Sulfur Containing Patents (Class 568/18)
  • Patent number: 7235697
    Abstract: The present invention relates to a process for preparing sulfur-containing compounds of the general formula I in which Q, R1 and R2 are each independently defined as follows: Q: —S— or —S—S—, R1: hydrogen or saturated or unsaturated, linear or branched C1-C30-alkyl radical, R2: hydrogen or saturated or unsaturated, linear or branched C1-C30-alkyl radical, where R1 and R2 are not simultaneously hydrogen, by reacting a mixed gas stream comprising hydrogen sulfide, with or without oxygen, with linear or branched C1-C30-olefins, which comprises carrying out the reaction in the presence of water and carbon dioxide at a pressure of from 2 to 325 bar.
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: June 26, 2007
    Assignee: BASF Aktiengesellschaft
    Inventors: Christian Müller, Markus Weber, Eckhard Stroefer
  • Patent number: 7183440
    Abstract: A compound of formula (I) or (II): wherein A is hydrogen or CR1R2; Y and Z are each, independently, hydrogen or a halogen; X is —NR4R5, or R7; R1 is hydrogen, or a substituted or unsubstituted alkyl or alkenyl group containing 1–4 carbon atoms; when X is —NR4R5, R2 is a substituted or unsubstituted alkyl, alkenyl, alkynyl, aryl, aralkyl aralkenyl, or aralkynyl group, that optionally includes at least one heteroatom in its carbon skeleton and contains 1–12 carbon atoms; when X is R7, R2 is an unsubstituted alkyl, alkenyl or alkynyl group, or a substituted or unsubstituted aryl, aralkyl aralkenyl, or aralkynyl group, that optionally includes at least one heteroatom in its carbon skeleton and contains 1–12 carbon atoms; R3 is a substituted or unsubstituted alkyl, alkenyl, alkynyl, aryl, aralkyl aralkenyl, or aralkynyl group, that optionally includes at least one heteroatom in its carbon skeleton and contains 1–12 carbon atoms; R4 is hydrogen, a substituted or unsubstituted alkyl, alkenyl, alkynyl, aryl, aralkyl
    Type: Grant
    Filed: February 7, 2005
    Date of Patent: February 27, 2007
    Assignee: Charterhouse Therapeutics Ltd
    Inventors: Stanley Michael Roberts, Maria Gabriella Santoro, Vasudev Jadhav, Alan Michael Happe, Jérôme Dauvergne
  • Patent number: 7148383
    Abstract: The invention is directed to aromatic vinyl sulfide compounds of general formula A(—S—CH?CH2)z, wherein z is in the range of 1–4 and A represents highly halogenated and highly halogenated-deuterated phenyl, biphenyl and naphthalene compounds; highly halogenated and highly halogenated-deuterated biphenyl ethers and thioethers; and highly halogenated and highly halogenated-deuterated unsaturated 5- and 6-member heterocyclic ring systems containing carbon and at least one heteroatom selected from the group consisting of nitrogen, oxygen and sulfur. The aromatic vinyl sulfide compounds of the invention can be used to prepare elements and devices suitable for use in optical communications.
    Type: Grant
    Filed: June 14, 2005
    Date of Patent: December 12, 2006
    Assignee: Corning Incorporated
    Inventors: Thomas M. Leslie, Helen Samson
  • Patent number: 7101918
    Abstract: The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, Useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provides a hybrid type onium salt shown by the general formula [1]: and R4 is an alkyl group, an alkenyl group, an aryl group or an aralkyl group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted or a group shown by the general formula [2]: and a polymerization initiator or an acid generator, comprising said onium salt.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: September 5, 2006
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Masami Ishihara, Tsuneaki Maesawa, Yoji Urano
  • Patent number: 7091292
    Abstract: Ligands, compositions, metal-ligand complexes and arrays with substituted bridged bis-biaromatic ligands, and methods of making and using the same, are disclosed that are useful in the catalysis of transformations such as the polymerization of monomers into polymers. The catalysts have high performance characteristics, including higher comonomer incorporation into ethylene/olefin copolymers, where such olefins are for example, 1-octene, propylene or styrene. The catalysts also polymerize propylene into isotactic polypropylene.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: August 15, 2006
    Assignee: Symyx Technologies, Inc.
    Inventors: Thomas Boussie, Oliver Bruemmer, Gary M. Diamond, Anne M. LaPointe, Margarete K. Leclerc, Cynthia Micklatcher, Pu Sun, Xiaohong Bei
  • Patent number: 7087764
    Abstract: A process for producing a compound of the formula (II): wherein Hal1 represents halogen and R1 and R2 each independently represents halogen, alkyl, alkoxy, nitro or cyano, which comprises allowing a halogenating agent to react with a compound of the formula (I): wherein Alk represents branched alkyl and R1 and R2 are as defined above.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: August 8, 2006
    Assignee: Shionogi & Co., Ltd.
    Inventors: Tsutomu Aoki, Toshiro Konoike
  • Patent number: 7081467
    Abstract: The present invention is directed C2-disubstituted indan-1-ones of the Formula I, physiologically acceptable salts, and physiologically functional derivatives thereof, and pharmaceutical compositions comprising such compounds, salts and derivatives, which are useful for reducing weight, for the prophylaxis or treatment of obesity, and for the prophylaxis or treatment of type II diabetes in mammals. The invention is directed also to methods for reducing weight and such treatments and prophylaxis. The invention is directed also to processes for the preparation of such compounds.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: July 25, 2006
    Assignee: Sanofi-aventis Deutschland GmbH
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias Gossel
  • Patent number: 7067322
    Abstract: Disclosed are methods for making surface plasmon resonance-capable arrays wherein molecules, such as proteins or nucleic acids, or cells, are adhered to a metal substrate. The metal substrates are modified by depositing an ?-modified alkanethiol monolayer to the substrate and then contacting the ?-modified monolayer with a heterobifunctional linking compound. Biomolecules or cells can then be attached to the heterobifunctional linking compound. Also disclosed are arrays wherein glutathione-containing molecules are immobilized on the substrate and GST-containing molecules are then specifically immobilized onto the substrate, taking advantage of the affinity between glutathione and GST.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: June 27, 2006
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Robert M. Corn, Emily A. Smith, Bernard Weisblum, Matthew G. Erickson, Andrew T. Ulijasz, Matthew J. Wanat
  • Patent number: 7060858
    Abstract: It is an object of the invention to provide a method which makes it possible to manufacture the desired sulfonium salts directly without using a metathesis process and without using acids in large excess amounts. An aryl compound (A) in which a hydrogen atom is bonded to at least one of the carbon atoms of the aryl group, and a sulfoxide compound (B) which can be expressed by the formula: R1 SO R2 (where R1 and R2 indicate hydrocarbon groups or heterocyclic groups which may be substituted, and which may be the same or different) are reacted in the presence of a strong acid (C) which can be expressed by the formula: HMXmYn (where M indicates an element of group IIIa or group Va of the periodic table, X indicates a halogen atom, Y indicates a hydroxyl group, m and n are integers which are such that m+n=4 and n=0 to 3 in cases where M is an element of group IIIa, and m and n are integers which are such that m+n=6 and n=0 to 2 in cases where M is an element of group Va).
    Type: Grant
    Filed: December 17, 2001
    Date of Patent: June 13, 2006
    Assignee: San-Apro Limited
    Inventors: Masashi Date, Hideki Kimura, Jiro Yamamoto
  • Patent number: 7041853
    Abstract: It is an object of the present invention to provide a process for producing highly pure 4-bromothioanisole, which is useful in the manufacture of medicinal chemicals, agrochemicals or functional materials, in a simple and industrially advantageous manner. The present invention is related to a process for producing 4-bromothioanisole which comprises adding an alcoholic solvent to a 4-bromothioanisole-containing product resulting from the reaction of thioanisole with bromine to cause crystallization of 4-bromothioanisole.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: May 9, 2006
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Kenichi Wakimura, Hitoshi Karino, Hirokazu Kagano
  • Patent number: 7033727
    Abstract: A photosensitive composition of the present invention has excellent sensitivity and pattern profile, which comprises an acid generator having a specific structure.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: April 25, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kunihiko Kodama
  • Patent number: 7018840
    Abstract: The present invention is directed, in part, to fluorescent metal sensors for detecting metal ions, and methods of making and using the same.
    Type: Grant
    Filed: April 17, 2002
    Date of Patent: March 28, 2006
    Assignee: Massachusetts Institute of Technology
    Inventors: Stephen J. Lippard, Shawn Burdette
  • Patent number: 6982353
    Abstract: The present invention is directed to C2-disubstituted indan-1-ol systems of the Formula I, physiologically acceptable salts and physiologically functional derivatives thereof, and pharmaceutical compositions comprising such compounds, salts, and derivatives, which are useful for reducing weight, for the prophylaxis or treatment of obesity, and for the prophylaxis or treatment of type II diabetes in mammals. The invention is directed also to methods for reducing weight and such treatments and prophylaxis. The invention is directed also to processes for the preparation of such compounds.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: January 3, 2006
    Assignee: Aventis Pharma Deutschland GmbH
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias G ssel
  • Patent number: 6933412
    Abstract: The invention is directed to aromatic vinyl sulfide compounds of general formula A(—S—CH?CH2)z, wherein z is in the range of 1-4 and A represents highly halogenated and highly halogenated-deuterated phenyl, biphenyl and naphthalene compounds; highly halogenated and highly halogenated-deuterated biphenyl ethers and thioethers; and highly halogenated and highly halogenated-deuterated unsaturated 5- and 6-member heterocyclic ring systems containing carbon and at least one heteroatom selected from the group consisting of nitrogen, oxygen and sulfur. The aromatic vinyl sulfide compounds of the invention can be used to prepare elements and devices suitable for use in optical communications.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: August 23, 2005
    Assignee: Corning Incorporated
    Inventors: Thomas M. Leslie, Helen Samson
  • Patent number: 6921622
    Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions containing the same. The photoresist polymer includes a repeating unit comprising the photoresist monomer of Formula 1 as a comonomer and the photoresist composition containing the same have excellent etching resistance, heat resistance and adhesiveness to a wafer, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution.
    Type: Grant
    Filed: January 22, 2002
    Date of Patent: July 26, 2005
    Assignee: Hynix Semiconductor Inc.
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin
  • Patent number: 6919380
    Abstract: Derivatives of C2-substituted indan-1-ol compounds of formula I: its physiologically acceptable salts, and its physiologically functional derivatives for the prophylaxis or treatment of obesity are disclosed herein. Compositions comprising the same, methods for preparing the instant compounds, and methods for reducing weight in mammals and for the prophylaxis or treatment of obesity are also described.
    Type: Grant
    Filed: October 27, 2003
    Date of Patent: July 19, 2005
    Assignee: Aventis Pharma Deutschland GmbH.
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias Gossel
  • Patent number: 6894194
    Abstract: In a process to make dithiodiglycol by oxidation of ?-mercaptoethanol with sulfur, an improved product is recovered when a 1-10 mol % excess of ?-mercaptoethanol is used and hydrogen sulfide is removed by vacuum or nitrogen sparge. A typical product contains 88.1 mol % (92.0 wt %) dithiodiglycol, 2.3 mol % (2.9 wt %) trithiodiglycol and 9.6 mol % (5.1 wt %) unreacted ?-mercaptoethanol. Reaction of this product with 35 to 50 wt % solution hydrogen peroxide reduces residual ?-mercaptoethanol to less than 0.02 wt % mercaptan. Residual water of about 3.6 wt % after hydrogen peroxide treatment is reduced to less than 1 wt % by vacuum stripping and/or nitrogen sparge or with a wiped film evaporator.
    Type: Grant
    Filed: December 8, 2003
    Date of Patent: May 17, 2005
    Assignee: Chevron Phillips Chemical Company
    Inventors: Kenneth E. Inkrott, Michael S. Matson, Alex Pauwels
  • Patent number: 6861562
    Abstract: The present invention provides a process for producing a mixture of 4,4?- and 2,4?-dihydroxydiphenylsulfones comprising heating trihydroxytriphenyldisulfone or a mixture of dihydroxydiphenylsulfone isomers containing trihydroxytriphenyldisulfone in the presence of phenol and an acid catalyst.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: March 1, 2005
    Assignee: Konishi Chemical Ind. Co., Ltd.
    Inventors: Fumio Oi, Norio Yanase, Hiroyuki Yamamoto
  • Patent number: 6822120
    Abstract: The present invention is directed to selective LXR modulators, small molecule compounds corresponding to Formula I and is further directed to a process of treating a condition in a mammal that is modulated by LXR using a therapeutically effective dose of a compound of Formula I.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: November 23, 2004
    Assignee: Pharmacia Corporation
    Inventors: Daniel P. Becker, Gary A. DeCrescenzo, James W. Malecha, Julie M. Miyashiro, Jennifer Ann Van Camp, Joe T. Collins
  • Publication number: 20040181023
    Abstract: By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer.
    Type: Application
    Filed: February 23, 2004
    Publication date: September 16, 2004
    Inventors: Takanori Yamagishi, Takahito Mita
  • Patent number: 6765102
    Abstract: Water-soluble or water-dispersible branched or unbranched cationic epoxy compounds comprise a backbone having covalently attached thereto two or more epoxy moieties and one or more of the same or different organoonium moieties. The backbone comprises at least 25 weight % oxygen.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: July 20, 2004
    Assignee: Eastman Kodak Company
    Inventors: Jeffrey W. Leon, Paul R. West, Robert E. Mccovick
  • Patent number: 6723483
    Abstract: A triphenyl sulfonium salt compound shown by the general formula [1] or [3]. (wherein R1 and R2 are each independently a hydrogen atom or a lower alkyl group, provided that at least one of R1 and R2 are a lower alkyl group, R3s are each independently an alkyl group, n is an integer of 0 to 3, i is an integer of 1 to 3, j is an integer of 0 to 2, provided that i+j=3, Y− is an anion derived from a sulfonic acid shown by the general formula [2] R4—SO3H  [2] [wherein R4 is an alkyl group or an aryl group which may have as a substituent an alkyl group]). (wherein X is a phenyl group which has a substituent at an ortho- and/or a meta-position, m is an integer of 1 to 3, q is an integer of 0 to 2, provided that m+q=3, p is 1 or 2 and Zp− is an anion derived from a carboxylic acid).
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: April 20, 2004
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Keiji Oono, Kazuhito Fukasawa, Kazunori Sakamoto, Fumiyoshi Urano, Motoshige Sumino, Shigeaki Imazeki
  • Patent number: 6703422
    Abstract: The present invention relates to novel sulfide and disulfide compounds, compositions comprising sulfide and disulfide compounds, and methods useful for treating and preventing cardiovascular diseases, dyslipidemias, dysproteinemias, and glucose metabolism disorders comprising administering a composition comprising an ether compound. The compounds, compositions, and methods of the invention are also useful for treating and preventing Alzheimer's Disease, Syndrome X, peroxisome proliferator activated receptor-related disorders, septicemia, thrombotic disorders, obesity, pancreatitis, hypertension, renal disease, cancer, inflammation, and impotence. In certain embodiments, the compounds, compositions, and methods of the invention are useful in combination therapy with other therapeutics, such as hypocholesterolemic and hypoglycemic agents.
    Type: Grant
    Filed: October 11, 2001
    Date of Patent: March 9, 2004
    Assignee: Esperion Therapeutics, Inc.
    Inventors: Jean-Louis Henri Dasseux, Carmen Daniela Oniciu
  • Publication number: 20040044251
    Abstract: The invention is directed to aromatic vinyl sulfide compounds of general formula A(—S—CH═CH2)z, wherein z is in the range of 1-4 and A represents highly halogenated and highly halogenated-deuterated phenyl, biphenyl and naphthalene compounds; highly halogenated and highly halogenated-deuterated biphenyl ethers and thioethers; and highly halogenated and highly halogenated-deuterated unsaturated 5- and 6-member heterocyclic ring systems containing carbon and at least one heteroatom selected from the group consisting of nitrogen, oxygen and sulfur. The aromatic vinyl sulfide compounds of the invention can be used to prepare elements and devices suitable for use in optical communications.
    Type: Application
    Filed: August 27, 2002
    Publication date: March 4, 2004
    Inventors: Thomas M. Leslie, Helen Samson
  • Publication number: 20040015018
    Abstract: Disclosed is a one step method for preparing a &bgr;-substituted sulfide by treating a &bgr;-halosulfide with a nucleophile in water.
    Type: Application
    Filed: March 19, 2003
    Publication date: January 22, 2004
    Inventors: Hartmuch C. Kolb, Zhi-Cai Shi, Zhi-Min Wang
  • Publication number: 20030229240
    Abstract: The invention relates to a process for synthesizing tertiary phosphines by reacting halophosphines with organomagnesium compounds in the presence of copper compounds and optionally of salts.
    Type: Application
    Filed: April 17, 2003
    Publication date: December 11, 2003
    Inventors: Florian Rampf, Hans-Christian Militzer
  • Publication number: 20030178342
    Abstract: Sour natural gas is processed to remove the sulfur compounds and recover C4+/C5+ hydrocarbons by scrubbing the gas with an amine solution to remove most of the sulfur, followed cooling the gas to remove C4+/C5+ hydrocarbons and more sulfur compounds as liquid condensate to produce a gas having less than 20 vppm of total sulfur. The condensate is sent to a fractionator to recover the C4+/C5+ hydrocarbons. The sulfur and hydrocarbon reduced gas is contacted first with zinc oxide and then nickel, to produce a gas having less than 10 vppb of total sulfur which is passed into a synthesis gas generating unit to form a very low sulfur synthesis gas comprising a mixture of H2 and CO. This synthesis gas is useful for hydrocarbon synthesis with increased life of the hydrocarbon synthesis catalyst and greater hydrocarbon production from the hydrocarbon synthesis reactor. Contacting the synthesis gas with zinc oxide further reduces the sulfur content to below 3 vppb.
    Type: Application
    Filed: March 14, 2003
    Publication date: September 25, 2003
    Inventors: Dennis G. Alexion, Robert B. Fedich, John C. Wilbur, James H. Taylor, James P. Glass, Geoffrey R. Say, Richard P. O'Connor
  • Patent number: 6617392
    Abstract: The present invention provides the molding composition of siloxane, which is capable of extending mold lifetime where inhibitors alkene or acetylene polymerization are mixed in the molds composed of siloxane. The inhibitors can effectively inhibit the release of alkene or acetylene when a resin containing an alkene or acetylene is poured into the molds which extends lifetime of molds composed of siloxane. The inhibitors are compounds containing primarily sulfur, wherein sulfur is the most effective.
    Type: Grant
    Filed: January 3, 2002
    Date of Patent: September 9, 2003
    Inventor: Wen-Chen Yang
  • Patent number: 6605409
    Abstract: A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: August 12, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kunihiko Kodama, Shinichi Kanna
  • Patent number: 6576684
    Abstract: Disclosed are compositions from which radically initiated oligomers/polymers having a controlled molecular weight, low polydispersity and a vinyl or dienyl end group are prepared. Further subjects of the invention are a process for controlled radical polymerization, oligomers/polymers obtainable by said process and the use of specific addition fragmentation agents for the polymerization process. The addition fragmentation agents are new in part and these are also subject of the present invention. The addition fragmentation agents are of the formula (Ia), (Ib) or (Ic) where Y is a group which activates the double bond towards Michael addition.
    Type: Grant
    Filed: February 15, 2001
    Date of Patent: June 10, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Vincent Desobry, Peter Murer, Anne Schuwey
  • Publication number: 20030080312
    Abstract: A process for preparing an ionic liquid or salt, preferably in which the cation comprises an N-alkylated base and the anion is a carboxylate, formed by reaction between an organic base and an alkylating agent, wherein the alkylating agent is a fluorinated ester or an alkyl sulfonate, is described. Suitable organic bases include imizadoles, substituted imidazoles, pyridines and substituted pyridines. The so-formed products can be subsequently transformed into different ionic liquids or salts by metathesis.
    Type: Application
    Filed: September 9, 2002
    Publication date: May 1, 2003
    Inventors: Kenneth R. Seddon, Adrian J Carmichael, Martyn J. Earle
  • Patent number: 6544936
    Abstract: To manufacture sulphurated products deriving from olefin(s) by sulphurization using sulphur and hydrogen sulphide, the reaction is carried out in the presence of a zeolite.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: April 8, 2003
    Assignee: Atofina
    Inventor: Jean-Francois Devaux
  • Patent number: 6528462
    Abstract: The present invention provides a process for inhibiting the emission of hydrogen sulfide and/or mercaptans from sulfurized organic compounds, which generally contain a high proportion of sulfur by treating the sulfurized organic compounds with organic hydroperoxides.
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: March 4, 2003
    Assignee: Rhein Chemie Rheinau GmbH
    Inventors: Ludger Heiliger, Alfred Pauli, Joachim Hegmann, Michael Wühr, Achim Fessenbecker, Kurt Schilling
  • Patent number: 6518392
    Abstract: A novel dielectric composition is provided that is useful in the manufacture of integrated circuit devices and integrated circuit packaging devices. The dielectric composition is prepared by imidizing and curing an oligomeric precursor compound comprised of a central polybenzoxazole, polybenzothiazole, polyamic acid or polyamic acid ester segment end-capped at each terminus with an aryl-substituted acetylene moiety such as an ortho-bis(arylethynyl)aryl group, e.g., 3,4-bis(phenylethynyl)phenyl. Integrated circuit devices, integrated circuit packaging devices, and methods of synthesis and manufacture are provided as well.
    Type: Grant
    Filed: March 8, 2001
    Date of Patent: February 11, 2003
    Assignee: International Business Machines Corporation
    Inventors: Kenneth R. Carter, James L. Hedrick, Victor Yee-Way Lee, Dale C. McHerron, Robert D. Miller
  • Publication number: 20030022100
    Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions containing the same. The photoresist polymer includes a repeating unit comprising the photoresist monomer of Formula 1 as a comonomer and the photoresist composition containing the same have excellent etching resistance, heat resistance and adhesiveness to a wafer, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. In addition, the photoresist composition has low light absorbance at 157 nm wavelength, and thus is suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) in fabricating a minute circuit for a high integration semiconductor device.
    Type: Application
    Filed: January 22, 2002
    Publication date: January 30, 2003
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin
  • Publication number: 20030008230
    Abstract: Thiophene-containing photo acid generators having either of the following general formulas: 1
    Type: Application
    Filed: June 29, 2001
    Publication date: January 9, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Wenjie Li, Pushkara Rao Varanasi, Kuang-Jung Chen
  • Patent number: 6498196
    Abstract: The present invention relates to novel thio-aminotetralin compounds of the formula (I) wherein Z, X, R1, R2, R3, R4, R5, and R6 are defined herein. The compounds are useful in pain management.
    Type: Grant
    Filed: December 14, 1999
    Date of Patent: December 24, 2002
    Inventors: Edward Roberts, Tiechao Li, Dilip Dixit, Krzysztof Bednarski, Dick Storer, Wuyi Wang
  • Patent number: 6472354
    Abstract: To manufacture sulphurated products derived from olefin(s) by sulphurization using sulphur and hydrogen sulphide, the reaction is carried out in the presence of a solid acid catalyst and of a solid basic catalyst.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: October 29, 2002
    Assignee: Atofina
    Inventors: Piet Luyendijk, Jean-Francois Devaux, Bernard Monguillon
  • Patent number: 6458506
    Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an anthracene acid upon exposure to activating radiation, particularly anthracene sulfonic acids such as acids that include 9,10-dialkoxyanthracene-2-sulfonate moieties. Positive- and negative-acting chemically amplified resists that contain such PAGs and that are imaged with I-line (365 nm) radiation are particularly preferred.
    Type: Grant
    Filed: August 13, 1999
    Date of Patent: October 1, 2002
    Assignee: Shipley Company, LLC
    Inventor: James F. Cameron
  • Patent number: 6451904
    Abstract: Novel polymer stabilizers are disclosed. The novel stabilizers have the general formula (R)qSn-(MR″-OCH2-R′CH]m-OT)4-q, P-[(OCH2-R′CH)mOT]3′ wherein M is O or S and R″is (CH2)pCO-, CO-(CH3)p, or CO(CH2)p-. About 0.005 to about 65 phr of the stabilizer can be used in a polymer having a halogen-containing repeating unit, such as poly(vinyl chloride), to reduce yellowing of an article made from the polymer after the article has been exposed to gamma radiation.
    Type: Grant
    Filed: October 9, 2001
    Date of Patent: September 17, 2002
    Assignee: Occidental Chemical Corporation
    Inventors: Qi Wang, Sandor Nagy
  • Patent number: 6444709
    Abstract: The invention relates to novel heteroethynylenic compounds having the general formula (I): as well as to the use of these compounds in pharmaceutical compositions intended for use in human or veterinary medicine (dermatological, rheumatic, respiratory, cardiovascular and ophthalmological complaints in particular), or alternatively in cosmetic compositions.
    Type: Grant
    Filed: February 7, 2000
    Date of Patent: September 3, 2002
    Assignee: Galderma Research & Development S.N.C.
    Inventors: Philippe Diaz, Jean-Michel Bernardon
  • Patent number: 6406830
    Abstract: A chemical amplifying type positive resist composition having high transmittance, superior in sensitivity and resolution in a lithography utilizing a light having a wavelength of 220 nm or lower and confering a good profile is provided, Which comprises an aliphatic sulfonium salt represented by the following formula (I): wherein either Q1, Q2, Q3 and Q4 represent an alkyl group or a cycloalkyl group, or Q1 and Q2 and/or Q3 and Q4 form, together with the adjacent sulfur atom, a heterocyclic group, and m represents an integer of 1 to 8; at least one onium salt selected from the group consisting of a triphenylsulfonium salt and a diphenyliodonium salt; and a resin which contains a polymerization unit having a group unstable to an acid, and which is insoluble in alkali by itself but becomes soluble in alkali by the action of an acid.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: June 18, 2002
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hiroki Inoue, Yasunori Uetani
  • Patent number: 6395450
    Abstract: A positive working photoresist composition includes at least one thermally cross-linkable photoacid generator, a binder polymer, and a solvent in which the binder polymer and photoacid generator are dissolved. The photoacid generator is represented by the general formula (I): wherein X is methanesulfonate, trifluoromethanesulfonate, 4-toluenesulfonate, 10-camphorsulfonate, cyclohexane sulfamate, perfluoro-1-butanesulfonate, perfluorooctanesulfonate, F, Cl, Br, SbF6, BF4, PF4, or AsF6, R1 is hydrogen or methyl, and R2 is alkyl of C1-10 or vinyloxyethyl. The binder polymer represented by the general formula (II): wherein R1 and R2 are different from each other and are selected from the group consisting of acid labile groups, hydrogen, methoxy, ethoxy, n-butoxy and t-butoxy, R3 is hydrogen or alkyl of C1-10, R4 is hydrogen or methyl, 0<o≦1, 0≦p≦0.7, 0≦q≦0.7, and 0≦r≦0.3, wherein p, q and r are not 0 simultaneously.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: May 28, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-Geun Park, Chang-Ho Noh, Bong-Seok Moon, Sang-Kyun Lee, Seong-Yun Moon
  • Publication number: 20020058765
    Abstract: The present invention relates to a metal-free cyclopentadienide compound which, in conjunction with a metallocene, is able to form a catalyst system that can be used for the polymerization of olefins. It is thus possible to dispense with the use of methylaluminoxane (MAO) or boron-containing compounds as co-catalyst and nevertheless achieve a high degree of catalytic activity. The invention relates also to a process for the preparation of the metal-free cyclopentadienide compound and to the use thereof as a catalyst component in the preparation of polyolefins.
    Type: Application
    Filed: August 3, 2001
    Publication date: May 16, 2002
    Inventors: Sigurd Becke, Uwe Denninger, Steffen Kahlert, Werner Obrecht, Claudia Schmid, Heike Windisch
  • Patent number: 6380277
    Abstract: The present invention relates to iodonium salts containing urethane groups of reduced crystallization tendency, to a process for their preparation, and to their use for the radiation curing of cationically curing compositions.
    Type: Grant
    Filed: September 19, 2000
    Date of Patent: April 30, 2002
    Assignee: Goldschmidt AG
    Inventors: Sascha Oestreich, Andreas Weier, Stefanie Volkmer
  • Publication number: 20020015913
    Abstract: A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises:
    Type: Application
    Filed: June 22, 2001
    Publication date: February 7, 2002
    Inventors: Yasunori Uetani, Kenji Oohashi, Akira Kamabuchi
  • Publication number: 20020016510
    Abstract: To manufacture sulphurated products derived from olefin(s) by sulphurization using sulphur and hydrogen sulphide, the reaction is carried out in the presence of a solid acid catalyst and of a solid basic catalyst.
    Type: Application
    Filed: April 25, 2001
    Publication date: February 7, 2002
    Inventors: Piet Luyendijk, Jean-Francois Devaux, Bernard Monguillon
  • Patent number: 6306451
    Abstract: Described is a 2-mercapto-2-methyl-pentan-1-ol compound, which is especially useful as fragrance or flavor compound. For the production of 2-mercapto-2-methyl-pentan-1-ol, 2,3-epithio-2-methyl-pentan-1-ol can be reduced. The described compound can provide foodstuffs an interesting, gustatory and fragrant note.
    Type: Grant
    Filed: August 20, 1999
    Date of Patent: October 23, 2001
    Assignee: DRAGOCO Gerberding & Co. AG
    Inventors: Christopher Sabater-Lüntzel, Sabine Widder, Wilhelm Pickenhagen, Tobias Vössing
  • Patent number: 6303173
    Abstract: Described are compounds of the general formula A where R2=CH3, C2H5, C3H7 (n, iso) or C4H9 (n, iso, tert) and R2=CH3, C2H5, C3H7 (n, iso) or C4H9 (n, iso, tert) which are especially useful as fragrance or flavor materials. The 3-mercapto-2-alkyl-alkanals of the general formula A in which X—CHO are formed by reaction of the corresponding 2-alkyl-2-alkenals with hydrogen sulfide.
    Type: Grant
    Filed: August 20, 1999
    Date of Patent: October 16, 2001
    Assignee: Dragoco Gerberding & Co. AG
    Inventors: Christopher Sabater-Lüntzel, Sabine Widder, Wilhelm Pickenhagen
  • Patent number: 6294698
    Abstract: The present invention is directed to new, energy-efficient photoinitiators in the form of organic sulfur-containing compounds. The present invention is also directed to a method of generating reactive species which includes exposing one or more photoinitiators to radiation to form one or more reactive species. Also described are methods of polymerizing unsaturated monomers, methods of curing an unsaturated oligomer/monomer mixture, and methods of laminating using the photoinitiators of the present invention.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: September 25, 2001
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Ronald S. Nohr, J. Gavin MacDonald