Vanadium, Niobium, Or Tantalum Containing (v, Nb, Or Ta) Patents (Class 556/42)
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Patent number: 7371878Abstract: Tantalum precursors useful in depositing tantalum nitride or tantalum oxides materials on substrates, by processes such as chemical vapor deposition and atomic layer deposition. The precursors are useful in forming tantalum-based diffusion barrier layers on microelectronic device structures featuring copper metallization and/or ferroelectric thin films.Type: GrantFiled: January 23, 2007Date of Patent: May 13, 2008Assignee: Advanced Technology Materials, Inc.Inventors: Tianniu Chen, Chongying Xu, Thomas H. Baum
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Patent number: 7358209Abstract: A transition metal complex having the following Formula (A): wherein the monovalent groups R1 and R2 are —Ra, —ORb, —NRcRd, and —NHRe: the monovalent groups Ra, Rb, Rc, Rd and Re, and the divalent group R3 are (i) aliphatic hydrocarbon, (ii) alicyclic hydrocarbon, (iii) aromatic hydrocarbon, (iv) alkyl substituted aromatic hydrocarbon (v) heterocyclic groups and (vi) heterosubstituted derivatives of said groups (i) to (v); M is a Group (3) to (11) or lanthanide metal; E is phosphorus or arsenic; X is an anionic group, L is a neutral donor group; n is (1) or (2), y and z are independently zero or integers, such that the number of X and L groups satisfy the valency and oxidation state of the metal M. n is preferably (2) and the two resulting R1 groups are preferably linked.Type: GrantFiled: August 31, 2006Date of Patent: April 15, 2008Assignee: Ineos Europe LimitedInventors: Vernon Charles Gibson, Grant Berent Jacobsen, David John Jones, Richard James Long
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Publication number: 20080071102Abstract: Processes for preparing high-purity niobium alkoxides, especially niobium ethoxide, are described which include: (a) providing a crude niobium alkoxide starting material comprising at least one compound of the general formula (I) Nb(OR)5 ??(I) wherein each R independently represents a linear or branched C1-12 alkyl group; and (b) contacting the crude niobium alkoxide starting material with a treatment medium comprising a component selected from the group consisting of (i) one or more alcohols of the general formula (II) in an amount of 0.01 to 5% by weight, (ii) air or an oxygen-containing gas, and (iii) combinations thereof; R1OH ??(II) wherein each R1 independently represents a linear or branched C1-12 alkyl group.Type: ApplicationFiled: September 14, 2007Publication date: March 20, 2008Applicant: H. C. Starck GmbHInventor: Knud Reuter
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Patent number: 7332618Abstract: This invention relates to organometallic precursor compounds represented by the formula (H)mM(R)n wherein M is a metal or metalloid, R is the same or different and is a substituted or unsubstituted, saturated or unsaturated, heterocyclic radical containing at least one nitrogen atom, m is from 0 to a value less than the oxidation state of M, n is from 1 to a value equal to the oxidation state of M, and m+n is a value equal to the oxidation state of M, a process for producing the organometallic precursor compounds, and a method for producing a film or coating from the organometallic precursor compounds.Type: GrantFiled: August 1, 2005Date of Patent: February 19, 2008Assignee: Praxair Technology, Inc.Inventor: Scott Houston Meiere
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Patent number: 7314844Abstract: A process for cyanating an aldehyde is provided. The process comprises reacting the aldehyde with: i) a cyanide source which does not comprise a Si—CN bond or a C—(C?O)—CN moiety; and ii) a substrate susceptible to nucleophilic attack not comprising a halogen leaving group; in the presence of a chiral catalyst. Preferably, the chiral catalyst is a chiral vanadium or titanium catalyst. The cyanide source is preferably an alkali metal cyanide and the substrate susceptible to nucleophilic attack not comprising a halogen leaving group is a carboxylic anhydride.Type: GrantFiled: April 26, 2005Date of Patent: January 1, 2008Assignees: King's College London, Nesmeyanov Institute of Organoelement CompoundsInventors: Michael North, Yuri Belokon
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Patent number: 7301040Abstract: Bidentate catalyst systems and the methods or forming such are described herein. The catalyst systems generally are compounds having the general formula: where R, R1, R2 and R3 are optional and independently selected from hydrogen, C1 to C20 alkyl groups or C6 to C20 aryl groups, A? and A? are independently selected from coordination groups, M is a Group 4 or 5 transition metal, X is selected from halogens, alkyl groups, aromatic groups or combinations thereof and n is less than 4.Type: GrantFiled: August 18, 2005Date of Patent: November 27, 2007Assignee: Fina Technology, Inc.Inventors: Abbas Razavi, Vladimir P. Marin, Margarito Lopez
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Patent number: 7273943Abstract: A novel process for the preparation of high-purity zirconium, hafnium, tantalum and niobium alkoxides (alcoholates), novel tantalum and niobium compounds and a process for their preparation are provided. The process comprises the steps of mixing crude metal alkoxides M(OR)x having a halogen impurity of at least 0.05 wt. %, with an alcohol ROH, in which R is a C1-C12-alkyl radical, and subsequently or simultaneously metering in an excess of ammonia, based on the amount of mononuclear or polynuclear halogen-containing metal alkoxides.Type: GrantFiled: August 24, 2006Date of Patent: September 25, 2007Assignee: H. C. Starck GmbHInventors: Knud Reuter, Friedrich Zell, Martina Ebner
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Patent number: 7268253Abstract: The invention relates to a novel process for hydroxymethylating noncyclic ?,?-dialkylcarboxylic acid derivatives with formaldehyde using amide bases at temperatures of from ?40° C. up to the boiling point of the solvent or solvent mixture used.Type: GrantFiled: November 29, 2005Date of Patent: September 11, 2007Assignee: Consortium fuer Elektrochemische Industrie GmbHInventors: Andreas Boehm, Hermann Petersen, Juergen Stohrer
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Patent number: 7241911Abstract: The present invention relates to novel, water-soluble niobium compounds, a process for their preparation and their formulations.Type: GrantFiled: September 29, 2005Date of Patent: July 10, 2007Assignee: H. C. Starck GmbH & Co. KGInventors: Karsten Beck, Hady Seyeda, Udo Sulkowski, Axel Rosenkranz
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Patent number: 7238821Abstract: This invention relates to a one pot method for large scale production of an organometallic compound comprising (i) reacting a hydrocarbon or heteroatom-containing material with a base material in the presence of a solvent and under reaction conditions sufficient to produce a first reaction mixture comprising a hydrocarbon or heteroatom-containing compound, (ii) adding a metal source compound to said first reaction mixture, (iii) reacting said hydrocarbon or heteroatom-containing compound with said metal source compound under reaction conditions sufficient to produce a second reaction mixture comprising said organometallic compound, and (iv) separating said organometallic compound from said second reaction mixture.Type: GrantFiled: October 6, 2003Date of Patent: July 3, 2007Assignee: Praxair Technology, Inc.Inventors: Scott Houston Meiere, David Walter Peters
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Patent number: 7179765Abstract: The present invention relates to a process for the preparation of hydrogen peroxide from oxygen or oxygen-delivering substances and hydrogen or hydrogen-delivering substances in the presence of at least one catalyst containing a metal-organic framework material, wherein said framework material comprises pores and a metal ion and an at least bidentate organic compound, said bidentate organic compound being coordinately bound to the metal ion. The invention further relates to a novel material consisting of said metal organic framework material wherein the material is brought in contact with at least one additional metal.Type: GrantFiled: October 26, 2005Date of Patent: February 20, 2007Assignees: BASF Aktiengesellschaft, The Reagents of the University of MichiganInventors: Ulrich Mueller, Olga Metelkina, Henrik Junicke, Thomas Butz, Omar M. Yaghi
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Patent number: 7151070Abstract: The compound of this invention is a useful catalyst for the oxidative coupling of naphthol. Its originality lies in that it is a novel vanadium complex of Schiff's base formed by a chiral amino acid and a formyl biphenol or its derivative. Its axis chirality is induced to form by the chiral amino acid. It has the general formula: where R represents a benzyl, an isopropyl, an isobutyl or a tertiary butyl and the configuration of the amino acid is R or S. The compound can catalyze oxidative coupling of naphthol or its derivative to form binaphthol or its derivatives with a high optical purity.Type: GrantFiled: February 27, 2003Date of Patent: December 19, 2006Assignee: Chengdu Institute of Organic Chemistry Chinese Academy of SciencesInventors: Liuzhu Gong, Zhibin Luo, Quanzhong Liu, Aiqiao Mi, Yaozhong Jiang
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Patent number: 7148367Abstract: The organometallic compound of the present invention is a compound that has bonds between metal atoms and nitrogen atoms or bonds between semimetal atoms and nitrogen atoms, and the content of chlorine in the compound is 200 ppm or less and the content of water is 30 ppm or less. In addition, the general formula of this compound is represented by the following formula (1): M[(R1)2N](n?s)(R2)s??(1) wherein, M represents a metal atom or semimetal atom, with the metal atom being Hf, Zr, Ta, Ti, Ce, Al, V, La, Nb or Ni, and the semimetal atom being Si, R1 represents a methyl group or ethyl group, R2 represents an ethyl group, n represents the valence of M, and s represents an integer of 0 to n?1.Type: GrantFiled: January 23, 2004Date of Patent: December 12, 2006Assignee: Mitsubishi Materials CorporationInventor: Atsushi Itsuki
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Patent number: 7105672Abstract: A catalyst compound of formula I or II: (wherein R1–R11, M, E, T, X, Y, m and n are defined herein). The compound, when combined with a suitable activator, is active for the polymerization of olefins. In an embodiment of combinations of the R1–R7 and T groups, these catalysts can engage in weak attractive non-covalent interactions with the polymer chain. In another embodiment, the R1–R11 groups in formula II exhibit weak attractive non-covalent interactions with the polymer chain.Type: GrantFiled: September 7, 2005Date of Patent: September 12, 2006Assignee: The University of Hong KongInventors: Michael Chi-Wang Chan, Chi-Fai Kui
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Patent number: 7084306Abstract: Disclosed is a process for preparing 2,2,6,6-tetramethyl-3,5-heptanedione, comprising reacting a pivalic acid alkyl ester with pinacolone in the presence of an alkali metal alkoxide catalyst using a pivalic acid alkyl ester as a solvent but using no other solvent or reacting them in an amide type or urea type solvent in the presence of an alkali metal alkoxide catalyst. Also disclosed is a process for preparing a 2,2,6,6-tetramethyl-3,5-heptanesione metal complex using the 2,2,6,6-tetramethyl-3,5-heptanedione obtained by the above process. The process for preparing 2,2,6,6-tetramethyl-3,5-heptanedione is an industrially advantageous process in which an alkali metal alkoxide that is easy to handle can be used as a catalyst for preparing 2,2,6,6-tetramethyl-3,5-heptanedione from a pivalic acid alkyl ester and pinacolone.Type: GrantFiled: December 18, 2002Date of Patent: August 1, 2006Assignee: Showa Denko K.K.Inventors: Makoto Saito, Takashi Ueda, Takashi Tani
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Patent number: 6998497Abstract: A metal bis-triflimide compound having the formula: [Mx]n+[(N(SO2CF3)2)(nx?yz)](nx?yz)?[Ly]z? where M is a metal selected from the metals in groups 5 to 10, 12 and 14 to 16 and Cu, Au, Ca, Sr, Ba, Ra, Y, La, Ac, Hf, Rf, Ga, In, Tl, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Lu and the actinides; L is a negative or neutral ligand; n is 2,3,4,5,6,7 or 8; x is greater than or equal to 1 y is 0,1,2,3,4,5,6,7 or 8; and z is 0,1,2,3 or 4.Type: GrantFiled: March 12, 2002Date of Patent: February 14, 2006Assignee: The Queen's University of BelfastInventors: Martyn J. Earle, Barry Joseph Mcauley, Alwar Ramani, Kenneth Richard Seddon, Jillian M. Thomson
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Patent number: 6974878Abstract: A new ligands that include a benzene ring in the backbone can be combined with a metal or metal precursor compound or formed into a metal-ligand complex catalyze a number of different chemical transformations, including olefin polymerization reactions. The ligands, complexes formed with the ligands and compositions including the ligands are useful catalysts, depending on the reaction.Type: GrantFiled: September 18, 2001Date of Patent: December 13, 2005Assignee: Symyx Technologies, Inc.Inventors: Anil Guram, Cheryl Lund, Howard W. Turner, Tetsuo Uno
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Patent number: 6960675Abstract: Tantalum precursors useful in depositing tantalum nitride or tantalum oxides materials on substrates, by processes such as chemical vapor deposition and atomic layer deposition. The precursors are useful in forming tantalum-based diffusion barrier layers on microelectronic device structures featuring copper metallization and/or ferroelectric thin films.Type: GrantFiled: October 14, 2003Date of Patent: November 1, 2005Assignee: Advanced Technology Materials, Inc.Inventors: Tianniu Chen, Chongying Xu, Thomas H. Baum
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Patent number: 6946568Abstract: Complexes of the formulae Ia and Ib where M=Ti, Zr, Hf, V, Nb or Ta, can be used for the polymerization and copolymerization of olefins, for example in suspension polymerization processes, gas-phase polymerization processes and bulk polymerization processes.Type: GrantFiled: February 6, 2002Date of Patent: September 20, 2005Assignee: Basell Polyolefine GmbHInventors: Marc Oliver Kristen, Benno Bildstein, Alexander Krajete
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Patent number: 6924147Abstract: A polymeric food spoilage sensor comprises a polymer containing a polyazamacrocyclic transition metal complex. The complex selectively binds biogenic amines, such as cadaverine, putrescine and histamine, which are released by food spoilage microorganisms. The polymer undergoes a detectable color change upon exposure to biogenic amine, thus indicating that food spoilage has probably occurred. In one embodiment, the polymer is molecularly imprinted with the biogenic amine to impart selective binding affinity. The polymer is easily incorporated in common food containers and can be employed in fiber optic detection devices.Type: GrantFiled: July 15, 2003Date of Patent: August 2, 2005Assignee: The Johns Hopkins UniversityInventors: Craig A. Kelly, George M. Murray, O. Manuel Uy
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Patent number: 6919467Abstract: The present invention provides a catalyst precursor and catalyst system comprising the precursor, an embodiment of the precursor is selected from the following structures: wherein T is a bridging group; M is selected from Groups 3 to 7 atoms, and the Lanthanide series of atoms the Periodic Table of the Elements; Z is a coordination ligand; each L is a monovalent, bivalent, or trivalent anionic ligand; X and Y are each independently selected from nitrogen, oxygen, sulfur, and phosphorus; R is a non-bulky substituent that has relatively low steric hindrance with respect to X; and R? is a bulky substituent that is sterically hindering with respect to Y.Type: GrantFiled: December 18, 2001Date of Patent: July 19, 2005Assignee: Univation Technologies, LLCInventor: Rex Eugene Murray
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Patent number: 6869638Abstract: A CVD Method of forming gate dielectric thin films on a substrate using metalloamide compounds of the formula M(NR1R2)x, or wherein M is Zr, Hf, Y, La, Lanthanide series elements, Ta, Ti, or Al; N is nitrogen; each of R1 and R2 is same or different and is independently selected from H, aryl, perfluoroaryl, C1-C8 alkyl, C1-C8 perfluoroalkyl, alkylsilyl; and x is the oxidation state on metal M; and an aminosilane compound of the formula HxSiAy(NR1R2)4-x-y or wherein H is hydrogen; x is from 0 to 3; Si is silicon; A is a halogen; Y is from 0 to 3; N is nitrogen; each of R1 and R2 is same or different and is independently selected from the group consisting of H, aryl, perfluoroaryl, C1-C8 alkyl, and C1-C8 perfluoroalkyl; and n is from 1-6. By comparison with the standard SiO2 gate dielectric materials, these gate dielectric materials provide low levels of carbon and halide impurity.Type: GrantFiled: September 18, 2001Date of Patent: March 22, 2005Assignee: Advanced Tehnology Materials, Inc.Inventors: Thomas H. Baum, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder
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Ortho substituted chiral phosphines and phosphinites and their use in asymmetric catalytic reactions
Patent number: 6855657Abstract: 3,3?-Substituted chiral biaryl phosphine and phosphinite ligands and metal complexes based on such chiral ligands useful in asymmetric catalysis are disclosed. The metal complexes are useful as catalysts in asymmetric reactions, such as, hydrogenation, hydride transfer, allylic alkylation, hydrosilylation, hydroboration, hydrovinylation, hydroformylation, olefin metathesis, hydrocarboxylation, isomerization, cyclopropanation, Diels-Alder reaction, Heck reaction, isomerization, Aldol reaction, Michael addition, epoxidation, kinetic resolution and [m+n] cycloaddition. The metal complexes are particularly effective in Ru-catalyzed asymmetric hydrogenation of beta-ketoesters to beta-hydroxyesters and Ru-catalyzed asymmetric hydrogenation of enamides to beta amino acids.Type: GrantFiled: September 11, 2003Date of Patent: February 15, 2005Assignee: The Penn State Research FoundationInventor: Xumu Zhang -
Patent number: 6855839Abstract: This invention relates to a composition of matter represented by the formula below, and to a polymerization process comprising combining an olefin in the gas or slurry phase with an activator, a support and a compound represented by the following formula: wherein M is a group 3 to 14 metal, each X is independently an anionic leaving group, n is the oxidation state of M, m is the formal charge of the YZL ligand, Y is a group 15 element, Z is a group 15 element, L is a group 15 or 16 element, R1 and R2 are independently a C, to C20 hydrocarbon group, a heteroatom containing group, silicon, germanium, tin, lead, phosphorus, a halogen, R1 and R2 may also be interconnected to each other, R3 is absent, or is hydrogen, a group 14 atom containing group, a halogen, a heteroatom containing group, R4 and R5 are independently an aryl group, a substituted aryl group, a cyclic alkyl group, a substituted cyclic alkyl group, or multiple ring system, R6 and R7 are independently absent or hydrogen, halogen, a heteroatom oType: GrantFiled: May 24, 2001Date of Patent: February 15, 2005Inventors: David H. McConville, Richard R. Schrock
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Patent number: 6831187Abstract: The present invention relates to novel hetero-multimetallic catalyst precursors and catalysts for the polymerization of olefins.Type: GrantFiled: December 18, 2001Date of Patent: December 14, 2004Assignee: Univation Technologies, LLCInventor: Rex Eugene Murray
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Publication number: 20040229845Abstract: The instant invention provides reagents and methods for diagnosis, detection and treatment of cancers (for example, prostate cancers). In particular, the invention provides methods to generate various functionalized PSMA ligands, and their uses in diagnosis, detection, imaging, and treatment of prostate cancers, especially those overexpressing PSMA.Type: ApplicationFiled: June 16, 2004Publication date: November 18, 2004Applicant: Beth Israel Deaconess Medical CenterInventor: John V. Frangioni
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Publication number: 20040210071Abstract: The organometallic compound of the present invention is a compound that has bonds between metal atoms and nitrogen atoms or bonds between semimetal atoms and nitrogen atoms, and the content of chlorine in the compound is 200 ppm or less and the content of water is 30 ppm or less.Type: ApplicationFiled: January 23, 2004Publication date: October 21, 2004Applicant: MITSUBISHI MATERIALS CORPORATIONInventor: Atsushi Itsuki
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Publication number: 20040176623Abstract: The object of this invention is to provide an organometallic precursor for forming a metal film or pattern and a method of forming the metal film or pattern using the same. More particularly, the present invention provides an organometallic precursor containing a hydrazine-based compound coordinated with a central metal thereof, and a method of forming a metal film or pattern using the same. Further, the present invention provides a composition containing an organometallic compound and a hydrazine-based compound, and a method of forming a metal film or pattern using the same. Additionally, the present invention is advantageous in that a pure metal film or pattern is formed using the organometallic precursor or composition through a simple procedure without limiting atmospheric conditions at a low temperature, and the film or pattern thus formed has excellent conductivity and morphology. Therefore, the film is useful in an electronic device field including flexible displays and large-sized TFT-LCD.Type: ApplicationFiled: October 2, 2003Publication date: September 9, 2004Inventors: Hae Jung Son, Euk Che Hwang, Sang Yoon Lee, Soon Taik Hwang, Byong Ki Yun
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Publication number: 20040171857Abstract: A catalyst composition for the polymerization of olefins is provided, comprising a cyclopentadienyl transition metal catalyst and an activating co-catalyst.Type: ApplicationFiled: March 1, 2004Publication date: September 2, 2004Inventor: Chunming Wang
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Patent number: 6706249Abstract: A composite metal polybasic salt containing a trivalent metal and magnesium as metal components and having a novel crystal structure, and a method of preparing the same. The invention further deals with a composite metal polybasic salt which has anion-exchanging property, which by itself is useful as an anion-exchanger, capable of introducing anions suited for the use upon anion-exchange, and finds a wide range of applications, and a method of preparing the same. The composite metal polybasic salt has a particular chemical composition and X-ray diffraction peaks, and further has a degree of orientation (Io) of not smaller than 1.5.Type: GrantFiled: March 6, 2001Date of Patent: March 16, 2004Assignee: Mizusawa Industrial Chemicals Ltd.Inventors: Yoshinobu Komatsu, Hitoshi Ishida, Hiroshi Igarashi, Masami Kondo, Madoka Minagawa, Tetsu Sato, Teiji Sato
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Patent number: 6695977Abstract: Improved liquid crystalline materials may be prepared by doping liquid crystalline materials with chiral, uncharged metal compounds of formula [(P1—Y1—A1—Y2—M1—Y3—)nL]2Me or [(P1—Y1—A1—Y2—M1—Y3—)nL]Me(L′(—Y6—M2—Y5—A2—Y4—P2)n′)m. Groups P1 and P2 may be, independently, hydrogen, C1-C12-alkyl groups, polymerizable groups, or radicals containing a polymerizable group. Y1 to Y6 may be, independently, single chemical bonds, ether groups, thio groups, carbonyl groups, acid groups, etc. Groups A1 and A2 are spacers having from 1 to 30 carbon atoms, and M1 and M2 are mesogenic groups. Me may be a transition metal from the fourth, fifth or sixth period of the periodic table, except for technetium, silver, cadmium, gold, mercury, or any of the lanthanoids, or Me may be a main group element from group 14 (IUPAC system), except for carbon and lead.Type: GrantFiled: December 11, 2001Date of Patent: February 24, 2004Assignee: BASF AktiengesellschaftInventors: Frank Prechtl, Sylke Haremza, Robert Parker, Kathrin Kürschner, Manfred Braun, Antje Hahn, Ralf Fleischer
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Publication number: 20040033892Abstract: The ionic liquids according to the invention result from the reaction of a halogenated or oxyhalogenated Lewis acid based on titanium, niobium, tantalum, tin or antimony with an organic salt of formula X+A− in which A− is a halide anion and X+ a quaternary ammonium, quaternary phosphonium or ternary sulphonium cation.Type: ApplicationFiled: May 13, 2003Publication date: February 19, 2004Inventors: Philippe Bonnet, Eric Lacroix, Jean-Pierre Schirmann
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Patent number: 6686489Abstract: A liquid precursor for forming a transparent metal oxide thin film comprises a first organic precursor compound. In one embodiment, the liquid precursor is for making a conductive thin film. In this embodiment, the liquid precursor contains a first metal from the group including tin, antimony, and indium dissolved in an organic solvent. The liquid precursor preferably comprises a second organic precursor compound containing a second metal from the same group. Also, the liquid precursor preferably comprises an organic dopant precursor compound containing a metal selected from the group including niobium, tantalum, bismuth, cerium, yttrium, titanium, zirconium, hafnium, silicon, aluminum, zinc and magnesium. Liquid precursors containing a plurality of metals have a longer shelf life. The addition of an organic dopant precursor compound containing a metal, such as niobium, tantalum or bismuth, to the liquid precursor enhances control of the conductivity of the resulting transparent conductor.Type: GrantFiled: November 9, 2001Date of Patent: February 3, 2004Assignee: Symetrix CorporationInventors: Jolanta Celinska, Carlos A. Paz de Araujo, Joseph D. Cuchiaro, Jeffrey W. Bacon, Larry D. McMillan
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Chemical vapor deposition systems including metal complexes with chelating O- and/or N-donor ligands
Patent number: 6682602Abstract: A method of forming a film on a substrate using one or more complexes containing one or more chelating O- and/or N-donor ligands. The complexes and methods are particularly suitable for the preparation of semiconductor structures using chemical vapor deposition techniques and systems.Type: GrantFiled: August 19, 2002Date of Patent: January 27, 2004Assignee: Micron Technology, Inc.Inventor: Brian A. Vaartstra -
Patent number: 6680385Abstract: A method for the preparation of aryl methyl ketones converts a variety of ethyl arenas to the corresponding aryl methyl ketones using a dioxygen-containing gas as the oxidant. The catalyst used for the reaction is a metal complex bearing general formulas as disclosed.Type: GrantFiled: January 25, 2002Date of Patent: January 20, 2004Assignees: The Hong Kong Polytechnic University, Sichuan UniversityInventors: Albert Sun-Chi Chan, Jian-Ying Qi, Cheng-Chao Pai, Xian-Jun Li, Li-Sheng Deng, Wen-Zao Li, Bin Sun, Jia-Yuan Hu
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Patent number: 6677490Abstract: The invention relates to a method for producing a mixture of alcohols/ketones by decomposing an alkyl hydroperoxide, particularly to a method for producing a cyclohexanol/cyclohexanone by decomposing cyclohexyl hydroperoxide in the presence of a heterogeneous catalyst. According to the invention, the reaction is carried out in the presence of a heterogeneous catalyst containing an organometallic segment fixed on the surface of a porous solid compound such as silicon. The organometallic segment can be formula (I).Type: GrantFiled: October 15, 2002Date of Patent: January 13, 2004Assignee: Rhodia Polyamide IntermediatesInventors: James Clark, Eric Fache, Ducan Macquarrie, Peter Price, John Rafelt
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Patent number: 6673257Abstract: A thermal cutoff member and compositions used to manufacture such members are described herein as including at least two organic compounds which, when sufficiently combined, give rise to a component which has a lower melt transition temperature than the initial organic compounds prior to combining the same. The thermal cutoff member is generally utilized in a thermal cutoff construction having an electrical switching unit that changes its operating condition when the member therein melts by being heated to a certain temperature for the particular material that forms the member being utilized.Type: GrantFiled: September 12, 2000Date of Patent: January 6, 2004Assignee: Therm-O-Disc, IncorporatedInventor: Christine M. Hudson
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Patent number: 6664408Abstract: The present invention is generally directed to a process for preparing polyoxometalates having amine-derived substituents attached thereto. In a first embodiment, the process comprises contacting a polyoxometalate and an amine in the presence of a diimide. The present invention is further directed to novel functionalized polyoxometalates prepared by the present process.Type: GrantFiled: March 29, 2002Date of Patent: December 16, 2003Assignee: The Curators of The University of MissouriInventors: Zhonghua Peng, Yongge Wei, Bubin Xu
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Publication number: 20030181746Abstract: Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3−n , where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an integer fro 1 to 3. Such monoalkyl Group VA metal dihalide compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities. Monoalkyl Group VA metal dihydride compounds can be easily produced in high yield and high purity by reducing such monoalkyl Group VA metal dihalide compounds.Type: ApplicationFiled: January 17, 2003Publication date: September 25, 2003Applicant: Shipley Company, L.L.C.Inventors: Deodatta Vinayak Shenai-Khatkhate, Michael Brendan Power, Artashes Amamchyan, Ronald L. DiCarlo
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Patent number: 6610629Abstract: Disclosed is a process for producing an oxide catalyst comprising, as component elements, molybdenum (Mo), vanadium (V), at least one element selected from the group consisting of the two elements of antimony (Sb) and tellurium (Te), and niobium (Nb), wherein the process comprises providing an aqueous raw material mixture containing compounds of the component elements of the oxide catalyst, and drying the aqueous raw material mixture, followed by calcination, and wherein, in the aqueous raw material mixture, at least a part of the niobium compound as one of the compounds of the component elements is present in the form of a complex thereof with a complexing agent comprising a compound having a hydroxyl group bonded to an oxygen atom or a carbon atom. Also disclosed is a process for producing (meth)acrylonitrile or (meth)acrylic acid, which comprises performing the ammoxidation or oxidation of propane or isobutane in the gaseous phase in the presence of the oxide catalyst.Type: GrantFiled: September 18, 2001Date of Patent: August 26, 2003Assignee: Asahi Kasei Kabushiki KaishaInventors: Hidenori Hinago, Hiroyuki Yano
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Publication number: 20030144434Abstract: The invention relates to chemical products which are suited for use as co-catalysts and which can be obtained by reacting a compound of formula (I), M1R1R2(R3)m with a compound of formula (II), (R4X)q-(G)*(M2R5R6)g. In formula (I), R1, R2 and R3 are the same or different and represent a hydrogen atom, C1-C20 alkyl, C1-C20 alkyl halide, C6-C20 aryl, C6-C20 aryl halide, C7-C40 arylalkyl, C7-C40 arylalkyl halide, C7-C40 alkylaryl or C7-C40 alkylaryl halide; M1 represents an element of the second or third main group of the periodic table of elements, and; m equals 0 or 1, whereby m is equal to 1 when M1 represents an element of the third main group, and m is equal to 0 when M1 represents an element of the second main group.Type: ApplicationFiled: November 20, 2002Publication date: July 31, 2003Inventor: J?ouml;rg Schottek
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Patent number: 6593484Abstract: A stable compound having a vapor pressure higher by 1 order than that of Ta(NtBu)(NEt2)3 is provided as a starting material for forming a TaN film as a barrier film by the CVD method. There are further provided a process for producing the same and a method of forming a TaN film by using the same. The novel compound, tantalum tertiary amylimido tris(dimethylamide) [Ta(NtAm)(NMe2)3] has a vapor pressure of 1 Torr at 80° C., and its melting point is 36° C. This compound is obtained by allowing 1 mole of TaCl5, 4 moles of LiNMe2 and 1 mole of LiNHtAm to react with one another in an organic solvent in the vicinity of room temperature, then separating byproducts by filtration, distilling the solvent away, and distilling the product in vacuo. This compound can be used as a starting material in CVD to form a cubic TaN film on a SiO2/Si substrate at 550° C. at 0.05 Torr.Type: GrantFiled: November 9, 2001Date of Patent: July 15, 2003Assignee: Kabushikikaisha Kojundokagaku KenkyushoInventors: Sakiko Yasuhara, Hidekimi Kadokura
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Publication number: 20030130451Abstract: The present invention relates to vanadium-imidoaryl compounds having electron-withdrawing substituents at the aryl group, to compositions containing vanadium-imidoaryl compounds having electron-withdrawing substituents at the aryl group, which compositions are suitable especially as catalysts for the polymerization of olefins, such as for ethene/propene or ethene/&agr;-olefin copolymerization and the terpolymerization of those monomers with dienes.Type: ApplicationFiled: August 9, 2002Publication date: July 10, 2003Inventors: Michael Arndt-Rosenau, Martin Hoch, Jorg Sundermeyer, Jennifer Kipke, Xiaoyan Li
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Patent number: 6552209Abstract: This invention relates to an improved process to produce metal imino/amino complexes having the formula R1N=M(NR2R3)3 where M is a pentavalent metal or (R1N=)2M′(NR2R3)2 where M′ is a hexavalent metal. In the process MX5 and two-equivalents of primary amine R1NH2 or metal hexahalide, M′X6 with seven-equivalents of primary amine H2NR1 are reacted in the presence of excess pyridine. The resulting reaction product R1N═MX3(py)2 or [(R1N)2M′X2(py)]2 then is followed by the addition of LiNR2R3. The process provides the final product in high yield and in high purity as well as representing a simplified procedure for synthesizing R1N═M(NR2 R3)3 or (R1N═)2M′(NR2R3)2type complexes.Type: GrantFiled: June 24, 2002Date of Patent: April 22, 2003Assignee: Air Products and Chemicals, Inc.Inventors: Xinjian Lei, John Anthony Thomas Norman
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Patent number: 6548685Abstract: The invention relates to a process for preparing niobium(V) alkoxides and tantalum(V) alkoxides, in particular niobium(V) ethoxide and tantalum(V) ethoxide, by reacting NbCl5 or TaCl5 with an appropriate alcohol in the presence of ammonia, wherein NbCl5 or TaCl5 is dissolved at a temperature of from about 0° C. to −50° C. in the alcohol containing from about 5 to about 7 mol of ammonia per mol of NbCl5 or TaCl5 to be reacted.Type: GrantFiled: March 15, 2002Date of Patent: April 15, 2003Assignee: H.C. Starck GmbHInventor: Friedrich Zell
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Publication number: 20030065203Abstract: Metal complexes having constrained geometry and a process for preparation thereof, addition polymerization catalysts formed therefrom, processes for preparation of such addition polymerization catalysts, methods of use, and novel polymers formed thereby, including ElPE resins and pseudo-random copolymers, are disclosed and claimed.Type: ApplicationFiled: November 6, 2001Publication date: April 3, 2003Inventors: David R. Wilson, Robert K. Rosen
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Patent number: 6534664Abstract: New ligands having a backbone comprised of NCCX can be combined with a metal or metal precursor compound or formed into a metal-ligand complex to catalyze a number of different chemical transformations, including polymerization.Type: GrantFiled: October 5, 2000Date of Patent: March 18, 2003Assignee: Symyx Technologies, Inc.Inventors: Anil S. Guram, Anne Marie LaPointe, Howard W. Turner, Tetsuo Uno
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Patent number: 6518444Abstract: A method to synthesize a Group 15 containing metal polymerization catalyst is disclosed. The method includes an efficient high temperature synthesis of Group 15 containing ligands, especially arylamine ligands, for use in preparing polymerization catalysts and catalyst systems.Type: GrantFiled: December 18, 2000Date of Patent: February 11, 2003Assignee: Univation Technologies, LLCInventors: David H. McConville, Jaimes Sher
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Patent number: 6511936Abstract: The present invention relates to catalyst systems, processes for making such catalysts, intermediates for such catalysts, and olefin polymerization processes using such catalysts wherein such catalyst includes a component represented by the following formula 1A: wherein R and R′ independently represent a hydrogen atom, or a substituted or unsubstituted, branched or unbranched hydrocarbyl or organosilyl radical; R1, R2, and R3 independently represent a hydrogen atom, or a substituted or unsubstituted, branched or unbranched hydrocarbyl radical; M is a group IIIB, IVB, VB, VIB, VIIB or VIII transition metal; T independently represents a univalent anionic ligand such as a hydrogen atom, or a substituted or unsubstituted hydrocarbyl halogeno, aryloxido, arylorganosilyl, alkyloriganosilyl, amido, arylamido, phosphido, or arylphosphido group, or two T groups taken together represent an alkylidene or a cyclometallated hydrocarbyl bidentate ligand; L independently represents a sigma donorType: GrantFiled: August 13, 1999Date of Patent: January 28, 2003Assignees: University of Delaware, Chevron Chemical Co.Inventors: Klaus H. Theopold, Woo-Kyu Kim, Leonard A. MacAdams, John M. Power, Javier M. Mora, Albert P. Masino
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Publication number: 20030017940Abstract: The present invention relates to a transition metal compound represented by the general formula (I), and a olefin polymerization catalyst comprising above transition metal compound and activating co-catalyst as the main components.Type: ApplicationFiled: May 10, 2002Publication date: January 23, 2003Inventors: Takashi Kashiwamura, Takuji Okamoto, Yutaka Minami