Arsenic, Antimony, Or Bismuth Containing (as, Sb, Or Bi) Patents (Class 556/64)
  • Publication number: 20030083373
    Abstract: The present invention features biarsenical molecules. Target sequences that specifically react with the biarsenical molecules are also included. The present invention also features kits that include biarsenical molecules and target sequences. Tetraarsenical molecules are also featured in the invention.
    Type: Application
    Filed: April 19, 2002
    Publication date: May 1, 2003
    Applicant: The Regents of the University of California
    Inventors: Roger Y. Tsien, B. Albert Griffin
  • Publication number: 20020188145
    Abstract: Disclosed are methods of preparing trialkyl Group VA metal compounds in high yield and high purity. Such trialkyl Group VA metal compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities.
    Type: Application
    Filed: April 6, 2002
    Publication date: December 12, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Deodatta V. Shenai-Khatkhate, Michael B. Power, Artashes Amamchyan
  • Publication number: 20020156295
    Abstract: One aspect of the present invention relates to novel ligands for transition metals. A second aspect of the present invention relates to the use of catalysts comprising these ligands in transition metal-catalyzed carbon-heteroatom and carbon-carbon bond-forming reactions. The subject methods provide improvements in many features of the transition metal-catalyzed reactions, including the range of suitable substrates, reaction conditions, and efficiency.
    Type: Application
    Filed: October 23, 2001
    Publication date: October 24, 2002
    Inventors: Stephen L. Buchwald, David W. Old, John P. Wolfe, Michael Palucki, Ken Kamikawa
  • Patent number: 6455717
    Abstract: A method of forming a film on a substrate using one or more complexes containing one or more chelating O- and/or N-donor ligands. The complexes and methods are particularly suitable for the preparation of semiconductor structures using chemical vapor deposition techniques and systems.
    Type: Grant
    Filed: August 28, 2000
    Date of Patent: September 24, 2002
    Assignee: Micron Technology, Inc.
    Inventor: Brian A. Vaartstra
  • Publication number: 20020087018
    Abstract: A liquid precursor for forming a transparent metal oxide thin film comprises a first organic precursor compound. In one embodiment, the liquid precursor is for making a conductive thin film. In this embodiment, the liquid precursor contains a first metal from the group including tin, antimony, and indium dissolved in an organic solvent. The liquid precursor preferably comprises a second organic precursor compound containing a second metal from the same group. Also, the liquid precursor preferably comprises an organic dopant precursor compound containing a metal selected from the group including niobium, tantalum, bismuth, cerium, yttrium, titanium, zirconium, hafnium, silicon, aluminum, zinc and magnesium. Liquid precursors containing a plurality of metals have a longer shelf life. The addition of an organic dopant precursor compound containing a metal, such as niobium, tantalum or bismuth, to the liquid precursor enhances control of the conductivity of the resulting transparent conductor.
    Type: Application
    Filed: November 9, 2001
    Publication date: July 4, 2002
    Applicant: Symetrix Corporation
    Inventors: Jolanta Celinska, Carlos A. Paz de Araujo, Joseph D. Cuchiaro, Jeffrey W. Bacon, Larry D. McMillan
  • Patent number: 6395939
    Abstract: One aspect of the present invention relates to novel reaction conditions that allow the efficient synthesis of diaryl ethers from arenes bearing a leaving group and arenols under relatively mild conditions. Another aspect of the present invention relates to the dramatic effects of acidic activators on Ullmann-type couplings involving electron-poor and/or relatively insoluble substrates.
    Type: Grant
    Filed: October 5, 1998
    Date of Patent: May 28, 2002
    Assignee: Massachusetts Institute of Technology
    Inventors: Jean-Francois Marcoux, Sven Doye, Stephen Buchwald
  • Patent number: 6380277
    Abstract: The present invention relates to iodonium salts containing urethane groups of reduced crystallization tendency, to a process for their preparation, and to their use for the radiation curing of cationically curing compositions.
    Type: Grant
    Filed: September 19, 2000
    Date of Patent: April 30, 2002
    Assignee: Goldschmidt AG
    Inventors: Sascha Oestreich, Andreas Weier, Stefanie Volkmer
  • Patent number: 6306555
    Abstract: Radiation-sensitive compositions comprising (a1) a cationically or acid-catalytically polymerisable or crosslinkable compound or (a2) a compound that increases its solubility in a developer under the action of acid; and (b) at least one diaryliodonium salt of formula I X is branched C3-C20alkyl or C3-C8cycloalkyl; X1 is hydrogen, linear C1-C20alkyl, branched C3-C20alkyl or C3-C8cycloalkyl; with the proviso that the sum of the carbon atoms in X and X1 is at least 4; Y is linear C1-C10alkyl, branched C3-C10alkyl or C3-C8cycloalkyl; A− is a non-nucleophilic anion, selected from the group (BF4)−, (SbF6)−, (PF6)−, (B(C6F5))4−, C1-C20alkylsulfonate, C2-C20haloalkylsulfonate, unsubstituted C6-C10arylsulfonate, camphorsulfonate, and C6-C10arylsulfonate substituted by halogen, NO2, C1-C12alkyl, C1-C12halo-alkyl, C1-C12alkoxy or by COOR1; and R1 is C1-C20alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C1-C12alkyl, C1-C12alkoxy or by halogen; with the
    Type: Grant
    Filed: December 18, 2000
    Date of Patent: October 23, 2001
    Assignee: CIBA Specialty Chemicals Corp.
    Inventors: Reinhard Schulz, Jean-Luc Birbaum, Jean-Pierre Wolf, Stephan Ilg, Hitoshi Yamato, Toshikage Asakura
  • Patent number: 6184418
    Abstract: A method for acylating an aromatic compound, specifically an activated or deactivated aromatic compound, is disclosed. The method is suitable for preparing aromatic ketones. The preparation of a catalyst and novel bismuth compounds is also disclosed. Said aromatic compound acylation method comprises reacting said aromatic compound with an acylating agent in the presence of a catalyst, and is characterised in that the acylation reaction is performed in the presence of an effective amount of at least one bismuth salt of trifluoromethanesulphonic acid.
    Type: Grant
    Filed: January 19, 1999
    Date of Patent: February 6, 2001
    Assignee: Rhodia Chimie
    Inventors: Jacques Dubac, Hafida Gaspard, Mireille Labrouillere, André Laporterie, Jean-Roger Desmurs, Christophe Le Roux
  • Patent number: 6156873
    Abstract: The invention relates to dendrimeric organometallic bismuth compounds (bismuth dendrimers), which can advantageously be used as x-ray contrast media, as well as processes for their production.
    Type: Grant
    Filed: May 7, 1999
    Date of Patent: December 5, 2000
    Assignee: Schering Aktiengesellschaft
    Inventors: Werner Krause, Herbert Schumann
  • Patent number: 6124487
    Abstract: A new family of metallacycles, which are preferably zirconacycles, is characterized by having a unique halogenated substituent. The metallacycles are useful for the preparation of main group heterocycles, especially two novel families of heterocycles. The first new family of heterocycles preferably contains a halosilyl substituent. A preferred group of the second family of novel heterocycles contains a silyl group having a leaving group bonded thereto. The preferred group of these heterocycles is suitable for preparing novel organometallic complexes having a bridged bidentate heterocyclic ligand. These novel organometallic complexes may be used as catalyst components in olefin polymerization. The subject catalyst components are particularly well suited for use in the medium pressure solution process to prepare linear low density polyethylene.
    Type: Grant
    Filed: March 6, 1998
    Date of Patent: September 26, 2000
    Assignee: Nova Chemicals (International) S.A.
    Inventors: Rupert Edward von Haken Spence, Xiaoliang Gao, Linda Koch, Stephen John Brown, Daryll G. Harrison
  • Patent number: 6111124
    Abstract: Anhydrous mononuclear Lewis base adducted tris(.beta.-diketonato) bismuth complexes, useful as precursors for chemical vapor deposition of bismuth, for producing Bi-containing films of significantly improved stoichiometry, morphology and functional character, as compared to films obtained from dinuclear tris(.beta.-diketonato) bismuth complexes of the prior art.
    Type: Grant
    Filed: December 31, 1998
    Date of Patent: August 29, 2000
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Thomas H. Baum, Raymond H. Dubois
  • Patent number: 6005127
    Abstract: An antimony/Lewis base adduct of the formula SbR.sub.3.L, wherein each R is independently selected from C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.8 perfluoroalkyl, C.sub.1 -C.sub.8 haloalkyl, C.sub.6 -C.sub.10 aryl, C.sub.6 -C.sub.10 perfluoroaryl, C.sub.6 -C.sub.10 haloaryl, C.sub.6 -C.sub.10 cycloalkyl, substituted C.sub.6 -C.sub.10 aryl and halo; and L is a Lewis base ligand coordinating with SbR.sub.3. The adducts of the invention are useful as metal source compositions for chemical vapor deposition, assisted chemical vapor deposition (e.g., laser-assisted chemical vapor deposition, light-assisted chemical vapor deposition, plasma-assisted chemical vapor deposition and ion-assisted chemical vapor deposition), ion implantation, molecular beam epitaxy, and rapid thermal processing, to form antimony or antimony-containing films.
    Type: Grant
    Filed: November 24, 1997
    Date of Patent: December 21, 1999
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Michael A. Todd, Thomas H. Baum, Gautam Bhandari
  • Patent number: 5910599
    Abstract: The invention discloses a process of the preparation of antimony glycoloxide which comprises reacting an antimony halide with excess of ethylene glycol and further comprises the addition of a nitrogen compound selected from ammonia, organic amines and heterocyclic nitrogen rings.
    Type: Grant
    Filed: September 11, 1997
    Date of Patent: June 8, 1999
    Inventors: Yoshio Tanaka, Kazuyuki Koide, Hiroyuki Kawabata
  • Patent number: 5908931
    Abstract: The present invention relates particularly to novel preorganized hexadentate ligands that are suitable for completing with a radionuclide, and are useful as general imaging agents for diagnostic purposes.
    Type: Grant
    Filed: December 14, 1990
    Date of Patent: June 1, 1999
    Assignee: Mallinckrodt Inc.
    Inventors: Raghavan Rajagopalan, William L. Neumann, Dennis L. Nosco
  • Patent number: 5886203
    Abstract: A process is provided for the production of metalorganic compounds by reacting a Grignard reagent with a Group II, Group III or Group V metal halide in a tertiary alkyl amine solvent to form a metalorganic adduct, isolating the adduct and dissociating the adduct to leave the metalorganic compound.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: March 23, 1999
    Assignee: Secretary of State For Defence Acting Through His Defence Evaluation & Research Agency
    Inventors: Anthony Copeland Jones, Simon Andrew Rushworth, Trevor Martin, Timothy John Whittaker, Richard William Freer
  • Patent number: 5859274
    Abstract: Anhydrous mononuclear tris(.beta.-diketonato)bismuth complexes, useful as precursors for chemical vapor deposition of bismuth, for producing Bi-containing films of significantly improved stoichiometry, morphology and functional character, as compared to films obtained from dinuclear tris(.beta.-diketonato)bismuth complexes of the prior art.
    Type: Grant
    Filed: October 30, 1997
    Date of Patent: January 12, 1999
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Thomas H. Baum, Gautam Bhandari, Margaret Chappuis
  • Patent number: 5847174
    Abstract: Proposed is a method for the preparation of an ionic polyhalogeno metal complex compound consisting of a tetraalkylammonium cation and a polyhalogeno metal anion, of which the metal is selected from those having an atomic valency of 1 and a coordination number of 2, those having an atomic valency of 3 and a coordination number of 4 and those having an atomic valency of 2 and a coordination number of 4. The method comprises the steps of: dissolving a tetraalkylammonium halide and elementary halogen in a stoichiometric proportion corresponding to the chemical composition of the desired complex compound in an organic solvent to form a solution; dissolving, in the solution, the metal in an amount larger than the stoichiometric amount so as to be dissolved in the solution forming the complex compound in the reaction mixture; removing the undissolved metal from the reaction mixture to give a solution of the complex compound; and isolating the complex compound from the solution.
    Type: Grant
    Filed: September 26, 1996
    Date of Patent: December 8, 1998
    Assignee: Agency of Industrial Science and Technology
    Inventor: Yukimichi Nakao
  • Patent number: 5629355
    Abstract: The invention is a polymeric photoinitiator having the formula: ##STR1## wherein n=10 to 50; each of a and b may be 0-4 while c is 0-5; A is an alkyl or aryl group; X is an anion; and each of R, R', and R" is independently H or one or more groups substituted onto the respective phenyl moieties. The substituted groups are independently selected from various kinds of groups excluding basic groups such as amino groups. Preferably, they are a hydrogen atom, halogen atom (e.g., F, Cl, Br, and I) , nitro group, alkoxy group (e.g. , CH.sub.3 O-- and C.sub.2 H.sub.5 O--) , C.sup.1 -C.sub.18 aliphatic group (e.g., hydrocarbon group such as CH.sub.3 --, C.sub.2 H.sub.5 --, and (CH.sub.3).sub.2 CH--; cyclic hydrocarbon group such as cyclohexyl group; and those which contain a heteroatom in the main chain or substituent group. The substituted groups may also be a C.sub.1 -C.sub.18 aliphatic group having at least one hydroxyl group or a C.sub.3 -C.sub.19 aliphatic group having a group of --OCH.sub.2 CH.sub.2 O--.
    Type: Grant
    Filed: May 29, 1996
    Date of Patent: May 13, 1997
    Assignee: International Business Machines Corporation
    Inventor: Joseph P. Kuczynski
  • Patent number: 5616312
    Abstract: The present invention provides new and structurally diverse compositions comprising compounds of the general formula: ##STR1## Wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, and R.sup.5 are the same or different and are --CO--(CH.sub.2).sub.y --SH, --(CH.sub.2).sub.2 --SH, --SO.sub.2 --(SH.sub.2).sub.t --SH,--SH,--(CH.sub.2).sub.q --COOH, and --(CH.sub.2).sub.v --CONR.sup.6 R.sup.7, provided at least one of R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 is a sulfur containing moiety; n is 0 to about 10; i is 2 to about 5; j is 2 to about 5; y is 1 to about 5; z is 1 to about 6; t is 1 to about 5; q is 1 to about 5; v is 1 to about 5; R.sup.6 is H, alkyl, hydroxyalkyl, polyhydroxyalkyl, arylalkyl or alkoxyalkyl; R.sup.7 is H, alkyl, hydroxyalkyl, polyhydroxyalkyl, arylalkyl or alkoxyalkyl; and R.sup.7 can be polyamine when R.sup.6 is H.Methods for imaging using compositions of the invention are also provided.
    Type: Grant
    Filed: March 10, 1995
    Date of Patent: April 1, 1997
    Assignee: Mallinckrodt Medical, Inc.
    Inventor: Leonard O. Rosik
  • Patent number: 5612082
    Abstract: Metals are reacted in a first solvent, such as 2-methoxyethanol, to form an initial precursor comprising metal-oxide compounds dissolved in the first solvent. A second solvent, such as xylene, that does not react with the metal is added to the solution and the solution heated to distill away the first solvent and form a final precursor. The final precursor is spin-coated on an integrated circuit substrate then dried and annealed to form a thin film of a metal oxide. For metal oxides including bismuth, the bismuth precursor is added to a cold initial precursor and the final precursor is not heated after the bismuth precursor is added. The second solvent wets the substrate better than the first solvent and has a better viscosity for spin-coating, thus resulting in a denser thin film with fewer imperfections.
    Type: Grant
    Filed: July 26, 1994
    Date of Patent: March 18, 1997
    Assignees: Symetrix Corporation, Matsushita Electronics Corporation
    Inventors: Masamichi Azuma, Michael C. Scott, Carlos A. Paz de Araujo, Larry D. McMillan
  • Patent number: 5585468
    Abstract: This invention relates to chelating agents useful for coupling metal ions to biologically active molecules. In particular, substantial thioureas for chelating metals such as technetium are provided that can be conjugated to a targeting molecule such as an antibody, a peptide or a protein.
    Type: Grant
    Filed: June 27, 1994
    Date of Patent: December 17, 1996
    Assignee: Cytogen Corporation
    Inventors: Daniel J. Coughlin, Benjamin A. Belinka, Jr.
  • Patent number: 5585507
    Abstract: A photoresist composition containing an alkylsulfonium salt compound represented by the following general formula (I): ##STR1## Wherein R.sup.1 and R.sup.2 may be the same or different, each being a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, R.sup.3 is a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, a C.sub.5 to C.sub.7 2-oxocycloalkyl radical, or a linear or branched C.sub.3 to C.sub.8 2-oxoalkyl radical, and Y.sup.- represents a counter ion. The photoresist composition has high transparency to deep U.V. light having wavelengths of 220 nm or less and is capable of forming good fine patterns with high sensitivity, thus being useful as chemically amplified type resist which is exposed to the deep U.V. light from an ArF excimer laser.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: December 17, 1996
    Assignee: NEC Corporation
    Inventors: Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa
  • Patent number: 5550171
    Abstract: The invention is a polymeric photoinitiator having the formula: ##STR1## wherein n=10 to 50; each of a and b may be 0-4 while c is 0-5; A is an alkyl or aryl group; X is an anion; and each of R, R', and R" is independently H or one or more groups substituted onto the respective phenyl moieties. The substituted groups are independently selected from various kinds of groups excluding basic groups such as amino groups. Preferably, they are a hydrogen atom, halogen atom (e.g., F, Cl, Br, and I), nitro group, alkoxy group (e.g., CH.sub.3 O-- and C.sub.2 H.sub.5 O--), C.sup.1 -C.sub.18 aliphatic group (e.g., hydrocarbon group such as CH.sub.3 --, C.sub.2 H.sub.5 --, and (CH.sub.3).sub.2 CH--; cyclic hydrocarbon group such as cyclohexyl group; and those which contain a heteroatom in the main chain or substituent group. The substituted groups may also be a C.sub.1 -C.sub.18 aliphatic group having at least one hydroxyl group or a C.sub.3 -C.sub.19 aliphatic group having a group of --OCH.sub.2 CH.sub.2 O--.
    Type: Grant
    Filed: May 31, 1995
    Date of Patent: August 27, 1996
    Assignee: International Business Machines Corporation
    Inventor: Joseph P. Kuczynski
  • Patent number: 5534557
    Abstract: The composition of the present invention is excellent in compatibility, transparency and curability and give a cured coat of excellent gloss and of less smell, and cured products of excellent properties can be obtained by curing the composition.The present invention relates to an onium salt represented by the following formula (1): ##STR1## wherein Ar is a mono- to tetra-valent aromatic group, X is a bisphenylsulfonio group which may have a substituent, a is 1-4, b is 0 or 1-3, a+b is 1-4, n is 1-4, and Z is a halide represented by the following formula (3): ##STR2## where M is a boron atom, a phosphorus atom, an arsenic atom or an antimony atom, Q is a halogen atom, m is 3-6, l is 0 or 1, and m+l is 4-6; a photopolymerization initiator containing the onium salt as an active ingredient; an energy ray-curable composition containing the initiator; and a cured product.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: July 9, 1996
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Tetsuya Abe, Kazuhiko Ishii, Minoru Yokoshima
  • Patent number: 5470994
    Abstract: Sulfonium and oxysulfonium salts, useful as photoinitiators, have directly attached to the sulfur atom thereof:at least one aromatic or heterocyclic aromatic substituent containing at least 14 aromatic atoms and having a removable positive hydrogen ion, said substituent exhibiting a higher energy occupied molecular orbital than at least one other substituent directly attached to said sulfur atom;and at least one substituent comprising an electron withdrawing group and exhibiting a lower energy unoccupied molecular orbital than at least one other substituent directly attached to said sulfur atom;said salt being capable, upon exposure to visible radiation, of undergoing irreversible intramolecular rearrangement to form a Bronsted acid comprising the anion of said salt and said removable positive hydrogen ion.
    Type: Grant
    Filed: April 5, 1990
    Date of Patent: November 28, 1995
    Assignee: Eastman Kodak Company
    Inventors: Franklin D. Saeva, David T. Breslin
  • Patent number: 5468890
    Abstract: The invention concerns iodonium salts of the general formula A-I.sup.+ --B X.sup.-, in which A is a group of the general formula ##STR1## in which C is a monovalent aromatic hydrocarbon group with 6 to 14 carbon atoms or a monovalent aromatic hydrocarbon group containing at least one oxygen and/or sulphur atom and with 5 to 14 atoms in the aromatic ring, D, E and F are each substituents of C, D being a group of the formula --(O).sub.x --(R).sub.y --SiR1/3, E being a group of the formula --OR.sup.2, F being a group of the formula --R.sup.3, a being 1, 2, or 3, b being 0, 1 or 2, c being 0, 1 or 2, x being 0 or 1 and y being 0 or 1, and R, R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1; B is a group of the formula ##STR2## in which E and F, which are as defined above, may each be bound to the 2, 3, 4, 5 or 6 position in the benzene ring, d is 0, 1 or 2, e is 0, 1 or 2 and X.sup.- is a tosylate anion or a weakly nucleophilic or non-nucleophilic anion Y.sup.- selected from the group comprising CF.sub.
    Type: Grant
    Filed: June 8, 1994
    Date of Patent: November 21, 1995
    Assignee: Wacker-Chemie GmbH
    Inventors: Christian Herzig, Silke Scheiding
  • Patent number: 5466845
    Abstract: The present invention provides photoactive sulfonium salts which can be employed as photoinitiators for the polymerization of cationically polymerized organic substances and are soluble in these substances.
    Type: Grant
    Filed: October 20, 1994
    Date of Patent: November 14, 1995
    Assignee: Wacker-Chemie GmbH
    Inventor: Christian Herzig
  • Patent number: 5399596
    Abstract: The oxyphenylbenzylalkyl sulfonium polyfluoro(sub)metal salts are novel compounds, which can be produced by way of an anion exchanging process, which compounds have an effect as an initiator capable of polymerizing cationically polymerizable material such as an epoxy monomer or styrene monomers by means of radiation rays such as light or electron rays and/or heat in a short period of time.
    Type: Grant
    Filed: August 5, 1993
    Date of Patent: March 21, 1995
    Assignee: Sanshin Kagaku Kogyo Co., Ltd.
    Inventors: Katsushige Kouge, Tatsuya Koizumi, Takeshi Endo
  • Patent number: 5326856
    Abstract: This invention relates to chelating agents useful for coupling metal ions to biologically active molecules. In particular, isothiocyanate derived thiocarbonyls for chelating metals such as technetium are provided that can be conjugated to a targeting molecule such as an antibody, a peptide or a protein.
    Type: Grant
    Filed: April 9, 1992
    Date of Patent: July 5, 1994
    Assignee: Cytogen Corporation
    Inventors: Daniel J. Coughlin, Benjamin A. Belinka, Jr.
  • Patent number: 5274148
    Abstract: This invention relates to C.sub.14 to C.sub.20 alkoxy monophenyl sulfonium salt initiators having the formula ##STR1## wherein R is C.sub.14 to C.sub.20 alkyl; R.sub.1 and R.sub.2 are each independently C.sub.4 to C.sub.20 alkyl and X.sup.- is a non-basic, nonnucleophilic anion, which initiators are employed in the polymerization of mono- and poly- functional glycidyl ethers, alpha-olefin oxides and vinyl monomers or oligomers.
    Type: Grant
    Filed: August 10, 1992
    Date of Patent: December 28, 1993
    Assignee: ISP Investments, Inc.
    Inventors: James A. Dougherty, James V. Crivello
  • Patent number: 5247113
    Abstract: Sulfonium salts of the formulae I to IV ##STR1## in which A is C.sub.1 -C.sub.12 alkyl, C.sub.3 -C.sub.8 cycloalkyl, C.sub.4 -C.sub.10 cycloalkylalkyl, phenyl which is unsubstituted or mono- or polysubstituted by C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.4 alkoxy, halogen, nitro, phenyl, phenoxy, alkoxycarbonyl having 1-4 C atoms in the alkoxy radical or acyl having 1-12 C atoms, Ar, Ar.sup.1 and Ar.sup.2, independently of one another, are each unsubstituted or mono- or polysubstituted phenyl, or naphthyl which is unsubstituted or mono- or polysubstituted each arylene is an unsubstituted or mono- or polysubstituted phenylene or unsubstituted or mono- or polysubstituted naphthylene and Q.sup..crclbar. is SbF.sub.6.sup.-, AsF.sub.6.sup.- or SbF.sub.5 OH.sup.- are valuable curing agents and curing accelerators in the heat-curing of cationically polymerizable compounds, preferably epoxy resins.
    Type: Grant
    Filed: January 7, 1991
    Date of Patent: September 21, 1993
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Roth, Beat Muller
  • Patent number: 5235078
    Abstract: The invention relates to heterocyclic organometallic compounds formula I below and to the use thereof for the production of thin films and layers on substrates by gas phase deposition.
    Type: Grant
    Filed: December 12, 1990
    Date of Patent: August 10, 1993
    Assignee: Merck Patent Gesellschaft mit Beschrankter Haftung
    Inventors: Ludwig Pohl, Martin Hostalek, Matthias Lokai
  • Patent number: 5202493
    Abstract: Chiral tridentate bis(phospholanes) which coordinate as ligands in a meridinal fashion on an octahedral metal or which coordinate in square-planar environments are provided with a method for their preparation.
    Type: Grant
    Filed: April 26, 1991
    Date of Patent: April 13, 1993
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Mark J. Burk
  • Patent number: 5177233
    Abstract: A catalyst system for the preparation of 1,2-dichloroethane by reacting ethylene and chlorine in a solvent, if desired, in the presence of an inhibitor for reducing the formation of byproducts. The catalyst system comprises a phenolate/chlorine complex. The invention also relates to a process for the chlorination of ethylene using indicated catalyst system.
    Type: Grant
    Filed: April 17, 1991
    Date of Patent: January 5, 1993
    Assignee: Wacker Chemie GmbH
    Inventors: Ludwig Schmidhammer, Klaus Haselwarter, Hermann Klaus, Gerhard Dummer, Klaus-Peter Mohr
  • Patent number: 5159088
    Abstract: Novel sulfonium salts suitable for use as photoinitiators for cationic polymerization and for photoresists have the general formula (I) ##STR1## where X is 1, 2 or 3,R is a hydrocarbon radicalR.sup.1 is hydrogen, alkyl, alkoxy, halogen or nitro,R.sup.2 is a monovalent radical containing more than 6 carbon atoms,Y is a single bond or a bridge member andA.sup..crclbar. is a non-nucleophilic counterion.
    Type: Grant
    Filed: July 12, 1990
    Date of Patent: October 27, 1992
    Assignee: BASF Aktiengesellschaft
    Inventor: Reinhold Schwalm
  • Patent number: 5144051
    Abstract: Disclosed are C.sub.6 to C.sub.11 branched chain alkoxy monosubstituted diaryl iodonium salts, such as [4-(2-ethylhexyloxy)phenyl]phenyliodonium hexafluoroantimonate. These diaryl iodonium salts are useful as photoinitiators for epoxy containing compounds, especially epoxysilanes.
    Type: Grant
    Filed: May 29, 1990
    Date of Patent: September 1, 1992
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Carl R. Kessel, Ellen O. Aeling
  • Patent number: 5126473
    Abstract: A process is described for the hydrided of halogen-substituted compounds of the second to fourth period of Groups III to V of the periodic system, with the exception of gallium, aluminum, carbon, or nitrogen. A finely-granulated aluminum is added to a molten salt melt that consists of 50-67 molar % AlCl.sub.3 (anhydrous) and 50 to 33 molar % of sodium chloride. Then to the stirred, or by some other means dispersed suspension, hydrogen is introduced to hydrided the finely-dispersed aluminum. Thereafter the mixture is reacted with the halogen-substituted compound and the resulting hydrided compound is renewed.
    Type: Grant
    Filed: August 10, 1990
    Date of Patent: June 30, 1992
    Assignee: Degussa Aktiengesellschaft
    Inventors: Hans-Juergen Klockner, Ralf Schmoll, Peter Panster, Peter Kleinschmit
  • Patent number: 5117019
    Abstract: A class of new oxide structures containing octahedral molybdenum and tetrahedral phosphorous has been generated using hydrothermal techniques. These materials are produced by the reaction of a molybdenum oxide source with phosphate and any one, or combination of organic cation/alkali-metal cation/organic amine as a templating/mineralizing agent. A reducing agent is necessary to convert the Mo(VI) to a lower valent form and can be either added to the reaction mixture or is provided in the form of one of the reactants.
    Type: Grant
    Filed: January 31, 1991
    Date of Patent: May 26, 1992
    Assignee: Exxon Research and Engineering Company
    Inventors: Robert C. Haushalter, Linda A. Mundi
  • Patent number: 5101053
    Abstract: Radiation sensitive sulfonium salts which contain (1) a sulfonium initiator portion, (2) a spacer portion, and (3) a reactive group portion. The spacer portion has the formula "-o-w- x-z-" wherein "w" is a single bond or one of --C(O)--, --C(O)O--, --C(O)S--, --C(O)NH-- --C(O)N(alkyl)--, --C(S)--, --C(S)S--,--S(O)--, --S(O)(O)--, or --S(O)(O)O--; "X" is an unsubstituted or substituted alkylene radical; and "Z" is --O--, --NH--, --N(C,--C.sub.6 -alkyl)--, or --N(phenyl)--. The reactive group portion is --CH.dbd.CH.sub.2 or --C(O)--C(Y).dbd.CH.sub.2 wherein "Y" is H, C.sub.1 -.sub.6 -alkyl, or phenyl. The sulfonium salts find use in curing monomers which can be subjected to cationic polymerization.
    Type: Grant
    Filed: January 9, 1990
    Date of Patent: March 31, 1992
    Assignee: BASF Aktiengesellschaft
    Inventor: Andreas Boettcher
  • Patent number: 5084128
    Abstract: This invention relates to a low-temperature process for the preparation of group III-group V semiconducting material. More particularly, in the present process at least one group III compound is reacted with at least one group V compound in an aprotic solvent to form a precursor, which is then heated to form the semiconducting material.
    Type: Grant
    Filed: October 23, 1990
    Date of Patent: January 28, 1992
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Ralph T. Baker
  • Patent number: 5079378
    Abstract: A highcarbon-containing diaryliodonium initiator for cationic polymerization which possesses enhanced solubility characteristics over conventional diaryliodonium initiators. By the disclosed process, a novel photo/thermal initiator is obtained which is uniquely characterized by the concatenation of a long chain ester with an aryl group, resulting in a total number of carbon atoms in the entire moiety attached to the iodine atom in excess of 20.
    Type: Grant
    Filed: July 27, 1990
    Date of Patent: January 7, 1992
    Assignee: Polyset Corporation
    Inventor: James V. Crivello
  • Patent number: 5073643
    Abstract: Synthesis use of a new class of diaryliodonium salt photo and thermal polymerization initiators in which the aryl groups are substituted with alkoxy group bearing hydroxy groups. Good to excellent yields are obtained of diaryliodonium salts in which the aryl groups are substituted with long chain alkoxy groups, which alkoxy groups also possess at least one hydroxyl moiety attached at the 2-position of an alkoxy group. The resultant salts have enhanced solubility when compared with their lower molecular weight counterparts. The hydroxyl groups serve as chain transfer agents; and, in cross linking UV-induced cationic polymerizations, the hydroxyl groups effect marked accelertion on polymerization rates. The salts also have excellent compatability with nonpolar monomers such as epoxidized oil and poly(1,2-butadience oxide) and provide further benefits when they are used along with copper cocatalysts in thermally curable polymer systems.
    Type: Grant
    Filed: August 30, 1990
    Date of Patent: December 17, 1991
    Assignee: Polyset Corporation
    Inventor: James V. Crivello
  • Patent number: 5070214
    Abstract: Disclosed is an organic material with a very narrow electronic spin resonance (ESR) line. This material is formed by a 1, 2, 7, 8-tetrahydrocyclopentataperylene salt which may have, advantageously, undergone a heat treatment. The material can be applied to the fabrication of probes for gaussmeters and magnetometers.
    Type: Grant
    Filed: May 30, 1989
    Date of Patent: December 3, 1991
    Assignee: Thomson CSF
    Inventors: Paul Penven, Philippe Michel, Denis Jerome, Alexandre Moradpour
  • Patent number: 5068370
    Abstract: Preparation of the novel monomeric compounds of the formula (t-Bu).sub.2 ME(t-Bu).sub.2, where M is Ga, Al, or In and E is As, P, Sb, or N, by reaction of (t-Bu).sub.2 MCl and LiE(t-Bu).sub.2. The resulting product (t-Bu).sub.2 ME(t-Bu).sub.2 can be pyrolyzed to form crystalline films of the metallic material, ME.
    Type: Grant
    Filed: June 8, 1990
    Date of Patent: November 26, 1991
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventor: Kelvin T. Higa
  • Patent number: 5068372
    Abstract: Disclosed is a method for producing, from an aqueous basic composition, a primary arsine having one hydrocarbyl group bonded directly to As, the basic composition having been obtained from the combination of components comprising an alkali metal arsenite and a reactive hydrocarbyl halide by combining the aqueous composition with an acidic, nascent hydrogen-generating reducing agent to produce the primary arsine directly from the aqueous composition without isolation of the primary arsonic acid intermediate.
    Type: Grant
    Filed: July 16, 1990
    Date of Patent: November 26, 1991
    Assignee: CVD Incorporated
    Inventors: Ravindra K. Kanjolia, Benjamin C. Hui
  • Patent number: 5047568
    Abstract: Sulfonium salts of the formula: ##STR1## wherein Ar is a fused aromatic radical; R.sub.1 is a divalent organic bridge; each R.sub.2 and R.sub.3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided thatn not more than one of R.sub.2 and R.sub.3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
    Type: Grant
    Filed: November 18, 1988
    Date of Patent: September 10, 1991
    Assignee: International Business Machines Corporation
    Inventors: Raymond W. Angelo, Jeffrey D. Gelorme, Joseph P. Kuczynski, William H. Lawrence, Socrates P. Pappas, Logan L. Simpson
  • Patent number: 5047567
    Abstract: A solid composition of matter comprising heteropolyoxo vanadium oxide compounds of the general formula: (R'.sub.4 N).sub.x H.sub.y (VO.sub.b).sub.a (RQO.sub.3).sub.-- nH.sub.2 O) wherein (VO.sub.b).sub.a (RQO.sub.3) is a molecular anion; R' is a substituted or unsubstituted monovalent organic group covalently bound to nitrogen to form a tetraorgano ammonium cation (R'.sub.4 N); R is a substituted or unsubstituted monovalent organic group covalently bound to Q to form an organophosphorus or organoarsenous group; R and R' are selected from the group consisting of C.sub.1 -C.sub.20 alkyl, aryl, hetero alkyl, hetero aryl or mixtures thereof; Q is a phosphorus or arsenic atom; a is about 1.0 to about 3.0; b is about 1.0 to about 2.0; (x+y) are determined by the vanadium oxidation state (m) where (x+y) equals (2ab+2)-ma and where (x+y) and x can not equal zero; and n is zero or a positive number.
    Type: Grant
    Filed: September 17, 1990
    Date of Patent: September 10, 1991
    Assignee: Exxon Research & Engineering Company
    Inventors: Guohe Huan, Allan J. Jacobson
  • Patent number: 5021598
    Abstract: An improved process for making a bismuth carboxylate is disclosed which generally comprises (A) heating an anhydrous reaction mixture comprising a carboxylic acid or anhydride, bismuth metal, and hydrazine to a temperature of from about 80.degree. C. up to, but not including, the temperature of decomposition of any reactant, hydrazine, or the desired bismuth carboxylate, (B) bubbling an oxygen-containing gas through the reaction mixture during (A), and (C) removing water formed during (B) from the reaction mixture. Bismuth carboxylate compositions are also disclosed which contain at least 70 equivalents of a bismuth carboxylate derived from at least one carboxylic acid or anhydride having from about 6 to about 20 carbon atoms, the composition having a viscosity of not more than 1000 centipoise at 25.degree. C.
    Type: Grant
    Filed: July 24, 1989
    Date of Patent: June 4, 1991
    Assignee: Mooney Chemicals, Inc.
    Inventors: Prabodh K. Patnaik, Paul L. Cells
  • Patent number: 5021597
    Abstract: Novel acrylic acid salts of formula ##STR1## wherein R represents a hydrogen or a halogen atom, a C.sub.1-4 alkyl, a C.sub.1-4 alkoxy or a nitro group,M represents a cation derived from bismuth, zinc or a pharmaceutically acceptable organic base,X represents an inorganic anion,n is an integer of from 0 to 2,m is an integer of from 1 to 3,p is 0 or 1, andr is an integer of from 0 to 6having cytoprotective and antiulcer activities are provided. A process is also described for the preparation of said compounds.
    Type: Grant
    Filed: July 11, 1990
    Date of Patent: June 4, 1991
    Assignee: Richter Gedeon Vegyeszeti Gyar Rt.
    Inventors: Tamas Fodor, Janos Fischer, Laszlo Dobay, Ferenc Trischler, Elemer Ezer, Judit Matuz, Katalin Saghy, Laszlo Szporny, Gyorgy Hajos