Plural Silicons Bonded Directly To Each Other Patents (Class 556/430)
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Patent number: 6841163Abstract: A high internal aqueous phase water-in-oil type emulsion cosmetic composition comprising a cross-linkable polyether-modified silicone in an amount of 0.1 to 10.0% by weight and a water-soluble polymer having a weight average molecular weight of 2000 to 300,000, an inorganic salt and an amino acid salt or a polyether-modified silicone, and having a content of an aqueous phase component of at least 50% by weight.Type: GrantFiled: March 27, 2002Date of Patent: January 11, 2005Assignee: Shiseido Company, Ltd.Inventors: Takayuki Omura, Tomiyuki Nanba
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Patent number: 6812311Abstract: A method of producing a highly stable packaging substrate in which are provided a first precursor having a first backbone and a first ethynyl group, and a second precursor having a second backbone and a second ethynyl group. Furthermore provided is a crosslinker having a first and a second reactive group. The first precursor, the second precursor, the crosslinker, and a solvent are applied onto a surface to form an electrically insulating layer. The first ethynyl group is reacted with the first reactive group in a first carbon-carbon bond formation reaction and the second ethynyl group is reacted with the second reactive group in a second carbon-carbon bond formation reaction to crosslink the first backbone with the second backbone, thereby forming the packaging substrate. The solvent is removed in a further step.Type: GrantFiled: October 18, 2001Date of Patent: November 2, 2004Assignee: Honeywell International Inc.Inventors: Thomas McCarthy, Michael Wagaman, David Schwind
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Patent number: 6800777Abstract: The invention includes a trialkylsilane comprising a hydrocarbon backbone including one to ten carbon atoms; a terminal trialkylsilyl moiety having at least two alkyl groups independently comprising at least six carbon atoms; and a terminal silyl moiety that has at least one hydrolyzable group bound to a silicon of the silyl moiety. At least one of the alkyl groups of the trialkylsilyl moiety may substituted with at least one halogen, and is preferably a perfluoroalkyl group. The invention also provides methods of producing the trialysilane and substrates including the trialkysilane of the invention, as well as columns and substrates for use in chromatographic applications.Type: GrantFiled: May 3, 2002Date of Patent: October 5, 2004Assignee: Gelest, Inc.Inventors: Barry C. Arkles, Gerald L. Larson, Youlin Pan
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Patent number: 6737124Abstract: Chiral nonracemic, chiral racemic and achiral compounds useful as component of LC compositions which have a silane tail group which is partially fluorinated. The silane tail group comprises a perfluoroalkyl group. The silane tail group of this invention has the formula: where k is 0 or an integer ranging from 1-10; m and n are integers ranging from 1 to about 20; j is 0 or an integer ranging from 1 to 20; Z is —O— or a single bond; R1, R1′, R2 and R2′ are alkyl groups or perfluorinated alkyl groups; and RF is a perfluorinated alkyl group. The invention also provides LC compositions comprising one or more compounds of the invention with partially fluorinated silane tails. The invention also provides optical devices, particularly display devices which contain an aligned layer of an LC composition comprising one or more silane compounds of this invention.Type: GrantFiled: January 3, 2001Date of Patent: May 18, 2004Assignee: Displaytech, Inc.Inventors: Neil Gough, Xin-Hua Chen, William N. Thurmes, Michael Wand
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Patent number: 6706424Abstract: An organic electrically conductive compound represented by general formula (1): and an organic elctroluminescent device using the compound are provided, wherein n is an integer from 2 to 10, k represents any of integers from 1 to n, Ar1, Ar1′, Ar2, and Ar2′ are substituted or non-substituted aromatic hydrocarbon rings or heterocyclic rings that share a bond between carbons at 2,3-positions or 4,5-positions of a pyrrole ring in general formula (1) and are fused with the pyrrole ring, respectively, and Rk and Rk′ are aliphatic hydrocarbon groups or substituted or non-substituted aryl or heterocyclic groups, respectively.Type: GrantFiled: September 27, 2002Date of Patent: March 16, 2004Assignee: Mitsumi Electric Co., Ltd.Inventors: Norio Hasegawa, Akira Shiga, Youichi Itagaki
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Publication number: 20030216591Abstract: A silicon compound having a repeating unit represented by the following general formula (1): 1Type: ApplicationFiled: September 16, 2002Publication date: November 20, 2003Inventors: Kazunori Ueno, Yomishi Toshida, Yuichi Hashimoto, Akihiro Senoo, Seiji Mashimo
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Publication number: 20030091863Abstract: An organic electrically conductive compound represented by general formula (1): 1Type: ApplicationFiled: September 27, 2002Publication date: May 15, 2003Inventors: Norio Hasegawa, Akira Shiga, Youichi Itagaki
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Patent number: 6538055Abstract: A compound containing a silane backbone and a group of formula (A) wherein R is hydrogen, C1-C8alkyl, —O, —OH, —CH2CN, C1-C18alkoxy, C5-C12cycloalkoxy, C3-C6alkenyl, C7-C9phenylalkyl unsubstituted or substituted on the phenyl by 1, 2 or 3 C1-C4alkyl; or C1-C8acyl; is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.Type: GrantFiled: October 18, 2001Date of Patent: March 25, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Primo Carrozza, Valerio Borzatta, Giovanni Da Roit, Chryssostomos Chatgilialoglu
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Publication number: 20020132053Abstract: A method of producing a highly stable packaging substrate in which are provided a first precursor having a first backbone and a first ethynyl group, and a second precursor having a second backbone and a second ethynyl group. Furthermore provided is a crosslinker having a first and a second reactive group. The first precursor, the second precursor, the crosslinker, and a solvent are applied onto a surface to form an electrically insulating layer. The first ethynyl group is reacted with the first reactive group in a first carbon-carbon bond formation reaction and the second ethynyl group is reacted with the second reactive group in a second carbon-carbon bond formation reaction to crosslink the first backbone with the second backbone, thereby forming the packaging substrate. The solvent is removed in a further step.Type: ApplicationFiled: October 18, 2001Publication date: September 19, 2002Applicant: Honeywell International, Inc.Inventors: Thomas McCarthy, Michael Wagaman, David Schwind
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Patent number: 6403750Abstract: A process for fabricating ceramic composites employs a thermoplastic photo-curable pre-ceramic polymer in which the component is shape by a variety of standard composite fabrication techniques, such as filament winding, tape winding, and woven cloth winding. The process includes steps of passing ceramic fiber monofilament, tow, mat, or woven cloth through a solution of said thermoplastic photo-curable pre-ceramic polymer, applying ceramic fiber monofilament, tow, mat, or woven cloth to a moving flat substrate, using a compaction roller to press the thermoplastic pre-ceramic polymer coated ceramic fiber onto flat substrate, using photo-light of the ultraviolet, visible, or infrared light spectrum to induce cross-linking (curing) of the photo-curable pre-ceramic polymer thereby rendering a thermoset polymer and either partially or completely pyrolyzing the now cured pre-ceramic polymer matrix coated ceramic fiber material.Type: GrantFiled: June 3, 1999Date of Patent: June 11, 2002Inventors: Edward J. A. Pope, Kenneth M. Kratsch
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Patent number: 6365698Abstract: Grafted-polysilanes with a greater efficiency for the photoinitiation of vinyl type resins are provided. These grafted polysilanes which include both grafted cyclic polysilanes and grafted networked polysilanes have variable composition and length molecular chains grafted onto the silane backbone which aid in the solubility in vinyl type resins.Type: GrantFiled: October 16, 1998Date of Patent: April 2, 2002Assignees: Three Bond Co., Ltd., University of CincinnatiInventors: Barry Goldslager, Stephen J. Clarson
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Patent number: 6337415Abstract: Tetrakis(trimethylsilyl)silane is prepared by reacting tetrachlorosilane with chlorotrimethylsilane in the presence of lithium metal, adding a compound with active proton(s) to the reaction mixture for treating the residual lithium metal therewith while maintaining the mixture neutral or acidic, and separating tetrakis(trimethylsilyl)silane from the organic layer. The residual lithium metal is treated in a safe and simple manner. Reaction of the tetrakis(trimethylsilyl)silane with an alkyl lithium or alkali metal alkoxide, followed by acid hydrolysis, affords tris(trimethylsilyl)silane. The desired compounds are prepared in high yields and on an industrial scale.Type: GrantFiled: November 3, 2000Date of Patent: January 8, 2002Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ayumu Kiyomori, Tohru Kubota, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe
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Patent number: 6310231Abstract: Silane compounds as a constituent material of luminescent device are described, which are represented by formula (1), luminescent device materials which comprise said compounds and luminescent devices which comprise said materials to acquire high luminous efficiency and high durability: wherein R1 represents an alkyl group, an aryl group, a heteroaryl group or an alkynyl group, and each of Ar11, Ar12 and Ar13 represents a heteroaryl group.Type: GrantFiled: April 5, 2000Date of Patent: October 30, 2001Assignee: Fuji Photo Film Co., Ltd.Inventors: Tatsuya Igarashi, Toshiki Taguchi
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Patent number: 6307083Abstract: Silane compounds represented by formula (1), a synthesis method thereof, luminescent device materials comprising such silane compounds, and luminescent devices containing such materials: wherein each of R1 and R2 groups represents an aryl group containing no alkenyl substituent, or a heteroaryl group containing no alkenyl substituent; each of R3, R4, R5 and R6 groups represents a hydrogen atom or a substituent group; each of R7 and R8 groups represents an aryl group or a heteroaryl group; and each of Ar1 and Ar2 groups represents an arylene group or a heteroarylene group; provided that the compound represented by the formula (1) takes neither polymeric nor oligomeric form and the case is excluded therefrom wherein all or three of R1 R2, Ar1 and Ar2 groups have heteroaryl structures.Type: GrantFiled: April 4, 2000Date of Patent: October 23, 2001Assignee: Fuji Photo Film Co., Ltd.Inventor: Tatsuya Igarashi
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Patent number: 6255430Abstract: The invention is directed to a polysilane represented by the formula (1) wherein R is hydrogen atom, alkyl group, aryl group, alkoxy group, amino group or silyl group, R's may be the same or at least two of them may be different from each other; each hydroxyl group is in the p-position or m-position; and n is 2 to 10,000, preferably 13 to 8,500. The polysilane of the invention is important as materials for modified polycarbonates or like engineering plastics, resists or electrophotographic photoreceptors.Type: GrantFiled: July 8, 1999Date of Patent: July 3, 2001Assignee: Osaka Gas Company LimitedInventors: Ryoichi Nishida, Hiroaki Murase
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Patent number: 6174982Abstract: A method for producing polysilanes comprising subjecting a dihalosilane of the general formula (wherein m is 1 to 3; R represents hydrogen atom, alkyl group, aryl group, alkoxy group, amino group or silyl group and two Rs are the same or different in case of m=1, four Rs are the same or at least two of them are different in case of m=2 and six Rs are the same or at least two of them are different in case of m=3; X represents halogen atom) to the action of Mg or Mg alloy in an aprotic solvent in the presence of Li salt and metal halide, thereby producing polysilane represented by the general formula (wherein R is as defined above corresponding to the starting material; n is 2 to 1000).Type: GrantFiled: June 22, 1999Date of Patent: January 16, 2001Assignee: Osaka Gas Company LimitedInventors: Ryoichi Nishida, Shinichi Kawasaki, Hiroaki Murase
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Patent number: 6166234Abstract: Novel tripodal cyclopentadiene derivatives have the formula (I) ##STR1## where E are identical or different and are --N(R)(R), --P(R)(R), --As(R)(R), --Sb(R)(R), --OR, --SR, --SeR, --TeR, where R are identical or different and are each hydrogen, a C.sub.1 -C.sub.20 -carboorganic radical or a C.sub.1 -C.sub.30 -organosilicon radical, or E is a leaving group X andR.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6 are identical or different and are each hydrogen, a C.sub.1 -C.sub.20 -carboorganic radical or a C.sub.1 -C.sub.30 -organosilicon radical,Z is a cyclopentadienyl radical or a substituted cyclopentadienyl structural unit andT is hydrogen, a C.sub.1 -C.sub.20 -carboorganic radical or a C.sub.1 -C.sub.30 -organosilicon radical or a group E--Y--, where E is --N(R)(R), --P(R)(R), --As(R)(R), --Sb(R)(R), --OR, --SR, --SeR, --TeR or a leaving group X, where R are identical or different and are each hydrogen, a C.sub.1 -C.sub.20 -carboorganic radical or a C.sub.1 -C.sub.Type: GrantFiled: January 13, 1998Date of Patent: December 26, 2000Assignee: BASF AktiengesellschaftInventors: Gottfried Huttner, Joachim Vogelgesang, Ute Winterhalter, Bjorn Antelmann
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Patent number: 6136940Abstract: A silacyclobutane compound having the formula: ##STR1## wherein R.sup.1 and R.sup.2 are independently chloro, triorganosiloxy, organooxy, triorganosilyl, or a monovalent hydrocarbon group; R.sup.3 is a monovalent hydrocarbon group free of conjugated aliphatic unsaturation, triorganosilyl, or hydrogen; and R.sup.4 is a monovalent saturated hydrocarbon group; provided that when R.sup.3 is hydrogen, neither R.sup.1 nor R.sup.2 is chloro or organooxy. Methods of preparing the silacyclobutane compounds, silane polymers containing at least one silacyclobutane unit, and siloxane polymers containing at least one silacyclobutane unit.Type: GrantFiled: April 23, 1999Date of Patent: October 24, 2000Assignee: Dow Corning LimitedInventors: Norbert Auner, Martin Grasmann
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Patent number: 6124491Abstract: The invention includes hydrolyzable and polymerizable silanes, methods of making them and using them to obtain silicic acid(hetero)polycondensates and silicic acid(hetero)polymerizates. The hydrolyzable and polymerizable silanes have the formula I, ##STR1## wherein A=O, S, NH or C(O)O; wherein B=a straight chain or branched organic residue with at least one C.dbd.C double bond and from 4 to 50 carbon atoms;R is an alkyl group, alkenyl group, aryl group, alkylaryl group or an arylalkyl group;R' is a substituted or unsubstituted alkylene group, arylene group, arylenealkylene group or alkylenearylene group each having zero to ten carbon atoms, with the proviso that the substituted groups each have at least one oxygen atom, sulfur atom and/or amine group substituent;R.sup.Type: GrantFiled: February 25, 1997Date of Patent: September 26, 2000Assignee: Fraunhofer-Gesellschaft Zur Forderung der AngewandtenInventors: Herbert Wolter, Werner Storch
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Patent number: 6114500Abstract: An organic silicon polymer is purified by washing at least once a solution of an organic silicon polymer with aqueous hydrochloric acid having a concentration of at least 0.001 N, and washing the solution at least twice with ultrapure water having a resistivity of at least 10 M.OMEGA./cm. Metal impurities can be removed from the organic silicon polymer to a sufficient level for use as electronic material without detracting from the polymer's own properties.Type: GrantFiled: January 7, 1999Date of Patent: September 5, 2000Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Shigeru Mori, Yoshitaka Hamada
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Patent number: 6020447Abstract: A process is provided that involves reductive coupling of polysilane precursors to form polysilane in the presence of ultrasonification. The resulting precursors, upon pyrolysis, lead to improved SiC ceramic product. Ultrasonification can be used to produce oligosilanes from precursors thereof, or polysilanes from monomers, dimers, trimers, or oligomers. Precursors can include Si:C in a ratio of about 1:1, and the invention allows formation of SiC having a Si:C ratio of about 1:1.Type: GrantFiled: March 28, 1997Date of Patent: February 1, 2000Assignee: Massachusetts Institute of TechnologyInventors: Dietmar Seyferth, Toshiya Sugimoto, Pawel Czubarow
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Patent number: 6005036Abstract: A composition containing an organic material subject to oxidative, thermal or actinic degradation can be stabilized by an effective amount of at least one polysilane compound of formula I ##STR1## Preferred compounds are where q is zero, p is 2 to 50, m is zero, R.sub.1 is alkyl, phenyl or benzyl, and A and B are independently hydrogen or a group --Si(E).sub.3 where E is alkyl. These compounds can also be copolymeric having a random, alternate or block distribution of individual structural units. These compounds are particularly suitable as process stabilizers.Type: GrantFiled: December 22, 1997Date of Patent: December 21, 1999Assignee: Ciba Specialty Chemical CorporationInventors: Primo Carrozza, Valerio Borzatta, Chryssostomos Chatgilialoglu
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Patent number: 5939577Abstract: A novel method for the synthesis of chlorinated or partially chlorinated organosilanes and organopolysilanes. The chlorination is effected by contacting an organosilanes or organopolysilanes with anhydrous CuCl.sub.2 in a nonpolar alkane solvent, preferably pentane or hexadecane, without the use of a catalyst. Copper metal, which is easily filtered, is a reaction product. The filtrate containing the chlorinated organosilane or organopolysilane can be used directly as a reactant to produce, for example, aminoorganosilanes.Type: GrantFiled: July 22, 1998Date of Patent: August 17, 1999Assignee: Sandia CorporationInventors: David R. Wheeler, Timothy P. Pollagi
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Patent number: 5879589Abstract: The present invention provides a process for the antistatic treatment of a resin which comprises dispersing the following organically-modified layer silicate in a synthetic resin in the state that the following specific state is attained. A novel resin composition is provided, comprising an organically-modified layer silicate compound having a specific volume resistivity of not more than 1.times.10.sup.13 .OMEGA..multidot.cm dispersed in a synthetic resin in a proportion of from 2 to 30 parts by weight based on 100 parts by weight of said synthetic resin in the state that (1) a primary aggregate and/or a secondary aggregate having a short axis length of not more than 500 nm is formed and (2) the average minimum interparticle distance is not more than 500 nm.Type: GrantFiled: January 31, 1997Date of Patent: March 9, 1999Assignee: Kao CorporationInventors: Seiichi Miyanaga, Yasuhiro Doi, Kenichi Nishimura, Isao Nishi, Yuzo Sumida
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Patent number: 5874603Abstract: A branched alkylsilane includes a branched hydrocarbon backbone which has a linear or branched alkylsilyl moiety extending asymmetrically from the backbone such that the backbone has a first portion and a second portion extending from the moiety. The second portion has two carbon atoms more than the first portion, and the alkylsilyl moiety includes at least one hydrolyzable group bound to silicon for reacting with a substrate. A method for preparing a branched alkylsilane useful for chromatographic applications includes the steps of preparing a vinylidene olefin by dimerization of an .alpha.-olefin and reacting it with a monomeric silane having a silicon-hydrogen bond in the presence of a metallic catalyst such that the silicon-hydrogen bond is added to the vinylidene double bond of the vinylidene olefin thereby converting the double bond to a single bond and bonding the silicon of the monomeric silane to the vinylidene olefin to form a branched alkylsilane.Type: GrantFiled: July 15, 1997Date of Patent: February 23, 1999Assignee: Gelest, Inc.Inventor: Barry C. Arkles
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Patent number: 5830972Abstract: A polysilane is disclosed whose main chain skeleton has a repeating unit represented by the general formula (1): ##STR1## wherein R.sub.1 represents a substituted or unsubstituted alkyl cycloalkyl, aryl or aralkyl group; X is a atom having an unpaired electron or a group containing an atom having an unpaired electron and represents an oxygen atom, sulfer atom or a nitrogen atom-containing group represented by the general formula (2): ##STR2## wherein R.sub.2 represents a substituted or unsubstituted alkyl, cycloalkyl, aryl or aralkyl group; Ar.sub.1 represents a substituted or unsubstituted arylene group; and Ar.sub.2 represents a substituted or unsubstituted aryl group, a group having an aromatic amine skeleton or a group ethenylene skeleton; a process for producing the polysilane; and a dihalosilane which is the starting material therefor. The polysilane compound has an excellent moldability as a high polymeric material and a higher hole drift mobility as a hole transporting material.Type: GrantFiled: April 9, 1996Date of Patent: November 3, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Masato Ueda, Fumi Yamaguchi, Yukio Fujii, Isao Yahagi, Manabu Sasaki, Takenori Osada, Makoto Kitano, Yasuaki Abe
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Patent number: 5798428Abstract: There is disclosed a method of making polysilanes by polymerization of a silane in the presence of a catalyst comprising a phosphine-stabilized polyhydride of an early transition metal of Groups 4 to 7 of the Periodic Table and the resultant polysilanes which have a molecular weight higher than 1,000 and a polydispersity below about 2.Type: GrantFiled: September 20, 1996Date of Patent: August 25, 1998Assignee: Osaka Gas Co., Ltd.Inventors: Stuart T. Schwab, Partha P. Paul, Ryoichi Nishida
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Patent number: 5773639Abstract: A layer forming material is a compound which has a structure of six-membered ring coordinated to Cu and containing Si, and of which general formula is represented by the following chemical formula: ##STR1## wherein X.sub.1 and X.sub.2 are elements of the VI group of the same or different types which are coordinate-bonded to Cu, and of which examples include O, S, Se, Te and the like, at least one of Y.sub.1, Y.sub.2 and Y.sub.3 is Si, L is a group which has a double or triple bond and which is able to supply electrons to Cu, and each of R.sub.1 and R.sub.2 is any of SiF.sub.3, SiH.sub.3, CF.sub.3 and CH.sub.3 for example.Type: GrantFiled: March 19, 1996Date of Patent: June 30, 1998Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Akemi Kawaguchi, Yuka Terai, Kousaku Yano
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Patent number: 5710301Abstract: The present invention provides an oganosilicon compound possessing a .beta.-branched alkyl group or a .beta.-branched aralkyl group represented by Formula (I): ##STR1## wherein R.sup.1 represents methyl group or ethyl group; R.sup.2 represents C1-C18 alkyl group or aryl group. The present invention relates to optically active organosilicon compounds for use as a new type of enantio-recognitive material, and organosilicons which can be anticipated for use as a high polymer standard material in one-dimensional semiconductor quantum wire structures.Type: GrantFiled: February 18, 1994Date of Patent: January 20, 1998Inventor: Michiya Fujiki
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Patent number: 5670683Abstract: Cyclopentadineyl compounds of the formula II ##STR1## and formula III ##STR2## their preparation and their use as intermediates in the preparation of metallocene complexes of the formula I.Type: GrantFiled: March 22, 1996Date of Patent: September 23, 1997Assignee: BASF AktiengesellschaftInventors: Franz Langhauser, Jurgen Kerth, Gunther Schweier, Hans-Herbert Brintzinger, Stefan Mansel
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Patent number: 5663271Abstract: A polysilane of Formula [I] or [II]: ##STR1## (wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 denote independently hydrogen, alkyl, aryl, alkenyl, alkynyl, silyl, and amino groups. R.sup.1 and R.sup.2, R.sup.3 and R.sup.4, R.sup.5 and R.sup.6, R.sup.7 and R.sup.8, R.sup.13 and R.sup.14, R.sup.10 and R.sup.11 can form a ring with the silicon bonded to each group. m is 0 or 1. n is an integer.);and a method for synthesizing the polysilane of Formula [I] or [II] in which a small-ring polysilane is reacted (in a solvent) with an organolithium reagent, and then treated with silanes possessing a leaving group. The resulting polysilanes have a homogeneous molecular weight distribution and are useful as a functional polymer for nonlinear optical materials and electroconductive polymers.Type: GrantFiled: November 9, 1995Date of Patent: September 2, 1997Inventor: Yasuo Hatanaka
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Patent number: 5637667Abstract: A thermosetting resin composition, containing (A) a thermosetting resin; (B) a curing agent for the thermosetting resin; (C) a polysilane copolymer; and (D) an inorganic filler; wherein the polyailane copolymer (C) is added in amount of about 0.1 to 10% by weight based on the total amount of the resin composition.Type: GrantFiled: May 25, 1995Date of Patent: June 10, 1997Assignee: Kabushiki Kaisha ToshibaInventors: Hiroshi Shimozawa, Shinetsu Fujieda, Shuzi Hayase, Yoshihiko Nakano, Akira Yoshizumi, Ken Uchida
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Patent number: 5633312Abstract: Disclosed is a process for preparing a polyorganosilane which comprises subjecting a disilane compound having at least two substituted or unsubstituted hydrocarbyloxy groups in one molecule to disproportionation reaction in the presence of a catalyst comprising a reaction product of an organic alkali metal compound represented by the formula (I):RM (I)wherein R represents a substituted or unsubstituted monovalent hydrocarbon group; and M represents an alkali metal,represented by the formula (III):MR.sup.3.sub.p M (III)wherein R.sup.3 represents a saturated or unsaturated chain or cyclic divalent hydrocarbon group or a divalent heterocyclic group, two or more R.sup.3 s may be the same or different and an ether oxygen atom may exist between two or more R.sup.3 s; p represents an integer of 1 or more; and M represents an alkali metal atom,and at least one of a disilane compound and a silane compound both of which have a substituted or unsubstituted hydrocarbyloxy group(s).Type: GrantFiled: April 1, 1996Date of Patent: May 27, 1997Assignee: Toshiba Silicone Co., Ltd.Inventors: Keiji Kabeta, Sigeru Wakamatsu, Takafumi Imai
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Patent number: 5606088Abstract: A one-step process for the preparation of organodisilanes. The process comprises contacting magnesium metal with a mixture comprising diethylene glycol dibutyl ether, an organic halide, and a halodisilane at a temperature within a range of about 0.degree. C. to 250.degree. C. The process provides a high yield of organodisilane product that is easily recoverable. The present process is especially useful for converting halodisilanes in a high-boiling mixture resulting from the direct process for making organosilane monomers into hexaorganodisilanes.Type: GrantFiled: March 28, 1996Date of Patent: February 25, 1997Assignee: Dow Corning CorporationInventors: Howard M. Bank, Sean P. Davern, Binh T. Nguyen
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Patent number: 5605998Abstract: There is disclosed a method for producing polycarbosilanes, comprising polymerizing silane of the formula SiH.sub.4 with dienes in the presence of a rare earth metal complex. Polycarbosilanes useful as photoreactive materials and as raw material of silicon carbide-series ceramics can be obtained in a high yield from silane (SiH.sub.4) and dienes.Type: GrantFiled: March 9, 1995Date of Patent: February 25, 1997Assignee: Director-General of Agency of Industrial Science and TechnologyInventors: Toshi-aki Kobayashi, Masato Tanaka
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Patent number: 5599892Abstract: In a process for preparing a polysilane from a diorganodihalosilane and an alkali metal, a low molecular weight polysilane results from the process as a by-product. The low molecular weight polysilane is further reacted with an alkali metal for conversion into a high molecular weight polysilane.Type: GrantFiled: October 6, 1995Date of Patent: February 4, 1997Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Akira Hayashida
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Patent number: 5596117Abstract: A process for the preparation of alkylsilanes and alkenyl silanes by hydrosilylation of their corresponding silanes and unsaturated hydrocarbons in the presence or absence of a catalyst. A process for the preparation of polyalkenylsilanes (some of which are novel high molecular compounds) by the anionic coordination polymerization, radical polymerization or ionic polymerization of the alkenylsilanes. A process for the production of silicon carbide by using these polyalkenylsilanes as prepolymers.Type: GrantFiled: February 3, 1995Date of Patent: January 21, 1997Assignee: Mitsui Toatsu Chemicals, IncorporatedInventors: Masayoshi Itoh, Ryo Takeuchi, Kenji Iwata
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Patent number: 5498739Abstract: By reacting a chloromonosilane or chlorodisilane with a halogenated hydrocarbon in a liquid phase in the presence of metallic aluminum or an aluminum alloy, a hydrocarbon group is substituted for at least one chlorine atom of the chlorosilane for introducing hydrocarbon into the chlorosilane. Silanes having a high degree of hydrocarbon substitution can be easily synthesized from chlorosilanes under moderate conditions and with high volumetric efficiency. The reagents used are aluminum or aluminum alloys and halogenated hydrocarbons which are inexpensive and readily available.Type: GrantFiled: December 20, 1994Date of Patent: March 12, 1996Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Takeuchi, Akira Yamamoto, Mikio Endo
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Patent number: 5403943Abstract: The invention provides a novel chloro-terminated polysilane of the formula:Cl[(R.sup.1 R.sup.2 Si).sub.n (R.sup.3 R.sup.4 Si).sub.m ].sub.k Cl(1)wherein R.sup.1, R.sup.2 and R.sup.3 are alkyl and aryl groups, R.sup.4 is a monovalent hydrocarbon group having 2 to 12 carbon atoms selected from substituted and unsubstituted alkyl and aryl groups, n, m and k are numbers in the range: 0.ltoreq.n.ltoreq.10, 0<m.ltoreq.10, n+m.gtoreq.10, and k.gtoreq.1, especially k.gtoreq.5. It is prepared by exposing a high-molecular weight polysilane in chlorinated hydrocarbon to ultraviolet radiation in an inert gas atmosphere.Type: GrantFiled: September 24, 1993Date of Patent: April 4, 1995Assignee: Shin-Etsu Chemical Company, LimitedInventors: Eiichi Tabei, Shigeru Mori
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Patent number: 5386048Abstract: The invention provides silicon substituted fullerene compounds. The compounds can form polymers or wrapped fullerenes. The compounds may be made by reacting an organo-silicon compound with a fullerene in the presence of a catalyst by a hydrosilylation reaction.Type: GrantFiled: November 24, 1993Date of Patent: January 31, 1995Assignee: Wisconsin Alumni Research FoundationInventors: Robert C. West, Kunio Oka
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Patent number: 5374758Abstract: A both end hydro-terminated polysilane is of the formula: H[(R.sup.1 R.sup.2 Si).sub.n (R.sup.3 R.sup.4 Si).sub.m ].sub.k H wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are independently C.sub.1 -C.sub.12 alkyl groups or aryl groups and letters n, m and k are numbers in the range: 0.ltoreq.n.ltoreq.10, 0.ltoreq.m.ltoreq.10, n+m.gtoreq.10, and k.gtoreq.1. It is prepared by dissolving a corresponding chloro-terminated polysilane in a solvent and reducing with LiAlH.sub.4 in an inert gas atmosphere.Type: GrantFiled: July 26, 1993Date of Patent: December 20, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Shigeru Mori, Eiichi Tabei
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Patent number: 5359106Abstract: Terminally reactive polysilanes of formula (1) are novel. ##STR1## R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are independently C.sub.1-12 alkyl or aryl groups, R.sup.5 is an organic group containing an alkoxysilyl, epoxy, glycidyloxy, acryl, methacryl, acetoxysilyl or amino group, A is a C.sub.2-6 alkylene group, n, m and k are numbers in the range: 0.ltoreq.n.ltoreq.10, 0.ltoreq.m.ltoreq.10, n+m.gtoreq.10, and k.gtoreq.1. The polysilanes are prepared by effecting addition reaction between a hydro-terminated polysilane and an unsaturated group-containing reactive compound in the presence of a hydrosilylation catalyst.Type: GrantFiled: December 22, 1993Date of Patent: October 25, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Eiichi Tabei, Shigeru Mori
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Patent number: 5347028Abstract: A composition curable to a thermally reversible rubber comprises(i) a strong acid catalyst having a pK.sub.a of less than about -9,(ii) at least one polycyclosiloxane containing at least one polyfunctional siloxane unit, and(iii) at least one polysiloxane selected from the group consisting of a linear polydimethylsiloxane; a polydimethylcyclosiloxane containing from about 6 to about 50 silicon-oxygen bonds; a linear or cyclic block copolymer of polydimethylsiloxane and a non-siloxane organic polymer; and a linear or cyclic random copolymer of a siloxane of the formula Si(R)(R.sup.1)O wherein R and R.sup.1 are different and are selected from the group consisting of hydrogen, C.sub.1 -C.sub.18 hydrocarbon and C.sub.2 -C.sub.18 hydroxyalkyl,wherein the catalyst comprises from about 0.05 to about 0.5 wt % of the composition, and the concentration of polyfunctional siloxane units is at least about two times the catalyst concentration in the composition, but no more than about 0.27 molar.Type: GrantFiled: December 23, 1993Date of Patent: September 13, 1994Assignee: Temple University of the Commonwealth System of Higher EducationInventors: Mark A. Buese, Pao-Sun Chang
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Patent number: 5336798Abstract: There is disclosed a method for preparing a polysilane oligomer having a terminal SiH group represented by the structural formula (1): ##STR1## wherein R.sup.1 to R.sup.4 are monovalent hydrocarbon groups with proviso that at least one of R.sup.1 to R.sup.4 is an aryl group, n and m are integers of 1 or more, and n+m is equal to 3, 4, 5 or 6 comprising the step of reacting a disilane of the structural formula (2): ##STR2## wherein R.sup.1 to R.sup.4 are as defined above in the presence of a Group VIII transition metal complex catalyst.Type: GrantFiled: March 17, 1993Date of Patent: August 9, 1994Assignee: Shin-Etsu Chemical Company, LimitedInventors: Motoo Fukushima, Shigeru Mori
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Patent number: 5312946Abstract: Siloxane fluids containing novel siloxane polymers prepared from mixtures of disilanes, disiloxanes and silylmethylenes, and a method for recovering fully alkylated linear and cyclic siloxanes with disilane, disiloxane and silylmethylene bonds, such as from methylchlorosilane residue cleavage bottoms, are disclosed.Type: GrantFiled: April 13, 1992Date of Patent: May 17, 1994Assignee: General Electric CompanyInventors: Robert G. Stank, Luisito A. Tolentino, Alan Ritzer, Frank J. Traver
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Patent number: 5302736Abstract: The present invention is a process wherein silanes containing hydrogen atoms bonded directly to silicon are removed from silanes of the general formulaR.sub.x Cl.sub.3-x Si--[SiR.sub.y Cl.sub.2-y ].sub.n --A (I)and mixtures thereof, in which R denotes an optionally halogen-substituted hydrocarbon radical having 1 to 18 carbon atoms which is free from ethylenic double bonds, A denotes a chlorine atom or a radical R, x has the value of 0, 1, 2 or 3, y has the value of 0, 1 or 2 and n has the value of 0 or 1. The silanes containing hydrogen atoms bonded directly to silicon are reacted with hydrogen chloride in the presence of silver or gold as catalysts to give the corresponding chlorosilanes.Type: GrantFiled: November 1, 1993Date of Patent: April 12, 1994Assignee: Wacker-Chemie GmbHInventors: Wilfried Kalchauer, Bernd Pachaly
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Patent number: 5292415Abstract: The invention provides a novel chloro-terminated polysilane of the formula:Cl[(R.sup.1 R.sup.2 Si)n (R.sup.3 R.sup.4 Si)m]kCl (1)wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are alkyl and aryl groups, n, m and k are numbers in the range: 0.ltoreq.n.ltoreq.10, 0.ltoreq.m.ltoreq.10, n+m.gtoreq.10, and k.gtoreq.1, especially k.gtoreq.5. It is prepared by exposing a high-molecular weight polysilane in chlorinated hydrocarbon to ultraviolet radiation in an inert gas atmosphere.Type: GrantFiled: January 21, 1993Date of Patent: March 8, 1994Assignee: Shin-Etsu Chemical Company, LimitedInventors: Shigeru Mori, Eiichi Tabei, Hisashi Umehara
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Patent number: 5286891Abstract: The invention provides a novel hydroxy terminated polysilane of the formula:OH[(R.sup.1 R.sup.2 Si).sub.n (R.sup.3 R.sup.4 Si).sub.m ].sub.k OHwherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are alkyl or aryl groups, n, m and k are numbers in the range: 0.ltoreq.n.ltoreq.10, 0.ltoreq.m.ltoreq.10, n+m.gtoreq.10, and k.gtoreq.1, especially k.gtoreq.5. It is prepared by hydrolyzing a chloro- terminated polysilane.Type: GrantFiled: January 21, 1993Date of Patent: February 15, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Eiichi Tabei, Shigeru Mori
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Patent number: 5258535Abstract: A novel method is proposed for the chlorination of a silicon compound having, in a molecule, at least one hydrogen atom directly bonded to the silicon atom. The method comprises the step of reacting the starting silicon compound with anhydrous copper (II) chloride as a chlorinating agent in the presence of copper (I) iodide as a catalyst so as to substitute a chlorine atom for the silicon-bonded hydrogen atom. When the starting silicon compound has two or more of silicon-bonded hydrogen atoms, the chlorination reaction proceeds stepwise so that the inventive method provides a possibility of selective chlorination.Type: GrantFiled: February 26, 1993Date of Patent: November 2, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Mitsuo Ishikawa, Kunai Atsutaka, Yasushi Yamamoto
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Patent number: 5254707Abstract: The process for preparing a compound of the formula:Cp'YNHRwherein: Cp' is a cyclopentadienyl or a substituted cyclopentadienyl group, Y is a covalent bridging group which contains one or more group 14 elements, and R is a C.sub.1 to C.sub.20 hydrocarbyl or substituted hydrocarbyl group, the process comprising reacting a ligand of the formula Cp'YX, wherein Cp' and Y are as defined above and X is halogen, with a substantially equimolar amount of a primary amine of the formula NH.sub.2 R, wherein R is as defined above, in an inert solvent in the presence of a HX scavenger at an elevated temperature of at least about 35.degree. C., so as to form said compound.Type: GrantFiled: December 7, 1992Date of Patent: October 19, 1993Assignee: Ethyl CorporationInventors: Jamie R. Strickler, John M. Power, Meng-Sheng Ao