Abstract: The present invention provides a method of making a methylene malonate monomer that includes the steps of reacting a malonic acid ester with a source of formaldehyde optionally in the presence of an acidic or basic catalyst and optionally in the presence of an acidic or non-acidic solvent to form reaction complex. The reaction is optionally performed in the presence of or contacted with an energy transfer means such as a heat transfer agent, a heat transfer surface, a source of radiation or a laser such that reaction complex is substantially vaporized to produce a vapor phase comprising methylene malonate monomer which may be isolated. The present invention further provides methylene malonate monomers prepared by the method of the invention, as well as compositions and products formed from the methylene malonate monomers, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g.

Abstract: A photochromic cured product exhibiting favorable photochromic properties such as a high color density and a large fading rate, and excellent base member properties such as a high hardness, a high heat resistance and a high impact resistance. A curable composition contains a polymerizable monomer which exhibits the L-scale Rockwell hardness of not larger than 40, a bifunctional polymerizable monomer which exhibits the L-scale Rockwell hardness of not smaller than 60, a polyfunctional polymerizable monomer which exhibits the L-scale Rockwell hardness of not smaller than 60, and a photochromic compound.

Abstract: A polymer comprising a conducting or semiconducting segment coupled to a polymer segment having an insulating polymer backbone, the polymer further comprising a RAFT functional group coupled to the polymer segment, wherein there is no RAFT functional group in between the conducting or semiconducting segment and the polymer segment.

Abstract: The invention relates to an intraocular lens comprising at least one pharmaceutically-acceptable photochromic polymer that enables all or part of the intraocular lens to change colour reversibly when exposed to light.

Abstract: Described herein are compounds and processes that can be used to prepare polymer-based films, particles, gels and related compositions, and processes for delivery of agents, and other uses.

Abstract: A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.

Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A?) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof).

Abstract: A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.

Abstract: A polymer which has a radical polymerizable unsaturated group in a side chain and can be made a molecular design suitable for the purpose; a curable resin composition containing the polymer, which provides a cured product having high surface hardness after curing and hardly suffering from scratch; the cured product; and an article obtained by laminating the cured product are provided. The polymer (A) of the present invention is obtained by polymerizing, at least, a vinyl monomer represented by the following general formula (1) and a cyclic ether compound represented by the following general formula (2). The polymer (A) of the present invention is preferably obtained by polymerization of 1 wt % or more and 99.9 wt % or less of a vinyl monomer represented by the general formula (1), 0.1 wt % or more and 99 wt % or less of a cyclic ether compound represented by the general formula (2) and 0 wt % or more and 98.9 wt % or less of the other cationic polymerizable monomer.

Abstract: The present invention relates to a polymerization reactor for continuous polymerization, the reactor being constructed in two stages and comprising a prepolymerization stage which is configured as a stirred vessel or as a loop-type bubble column and also a main polymerization stage which is configured as a tubular reactor. Furthermore, the present invention relates to a method for the production of biodegradable polyester, in particular polylactide, the reactor according to the invention being used. Likewise, the invention relates to a polymerization device which comprises further components in addition to the polymerization reactor.

Abstract: A polymer includes a repeating unit shown by a general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents —X1Z1X2— which is an atomic group which forms a cyclic structure including a heteroatom together with Y. Z1 represents —O—, —S—, —CO—, —COO—, —SO—, or —SO2—. Each of X1 and X2 individually represents a single bond, a methylene group, or an alkylene group having 2 to 25 carbon atoms. Each of X1 and X2 is unsubstituted or substituted with a substituent, and optionally a carbon atom included in X1 and a carbon atom included in X2 are bonded via a divalent group.

Abstract: A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.

Abstract: Provided is a radically polymerizable resin which has a low viscosity, has excellent workability, and is rapidly cured upon application of heat and/or light to form a cured product having excellent flexibility and thermal stability. The radically polymerizable resin composition is obtained by cationic polymerization of an oxetane-ring-containing (meth)acrylic ester compound represented by following Formula (1) alone or in combination with another cationically polymerizable compound. In Formula (1), R1 represents hydrogen atom or methyl group; R2 represents hydrogen atom or an alkyl group; and “A” represents a linear or branched chain alkylene group having 4 to 20 carbon atoms.

Abstract: Provided are 1) a polymer which is excellent in a reactivity to acid and a heat stability and which is less swollen in developing, 2) a compound shown below which is a raw material for the above polymer and 3) a photoresist composition which contains the above polymer and which is improved in LWR and excellent in a heat resistance. (wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or the like; R2 to R10 each represent independently a hydrogen atom, a linear alkyl group, a branched alkyl group or the like; and A and B each represent independently an oxygen atom or a sulfur atom).

Abstract: Norbornene monomers with epoxy groups and polymer materials thereof are disclosed. The Norbornene monomers with epoxy groups are prepared by Diels-Alder reaction. The Norbornene monomers with epoxy groups are highly active for ring-opening-metathesis polymerization (ROMP), and the molecular weight and PDI value of the obtained polymers are controllable.

Abstract: A luminescent polymer comprising a triarylene repeat unit which comprises a triarylene of general formula (I) which is substituted or unsubstituted and an arylene repeat unit -[-Ar-]- that is different from the triarylene repeat unit wherein X, Y, and Z are each independently O, S, CR2, SiR2 or NR and each R is independently alkyl, aryl or H.

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract: The invention provide a new lens curing method for making hydrogel contact lenses. The new lens curing method is based on actinically-induced step-growth polymerization. The invention also provides hydrogel contact lenses prepared from the method of the invention and fluid compositions for making hydrogel contact lenses based on the new lens curing method. In addition, the invention provide prepolymers capable of undergoing actinically-induced step-growth polymerization to form hydrogel contact lenses.

Abstract: The present invention relates to an optical film, comprising a copolymer that comprises (a) a (meth)acrylic monomer, (b) an aromatic vinyl monomer, (c) at least one monomer of an acid anhydride monomer and an unsaturated organic acid monomer, and (d) a vinylcyan monomer, a protection film for a polarizer, a polarizing plate fabricated therefrom, and a display device employing the same.

Abstract: An ink-jet ink is provided. The ink-jet ink includes a compound of formula (1) to form a cured film with high-flame retardancy.

Abstract: The object of the present invention is to provide a radiation-sensitive colored composition which can supress the generation of the contamination of the device. A radiation-sensitive colored composition including: (A) a dye containing of from 10 ppm to 1000 ppm of a halogen ion; (B) a polymerizable compound; and (C) a solvent.

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract: A method of making a foamable polystyrene composition includes combining a styrenic monomer and a co-monomer containing a polar functional group to obtain a mixture, subjecting the mixture to polymerization to obtain a styrenic co-polymer, and combining the styrenic co-polymer with a blowing agent in a foaming process to obtain foamed articles.

Abstract: Polymers and copolymers of polymerizable fluorescent compounds of 7-hydroxycoumarin such as Ethyl-2-methacrylate Umbelliferone-4-acetate are provided. In addition, a sensor comprising this polymer notably for detecting and/or assaying nitrated and organophosphorus compounds, explosives, and toxic compounds is provided.

Abstract: A polymer includes a repeating unit shown by a general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents —X1Z1X2— which is an atomic group which forms a cyclic structure including a heteroatom together with Y. Z1 represents —O—, —S—, —CO—, —COO—, —SO—, or —SO2—. Each of X1 and X2 individually represents a single bond, a methylene group, or an alkylene group having 2 to 25 carbon atoms. Each of X1 and X2 is unsubstituted or substituted with a substituent, and optionally a carbon atom included in X1 and a carbon atom included in X2 are bonded via a divalent group.

Abstract: The present invention provides a copolymer which can prevent problems associated with immersion lithography (including occurrence of a pattern defect such as water mark, and variation in sensitivity or abnormal patterning due to elution of an additive such as a radiation-sensitive acid-generator) and which provides surface characteristics suitable for immersion lithography, and a composition containing the copolymer.

Abstract: Disclosed is an ultraviolet-curable resin composition for multilayer optical discs, which contains (A) dioxane glycol di(meth)acrylate and/or tricyclodecane dimethylol di(meth)acrylate, and (B) a photopolymerization initiator.

Abstract: A method for obtaining a star polymer having a controlled ratio of a weight average molecular weight of the star polymer to a number average molecular weight of the star polymer, containing the steps of anionically polymerizing a (meth)acrylic ester having an alicyclic skeleton and a lactone ring in the presence of an anionic polymerization initiator to synthesize an arm polymer, reacting the arm polymer with a polyfunctional coupling agent, and reacting with an anionic polymerizable monomer.

Abstract: The invention relates to novel ethylene copolymers comprising 10-60% polyethylenglycol (meth)acrylate monomers and 40-90% substantially cationic monomer. Compositions, in particular cosmetic or pharmaceutical compositions, containing the inventive copolymers and a cosmetic treatment method using said copolymers are also disclosed.

Abstract: Provided are a novel photopolymerizable monomer having at least one unsaturated double bond and epoxide, and a photocurable composition comprising the photopolymerizable monomer and an initiator, which is polymerizable with good efficiency using light and/or heat, provides reduced shrinkage, and has superior mechanical strength including adhesion and transparency.

Abstract: A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.

Abstract: Disclosed therein are a photoreactive polymer, and an alignment layer comprising the same that exhibit excellences in alignment rate and alignment stability. The photoreactive polymer comprises a cyclic olefin-based repeating unit with at least one photoreactive substituent, and the maximum absolute value of a variation in dichloric ratio per unit UV dose as given by d(dichloric ratio)/d(mJ/cm2) upon exposure to a polarized UV radiation having a wavelength of 150 to 450 nm at a total exposure dose of 20 mJ/cm2 or less is at least 0.003.

Abstract: Disclosed is a cationically polymerizable resin composition which includes an oxetane-ring-containing vinyl ether compound (A) and/or an alicyclic-epoxy-containing vinyl ether compound (B); and an oligomer or polymer (C) having a molecular weight of 500 or more, being liquid at 0° C., and containing at least one of structures represented by following Formulae (1a) to (1f), wherein Rx represents hydrogen atom or methyl group; R1 to R3 each independently represent a hydrocarbon group having 1 to 5 carbon atoms; “a” is an integer of from 0 to 5; and “b” is 1 or 2. This cationically polymerizable resin composition has a low viscosity, is easy to work, cures extremely rapidly upon irradiation with light, and can give a cured object excellent in flexibility, thermal stability, and bendability after heat treatment.

Abstract: Oxymethylene copolymers having a high proportion of terminal alkyl ether groups and having terminal hydroxyalkylene groups are described. These polymers are distinguished by high thermal stability and high hot water resistance.

Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.

Abstract: The present application relates to a process for the manufacture of copolymers of ethylene and of at least one vinyl ester, comprising the following steps: a) fermentation of renewable starting materials so as to produce at least one alcohol comprising ethanol; b) dehydration of the alcohol obtained so as to produce at least one alkene comprising ethylene and, optionally, purification of the alkene so as to obtain ethylene, c) copolymerization of the ethylene with at least one vinyl ester, d) isolation of the copolymer obtained. The application also relates to the copolymers of ethylene and of at least one vinyl ester in which the ethylene is at least partly obtained from renewable starting materials, and to uses thereof.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: The invention relates to polymers, such as aliphatic polyesters, with grafted zwitterions. More particularly, the invention relates to polyester-graft-phosphorylcholine polymers prepared by ring-opening polymerization and click chemistry, compositions and products comprising same, and related methods and uses, for example, in drug delivery.

Abstract: An acrylic copolymer with high heat-resistance is provided. The acrylic copolymer includes repeat units of a monomer of Formula (1) and repeat units of a methacrylic monomer derivative: wherein x is 1-3 and y is 0-3. The acrylic copolymer possesses high heat-resistance and low water absorptivity. The invention also provides a method for preparing the acrylic copolymer.

Abstract: Disclosed is a method for producing a polymer through living polymerization, comprising forming an oligomer having a polymerization active end, which is an oligomer higher than an average 1.0-mer and lower than an average 4.0-mer or an average 4.0-mer, and polymerizing using the oligomer having a polymerization active end as an initiating species, wherein the acrylic acid-based polymer comprising a repeating unit derived from a poly(?-lower alkyl)acrylate, and a repeating unit derived from an (?-lower alkyl)acrylic ester represented by formula (I) wherein R1 represents a hydrogen atom or a lower alkyl group, and R2 represents an organic group having a polar group in an arm portion.

Abstract: A positive photosensitive composition ensuring wide exposure latitude and reduced line edge roughness not only in normal exposure (dry exposure) but also in immersion exposure, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition are provided, which are a positive photosensitive composition comprising (A) a resin having a specific lactone structure in the side chain and being capable of increasing the solubility in an alkali developer by the action of an acid and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition.

Abstract: To provide an amorphous fluorinated polymer which is soluble in a fluorinated solvent having a boiling point of at most 70° C., and a fluorinated polymer composition containing it. An amorphous fluorinated polymer characterized by having a fluorine content of at least 50 mass % and an intrinsic viscosity of at least 0.03 g/dL and less than 0.05 dL/g as measured in perfluoro(2-butyltetrahydrofuran) at 30° C.

Abstract: Disclosed are polymer-based dielectric compositions (e.g., formulations) and materials (e.g. films) and associated devices. The polymers generally include photocrosslinkable pendant groups; for example, the polymers can include one or more coumarin-containing pendant groups.

Abstract: The present invention relates to a norbornene polymer that comprises a norbornene monomer having a photoreactive functional group, and a method of manufacturing the same. The norbornene polymer comprises at least 50 mol % of exo isomers among the norbornene monomers having the photoreactive functional group. Since the norbornene polymer according to the present invention comprises at least 50 mol % of exo isomers among the norbornene monomers having the photoreactive functional group, a molecular weight is significantly increased while the yield is not reduced during the manufacturing of the polymer. In views of the three dimensional structure, stability is ensured because the polymer has a planar structure in which the photoreactive groups between the molecules are close to each other. Therefore, the distance between the photoreactive groups is reduced, thus increasing the photoreaction rate.

Abstract: There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the

Abstract: A (meth)acrylate compound having an aromatic acid-labile group, the (meth)acrylate compound being represented by the following Formula 1: In Formula I, R1 is hydrogen or methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, R3 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl, or a substituted or unsubstituted aryl having from two to four fused aromatic rings, and carbon CAR is bonded directly to an aromatic ring of AR.

Abstract: The present invention provides polymers resulting from polymerization of at least one reactive vinyl monomer moiety and a multifunctional N-vinylformamide crosslinking moiety; polymers resulting from polymerization of at least one reactive vinyl monomer moiety and a hybrid N-vinylformamide crosslinking moiety having at least one N-vinylformamide functionality and at least one other reactive vinyl functionality; polymers resulting from polymerization of at least one hybrid reactive N-vinylformamide monomer moiety having one N-vinylformamide functionality and at least one other reactive non-vinyl functionality and a multifunctional N-vinylformamide crosslinking moiety; and polymers resulting from polymerization of at least one hybrid reactive N-vinylformamide monomer moiety having one N-vinylformamide functionality and at least one other reactive non-vinyl functionality and a hybrid N-vinylformamide crosslinking moiety having at least one N-vinylformamide functionality and at least one other reactive vinyl func

Abstract: The invention relates to copolymers that can be obtained by the polymerization of monomers (A), (B), (C) and (D), where (A) is a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4 alkylene different from A, R is hydrogen or methyl, m is a number between 1 and 500, and n is a number between 1 and 500, the sum of m+n being equal to between 2 and 1000; (B) is a monomer of formula (II) wherein D is C3 alkylene, R is hydrogen or methyl, and o is a number between 2 and 500; (C) is an ethylenically unsaturated monomer containing an aromatic group; and (D) is an ethylenically unsaturated monomer containing an alkyl radical.

Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.

Abstract: To provide a copolymer for semiconductor lithography employed for forming a resist film as well as thin films such as an anti-reflection film, a gap-filling film, a top coating film, etc. which are formed on or under a resist film, these films being employed in semiconductor lithography, wherein the copolymer has excellent solubility in a solution of a thin film-forming composition and prevents generation of microparticles (e.g., microgel) and pattern defects, and to provide a method for producing the copolymer reliably on an industrial scale.