Abstract: A method and system for the use of prediction data in monitoring actual production targets is described herein. In one embodiment, a process is provided to receive data from a plurality of source systems in a manufacturing facility and generate a prediction pertaining to a future state of the manufacturing facility based on the data received from the plurality of source systems. A recent state of the manufacturing facility is determined based on the data received from the plurality of source systems and a comparison between the recent state and the prediction is facilitated.

Abstract: A manufacturing execution system (MES) with virtual-metrology capabilities and a manufacturing system including the MES are provided. The MES is built on a middleware architecture (such as an object request broker architecture), and includes an equipment manager, a virtual metrology system (VMS), a statistical process control (SPC) system, an alarm manager and a scheduler. The manufacturing system includes a first process tool, a second process tool, a metrology tool, the aforementioned MES, a first R2R (Run-to-Run) controller and a second R2R controller.

Abstract: A construction process management system includes storage units that store work information of work to be carried out during construction of a plant, and section information, period information, and system information associated with the work information. The section information indicates a section in which work is performed among plural sections in the plant. The period information indicates a period in which the work is performed. The system information indicates a system to which the work belongs among systems in the construction work. The construction process management system further includes a process chart generation unit that extracts work information for section information item and generates a section-based process chart showing a process of work for each section based on the period information, and a conversion unit that converts the section-based process chart into a system-based process chart showing the process of work for each system based on the system information.

Abstract: A fail-over system and method relates to a fail-over technology of an equipment server managing a semiconductor fabrication equipment server.

Abstract: A loom monitoring system includes loom computers and a host computer connected to the loom computers through a network. Each loom computer acquires a temporary IP address from a DHCP server when a fixed IP address is not set for the loom computer and requests the host computer to transmit a fixed IP address using the temporary IP address. The host computer assigns a fixed IP address to the loom computer that transmitted the assignment request signal and correlates the fixed IP address with a loom layout map. The loom computers each transmit an acquisition completion signal to the host computer using the fixed IP address in a designated order based on the loom layout map. The host computer correlates the fixed IP address of each loom computer with the loom layout map in accordance with the designated order.

Abstract: A system and method for monitoring product through a batch manufacturing plant is provided. The system includes, a parallel flow mode when product flows concurrently from at least two units to a single unit; and a serial flow mode where product flows from one unit to another at a given time, wherein the batch manufacturing plant is modeled based on the parallel and serial flow modes. A lot association is built based on product flow and a parent/child record is created for lot association. The system also includes a data collection system that collects phase information for every unit and a procedure identifier is used to create a batch identifier, where a batch identifier is associated with each lot on each unit through which product is flowing to and/or from at a given time.

Abstract: According to an exemplary embodiment of the present invention, a diagnosis system for detecting a state of emergency during assembly of a fuselage (101) of an airplane is provided, which is adapted for detecting an emergency event and outputting information relating to the actual position of the emergency event. This may provide for a fast error identification during airplane assembly.

Abstract: Processes, a methodology and software are provided for improving manufacturing and asset maintenance in machine intensive environments such as manufacturing, processing, assembly plants and military. In particular, for improving assets reliability, performance and maintenance. A process includes developing an asset plan to improve machinery reliability, performance and maintenance and a business plan to measure revenues, profits and market share gained through the activities generated by said asset plan implemented in a short amount of time. A method for dividing a manufacturing system into elements to simplify, for identifying and prioritizing sources of stress and for solving and managing said solutions. A method for forming matrices of interacting elements for solving or reducing said sources of stress in a short amount of time. A software for calculating ROI and for providing business information as well as the condition of the assets.

Abstract: A method for importing data from a first system into a second system includes receiving configuration information about data storage structures in the first and second systems and information about communicating with the first and second systems. Information to be used in creating an import configuration file is entered via a user interface. The import configuration file is for use in preparing the second system to receive data from the first system. Based on the information about data storage structures, the information about communicating with the first and second systems, and the information entered via the user interface, the import configuration file is created to prepare the second system to receive data from the first system. Based on the import configuration file, data is transferred from the first system into the second system.

Abstract: A substrate processing system includes a substrate processing apparatus configured to process a substrate, and a management device configured to display specified information transmitted from the substrate processing apparatus on a display unit. The substrate processing apparatus includes a processing environment measuring unit configured to measure information on a substrate processing environment according to time and a trouble information notifying unit configured to notify information on a trouble of the substrate processing apparatus. The management device includes a storage unit configured to store measurement information measured by the processing environment measuring unit and notification information notified by the trouble information notifying unit. The display unit is configured to display the measurement information and the notification information which are stored in the storage unit and correlated with each other.

Abstract: Provided are a substrate processing apparatus, a display method thereof, and a substrate processing system capable of detecting any change in the condition of each component of a substrate processing apparatus. In the substrate processing system including the substrate processing apparatus for processing a substrate and a group management apparatus connected thereto, the substrate processing apparatus is configured to acquire monitor data representing at least the condition of each component of the substrate processing apparatus, aggregate a plurality of the monitor data to generate package data including at least one of a maximum value, an average value, and a minimum value of the monitor data, and transmit the package data to the group management apparatus. The group management apparatus is configured to receive the package data from the substrate processing apparatus and readably store the same therein.

Abstract: This disclosure provides a method and system for measurement system analysis (MSA) that present a structured and effective way of performing an MSA. The MSA system and method involves determination of a category of MSA for a measurement system based on an application of the measurement system, a quantification of measurement variation, calculation of a decision rule value based on the quantified measurement variation and a decision rule associated with the determined category, a determination of whether the measurement system is capable of performing MSA for the category based on a comparison of the calculated decision rule value and a decision rule threshold value, and applying a measurement system determined as capable for performing MSA to manage.

Abstract: The present invention provides a number of innovations in the area of computational process control (CPC). CPC offers unique diagnostic capability during chip manufacturing cycle by analyzing temporal drift of a lithography apparatus/ process, and provides a solution towards achieving performance stability of the lithography apparatus/process. Embodiments of the present invention enable optimized process windows and higher yields by keeping performance of a lithography apparatus and/or parameters of a lithography process substantially close to a pre-defined baseline condition. This is done by comparing the measured temporal drift to a baseline performance using a lithography process simulation model. Once in manufacturing, CPC optimizes a scanner for specific patterns or reticles by leveraging wafer metrology techniques and feedback loop, and monitors and controls, among other things, overlay and/or CD uniformity (CDU) performance over time to continuously maintain the system close to the baseline condition.

Abstract: A method for optimizing energy efficiency in a manufacturing process includes monitoring power consumption of each of a plurality of manufacturing entities of the manufacturing process using a power metering device assigned thereto; collecting, from the power metering devices, a first data stream that includes information about the power consumption; collecting a second data stream that includes information about the manufacturing entity and process; determining an optimized product routing of products to be manufactured by the manufacturing process from one manufacturing entity to another manufacturing entity, based on the collected first and second data streams, by simulating different product routings and determining the optimal product routing with respect to the overall energy consumption of the manufacturing process; and adjusting, via a manufacturing control system, the manufacturing process based on the optimized product routing.

Abstract: A POL-axis driving unit, an EL-axis driving unit, a Cross-EL-axis driving unit and an AZ-axis driving unit of an antenna apparatus drive respective axis drive motors controlled by a control unit of a control apparatus, such that the antenna performs an origin detection operation for each axis. The camera control unit controls a camera so as to capture an image of the antenna at each timing before and after the origin detection for each axis. An image acquisition unit of an antenna inspection acquires image data that indicates the image of the antenna captured by the camera and makes storage unit store the image data. A comparing diagnosis unit compares image data before the origin detection for each axis with image data after the origin detection, and diagnoses whether the antenna is in a normal state.

Abstract: A device setting apparatus is configured to communicate with a field device, and to acquire information from the field device and to set information with respect to the field device. The device setting apparatus includes a generator configured to generate an information code using at least one of acquired information acquired from the field device, work history information indicating a work history for the field device, reference destination information stored in reference destination information table and indicating a reference destination for support information supporting a work of field device, and license information (a two-dimensional code generator, a sound code generator).

Abstract: It is intended to provide an electronic component mounting device and an operation performing method for mounting electronic components so that both the operation quality and the productivity can be improved. In operation performing procedures, when an electronic component belongs to the first division, an operating head is made to move up and down based on an approximate operation position height derived from an approximate curved surface of the top surface of a board which is calculated by using the height measurement result obtained by measuring a plurality of height measuring points on the surface of the board, and when the electronic component belongs to the second division, the operating head is made to move up and down based on an individual operation position height obtained by individually measuring the board height at the operation position.

Abstract: Methodologies and an apparatus enabling a selection of design rules to improve a density of features of an IC design are disclosed. Embodiments include: determining a feature overlapping a grating pattern of an IC design, the grating pattern including a plurality of grating structures; determining a shape of a cut pattern overlapping the grating pattern; and selecting one of a plurality of rules for the feature based on the determined shape.

Abstract: The system and method uses a virtual frame of reference to evaluate and control a manufacturing system. Electronic images from a vision system may be analyzed using the virtual frame of reference to control the phasing of devices in the manufacturing system and to generate alerts.

Abstract: A method and apparatus for compensating a bias voltage at the wafer by measuring RF voltage signals in RF driven plasma including at least an electrostatic, chuck (ESC), a capacitive divider, a signal processing and signal conditioning network is disclosed. The bias compensation device includes a capacitive divider to detect the RF voltage at the ESC, a signal conditioning network for the purpose of filtering specific RF signals of interests, and a signal processing unit for computing the DC wafer potential from the filtered RF signals.

Abstract: An installation comprises at least one sensor for providing sensor data representing a real system state of the installation and at least one actuator for acting on the real system state. A controller for controlling the installation comprises a data memory for storing the sensor data and a program memory for storing a machine code program. A programming tool for programming the controller includes a program editor, a debugging tool and a compiler. A machine code program is executed on the controller while the debugging tool is activated, and the debugging tool determines a reverse relationship between the machine code running on the controller and at least one high level control instruction shown in the program editor, thereby linking at least one high level control instruction to a real system state during the execution of the machine code program.

Abstract: An inline vacuum processing apparatus includes a deposition unit, a process execution unit, a determination unit, and a control unit. The deposition unit causes one deposition chamber of a first deposition chamber and a second deposition chamber to execute a deposition process. The process execution unit causes the other deposition chamber to execute a process necessary for the deposition process. The determination unit measures the number of substrates processed in one deposition chamber and determines whether all substrates included in a first lot have undergone the deposition process. The control unit switches, based on a determination result from the determination unit, a process to be executed in each of the first deposition chamber and the second deposition chamber.

Abstract: An imaging device and a first terminal device are provided for plural work areas. Image data sets, capturing time data sets, and imaging unit identifiers transmitted by the imaging device are associated with each other in an image database. A control unit of a second terminal device displays progress display area of each work process performed for producing a product in a layout on a display, and displays progress in each progress display area in accordance with contents of a progress database. Also, the control unit of the second terminal device specifies a progress display area on the display corresponding to a data set from an input unit, specifies image data sets corresponding to the specified progress display area by referring to contents of the progress database and a correspondence database, reads the specified image data sets from the image database, and displays images represented by the image data sets.

Abstract: Substrate processing including correction for deposition location is described, including a combinatorial processing chamber that incorporates the correction. The combinatorial processing chamber can be used to process multiple regions of a substrate using different processing parameters on different regions. For example, one region can have one material deposited on it and another region can have a different material deposited on it, although other combinations and variations are possible. The combinatorial processing chamber uses a rotating and revolving substrate pedestal to be able to deposit on all locations or positions on a substrate. The combinatorial processing chamber uses a correction factor that accounts for variations in alignment and/or configuration of the processing chamber so that the actual location of deposition of a region is approximately the same as a desired location of deposition.

Abstract: Systems, machines, and methods for monitoring wafer handling are disclosed herein. A system for monitoring wafer handling includes a sensor and a controller. The sensor is capable of being secured to an assembled wafer handling machine. The controller is in electronic communication with the sensor and includes control logic. The control logic is configured to store a reference output of the sensor when the wafer handling machine is aligned and is configured to generate an indication signal when a difference between the reference output and a current output of the sensor exceeds a threshold.

Abstract: System, method and computer program product for configuring and controlling a facility to perform a manufacturing process and updating a tool controlling the process according to a model employed for mapping calculated coefficients that characterize non-linear variations observed of a product to actual control parameters governing the processes/tools used by the facility during the manufacturing process. The method enables real-time control of variation in an exposure step of a patterning process using an exposure tool to minimize a nonlinear variation in one or more pattern attributes by adjusting the exposure tool or the patterning process corresponding to the calculated coefficients. In the method, measurements of product attributes, obtained by finite sampling over a well defined domain, are projected onto a predefined reference mesh spanning the domain, using a physically based model comprised of functions constructed to be orthogonal and normalized over a discrete set of reference mesh locations.

Abstract: Provided is a consumable platemaking material remote administration method which is capable of remotely administrating a consumable platemaking material in each processing device in a fully-automatic platemaking system through a communication network. The consumable platemaking material remote administration method for a processing system for fully-automatic photogravure platemaking includes: providing a central control unit to be connected to the each processing device through a communication line, for receiving status information of a consumable platemaking material in the each processing device; and receiving the status information from the central control unit through a communication network by an external receiving device to remotely administrating the consumable platemaking material.

Abstract: A device, system, method, business method, and process of monitoring at least one machine tool including: determining a target signal of a component of the machine tool when performing a work step on the basis of at least one pre-definable or predefined reference number; detecting a current signal of the component of the machine tool when performing the work step; detecting a deviation of the target signal from the current signal; and generating a deviation signal. The deviation signal includes a piece of information about the component, the machine tool, and/or the deviation. The device, system, method, business method, and process of monitoring at least one machine tool further includes transferring the deviation signal as a new data set to an externally accessible storage unit that is separate or separable from the machine tool.

Abstract: A processing data managing system includes: a processing device 11 (such as a sputtering device for manufacturing a magnetic disc) for repeating the same process for each cycle; a sampling unit 30 for collecting raw data on a processing condition in the processing device (such as a discharge condition); a calculation unit 100 for receiving the raw data, calculating the raw data according to a predetermined rule, and processing it as summary data expressing a characteristic point for each cycle (characteristic value: for example, average value, maximum value, minimum value, standard deviation, discharge time, and the like); a data storage unit 40 for storing the processed summary data in storage means; and a display/output unit 50 for chart-displaying the summary data stored in the storage means.

Abstract: Described are methods, systems, and a computer-readable storage medium for controlling a discrete-type manufacturing process (e.g., an injection molding process) with a multivariate model. Data representing process parameters, operating parameters, or both of the manufacturing process are received. The received data is compared with a multivariate model that approximates the manufacturing process to provide a result. Upon the result of the comparing satisfying a condition, one or more values for a set of operating parameters for the manufacturing process are determined. When the one or more determined values for the set of operating parameters satisfies a criterion, at least one operating parameter of the manufacturing process is updated.

Abstract: The present invention addresses the deficiencies of the art in respect to the manufacturing test processes and provides a novel and non-obvious method, system and apparatus for dynamic optimization of manufacturing test coverage with automated integration of field failure feedback with the order configurator. In one embodiment of the invention, a manufacturing field failure feedback method can be provided. The method can include retrieving field failure data, analyzing the field failure data, storing failure analysis object information, modifying a manufacturing test case selection within the test case selection and order configurator based on using field failure data analysis, the test case selection including rules for test case selection and test case object information, and configuring a testing order with an optimized test case selection.

Abstract: An automation system for creating and adapting a machine or system model, and for checking a control program of an open-loop control based on a virtual machine or a virtual system has a control system, a data recording unit for recording machine or system data, a data preparation unit for analyzing the data recorded in the data recording unit, and the parameters of the machine or system model that were ascertained via the data analysis are storable, in an automated manner, in the virtual machine or the virtual system, in order to simulate a machine or system behavior of a real machine or system.

Abstract: A precision pump system having a motor driver for accurately and repeatedly delivering process fluid, (e.g., photo chemicals) using a pumping fluid with minimal process fluid loss to a fabrication process and whereby the motor driver can be easily and quickly replaced without interrupting the fluid flow path. This is accomplished with the use of a process fluid reservoir and a pumping fluid reservoir that are associated with the pump, either integrated with the pump or closely adjacent. In addition, this precision pump system can be remotely monitored, viewed and controlled over the Internet. In addition, trapped process fluid within a downstream filtering block can be recirculated to the process fluid reservoir when trapped gas in the filter is removed. Furthermore, a nitrogen gas source is connected to the process fluid reservoir via a valve in case a need to insert a gas is required.

Abstract: In an embodiment, deltas are calculated between respective current metric values for respective entities and previous metric values for the respective entities. A subset of the deltas is determined. A sum of the subset is calculated, and the sum is divided by a number of the subset to create an average delta for the subset. If one of the respective entities has one of the deltas that is greater than or equal to the average delta for the subset and the one of the respective entities was not previously used to create the previous prediction, then a current prediction is created.

Abstract: A processing device group controller includes: a storage unit which stores an operation schedule including information of maintenance time for a plurality of processing devices for processing workpieces, with respective equipment associated with the plurality of processing devices, and a transfer plan including information of timings at which the workpieces are carried in and out of the plurality of processing devices; a detecting unit which performs a step of comparing the transfer plan and the operation schedule of each processing device, a step of specifying the last process before maintenance for each processing device, and a step of detecting the end timing of the specified process; and an instruction unit which instructs each processing device to be switched to an idle state at the end timing along with the associated equipment.

Abstract: Disclosed are a system, computer readable medium and method for predicting key performance indicators. The method includes receiving one or more data pairs, the one or more data pairs indicating a performance parameter and reason indicator associated with the performance parameter, deriving a formulaic relationship, utilizing a regression formula, between the reason indicator and the performance parameter, predicting at least one key performance indicator (KPI), utilizing a regression formula, for each of the one or more data pairs, associating a cost with each of the one or more data pairs, and varying a parameter based on the KPI and the associated cost.

Abstract: A modular dynamically re-configurable profiling core may be used to provide both operating systems and applications with detailed information about run time performance bottlenecks and may enable them to address these bottlenecks via scheduling or dynamic compilation. As a result, application software may be able to better leverage the intrinsic nature of the multi-core hardware platform, be it homogeneous or heterogeneous. The profiling functionality may be desirably isolated on a discrete, separate and modular profiling core, which may be referred to as a configurable profiler (CP). The modular configurable profiling core may facilitate inclusion of rich profiling functionality into new processors via modular reuse of the inventive CP. The modular configurable profiling core may improve a customer's experience and productivity when used in conjunction with commercial multi-core processors.

Abstract: Methods and apparatus for evaluating characteristics of components of a mechanically attached connection are disclosed. Characteristics that may be evaluated include, but are not limited to, the position of a conduit gripping device on a conduit, an amount of axial compression or stroke of the conduit gripping device, and an amount of clamping force applied to the conduit gripping device as the conduit gripping device is axially compressed or stroked.

Abstract: One embodiment of the present invention provides techniques and systems for modeling mask errors based on aerial image sensitivity. During operation, the system can receive an uncalibrated process model which includes a mask error modeling term which is based at least on an aerial image sensitivity to mask modifications which represent mask errors. Next, the system can fit the uncalibrated process model using measured CD data. Note that the mask error modeling term can also be dependent on the local and/or long-range pattern density. In some embodiments, the mask error modeling term can include an edge bias term and a corner rounding term. The edge bias term can be based on the sensitivity of the aerial image intensity to an edge bias, and the corner rounding term can be based on the sensitivity of the aerial image intensity to a corner rounding adjustment.

Abstract: A device for diagnosing an evolutive industrial process comprise a plurality of technical steps for the production of a given industrial compound, for which a plurality of state or characterization technical data is available, the device including at least one microprocessor and one memory, an interface module, a counter module for verifying whether a calculation end criterion has been reached, a management module for managing operations and data exchanges between the different modules, a computational grid comprising a plurality of production window calculation modules in order to determine appropriate production windows, a clustering module for distributing parameter combinations between several clusters in order to perform convergence calculations, and a convergence module for verifying whether an expected convergence rate between clusters has been reached.

Abstract: A method of controlling process distribution of a semiconductor process includes receiving process distribution data representing the process distribution of the semiconductor process, receiving a parameter related to the process distribution, generating a virtual metrology model corresponding to the process distribution based on a relationship between the process distribution data and the parameter, and modifying a process variable affecting the process distribution based on the virtual metrology model.

Abstract: A method testing the quality of products applied to a system is provided. Each product includes a unique identification number. The system includes a data storage device and test devices. The data storage device includes a first table recording identification numbers, test types, and test results, each test device stores a second table records the identification numbers and the test types. The method includes: obtaining the identification number; obtaining the test type; determining whether a test type previous to the test type exists; and generating first information to prompt the operator to return the to-be-tested product to the workstation of previous test type when the test result corresponding to the existed previous test type does not exist or the test result corresponding to the existed previous test type is a first value.

Abstract: A method for use in semiconductor fabrication is provided that includes providing manufacturing data of a semiconductor process, providing a plurality of functional transformations, optimizing each of the functional transformations based on the manufacturing data, selecting one of the functional transformations that has a least deviation with respect to the manufacturing data, predicting performance of the semiconductor process using the selected transformation function, and controlling a fabrication tool based on the predicted performance.

Abstract: A cluster tool may be operated on the basis of an enhanced sequencing regime in which the supply of substrates is controlled such that a planned time of maintenance is reached for two or more process chambers simultaneously. Consequently, the occurrence of non-correlated sequential down times of various process chambers may be significantly reduced, thereby enhancing throughput and availability of complex cluster tools.

Abstract: The present invention relates to a vacuum pumping system (10) which comprises: a vacuum pumping mechanism (12) and a motor (14) for driving the vacuum pumping mechanism. Means (16) are provided for determining a cumulative load on the vacuum pumping system over time by monitoring a characteristic of the motor over that time. Means (18) are also provided for activating a maintenance activity on the system when the cumulative load exceeds a predetermined amount.

Abstract: The present disclosure includes a method for quantifying contribution to overall variability of moisture content in wood products and associated computer software. The method comprises the steps of obtaining moisture content data for the wood products and identifying one or more sources of variability in the moisture content data. A contribution to overall variability from each of the one or more sources of variability is then quantified. One or more opportunities to impact the overall variability are then quantified, each of the one or more opportunities being associated with one or more executable steps.

Abstract: A field device resident algorithm receives one or more diagnostic inputs and generates actionable service information. The algorithm(s) can be changed or updated after the manufacture of the field device. The actionable service information can be displayed locally or sent over a process control loop. A prediction engine can be employed to determine a period within which such service should be completed.

Abstract: A method of conducting vehicle usage data analysis is provided. The method includes providing usage data about at least one vehicle to a database. The usage data may be analyzed and compared to a member of a set of vehicle development models to determine whether to update a vehicle development model. The usage data may also be analyzed to determine whether to transmit a communication to a vehicle.

Abstract: A control unit (120) of a production index information generating device (100) groups, based on log information of a production device, processing targets to generate groups for which end time of processing falls within a predetermined interval, classifies the processing targets contained in the groups into classes based on a number of the processing targets contained in each of the groups, generates cycle time information for each of the classes, which specifies cycle time of each of the processing targets contained in corresponding one of the classes, and determines a production capability of the production device. Accordingly, an index specifying a capability of the production device may be obtained with ease.

Abstract: Methods, apparatuses and systems that facilitate the design, production and/or measurement tasks associated with manufacturing and other processes. In one embodiment, the present invention provides an understanding of how the multiple characteristics of a given process output are related to each other and to process inputs. This knowledge facilitates a reduction in measurement costs. It also facilitates an understanding of the sometimes complex interrelationships between design targets, design tolerances, process inputs, process control variables, average process output and variation in the process output. As discussed in more detail below, embodiments of the present invention facilitate 1.) determination of design target values, 2.) determination of design specification limits, 3.) design of process inputs, 4.) determination of process control variable settings, and/or 5.) reduction of measurement costs.