Abstract: A silicone pressure sensitive adhesive with amphiphilic copolymers for maintaining adhesion in a moist environment. The amphiphilic copolymers for silicone adhesives include at least one silicone moiety and at least one hydrophilic segment. Such adhesives are applicable to securing medical devices to human skin.

Abstract: Disclosed are a copolymer, porous membranes made from the copolymer, and a method of treating fluids to remove metal ions using the porous membranes, for example, from fluids originating in the microelectronics industry, wherein the copolymer includes monomeric units I and II, wherein monomeric unit I is of the formula A-X—CH2—B, wherein A is Rf—(CH2)n, Rf is a perfluoro alkyl group of the formula CF3—(CF2)x—, wherein x is 3-12, n is 1-6, X is O or S, and B is vinylphenyl, and monomeric unit II is vinylpyridine.

Abstract: Disclosed are a copolymer, porous membranes made from the copolymer, and a method of treating fluids to remove metal ions using the porous membranes, for example, from fluids originating in the microelectronics industry, wherein the copolymer includes monomeric units I and II, wherein monomeric unit I is of the formula A-X—CH2—B, wherein A is Rf—(CH2)n, Rf is a perfluoro alkyl group of the formula CF3—(CF2)x—, wherein x is 3-12, n is 1-6, X is O or S, and B is vinylphenyl, and monomeric unit II is vinylpyridine.

Abstract: Fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”) copolymers and terpolymers useful in the field of coatings for enhancing performance of materials surfaces. Also disclosed are methods for making such copolymers and terpolymers.

Abstract: To provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance. According to the photocurable fluorinated polymer composition comprising a fluorinated polymer (A) containing polymerized units derived from a fluoroolefin and polymerized units derived from an unsaturated monomer having an oxetanyl group or a substituted oxetanyl group, and a photoreaction initiator (B), of the present invention, it is possible to provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance.

Abstract: A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.

Abstract: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is an acid labile group, R5 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition is of dual-tone type in that an intermediate dose region of resist film is dissolved in a developer, but unexposed and over-exposed regions of resist film are insoluble.

Abstract: The present invention relates to a polymer composition comprising polylactide and, based on the weight of this polymer, from 17 to 25 wt % of a chain modifier, from 30 to 55 wt % of an elastomeric polymer and from 20 to 45 wt % of a plasticizer. The invention also relates to the method of preparing said composition as well as to the method of manufacturing an article starting from said composition and the article per se.

Abstract: The present invention is directed to a copolymer comprising: a polymeric backbone chain derived from a monomer comprising at least one conjugated diolefin monomer and optionally at least one vinyl aromatic monomer; and a polymeric side-chain bonded exclusively to a terminal end of the backbone chain, the side-chain comprising a polymer derived from a monomer having a hydrogen bond donor moiety and a hydrogen bond acceptor moiety.

Abstract: A photoresist includes a group which will decompose that is attached to a hydrocarbon backbone at multiple points along the hydrocarbon chain. With such an attachment, the group which will decompose will cleave from one point in order to generate a desired shift in polarity while still remaining bonded to the hydrocarbon backbone. This prevents the group which will decompose from leaving the photoresist, thereby reducing or eliminating volume losses associated with exposure and post-exposure baking.

Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

Abstract: A polymer comprising a conducting or semiconducting segment coupled to a polymer segment having an insulating polymer backbone, the polymer further comprising a RAFT functional group coupled to the polymer segment, wherein there is no RAFT functional group in between the conducting or semiconducting segment and the polymer segment.

Abstract: Polymers and copolymers of polymerizable fluorescent compounds of 7-hydroxycoumarin such as Ethyl-2-methacrylate Umbelliferone-4-acetate are provided. In addition, a sensor comprising this polymer notably for detecting and/or assaying nitrated and organophosphorus compounds, explosives, and toxic compounds is provided.

Abstract: To suppress a phenomenon where an optical axis of the optically anisotropic layer is tilted when the optically anisotropic layer is produced by using a liquid crystalline compound showing smectic phase as a materials showing a higher level of orderliness. An optically anisotropic layer wherein a polymerizable composition, containing one or more polymerizable rod-like liquid crystal compound showing a smectic phase, is fixed in a state of smectic phase, and a direction of maximum refractive index of the optically anisotropic layer is inclined at 10° or smaller to the surface of the optically anisotropic layer, a method for manufacturing the same, a laminate and a method for manufacturing the same, a polarizing plate, a liquid crystal display device, and an organic EL display device.

Abstract: Provided is a cationically polymerizable resin which is rapidly cured upon irradiation with light and forms a cured product excellent in flexibility and thermal stability. The cationically polymerizable resin is obtained through radical polymerization of an oxetane-ring-containing (meth)acryloyl compound represented by following Formula (1) alone or in combination with another radically polymerizable compound. In the formula, R1 represents hydrogen atom or methyl group; R2 represents hydrogen atom or an alkyl group; and “A” represents a linear or branched chain alkylene group having 2 to 20 carbon atoms.

Abstract: Disclosed is a cationically polymerizable resin composition which includes an oxetane-ring-containing vinyl ether compound (A) and/or an alicyclic-epoxy-containing vinyl ether compound (B); and an oligomer or polymer (C) having a molecular weight of 500 or more, being liquid at 0° C., and containing at least one of structures represented by following Formulae (1a) to (1f), wherein Rx represents hydrogen atom or methyl group; R1 to R3 each independently represent a hydrocarbon group having 1 to 5 carbon atoms; “a” is an integer of from 0 to 5; and “b” is 1 or 2. This cationically polymerizable resin composition has a low viscosity, is easy to work, cures extremely rapidly upon irradiation with light, and can give a cured object excellent in flexibility, thermal stability, and bendability after heat treatment.

Abstract: The present invention provides an overcoat film which has excellent degree of planarization by optimizing the molecular weight of a binder resin included in a thermally curable resin composition for a protective film and the content of each component including the same. In a color filter according to the present invention, it is not necessary to light up all the red, green, and blue (RGB) pixels for eliciting a white light and perform a separate application process of a white portion because an overcoat film according to the present invention may serve as the white portion.

Abstract: Disclosed herein are a cyclic olefin compound, a photoreactive polymer, and an alignment layer comprising the photoreactive polymer, where the cyclic olefin compound can be used to provide the photoreactive polymer having not only excellences in liquid crystal alignment and alignment rate but also readiness for change in the alignment direction depending on the polarization direction.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the ?-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms).

Abstract: The instant disclosure describes methacrylate coated carrier resins with aromatic substituent groups with optionally carbon atoms replaced by heteroatoms such as S, N, and O for charge control and improved RH sensitivity.

Abstract: Disclosed are polymer-based dielectric compositions (e.g., formulations) and materials (e.g. films) and associated devices. The polymers generally include photocrosslinkable pendant groups; for example, the polymers can include one or more coumarin-containing pendant groups.

Abstract: The present invention provides a thermoplastic acrylic resin of a copolymer comprising 10 to 70% by weight of a repeating unit derived from the particular methacrylate monomer, 5 to 40% by weight of a repeating unit derived from the particular vinyl aromatic monomer, and 20 to 50% by weight of a repeating unit of the particular cyclic acid anhydride, characterized in that a molar ratio (B/A) is within the range of more than 1 to not more than 10, wherein (A) is a content of the repeating unit of the vinyl aromatic monomer and (B) is a content of the repeating unit of the cyclic acid anhydride, and the total amount of remaining monomers to 100 parts by weight of the copolymer is not more than 0.5 part by weight.

Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.

Abstract: An adhesive resin composition of the present invention includes an expandable sticky polymer having a structure derived from a Meldrum's acid derivative, or a Meldrum's acid derivative represented by the following general formula (1) and an adhesive resin.

Abstract: The invention provides a method for inhibiting bacterial attachment to a surface, the method comprising forming the surface from a polymer, or applying a polymer to the surface, wherein the polymer is a homopolymer formed from a (meth) acrylate or (meth) acrylamide monomer or a copolymer formed from one or more (meth) acrylate or (meth) acrylamide monomers, wherein the (meth) acrylate or (meth) acrylamide monomers are of formula (I) or (II): [H2C?CR?—C(?O)—O—]nR??(I) [H2C?CR?—C(?O)—NH—]nR??(II) wherein n is 1, 2 or 3, R? is independently H or CH3, R is an organic group having a total of from 2 to 24 carbon atoms, wherein the organic group includes an aliphatic or aromatic hydrocarbon moiety and wherein the organic group does not include any hydroxyl groups.

Abstract: [Task to Be Achieved] To provide a chemically amplified type positive copolymer for semiconductor lithography, which has eliminated the problems of prior art, has a high development contrast, and has excellent resolution in fine-pattern formation; a composition for semiconductor lithography which contains the copolymer; and a process for producing the copolymer. [Means for Achievement] The copolymer for semiconductor lithography according to the present invention is a copolymer which has at least (A) a repeating unit having a structure which has an alkali-soluble group protected by an acid-labile, dissolution-suppressing group, (B) a repeating group having a lactone structure and (C) a repeating group having an alcoholic hydroxyl group and which is characterized by having an acid value of 0.01 mmol/g or less as determined by dissolving the copolymer in a solvent and subjecting the solution to neutralization titration with a solution of an alkali metal hydroxide using Bromothymol Blue as an indicator.

Abstract: There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.

Abstract: The present invention relates to a polymer composition comprising polylactide and, based on the weight of this polymer, from 17 to 25 wt % of a chain modifier, from 30 to 55 wt % of an elastomeric polymer and from 20 to 45 wt % of a plasticizer. The invention also relates to the method of preparing said composition as well as to the method of manufacturing an article starting from said composition and the article per se.

Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.

Abstract: A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.

Abstract: A flow medium for assisting a resin to be transferred into a mold accommodating a layered structure of reinforced material is provided. The flow medium is configured such that when the resin is cured the flow medium becomes incorporated within a final composite component comprising the reinforced material embedded within the transferred and cured resin. A semifinished product comprising such a flow medium is provided and a method for producing a composite component by utilizing such a semifinished product is also provided.

Abstract: This invention provides a method to form nano-sized dispersed structure consisting of aqueous sodium silicate and polyvinyl pyrrolidone (PVP) solutions, and a binder consisting of a nano-sized dispersed structure and calcium chloride dihydrate solution. The invention provides also a method to immobilize sand dunes and wind-blown dust by using the binder.

Abstract: The present discovery uses monomers which contain reversible photo-crosslinkable groups in addition to primary polymerizable groups. The mechanical properties of these materials and the reversibility of the photo-activated shape memory effect demonstrate the effectiveness of using photo-irradiation to effect change in modulus and shape memory effect. In the preferred embodiment the reaction mixture includes a photo-reactive monomer comprising a photo reactive group and a polymerizable group; a second monomer, which is more preferably a mixture of monomers, which are acrylate based; a multi-functional crosslinking agent, preferably 1,6 hexanediol diacrylate (HDODA); an initiator, preferably a free radical initiator; and a fifth, optional, component which is a modifying polymer. The mixture of the second monomer, crosslinking agent, and initiator comprise the base polymer matrix into which the photo-reactive monomer is incorporated.

Abstract: Provided is a method for purifying a resin for photolithography wherein, from an insufficiently purified resin (also referred to as “crude resin”), low molecular weight impurities such as an unreacted monomer and a polymerization initiator, which cause a development defect of a resist pattern or deterioration of the storage stability of the resin for photolithography can be removed more effectively. A method for purifying a resin for photolithography according to the present invention is characterized by comprising: an operation (a): an operation wherein a slurry in which a resin is dispersed in a solution containing a good solvent and a poor solvent is stirred; and then, an operation (b): an operation wherein, to said slurry, a poor solvent is added to lower the ratio of the good solvent to the poor solvent, and then, the resin is separated from the solution.

Abstract: The present invention relates to an innovative (meth)acrylic reactive resin which cures with low odour or odourlessly. The present invention relates more particularly to reactive resins comprising high-boiling, reactive (meth)acrylic monomers from the group of the polar, cyclically substituted esters of (meth)acrylic acid, more particularly glycerol acetal, ketal or carbonate methacrylates. These new components are used as substitutes for MMA, which represents the major part of the odour nuisance in the existing, prior-art reactive resin systems. Using these new components it is possible to obtain resin formulations which have glass transition temperatures similar to, and properties comparable with, MMA-based resins. The innovative reactive resins are able in addition to exhibit more rapid curing than prior-art MMA-based systems. Reactive resins for the purposes of the invention are reactive monomer mixtures or mixtures of monomers and polymers that when used as a 2-component system can be readily cured.

Abstract: An object of the present invention is to enable simpler operation in real time and culture while removing unnecessary cells from cultured cells for purification in analyzing, fractionating, and culturing the cells alive and to analyze and fractionate desired cells from the cultured cells to increase the purity, recovery rate, and viability of the cells. The present invention employs a cell-adhesive photocontrollable base material, wherein light irradiation causes the bond dissociation of a photolabile group comprising a coumarinylmethyl skeleton to produce the separation of a cell-adhesive material to leave a non-cell-adhesive material. As a result, cell images can be detected and analyzed to obtain the positional information of desired cells. Based on the positional information thus obtained, the cells can be analyzed and fractionated alive.

Abstract: The present invention provides a phosphonate-containing polymer and use thereof and a phosphonate-containing polymer viscosity reducer for drilling fluid. The phosphonate-containing polymer comprises structural units expressed by formula (1), structural units expressed by formula (2), and structural units expressed by formula (3) and/or structural units expressed by formula (4), wherein, the ratio of the mole number of the structural units expressed by formula (1), mole number of the structural units expressed by formula (2), and total mole number of the structural units expressed by formula (3) and structural units expressed by formula (4) is 10-85:10-75:5-55. The phosphonate-containing polymer still has outstanding viscosity reducing effect after high-temperature aging when it is applied in brine drilling fluids and high-density drilling fluids.

Abstract: Disclosed is a curable silicone composition for preparing release layers and pressure sensitive adhesives, and to substrates bearing a layer of the cured composition. More specifically, this invention relates to a silicone composition, curable in the absence of both catalysts and actinic radiation comprising a cyclic anhydride copolymer and an amine-terminated polysiloxane.

Abstract: A positive resist composition comprises a polymer having a carboxyl group substituted with an acid labile group having formula (1) wherein R1 and R2 are alkyl or alkenyl, R3 and R4 are a single bond, methylene, ethylene or propylene, R5 and R6 are hydrogen or alkyl. The composition has a high dissolution contrast, high resolution, and suppressed acid diffusion rate, and forms a pattern of good profile and minimal edge roughness.

Abstract: The invention relates to cross-linkable vinylester-copolymers obtained by means of radically initiated polymerisation of a) one or more vinyl esters and b) one or more ethylenically unsaturated, epoxy functional monomers, and by a subsequent reaction that is analogous to polymerisation of the thus obtained base polymers with one or more ethylenically unsaturated acids g), such that at least one ethylenically unsaturated, polymerizable group is introduced into each base polymer. Said invention is characterised in that the cross-linkable vinylester-copolymers have molecular weights of Mn of ?6.500 g/mol.

Abstract: An aspect of the present invention relates to a radiation-curable vinyl chloride copolymer, which comprises a structural unit denoted by general formula (1): wherein, in general formula (1), R1 denotes a hydrogen atom or a methyl group, and L1 denotes a divalent linking group denoted by formula (2), formula (3), or general formula (4): wherein, in general formula (4), R41 denotes a hydrogen atom or a methyl group.

Abstract: The present invention relates to a polymer obtained from the polymerization of: (i) at least one monomer of formula (I) (CH2?CR1)CO—K (1) wherein: K represents O—Z or NH—Z, Z representing (CR2R3)m-CH3, (CH2—CH2—O)m-H, (CH2—CH2—O)m-CH3, (CH2)m-NR4R5 with m representing an integer from 1 to 30; R1, R2, R3, R4 and R5 independently represent H or a C1-C6 alkyl; (ii) at least between 0.1 and 50% mol, advantageously between 1 and 30% mol, more advantageously between 1 and 20 mol % of a cyclic monomer having a exomethylene group of formula (II) wherein: R6, R7, R8 and R9 represent independently H or a C5-C7 aryl group or R6 and R9 are absent and R7 and R8 form together with the carbon atom on which they are bonded a C5-C7 aryl group; i and j represent independently an integer chosen between 0 and 2; X represents either O or X is not present and in this latter case, CR6R7 and CR8R9 are linked via a single bond C—C and (iii) at least one bio-resorbable block copolymer cross-linker.

Abstract: Polymers include a unit comprising a particular acetal moiety and a unit comprising a lactone moiety, photoresist compositions containing such a polymer, substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: A resist composition, a method of forming a resist pattern using the resist composition, a novel polymeric compound and a compound useful as a monomer for the polymeric compound, the resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, the base component (A) containing a resin component (A0) including a structural unit (a0) represented by general formula (a0) shown below in which A represents a divalent linking group; and R1 represents a hydrogen atom or a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent.

Abstract: The invention relates to a polymer comprising the following units: and the side chains comprising R2 groups, to its preparation methods and to its uses as a thinner in hydraulic compositions.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: Embodiments in accordance with the present invention relate generally to the use of polycycloolefinic polymers as a structure defining material in organic electronic devices, and more specifically to separators, insulating structures or bank structures of such devices and to organic electronic devices comprising such structures, to processes for preparing such structures and to organic electronic devices encompassing such structures.

Abstract: Embolic compositions comprising macromers having a backbone comprising a polymeric backbone comprising units with a 1,2-diol or 1,3-diol structure, such as polyvinyl alcohol, and pendant chains bearing crosslinkable groups and, optionally, other modifiers. When crosslinked, the macromers form hydrogels having many properties advantageous for use as embolic agents to block and fill lumens and spaces. The embolic compositions can be used as liquid embolic agents and crosslinked in situ or as preformed embolic articles, such as microspheres.