Abstract: The invention relates to reactive dyes according to the given, defined general formula (I) wherein D1 and D2 , R and R*, in addition to M are defined as per claim 1.

Abstract: A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

Abstract: The present invention provides a family of dark quenchers, termed Black Hole Quenchers (“BHQs”), that are efficient quenchers of excited state energy but which are themselves substantially non-fluorescent. Also provided are methods of using the BHQs, probes incorporating the BHQs and methods of using the probes.

Abstract: A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

Abstract: Sulfonyldiazomethane compounds containing a long-chain alkyl- or alkoxy-naphthyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, and minimized line width variation or shape degradation even on long-term PED.

Abstract: A process for the surface functionalisation of a polymeric substrate, which process comprises: (a) contacting the substrate with a diarylcarbene precursor, (b) generating a carbene reactive intermediate from the diarylcarbene precursor so that it reacts with the substrate to functionalise the surface, and (c) further functionalising the activated substrate obtained in step (b).

Abstract: A method for the production of diazomethane comprising the steps of a) feeding a base and a diazomethane precursor into a reactor vessel; b) generating gaseous diazomethane by allowing the base and the gaseous diazomethane precursor to react; and c) removing the gaseous diazomethane using a diluent gas.

Abstract: Aziridine derivatives of formula (I) are disclosed which can be used as cofactor for S-adenosyl-L-methionine-dependent methyltransferases.

Abstract: A method of effecting a nucleophilic substitution of an alcohol to produce a target product includes the steps of: reacting the alcohol and a nucleophile with an azodicarboxylate and a phosphine. At least one of the azodicarboxylate and the phosphine includes at least one fluorous tag. In several embodiments, the azodicarboxylate includes at least one fluorous tag, and the phosphine includes at least one fluorous tag. A compound has the formula: In the above formula n1, n2, n3, n4, n5, n6, n7, n8, n9 and n10 are independently 1 or 0. X1, X2, X3, X4, X5, X6, X7, X8, X9, X10, X11, X12, X13, X14, X15, X16, X17, X18, X19 and X20 are independently H, F, Cl, an alkyl group, an aryl group or an alkoxy group.

Abstract: An acid generating agent useful for imaging photosensitive elements selected from compounds of formulae (I), (II) and (III). wherein R1 is selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group; wherein X is selected from the group consisting of oxygen, sulfur and selenium; wherein Y is selected from the group consisting of sulfur, selenium and tellurium; wherein Ar1 is selected from the group consisting of an unsubstituted and substituted aryl group; wherein R2, R3 and R4 are individually selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group or any two of them are bonded together to form a ring structure; and wherein R5 and R6 are individually selected from the group of an unsubstituted and substituted hydrocarbon or aryl group, or are bonded to each other to form a ring structure.

Abstract: A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

Abstract: Novel cross linked polymer films prepared from poly4-[(4-cardanylazo]benzoic acid and poly4-[(4-acryloylcardanylazo]benzoic acid are disclosed. The invention also relates to novel monomers 4-[(4-cardanylazo] benzoic acid and 4-[(4-acryloylcardanylazo] benzoic acid and polymers thereof as well processes for the preparation thereof.

Abstract: An alternative technique whereby highly reactive carbene or nitrene species are generated from inert precursors under less harsh photolytic, and sometimes thermolytic, conditions has also been investigated for application to dyeing and other surface modifying processes of various natural and synthetic polymers. The chemistry of cargenes and nitrenes is well documented, and these reactive entities are known to form covalent bonds with many types of functional group groups. The application of these species to the surface modification or organic solids using different approaches both for the generation of the required carbenes or nitrenes, and for their reaction with the solid surface has been reported. Interestingly, although nitrenes (often generated from an azide or sulfonylazide precursor under photolytic or thermolytic conditions) are more stable, and therefore less reactive, than their carbene analogues, they have used much more widely for the dyeing of polymeric substrates.

Abstract: Novel diazo derivatives useful for the deacidification of paper material and the process for their preparation comprising three steps starting from an amine and ethyl chlorocarbonate, are described.

Abstract: This invention relates to nano-lithography with &pgr;-conjugated azo dyes and azo-metal complexes represented by formula 1 or formula 2(Korea Pat. Appln. Nos. 2001-6879˜6880), which has both electron-donating and electron-accepting groups in the molecular structures, as a resist on Si substrate by using an AFM anodization. lithography. Developing optimum conditions of scan speed, bias voltage, and resist materials are key issues for achieving a high resolution patterning on various substrates. We accomplished nanometer-scale patterning in approximately 35 nm dimensions.

Abstract: Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.

Abstract: The present invention provides a diazonium salt represented by the following general formula (1) wherein R1 represents a branched alkyl group; R2 and R3 separately represent an alkyl group and may bond to each other to form a ring; R4, R5, and R6 separately represent a hydrogen atom, an alkyl group, or an aryl group and R4 and R5 may bond to each other to form a ring; and X− represents an anion and a heat-sensitive recording material comprising a heat-sensitive recording layer including the diazonium salt and a coupler.

Abstract: Oligonucleotide-fluorophore-quencher conjugates wherein the fluorophore moiety has emission wavelengths in the range of about 300 to about 800 nm, and or where the quencher includes a substituted 4-(phenyldiazenyl)phenylamine structure provide improved signal to noise ratios and other advantageous characteristics in hybridization and related assays. The oligonucleotide-fluorophore-quencher conjugates can be synthesized by utilizing novel phosphoramidite reagents that incorporate the quencher moiety based on the substituted 4-(phenyidiazenyl)phenylamine structure, and or novel phosphoramidite reagents that incorporate a fluorophore moiety based on the substituted coumarin, substituted 7-hydroxy-3H-phenoxazin-3-one, or substituted 5,10-dihydro-10-[phenyl]pyrido[2,3-d;6,5-d′]dipyrimidine-2,4,6,8-(1H,3H,7H,9H,10H)-tetrone structure.

Abstract: Sulfonyldiazomethane compounds containing a long-chain alkyl- or alkoxy-naphthyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, and minimized line width variation or shape degradation even on long-term PED.

Abstract: Protein macromolecular dyes, A(B)b are disclosed, wherein A are protein macromolecules including natural protein macromolecules and modified natural protein macromolecules such as casein, gelatin and fur-protein; B are dyes including azo dyes, azo metal complex dyes and anthraquinone dyes which can react with the amino groups of the natural and modified protein macromolecules; b are integers between 1˜2500. The protein macromolecular dyes have excellent properties of crosslinking ability, better dyeing fastness, fixation ration than conventional dyes and the function of normal macromolecules such as compatibility, abilities of filling and forming membranes. They may be used in dyeing protein materials such as leather, wool and silk.

Abstract: A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C1-4 alkyl or alkoxy, G is SO2 or CO, R3 is C1-10 alkyl or C6-14 aryl, p is 1 or 2, q is 0 or 1, p+q=2, n is 0 or 1, m is 3 to 11, and k is 0 to 4. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution and improved pattern profile after development.

Abstract: This invention relates to colorants comprising a chromophore having a single azo acetoacetanilide moiety, wherein said moiety each have at least one poly(oxyalkylene) chain. Such colorants exhibit extremely good base stability and lightfastness, particularly when incoporated within certain media and/or on the surface of certain substrates. These poly(oxyalkylene) chains provide solubility in different solvents or resins thereby permitting the introduction of such excellent coloring chromophores within diverse media and/or or diverse substrates. Compositions and articles comprising such colorants are provided as are methods for producing such inventive colorants.

Abstract: An acid generating agent useful for imaging photosensitive elements selected from compounds of formulae (I), (II) and (III).

Abstract: Perfluoroisopropylbenzene derivatives of the general formula (I) or salts thereof, useful as intermediates or raw materials in the synthesis of various industrial materials including agricultural chemicals, drugs and surfactants, wherein X1 is H, halogeno, formyl, optionally halogenated C1-6 alkyl, —C(═O)—R1 (wherein R1 is H, halogeno, hydroxyl, C1-6 alkyl, or NR2R3, with R2 and R3 being each H, C1-6 alkyl, or the like), or the like; X3 is H, halogeno, hydroxyl, cyano, isocyanato, hydrazino, diazo, —C(═O)—R1, —SO2—R4 (wherein R4 is halogeno, hydroxyl, C1-6 alkyl, or NR5R6, with R5 and R6 being each H or C1-6 alkyl), or the like; and X4 is H, halogeno, C1-6 alkyl, or C1-6 alkoxy, with publicly known compounds being excepted.

Abstract: A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C1-4 alkyl or alkoxy, G is SO2 or CO, R3 is C1-10 alkyl or C6-14 aryl, p is 1 or 2, q is 0 or 1, p+q=2, n is 0 or 1, m is 3 to 11, and k is 0 to 4. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution and improved pattern profile after development.

Abstract: A process for the preparation of an oxirane, aziridine or cyclopropane of formula (I), wherein X is oxygen, NR4 or CHR5; R1 is hydrogen, alkyl, aryl, heteroaromatic, heterocyclic or cycloalkyl; R2 is hydrogen, alkyl, aryl, heteroaromatic, CO2R8, CHR14NHR13, heterocyclic or cycloalkyl; or R1 and R2 join together to form a cycloalkyl ring; R3 and R10 are, independently, hydrogen, alkyl, aryl, heteroaromatic, CO2R8, R83Sn, CONR8R9, trialkylsilyl or triarylsilyl; R4 is an electron withdrawing group; R5 is alkyl, cycloalkyl, aryl, heteroaromatic, SO2R8, SO3R8, COR8, CO2R8, CONR8R9, PO(R8)2, PO(OR8)2 or CN; R8 and R9 are independently alkyl or aryl; and R13 and R14 are independently hydrogen, alkyl or aryl is provided. The process comprises degrading a compound of formula (II), (IIa), (IIb) or (IIc): wherein R3 and R10 are as defined above; Y is a cation; depending on the nature of Y, r is 1 or 2; and L is a suitable leaving group, to form a diazo compound.

Abstract: Novel diazo derivatives useful for the deacidification of paper material and the process for their preparation comprising three steps starting from an amine and ethyl chlorocarbonate, are described.

Abstract: This invention relates to nano-lithography with &pgr;-conjugated azo dyes and azo-metal complexes represented by formula 1 or formula 2(Korea Pat. Appln. Nos. 2001-6879˜6880), which has both electron-donating and electron-accepting groups in the molecular structures, as a resist on Si substrate by using an AFM anodization. lithography. Developing optimum conditions of scan speed, bias voltage, and resist materials are key issues for achieving a high resolution patterning on various substrates. We accomplished nanometer-scale patterning in approximately 35 nm dimensions.

Abstract: Colorless markers for petroleum products and methods and composition for detecting them.

Abstract: The invention relates to six new crystal polymorphs, &agr; (alpha), &bgr; (beta), &ggr; (gamma), &dgr; (delta), &zgr; (zeta), and &eegr; (eta), of the disazo colorant of the formula I, having characteristic reflections in the X-ray diffraction spectrum. The novel crystal polymorphs are prepared by treatment in organic solvents.

Abstract: The present invention relates to a positive photosensitive composition, and in particular to a material for plate printing for heat mode printing. The positive photosensitive composition of the present invention comprises at least a diazo compound represented by the following General Formula 1, and a water-insoluble but alkaline water-soluble polymer: (where Z represents an organic group in which the pKa of dissociating H in Ph—NH—Z is 14 or less; and Q1 and Q2 represent organic groups, where Q1 and Q2 may be bonded to form an aliphatic ring or aromatic ring).

Abstract: Macroazo compounds, which comprise a repeating unit composed of a moiety of the formula (a), a (b) and a moiety of the formula (c) wherein X, E, Z and T are independently a lower alkylene group, R1, R2, R3 and R4 are independently a lower alkyl group or a cyano group, R5, R6, R7 and R8 are independently a lower alkyl group or an aryl group, and m and n are independently a positive integer, those moieties being bound with one another through a carboxylic acid ester linkage or a carboxylic acid amido linkage, make it possible, for instance, in a case of using the compound as a polymerization initiator, to produce easily and at high efficiency a block polymer containing both polyorganosiloxane units and polyoxyalkylene units in its molecule.

Abstract: A novel diazodisulfone compound capable of generating acid having high sensitivity to far ultraviolet rays typified by a KrF excimer laser and the like and capable of providing a resist with superior resolution and patterns when used as a photoacid generator for a chemically amplified resist, and a radiation-sensitive resin composition comprising the diazodisulfone compound. The diazodisulfone compound is represented by the following formulas (1) and (2). ##STR1## The radiation-sensitive resin composition comprises the diazodisulfone compound and resin represented by 4-hydroxystyrene/4-(1'-ethoxyethoxy)styrene copolymer.

Abstract: A process for producing a naphthoquinone diazide ester of a phenolic compound that is useful in a photoresist composition, which process comprises providing a naphthoquinone diazide ester solution in an organic polar solvent; adding the resulting naphthoquinone diazide ester solution to a precipitation bath that is maintained at a temperature of from about 0.degree. C. to about -30.degree. C.; and filtering the resulting naphthoquinone diazide ester.

Abstract: Polyazo dyes of the formula ##STR1## where n, Y.sup.1, Y.sup.2, Y.sup.3, Y.sup.4, X, R.sup.1, R.sup.2 and R.sup.3 are each as defined in more detail in the description are useful for dyeing natural or synthetic substrates.

Abstract: The present invention provides a silacyclopentadiene derivative represented by the following Formula (1): ##STR1## wherein X.sub.1 and Y.sub.1 represent independently a halogen atom, an amino group, a hydroxyl group, or an amino group or a hydroxyl group each having a substituent; R.sub.1 to R.sub.4 represent independently a hydrogen atom, a halogen atom, an alkyl group, an amino group, a silyl group, an aryl group, a cyano group, or the respective groups describe above each having a substituent; out of the groups represented by R.sub.1 to R.sub.4, those adjacent may be combined with each other to form rings; when R.sub.1 and R.sub.4 are phenyl groups or when combined are R.sub.1 with R.sub.2 and R.sub.3 with R.sub.4 respectively to form benzene rings, X.sub.1 and Y.sub.1 are not a chlorine atom or a hydroxyl group; and when R.sub.1 and R.sub.4 are methyl groups, X.sub.1 and Y.sub.1 are not bromine atoms.

Abstract: The present invention relates to a process for desalting aqueous suspensions containing an organic diazonium compound and electrolytes containing Na ions, in which the aqueous suspension is passed through a semipermeable membrane.

Abstract: Proposed is a positive- or negative-working chemical-sensitization photoresist composition having advantages in respect of the contrast and resolution of patterning, photo-sensitivity and cross sectional profile of the patterned resist layer as well as in respect of stability of the latent image formed by pattern-wise exposure to light before post-exposure baking treatment. The composition comprises: (A) 100 parts by weight of a film-forming resinous ingredient which causes a change, i.e. increase or decrease, of solubility in an aqueous alkaline solution by the interaction with an acid; and (B) from 0.5 to 20 parts by weight of a radiation-sensitive acid-generating agent which is a diazomethane compound represented by the general formulaR.sup.1 --SO.sub.2 --C(=N.sub.2)--SO.sub.2 --R.sup.2,in which R.sup.1 and R.sup.2 are each, independently from the other, a monovalent cyclic group substituted on the cyclic nucleus by an acid-dissociable group such as a tert-butoxycarbonyl and acetal groups.

Abstract: A diazonium salt for a color-forming layer of a thermosensitive recording medium, having formula (1): ##STR1## wherein R is an alkyl group having four carbon atoms which is selected from the group consisting of n-butyl, t-butyl, and sec-butyl, and X.sup.- is selected from the group consisting of hexafluorophosphate ion PF.sub.6.sup.-, tetrafluoroborate ion BF.sub.4.sup.- and tetraphenylborate ion (C.sub.6 H.sub.5).sub.4 B.sup.-. In a first embodiment, a thermosensitive recording medium has a color-forming layer which includes a diazonium salt as described above, a basic compound and a coupler. In a second embodiment, a thermosensitive recording medium has a color-forming layer which includes: a diazonium salt, a basic compound, and a coupler, wherein the diazonium salt has a formula (2): ##STR2## where R.sup.1 and R.sup.2 are alkyl groups each having one or more carbon atoms, and X.sup.- is selected from the group consisting of hexafluorophosphate ion PF.sub.6.sup.-, tetrafluoroborate ion BF.sub.4.sup.

Abstract: A novel colorant compound is provided which is the addition product of an organic chromophore having at least one reactive hydroxyl or amine substituent, a polyisocyanate, and a carboxylic acid, sulfonic acid, or salt of either thereof. The polyisocyanate, added in a molar excess relative to the number of such reactive substituents, reacts with the reactive hydroxyl or amine groups to provide terminal isocyanate groups. Subsequently, the carboxylic acid or salt thereof, also added in an amount excessive in relation to the number of terminal isocyanate groups, reacts therewith to from urethane moieties on the colorant. Such a compound provides excellent ink compositions upon dilution and are very soluble within all the standard ink diluents. Furthermore, such colorants provide good jettability, waterfastness, washfastness, and the like, within ink-jet applications on various types of printing substrates.

Abstract: The present invention relates to novel photosensitive quinolone compounds, specifically novel 3-diazo 2,4-quinolinedione compounds, that may be used in a variety of applications, such as, photosensitive coating compositions, pharmaceuticals, agricultural, amongst others. The invention further relates to a process for making the novel photosensitive 3-diazo 2,4-quinolinedione compounds. These compounds are particularity useful as a photoactive component in a positive working photoresist composition, particularity for use as a deep ultraviolet (UV) photoresist.

Abstract: Diazomethane is produced in a continuous process with little or no explosion hazard, by dissolving an N-methyl-N-nitroso amine in a mixture of a water-miscible organic solvent that dissolves the N-methyl-N-nitroso amine and a water-immiscible organic solvent that dissolves diazomethane, and combining a stream of this solution with a stream of an aqueous inorganic base, allowing the aqueous and organic phases to settle after a suitable residence time, and phase separating the phases, all on a continuous basis. When using N-methyl-N-nitrosourea as the amine, the diazomethane process is preceded by a continuous nitrosation process involving combining aqueous solutions of methyl urea and a nitrite salt with an organic solution of a mineral or organic acid, the solvent in the organic solution being a mixture of the two organic solvents referred to above, allowing the aqueous and organic phases to settle after a suitable residence time, and phase separating the phases, all on a continuous basis.

Abstract: Solid solutions consisting of 3,6-bis(biphenyl-4-yl)- 2,5-dihydropyrrolo?3,4-c!pyrrole-1,4-dione and either a) a second 1,4-diketopyrrolopyrrole or b) a quinacridone, which are further defined herein, are outstandingly suited to pigmenting high molecular weight organic material.

Abstract: Diazomethane is prepared in a batch process on a scale of at least 50 gram-moles per batch, from an N-methyl-N-nitroso amine in an organic solvent and an inorganic base in an aqueous solution by the use of a phase transfer catalyst and by controlling the choice of solvent, reagent concentrations, addition rate and reaction temperature to cause codistillation of the product and the organic solvent in such a manner that the concentration of diazomethane in both liquid and vapor phases are controlled within limits that will prevent detonation of the diazomethane.

Abstract: Compounds of the formula ##STR1## where the symbols have the meaning described in the application, have retinoid-like or retinoid antagonist-like biological activity.

Abstract: The invention relates to a method of increasing the sensitivity of laser induced thermal imaging by using certain diazo compounds. The diazo compounds contain functional groups adjacent the diazo substituent capable of stabilizing these compounds. The invention is useful in the field of thermal transfer imaging for the production of various graphic arts media.

Abstract: There are provided a derivative of a metal-encapsulated fullerene having application as a functional material, superconducting material, electronics material or pharmaceutical material, and a method of synthesizing this derivative. The derivative of a metal-encapsulated fullerene having the following structure is synthesized by adding a substituted diazomethane to a metal-encapsulated fullerene and denitrifying in a solvent.

Abstract: The invention is directed to azoxycyanobenzene derivatives of the formula: ##STR1## wherein n is 0-3; each R represents halogen, nitro, cyano, alkyl, haloalkyl, alkoxy, or haloalkoxy; and each R.sup.1 and R.sup.2 represents an optionally substituted alkyl, alkenyl, alkynyl, cycloalkyl, or aralkyl group. The compounds may be used as fungicides.

Abstract: Anilines of the formula ##STR1## where R.sup.1 and R.sup.2 are each hydrogen, unsubstituted or substituted alkyl, alkenyl or unsubstituted or substituted phenyl orR.sup.1 and R.sup.2, together with the nitrogen atom linking them are a heterocyclic radical or R.sup.1 may furthermore be unsubstituted or substituted hydroxyl or unsubstituted or substituted amino,R.sup.3 and R.sup.7 are each hydrogen, unsubstituted or substituted alkyl, alkenyl, cyano, nitro, acyl, acylamino, unsubstituted or substituted hydroxyl, unsubstituted or substituted carboxymethyl, unsubstituted or substituted amino, unsubstituted or substituted mercapto or unsubstituted or substituted sulfamoyl or, together with R.sup.2, are alkylene, alkenylene or phenylalkenylene,R.sup.4 is hydrogen, unsubstituted or substituted alkyl, alkenyl, unsubstituted or substituted hydroxyl, unsubstituted or substituted amino, unsubstituted or substituted carboxyl or unsubstituted or substituted sulfamoyl andR.sup.5 and R.sup.

Abstract: A process for producing a diazomethane derivative by oxidizing a hydrazone derivative in a two-phase system containing: a) an aqueous solution of a mixture of a caustic alkali and an alkali metal hypochlorite in respective concentrations of 4-14 w/w % and 3-10 w/w % based on the total weight of the solution; b) a hydrophobic organic solvent; c) an inorganic iodine compound, and d) a phase-transfer catalyst.