Patent number: 7183440
Abstract: A compound of formula (I) or (II): wherein A is hydrogen or CR1R2; Y and Z are each, independently, hydrogen or a halogen; X is —NR4R5, or R7; R1 is hydrogen, or a substituted or unsubstituted alkyl or alkenyl group containing 1–4 carbon atoms; when X is —NR4R5, R2 is a substituted or unsubstituted alkyl, alkenyl, alkynyl, aryl, aralkyl aralkenyl, or aralkynyl group, that optionally includes at least one heteroatom in its carbon skeleton and contains 1–12 carbon atoms; when X is R7, R2 is an unsubstituted alkyl, alkenyl or alkynyl group, or a substituted or unsubstituted aryl, aralkyl aralkenyl, or aralkynyl group, that optionally includes at least one heteroatom in its carbon skeleton and contains 1–12 carbon atoms; R3 is a substituted or unsubstituted alkyl, alkenyl, alkynyl, aryl, aralkyl aralkenyl, or aralkynyl group, that optionally includes at least one heteroatom in its carbon skeleton and contains 1–12 carbon atoms; R4 is hydrogen, a substituted or unsubstituted alkyl, alkenyl, alkynyl, aryl, aralkyl
Type:
Grant
Filed:
February 7, 2005
Date of Patent:
February 27, 2007
Assignee:
Charterhouse Therapeutics Ltd
Inventors:
Stanley Michael Roberts, Maria Gabriella Santoro, Vasudev Jadhav, Alan Michael Happe, Jérôme Dauvergne
Patent number: 6395450
Abstract: A positive working photoresist composition includes at least one thermally cross-linkable photoacid generator, a binder polymer, and a solvent in which the binder polymer and photoacid generator are dissolved. The photoacid generator is represented by the general formula (I):
wherein
X is methanesulfonate, trifluoromethanesulfonate, 4-toluenesulfonate, 10-camphorsulfonate, cyclohexane sulfamate, perfluoro-1-butanesulfonate, perfluorooctanesulfonate, F, Cl, Br, SbF6, BF4, PF4, or AsF6,
R1 is hydrogen or methyl, and
R2 is alkyl of C1-10 or vinyloxyethyl.
The binder polymer represented by the general formula (II):
wherein R1 and R2 are different from each other and are selected from the group consisting of acid labile groups, hydrogen, methoxy, ethoxy, n-butoxy and t-butoxy, R3 is hydrogen or alkyl of C1-10, R4 is hydrogen or methyl, 0<o≦1, 0≦p≦0.7, 0≦q≦0.7, and 0≦r≦0.3, wherein p, q and r are not 0 simultaneously.
Type:
Grant
Filed:
June 1, 2000
Date of Patent:
May 28, 2002
Assignee:
Samsung Electronics Co., Ltd.
Inventors:
Jae-Geun Park, Chang-Ho Noh, Bong-Seok Moon, Sang-Kyun Lee, Seong-Yun Moon