiled: June 12, 2002Date of Patent: December 14, 2004Assignee: tesa AGInventors: Marc Husemann, Stephan Zöllner
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Patent number: 6756418Abstract: New polymers, compositions comprising these polymers, and methods of using these compositions are provided. The polymers comprise styrene and maleic anhydride monomers with at least some of the maleic anhydride monomers having certain functional groups bonded thereto. Preferred functional groups include those derived from adhesion promoters (e.g., 2-aminophenol), photoinitiators (e.g., 4-aminoacetophenone), and solubilizers (e.g., 4-aminobenzoic acid). The polymers can be incorporated according to conventional processes into compositions which are then used to form a color filter to be used in a liquid crystal display. The final color filter has a high resolution, is highly resistant to solvents typically used in the color filter manufacturing process, is strongly adhered to the color filter substrate, has superior optical clarity, is highly soluble in a wide range of alkali developers, and has excellent heat and UV light stability.Type: GrantFiled: June 7, 2002Date of Patent: June 29, 2004Assignee: Brewer Science Inc.Inventors: Gu Xu, Dan W. Brewer, Timothy Limmer, Mike Stroder, Shelly Fowler, Jonathon Mayo
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Patent number: 6747090Abstract: The invention related to a hydrogel forming aqueous composition of water soluble polymers having a sufficiently high coherency that it substantially not is dispersed when being injected into an aqueous environment of a body site such as the capsular bag of the eye to undergo a photoinitiated crosslinking reaction. The water soluble polymers either can be a water-soluble polymer bearing free acrylic, or other vinylic groups capable of facile free radical reaction with a polymeric water-soluble photoinitiator also present in the composition, or a water-soluble polymer bearing both free acrylic, or other vinylic groups capable of facile free radical reaction and photoinitiator, wherein both polymers are capable of being crosslinked when irradiated with light of wavelengths greater than about 305 nm to form the hydrogel.Type: GrantFiled: July 16, 2002Date of Patent: June 8, 2004Assignee: Pharmacia Groningen BVInventors: Jacqueline Hermina De Groot, Kenneth Albert Hodd, Hendrik Jan Haitjema
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Patent number: 6737203Abstract: New polymers, compositions comprising these polymers, and methods of using these compositions are provided. The polymers comprise styrene and maleic anhydride monomers with at least some of the maleic anhydride monomers having certain functional groups bonded thereto. Preferred functional groups include those derived from adhesion promoters (e.g., 2-aminophenol), photoinitiators (e.g., 4-aminoacetophenone), and solubilizers (e.g., 4-aminobenzoic acid). The polymers can be incorporated according to conventional processes into compositions which are then used to form a color filter to be used in a liquid crystal display. The final color filter has a high resolution, is highly resistant to solvents typically used in the color filter manufacturing process, is strongly adhered to the color filter substrate, has superior optical clarity, is highly soluble in a wide range of alkali developers, and has excellent heat and UV light stability.Type: GrantFiled: February 25, 2002Date of Patent: May 18, 2004Assignee: Brewer Science Inc.Inventors: Gu Xu, Dan W. Brewer, Timothy Limmer, Mike Stroder, Shelly Fowler, Jonathon Mayo
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Patent number: 6734222Abstract: The invention relates to a mixture, containing A) a polymer, which consists to an extent of at least 40 wt % of C1-C18 alkyl (meth)acrylates (referred to herein as polyacrylates) and B) a homopolymer or copolymer of vinyl alkyl ether (referred to herein as polyvinyl alkyl ether), which consists, to an extent of at least 70 wt %, of structural units of the following formula, in which X stands for a single bond or a C1-C3 alkyl group and R for a C1-C6 alkyl group.Type: GrantFiled: January 28, 2002Date of Patent: May 11, 2004Assignee: BASF AktiengesellschaftInventors: Ralf Fink, Karl-Heinz Schumacher, Uwe Düsterwald, Christelle Staller
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Patent number: 6673850Abstract: Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI′ inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is —NR3R4 or —OH; M1′ is for example a group (c); R3′ is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.Type: GrantFiled: October 18, 2001Date of Patent: January 6, 2004Assignee: Ciba Specialty Chemicals CorporationInventors: Hitoshi Yamato, Masaki Ohwa, Toshikage Asakura, Akira Matsumoto
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Patent number: 6664306Abstract: This invention relates to polymeric compositions that are processible and may be photochemically cured to produce crosslinked compositions useful in coating, sealants and adhesive applications. The crosslinkable composition comprises a first component having a plurality of pendent, free-radically polymerizable functional groups; a polymeric photoinitiator, and a residual content of less than 2%. The composition is melt processable at temperatures of less than or equal to 100° C.Type: GrantFiled: July 22, 2002Date of Patent: December 16, 2003Assignee: 3M Innovative Properties CompanyInventors: Babu N. Gaddam, Steven M. Hellmann, Ahmed S. Abuelyaman, Maureen A. Kavanagh, Duane D. Fansler, Kevin M. Lewandowski
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Patent number: 6635683Abstract: A memberane sensitive to anions is obtained by forming into a membrane either a composition comprising an onium salt compound such as trioctylmethylammonium chloride or tetraoctylammonium bromide, and an aromatic boric diester compound such as (p-alkyloxy)phenyl borate, or a composition which comprises these two ingredients and a membrane-forming polymer such as polyvinyl chloride or polystyrene, and may further contain a fat-soluble anion salt such as tetraphenyl borate. This membrane can yield an ion-selective electrode which permits hydrogencarbonate ions contained in body fluids to be rapidly determined with high sensitivity and high selectivity and which has a long life.Type: GrantFiled: January 26, 2001Date of Patent: October 21, 2003Assignee: Tokuyama CorporationInventors: Hiroaki Taira, Kazuya Ibaragi, Hiromasa Yamamoto, Hiroyuki Yanagi
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Patent number: 6596786Abstract: There is provided a radiation-curable coating composition containing oligomers that each have two end groups X1 and X2, wherein the end groups X1 and X2, which may be the same or different, are a photoinitiator group or an adhesion promoter group. The coating composition may exclude the presence of non-reactive photoinitiator groups and non-reactive adhesion promoter groups, each of which would fail to covalently bond itself to an oligomer backbone.Type: GrantFiled: August 17, 2001Date of Patent: July 22, 2003Assignee: AlcatelInventors: Michael B. Purvis, Igor V. Khudyakov, Bob Overton, Todd W. Gantt
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Patent number: 6583195Abstract: A substantially 100% solids sealer composition for use with wood and, in particular, weathered wood surfaces and other porous surfaces is prepared from a mixture of UV curable acrylates and a photoinitiator blend. The composition may further include fillers, fungicides, insect repellents, animal repellents, UV light absorbers, pigments, dyes, and the like. The photoinitiator blend is used at relatively low levels to controll the degree of polymerization.Type: GrantFiled: July 18, 2001Date of Patent: June 24, 2003Inventor: Andrew A. Sokol
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Patent number: 6565968Abstract: PSAs and protective coatings are provided, and include solvent, emulsion, and hot melt PSAs formulated with at least one benzocyclobutenone (BCBO) monomer. UV-cured PSAs and coatings are provided, and include cured BCBO-containing polymers and cured mixtures of BCBO-containing and OH-containing polymers.Type: GrantFiled: April 12, 2000Date of Patent: May 20, 2003Assignee: Avery Dennison CorporationInventors: Kai Li, Yukihiko Sasaki, Prakash Mallya, Pradeep Iyer
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Patent number: 6559223Abstract: Forming graft copolymers in water using labeling of water soluble polymers with photoinitiators. Water soluble polymers can form environmentally responsive hydrophobically stimulated cages. The cages, which contain initiating radicals after irradiation, may be “opened” or “closed” by changes in environmental conditions. When the cage is closed, the radicals are trapped inside and thus do not cause substantial polymerization of water soluble monomers in the same solution. When the cage is closed, the radicals escape and cause polymerization. In another variation, hydrogels and graft copolymers are formed by covalently linking phototoinitiator groups to water soluble polymers that do not form cages. Thus, monomers may form grafts to the polymer, allowing formation of physical hydrogels.Type: GrantFiled: February 22, 2001Date of Patent: May 6, 2003Assignee: Polytechnic UniversityInventors: Mark M. Green, Sung Yun Yang
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Publication number: 20030008241Abstract: A positive-working resist composition comprising (A) a specific resin which has an aliphatic cyclic hydrocarbon group and enhances in the dissolution rate in an alkaline developing solution by an action of an acid, and (B) a specific compound generating an acid by irradiation of actinic ray or radiation. The composition is excellent in the resolving power and the exposure margin, and can be suitably used for micro-photofabrication using far ultraviolet rays, particularly ArF eximer laser beams.Type: ApplicationFiled: March 11, 2002Publication date: January 9, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Kenichiro Sato, Kunihiko Kodama
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Patent number: 6448301Abstract: This invention relates to polymeric compositions that are processible and may be photochemically cured to produce crosslinked compositions useful in coating, sealants and adhesive applications. The crosslinkable composition comprises a first component having a plurality of pendent, free-radically polymerizable functional groups; a polymeric photoinitiator, and a residual content of less than 2%. The composition is melt processable at temperatures of less than or equal to 100° C.Type: GrantFiled: September 8, 2000Date of Patent: September 10, 2002Assignee: 3M Innovative Properties CompanyInventors: Babu N. Gaddam, Steven M. Heilmann, Ahmed S. Abuelyaman, Maureen A. Kavanagh, Duane D. Fansler, Kevin M. Lewandowski
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Patent number: 6294591Abstract: A process is described for preparing radiation-crosslinkable polymeric acrylates and methacrylates, which involves reacting an acrylate or methacrylate copolymer containing units having a reactive side group with a compound that contains a group which is capable of reacting with the reactive side group and also a group which is capable of forming free radicals under the action of actinic radiation. The preparation of the modified, photoactive polymers by polymer-analogous reaction makes it possible to do without the laborious handling of aggressive, specially synthesized monomers, especially acrylic esters. The products of the process can be employed widely as radiation-curable coating materials.Type: GrantFiled: June 16, 1999Date of Patent: September 25, 2001Assignee: BASF Coatings AGInventors: Rainer Blum, Peter Keller
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Patent number: 6261736Abstract: The pattern forming material of the present invention includes a polymer having a group which generates an acid when the polymer is irradiated with an energy beam or heated and a compound which generates a base when the compound is irradiated with an energy beam. The polymer is a binary polymer or a polymer of a higher degree obtained by polymerizing another group with a compound represented by the following general formula: where R1 indicates a hydrogen atom or an alkyl group, and R2 and R3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group, or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group.Type: GrantFiled: October 12, 1999Date of Patent: July 17, 2001Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka
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Patent number: 6252032Abstract: An ultraviolet-absorbing polymer is formed from a reaction mixture including a diisocyanate, at least one selected from the group consisting of a diol, a diamine and mixtures thereof, and a polyfunctional UV-absorbing monomer.Type: GrantFiled: July 7, 1999Date of Patent: June 26, 2001Assignee: MiniMed Inc.Inventors: William P. Van Antwerp, Li Yao
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Patent number: 6235353Abstract: Production of a dielectric coating on a substrate whereby a poly(arylene ethers) or fluorinated poly(arylene ethers) layer is cured by exposure to electron beam radiation. A wide area electron beam is used which causes chemical reactions to occur in the polymer structure which are thought to cause crosslinks between polymer chains. The crosslinks lead to higher mechanical strength and higher glass transition temperature, lower thermal expansion coefficient, greater thermal-chemical stability and greater resistance to aggressive organic solvents. The polymer layer may also be optionally heated, thermally annealed, and/or exposed to UV actinic light.Type: GrantFiled: February 5, 1999Date of Patent: May 22, 2001Assignee: AlliedSignal Inc.Inventors: James S. Drage, Jingjun Yang, Dong Kyu Choi
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Patent number: 6232362Abstract: Photosensitized silicones having the formula MDnDEmD*pM are provided, wherein M is selected from the group consisting of R3SiO1/2 and R2ESiO1/2; wherein each R is independently selected from the group consisting of monovalent hydrocarbon radicals having from 1 to 30 carbons, and E is an epoxide functionalized substituent selected from the group of epoxy either substitutents having the formula C6H11O2 or the group of alkyl cyclohexeneoxide substituents having the formula C8H13O; D has the formula R2SiO2/2, wherein each R is independently selected from the group consisting of monovalent hydrocarbon radicals having from 1 to 30 carbons; DE has the formula RESiO2/2 wherein R is selected from the group consisting of monovalent hydrocarbon radicals having from 1 to 30 carbon atoms, and wherein E is an epoxide functionalized substituent selected from the group of epoxy ether substituents having the formula C6H11O2 or the group of alkyl cyclohexeneoxide substituents having the formula C8H13O; D* is defined as the reaType: GrantFiled: May 4, 1999Date of Patent: May 15, 2001Assignee: General Electric CompanyInventors: Robert F. Agars, Richard P. Eckberg
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Patent number: 6221972Abstract: The present invention relates to a novel photosensitive resin which can be developed in water and which can be used as a photosensitive resin composition. More specifically, the present invention relates to a composition which is useful as a photosensitive soldering resist for printed circuit board.Type: GrantFiled: September 10, 1997Date of Patent: April 24, 2001Assignee: Ajinomoto Co., Inc.Inventors: Shigeo Nakamura, Tadahiko Yokota
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Patent number: 6214488Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) in which Ar is a phenylene ring having p- and/or m-bonds, Ar′ is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit, X, N and M, independently of one another are 0 or 1, Y is 0, 1, 2 or 3, P is 1, 2, 3 or 4, is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.Type: GrantFiled: October 6, 1997Date of Patent: April 10, 2001Assignee: Hoechst AktiengesellschaftInventors: Freddy Helmer-Metzmann, Frank Osan, Arnold Schneller, Helmut Ritter, Konstantin Ledjeff, Roland Nolte, Ralf Thorwirth
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Patent number: 6197842Abstract: This invention pertains to a process for the manufacture of a hydrophilic polymeric product, consisting in causing a material comprising a crosslinked silicone polymer matrix and photoinitiator groups dispersed and immobilized within the polymer matrix to swell in a swelling solution comprising a solvent for swelling the crosslinked silicone polymer of the matrix of the material, a photopolymerizable hydrophilic monomer and optionally a crosslinking agent and a proton- or electron-donating coinitiator compound, when the material comprises photoactivable photoinitiator groups and does not comprise proton- or electron-donating coinitiator groups causing the photopolymerizable hydrophilic monomer to diffuse into the swollen material, and polymerizing, by irradiation, the photopolymerizable hydrophilic monomer.Type: GrantFiled: December 18, 1998Date of Patent: March 6, 2001Assignee: Essilor International Compagnie Generale d'OptiqueInventors: Brigitte Marchin, Dominique Baude, Jean-Pierre Vairon, Marine-Anne Dourges, Philippe Chaumont, Joël Steiner
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Patent number: 6184264Abstract: There are described novel adhesives, which are capable of being “switched” form a tack to a non-tacky state. Such switchable adhesives are especially advantageous when used in medical dressings, and therefore, novel medical dressings comprising a switchable adhesive layer, a removable light occlusive layer and an intermediate transparent or translucent layer are also described.Type: GrantFiled: March 26, 1998Date of Patent: February 6, 2001Assignee: Smith & Nephew plcInventor: Iain Webster
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Patent number: 6162840Abstract: The invention concerns the use of monomer-free saturated or unsaturated polyester resins or mixtures of saturated and unsaturated polyester resins containing structural units of general formulae (I) and/or (II), in which n=1-10, as impregnation, sealing and coating compounds for electrical engineering and electronic components and for carrier substances for flat insulating materials.Type: GrantFiled: July 6, 1998Date of Patent: December 19, 2000Assignee: Dr. Beck + CO.AGInventors: Rainer Blum, Thomas Loerzer, Gunther Hegemann, Manfred Eichhorst
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Patent number: 6156345Abstract: A crosslinkable macromer system that includes two or more polymer-pendent polymerizable groups and one or more polymer-pendent initiator groups. The polymerizable groups and the initiator group(s) can be pendent on the same or different polymeric backbones. The macromer system provides advantages over the use of polymerizable macromers and separate, low molecular weight initiators, including advantages with respect to such properties as nontoxicity, efficiency, and solubility.Type: GrantFiled: December 21, 1999Date of Patent: December 5, 2000Assignee: SurModics, Inc.Inventors: Stephen J. Chudzik, Aron B. Anderson
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Patent number: 6124372Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.Type: GrantFiled: August 29, 1996Date of Patent: September 26, 2000Assignee: Xerox CorporationInventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
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Patent number: 6087412Abstract: The invention relates to crosslinked polymers, which are polymerisation products of a polymerisable mixture that comprises the following components:a) a macromer of formula C ##STR1## wherein Macro is an m-valent radical of a macromer from which the number m of groups Rx.sub.x --H has been removed,each R.sub.x, independently of the others, is a bond, --O--, --NR.sub.N -- or --S-- wherein R.sub.N is hydrogen or lower alkyl,PI* is a bivalent radical of a photoinitiator,R.sub.aa is the moiety of a photoinitiator that forms the less reactive free radical on cleavage of the photoinitiator, andm is an integer from 1 to 100,b) a copolymerisable vinyl monomer andc) a copolymerisable crosslinker.The polymers are suitable especially for the production of mouldings, such as for contact lenses.Type: GrantFiled: September 12, 1997Date of Patent: July 11, 2000Assignee: Novartis AGInventors: Peter Chabrecek, Dieter Lohmann, Kurt Dietliker
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Patent number: 6028153Abstract: The present invention relates to a novel copolymer resin of maleimide and alicyclic olefin-based monomers, a photoresist containing the copolymer and a process for the preparation thereof. More specifically, the present invention relates to a novel copolymer resin of maleimide and alicyclic olefin-based monomers useful for a photoresist usable lithography process using ultra-short wavelength light source such as KrF(.lambda.=248 .mu.m), ArF(.lambda.=193 .mu.m), X-ray, ion beam, E-beam and EUV (Extreme Ultra Violet) which is a potentially applicable technology to the fabrication of a fine circuit of a highly integrated semiconductor device.Type: GrantFiled: September 14, 1998Date of Patent: February 22, 2000Assignee: Hyundai Electronics Industries Co., Ltd.Inventor: Jae Chang Jung
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Patent number: 6011077Abstract: The invention relates to a novel process for the production of mouldings, in particular contact lenses, in which a crosslinkable polymer comprising units containing crosslinkable groups, units containing a bound photoinitiator and, if desired, units containing further modifiers is crosslinked in solution, and to mouldings, in particular contact lenses, obtainable by this process. The present invention likewise relates to novel crosslinkable polymers which can be employed in the process, in particular derivatives of a polyvinyl alcohol having a molecular weight of at least about 2000 which comprises from about 0.5 to about 80%, based on the number of hydroxyl groups in the polyvinyl alcohol, of units of the formula I ##STR1## in which the variables are as defined in the description, and units of the formula IV, as defined in the description, which contain a bound photoinitiator.Type: GrantFiled: September 12, 1997Date of Patent: January 4, 2000Assignee: Novartis AGInventor: Beat Muller
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Patent number: 6007833Abstract: A crosslinkable macromer system that includes two or more polymer-pendent polymerizable groups and one or more polymer-pendent initiator groups. The polymerizable groups and the initiator group(s) can be pendent on the same or different polymeric backbones. The macromer system provides advantages over the use of polymerizable macromers and separate, low molecular weight initiators, including advantages with respect to such properties as nontoxicity, efficiency, and solubility.Type: GrantFiled: July 23, 1998Date of Patent: December 28, 1999Assignee: SurModics, Inc.Inventors: Stephen J. Chudzik, Aron B. Anderson
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Patent number: 5998496Abstract: A compound of the general formula:A-L.sup.+ D.sup.-where A is a moiety which absorbs radiation and enters an excited state in which it accepts an electron; D.sup.- is a moiety which donates an electron to the excited state A and releases a free radical; and L.sup.+ is a cationic linking group which tethers electron acceptor moiety A to electron donor moiety D.sup.-. Cationic linking moiety L.sup.+ has the formula:-L'-G-where L' is a moiety which forms a stable radical with acceptor moiety A upon transfer of an electron from donor moiety D.sup.- to electron acceptor moiety A, and G is a moiety which forms a leaving group upon transfer of the electron from donor moiety D.sup.- to acceptor moiety A.Type: GrantFiled: August 19, 1996Date of Patent: December 7, 1999Assignee: Spectra Group Limited, Inc.Inventors: Salah A. Hassoon, Ananda M. Sarker, Douglas C. Neckers
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Patent number: 5994425Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.Type: GrantFiled: August 29, 1996Date of Patent: November 30, 1999Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller, Thomas W. Smith, David J. Luca, Ralph A. Mosher
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Patent number: 5958995Abstract: Disclosed is a composition for preparing a thermal ink jet printhead which comprises a mixture of (A) a polymer, some monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution measured in milliequivalents photosensitivity-imparting group per gram either (1) a polymer having a second degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degrType: GrantFiled: August 29, 1996Date of Patent: September 28, 1999Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 5942555Abstract: A photoactivatable reagent useful as a chain transfer reagent for providing a semitelechelic polymer having one or more terminal photoactivatable groups. The reagent provides one or more photoactivatable groups and one or more sulfhydryl (or other chain transfer) groups, the photoactivatable and chain transfer groups optionally being joined together by a spacer group. The reagent can be used to prepare a polymer by serving to initiate the polymerization of ethylenically unsaturated monomers. The reagent itself becomes an integral part of the resultant polymer, thereby providing the polymer with a terminal photoactivatable nature. The method provides a number of benefits, including the ability to provide homogeneous photoactivatable polymer compositions, e.g., in terms of the uniform location of the photogroup(s) on the terminal portion of each polymer molecule and the ability to build a desired nonpolar quality, and in turn improved surfactancy, into otherwise polar polymers.Type: GrantFiled: March 21, 1996Date of Patent: August 24, 1999Assignee: SurModics, Inc.Inventors: Melvin J. Swanson, Richard A. Amos, Dale G. Swan, Gary W. Opperman
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Patent number: 5919598Abstract: A method for making multilayer resist structures for microlithographic processing using a thermosetting anti-reflective coating is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.Type: GrantFiled: August 6, 1996Date of Patent: July 6, 1999Assignee: Brewer Science, Inc.Inventors: Tony D. Flaim, Jim D. Meador, Xie Shao, Terry Lowell Brewer
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Patent number: 5902836Abstract: Solute polymers in solvent monomers form a coatable syrup that can be cured to a viscoelastomeric material when radiation-sensitive .alpha.-cleaving groups in either the polymer or one of the monomers are exposed to ultraviolet radiation. The solute polymers can be formed from the solvent monomers in situ or be added thereto to form the syrup.Type: GrantFiled: August 23, 1995Date of Patent: May 11, 1999Assignee: Minnesota Mining and Manufacturing CompanyInventors: Greggory S. Bennett, Gaddam N. Babu, Kejian Chen, Louis E. Winslow, George F. Vesley, Patrick G. Zimmerman
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Patent number: 5889077Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, with (i) a formaldehyde source, and (ii) an unsaturated acid in the presence of an acid catalyst, thereby forming a curable polymer with unsaturated ester groups. Also disclosed is a process for preparing an ink jet printhead with the above polymer.Type: GrantFiled: August 29, 1996Date of Patent: March 30, 1999Assignee: Xerox CorporationInventors: Timothy J. Fuller, Ram S. Narang, Thomas W. Smith, David J. Luca, Raymond K. Crandall
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Patent number: 5849809Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.Type: GrantFiled: August 29, 1996Date of Patent: December 15, 1998Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 5837746Abstract: Compounds of the formulaRG--A--INwherein IN is a photoinitiator basic structure A is a spacer group and RG is a functional reactive group can be employed as coreactive photoinitiators for photo-polymerization of systems containing ethylenically unsaturated compounds.Type: GrantFiled: June 23, 1997Date of Patent: November 17, 1998Assignee: Ciba Specialty Chemicals CorporationInventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
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Patent number: 5824717Abstract: The invention relates to peroxide- or radiation-curable copolymer containing compositions and to the resulting radiation- or peroxide- cured compositions. The compositions may optionally contain a reinforcing filler. Copolymers employed in the compositions are acrylate modified copolymers of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene comonomers. Since the percentage of extractables from the cured composition is negligible, the cured compositions are suitable for use in the manufacture of a variety of high purity rubber goods used in the pharmaceutical and health care industries. In addition, the compositions may be employed as condenser packings and as food contact materials or wire cable insulation materials. Further, the cured composition may be employed in the manufacture of high purity hoses.Type: GrantFiled: June 7, 1995Date of Patent: October 20, 1998Assignee: Exxon Chemical Patents Inc.Inventors: Natalie Ann Merrill, Hsien-Chang Wang, Anthony Jay Dias
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Patent number: 5776658Abstract: Compounds of the general formula I: (SIL--X--).sub.m IN (I), in which SIL is a radical of the formula Si(R.sup.1)(R.sup.2)(R.sup.3), where R.sup.1 is an alkyl, haloalkyl or alkoxy radical of 1 to 8 carbon atoms, an alkenyl radical, an alkenyloxy or acyloxy radical of 2 to 8 carbon atoms, an aryl or aryloxy radical of 6 to 10 carbon atoms, or a dialkyl-, diaryl- or alkylaryl-methyleneaminooxy radical having C.sub.1 -C.sub.4 -alkyl or C.sub.6 -aryl groups; and R.sup.2 and R.sup.3 are identical or different radicals with the meaning of R.sup.1 or X--IN; X is a group C.sub.n H.sub.2n ; IN is the radical of a compound which is active as a photoinitiator or photosensitizer and which has at least one carbonyl group located on an aromatic nucleus; m is a number from 1 to 4; and n is a number from 2 to 12, or of the formula II: Si.sub.o O.sub.o-1 (--X--IN).sub.p R.sup.4.sub.2o+2-p (II), in which R.sup.4 is a radical with the meaning of R.sup.1, and two or more radicals R.sup.Type: GrantFiled: September 29, 1995Date of Patent: July 7, 1998Assignee: AGFA-Gevaert AGInventors: Claus-Peter Niesert, Georg Pawlowski, Willi-Kurt Gries, Klaus-Juergen Przybilla
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Patent number: 5773485Abstract: Solute polymers in solvent monomers form a coatable syrup that can be cured to a viscoelastomeric material when radiation-sensitive hydrogen abstracting groups in either the polymer or one of the monomers are exposed to ultraviolet radiation. The solute polymers can be formed from the solvent monomers.Type: GrantFiled: August 23, 1995Date of Patent: June 30, 1998Assignee: Minnesota Mining and Manufacturing CompanyInventors: Greggory S. Bennett, Louis E. Winslow, Gaddam N. Babu
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Patent number: 5744512Abstract: Compounds of the formulaRG--A--INwhereinIN is a photoinitiator basic structureA is a spacer group andRG is a functional reactive group can be employed as coreactive photoinitiators for photopolymerization of systems containing ethylenically unsaturated compounds.Type: GrantFiled: March 20, 1996Date of Patent: April 28, 1998Assignee: Ciba Specialty Chemicals CorporationInventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
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Patent number: 5741408Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) ##STR1## in which Ar is a phenylene ring having p- and/or m-bonds,Ar' is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit,X, N and M, independently of one another are 0 or 1,Y is 0, 1, 2 or 3,P is 1, 2, 3 or 4,is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.In specific cases, the crosslinkable substituents can be omitted.Type: GrantFiled: May 19, 1995Date of Patent: April 21, 1998Assignee: Hoechst AktiengesellschaftInventors: Freddy Helmer-Metzmann, Frank Osan, Arnold Schneller, Helmut Ritter, Konstantin Ledjeff, Roland Nolte, Ralf Thorwirth
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Patent number: 5723513Abstract: Radiation-sensitive organo-halogen compounds that have a photo-labile halomethyl-1,3,5-triazine moiety and a polymeric moiety within the same molecule. The compounds of this invention are comprised of a polymeric moiety having attached or incorporated within its structure at least one 1,3,5-triazine nucleus, said triazine nucleus having at least one halomethyl substituent attached to a carbon atom of the triazine nucleus. These compounds are capable of being stimulated by actinic radiation at wavelengths of from about 250 to about 900 nanometers to generate free radicals and/or acids. The compounds of this invention are useful as photoinitiators in free radical polymerization reactions, oxidation-reduction reactions, or reactions sensitive to acid, and they also exhibit the capability to crosslink upon exposure to light.Type: GrantFiled: March 8, 1996Date of Patent: March 3, 1998Assignee: Minnesota Mining and Manufacturing CompanyInventors: James A. Bonham, Mitchell A. Rossman, Richard J. Grant
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Patent number: 5723511Abstract: A process for the preparation of branched thermoplastic resins comprising: heating a mixture of a free radical initiator, at least one first free radical reactive monomer, at least one free radical reactive branching agent compound, and at least one stable free radical agent, to produce a linear or unbranched polymer product with a free radical initator fragment at one end and a covalently bonded stable free radical agent at the other end of the polymerized chain of monomers; and irradiating the unbranched polymer product in the presence of a reactive compound selected from the group consisting of a free radical reactive monomer, a branching agent compound, and mixtures thereof to form a branched polymeric product.Type: GrantFiled: June 17, 1996Date of Patent: March 3, 1998Assignee: Xerox CorporationInventors: Peter M. Kazmaier, Barkev Keoshkerian, Karen A. Moffat, Michael K. Georges, Gordon K. Hamer, Richard P. N. Veregin
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Patent number: 5710193Abstract: Colorants, polymeric binder resins, photoinitiators, photosensitizers, color-change agents, anti-halation agents, stabilizers, and other active hydrogen-containing components of radiation sensitive compositions for lithographic printing plate production and the like are reacted with a polyethylenically unsaturated monoisocyanate compound of the formula ##STR1## wherein Y is the residue of a monohydroxyl compound of formula YOH and Y contains at least two ethylenically unsaturated double bonds. In this way the components are bonded to the image on exposure.Type: GrantFiled: May 21, 1996Date of Patent: January 20, 1998Assignee: DuPont (UK) LimitedInventors: John Robert Wade, Michael John Pratt, Jianrong Ren
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Patent number: 5693691Abstract: A thermosetting anti-reflective coating and method for making and using the same is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.Type: GrantFiled: August 21, 1995Date of Patent: December 2, 1997Assignee: Brewer Science, Inc.Inventors: Tony D. Flaim, Jim D. Meador, Xie Shao, Terry Lowell Brewer
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Patent number: 5654376Abstract: A composition and methods for the use and manufacture thereof are provided for a polymeric dye. The composition comprises one or more aminoaromatic chromophores in conjunction with polymers having an anhydride group or the reaction products thereof. The composition is particularly useful as an underlaying antireflective coating with microlithographic photoresists for the absorbtion of near or deep ultraviolet radiation.Type: GrantFiled: June 6, 1995Date of Patent: August 5, 1997Assignee: International Business Machines CorporationInventors: Christopher John Knors, Elwood Herbert Macy, Wayne Martin Moreau