Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.

Abstract: A tire provided with a tire tread made from a rubber composition comprising (A) a random copolymer based on non-conjugated cyclic polyene comprising structural units originated from one or more &agr;-olefins (A1) and originated from one or more non-conjugated cyclic polyene (A2), the said random copolymer having a content of the structural unit(s) originated from one or more &agr;-olefins (A1) in the range of 93 to 70 mole %; a content of the structural unit originated from one or more non-conjugated cyclic polyene (A2) in the range of 7 to 30 mole %; an intrinsic viscosity [&eegr;], determined in decalin at 135° C., in the range of 0.01 to 20 dl/g; a glass transition temperature (Tg) of not higher than 40° C.; and an iodine value in the range of 50 to 150, and (B) a rubber based on diene, in a weight proportion of {the random copolymer based on non-conjugated cyclic polyene (A)} versus {the rubber based on diene (B)} in the range from 60/40 to 0.1/99.

Abstract: Low color, aromatic modified C5 hydrocarbon resins are disclosed. The resins are predominantly an aromatic modified piperylene resin. The resins are useful as tackifies in hot melt adhesives and hot melt pressure sensitive adhesives.

Abstract: This invention relates to a process to polymerize olefins comprising contacting, in a polymerization system, olefins having three or more carbon atoms with a catalyst compound, activator, optionally comonomer, and optionally diluent or solvent, at a temperature above the cloud point temperature of the polymerization system and a pressure no lower than 10 MPa below the cloud point pressure of the polymerization system, where the polymerization system comprises any comonomer present, any diluent or solvent present, the polymer product, where the olefins having three or more carbon atoms are present at 40 weight % or more.

Abstract: A method for making a fiber-reinforced composite comprises dispensing a reactive liquid into a mold. The mold comprises fibers and a single-component activator on the fibers. The reactive liquid comprises a cyclic olefin, and the mold comprises fibers and a single-component ROMP activator on the fibers. Composites formed by the method may have high fiber densities.

Abstract: The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of −10 to +10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure.

Abstract: A process for producing a copolymer of an isoolefin and at least one other comonomer comprising the step of polymerizing a reaction mixture comprising an isoolefin, a catalyst and at least one of a cycloconjugated muitiolefin and an unconjugated cyclic olefin in the presence of an activator comprising a carbo cation producing species, a silica cation producing species and mixtures thereof. The process can be practiced using a slurry polymerization approach. One of the main benefits achieved with the present invention is the conversion of the monomers over a shorter period of time and higher percent conversion than when the activator is not used.

Abstract: A reshapable hair styling composition comprising heterogeneous (meth)acrylic copolymer particles, said particles being the same or different and comprising at least one (meth)acrylic copolymer comprising: (a) units derived from at least one monomer chosen from (meth)acrylate esters of branched and straight chain alkyl alcohols, (b) units derived from at least one monomer chosen from (meth)acrylate esters of saturated and unsaturated cyclic alcohols containing 6 to 20 carbon atoms, (c) optionally units derived from at least one monomer chosen from hydrophilic monomers, and (d) optionally units derived from at least one monomer other than (a), (b), and (c) monomers, wherein said composition provides a reshapable effect.

Abstract: The instant invention relates to an epoxy/alkylation-type hydrocarbon resin alloy comprising an epoxy resin, an alkylation-type hydrocarbon resin, and a curative. The alkylation-type hydrocarbon resin is characterized as a product formed by an alkylation reaction between a cyclic diolefin and aromatic solvent. A particularly effective alkylation-type hydrocarbon resin in this invention is the alkylation resin formed by the reaction of dicyclopentadiene (DCPD) with alkylnaphthalene solvent. The alkylation-type hydrocarbon resin can be readily dissolved into various epoxy resins and easily processed into resin impregnated glass cloth prepreg for ultimate conversion into electronic laminate products. These epoxy/alkylation-type hydrocarbon resin alloys retain high Tg values with minimal increase in thermal expansion.

Abstract: The present invention relates to a white, biaxially oriented polyester film having at least a base layer, the characterizing features of which are that at least this base layer comprises a cycloolefin copolymer (COC) at a concentration of from 4 to 60% by weight, based on the base layer, where the glass transition temperature of cycloolefin copolymer (COC) is within the range from 70 to 270° C.

Abstract: An olefinic copolymer having a cyclic structure is prepared by copolymerizing a) ethylene (M1) and b) dicyclopentadiene or tricyclopentadiene (M2), and, optionally c) a cyclic olefin (M3), in the presence of a catalyst which contains a metallocene compound (A) having formula [1]: H2C(R′mCp)(R″nCp)MX2[1], wherein M is zirconium or hafnium, Cp has a cyclopentadienyl skeleton, each of R′ and R″ is a hydrocarbon group having 1 to 10 carbon atoms, each of two X's which may be the same or different from each other, is a halogen, a hydrogen, a hydrocarbon group having 1 to 20 carbon atoms, a halogenated hydrocarbon group, an alkylamino group, an alkoxy group, an aryloxy group of the formula —O—Ar—Yp, a thioalkyl group, or a thioaryl group of the formula —S—Ar—Yp; wherein Ar is an aromatic ring, Y is a halogen, a hydrogen, a hydrocarbon group having 1 to 20 carbon atoms, a halogenated hydrocarbon group, an alkoxy group, an alkylamino

Abstract: 1.

Abstract: The present invention relates to a copolymer resin for a photoresist used in far ultraviolet ray such as KrF or ArF, process for preparation thereof, and photoresist comprising the same resin. The copolymer resin according to the present invention is easily prepared by conventional radical polymerization due to the introduction of mono-methyl cis-5-norbonen-endo-2,3-dicarboxylate unit to a structure of norbornene-maleic anhydride copolymer for photoresist. The resin has high transparency at 193 nm wavelength, provides increased etching resistance and settles the problem of offensive odor occurred in the course of copolymer resin synthesis. Further, as the resin composition can be easily controlled due to the molecular structure, the resin can be manufactured in a large scale.

Abstract: Low color, aromatic modified C5 hydrocarbon resins are disclosed. The resins are predominantly an aromatic modified piperylene resin. The resins are useful as tackifiers in hot melt adhesives and hot melt pressure sensitive adhesives.

Abstract: The present invention describes the use of cationic vinylidene, allenylidene and higher cumulenylidene complexes of ruthenium or osmium as catalysts or catalyst precursors for olefin metathesis reactions of all types, as well as to new cationic allenylidene complexes of ruthenium and osmium which can be used as metathesis catalysts with preferred embodiment. These catalysts or catalyst precursors are easy to prepare from well accessible, stable and essentially non toxic starting materials, can be isolated and stored, they exhibit a high catalytic activity, a good compatibility with functional groups, solvents, water and additives, and they need not to be activated by any additive.

Abstract: A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonapthalene, 5,5′-(1,2-ethanediyl)bisbicyclo[2.2.1]hept-2-ene, and 1,4,4a,4b,5,8,8a,8b-octahydro-1,4:5,8-dimethanobiphenylene are disclosed. The catalyst includes an organonickel or organopalladium transition metal procatalyst and an activator compound. Polymerization can be carried out in a reaction injection molding process to yield thermoplastic and thermoset molded polymeric articles possessing high glass transition temperatures.

Abstract: The invention discloses a method for dispersing a metathesis catalyst in an olefin to produce a catalyst-monomer mixture having a desired catalyst:monomer ratio comprising dispersing the catalyst within a solvent and mixing the dispersed catalyst with an olefin monomer. In preferred embodiments, the catalyst is of the formula wherein M is ruthenium or osmium; X and X1 are either the same or different and are any anionic ligand; L and L1 are either the same or different and are neutral electron donor; R and R1 are either the same or different and are each independently hydrogen or a substituent selected from the group consisting of C1-C20 alkyl, C2-C20 alkenyl, C2-C20 alkynyl, aryl, C1-C20 carboxylate, C1-C20 alkoxy, C2-C20 alkenyloxy, C2-C20 alkynyloxy, aryloxy, C2-C20 alkoxycarbonyl, C1-C20 alkylthio, C1-C20 alkylsulfonyl and C1-C20 alkylsulfinyl, wherein each of the substituents is substituted or unsubstituted.

Abstract: Novel ethylene styrene interpolymers having triads with double reverse styrene incorporation (SSS) may be prepared in the presence of a transition metal phosphinimine compound and an activator.

Abstract: Conjugated diolefins, optionally in combination with other unsaturated compounds which may be copolymerized with the diolefins, are polymerized by performing the polymerization of the diolefins in the presence of catalysts based on monocyclopentadienyl compounds of vanadium and alumoxanes in the presence of aromatic vinyl compounds as the solvent at temperatures of −30 C. to +80 C. By means of the process according to the invention, it is possible to straightforwardly produce solutions of polydiolefins, such as polybutadiene, having 1,2 unit contents of 10 to 30% in aromatic vinyl compounds, which solutions may then, for example, be further processed to yield ABS or HIPS.

Abstract: A polymer comprising recurring units of formula (1) and having a Mw of 1,000-500,000 is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 and R15 are acid labile groups, and at least one of R6 to R9 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are H or alkyl, at least one of R10 to R13 is a monovalent hydrocarbon group containing a —CO2— partial structure, and the reminders are H or alkyl, R14 is a polycyclic hydrocarbon group or polycyclic hydrocarbon-containing alkyl group, Z is a trivalent hydrocarbon group, k=0 or 1, x is>0, a, b, c and d are≧0, satisfying x+a+b+c+d=1. A resist composition comprising the polymer has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.

Abstract: The present invention relates to a polymer composition comprising one or more cycloolefin copolymers and one or more suitably formulated additives, having improved resistance to stress cracking in air or else in contact with media which give rise to stress cracking.

Abstract: A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is halogen or acyloxy, alkoxycarbonyloxy or alkylsulfonyloxy group which may be substituted with halogen, R5 is H or alkyl, R6 is an acid labile group, Z is a single bond or a divalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.

Abstract: A process is provided to produce a dialkenyl-tricyclic-nonaromatic/olefin polymer. The process comprises contacting at least one dialkenyl-tricyclic-nonaromatic compound, at least one olefin, at least one titanium complex, and at least one aluminoxane in a polymerization zone under polymerization conditions to form the dialkenyl-tricyclic-nonaromatic/olefin polymer.

Abstract: A process for producing a hydrogenated product of a polymer prepared through ring-opening polymerization which comprises a polymerization step of polymerizing a cyclic olefin through ring-opening polymerization in the presence of a polymerization catalyst comprising an organoruthenium compound or an organoosmium compound to prepare a polymer, and a hydrogenation step of adding a hydrogenation catalyst and hydrogen into a polymerization system resulting from the polymerization step to hydrogenate the carbon-carbon double bonds of the polymer prepared through the ring-opening polymerization. When the organoruthenium compound- or organoosmium compound-containing catalyst further comprises a carbene compound, the catalyst exhibits a higher activity for the ring-opening polymerization.

Abstract: Ruthenium and osmium carbene compounds that are stable in the presence of a variety of functional groups and can be used to catalyze olefin metathesis reactions on unstrained cyclic and acyclic olefins are disclosed. Also disclosed are methods of making the carbene compounds. The carbene compounds are of the formula where M is Os or Ru; R1 is hydrogen; R is selected from the group consisting of hydrogen, substituted or unsubstituted alkyl, and substituted or unsubstituted aryl; X and X1 are independently selected from any anionic ligand; and L and L1 are independently selected from any neutral electron donor. The ruthenium and osmium carbene compounds of the present invention may be synthesized using diazo compounds, by neutral electron donor ligand exchange, by cross metathesis, using acetylene, using cumulated olefins, and in a one-pot method using diazo compounds and neutral electron donors.

Abstract: A thermoplastic dicyclopentadiene ring-opening polymer obtained by ring-opening polymerization of a monomer component containing a dicyclopentadiene monomer, characterized in that polycyclic rings which are repeating units of the polymer are bonded in cis-position relative to the carbon-carbon double bond of the main chain of the polymer in 50 mol % or more of the repeating units based on the total repeating units and the content of a low-molecular weight component of 2,000 or less in molecular weight is 10% by weight or less based on the total polymer components, and a hydrogenation product obtained by hydrogenating the carbon-carbon unsaturated bond of the thermoplastic dicyclopentadiene ring-opening polymer.

Abstract: Disclosed is a polymer for use in a chemically amplified resist, a resist composition including such a polymer is suitable for use in a chemically amplified resist, which is sensitive to far ultraviolet rays such as KrF or ArF excimer laser and forms a photoresist pattern having low dependence on and good adhesion to substrate, high transparency in the wavelength range of the above radiation, strong resistance to dry etching, and excellencies in sensitivity, resolution and developability. The resist composition can have a stronger etching resistance with a maximized content of unsaturated aliphatic ring in the polymer and a reduced edge roughness of the photoresist pattern with an alkoxyalkyl acrylate monomer employed.

Abstract: A process for producing a hydrogenated product of a polymer prepared through ring-opening polymerization which comprises a polymerization step of polymerizing a cyclic olefin through ring-opening polymerization in the presence of a polymerization catalyst comprising an organoruthenium compound or an organoosmium compound to prepare a polymer, and a hydrogenation step of adding a hydrogenation catalyst and hydrogen into a polymerization system resulting from the polymerization step to hydrogenate the carbon-carbon double bonds of the polymer prepared through the ring-opening polymerization. When the organoruthenium compound- or organoosmium compound-containing catalyst further comprises a carbene compound, the catalyst exhibits a higher activity for the ring-opening polymerization.

Abstract: Activation of ruthenium based catalyst compounds with acid to improve reaction rates and yields of olefin metathesis reactions, including ROMP, RCM, ADMET and cross-methasis reactions is disclosed. The ruthenium catalyst compounds are ruthenium carbene complexes of the general formula AxLyXzRu═CHR′ where x=0, 1 or 2, y=0, 1 or 2, and z=1 or 2 and where R′ is hydrogen or a substituted or unsubstituted alkyl or aryl, L is any neutral electron donor, X is any anionic ligand, and A is a ligand having a covalent structure connecting a neutral electron donor and an anionic ligand. The use of acid with these catalysts allows for reactions with a wide range of olefins in a variety of solvents, including acid-initiated RIM processes and living ROMP reactions of water-soluble monomers in water.

Abstract: The present invention relates to telechelic polymers having crosslinkable end groups of the formula 1

Abstract: A functionalized and polymerizable polymer is described which is obtainable by ring-opening metathesis polymerization and is suitable in particular as a dental material and especially as a constituent of dental adhesives owing to an adhesion-boosting effect.

Abstract: A process is provided to produce a dialkenyl-tricyclic-nonaromatic/olefin polymer. The process comprises contacting at least one dialkenyl-tricyclic-nonaromatic compound, at least one olefin, at least one titanium complex, and at least one aluminoxane in a polymerization zone under polymerization conditions to form the dialkenyl-tricyclic-nonaromatic/olefin polymer.

Abstract: The invention relates to an elastomeric copolymer derived from components comprising a) ethylene, b) an &agr;-olefin, c) a non-conjugated polyene (C) having one C═C bond that is copolymerizable using a Ziegler-Natta catalyst, and d) optionally a non-conjugated polyene (D) which in the molecule contains two or more C═C bonds that are copolymerizable using a Ziegler-Natta catalyst. The copolymer is characterized by, inter alia, a specific branching coefficient BC. The invention also relates to a process for the preparation of such copolymers.

Abstract: This invention relates to novel resins, blends of the novel resins with base polymers and a process for producing a resin comprising combining a reactor feed blend comprising: (a) at least 2 weight % of isoprene, (b) at least 2 weight % of one or more of dicyclopentadiene, substituted cyclopentadienes and substituted dicyclopentadienes, (c) at least 2 weight % piperylene, (d) at least 1 weight % aromatic olefins, and (e) 0 to 92 weight % of additional aliphatic olefins, based upon the weight of the reactor feed blend, with a polymerization catalyst under polymerization conditions, preferably where the ratio of component (c) to component (b) is less than 8 and the ratio of component (a) to component (b) is less than 5.

Abstract: The present invention relates to a process for the preparation of rubber-like ethylene/&agr;-olefin copolymers and ethylene/&agr;-olefin/non-conjugate diene terpolymers using a metallocene as catalyst, which process is characterized in that the metallocene used is a compound of the general formula (I) 1

Abstract: Disclosed is a negative photoresist which is suitable for use in photolithography using light of 220 nm or shorter like the light from the ArF excimer laser as exposure light, avoids pattern deformation originated from swelling and has a high adhesion strength to the substrate (a micro pattern is hard to be separated from the substrate) in addition to a dry etching resistance and high resolution.

Abstract: A polymerization system for ring opening polymerization of cycloolefins, comprising a catalyst [MOX2L2], a Lewis acid as co-catalyst, and a chain-transfer agent, 1

Abstract: A polymerization system for ring opening polymerization of cycloolefins, comprising a catalyst [MoOX2L2], a Lewis acid as co-catalyst, and a chain-transfer agent, wherein (1) both X groups are the same halogen atom selected from the group consisting of Cl and Br, and both L groups are the same halogen atom as X; or (2) both of the X groups are the same halogen atom selected from the group consisting of Cl and Br, and both of the L groups are the same straight chain or branched alkyl group having 1-4 carbon atoms; or (3) both X groups are the same halogen atom selected from the group consisting of Cl and Br, and both L groups are the same straight chain or branched alkoxy group having 1-4 carbon atoms; or (4) both X groups are the same alkyl group having 1-4 carbon atoms, and both L groups are the same alkoxy group having 1-4 carbon atoms; or (5) one X group is a halogen atom selected from the group consisting of Cl and Br, and the other X group together with both L groups cons

Abstract: In accordance with the present invention, there are provided novel heterobifunctional monomers and uses for the same. Invention compounds have many of the properties required by the microelectronics industry, such as, for example, hydrophobicity, high Tg values, low dielectric constant, ionic purity, low coefficient of thermal expansion (CTE), and the like. These properties result in a thermoset that is particularly well suited to high performance applications where typical operating temperatures are often significantly higher than those at which prior art materials were suitable. Invention compounds are particularly ideal for use in the manufacture of electronic components, such as, for example, printed circuit boards, and the like.

Abstract: The invention is directed to polymers containing a repeating unit derived from a norbornene sulfonamide. These may be addition polymers which include copolymers with one or more comonomers such as norbornene, ethylene, an acrylate or sulfur dioxide or carbon monoxide. Said monomers may be polymerized using single or multicomponent Group VIII catalysts. The norbornene sulfonamides can also form ROMP polymers using known metathesis catalysts. Preferably the ROMP polymers may be hydrogenated to give more stable polymers.

Abstract: The present invention provides novel tertiary alcohol compounds which are useful as monomers for the preparation of photoresist materials having high transparency and a great affinity for the substrate and hence suitable for use in photolithography using a light source comprising preferably light having a wavelength of 300 nm or less and more preferably light emitted from an ArF excimer laser.

Abstract: The present invention relates to a copolymer resin for a photoresist used in far ultraviolet ray such as KrF or ArF, process for preparation thereof, and photoresist comprising the same resin. The copolymer resin according to the present invention is easily prepared by conventional radical polymerization due to the introduction of mono-methyl cis-5-norbonen-endo-2,3-dicarboxylate unit to a structure of norbornene-maleic anhydride copolymer for photoresist. The resin has high transparency at 193 nm wavelength, provides increased etching resistance and settles the problem of offensive odor occurred in the course of copolymer resin synthesis. Further, as the resin composition can be easily controlled due to the molecular structure, the resin can be manufactured in a large scale.

Abstract: A method for producing an olefin type copolymer having a cyclic structure, which comprises copolymerizing ethylene (M1) and dicyclopentadiene or tricyclopentadiene (M2), and, as optionally introduced, a cyclic olefin (M3), wherein, as a catalyst, a catalyst comprising a metallocene compound (A) of the following formula [1]:

Abstract: A cyclic olefin polymer having a small content of a catalyst residue, a production process for the same and use of the same as an optical material. Catalysts used for polymerization and/or hydrogenation reaction for forming the cyclic olefin polymer are decomposed efficiently by adding at least one compound selected from the group consisting of an &agr;-oxyacid and &bgr;-oxyacid having one hydroxyl group and one carboxyl group in the molecule and derivatives obtained by substituting hydroxyl group thereof by an alkoxyl group, and the decomposition products are removed by rendering them insoluble in a reaction solvent used for the polymerization and/or hydrogenation reaction and precipitating them efficiently.

Abstract: A process for production of an ethylene-propylene-diene-methylene (EPDM) tetrapolymer having long chain branching is described. The process comprises the step of polymerizing a monomer mixture comprising ethylene, propylene, a first diolefin monomer containing one polymerizable double bond (preferably ENB) and a second diolefin containing two polymerizable double bonds (preferably VNB) in the presence of a catalyst system. The catalyst system comprises: a catalyst comprising a compound containing vanadium +3 with the proviso that the compound does not comprise a halogen directly bound to the vanadium; a halogenated organoaluminum cocatalyst having a halogen to aluminum molar ratio in the range of from about 1 to about 2; and an activator. The branched polymer product of the present process exhibits a molecular weight distribution of less than about 3.5 and improved rheological properties and enhanced processability characteristics.

Abstract: A copolymer of cyclopentadiene and/or dicyclopentadiene and a vinyl-substituted aromatic compound. The copolymer has a softening point of from 60 to 130° C., a vinyl-substituted aromatic compound content of from 30 to 90% by weight, a bromine number of from 30 to 90 g/110 g, a number average molecular weight of from 400 to 1,000, and a weight average molecular weight/number average molecular weight (Mw/Mn) ratio of 2.5 or less, and a process for producing the same. The copolymer is useful in the production of a tackifier and an adhesive.

Abstract: The present invention relates to a carboxyl-containing alicyclic compound represented by Chemical Formula 1: [formula 1] wherein, R1 and R2, which may be identical to or different from each other, represent hydrogen or a tert-butyl group; X represents hydrogen, hydroxy or oxygen; and n represents a number from 1 to 3. Compounds of the present invention are useful as monomers in a photoresist resin, and in a process for preparing the same.

Abstract: Amorphous polymers, including homopolymers and co-polymers, containing residues of vinyl cyclohexane and/or substituted vinyl cyclohexane are described. The polymers of the present invention have a syndiotactic configuration in which the quantity of diads is greater than 50.1% and less than 74%. The polymers of the invention have high transparency, low birefringence and high heat defection temperature, and can be used to prepare molded articles (e.g., optical data storage media and lenses) and films.

Abstract: A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonapthalene, 5,5′-(1,2-ethanediyl)bisbicyclo[2.2.1]hept-2-ene, and 1,4,4a,4b,5,8,8a,8b-octahydro-1,4:5,8-dimethanobiphenylene are disclosed. The catalyst includes an organonickel or organopalladium transition metal procatalyst and an activator compound. Polymerization can be carried out in a reaction injection molding process to yield thermoplastic and thermoset molded polymeric articles possessing high glass transition temperatures.

Abstract: Disclosed is a negative photoresist which is suitable for use in photolithography using light of 220 nm or shorter like the light from the ArF excimer laser as exposure light, avoids pattern deformation originated from swelling and has a high adhesion strength to the substrate (a micro pattern is hard to be separated from the substrate) in addition to a dry etching resistance and high resolution.