Sulfur-containing Ring Contains Additional Hetero Atom, I.e., N, O, Se, Te Patents (Class 526/257)
  • Patent number: 10597371
    Abstract: The present invention provides a polymerizable compound having high storage stability without causing crystal precipitation when added to a polymerizable composition. The present invention also provides a polymerizable composition containing the compound. When the filmy polymer produced through polymerization of the polymerizable composition is irradiated with UV light, it hardly discolors or peels from substrate. Further, the present invention provides a polymer produced through polymerization of the polymerizable composition and an optically anisotropic body using the polymer.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: March 24, 2020
    Assignee: DIC CORPORATION
    Inventors: Masahiro Horiguchi, Yutaka Kadomoto
  • Patent number: 10508072
    Abstract: The present disclosure provides a method for producing an acid halide solution that is useful as a production intermediate or the like that allows industrially advantageous production of a polymerizable liquid crystal compound. The method for producing an acid halide solution of the present disclosure includes a step ? of reacting a halogenating agent and a dicarboxylic acid compound in a water-immiscible organic solvent in the presence of a tetraalkylammonium salt to obtain a water-immiscible organic solvent solution including an acid halide, and a step ? of concentrating the obtained water-immiscible organic solvent solution.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: December 17, 2019
    Assignee: ZEON CORPORATION
    Inventors: Kumi Okuyama, Kei Sakamoto, Kanako Sanuki, Hiroki Iwaki
  • Patent number: 10428032
    Abstract: The present invention provides a compound represented by the general formula (I), and a polymerizable composition containing the compound. When the polymerizable composition containing the compound represented by the formula (I) is used to form a filmy product, the resulting filmy product exhibits less change over time in phase difference and reverse wavelength dispersion and when the filmy polymer is irradiated with UV light, peeling from a substrate is unlikely to be caused. Further, the invention provides a polymer obtained through polymerization of the polymerizable composition and an optically anisotropic body obtained using the polymer.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: October 1, 2019
    Assignee: DIC CORPORATION
    Inventors: Masahiro Horiguchi, Junichi Mamiya, Yoshio Aoki
  • Patent number: 10392343
    Abstract: The present invention is a polymerizable compound represented by a general formula (I), a polymerazable composition, a polymer, and an optically anisotropic product.
    Type: Grant
    Filed: February 9, 2015
    Date of Patent: August 27, 2019
    Assignee: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kumi Okuyama
  • Patent number: 10351643
    Abstract: An object of the invention is to provide polymerizable compounds having excellent optical characteristics and suited as materials for optically anisotropic articles, compositions containing the polymerizable compounds, polymers obtained by polymerizing the polymerizable compounds, optically anisotropic articles formed of the polymers, and liquid crystal display devices including the optically anisotropic articles.
    Type: Grant
    Filed: November 27, 2014
    Date of Patent: July 16, 2019
    Assignee: DIC CORPORATION
    Inventors: Hiroshi Hasebe, Yoshio Aoki, Kunihiko Kotani, Akihiro Koiso, Hidetoshi Nakata
  • Patent number: 9908963
    Abstract: This invention relates to polymer particles, a process for their preparation, the use of these particles for the preparation of an electrophoretic device, electrophoretic displays comprising such particle, and new copolymer stabilizers.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: March 6, 2018
    Assignee: Mereck Patent GmbH
    Inventors: Louise D. Farrand, Claire Topping, Kate Belsey, Simon Holder
  • Patent number: 9902708
    Abstract: One embodiment of the present invention can provide an optical material composition that includes a cyclic compound that is represented by formula (1) and an episulfide that is represented by formula (2). Another embodiment of the present invention can provide an optical material production method that includes a step wherein, with respect to the total amount of the optical material composition, 0.0001-10 mass % of a polymerization catalyst is added to the optical material composition and the optical material composition is polymerization cured. (In formula (2), m is an integer from 0 to 4, and n is an integer from 0 to 2.
    Type: Grant
    Filed: March 1, 2016
    Date of Patent: February 27, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki Kariyazono, Takashi Aoki
  • Patent number: 9856333
    Abstract: The present invention relates to: a polymerizable compound (I), wherein Y1 to Y6 are a chemical single bond, —O—C(?O)—, —C(?O)—O— or the like, G1 and G2 are a divalent aliphatic group, Z1 and Z2 are an alkenyl group, Ax is a fused ring group represented by a formula (II), wherein X is —NR3—, an oxygen atom, a sulfur atom or the like, R3 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and D is a substituted or unsubstituted ring having 1 to 20 carbon atoms that includes at least one nitrogen atom, Ay is a hydrogen atom, an alkyl group, A1 is a trivalent aromatic group or the like, A2 and A3 are a divalent aromatic group having 6 to 30 carbon atoms or the like, and Q1 is a hydrogen atom, or an alkyl group having 1 to 6 carbon atoms.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: January 2, 2018
    Assignee: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kumi Okuyama
  • Patent number: 9638849
    Abstract: An optical film of the present invention includes an optically anisotropic layer containing a compound represented by the following general formula (1) or an optically anisotropic layer formed by the curing of a polymerizable composition containing a compound represented by the following general formula (1):
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: May 2, 2017
    Assignee: FUJIFILM CORPORATION
    Inventors: Hiroshi Matsuyama, Shinichi Morishima, Yuki Nakazawa
  • Publication number: 20150147696
    Abstract: Provided is a method for producing a polymer compound that has very low contents of impurities such as metal components and exhibits excellent storage stability. The production method gives such a polymer compound. The polymer compound is incorporated into a photoresist resin composition. The method for producing a polymer compound includes the step of filtering a resin solution containing a polymer compound through a filter. The filter is approximately devoid of strongly acidic cation-exchange groups and develops a positive zeta potential. The polymer compound includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) includes at least one monomer units represented by Formulae (a1) to (a3). The monomer unit (b) contains a group capable of releasing a moiety thereof by the action of an acid to develop solubility in an alkali.
    Type: Application
    Filed: July 26, 2013
    Publication date: May 28, 2015
    Applicant: DAICEL CORPORATION
    Inventors: Akira Eguchi, Masamichi Nishimura
  • Publication number: 20150147697
    Abstract: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is an acid labile group, R5 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition is of dual-tone type in that an intermediate dose region of resist film is dissolved in a developer, but unexposed and over-exposed regions of resist film are insoluble.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20150147698
    Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20150140497
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V11 represents an aliphatic cyclic group with or without a substituent; R1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y1 represents an oxygen atom (—O—), an ester bond (—C(?O)—O—) or a single bond; and W2 represents a group formed by a polymerization reaction of a polymerizable group-containing group).
    Type: Application
    Filed: November 13, 2014
    Publication date: May 21, 2015
    Inventors: Masatoshi Arai, Yoshiyuki Utsumi
  • Publication number: 20150132698
    Abstract: A resin containing a structural unit derived from a compound represented by the formula (aa) wherein T, R1 and Z1 are defined in the specification.
    Type: Application
    Filed: January 23, 2015
    Publication date: May 14, 2015
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Yusuke FUJI, Satoshi YAMAGUCHI
  • Patent number: 9023964
    Abstract: The present invention relates to conjugated polymers. In various embodiments, the present invention provides a conjugated polymer including a repeating unit including a benzene ring conjugated with the polymer backbone, wherein the benzene ring is fused to two 5-membered rings, wherein each fused 5-membered ring includes N and at least one of O and S. In various embodiments, the present invention provides semiconductor devices including the polymer, and methods of making the polymer.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: May 5, 2015
    Assignee: Iowa State University Research Foundation, Inc.
    Inventors: Malika Jeffries-EL, Jeremy J. Intermann, Brian C. Tlach
  • Patent number: 9023581
    Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: May 5, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd
    Inventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
  • Patent number: 9017918
    Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Seiichiro Tachibana, Koji Hasegawa
  • Publication number: 20150099119
    Abstract: This invention relates to coloured polymer, a process for their preparation, electrophoretic fluids comprising such particles, and electrophoretic display devices comprising such fluids.
    Type: Application
    Filed: May 7, 2013
    Publication date: April 9, 2015
    Inventors: Louise Diane Farrand, Nils Greinert, Claire Topping, Jonathan Henry Wilson, Simon Biggs, Olivier Cayre, Simon Lawson, Alexandre Richez, Simone Stuart-Cole
  • Patent number: 9000111
    Abstract: An optical part comprising a thermoplastic resin having a recurring unit represented by the following formula (1): wherein R represents a hydrogen atom, an alkyl group, or an aryl group; G represents a divalent linking group; A represents an oxygen atom, a sulfur atom, or —N(R1)—; R1 represents a hydrogen atom, an alkyl group, or an aryl group; Q represents an atomic group of forming a hetero ring; and l indicates 0 or 1.
    Type: Grant
    Filed: August 28, 2009
    Date of Patent: April 7, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Suzuki, Rie Okutsu, Hiroaki Mochizuki, Tatsuhiko Obayashi
  • Publication number: 20150076418
    Abstract: The invention relates to novel conjugated polymers comprising in their backbone one or more divalent donor units, like for example benzo[1,2-b:4,5-b?]dithiophene-2,6-diyl (BDT), that are linked on both sides to an acceptor unit, to methods of preparing the polymers and educts or intermediates used in such preparation, to polymer blends, mixtures and formulations containing the polymers, to the use of the polymers, polymer blends, mixtures and formulations as semiconductors organic electronic (OE) devices, especially in organic photovoltaic (OPV) devices and organic photodetectors (OPD), and to OE, OPV and OPD devices comprising these polymers, polymer blends, mixtures or formulations.
    Type: Application
    Filed: February 15, 2013
    Publication date: March 19, 2015
    Applicant: MERCK PATENT GMBH
    Inventors: Nicolas Blouin, Amy Phillips, Lana Nanson, Steven Tierney, Toby Cull, Priti Tiwana, Stephane Berney, Miguel Carrasco-Orozco, Frank Egon Meyer
  • Publication number: 20150065671
    Abstract: A compound represented by the formula (1). A polymer compound comprising the compound. An organic semiconductor material comprising the compound or the polymer compound. An organic semiconductor device comprising an organic layer comprising the organic semiconductor material. An organic transistor comprising a source electrode, a drain electrode, a gate electrode and an active layer, wherein the active layer comprises the organic semiconductor material.
    Type: Application
    Filed: April 16, 2013
    Publication date: March 5, 2015
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Hiroki Terai
  • Publication number: 20150065670
    Abstract: Asymmetric bifunctional silyl (ABS) monomers comprising covalently linked pharmaceutical, chemical and biological agents are described. These agents can also be covalently bound via the silyl group to delivery vehicles for delivering the agents to desired targets or areas. Also described are delivery vehicles which contain ABS monomers comprising covalently linked agents and to vehicles that are covalently linked to the ABS monomers. The silyl modifications described herein can modify properties of the agents and vehicles, thereby providing desired solubility, stability, hydrophobicity and targeting.
    Type: Application
    Filed: September 10, 2014
    Publication date: March 5, 2015
    Inventors: Joseph M. DeSimone, Mathew Finniss, Mary Napier, Ashish Pandya, Matthew Parrott
  • Publication number: 20150064626
    Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Application
    Filed: July 14, 2014
    Publication date: March 5, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Publication number: 20150037733
    Abstract: Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, m, x, and y are as defined in the text of Description.
    Type: Application
    Filed: February 25, 2013
    Publication date: February 5, 2015
    Applicant: KURARAY CO., LTD.
    Inventors: Akinobu Takeda, Takashi Fukumoto, Osamu Nakayama
  • Publication number: 20150034161
    Abstract: Organic molecule semi-conducting chromophores containing a halogen-substituted core structure are disclosed. Such compounds can be used in organic heterojunction devices, such as organic molecule solar cells and transistors.
    Type: Application
    Filed: February 19, 2013
    Publication date: February 5, 2015
    Inventors: Arnold B. Tamayo, Corey V. Hoven, Thomas K. Wood, Braden Smith
  • Patent number: 8940856
    Abstract: The present invention provides a heterocyclic compound of the following general formula (I): wherein X and Y are different from each other and represent a halogen atom selected from among a chlorine atom, bromine atom and iodine atom, or CF3SO3?, CH3SO3?, C6H5SO3? or CH3C6H4SO3?; R1 represents an optionally substituted monovalent aliphatic hydrocarbon group having two or more carbon atoms; one of A1 and A2 represents —S—, —O—, —Se— or Te—, while the other represents —N?, —P? or —Si(R2)?, wherein R2 represents a hydrogen atom, an optionally substituted monovalent hydrocarbon group, a halogen atom, an amino group or a carbonyl group; and one of two linkages each represented by a solid line and a dashed line is a single bond, while the other is a double bond.
    Type: Grant
    Filed: December 11, 2013
    Date of Patent: January 27, 2015
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kenta Tanaka, Hideyuki Higashimura, Kazuei Ohuchi, Akio Tanaka, Masato Ueda
  • Publication number: 20150017586
    Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of hydroxyanthraquinone or hydroxy-2,3-dihydro-1,4-anthracenedione methacrylate, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Application
    Filed: July 3, 2014
    Publication date: January 15, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20140363772
    Abstract: A resist composition including a high-molecular weight compound having a constituent unit represented by general formula (a0-1), a constituent unit (a1) containing a group containing a monocyclic group or a chain group among acid decomposable groups whose polarity increases by action of acid, a constituent unit (a1?) containing a group containing a polycyclic group among acid decomposable groups whose polarity increases by the action of an acid, and a constituent unit (a2) containing a lactone-containing monocyclic group, with a proportion of the constituent unit (a1) being equal to a proportion of the constituent unit (a1?) or more; and a method for forming a resist pattern using the resist composition.
    Type: Application
    Filed: May 29, 2014
    Publication date: December 11, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Junichi Tsuchiya, Yuta Iwasawa
  • Publication number: 20140346400
    Abstract: A method for the synthesis and use of transparent bulk conjugated polymers prepared from liquid monomers via bulk polymerization. The liquid monomer contains pi-electron conjugated moieties and polymerizable moieties. The monomer solution may also have functionalizing additives such as a luminescence additive that includes organic dyes, luminescent molecules, fluorescent compounds, phosphorescent compounds, and luminescent quantum dots. The monomer solution may also have sensitizing additives such as high-energy photo sensitizing compounds, nanoparticles of compounds containing atoms with atomic numbers greater than 52 and neutron sensitizing additives. The monomer solution is polymerized by heating to an elevated temperature with or without addition of an initiator. Alternatively, the monomer is polymerized by photo-induced polymerization. A photoinitiator may be employed to initiate the photopolymerization. Scintillation materials with significant light yields are illustrated.
    Type: Application
    Filed: June 2, 2014
    Publication date: November 27, 2014
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Qibing Pei, Qi Chen
  • Publication number: 20140342390
    Abstract: There is provided a method for introducing a temperature-sensitive probe comprising a copolymer, which comprises a thermoresponsive unit and a fluorescent unit, into a cell, and the method using the copolymer further comprising a cationic unit as the temperature-sensitive probe, and the method comprising the step of mixing the copolymer with the cell in a solvent. The copolymer can be preferably used as a fluorescence temperature sensor which measures intracellular temperature since the copolymer has a cationic group and thus enters into a cell without using a special method.
    Type: Application
    Filed: May 20, 2014
    Publication date: November 20, 2014
    Applicants: THE UNIVERSITY OF TOKYO, KIRIN HOLDINGS KABUSHIKI KAISHA
    Inventors: Toshikazu TSUJI, Kumiko IKADO, Seiichi UCHIYAMA, Kyoko KAWAMOTO
  • Patent number: 8883954
    Abstract: A photovoltaic cell is provided that includes a first electrode, a second electrode, and a photoactive layer disposed between the first and second electrodes. The photoactive layer includes a photoactive polymer containing a first monomer repeat unit, which contains a moiety of formula (1): in which A and R are defined in the specification.
    Type: Grant
    Filed: October 9, 2013
    Date of Patent: November 11, 2014
    Assignee: Merck Patent GmbH
    Inventors: Paul Byrne, Li Wen, David P. Waller, Taizoon Canteenwala, Patrick Foyle, Edward Jackson
  • Patent number: 8877344
    Abstract: The present invention is directed to phenothiazine-based macromonomer compounds and methods of making the same.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: November 4, 2014
    Assignee: Bayer HealthCare LLC
    Inventors: Jiangfeng Fei, Henry Arndt, Steven Fowler
  • Patent number: 8877424
    Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: November 4, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa, Kazuhiro Katayama
  • Publication number: 20140308614
    Abstract: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, PEB, and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition is based on a polymer comprising recurring units (a1) of formula (1) wherein R1 is H or CH3, R2 and R3 are H, F or a monovalent hydrocarbon group, R4 is H or a monovalent hydrocarbon group, R5 and R6 are a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, and k1=0 or 1. A fine hole or trench pattern can be formed therefrom.
    Type: Application
    Filed: March 14, 2014
    Publication date: October 16, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Koji Hasegawa, Masayoshi Sagehashi, Tomohiro Kobayashi, Kazuhiro Katayama
  • Patent number: 8859717
    Abstract: Nitrogen-containing fused ring compound having at least one structural unit selected from the group consisting of a structural unit represented by the formula (1-1) and a structural unit represented by the formula (1-2).
    Type: Grant
    Filed: March 3, 2011
    Date of Patent: October 14, 2014
    Assignees: Sumitomo Chemical Company, Limited, Osaka University
    Inventors: Yutaka Ie, Masashi Ueta, Yoshio Aso, Masato Ueda
  • Patent number: 8841410
    Abstract: It is an object of the present invention to provide a nitrogen-containing condensed ring compound, which can be used as an organic n-type semiconductor having an excellent electron transport property and which is also excellent in terms of solubility in an organic solvent. The nitrogen-containing condensed ring compound of the present invention has a structural unit represented by the following formula (1-1) or formula (1-2): wherein Ar1 represents an aromatic ring; one of Y1 and Y2 represents a single bond, and the other represents —C(R11)(R12)— or —C(?X1)—; one of Y3 and Y4 represents a single bond, and) the other represents —C(R21)(R22)— or —C(?X2)—, and one of Y1 to Y4 represents —C(R11)(R12)— or —C(R21)(R22)—; at least one of W1 and W2 represents —N?; and Z1 and Z2 each represent any one of the groups represented by the formula (i) to the formula (ix).
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: September 23, 2014
    Assignees: Sumitomo Chemical Company, Limited, Osaka University
    Inventors: Yoshio Aso, Yutaka Ie, Masashi Ueta, Masato Ueda
  • Publication number: 20140272727
    Abstract: A method of producing a copolymer, including copolymerizing a monomer (am0) containing a partial structure represented by formula (am0-1) shown below, a monomer (am1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a monomer (am5) containing an —SO2— containing cyclic group in the presence of a nitrogen-containing compound (X) having a conjugated acid with an acid dissociation constant of less than 10 (in the formula, *0 to *4 each represents a valence bond).
    Type: Application
    Filed: March 12, 2014
    Publication date: September 18, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tomoyuki Hirano, Yoshiyuki Utsumi, Junichi Tsuchiya, Yoichi Hori
  • Patent number: 8835579
    Abstract: The present invention relates to a process for polymerizing (hetero)aromatic compounds under formation of aryl-aryl C—C couplings for preparing conjugated polymers with high molecular weight and high regioregularity, and to novel polymers obtainable by this process. The invention further relates to the use of the novel polymers as semiconductors or charge transport materials in optical, electrooptical or electronic devices including field effect transistors (FETs), thin film transistors (TFT), electroluminescent, photovoltaic and sensor devices.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: September 16, 2014
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Mathias Dueggeli, Martin Elbs, Olivier Frederic Aebischer, Achim Lamatsch
  • Publication number: 20140242519
    Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are a monovalent hydrocarbon group, R4 to R9 are hydrogen or a monovalent hydrocarbon group, R10 is a monovalent hydrocarbon group or fluorinated hydrocarbon group, A1 is a divalent hydrocarbon group, k1 is 0 or 1, and n1A is 0, 1 or 2. A resist composition comprising the polymer displays a high dissolution contrast during organic solvent development.
    Type: Application
    Filed: February 3, 2014
    Publication date: August 28, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama
  • Publication number: 20140220492
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component containing a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1). R1 and R2 each independently represents a group represented by general formula (a0-2) or a functional group; V1 and V2 each represents a single bond or an alkylene group of C1 to C10 which may have a substituent; Y1 represents a single bond or a divalent linking group; Y2 represents a fluorinated alkylene group of C1 to C4 which may have a substituent; L1 represents O or a group represented by —NR?1—(R?1 represents H or an alkyl group of C1 to C5); Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Application
    Filed: February 3, 2014
    Publication date: August 7, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takaaki Kaiho, Yoshitaka Komuro
  • Publication number: 20140196787
    Abstract: An organic photovoltaic cell, containing a first electrode; a second electrode; and a photoelectric conversion layer between the first electrode and the second electrode, wherein the photoelectric conversion layer contains a polymer having a structural unit represented by formula (I): wherein X represents S, NR2, O, Se or Te; Y represents NR2, O, Te, SO, SO2 or CO; and R1 and R2 represent a hydrogen atom or a substituent.
    Type: Application
    Filed: March 27, 2014
    Publication date: July 17, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Naoyuki HANAKI, Yoshihiro NAKAI, Kiyoshi TAKEUCHI, Hiroki SUGIURA
  • Publication number: 20140199631
    Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3 and R2 is H or an acid labile group. A resist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Application
    Filed: December 17, 2013
    Publication date: July 17, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama
  • Publication number: 20140183455
    Abstract: A Pechmann dye based polymer of formula 1, below, is provided.
    Type: Application
    Filed: December 27, 2012
    Publication date: July 3, 2014
    Applicant: XEROX CORPORATION
    Inventors: Anthony J. WIGGLESWORTH, Yiliang WU, Ping LIU
  • Publication number: 20140175414
    Abstract: An organic semiconductor polymer includes a moiety represented by the following Chemical Formula 1 and a heteroaromatic moiety having at least one of sulfur (S) and selenium (Se). In the Chemical Formula 1, R1, R2, R3a, R3b, R4a, R4b, R5a, and R5b, a1, a2, b1, and b2 are the same as described in the detailed description.
    Type: Application
    Filed: December 19, 2013
    Publication date: June 26, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hye Yeon YANG, Bang Lin LEE, Bon Won KOO, Joo Young KIM, Jeong Il PARK, Eun Kyung LEE, Ji Youl LEE, Jong Won CHUNG, Ji Young JUNG
  • Publication number: 20140166987
    Abstract: Conjugated polymers and small molecules including the nonplanar aromatic 1,6-methano[10]annulene ring structure along with aromatic subunits, such as diketopyrrolopyrrole, and 2,1,3-benzothiadiazole, substituted with alkyl chains in a “Tail In,” “Tail Out,” or “No Tail” regiochemistry are disclosed.
    Type: Application
    Filed: December 14, 2012
    Publication date: June 19, 2014
    Applicant: The Johns Hopkins University
    Inventors: John D. Tovar, Benjamin C. Streifel, Patricia A. Peart
  • Publication number: 20140151680
    Abstract: A polymer compound comprising a structural unit represented by the formula: wherein E represents —O—, —S— or —Se—; R1 represents a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group, a heteroaryl group or a halogen atom; and R2 represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group or a halogen atom, or two R2s are linked to form a ring, and a structural unit which is different from the structural unit represented by the formula (1) and is represented by the formula: ?Ar1???(2) wherein Ar1 represents a divalent aromatic group, a group represented by —CR3?CR3— or a group represented by —C?C—, wherein R3 represents a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group or a cyano group.
    Type: Application
    Filed: July 26, 2012
    Publication date: June 5, 2014
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hiroki Terai, Shinya Ito, Tomoya Kashiki
  • Patent number: 8741508
    Abstract: A colored curable composition including: at least one selected from the group consisting of a compound represented by the following Formula (1a) and a tautomer thereof; and at least one polymerizable compound, wherein R11, R12, R13, R14, R15, and R16 each independently represent a hydrogen atom or a monovalent substituent; and R11 and R12, and R15 and R16 independently may bond to each other in each pair to form a ring.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: June 3, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yoshihiko Fujie, Shinichi Kanna, Kazuya Oota, Yoshiharu Yabuki, Hiroaki Idei, Yasuhiro Ishiwata
  • Publication number: 20140141373
    Abstract: A compound represented by formula (I). In the formula, R1 represents a hydrocarbon group of 1 to 10 carbon atoms; Z represents a hydrocarbon group of 1 to 10 carbon atoms or a cyano group; provided that R1 and Z may be mutually bonded to form a ring; X represents a divalent linking group having any one selected from —O—C(?O)—, —NH—C(?O)— and —NH—C(?NH)— on a terminal that comes into contact with Q; p represents an integer of 1 to 3; Q represents a hydrocarbon group having a valency of (p+1), provided that, when p is 1, Q may be a single bond; R2 represents a single bond, an alkylene group which may have a substituent or an arylene group which may have a substituent; q represents 0 or 1; r represents an integer of 0 to 8; and A+ represents a metal cation or an organic cation.
    Type: Application
    Filed: June 15, 2012
    Publication date: May 22, 2014
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshiyuki Utsumi, Takahiro Dazai, Jun Iwashita, Kenri Konno
  • Publication number: 20140142266
    Abstract: The present invention relates to a polymerizable compound represented by a formula (I). The present invention provides a polymerizable compound, a polymerizable composition, a polymer, and an optically anisotropic article that are capable of obtaining an optical film having a low melting point, having excellent solubility, capable of being manufactured at low cost, and capable of uniform polarized light conversion across a broad wavelength region. [In formula: Y1 to Y6 are independently a chemical single bond, —O—, —O—C(?O)—, —C(?O)—O— etc.; G1 and G2 are independently a divalent C1-C20 aliphatic group etc.; Z1 and Z2 are independently C2-C10 alkenyl group that is substituted with a halogen atom etc.; Ax is a C2-C30 organic group that includes at least one aromatic ring selected from a group consisting of an aromatic hydrocarbon ring and an aromatic hetero ring; Ay is a hydrogen atom, a C1-C20 alkyl group, a C2-C20 alkenyl group, a C3-C12 cycloalkyl group etc.; A1 is a trivalent aromatic group etc.
    Type: Application
    Filed: April 27, 2012
    Publication date: May 22, 2014
    Applicant: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kumi Okuyama
  • Patent number: 8729221
    Abstract: Embodiments of the invention include polymers comprising a regioregular conjugated main chain section having an enantiopure or enantioenriched chiral side chain, as well as methods and materials for producing such polymers. Illustrative methods include regioselectively preparing a monomer that includes an enantiopure or enantioenriched chiral side group, and then reacting these monomers to produce a polymer that comprises a regioregular conjugated main chain section having an enantiopure or enantioenriched chiral side chains. In illustrative embodiments of the invention, the regioregular conjugated main chain section can contain a repeat unit that includes a dithiophene and a pyridine.
    Type: Grant
    Filed: April 24, 2013
    Date of Patent: May 20, 2014
    Assignee: The Regents of the University of California
    Inventors: Guillermo C. Bazan, Lei Ying, Peter Zalar, Thuc-Quyen Nguyen