5-membered Heterocyclic Ring Compound Contains At Least One Oxygen Atom Patents (Class 526/270)
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Publication number: 20110045405Abstract: Disclosed are a (meth)acrylate compound, a photosensitive polymer, and a resist composition, and the (meth)acrylate compound includes a lactone-group-containing (meth)acrylate compound represented by the following Chemical Formula 1.Type: ApplicationFiled: August 17, 2010Publication date: February 24, 2011Inventors: Sung-Jae Lee, Tae-Ho Kim, Jun-Suk Kim, Jin-Young Lee, Kang Ryu, Sang-Jun Choi
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Publication number: 20110046332Abstract: The invention relates to a hydrogel which is a copolymer formed from a polymerizable monomer mixture which contains a) 10-65 mol % of at least one hydrophobic vinyl monomer of the formula I in which R1 is hydrogen or methyl, p is an integer from 1 to 8, whose hydroxyl groups are present in protected form, b) 25-70 mol % of at least one silicone-containing (meth)acrylate, vinyl carbonate or vinyl carbamate monomer, c) 0-25 mol % of at least one hydrophilic vinyl monomer and d) 0-10 mol % of at least one crosslinker, based on the total amount of monomers a) to c), and where the hydroxyl groups of the segments formed by the monomers a) in the hydrogel are present in protected form or in free form. The hydrogel can be used to produce contact lenses or intraocular lenses.Type: ApplicationFiled: April 23, 2009Publication date: February 24, 2011Applicant: Evonik Roehm GmbHInventors: Christine Maria Breiner, Marianne Omeis
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Patent number: 7893190Abstract: Disclosed herein are an alternating copolymer of phenylene vinylene and oligoarylene vinylene, a preparation method thereof, and an organic thin film transistor including the same. The organic thin film transistor maintains low off-state leakage current and realizes a high on/off current ratio and high charge mobility because the organic active layer thereof is formed of an alternating copolymer of phenylene vinylene and oligoarylene vinylene.Type: GrantFiled: April 18, 2008Date of Patent: February 22, 2011Assignee: Samsung Electronics Co., Inc.Inventors: Jeong Il Park, Kook Min Han, Sang Yoon Lee, Eun Jeong Jeong
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Publication number: 20110039210Abstract: Provided are new resins that comprise lactone units and photoresist compositions that comprise such resins.Type: ApplicationFiled: May 18, 2010Publication date: February 17, 2011Applicant: Rohm and Haas Electronic Materials LLCInventors: Cheng-Bai Xu, Anthony Zampini
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Publication number: 20110028667Abstract: The invention relates to a copolymer, which includes 20 to 95 percent by weight, based on the total weight of the copolymer, of structural units derived from at least one hydrophilic monomer, and 5 to 80 percent by weight, based on the total weight of the copolymer, of structural units derived from at least one monomer according to the general formula I wherein R1, R2 and R3 each independently of each other denote hydrogen or alkyl-, Y: denotes O or NR4 with R4 selected from hydrogen or alkyl-, X: denotes O, S, SO or SO2, S denotes a structural unit selected from CHR5 or (CHR5CHR5O)iCH2, wherein all of the R5 each independently of each other denote hydrogen or alkyl-, n and i independently of each other denote an integer between 1 and 10 and m denotes an integer between 2 and 6, and wherein the copolymer has a water content from 1 to 59 percent by weight based on the total weight of the copolymer. Furthermore, the invention relates to an ophthalmologic composition.Type: ApplicationFiled: December 5, 2008Publication date: February 3, 2011Inventors: Helmut Ritter, Daniel Schmitz, Juergen Nachbaur
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Publication number: 20110014566Abstract: A salt represented by the formula (I-Pa): wherein Xpa represents a single bond or a C1-C4 alkylene group, Rpa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Ypa represents a polymerizable group, and Zpa+ represents an organic cation.Type: ApplicationFiled: July 9, 2010Publication date: January 20, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji Ichikawa, Masako Sugihara, Yuko Yamashita
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Publication number: 20110008727Abstract: The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.Type: ApplicationFiled: October 16, 2008Publication date: January 13, 2011Applicant: International Business Machines CorporationInventors: Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong
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Publication number: 20110009586Abstract: A polymer which has a radical polymerizable unsaturated group in a side chain and can be made a molecular design suitable for the purpose; a curable resin composition containing the polymer, which provides a cured product having high surface hardness after curing and hardly suffering from scratch; the cured product; and an article obtained by laminating the cured product are provided. The polymer (A) of the present invention is obtained by polymerizing, at least, a vinyl monomer represented by the following general formula (1) and a cyclic ether compound represented by the following general formula (2). The polymer (A) of the present invention is preferably obtained by polymerization of 1 wt % or more and 99.9 wt % or less of a vinyl monomer represented by the general formula (1), 0.1 wt % or more and 99 wt % or less of a cyclic ether compound represented by the general formula (2) and 0 wt % or more and 98.9 wt % or less of the other cationic polymerizable monomer.Type: ApplicationFiled: March 4, 2009Publication date: January 13, 2011Applicant: Nippon Shokubai Co., Ltd.Inventors: Yasuhiro Matsuda, Osamu Konosu
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Patent number: 7867690Abstract: (1) A polymer compound for photoresist compositions which is high in storage stability and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided; and (3) a photoresist composition with improved LWR containing the subject polymer compound are further provided. In detail, [1] a tertiary alcohol derivative represented by the following general formula (1) is provided. (In the formula, wherein R1 represents a linear alkyl group having from 1 to 6 carbon atoms, a branched alkyl group having from 3 to 6 carbon atoms or a cyclic alkyl group having from 3 to 6 carbon atoms; R2 represents a hydrogen atom or a methyl group; W represents a linear alkylene group having from 1 to 10 carbon atoms, a branched alkylene group having from 3 to 10 carbon atoms or a cyclic alkylene group having from 3 to 10 carbon atoms; n represents 0 or 1; and p represents 1 or 2.Type: GrantFiled: February 16, 2007Date of Patent: January 11, 2011Assignee: Kuraray Co., Ltd.Inventors: Osamu Nakayama, Ichihiro Aratani
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Patent number: 7862867Abstract: Disclosed is a bifunctional polymerizable compound represented by the formula [1]. Also disclosed is a polymerizable liquid crystal composition comprising at least one bifunctional polymerizable compound represented by the formula [1] and a polymerizable liquid crystal compound. The bifunctional polymerizable compound has a high polymerizability. When added to a polymerizable liquid crystal compound to prepare a polymerizable liquid crystal composition, the bifunctional polymerizable compound enables to remarkably improve the thermal stability of a polymer produced from the composition. The polymerizable liquid crystal composition containing the bifunctional polymerizable compound has a low crystallization temperature and shows a stable liquid-crystallinity under ordinary environment wherein X1, X2 and X3 independently represent a single bond or a benzene ring; Y represents —O— or a single bond; M represents a lactone ring or an acrylate group; and n represents an integer of 4 to 10.Type: GrantFiled: October 2, 2007Date of Patent: January 4, 2011Assignee: Nissan Chemical Industries, Ltd.Inventor: Daniel Antonio Sahade
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Publication number: 20100323296Abstract: A resin comprises a structural unit derived from a compound represented by the formula (aa) wherein T represents a C4 to C36 alicyclic hydrocarbon group, the hydrogen atom contained in the alicyclic hydrocarbon group may be replaced by a halogen atom, a hydroxyl group, a C1 to C12 alkyl group optionally substituted with a halogen atom or a hydroxyl group, a C1 to C12 alkoxyl group, a C6 to C12 aryl group, a C7 to C12 aralkyl group, a glycidyloxy group, a C2 to C4 acyl group, an alkoxycarbonyl group, an alkanoyloxyalkyl group or a cyano group, and the —CH2— contained in the alicyclic hydrocarbon group is replaced by at least one —SO2— and furthermore may be replaced by —CO—, —O—, —S—, —SO2— or —N(Rc)—; Rc represents a hydrogen atom or a C1 to C6 alkyl group; R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group that may optionally has halogen atoms; and Z1 represents an optionally substituted C1 to C17 saturated hydrocarbon group, and the —CH2— contained in the saturated hydrocarbon grouType: ApplicationFiled: June 22, 2010Publication date: December 23, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji Ichikawa, Yusuke Fuji, Satoshi Yamaguchi
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Publication number: 20100324245Abstract: In order to improve a resist pattern shape in a semiconductor lithography process, which is a factor largely affecting on a processing precision, an integration degree and yield, a copolymer for semiconductor lithography where a composition of a hydroxyl group-containing repeating unit in a low molecular weight region is controlled, and a method of producing the same are provided. According to the invention, in a copolymer for semiconductor lithography, which is obtained by copolymerizing a monomer having a hydroxyl group and a monomer having no hydroxyl group, when a copolymer of which composition of a hydroxyl group-containing repeating unit is controlled is used, the object can be achieved.Type: ApplicationFiled: August 31, 2010Publication date: December 23, 2010Applicant: MARUZEN PETROCHEMICAL CO., LTD.Inventors: Takanori YAMAGISHI, Takayoshi Okada, Satoshi Yamaguchi, Kiyomi Miki
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Publication number: 20100316954Abstract: Disclosed is a novel monomer having a lactone skeleton, which is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or water solubility after hydrolysis. The monomer having a lactone skeleton is represented by following Formula (1), wherein Ra represents a hydrogen atom, halogen atom, or substituted or unsubstituted alkyl group having 1 to 6 carbon atoms; R1 represents a group having a lactone skeleton; and Y represents a bivalent organic group having 1 to 6 carbon atoms.Type: ApplicationFiled: January 21, 2009Publication date: December 16, 2010Inventors: Hiroshi Koyama, Mari Sumida, Hiroki Tanaka
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Publication number: 20100310987Abstract: A radiation-sensitive composition includes (A) an acid-dissociable group-containing polymer, and (B) a radiation-sensitive acid generator. The acid-dissociable group-containing polymer (A) includes a polymer that includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y represents a carbon atom, and X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.Type: ApplicationFiled: July 12, 2010Publication date: December 9, 2010Applicant: JSR CorporationInventors: Ken MARUYAMA, Toshiyuki Kai
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Publication number: 20100297555Abstract: Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein Ra represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms. The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.Type: ApplicationFiled: February 3, 2009Publication date: November 25, 2010Inventors: Hiroshi Koyama, Kyuhei Kitao, Akira Eguchi
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Patent number: 7829634Abstract: The invention relates to scorch prevention and, more specifically, to a composition which comprises a nitroxide and at least one organic peroxide and which can be used to delay scorching prior to crosslinking of thermoplastic compositions and/or elastomers. The invention also relates to a crosslinkable composition and to a crosslinking method.Type: GrantFiled: September 16, 2005Date of Patent: November 9, 2010Assignee: Arkema FranceInventors: Fabien Debaud, Jacques Kervennal, Alfredo Defrancisci, Olivier Guerret
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Patent number: 7816471Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: December 23, 2009Date of Patent: October 19, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20100248136Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises a hydrophobic resin (HR) containing a fluorine atom, wherein the hydrophobic resin (HR) comprises any of repeating units (a) of general formula (I) or (II) below:Type: ApplicationFiled: March 30, 2010Publication date: September 30, 2010Applicant: FUJIFILM CorporationInventors: Shinichi SUGIYAMA, Shinji Tarutani, Takayuki Kato, Kaoru Iwato, Hiroshi Saegusa
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Publication number: 20100248149Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.Type: ApplicationFiled: March 23, 2010Publication date: September 30, 2010Applicant: FUJIFILM CORPORATIONInventors: Tomotaka Tsuchimura, Hidenori Takahashi, Takayuki Ito, Takeshi Inasaki, Shohei Kataoka
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Publication number: 20100240852Abstract: Heteroatom-containing polymers such as polyketals, and methods of making and using such heteroatom-containing polymers are disclosed herein. The heteroatom-containing polymers can be useful for applications including, for example, medical devices and pharmaceutical compositions. In a preferred embodiment, the heteroatom-containing polymers are polyketals that are biodegradable.Type: ApplicationFiled: March 22, 2010Publication date: September 23, 2010Applicant: Medtronic, Inc.Inventors: Lian Leon Luo, Michael Eric Benz
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Publication number: 20100233620Abstract: A resist copolymer includes a repeating unit having the following Chemical Formula 1, a repeating unit having the following Chemical Formula 2, and a repeating unit having the following Chemical Formula 3:Type: ApplicationFiled: May 25, 2010Publication date: September 16, 2010Inventors: Sang-Jun Choi, Youn-Jin Cho, Seung-Wook Shin
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Patent number: 7790057Abstract: The present invention relates to electroluminescent polymers which contain structural units of the formula (1) and to the use thereof. The polymers according to the invention exhibit improved efficiency and a longer lifetime, in particular on use in polymeric organic light-emitting diodes.Type: GrantFiled: June 22, 2007Date of Patent: September 7, 2010Assignee: Merck Patent GmbHInventors: Arne Büsing, Holger Heil, Aurélie Ludemann, Niels Schulte
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Publication number: 20100210801Abstract: Disclosed is a copolymer which includes at least monomer units corresponding to a vinyl monomer A containing a blocked isocyanate group and represented by following Formula (1); and monomer units corresponding to a vinyl monomer B containing a cyclic ether group having 3 to 5 members. The copolymer may further include monomer units corresponding to (meth)acrylic alkyl esters, aromatic vinyl compounds, hydroxyl-containing monomers, and/or carboxyl-containing monomers. In the formula, R1 represents hydrogen atom or methyl group; R2 represents a bivalent saturated aliphatic hydrocarbon group having 1 to 8 carbon atoms; and R3 represents a residue of isocyanate-blocking agent R3H. This copolymer gives a cured article that excels not only in adhesion to substrates but also in resistance to chemicals, especially to alkalis.Type: ApplicationFiled: August 21, 2008Publication date: August 19, 2010Inventors: Toshihiko Nijukken, Yasunobu Nakagawa
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Patent number: 7763694Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).Type: GrantFiled: December 4, 2009Date of Patent: July 27, 2010Assignee: NOF CorporationInventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
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Publication number: 20100167178Abstract: Compounds of the formula (I), (II) or (III), wherein R1 is for example C1-C18alkylsulfonyl, C1-C10haloalkylsulfonyl, camphorylsulfonyl, phenyl-C1-C3alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R?1 is for example phenylenedisulfonyl, R2 is for example CN, C1-C10haloalkyl or C1-C10haloalkyl which is substituted by (IV); Ar1 is for example phenyl optionally substituted by a group of formula (IV); Ar?1 is for example phenylene which optionally is substituted by a group of formula (IV); A1, A2 and A3 independently of each other are for example hydrogen, halogen, CN, or C1-C18alkyl; D2 is for example a direct bond, O, (CO)O, (CO)S, SO2, OSO2 or C1-C18alkylene; or A3 and D2 together form C3-C30cycloalkenyl; or A2 and D2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C3-C30cycloalkyl; D3 and D4 for example independently of each other are a direct bond, O, S, C1-C18alkylene or C3-C30cycloalkylene provType: ApplicationFiled: June 15, 2007Publication date: July 1, 2010Inventors: Hitoshi Yamato, Toshikage Asakura, Yuichi Nishimae, Takeshi Iwai, Makiko Irie, Kazuhiko Nakayama
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Publication number: 20100167200Abstract: A (meth)acrylate compound having an acid-labile ester group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1 wherein, R1 is hydrogen or methyl, R2 and R3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and R4 is a linear ester or cyclic ester group.Type: ApplicationFiled: December 30, 2009Publication date: July 1, 2010Inventors: Sang-Jun Choi, Sung-Jae Lee, Seung-Jib Choi
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Patent number: 7741416Abstract: The present invention relates to colloidal photonic crystals using colloidal nanoparticles and a method for the preparation thereof, wherein by adding a viscoelastic material into a solution containing the colloidal nanoparticles when preparing the colloidal photonic crystals, a uniform volume contraction occurs due to the elasticity of the viscoelastic material even when a nonuniform volume contraction occurs while drying a dispersion medium in the colloidal solution. Thus, it is possible to prepare 2 or 3 dimensional colloidal photonic crystals of large scale with no defects in less time.Type: GrantFiled: November 6, 2006Date of Patent: June 22, 2010Assignee: LG Chem, Ltd.Inventors: Young-jun Hong, Sang-hyuk Im
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Publication number: 20100151383Abstract: A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: [Formula 1] —CH2—O-A?O—CH2—]n??(1) (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).Type: ApplicationFiled: February 17, 2010Publication date: June 17, 2010Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Toshiyuki Ogata, Syogo Matsumaru, Hideo Hada, Masaaki Yoshida
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Publication number: 20100152401Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.Type: ApplicationFiled: December 11, 2009Publication date: June 17, 2010Applicant: FUJIFILM CORPORATIONInventors: Shuji HIRANO, Kaoru IWATO, Hiroshi SAEGUSA, Yusuke IIZUKA
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Publication number: 20100130713Abstract: The present disclosure provides copolymers including a first monomer including at least one phospholipid possessing at least one vinyl group and a second monomer including a furanone possessing vinyl and/or acrylate groups. Compositions, medical devices, and coatings including such copolymers are also provided.Type: ApplicationFiled: May 9, 2008Publication date: May 27, 2010Inventor: Joshua B. Stopek
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Publication number: 20100124719Abstract: A polymer comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, X represents a linear or branched chain C1-C6 alkylene group, Z represents a group represented by the formula (Ia): wherein R2 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and m represents an integer of 0 to 15, and a structural unit represented by the formula (II): wherein R3 represents a hydrogen atom or a methyl group, R4 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.Type: ApplicationFiled: November 4, 2009Publication date: May 20, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Nobuo ANDO, Kazuhiko HASHIMOTO
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Patent number: 7718342Abstract: A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000 and a Mw/Mn of 1.5-2.5. R1, R3, R4, R7, R9, and R11 are H or CH3, Y is methylene or O, R2 is CO2R10 when Y is methylene and R2 is H or CO2R10 when Y is O, R10 is C1-C15 alkyl which may be separated by O, R5 and R6 are H or OH, R8 is a tertiary ester type acid-labile protective group, and R12 is OH-containing fluoroalkyl. A resist composition comprising the polymer has a high resolution and is improved in line edge roughness and I/G bias.Type: GrantFiled: December 27, 2006Date of Patent: May 18, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Kenji Funatsu, Tomohiro Kobayashi, Koji Hasegawa, Tsunehiro Nishi
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Publication number: 20100099042Abstract: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C2-C20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.Type: ApplicationFiled: October 16, 2009Publication date: April 22, 2010Inventors: Masaki OHASHI, Youichi OHSAWA, Takeshi KINSHO, Jun HATAKEYAMA, Selichiro TACHIBANA
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Publication number: 20100099836Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: ApplicationFiled: December 23, 2009Publication date: April 22, 2010Inventors: Hitoshi WATANABE, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20100093878Abstract: Crosslinkable fluoropolymers and crosslinked fluoropolymers prepared from select fluorinated monomers by dimerization and trimerization. Also disclosed are proton conductive membranes of these crosslinked fluoropolymers.Type: ApplicationFiled: December 29, 2008Publication date: April 15, 2010Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventors: ZHEN-YU YANG, Amy Qi Han, Mark Gerrit Roelofs, Randal L. Perry
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Publication number: 20100093846Abstract: The present disclosure provides compositions including a first component including at least one phospholipid possessing at least one vinyl group, a second component including a furanone possessing vinyl and/or acrylate groups, and a third component including a hydroxamate. Compositions, medical devices, and coatings including copolymers and blends of the foregoing components are also provided.Type: ApplicationFiled: October 5, 2009Publication date: April 15, 2010Inventors: Joshua Stopek, Ahmad Hadba
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Patent number: 7696291Abstract: A material having properties required for a chromatic aberration-free lens and excellent in moldability and impact resistance, which material is an amorphous fluoropolymer containing a carbon atom chain as a main chain and containing a fluorinated atom-bonded carbon atom as a carbon atom of the main chain, wherein vd>75, ?gF>0.50, and ??gF>0.03, where vd represents an Abbe number, ?gF represents a relative partial dispersion of a g-F line, and ??gF represents a deviation from a standard line of the relative partial dispersion of the g-F line.Type: GrantFiled: July 25, 2008Date of Patent: April 13, 2010Assignee: Asahi Glass Company, LimitedInventors: Hiromasa Yamamoto, Hideki Sato
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Publication number: 20100081080Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.Type: ApplicationFiled: February 6, 2008Publication date: April 1, 2010Inventors: Jun Iwashita, Sho Abe, Makiko Irie, Takeshi Iwai
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Publication number: 20100081779Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n—; R3: —(CH2)m—; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).Type: ApplicationFiled: December 4, 2009Publication date: April 1, 2010Applicant: NOF CorporationInventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
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Publication number: 20100081778Abstract: Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.Type: ApplicationFiled: December 1, 2009Publication date: April 1, 2010Inventors: Keizo Inoue, Takahiro Iwahama, Masamichi Nishimura, Kiyoharu Tsutsumi
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Publication number: 20100081079Abstract: Disclosed are a polymer for a chemically amplified resist represented as and a resist composition using the same. In the above Chemical formula 1, X represents vinyl ether derivatives or olefin derivatives, at least one of R1, R2, R3 and R4 is an alkyl group with 1 to 30 carbon atoms containing at least one functional group of a hydrogen atom, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitryl group (—CN), and an aldehyde group, l, m, n, o and p respectively represent repeating units, l represents a real number of 0.05 to 0.5, m and n respectively represent real numbers of 0.1 to 0.7, o and p respectively represent real numbers of 0 to 0.7, and a sum of l, m, n, o and p is 1.Type: ApplicationFiled: April 2, 2009Publication date: April 1, 2010Inventors: Hyunsang JOO, Jinho KIM, Yonghwa HONG, Changsoo LEE
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Publication number: 20100081086Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1?) containing an acid dissociable, dissolution inhibiting group within the structure thereof and including a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and A? represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom) and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group; or a polymeric compound (Al) including the structural unit (a0) and a structural unit (al) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.Type: ApplicationFiled: September 28, 2009Publication date: April 1, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tomoyuki HIRANO, Takahiro DAZAI, Daiju SHIONO, Tasuku MATSUMIYA
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Publication number: 20100075257Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.Type: ApplicationFiled: September 18, 2009Publication date: March 25, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Ichiki TAKEMOTO, Nobuo ANDO
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Patent number: 7678530Abstract: Lactone-containing compounds having formula (1) are novel wherein A1 is a polymerizable functional group having a double bond, R1 is a monovalent C1-C10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH2, O or S. They are useful as monomers to produce polymers for the formulation of radiation-sensitive resist compositions which have high transparency to radiation of up to 500 nm and exhibit good development properties. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography.Type: GrantFiled: January 4, 2007Date of Patent: March 16, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Koji Hasegawa, Satoshi Watanabe, Jun Hatakeyama, Takeshi Kinsho, Seiichiro Tachibana
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Publication number: 20100062364Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including at least one structural unit (a0) selected from the group consisting of a structural unit represented by general formula (a0-1) [R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof] and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group, and the polymeric compound (A1) containing an acid dissociable, dissolution inhibiting group within the structure thereof.Type: ApplicationFiled: August 20, 2009Publication date: March 11, 2010Inventors: Takahiro Dazai, Tomoyuki Hirano, Daiju Shiono, Tasuku Matsumiya
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Publication number: 20100044632Abstract: Disclosed is a bifunctional polymerizable compound represented by the formula [1]. Also disclosed is a polymerizable liquid crystal composition comprising at least one bifunctional polymerizable compound represented by the formula [1] and a polymerizable liquid crystal compound. The bifunctional polymerizable compound has a high polymerizability. When added to a polymerizable liquid crystal compound to prepare a polymerizable liquid crystal composition, the bifunctional polymerizable compound enables to remarkably improve the thermal stability of a polymer produced from the composition. The polymerizable liquid crystal composition containing the bifunctional polymerizable compound has a low crystallization temperature and shows a stable liquid-crystallinity under ordinary environment. wherein X1, X2 and X3 independently represent a single bond or a benzene ring; Y represents —O— or a single bond; M represents a lactone ring or an acrylate group; and n represents an integer of 4 to 10.Type: ApplicationFiled: October 2, 2007Publication date: February 25, 2010Inventor: Daniel Antonio Sahade
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Patent number: 7662897Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: January 20, 2006Date of Patent: February 16, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Publication number: 20100028701Abstract: A single- or multiple-component, free-radically curable composition having at least one free-radically polymerizable monomer of the formula (I) and at least one free-radical initiator. These compositions are suitable as adhesives or sealants and also as coverings. Both before and after curing they have a very low odour, and after curing they possess excellent mechanical qualities in tandem with effective adhesion, to various materials such as plastics, and are therefore suitable for use in areas that are closed or difficult to aerate.Type: ApplicationFiled: October 30, 2007Publication date: February 4, 2010Applicant: SIKA TECHNOLOGY AGInventors: Ria De Cooman, Steffen Maier, Peter Gimmnich
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Patent number: 7655743Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.Type: GrantFiled: June 26, 2008Date of Patent: February 2, 2010Assignee: Daicel Chemical Industries, Ltd.Inventors: Hitoshi Watanabe, Hidetaka Hayamizu, Masaaki Kishimura
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Patent number: RE41580Abstract: A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance.Type: GrantFiled: September 23, 2005Date of Patent: August 24, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Jun Hatakeyama, Osamu Watanabe