Abstract: Polyoxymethylene polymers having thermally stable but photochemically sensitive and degradable random linkages ##EQU1## in the chain where n is 0 or 1, R.sup.3 and R.sup.4 are H or lower alkyl and at least one of R.sup.1 and R.sup.2 is a phenyl group with an orthonitro substituent are made by intercalating a polyoxymethylene polymer with the appropriate dioxane or dioxolane. By exposing a film of the polymer to light through a transparency followed by heating or a heated treatment with base, a relief image of the copy on the transparency is obtained.

Abstract: A photosensitive resin composition consisting of, or comprising as the essential components, (A) a photo-polymerizable unsaturated compound having at least two terminal ethylene groups, (B) a sensitizer capable of initiating polymerization of the above unsaturated compound upon irradiation with active rays, (C) a compound containing at least two epoxy groups, and (D) a compound selected from the group consisting of dicyandiamide, p,p'-diaminodiphenyl compounds, polycarboxylic acids having at least two carboxyl groups, polycarboxylic anhydrides and mixtures of the polycarboxylic acids and the polycarboxlic anhydrides. The above photosensitive resin composition can give a protective film excellent in solvent resistance, chemical resistance, heat resistance and mechanical strengths, and hence, can be used in the production of printed circuit boards, precision-processing of metals and as materials for adhesives, paints, plastic relief and the like.

Abstract: Phase holograms are recorded in the visible with high efficiency by the use of a transparent photosensitive recording composition containing a transparent thermochromic electrochromic or photochromic compound capable of forming a chromatic sensitizer temporarily in situ in the composition when under the influence of external physical excitation appropriate to the nature of the compound, namely heat, an electric field or irradiation. In the process of recording, the physical excitation is applied and maintained during the duration of the recording, whereafter the physical excitation is terminated and the recording composition becomes transparent again leaving the recording constituted solely by local refractive index variations.

Abstract: Photopolymerizable compositions and processes for photopolymerizing such compositions are provided, said process comprising admixing with said epoxides, photosensitive organohalogen compounds in combination with an organometallic compound and thereafter applying energy to the resulting mixture. The organohalogens decompose to liberate an active catalyst which then serves to initiate polymerization of the epoxide material. The organometallic compound functions synergistically with the organohalogen to enhance the film forming properties of the resulting polymer and or sensitivity of the polymerizable system.

Abstract: A resist mask is formed by coating on a substrate a layer of a polymer, such as polymethyl methacrylate, which is degradable by high energy radiation, such as a scanning electron beam. The layer is exposed to high energy radiation in a patternwise manner so as to lower the molecular weight of the polymer in the exposed portions. The layer is developed to remove the exposed portions by immersing the layer in a developer which consists of alkyl acetates and ketones having between 7 and 9 carbon atoms and mixtures thereof at a temperature of at least about 40.degree. C.

Abstract: Polymers capable of being cross-linked by light, which comprise units having lateral substituted 1-carbonyloxy-1H-naphthalene-2-one groups of the formula ##SPC1##Where R is hydrogen or methyl; R.sub.1 is a streight-chain or branched, saturated or unsaturated hydrocarbon radical having from 1 to 3 carbon atoms, in which a hydrogen atom may be substituted by cyano, (C.sub.1 to C.sub.2) alkoxy, carbo-(C.sub.1 to C.sub.2)-alkoxy, (C.sub.1 to C.sub.2)acyl or (C.sub.1 to C.sub.2)acyloxy and R.sub.2 and R.sub.3, independently, each are (C.sub.1 to C.sub.4)alkyl or chlorine; and R.sub.4 is (C.sub.1 to C.sub.4)alkyl, nitro, chlorine or bromine, are provided.

Abstract: Very sensitive electron beam positive resists have been obtained using films of nitrocellulose containing 10.5 to 12% nitrogen.

Abstract: A positive resist image is produced by exposing, to radiation in a predetermined pattern, a polymeric material containing polymerized alkyl methacrylate units and polymerized monoethylenically unsaturated acid units. The exposed and unexposed areas are distinguished by their different respective abilities to be swelled in an appropriate swelling agent, and the swelled areas are removed by dispersal in a nonsolvent liquid.

Abstract: A radiation-sensitive element comprises a support having thereon a composition comprising a depolymerizable polymer, such as a polymer of an aromatic 1,2-dialdehyde, and may also contain a radiation-sensitive substance or combination of substances, binder and/or a color-forming substance or combination of substances.A negative-working radiation-sensitive process comprises exposing a radiation-sensitive element to radiation, following which the element is heated in order to accelerate the depolymerization reaction. A visible image can be formed during heating by the reaction of the released monomer, such as an aromatic 1,2-dialdehyde, with a color-forming substance included in the element or contained in a separate element, or by heat treatment in the presence of a gaseous color-forming reagent.

Abstract: This invention relates to photopolymerizable compositions comprising an ethylenically unsaturated organic compound and a visible light photosensitizing composition comprising a combination of Mn.sub.2 (C0).sub.10 and a co-catalyst selected from the group consisting of a compound characterized by the formula ##SPC1##Wherein R.sub.1 is --H, --Br, or --CH.sub.3, R.sub.2 is --H or --CH.sub.3, and R.sub.3 is --H or --CH.sub.3 ; cumene; diisopropyl benzene; alkyl mercaptans containing from 10 to 16 carbon atoms; thiourea; and mixtures thereof and to polymerized products thereof. The invention also provides a process for photopolymerizing ethylenically unsaturated organic compounds with visible light in the range of 4,000 to 7,000 angstroms.

Abstract: A method for modifying vesicular images into non-scattering images is provided, which comprises opening the closed bubbles of the vesicular image to form an open-bore image by allowing at least one organic solvent which attacks the thermoplastic bubble walls of the vesicular image to act on the latter, optionally making the image wettable with a surfactant introducing the image substance into the open pores by treatment with a solution or dispersion of the image substance and, optionally removing any remaining gas bubbles or pores by heat or solvent treatment.

Abstract: Photopolymerizable compositions and processes for photopolymerizing such compositions are provided, said process comprising admixing with said epoxides, photosensitive organohalogen compounds in combination with an organometallic compound and thereafter applying energy to the resulting mixture. The organohalogens decompose to liberate an active catalyst which then serves to initiate polymerization of the epoxide material. The organometallic compound functions synergistically with the organohalogen to enhance the film forming properties of the resulting polymer and or sensitivity of the polymerizable system.

Abstract: The invention disclosed is directed to new curable liquid polyene-polythiol compounds containing particular polar groups, at least one unsaturated carbon-to-carbon bond disposed at a terminal position on a main or pendant chain of the molecule and at least one terminally disposed thiol group, with the sum of the unsaturated bonds and thiol groups per polyene-polythiol molecule being at least 3. Upon curing in the presence of a free radical generator such as actinic radiation, the polar polyene-polythiol compounds form solid elastomeric and rigid products which are useful in a variety of applications including coatings, adhesives, sealants and molded articles.

Abstract: Material useful in electropolymerization processes comprises a conductive support and a layer thereon of a composition comprising a polymerizable monomer and polymerization catalyst precursor which is a combination of an alkali metal nitrite and a primary aromatic amine. Electrolysis of the composition results in diazotization of the amine with subsequent electrolytic generation of polymerization-inducing free radicals. The anodic reaction ensures polymerization at and bonding of the resulting polymer to the support sheet of the material even when used in conjunction with zinc oxide photoconductor cathode layers. The material is particularly useful in negative-working imagery and in the preparation of patterned resist layers.

Abstract: Photopolymeric image inlay articles comprising a photopolymeric image inlaid into a resilient polyester resin coated matrix of a solidified synthetic rock-like mixture.

Abstract: The invention relates to a method of providing a patterned silicon-containing oxide layer on a substrate, by providing a coating comprising a polymerizable siloxane material on the substrate, locally exposing the coating to radiation in accordance with the desired pattern, then developing the exposed coating and converting the siloxane material pattern into the patterned silicon-containing oxide layer.

Abstract: Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.

Abstract: Disclosed is a method for the preparation of a relief printing master which is based on irradiation of a film of a composition comprisingA. a degradable polymer containing segments characterized by the structural formula ##EQU1## wherein R is H, an alkyl radical of 1 to 6 carbon atoms, a chlorine or fluorine substituted alkyl radical of 1 to 6 carbon atoms or a cyano substituted aliphatic hydrocarbon radical of 1 to 5 carbon atoms, andB. a photosensitizer which upon exposure to actinic radiation assumes a .sup.3 (n, .pi.*) or a .sup.1 (n, .pi.*) state.The polymer and photosensitizer combination, which is in the form of a thin film upon a suitable substrate, is exposed in an imagewise manner to actinic radiation to thereby degrade the polymer. Upon such degradation, depressions are formed in the exposed areas thereby rendering the exposed film suitable for use as a relief printing master.

Abstract: A process for electrically interconnecting a group of integrated-circuit chips embedded in plastic is described. Multilayer conductors are plated in grooves photoformed in successively applied plastic layers and connected to the chip pads and to conductors on other layers through vias also photoformed in the plastic. Photoformation of wiring grooves and layer-interconnecting vias is accomplished by ultraviolet irradiation of photosensitized liquid polyester resin.

Abstract: A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.

Abstract: A method of precisely aligning a pattern on one side of an opaque substrate with a pattern on the opposite side thereof through the use of pattern-defining masks, wherein at least certain pattern areas previously not formed on the substrate, as defined selectively through the masks, are formed while the masks are aligned. The first mask is releasably secured to a first side of the substrate so as to define a particular orientation of a desired pattern therethrough, and is dimensioned such that at least one, but preferably several spaced peripheral areas thereof extend beyond adjacent peripheral edge portions of the wafer, with the extended mask areas including alignment indicia. A second mask is then positioned against a second side of the substrate, and is constructed with one or more outwardly extending peripheral areas and respectively associated alignment indicia corresponding in number, and spatial relationship, with those in the first mask.

Abstract: Disclosed is an imaging method which involves exposing to activating radiation in an imagewise manner a film comprised of a matrix polymer as the principal ingredient, a degradable polymer and a photo-oxidant. Exposure of the film causes degradation of the degradable polymer, e.g., poly(acetaldehyde), whereupon the film undergoes a change in optical density in the exposed areas to provide a visible image.

Abstract: An improved method of defining a pattern in a layer of organic material includes depositing a relatively thin layer of silicon dioxide on the layer of organic material, applying to the silicon dioxide layer a film of primer solution comprising a silane derivative, and then forming a photoresist etch mask on the film. By utilizing an ultrasonic etch bath, a uniform and well-defined pattern is etched in the layer of organic material.

Abstract: Electron beam positive resists which are sensitive to electron beam radiation and simultaneously thermally stable are prepared using polycarbonates.

Abstract: A photopolymerizable composition comprising a polyester - polyether block polymer which is useful for preparing relief images and printing plates.

Abstract: A photosensitive resin composition comprising pullulan, which is a polymer having repetition units of maltotriose and is represented by the formula, ##SPC1##Wherein n is an integer of 20 to 8,000, and/or a derivative thereof, a photopolymerizable monomer, a photosensitizer and a thermal polymerization inhibitor, or comprising the said pullulan, which has been incorporated with a photoactive reaction group to provide photosensitivity, and a photosensitizer, is a novel composition low in viscosity which can be prepared by use of water and can be formed into a photosensitive plate capable of being developed with water to give a clear image. Since the pullulan in said composition has no toxicity, the waste water formed at the time of development of said photosensitive plate can be treated with ease.

Abstract: A photopolymerizable paste composition comprising film-forming solid inorganic particulate material, a polymer binder, unsaturated monomers, and an organic initiator dispersed in a hydrogenated terpene solvent provides a screen printable paste composition compatible with thick-film techniques used for fabricating electrically conductive and dielectric patterns and layers on substrates for electronic circuits.

Abstract: Novel cyclic monomers leaving two functional groups capable of undergoing condensation reactions to form amide, urea or urethane linkages and at least one photo or radiation-reactive group are condensed with cyclic comonomers to form a soluble, substantially-linear condensation pre-polymer. A solution of the prepolymer is applied to a substrate and the solution is evaporated off to form a film or foil. The photo or radiation-sensitive layer or foil is exposed or irradiated through a pattern, the unexposed or unirradiated part is dissolved or stripped off, and the relief structure which remains is annealed if necessary. The relief structures obtained are distinguished particularly by the sharpness of their edges, good mechanical and chemical properties as well as good insulating properties. They are suited particularly for the preparation of miniaturized insulating layers.

Abstract: A process for the manufacture of printed multilayer circuits by coating carrier films, which possess metal layers, with a light-sensitive material containing a compound with epoxide groups and with groups which can be cured by electromagnetic rays, by exposing the light-sensitive material through a transparent film which shows the negative image of the conductor traces to be produced, by developing with an organic solvent, by etching the metal layer and pressing the laminates together to form a multi-layer circuit. The parts of the light-sensitive layer which have been pre-cured by exposure to light are subjected to a thermal after-treatment using a curing agent for epoxide groups, whereby these parts are post-cured. These parts are not removed from the carriers films.

Abstract: A photopolymerizable vinylurethane monomer and a composition thereof useful for the preparation of printing plates and reliefs, the vinylurethane monomer being expressed in general by the following chemical formula: ##SPC1##In which R represents a hydrogen atom or a methyl group, X represents an alkylene or alkane-triyl to -hexayl group or polyalkyleneoxy group having a number average molecular weight not exceeding 2000 or 3000 respectively, and n represents a corresponding number to the valency of the group X selected from 2 to 6, and A represents an alkyleneoxy group or polyalkyleneoxy group of the formula: ##EQU1## where R is a hydrogen atom or a methyl group and m is a positive integer of 1 to 11, and the composition comprising the vinylurethane monomer, ethylenically unsaturated liquid monomers and a photosensitizer.

Abstract: A colored image in a polymer binder is obtained by polymerization of a mixture comprising (1) at least one polymerizable monomer, (2) a halogen containing activator (free radical source), (3) a binder, and (4) at least one normally bleachable dye, dissolved in said mixture; the polymerization being accomplished by imagewise exposure of said composition to a suitable dose of radiation, and is accompanied by fixing of the dye to the photopolymer. As a consequence, the dyes lose their bleaching characteristic and when the exposed areas are developed with a strong acid such as one which would normally bleach the dye, the dye is leached from only the unexposed areas. If the developer also includes an aliphatic alcohol, the unexposed areas may be removed, leaving a relief image with color in the raised portions.

Abstract: A video disc master of glass, having a metal surface with microscopic apertures therein representing information, is coated with a commercial photosensitive resist, the sensitivity of which has been enhanced. The resist is uniformly exposed through the glass disc. The unexposed resist is removed using conventional developers to which a surfectant is added. The resulting disc has surface irregularities of predetermined height which can be alternatively used to product "stampers" for embossing replicas or to produce a mold for casting replicas.

Abstract: Material useful in electropolymerization processes comprises a conductive support and a layer thereon of a composition comprising a polymerizable monomer and polymerization catalyst precursor which is a combination of an alkali metal nitrite and a primary aromatic amine. Electrolysis of the composition results in diazotization of the amine with subsequent electrolytic generation of polymerization-inducing free radicals. The anodic reaction ensures polymerization at and bonding of the resulting polymer to the support sheet of the material even when used in conjunction with zinc oxide photoconductor cathode layers. The material is particularly useful in negative-working imagery and in the preparation of patterned resist layers.

Abstract: Chromophore-substituted vinyl-halomethyl-s-triazine compounds are provided capable of free-radical generation upon excitation with radiation having a wavelength of from about 330 to about 700 millimicrons.

Abstract: Described are novel semiconductor structures having a protective passivating layer made from photo- or radiation cross-linking of selected reactive sites of a soluble pre-polymer which is a poly-addition or poly-condensation product of a polyfunctional carbocyclic and/or heterocyclic compound having reactive groups for condensation or addition as well as photoreactive or radiation-reactive groups capable of further polymerization or dimerization. Selected non-cross-linked portions of the passivating layer may be removed by dissolution to form contact points for various useful semiconductor and capacitor components.

Abstract: A presensitized lithoprinting plate which needs no fountain solution on printing comprising a support and a coating layer of a mixture of a photosensitive material and a silicone rubber.

Abstract: A process for making photoresists which comprises preparing a photopolymerizable layer of an addition polymer, an initiator system, and a polymerizable inhibitor, using a preformed macromolecular binding agent which is a copolymer of a first monomeric material containing one or more non-acidic vinyl-type compounds and a second monomeric material containing one or more alpha,beta-unsaturated carboxyl-containing monomers, wherein the ratio of the first monomer to the unsaturated carboxylic-containing monomer is sufficient to render the binding agent soluble in a dilute alkaline solution; thereafter exposing a portion of the photopolymerizable layer to actinic light; and washing said layer with a dilute aqueous alkaline solution to dissolve the unexposed portion of the photopolymerizable layer. Preferably, the photopolymerizable layer is supported on a metallic substrate prior to said washing step.

Abstract: Photopolymerizable screen printing inks comprising a hydroxyalkyl acrylate-type monomeric material, a polyester binder and a free-radical initiating system, such inks having a viscosity of from 5,000 to 200,000 centipoises, an acid number of from 0 to 120 and a thixotropic index of from 1 to 4. The process of using such inks to treat substrates, such as in making printed circuits, which includes the steps of screen printing the photopolymerizable ink on the substrate; exposing the ink to actinic radiation to cure the ink and to form a resist; and permanently modifying the exposed areas on the substrate. The resist may thereafter be removed by dissolving in aqueous dilute alkali or an organic solvent.

Abstract: A technique for the fabrication of integrated optical circuits is described wherein a transparent polymer film, which is doped with a polynuclear aromatic thiol having higher index of refraction than the polymer, is deposited from a liquid solution on a smooth substrate. Upon selective exposure to radiation there is a substantial reduction or elimination of the mobility and volatility of the dopant in the polymer matrix, a phenomenon known as "photolocking". The described class of dopant permits the attainment of higher resolution than previously reported, as well as the preparation of optical direction couplers having higher coupling strengths than those of the prior art.

Abstract: A photopolymerizable element for the preparation of relief printing plates. The element comprises an addition polymerizable monomer (e.g. trimethylolpropane trimethacrylate), a free radical initiator for polymerizing the monomer (e.g. benzophenone) and a polyester-based polyurethane binding agent which is the reaction product of 4,4'-methylenebis(phenyl isocyanate), a polycaprolactone diol having a molecular weight in the range of 1,000 to 2,500, and a mixture of at least two aliphatic diol extenders. Optionally the photopolymerizable element is provided with a support layer such as a polyester film or paper.Processes for the preparation of relief printing plates from said elements are also disclosed.

Abstract: A method of applying an anti-reflective coating, particularly a metal oxide coating to a solar cell during the manufacture of such cell.

Abstract: A method for preparing coatings, particularly imaged surfaces such as photoresists, printing plates, etc. which includes coating the surface of a substrate with a solid curable composition containing liquid polyene and solid styrene-allyl alcohol copolymer based polythiol components, curing the composition by exposing selected areas thereof to a free radical generating source, e.g. actinic radiation and removing, e.g., by dissolving, the uncured, unexposed areas of the curable composition to bare the underlying substrate. The solid polythiol is a reaction product of a copolymer of styrene-allyl alcohol and a mercaptocarboxylic acid, e.g. .beta.-mercaptopropionic acid.

Abstract: Photopolymerizable compositions comprising a polymerizable epoxide, vinyl ether, or other acid-catalyzed monomer and a phototropic, alkyl substituted-orthonitrobenzene containing compound are provided, which, when exposed to actinic radiation, are polymerized by the radiation produced acidic initiator.

Abstract: Solvent-developed type photosensitive compositions containing as an essential ingredient at least one selected from the group of the cyclization product of butadiene polymer or copolymer and organic solvent, with or without at least one member selected from the group consisting of photosensitizer and photosensitive crosslinking agent, both soluble in an organic solvent.

Abstract: Laminates for the production of relief plates for flexographic printing, by imagewise exposure and washing out with a developer solution have, on a base optionally provided with an elastomeric layer, a photo-crosslinkable layer containing a photoinitiator and consisting of a polyurethane elastomer which has been prepared in a special manner from an aliphatic saturated polyesterglycol, an aliphatic diisocyanate, but-1-ene-3,4-diol and, if desired, another diol and which has a Shore A hardness of 30 to 90.degree. in the photo-crosslinked state, the elastomer being optionally mixed with a photo-crosslinked monomer.

Abstract: A method of chemical machining utilizing selective plating techniques to form a metal component from sheet metal sheets, in which each sheet is degreased, rinsed in deionized water, and thoroughly dried, then is coated with a positive photoresist. The photoresist is cured, and then the image of the component to be formed is photographically applied to either side of the sheet utilizing photomasks, the photographically exposed photoresist is removed from the sheet, and the sheet etched to provide the basic component configuration. Selective plating is effected by further photographically exposing the photoresist of the sheet that overlies the portions of the sheet to be plated, by utilizing photomasks delineating the areas to be plated, after which the freshly exposed photoresist is removed, the sheet baked to better condition the resist for plating, and then suitably electroplating the areas of the sheet metal thus exposed. After plating, the completed component is soaked in acetone to remove the resist.

Abstract: A dry presensitized planographic plate composed of a support having coated thereon one or two layers of (a) a silicone rubber, (b) a photosensitive azide compound, (c) a cyclized rubber, and (d) a copolymer of vinylidene chloride and acrylonitrile, the uppermost layer, when the planographic plate has two layers, containing at least the component (a) and (b) and the lower layer containing at least the component (c).

Abstract: Photosensitive resins comprising high molecular weight compounds containing a thienylacrylic acid ester or amide group. These resins can be used for formation of images, optionally, in combination with at least one sensitizer. These resins have extremely high photosensitivity in comparison with conventional photosensitive high molecular weight compounds. The methods of preparing the polymer and the thienylacrylic acid ester or amide functional group containing monomers are disclosed.

Abstract: This invention relates to an electrophotographic process for the production of a printing form which comprises electrostatically charging a supported photoconductive and photopolymerizable layer, exposing the charged layer to light under a master, developing the resulting latent image with an electroscopic material, again exposing the layer to light, and removing the developed image areas from the support.

Abstract: Recording media comprising films of a polydialdehyde are suitable for recording information with electron beams.