Sulfur-containing Ring Contains Additional Hetero Atom, I.e., N, O, Se, Te Patents (Class 526/257)
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Publication number: 20110284082Abstract: Provided are a polymer containing a thiophene unit and a thienylenevinylene unit, and an organic field effect transistor and an organic solar cell containing the polymer. The film may be formed by coating a substrate with a polymer containing a thiophene unit and a thienylenevinylene unit using a solution process. Therefore, the production cost may be reduced and a large-scale device may be suitably manufactured since there is no need for an expensive vacuum system to form films. Also, the polymer according to one embodiment of the present invention containing a thiophene unit and a thienylenevinylene unit has very excellent flatness since the thiophene unit is continuously coupled with a vinyl group having excellent flatness. Therefore, the polymer may be useful in further improving the charge mobility since it has high crystallinity caused by the improved ordering property between molecules. Such crystallinity may be further improved by the heat treatment.Type: ApplicationFiled: December 10, 2010Publication date: November 24, 2011Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Dong-Yu Kim, Juhwan Kim, Bogyu Lim, Kang-Jan Baeg, Byung-Kwan Yu
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Patent number: 8039567Abstract: Disclosed herein are an alternating copolymer of phenylene vinylene and biarylene vinylene, a preparation method thereof, and an organic thin film transistor including the same. The organic thin film transistor maintains low off-state leakage current and realizes a high on/off current ratio and high charge mobility because the organic active layer thereof is formed of an alternating copolymer of phenylene vinylene and biarylene vinylene.Type: GrantFiled: December 20, 2010Date of Patent: October 18, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jong Il Park, Kook Min Han, Sang Yoon Lee, Eun Jeong Jeong
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Publication number: 20110244392Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A?) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof).Type: ApplicationFiled: December 27, 2010Publication date: October 6, 2011Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tomoyuki HIRANO, Daiju SHIONO, Masatoshi ARAI
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Publication number: 20110204351Abstract: The present invention relates to polymers comprising a repeating unit of the formula (I) and their use in electronic devices. The polymers according to the invention have excellent solubility in organic solvents and excellent film-forming properties. In addition, high charge carrier mobilities and high temperature stability of the emission color are observed, if the polymers according to the invention are used in polymer light emitting diodes (PLEDs).Type: ApplicationFiled: April 18, 2011Publication date: August 25, 2011Inventors: Ingo Heim, Bernd Tieke, Roman Lenz, Beat Schmidhalter, Aravinda Raman Rabindranath, Mathias Düggeli
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POLYMERS DERIVED FROM BIS(THIENOCYCLOPENTA) BENZOTHIADIAZOLE AND THEIR USE AS ORGANIC SEMICONDUCTORS
Publication number: 20110178236Abstract: The invention relates to conjugated polymers comprising bis(thienocyclopenta)benzothiadiazole units or derivatives thereof, to methods of their preparation, to novel monomer units used therein, to the use of the polymers in organic electronic (OE) devices, and to OE devices comprising the polymers.Type: ApplicationFiled: August 20, 2009Publication date: July 21, 2011Inventors: Steven Tierney, Clare Bailey, William Mitchell -
Publication number: 20110178255Abstract: A polymer semiconductor that includes a polythiophene having an Mn from about 1,000 to about 400,000 Daltons and derived from benzodithiophene monomer segments of Formula (1) and at least one divalent linkage providing compound selected from the group consisting of an aromatic or heteroaromatic electron acceptor compound X and an aromatic or heteroaromatic compound Y, wherein R1 and R2 are side chains independently selected from the group consisting of a hydrogen atom, a hydrocarbon group, a heteroatom and combinations thereof.Type: ApplicationFiled: January 19, 2010Publication date: July 21, 2011Applicant: Xerox CorporationInventors: Anthony J. Wigglesworth, Yiliang Wu, Ping Liu, Nan-Xing Hu
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Publication number: 20110171580Abstract: A positive resist composition comprising a polymer having a tetrahydrobenzocycloheptane-substituted secondary or tertiary carboxyl group ester as an acid labile group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.Type: ApplicationFiled: January 7, 2011Publication date: July 14, 2011Inventors: Jun HATAKEYAMA, Takeru Watanabe, Seiichiro Tachibaba
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Publication number: 20110171569Abstract: Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO, SO2, or OSO2, C1-C18alkylene, C3-C30cycloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, Ar1; Ar1, Ar2 and Ar3 are for example phenylene, R4, R5, R6, R7 and R8 are for example hydrogen, C3-C30-cycloalkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1C3-alkyl; X? is Formulae (IA), (IB) or (IC); R10 is for example C1-C18alkyl, C1-C10haloalkyl, camphoryl, phenyl-C1-C3alkyl, C3-C30cycloalkyl; and R11, R12, R13, R14 and R15 are for example C1-C10haloalkyl; are useful as polymerizable photolatent acids.Type: ApplicationFiled: June 2, 2009Publication date: July 14, 2011Inventors: Yuichi Nishimae, Toshikage Asakura, Hitoshi Yamato
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Publication number: 20110163303Abstract: A polymeric material includes a pendant polycyclic aromatic compound precursor.Type: ApplicationFiled: March 17, 2011Publication date: July 7, 2011Applicant: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Cherie R. Kagan
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Patent number: 7968650Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.Type: GrantFiled: October 26, 2007Date of Patent: June 28, 2011Assignee: Johnson & Johnson Vision Care, Inc.Inventors: Brian J. Tighe, Muriel Nasso, Beverley Benning, Frank F. Molock, Jr.
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Publication number: 20110135903Abstract: An optical part comprising a thermoplastic resin having a recurring unit represented by the following formula (1): wherein R represents a hydrogen atom, an alkyl group, or an aryl group; G represents a divalent linking group; A represents an oxygen atom, a sulfur atom, or —N(R1)—; R1 represents a hydrogen atom, an alkyl group, or an aryl group; Q represents an atomic group of forming a hetero ring; and l indicates 0 or 1.Type: ApplicationFiled: August 28, 2009Publication date: June 9, 2011Applicant: FUJIFILM CorporationInventors: Ryo Suzuki, Rie Okutsu, Hiroaki Mochizuki, Tatsuhiko Obayashi
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Publication number: 20110132460Abstract: A conjugated polymer has a repeated unit having the structure of formula (I) where in n is an integer greater than 1, R1 and R2 are independently selected from alkyl groups with up to 18C atoms, aryls and substituted aryls, and wherein Ar is selected from monocyclic, bicyclic and polycyclic arylene, or monocyclic, bicyclic and polycyclic heteroarylene, or may contain one to five such groups, either fused or linked.Type: ApplicationFiled: August 18, 2009Publication date: June 9, 2011Inventors: Yang Yang, Jianhui Hou, Hsiang-Yu Chen
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Publication number: 20110127515Abstract: Disclosed is a photoelectric conversion element comprising a pair of electrodes, at least one of which is transparent or translucent, and a photoactive layer provided between the electrodes, wherein the photoactive layer contains an electron donating compound and an electron accepting compound, and the electron donating compound or the electron accepting compound is a polymer compound having a repeating unit represented by the following formula (I), and the proportion of the repeating unit represented by the formula (I) is the highest among all of the repeating units contained in the polymer compound: wherein R1, R2, R3, R4, R5 and R6 are the same or different, represent a hydrogen atom or a substituent, and may be linked with one another to form a cyclic structure; X1, X2 and X3 are the same or different and represent a sulfur atom, an oxygen atom, a selenium atom, —N(R7)— or —CR8?CR9—; R7, R8, and R9 are the same or different and represent a hydrogen atom or a substituent; and n and m are the same or diType: ApplicationFiled: August 5, 2009Publication date: June 2, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Kunihito Miyake, Takanobu Noguchi
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Publication number: 20110114184Abstract: Polymers which can be used in p-type materials for organic electronic devices and photovoltaic cells. Compounds, monomers, dimers, trimers, and polymers comprising: wherein A1 and A2 each independently comprise a fused ring system comprising at least two fused rings directly covalently linked to the pyrrole rings. Good photovoltaic efficiency and lifetime can be achieved. The R group can provide solubility, environmental stability, and fine tuning of spectroscopic and/or electronic properties. Different polymer microstructures can be prepared which encourage multiple band gaps and broad and strong absorptions. The carbonyl can interact with adjacent thiophene rings to provide backbone with rigidity, induce planarity, and reduce and/or eliminate intramolecular chain twisting defects.Type: ApplicationFiled: September 1, 2010Publication date: May 19, 2011Inventors: Christopher T. Brown, Christophe René Gaston Grenier, Chad Landis, Elena E. Sheina, Ting Xu
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Publication number: 20110117497Abstract: An acrylate derivative represented by the following general formula (1): (in the formula, R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2, R3, R5, R7, R8, R9 and R10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R4 and R6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R4 and R6 are bonded to each other to represent an alkylene group, —O— or —S—; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to sType: ApplicationFiled: June 30, 2009Publication date: May 19, 2011Applicant: Kuraray Co., Ltd.Inventors: Junko Sato, Osamu Nakayama, Takashi Fukumoto
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Patent number: 7939612Abstract: A radically polymerizable compound having a group represented by formula (1) (In the formula, R1 to R3 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, X represents an alkylene group having 1 to 4 carbon atoms.) and a radically polymerizable double bond and a composition for an optical material comprising the same have a high refractive index and excellent transparency and are hard to be oxidized in thermal curing and useful as an optical material with little tinting.Type: GrantFiled: January 26, 2007Date of Patent: May 10, 2011Assignee: Showa Denko K.K.Inventors: Keisuke Ohta, Yasuyuki Oyama, Kazufumi Kai
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Patent number: 7935771Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.Type: GrantFiled: November 10, 2006Date of Patent: May 3, 2011Assignee: Canon Kabushiki KaishaInventors: Tatsuki Fukui, Akiko Tominaga, Takashi Kenmoku, Masato Minami, Tetsuya Yano, Takeshi Ikeda, Atsushi Tani, Norikazu Fujimoto
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Publication number: 20110060112Abstract: Provided are 1) a polymer which is excellent in a reactivity to acid and a heat stability and which is less swollen in developing, 2) a compound shown below which is a raw material for the above polymer and 3) a photoresist composition which contains the above polymer and which is improved in LWR and excellent in a heat resistance. (wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or the like; R2 to R10 each represent independently a hydrogen atom, a linear alkyl group, a branched alkyl group or the like; and A and B each represent independently an oxygen atom or a sulfur atom).Type: ApplicationFiled: February 20, 2009Publication date: March 10, 2011Applicant: KURARAY CO., LTD.Inventors: Osamu Nakayama, Takashi Fukumoto
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Publication number: 20110053082Abstract: A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.Type: ApplicationFiled: August 31, 2010Publication date: March 3, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji Ichikawa, Akira Kamabuchi, Yuichi Mukai
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Publication number: 20110046330Abstract: A soluble donor-acceptor electrochromic polymer (DA-ECP) is prepared that absorbs light throughout at least the majority of the visible range and is essentially black to the human eye when in the neutral state, but is highly transmissive when electrochemically doped. The conjugated polymer has acceptor units separated by sequences of a plurality of donor units. The sequences can be monodispersed or polydispersed. The DA-ECP is prepared by the polycondensation of a plurality of at least one donor-acceptor oligomer (DA-oligomer) that has at least one internal acceptor repeating unit and at least one donor repeating unit on all termini of the oligomer, and optionally, a plurality of at least one donor monomer and/or donor oligomer.Type: ApplicationFiled: October 29, 2008Publication date: February 24, 2011Applicant: University of Florida Research Foundation, Inc.Inventors: Pierre Marc Beaujuge, John R. Reynolds, Stefan Martin Ellinger
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Publication number: 20110040055Abstract: A series of conjugated polymers with electrochromic properties and photovoltaic activity are provided. The representative structure formula of the conjugated polymers is shown as structure formula (I): Wherein m can be 1-4, p can be 0-3, and n can be 3-10000; R1 and R2 can be —H, —CaH2a+1, —OCaH2a+1, —SCaH2a+1, —N(CaH2a+1)2 or —[O(CaH2a)2]b (a=1-15, b=1-5), respectively; and X is an unsaturated moiety.Type: ApplicationFiled: November 13, 2009Publication date: February 17, 2011Applicant: NATIONAL CENTRAL UNIVERSITYInventors: Chun-Guey WU, Ming-Hsuan HO, Pei-Fang TSAI
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Publication number: 20100331508Abstract: Provided are a polymerizable compound shown below which is useful as a raw material for a polymer having less swelling in developing, a polymer obtained by polymerizing a raw material containing the above polymerizable compound, a photoresist composition which contains the above polymer and which is improved in LWR and an efficient production process for the polymerizable compound described above: wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or trifluoromethyl; R2, R3, R4, R5, R6, R7, R8, R9 and R10 represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or the like; W represents an alkylene group having 1 to 10 carbon atoms or the like; and Y1 and Y2 represent an oxygen atom or a sulfur atom.Type: ApplicationFiled: February 20, 2009Publication date: December 30, 2010Applicant: KURARAY CO., LTD.Inventors: Junko Sato, Osamu Nakayama, Takashi Fukumoto
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Publication number: 20100326527Abstract: Disclosed are new semiconductor materials prepared from naphthalene-imide copolymers. Such polymers can exhibit desirable electronic properties and can possess processing advantages including solution-processability and/or good stability at ambient conditions.Type: ApplicationFiled: February 5, 2009Publication date: December 30, 2010Inventors: Antonio Facchetti, Zhihua Chen, He Yan, Yan Zheng, Jordan Quinn, Marcel Kastler, Florian Doetz, Silke Koehler
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Patent number: 7858287Abstract: A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X?represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).Type: GrantFiled: November 30, 2007Date of Patent: December 28, 2010Assignees: Hyogo Prefecture, Toyo Gosei Co., LtdInventors: Takeo Watanabe, Hiroo Kinoshita, Shinichi Yusa, Tomotaka Yamanaka, Masamichi Hayakawa, Yosuke Osawa, Satoshi Ogi, Yoshitaka Komuro
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Publication number: 20100323296Abstract: A resin comprises a structural unit derived from a compound represented by the formula (aa) wherein T represents a C4 to C36 alicyclic hydrocarbon group, the hydrogen atom contained in the alicyclic hydrocarbon group may be replaced by a halogen atom, a hydroxyl group, a C1 to C12 alkyl group optionally substituted with a halogen atom or a hydroxyl group, a C1 to C12 alkoxyl group, a C6 to C12 aryl group, a C7 to C12 aralkyl group, a glycidyloxy group, a C2 to C4 acyl group, an alkoxycarbonyl group, an alkanoyloxyalkyl group or a cyano group, and the —CH2— contained in the alicyclic hydrocarbon group is replaced by at least one —SO2— and furthermore may be replaced by —CO—, —O—, —S—, —SO2— or —N(Rc)—; Rc represents a hydrogen atom or a C1 to C6 alkyl group; R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group that may optionally has halogen atoms; and Z1 represents an optionally substituted C1 to C17 saturated hydrocarbon group, and the —CH2— contained in the saturated hydrocarbon grouType: ApplicationFiled: June 22, 2010Publication date: December 23, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji Ichikawa, Yusuke Fuji, Satoshi Yamaguchi
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Patent number: 7833694Abstract: Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S, and k1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ?500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.Type: GrantFiled: March 12, 2009Date of Patent: November 16, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Koji Hasegawa, Satoshi Shinachi, Katsuhiro Kobayashi, Tsunehiro Nishi, Takeshi Kinsho
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Publication number: 20100286003Abstract: The disclosed invention relates to polymers with heterocyclic-containing groups, and to concentrates and lubricating oil compositions containing the polymers.Type: ApplicationFiled: August 18, 2008Publication date: November 11, 2010Applicant: The Lubrizol CorporationInventor: Saleem Al-Ahmad
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Publication number: 20100241225Abstract: A curable resin composition for intraocular lens is provided, the curable resin composition including: (a) a first monomer selected from compounds represented by formula (I); (b) a polyfunctional second monomer; and (c) a radical polymerization initiator: wherein R1 represents a hydrogen atom or an alkyl group; X1 represents an oxygen atom or a sulfur atom; when X1 represents a sulfur atom, X2 represents CR2 where R2 represents a hydrogen atom or an alkyl group; when X1 represents an oxygen atom, X2 represents C?O; R3 to R5 each represents a hydrogen atom, an alkyl group, an aryl group, a hetero ring group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, an arylcarbonyloxy group, an acylamino group, a sulfonylamino group, an amino group, an acyl group or a halogen atom; and n represents 0 or 1.Type: ApplicationFiled: March 23, 2010Publication date: September 23, 2010Applicant: FUJIFILM CORPORATIONInventor: SATORU YAMADA
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Patent number: 7799884Abstract: UV curable compositions, polymeric photoinitiators and precursors therefor are described.Type: GrantFiled: November 30, 2006Date of Patent: September 21, 2010Assignee: Henkel AG & Co. KGaAInventors: Donald E. Herr, Ziyi Hu, Charles W. Paul, Robert W. R. Humphreys
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Publication number: 20100233625Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid, and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) having an aromatic group, a structural unit (a5) represented by general formula (a5-1) shown below, and a structural unit (a1) containing an acid-dissociable, dissolution-inhibiting group. In the formula (a5-1), R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.Type: ApplicationFiled: March 10, 2010Publication date: September 16, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tomoyuki Hirano, Tasuku Matsumiya, Daiju Shiono, Takahiro Dazai
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Publication number: 20100209848Abstract: A polymeric compound (A1) includes a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) represented by general formula (a0-2), and a structural unit (a1-0-1) represented by general formula (a1-0-1), wherein relative to the combined total of all the structural units, the proportion of the structural unit (a0-1) is from 10 to 40 mol %, the proportion of the structural unit (a0-2) is from 5 to 20 mol %, and the proportion of the structural unit (a1-0-1) is from 10 to 55 mol %. [In the formulas, each of R1 and R independently represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms, or a halogenated alkyl group of 1 to 5 carbon atoms, R2, A and B each represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof, and R4 and X1 each represents an acid-dissociable, dissolution-inhibiting group.Type: ApplicationFiled: January 26, 2010Publication date: August 19, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Dazai, Tomoyuki Hirano, Tasuku Matsumiya, Daiju Shiono
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POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND POLYMERIC COMPOUND
Publication number: 20100196821Abstract: A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a structural unit (a0) derived from an acrylate ester having a cyclic group containing a sulfonyl group on the side chain thereof, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a5) represented by general formula (a5-1) (Y1 represents an aliphatic hydrocarbon group; Z represents a monovalent organic group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, provided that a+b=1 to 3).Type: ApplicationFiled: January 14, 2010Publication date: August 5, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Dazai, Daiju Shiono, Tomoyuki Hirano, Tasuku Matsumiya, Masaru Takeshita -
Patent number: 7767379Abstract: There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R? each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).Type: GrantFiled: September 4, 2008Date of Patent: August 3, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Dazai, Takayoshi Mori, Hiroaki Shimizu, Kyoko Oshita
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Publication number: 20100183975Abstract: Provided is a actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin containing (A) a repeating unit having an ionic structure moiety that contains a cation represented by formula (Ia) and is capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation: wherein each of R1a to R13a independently represents a hydrogen atom or a monovalent substituent and may combine together to form a ring, and Z represents a single bond or a divalent linking group.Type: ApplicationFiled: December 18, 2009Publication date: July 22, 2010Applicant: FUJIFILM CORPORATIONInventors: Hidenori TAKAHASHI, Tomotaka TSUCHIMURA, Toru TSUCHIHASHI, Katsuhiro YAMASHITA, Hideaki TSUBAKI
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Publication number: 20100178609Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and an acid generator component (B), wherein the base component (A) includes a polymeric compound (A0) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R2 represents a bivalent linking group containing at least one kind of polar groups selected from the group consisting of —O—, —C(?O)—, —C(?O)—O—, a carbonate linkage (—O—C(?O)—O—), —S—, —S(?O)2—, —S(?O)2—O—, —NH—, —NR04— (wherein, R04 represents an alkyl group or an acyl group), and —NH—C(?O)—; and R3 represents a cyclic group containing a sulfonyl group within the ring skeleton).Type: ApplicationFiled: January 11, 2010Publication date: July 15, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Dazai, Daiju Shiono, Tomoyuki Hirano, Tasuku Matsumiya, Daichi Takaki, Takayoshi Mori, Junichi Tsuchiya
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Publication number: 20100156284Abstract: A polymer compound comprising a constitutional unit of the following formula (1): (wherein, P represents an integer of 1 to 4, Q represents an integer of 0 to 4. RX and RY represent each independently an alkyl group, alkoxy group, alkylthio group, aryloxy group, arylthio group, arylalkyl group, arylalkoxy group or arylalkylthio group, when there exist a plurality of RX's, these may be the same or different, and when there exist a plurality of RY's, these may be the same or different. Ar1 represents an unsubstituted or substituted arylene group or an unsubstituted or substituted di-valent heterocyclic group, and Ar2 represents an unsubstituted or substituted aryl group or an unsubstituted or substituted mono-valent heterocyclic group. A plurality of Ar1's and Ar2's may each be the same or different.).Type: ApplicationFiled: May 14, 2008Publication date: June 24, 2010Applicant: SUMITOMO CHEMICAL COMPANY ,LIMITEDInventors: Daisuke Fukushima, Yoshiaki Tsubata
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Patent number: 7696303Abstract: A polymer for use in an optical device comprising a first, optionally substituted, repeat unit of formula and a second, optionally substituted, repeat unit of formula wherein each Ar and Ar? is the same or different and comprises an optionally substituted aryl or heteroaryl group and optionally a third, optionally substituted, repeat unit in a molar ratio of no greater than 5%, the third repeat unit having a formula —Ar—N(Ar)—Ar— and having a single nitrogen atom in its backbone.Type: GrantFiled: May 9, 2003Date of Patent: April 13, 2010Assignee: Cambridge Display Technology LimitedInventors: Richard O'Dell, Carl Towns, Brian Tierney, Stephen O'Connor, Ilaria Grizzi, Clare L. Foden, Nalinkumar Patel, Mark L. Leadbeater, Lorraine Murtagh
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Publication number: 20100062364Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including at least one structural unit (a0) selected from the group consisting of a structural unit represented by general formula (a0-1) [R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof] and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group, and the polymeric compound (A1) containing an acid dissociable, dissolution inhibiting group within the structure thereof.Type: ApplicationFiled: August 20, 2009Publication date: March 11, 2010Inventors: Takahiro Dazai, Tomoyuki Hirano, Daiju Shiono, Tasuku Matsumiya
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Publication number: 20100001263Abstract: A polymer compound comprising a repeating unit of the following formula (1) and having a polystyrene-reduced number average molecular weight of 1×103 to 1×108: [wherein, Ar1 and Ar2 represent an arylene group, divalent heterocyclic group or divalent aromatic amine group. Z1 represents —CR1?CR2— or —C?C—. Here, R1 and R2 represent a hydrogen atom, alkyl group, aryl group or the like. m and n represent 1 or 2. Rs and Rt represent a hydrogen atom, alkyl group or alkoxy group.].Type: ApplicationFiled: July 26, 2007Publication date: January 7, 2010Applicant: Sumitomo Chemical Company, LimitedInventors: Takanobu Noguchi, Tomoyuki Suzuki, Makoto Anryu
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Publication number: 20090318651Abstract: The present invention provides a heterocyclic compound of the following general formula (I): wherein X and Y are different from each other and represent a halogen atom selected from among a chlorine atom, bromine atom and iodine atom, or CF3SO3?, CH3SO3?, C6H5SO3? or CH3C6H4SO3?; R1 represents an optionally substituted monovalent aliphatic hydrocarbon group having two or more carbon atoms; one of A1 and A2 represents —S—, —O—, —Se— or Te—, while the other represents —N?, —P? or —Si(R2)?, wherein R2 represents a hydrogen atom, an optionally substituted monovalent hydrocarbon group, a halogen atom, an amino group or a carbonyl group; and one of two linkages each represented by a solid line and a dashed line is a single bond, while the other is a double bond.Type: ApplicationFiled: November 19, 2007Publication date: December 24, 2009Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Kenta Tanaka, Hideyuki Higashimura, Kazuei Ohuchi, Akio Tanaka, Masato Ueda
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Patent number: 7632903Abstract: Crosslinked polymeric materials are described that contain pendant amine capture groups. The amine capture groups include N-sulfonylaminocarbonyl groups that can react with amine-containing materials by a nucleophilic displacement reaction. Reaction mixtures used to prepare the crosslinked polymeric materials, articles containing the crosslinked polymeric materials, methods of making articles, and methods of immobilizing an amine-containing material are also described.Type: GrantFiled: April 30, 2009Date of Patent: December 15, 2009Assignee: 3M Innovative Properties CompanyInventors: Charles M. Leir, George G. I. Moore, Rahul R. Shah, Karl E. Benson
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Publication number: 20090221740Abstract: A composition comprising a copolymer comprising DTP units for use in, for example, low band gap materials including uses in organic photovoltaic active layers. The band gap and other properties can be engineered by copolymerization methods including selection of monomer structure and ratio of monomer components. In addition, a dimer adapted for making alternating copolymers further comprising one first monomer moiety comprising at least one DTP moiety compound covalently linked to one second monomer moiety comprising at least one non-DTP moiety or a different DTP moiety. The composition can be copolymerized to form an alternating copolymer that can be further processed to form a polymeric film used in a printed organic electronic device.Type: ApplicationFiled: February 13, 2009Publication date: September 3, 2009Inventor: Elena E. Sheina
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Publication number: 20090209676Abstract: Crosslinked polymeric materials are described that contain pendant amine capture groups. The amine capture groups include N-sulfonylaminocarbonyl groups that can react with amine-containing materials by a nucleophilic displacement reaction. Reaction mixtures used to prepare the crosslinked polymeric materials, articles containing the crosslinked polymeric materials, methods of making articles, and methods of immobilizing an amine-containing material are also described.Type: ApplicationFiled: April 30, 2009Publication date: August 20, 2009Inventors: Charles M. Leir, George G.I Moore, Rahul R. Shah, Karl E. Benson
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Publication number: 20090189150Abstract: An organic semiconducting copolymer according to example embodiments may be represented by Formula 1 below: An organic electronic device may include the above organic semiconducting copolymer. The organic semiconducting copolymer according to example embodiments may provide improved solubility, processability, and thin film properties. Consequently, the organic semiconducting copolymer may be used in a variety of electronic devices. A suitable electronic device may be an organic thin film transistor. When an active layer of an organic thin film transistor includes the organic semiconducting copolymer, higher charge mobility and lower breaking leakage current may be achieved.Type: ApplicationFiled: July 18, 2008Publication date: July 30, 2009Inventors: Bang-Lin Lee, Kook-min Han, Eun-kyung Lee, Do-hwan Kim, Hyun-sik Moon
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Publication number: 20090192279Abstract: The invention relates to a radically polymerizable sulfur-containing compound having a group represented by formula (1) and at least one selected from among groups represented by formulae (2) to (4), a radically polymerizable sulfur-containing polymer obtained by subjecting the compound to cationic ring-opening (co)polymerization, production process thereof, a composition containing the sulfur-containing compound and/or the sulfur-containing polymer, and a cured product obtained from the composition. (R1 to R6 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.) The cured product obtained from the radically polymerizable sulfur-containing compound and the radically polymerizable sulfur-containing polymer having a high refractive index is useful as an optical material, especially for lens material.Type: ApplicationFiled: February 5, 2009Publication date: July 30, 2009Applicant: SHOWA DENKO K.K.Inventors: Keisuke OHTA, Tsuneo TAJIMA, Kazufumi KAI, Yasuyuki OYAMA
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Patent number: 7544754Abstract: Crosslinked polymeric materials are described that contain pendant amine capture groups. The amine capture groups include N-sulfonylaminocarbonyl groups that can react with amine-containing materials by a nucleophilic displacement reaction. Reaction mixtures used to prepare the crosslinked polymeric materials, articles containing the crosslinked polymeric materials, methods of making articles, and methods of immobilizing an amine-containing material are also described.Type: GrantFiled: September 30, 2005Date of Patent: June 9, 2009Assignee: 3M Innovative Properties CompanyInventors: Charles M. Leir, George G. I. Moore, Rahul R. Shah, Karl E. Benson
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Patent number: 7541131Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.Type: GrantFiled: February 17, 2006Date of Patent: June 2, 2009Assignee: FUJIFILM CorporationInventor: Yasutomo Kawanishi
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Publication number: 20090095343Abstract: The synthesis, characterization, optical and electrochemical properties of a regioregular copolymer, poly(3-octylthiophene-2,5-diyl-co-3-decyloxythiophene-2,5-diyl) (POT-co-DOT), and an alternating regioregular copolymer poly{(9,9-dioctylfluorene)-2,7-diyl-alt-[4,7-bis(3-decyloxythien-2-yl)-2,1,3-benzothiadiazole]-5?,5?-diyl} (PF-co-DTB) is disclosed. The incorporation of 3-alkoxythiophene units onto the conjugated backbones enhances the electron-donating property of the polymer and lowers its bandgap. The fabrication and performance of photovoltaic cells with bulk heterojunction architecture based on blends of these copolymers with PCBM are also described.Type: ApplicationFiled: September 15, 2008Publication date: April 16, 2009Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Qibing Pei, Yang Yang, Chenjun Shi
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Patent number: 7518001Abstract: The invention relates to a radically polymerizable sulfur-containing compound having a group represented by formula (1) and at least one selected from among groups represented by formulae (2) to (4), a radically polymerizable sulfur-containing polymer obtained by subjecting the compound to cationic ring-opening (co)polymerization, production process thereof, a composition containing the sulfur-containing compound and/or the sulfur-containing polymer, and a cured product obtained from the composition . . . (1)(2)(3)(4) . . . (R1 to R6 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.) The cured product obtained from the radically polymerizable sulfur-containing compound and the radically polymerizable sulfur-containing polymer having a high refractive index is useful as an optical material, especially for lens material.Type: GrantFiled: September 20, 2005Date of Patent: April 14, 2009Assignee: Showa Denko K.K.Inventors: Keisuke Ohta, Tsuneo Tajima, Kazufumi Kai, Yasuyuki Oyama
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Publication number: 20090065766Abstract: A polymer has a structure represented by: wherein each R is independently selected from hydrogen, an optionally substituted hydrocarbon, and a hetero-containing group, each M is an optional, conjugated moiety, a represents a number that is at least 1, b represents a number from 0 to 20, n represents a number from 2 to 5000, each X is independently selected from S, Se, O, and NR?, where each R? is independently selected from hydrogen, an optionally substituted hydrocarbon, and a hetero-containing group, each Z is independently one of an optionally substituted hydrocarbon, a hetero-containing group, and a halogen, d represents a number which is at least 1, and e represents a number from zero to 2.Type: ApplicationFiled: September 6, 2007Publication date: March 12, 2009Inventor: Yuning Li