Abstract: An apparatus includes a focusing element arranged to focus a high-energy beam on a workpiece, an image detector for recording at least one image of an area to be monitored on the surface of the workpiece and/or the reference contour; imaging optics arranged to (a) receive process radiation radiation through the focusing element, from an area of the workpiece and/or the reference contour to be monitored, in the form of a first monitoring beam that is non-coaxial with the high-energy beam between the workpiece and the imaging optics and (b) redirect the first monitoring beam to the image detector to provide the at least one image of the area to be monitored and/or the reference contour; and an evaluation device operable to determine the focus position of the high-energy beam based on the at least one recorded image.

Abstract: A glossiness determining device includes: a light source; a two-dimensional sensor that receives reflected light containing a specular reflection component of a subject illuminated by the light source, and outputs an image of the subject; and a determining unit that determines glossiness of the subject by using a saturated image, which is the image of the subject output by the two-dimensional sensor and in which pixel values of a partial area are saturated.

Abstract: In a lithographic projection apparatus, adjustment of the projection system, e.g. to compensate for lens heating effects, is performed by determining a region of interest for a given pattern and illumination arrangement, the region of interest being a non-circular region of a pupil plane of the projection system through which substantially all of the radiation of the modulated beam that contributes to formation of the image passes; obtaining a set of basis functions that are orthogonal over the region of interest; expressing the wavefront in the pupil plane in terms of the basis functions that are orthogonal over the region of interest and a set of coefficients; and determining a value of a control setting to minimize the values of the coefficients.

Abstract: An apparatus for planning and controlling production sequences, in particular printing processes in a printing system. The apparatus includes a sequence control apparatus formed of at least one data input unit, a data output unit, a data processing system and a memory unit, which are connected so as to communicate with one another and with the printing system. The apparatus also includes at least one planning board, which has display elements for displaying individual or a number of printing processes. In addition, a method of planning and controlling the production sequences is described.

Abstract: A scanning exposure apparatus in which a mask and a substrate are moved in a first direction while images of patterns of the mask are exposed onto the substrate includes at least a pair of projection optical systems that are spaced from each other in the first direction by a predetermined distance. The pair of projection optical systems also are displaced from each other in a second direction that is perpendicular to the first direction such that at least portions of projection areas where the images of the pattern are projected by the pair of projection optical systems onto the substrate overlap each other. The scanning exposure apparatus also includes a shifter that shifts the images of the overlapping projection areas on the substrate in the second direction. This enables the measurement of the flatness tolerance of long planar mirrors that are used in controlling the positions of the mask and the substrate to be easily made.

Abstract: An imaging assembly includes a media cartridge for holding a stack of media therein. The media cartridge includes a linkage assembly at least a portion of which is made of a material that is responsive to ambient conditions within the cartridge. An image forming device of the imaging assembly is adapted to control a development of images on the photosensitive media based on the sensed ambient conditions.

Abstract: An image-forming apparatus forms an image by applying a control electric field having a polarity corresponding to recording information, to a recording medium having microcapsules including chargeable particles dispersed in a dispersion medium. The image-forming apparatus includes an alternating electric field-applying unit for applying an alternating electric field to the microcapsules. The alternating electric field is applied to the microcapsules of the recording medium before the image formed on the recording medium is rewritten. Accordingly, the chargeable particles are separated from the wall surfaces of the microcapsules and from the other chargeable particles, making it possible for the chargeable particles to perform free electrophoresis. The recording medium is initialized to improve the response performance with respect to the control electric field for forming a new image. The recording density is increased, and the blur is reduced.

Abstract: A projection exposure apparatus is able to monitor changes in transmissivity of the projection optical system so as to provide a high degree of control over the exposure illuminance to produce precision printing of circuit patterns on a substrate. A referencing member, having reference marks and a window section for determining the illuminance of the transmitting exposure beam, is provided on the sample stage for the substrate. During scanning/exposure process, any positional deviation of projection optical system is checked by the alignment system by comparing reticle marks on the reticle with reference marks on the sample stage illuminated with alignment beams. Simultaneously, illuminance of exposure light passing through the projection optical system is checked to determine if there is any change in the transmission coefficient of the optical system, and illumination power is adjusted to provide near real-time compensation for any change in transmissivity in the optical system.

Abstract: A scanning exposure system to expose an objective wafer has a light source; a slit-shaped window having a length in a first direction greater than a width in a second direction perpendicular to the first direction; a photomask having an exposure opening therein, the exposure opening having a length along a longer direction greater than a width along a narrower direction perpendicular to the longer direction, the longer direction being aligned parallel to a projection of the first direction on the photomask, the objective wafer being exposed to the light source through the slit-shaped window and the exposure opening during a scanning operation by a relative motion of the photomask with respect to the slit-shaped window in a second direction perpendicular to the first direction.