Abstract: A build plate assembly for a three-dimensional printer includes: a lighting panel having individually addressable pixels configured to selectively emit light and/or transmit light from illumination below the pixels to a top surface top surface of the lighting panel; a rigid, optically transparent, gas-impermeable planar screen or base having an upper surface having an uneven surface topology and a lower surface that is affixed to the top surface of the lighting panel; and a flexible, optically transparent, gas-permeable sheet having upper and lower surfaces, the upper surface comprising a build surface for forming a three-dimensional object, the sheet lower surface positioned opposite the base, wherein the build plate is configured to permit gas flow to the build surface.

Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.

Abstract: An imprint method is provided. The method includes exercising an imprint head along a preconditioning trajectory before contacting the imprint head with a formable material on a substrate, followed by performing imprinting on the formable material after exercising the imprint head. The exercise of the imprint head along the preconditioning trajectory may be performed after the imprint head has been idled for a predetermined period of time. The exercise of the imprint head along the preconditioning trajectory may also be performed for a duration decided based on expected throughput requirements and tools used for the imprinting process.

Abstract: An optical film for a back light unit that includes an array of light emitting diodes. The optical film includes a substrate, and a plurality of regions of spatially modulated microstructures on at least one side of the substrate. The spatially modulated microstructures have different sizes and/or shapes configured to create a gradient structure within each region. The gradient structure within each region is constructed and arranged to cause more spreading of light when positioned directly above an individual light emitting diode and less spreading of light at locations not directly above an individual light emitting diode. Within the back light unit, the gradient structure converts light beams emitted by the respective light emitting diode at different angles into a more uniform and higher on-axis luminance upon exiting the back light unit.

Abstract: An imprint apparatus is provided. The imprint apparatus includes an imprint head, at least one cable assembly configured to supply a signal to the imprint head, and a cable assembly sensor configured to detect a state of the at least one cable assembly. The signal may include one or more of a voltage signal, a current signal, and a pneumatic signal. The cable assembly sensor may include a strain gauge configured to measure a strain of the at least one cable assembly or a load cell configured to measure a force on the at least one cable assembly. For example, the cable assembly may include an electric wire and/or a gas supply tube.

Abstract: An additive manufacturing method wherein the carrier (400) is within a vessel (100), the vessel contains the free-radically crosslinkable resin (300) and a liquid (200) which is immiscible with the free-radically cross-linkable resin (300) and has a higher density than the free-radically crosslinkable resin (300), such that the free-radically crosslinkable resin (300) floats on top of the liquid (200) and, prior to each step II), the distance between the carrier (400) and the free-radically crosslinkable resin (300) is altered such that a layer of the free-radically crosslinkable resin forms above the uppermost surface (420), viewed in vertical direction, of the previously deposited layer of the construction material (600) and at least partially forms contact with this uppermost surface (420) of the previously deposited layer of the construction material (600). The free-radically crosslinkable resin (300) comprises a urethane (meth)acrylate.

Abstract: A projection exposure apparatus for semiconductor lithography includes at least one component which is provided with a damping arrangement for dissipating mechanical vibration energy. The damping arrangement includes a ferromagnetic element, through which a magnetic field passes at least partly. The magnetic flux density is inhomogeneous at least regionally. The ferromagnetic element is mounted in such a way that it is movable with a movement component in the direction of the inhomogeneity of the magnetic field.

Abstract: A post-processing apparatus includes a post-processing unit configured to receive sheets from an image forming apparatus, perform processing on the received sheets, and then discharge the processed sheets through a discharge port. A sensor is configured to detect a presence of an object at the discharge port. The sensor includes a first light emitter on a first side of the discharge port that is positioned to emit a light across a width of the discharge port, a reflector on a second side of the discharge port opposite the first side in a first direction, and a first light receiver positioned to receive light of the first light emitter from the reflector. A controller is configured to terminate the processing on the received sheets by the post-processing unit when the sensor detects the presence of the object at the discharge port.

Abstract: The present invention provides a mechanism by which an image forming apparatus notifies an apparatus that inputs an image forming job to the image forming apparatus that the image forming apparatus is during remote support service, and suitably restricts acceptance of image forming jobs.

Abstract: The present invention relates to a method creating highly concentrated quantum entangled particles which can be embedded into substrates such that the particles, and therefore substrates they are embedded upon are remotely controllable. The invention includes streaming a beam of particles through a beam splitter and then applying a selected correlation system, such as NMR or supercooling, to the particles in order to align the particle spins. The particles are then released from the correlation system resulting in an unnaturally high saturation of concentrated quantum entangled particles on a macro scale. The particles and substrates are then in a salve-x relationship configuration and are therefore remotely controllable. Through stimulation and detection, changes in state may be observable in order to determine the level of concentration and remote control.

Abstract: The disclosure details the implementation of au apparatus, method, and system comprising a portable device configured to communicate with a terminal and a network server, and execute stored program code in response to user interaction with an interactive user interface. The portable device contains stored program code configured to render an interactive use interface on a terminal output component to enable the user the control processing activity on the portable device and access data and programs from the portable device and a network server.

Abstract: The disclosure details the implementation of an apparatus, method, and system comprising a portable device configured to communicate with a terminal and a network server, and execute stored program code in response to user interaction with an interactive user interface. The portable device contains stored program code configured to render an interactive user interface on a terminal output component to enable the user the control processing activity on the portable device and access data and programs from the portable device and a network server.

Abstract: Embodiments provide for a graphics processing apparatus comprising a graphics processing engine configured for tiled memory access. In one embodiment the graphics processing engine is configured to render pixel data to a tile of memory and write to metadata associated with the tile of memory that indicates a data characteristic of the pixel data. The data characteristic of the pixel data includes whether the pixel data is transparent or whether the pixel data is an update of data from a previous frame.

Abstract: An extreme ultraviolet (EUV) exposure apparatus includes a chamber, an EUV source in the chamber and configured to generate an EUV beam, an optical system above the EUV source and configured to provide the EUV beam to a substrate, a substrate stage in the chamber and configured to receive the substrate, a reticle stage in the chamber and configured to hold a reticle that is configured to project the EUV beam onto the substrate, and a plasma source configured to provide plasma to the reticle to electrically neutralize the reticle charged by the EUV beam.

Abstract: The invention discloses an optical microscopy system (10) for stimulated emission depletion (STED) of an object (O). An optical element (6) is applied for focusing a first excitation (1) and a second depletion (2) beam on the object thereby defining a common optical path (OP) for both the first and the second beam. A phase modifying member (5) is inserted in the common optical path (OP), and the phase modifying member is optically arranged for leaving the wavefront of the first beam substantially unchanged, and for changing the wavefront of the second beam (2?) so as to create an undepleted region of interest (ROI) in the object. The first beam and the second beam have a common optical path because the phase modifying member adapts the wavefront or phase in such a way that it has no effect on the first beam, while on the second beam it gives rise to a wavefront, or phase change, resulting in a depleted region in the object (e.g. to the donut shaped spot) at the focal plane.

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Abstract: The invention discloses a stealth method by use of three-dimensional spraying.

Abstract: An image forming apparatus includes a body casing provided therein with a container mounting part in which a plurality of toner containers are juxtaposed and mounted in a predetermined direction and an opening and closing door for opening and closing a toner container attaching/detaching opening formed on a sidewall opposite to the container mounting part in the body casing. The opening and closing door includes a plurality of sliding doors configured to slidably move within a range of a width of the opening in the predetermined direction.

Abstract: A vision system for a vehicle includes a camera disposed at a vehicle and having a field of view exterior of the vehicle. A brightness control, responsive to processing of a frame of image data captured by the camera, interpolates towards an expected brightness for a next frame of captured image data by calculating a set of at least three brightness values using three different control coefficients derived from a previous frame of image data captured by said camera. The brightness control interpolates toward the expected brightness of the next frame of captured image data using the current expected brightness value and two of the three brightness values derived from the three control coefficients derived from the previous frame of captured image data.

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: A micro electrical mechanical system (MEMS) optical sensor including a fluid channel having an input portion, an output portion and a curved portion positioned between the input portion and the output portion; a light source impinging on a first boundary of the curved portion and exiting from a second boundary of the curved channel; a photodetector to record a light path of refraction of the light source exiting from the second boundary of the curved portion; a processor to compute the refractive index of a fluid in the curved portion using the light path of refraction of the light source and compare the computed refractive index to a known refractive index for the fluid to determine a difference between the computed refractive index and the known refractive index.

Abstract: An assembly for a rotatable surveillance camera is disclosed. The assembly can include a gimbal ring, a base securable to the gimbal ring and a flexible hook member securable to the base. The gimbal ring can have a slotted channel recessed into an interior surface. The slotted channel can have a spiral configuration with opposing ends and can extend around the interior of the gimbal ring at least one full revolution. The base can have a side wall with a slot provided through at least a portion thereof. The hook member can have a proximal end within the interior of the base and can extend outside the base through the slot to an opposing end having a tab. The slotted channel can receive the tab and be slidably rotated around said tab between the opposing ends during rotation of the gimbal ring relative the base.

Abstract: An image forming apparatus includes: a print job acquisitor that acquires a print job; a hardware processor that calculates, before starting printing based on the print job, a distance in a paper conveying direction in which the printing is continuously executed, and in a case where the distance is equal to or greater than a predetermined distance, allows a user to select at least one image as a print image out of a first image generated on the basis of the print job and a second image different from the first image; and a printing part that prints the print image selected by the user on paper.

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: A manufacturing method of a glass substrate is provided, in which a mask including a light-blocking area, a transparent area and a partial-transparent area is adopted. The partial-transparent area protrudes from edges of the light-blocking area to admit some of the UV rays to pass through. In addition, a glass substrate manufactured with the method is also disclosed. By arranging the partial-transparent area on the edges of the light-blocking area, the mask is formed with a slope having a small angle after a lithography process. As such, in an etching process, an edge of a thin film is formed with a slope having a small angle, which contributes to the formation of a second thin film. The thin films are prevented from being fragmented around the slope and the ITO layer is also prevented from fragmented around the periphery of the through hole.

Abstract: An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength ? includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion ?ni=ni(?0)?ni(?0+1 pm) for a wavelength variation of 1 pm from a wavelength ?0. The objective satisfies the relation ? ? i = 1 N ? ? ? ? n i ? ( s i - d i ) ? ? 0 ? NA 4 ? A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.

Abstract: Provided are an inter-layer video encoding method and apparatus therefor and an inter-layer video decoding method and apparatus therefor. An inter-layer video decoding method involves reconstructing a first layer image, based on encoding information obtained from a first layer bitstream; in order to reconstruct a second layer block determined as a predetermined partition type and to be in a prediction mode, determining whether to perform illumination compensation for the reconstructed second layer block determined by using a first layer reference block that is from among the reconstructed first layer image and corresponds to the second layer block; and generating the reconstructed second layer block by using inter-layer prediction information obtained from a second layer bitstream and the first layer reference block, and generating a second layer image including the reconstructed second layer block whose illumination is determined according to whether the illumination compensation was performed.

Abstract: A method for fabricating a pellicle assembly includes forming a release layer over a carrier. A membrane layer is fabricated over the release layer. A pellicle frame is attached to the membrane layer. After attaching the pellicle frame to the membrane layer, a release treatment process is performed to the release layer to separate the carrier from the membrane layer. A pellicle assembly including the pellicle frame and the membrane layer attached to the pellicle frame is formed.

Abstract: A method for sub-diffraction-limited patterning using a photoswitchable layer is disclosed. A sample of the photoswitchable layer can be selectively exposed to a first wavelength of illumination that includes a super-oscillatory peak. The sample can be selectively exposed to a second wavelength of illumination that does not include the super-oscillatory peak. A region in the sample that corresponds to the super-oscillatory peak and is associated with the second transition state can optionally be converted into a third transition state. The region in the sample at the third transition state can constitute a pattern of an isolated feature with a size that is substantially smaller than a far-field diffraction limit.

Abstract: The present invention relates to a method for simulating image quality improvement of an image display device, in which the image display device to be tested is made to display an optimized picture quality with a simplified process by applying simplified simulation program and device; and a device therefor.

Abstract: An optical writing controller controls emission of a light source device including multiple light emitting element rows each constituted by multiple light emitting elements arranged in a sub-scanning direction to form an electrostatic latent image on a photoconductor. The optical writing controller includes an image information acquisition unit to acquire image information on an image to be formed as the electrostatic latent image; a light source control unit to sequentially control emission of the multiple light emitting elements on the basis of information on pixels generated on the basis of the acquired image information; an error information acquisition unit to acquire information indicating an error of a direction in which the light emitting elements are arranged with respect to the sub-scanning direction; and an adjustment value generation unit to generate an adjustment value for adjusting a light quantity of each light emitting element on the basis of the error.

Abstract: A system for document searching can include a camera. The system may further include an image capturing module configured to capture a first image of a first portion of a document, a feature recognition module in communication with the image capturing module, the feature recognition module configured to determine a first feature associated with the first image, a search module configured to send search information to a server and receive a first result from a first search of a set of documents that was performed based on one or more search criteria determined based on the first feature associated with the first image, and a search interface configured to present the first result on the device.

Abstract: An exposure apparatus includes a first member disposed at least in a part of a periphery of an optical path of the exposure light, and has a first face that faces an upper face of the object through a first gap and holds the liquid between the upper face of the object and the first face, a second member disposed at an outer side of the first face with respect to the optical path and has a second face facing the upper face of the object through a second gap, a first supply port disposed at an outer side of the second face and supplies a fluid, and a first suction port disposed between the first face and the second face, and suctions at least part of gas in an outer space of the second member via a gap between the second face and the upper face of the object.

Abstract: Disclosed is a printing device comprising a collimation layer disposed between a display screen and a sheet of instant film. The printing device quickly and compactly prints the display screen contents to the instant film, using a collimation layer that may be embedded in an opaque ribbon and drawn across the instant film. The collimation layer blocks any light not parallel to the normal vector of the display screen, thereby eliminating the need for traditional lenses to focus light. This in turn allows the printing device to yield high resolution photos with very short printing timeframes.

Abstract: A method of forming a three-dimensional object is carried out by providing a carrier and an optically transparent member having a build surface, the carrier and the build surface defining a build region therebetween; filling the build region with a polymerizable liquid; irradiating the build region through the optically transparent member to form a solid polymer from the polymerizable liquid and advancing the carrier away from the build surface to form the three-dimensional object from the solid polymer, while also concurrently with the irradiating and/or advancing steps: (i) continuously maintaining a dead zone of polymerizable liquid in contact with the build surface, and (ii) continuously maintaining a gradient of polymerization zone between the dead zone and the solid polymer and in contact with each thereof. The gradient of polymerization zone comprises the polymerizable liquid in partially cured form (e.g.

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.

Abstract: Features are fabricated on a semiconductor chip. The features are smaller than the threshold of the lithography used to create the chip. A method includes patterning a first portion of a feature (such as a local interconnect) and a second portion of the feature to be separated by a predetermined distance, such as a line tip to tip space or a line space. The method further includes patterning the first portion with a cut mask to form a first sub-portion (e.g., a contact) and a second sub-portion. A dimension of the first sub-portion is less than a dimension of a second predetermined distance, which may be a line length resolution of a lithographic process having a specified width resolution. A feature of a semiconductor device includes a first portion and a second portion having a dimension less than a lithographic resolution of the first portion.

Abstract: The present disclosure relates to systems and methods that are related to projection.

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.

Abstract: To provide a lighting device for image capturing in an electronic component mounting apparatus that has small dimensions in the height direction and a small size in a plan view and thus can meet demands in a reduction in size. In an electronic component mounting apparatus, a surface lighting unit 30 that emits illumination light to a substrate, which is an object whose image is to be captured by a camera 25, includes as a main component a flat lighting substrate 31 that is provided between the camera 25 and the substrate, which is an object whose image is to be captured, so as to be substantially parallel to the surface of the substrate.

Abstract: A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.

Abstract: The disclosed embodiments provide systems and methods for mitigating lensing and scattering as an optical fiber is being inscribed with a grating. The disclosed systems and methods mitigate the lensing phenomenon by surrounding an optical fiber with an index-matching material that is held in a vessel with a sealed phase mask. The sealed phase mask allows it to be in contact with a liquid index-matching material without having the liquid index-matching material seep into the grooves of the sealed phase mask. Thus, for some embodiments, the sealed phase mask may be immersed in a liquid index-matching material without adversely affecting the function of the phase mask.

Abstract: A reticle for multiple patterning a layer of an integrated circuit die includes a first portion with a first layout pattern for multiple patterning the layer of the integrated circuit die, and a second portion with a second layout pattern for multiple patterning the layer of the integrated circuit die. The first layout pattern is different from the second layout pattern.

Abstract: A two-dimensional dense array of contact holes can be printed on a negative photoresist employing a combination of a quadrupole illumination lens and a lithographic mask including a criss-cross pattern of opaque lines. The openings in the quadrupole illumination lens are aligned along the perpendicular directions of the opaque lines. Discrete contact holes can be printed on a negative photoresist employing a combination of a quadrupole illumination lens and a lithographic mask including a criss-cross pattern of opaque subresolution assist features and discrete opaque cross patterns. Alternately, a two-dimensional array of contact holes can be printed on a negative photoresist employing a quadrupole illumination lens and a checkerboard pattern of openings. The openings in the quadrupole illumination lens are in diagonal directions.

Abstract: Spacer-based pitch division lithography techniques are disclosed that realize pitches with both variable line widths and variable space widths, using a single spacer deposition. The resulting feature pitches can be at or below the resolution limit of the exposure system being used, but they need not be, and may be further reduced (e.g., halved) as many times as desired with subsequent spacer formation and pattern transfer processes as described herein. Such spacer-based pitch division techniques can be used, for instance, to define narrow conductive runs, metal gates and other such small features at a pitch smaller than the original backbone pattern.

Abstract: A scan assisting fixing device and a scanner using the same are provided. The fixing device is for fixing an object to be scanned, which includes a scanning portion and a holding portion. The fixing device includes an accommodation region, a scan window and a protrusion portion. When the holding portion is loaded in the accommodation region, the scanning portion correspondingly disposed in the scan window is retained and fixed by the protrusion portion, and the position of the holding portion in the fixing device is constant, so that the scanning portion is always within the range of the field depth of the scanner regardless of the specification of the positive film holder, and the clarity of the scanned image is assured.

Abstract: A stereoscopic image printing device includes an actuating unit for moving a grating structure, and a positioning module. The positioning module includes a plurality of shelters, a planar light source for emitting light to pass through the grating structure and an interval between the adjacent shelters, and a photosensitive component for receiving the light passing through the grating structure and the interval between the adjacent shelters, so as to generate a corresponding optical intensity signal. The printing device further includes a controller coupled to the actuating unit and the photosensitive component for controlling the actuating unit to move the grating structure according to the optical intensity signal generated by the photosensitive component.

Abstract: There is provided a photomask capable of improving alignment accuracy with respective photomasks disposed on the front and rear faces of a substrate. A photomask has a drawing pattern for exposure formed on one face opposing a substrate, a first alignment mark for alignment with a substrate side mark formed on the substrate, the first alignment mark being provided in a region of the one face, the region opposing the substrate when the substrate is retained and the drawing pattern is not formed in the region, and a second alignment mark for alignment with a third alignment mark provided on another photomask, the second alignment mark being provided in a region which does not oppose the substrate when the substrate is retained.

Abstract: Systems and methods for generating an image are provided. These systems and methods include generating multiple light beams from a light source by controlling at least one parameter of the light source to be different among each of the multiple light beams. The systems and methods further include forming multiple light patterns of circuit structures that are separated in frequency by directing each of the light beams at a mask of circuit features. The systems and methods, when used in lithography for example, further include directing each of the light patterns toward a silicon substrate. The silicon substrate includes a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).