Abstract: A sputtering target containing 0.01 to 0.5 wt % of Ag, and remainder being W and unavoidable impurities. The object of the present invention is to provide a sputtering target capable of forming a film having a relatively low specific resistance by sputtering, wherein the obtained film is endowed with good uniformity, and in particular the sputtering target has superior characteristics upon forming thin films for semiconductor devices, as well as to provide a method for producing the foregoing sputtering target.

Abstract: A method of making dispersion-strengthened alloy particles involves melting an alloy having a corrosion and/or oxidation resistance-imparting alloying element, a dispersoid-forming element, and a matrix metal wherein the dispersoid-forming element exhibits a greater tendency to react with a reactive species acquired from an atomizing gas than does the alloying element. The melted alloy is atomized with the atomizing gas including the reactive species to form atomized particles so that the reactive species is (a) dissolved in solid solution to a depth below the surface of atomized particles and/or (b) reacted with the dispersoid-forming element to form dispersoids in the atomized particles to a depth below the surface of said atomized particles. The atomized alloy particles are solidified as solidified alloy particles or as a solidified deposit of alloy particles.

Abstract: Provided is a copper alloy plate that is for an FPC substrate and that has superior heat dissipation, repeated bending workability, shape retaining properties, and heat resistance. The copper alloy plate contains at least 0.01 mass % of the total of at least one element selected from the group consisting of Ag, Cr, Fe, In, Ni, P, Si, Sn, Ti, Zn, and Zr, contains no more than 1.0 mass % of Ag, no more than 0.08 mass % of Ti, no more than 2.0 mass % of Ni, no more than 3.5 mass % of Zn, and no more than 0.5 mass % of Cr, Fe, In, P, Si, Sn, and Zr by the total of the at least one element selected from the group, the remainder comprising Cu and impurities, has a conductivity of at least 60% IACS, has a tensile strength of at least 350 MPa, and has I(311)/IO(311) determined by X-ray diffraction in the thickness direction of the plate surface that satisfies the formula I(311)/IO(311)?0.5.

Abstract: A secondary alloyed 1N copper wire for bonding in microelectronics contains one or more corrosion resistance alloying materials selected from Ag, Ni, Pd, Au, Pt, and Cr. A total concentration of the corrosion resistance alloying materials is between about 0.09 wt % and about 9.9 wt %.

Abstract: A doped 4N copper wire for bonding in microelectronics contains one or more corrosion resistance dopant materials selected from Ag, Ni, Pd, Au, Pt, and Cr. A total concentration of the corrosion resistance dopant materials is between about 10 wt. ppm and about 80 wt. ppm.

Abstract: A 3N copper wire with trace additions for bonding in microelectronics contains 3N copper and one or more corrosion resistance addition materials selected from Ag, Ni, Pd, Au, Pt, and Cr. A total concentration of the corrosion resistance addition materials is between about 90 wt. ppm and about 980 wt. ppm.

Abstract: An alloyed 2N copper wire for bonding in microelectronics contains 2N copper and one or more corrosion resistance alloying materials selected from Ag, Ni, Pd, Au, Pt, and Cr. A total concentration of the corrosion resistance alloying materials is between about 0.009 wt % and about 0.99 wt %.

Abstract: A Cu—Fe—P alloy sheet that is provided with the high strength and with the improved resistance of peel off of oxidation film, in order to deal with problems such as package cracks and peeling, is provided. A copper alloy sheet for electric and electronic parts according to the present invention is a copper alloy sheet containing Fe: 0.01 to 0.50 mass % and P: 0.01 to 0.15 mass %, respectively, with the remainder of Cu and inevitable impurities. A centerline average roughness Ra is 0.2 ?m or less and a maximum height Rmax is 1.5 ?m or less, and Kurtosis (degree peakedness) Rku of roughness curve is 5.0 or less, in measurement of the surface roughness of the copper alloy sheet in accordance with JIS B0601.

Abstract: A Cu—Fe—P alloy sheet that is provided with the high strength and with the improved resistance of peel off of oxidation film, in order to deal with problems such as package cracks and peeling, is provided. A copper alloy sheet for electric and electronic parts according to the present invention is a copper alloy sheet containing Fe: 0.01 to 0.50 mass % and P: 0.01 to 0.15 mass %, respectively, with the remainder of Cu and inevitable impurities. A centerline average roughness Ra is 0.2 ?m or less and a maximum height Rmax is 1.5 ?m or less, and Kurtosis (degree peakedness) Rku of roughness curve is 5.0 or less, in measurement of the surface roughness of the copper alloy sheet in accordance with JIS B0601.

Abstract: It is an object to provide an inexpensive alloy for heat dissipation having a small thermal expansion coefficient as known composite materials, a large thermal conductivity as pure copper, and excellent machinability and a method for manufacturing the alloy. In particular, since various shapes are required of the alloy for heat dissipation, a manufacturing method by using a powder metallurgy method capable of supplying alloys for heat dissipation, the manufacturing costs of which are low and which take on various shapes, is provided besides the known melting method. The alloy according to the present invention is a Cu—Cr alloy, which is composed of 0.3 percent by mass or more, and 80 percent by mass or less of Cr and the remainder of Cu and incidental impurities and which has a structure in which particulate Cr phases having a major axis of 100 nm or less and an aspect ratio of less than 10 are precipitated at a density of 20 particles/?m2 in a Cu matrix except Cr phases of more than 100 nm.

Abstract: The present invention relates to a nanocrystalline metallic material, particularly to nano-twin copper material with ultrahigh strength and high electrical conductivity and its preparation method. High-purity polycrystalline Cu material with a microstructure of roughly equiaxed submicron-sized grains (300-1000 nm) has been produced by pulsed electrodeposition technique, by which high density of growth-in twins with nano-scale twin spacing were induced in the grains. Inside each grain, there are high densities of growth-in twin lamellae. The twin lamellae with the same orientations are inter-parallel, and the twin spacing ranges from several nanometers to 100 nm with a length of 100-500 nm. This Cu material invented has more excellent performance than existing ones.

Abstract: A Cu—Fe—P copper alloy sheet which has the high strength and the high electrical conductivity compatible with excellent bendability is provided. The Cu—Fe—P copper alloy sheet contains 0.01% to 3.0% of Fe and 0.01% to 0.3% of P on a percent by mass basis wherein the orientation density of the Brass orientation is 20 or less and the sum of the orientation densities of the Brass orientation, the S orientation, and the Copper orientation is 10 or more and 50 or less in the microstructure of the copper alloy sheet.

Abstract: Disclosed is a process for the reprocessing or production of a sputter target or an X-ray anode wherein a gas flow forms a gas/powder mixture with a powder of a material chosen from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of two or more thereof and alloys thereof with at least two thereof or with other metals, the powder has a particle size of 0.5 to 150 ?m, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed on to the surface of the object to be reprocessed or produced.

Abstract: There is provided cryogenic milled copper alloys and methods of making the alloys. The alloys are fine grained and possess desirable physical properties stemming from the fine grain size. Embodiments include desirable physical properties, such as potentially high strength. Some embodiments of the cryogenic milled copper alloys may also be tailored for ductility, toughness, fracture resistance, corrosion resistance, fatigue resistance and other physical properties by balancing the alloy composition. In addition, embodiments of the alloys generally do not require extensive or expensive post-cryogenic milling processing.

Abstract: A copper-base alloy with increased melting point above 1000° C., which is resistant or immune to carburization, metal dusting and coking, resistant to oxidation at elevated temperatures. The alloy has the following composition (in weight-%): Al 4–15, Si 0.1–6, Mo 0.5–40, W 0–40, where the total of Mo and W do not exceed 40%, one or more of the group of Rare Earth Metals (REM), such as yttrium, hafnium, zirconium, lanthanum and/or cerium, up to 1.0 weight-% of each element or a total of maximum 3.0 weight-%, Cu balance and normally occurring alloying additions and impurities. A method for the alloy's production, and the alloy's use as construction components in CO-containing atmospheres, ammonia containing atmospheres, and/or hydrocarbon containing atmospheres or solid carbon containing processes, are also disclosed.

Abstract: The present invention relates to a method of producing W—Cu based composite powder, which is used in heat-sink materials for high-power integrated circuits, electric contact materials, etc, and to a method of producing a W—Cu based sintered alloy by using the composite powder. The method of producing tungsten-copper based composite powder includes first preparing composite oxide powder by dissolving ammonium metatungstate, [(NH4)6(H2W12O40).

Abstract: The present invention provides a Cu—Cr—Zr alloy material excellent in fatigue and intermediate temperature characteristics, which comprises 0.05 to 1.0% by mass of Cr and 0.05 to 0.25% by mass of Zr with a balance of Cu and inevitable impurities. The alloy comprises inclusion particles based on any one of Zr and a Cu—Zr alloy having a diameter of 0.1 &mgr;m or more, and the proportion of the inclusion particles containing 10% or more of sulfur as one of the inevitable impurities is one particle/mm2.

Abstract: The metallic material consists of an alloy including mainly Cu, Mo in an amount of 0.1 to 3.0% by weight and one or a plurality of elements selected from a group consisting of Al, Au, Ag, Ti, Ni Co and Si in a total amount of 0.1 to 3.0% by weight. In the metallic material, Mo is added to Cu so that Mo will be homogeneously mixed in a grain boundary of Cu, resulting in improvement of atmospheric corrosion resistance.

Abstract: A physical vapor deposition target includes an alloy of copper and silver, with the silver being present in the alloy at from less than 1.0 at % to 0.001 at %. In one implementation, a physical vapor deposition target includes an alloy of copper and silver, with the silver being present in the alloy at from 50 at % to 70 at %. A physical vapor deposition target includes an alloy of copper and tin, with tin being present in the alloy at from less than 1.0 at % to 0.001 at %. In one implementation, a conductive integrated circuit metal alloy interconnection includes an alloy of copper and silver, with the silver being present in the alloy at from less than 1.0 at % to 0.001 at %. A conductive integrated circuit metal alloy interconnection includes an alloy of copper and silver, with the silver being present in the alloy at from 50 at % to 70 at %. A conductive integrated circuit metal alloy interconnection includes an alloy of copper and tin, with tin being present in the alloy at from less than 1.0 at % to 0.

Abstract: A sputtering target made of AgxMayMbz or CuxMayMbz, where x>50 at % and Ag or Cu are a first metal, Ma is a second metal and Mb is a third metal is used in a method for manufacturing data storage disks. The method of manufacture includes providing a substrate, providing a spacer layer of a material transmitting light of a selected wavelength onto a surface of the substrate, applying a first layer of a first metal alloy between the substrate and spacer layer, providing a second layer of a second metal alloy on the spacer layer, and depositing the first and second metal alloys so that one of the first and second layers is semi-transparent with respect to the light. The first and second alloys have at least one common metal provided in particular fractions of the alloys.

Abstract: A melt of a Cu-based alloy containing 2 to 6% (% by weight, the same shall apply hereinafter) of Ag and 0.5 to 0.9% of Cr are solidified by casting, and the solidified article after subjecting to a homogenizing heat treatment is subjected to hot-working. The hot-worked article is subjected to a solution treatment, the article is subjected to cold-working or warm-working by forging or rolling, and then the formed article is subjected to an aging treatment to obtain a metallic material capable of manufacturing a high strength and high thermal conductive metal formed article at a low price, regardless of the geometry, and a method of manufacturing the metal formed article using the same.

Abstract: A copper alloy foil to be used in a printed board comprising a polyimide substrate is provided. The copper foil is not subjected to roughening plating and has hence fine surface roughness and can be directly bonded with the polyimide substrate. The copper alloy contains (a) one or more of the additive elements of from 0.01 to 2.0% of Cr and from 0.01 to 1.0% of Zr, or (b) from 1.0 to 4.8% of Ni and from 0.2 to 1.4% of Si. The surface roughness in terms of the ten-point average surface-roughness (Rz) is 2 &mgr;m or less, the 180° peeling strength is 8.0 N/cm or more. The alloy (a) has 600 N/mm2 or more of tensile strength, and 50% ICAS or more of electric conductivity. The alloy (b) has 650 N/mm2 or more of tensile strength, and 50% ICAS or more of electric conductivity.

Abstract: A joint body according to the invention is strong for a heat cycle and generates no local cracks. The joint body has the following features. An end portion of the metal member and the ceramic member are connected via a metal connection portion. The metal connection portion has a metallized layer formed on the ceramic member and a brazing connection portion interposing at least between the metallized layer and an end portion of the metal member. A melt point of a brazing member constructing the brazing connection portion is lower than that of a brazing member constructing the metallized layer.

Abstract: Copper alloy foils are provided having far greater strength and heat resistance than conventional copper foils, and having better productivity, are characterized by a composition comprising, all by weight, from 0.01 to 0.4% Cr, from 0.01 to 0.25% Zr, from 0.02 to 2.0% Zn; and when necessary from 0.05 to 1.8% Fe and from 0.05 to 0.8% Ti; and when further necessary one or more elements selected from the group consisting of Ni, Sn, In, Mn, P, Mg, Al, B, As, Cd, Co, Te, Ag, and Hf in a total amount of from 0.005 to 1.5%; the balance being copper and unavoidable impurities. Inclusions in the copper foil not larger than 10 .mu.m in size, and the inclusions between 0.5 and 10 .mu.m in size number less than 100 pieces/mm.sup.2.

Abstract: A laminate material comprising a metal substrate and a laser overlaid layer of a high temperature abrasion resistant copper alloy suitable for the material of engine parts such as valve seats and valve guides, wherein the copper alloy consists essentially of aluminum in an amount ranging from 1.0 to 15.0% by weight; at least one element selected from the group consisting of vanadium, niobium and tantalum in the group VB of the periodic table of elements, in an amount ranging from 0.1 to 5.0% by weight; and balance containing copper and impurities. The copper alloy has a structure in which at least one of intermetallic compounds is dispersed, each intermetallic compound contains at least one metal selected from the group consisting of aluminum and copper and at least one element selected from the group consisting of elements of the group VB of the periodic table. This copper alloy exhibits also high oxidation resistance and corrosion resistance at high temperatures.

Abstract: An abrasion resistant copper alloy suitable for the material of an overlaid layer formed at the valve seat of an engine cylinder head formed of aluminum alloy. The copper alloy consists essentially of nickel in an amount ranging from 10 to 30% by weight; silicon in an amount ranging from 0.5 to 5.0% by weight; at least one element selected from the group consisting of molybdenum, tungsten, tantalum, niobium and vanadium, in an amount ranging from 2.0 to 15.0% by weight; and balance being copper and impurities.

Abstract: Interrupting and chopping characteristics of a Cu--Cr contact alloy are improved by rounding Cr particles to be spherical in the alloy. The Cr particles are rounded in the alloy by sintering raw Cr powder particles having an average particle diameter of less than 100 .mu.m at a temperature of 1,100.degree. C. or higher with Cu powder, or by sintering raw Cr powder particles having an average particle diameter of 100 to 150 .mu.m at a temperature of 1,200.degree. C. or higher with Cu powder.

Abstract: Method and apparatus for making a Cu-Cr melt involves melting Cu-bearing alloy component in a melting vessel disposed in ambient air atmosphere, retaining Cr-bearing alloy component in an inverted ceramic crucible held submerged in the melted Cu-bearing alloy component, introducing inert gas into the melted Cu-bearing alloy component, and flowing the melted Cu-bearing alloy component in the melting vessel through openings in the submerged crucible to contact the Cr-bearing alloy component.

Abstract: A wire for electric railways comprises a copper alloy which consists essentially, by weight percent, of 0.1 to 1.0% Cr, 0.01 to 0.3% Zr, 0.05 to 0.15% Sn, and 10 ppm or less O, and if required, further contains 0.01 to 0.1% Si, or 0.01 to 0.1% Si and 0.001 to 0.05% Mg, with the balance being Cu and inevitable impurities.

Abstract: The invention concerns copper-based sintered components for use as contact components such as clutches and brakes and is intended to provide a sintered component comprising hard particles admixed with and finely and uniformly dispersed in a primary particle of a matrix to provide improved friction coefficient, and in which the dispersed hard particles are inhibited from coming off the Cu--Sn alloy matrix during contact movement so that the sintered component is possessed of good friction contact characteristics and improved mechanical properties under dry and wet conditions. The sintered contact component comprises a copper-based sintered alloy having a structure such that 15 to 25 wt % of a hard particulate material having a maximum particle diameter of not more than 15 .mu.m and a mean particle diameter of not more than 5 .mu.m is uniformly dispersed within copper particles in an alloy matrix.

Abstract: A method for forming an electrical contact material comprises the steps of melting a mixture of Cu and Cr into a molten alloy, atomizing the molten alloy into fine particles to obtain alloyed particles. Cr particles in the alloyed powder disintegrate to less than 5 .mu.m in mean particle diameter. The alloyed powder is sintered thereafter and a mean particle diameter of chromium in the sintered article is fined in a range of 2 to 20 .mu.m. An electrical contact material is composed of a copper matrix and chromium particles having a mean particle diameter of 2 to 20 .mu.m. The chromium particles are homogeneously dispersed in the copper matrix.

Abstract: An Fe-Cu alloy sheet manufactured by a thin plate continuous casting method so as to be used as a material of electronic and magnetic parts. The alloy sheet has an alloy structure of high uniformity which contains 20 to 90% Cu, 1 to 10% Cr, 0 to 10% Mo, and one or more of alloying elements selected from the group consisting of Al, Sc, Y, La, Si, Ti, Zr and Hf whose amount or total amounts are not less than a calcualtion value of the following equation and not more than 10%, the balance being essentially Fe: ##EQU1## wherein .alpha.=1,.beta.=51-(%Cu) (in the case where Cu=20 to 50%),.beta.=-19 +0.4 (% Cu) (in the case where Cu=50 to 90%).Boron and/or carbon take substantially the same effects as the above-mentioned elements such as Al.

Abstract: The present invention relates to a contact for a vacuum interrupter obtained by processing a contact-forming material comprising from 20% to 60% by weight of Cr, Bi in an amount of from 0.05% to 1.0% by weight of the total amount of Cu and Bi, and the balance substantially Cu into the shape of a contact, and thereafter subjecting the processed material to vacuum heat treatment. The contact for the vacuum interrupter has both excellent anti-welding characteristics and excellent voltage withstanding characteristics.

Abstract: A wear-resistant copper-base alloy having superior self-lubricity includes, by weight %,Ni: 10.0 to 30.0%;Si: 0.5 to 3%;Co: 2.0 to 15.0%;at least one metal selected from the group consisting of Mo, W, Nb and V:2.0 to 15.0%; andthe balance being Cu and unavoidable impurities, and having a structure in which hard phase grains containing 5 vol% or more of silicide of at least one metal selected from the group consisting of Mo, W, Nb and V are uniformly dispersed in an amount of 10 to 60 vol% in a copper-rich matrix, to which 2.0 to 15.0% of Fe and/or 1.0 to 10.0% of Cr may be further added.

Abstract: A cooper base alloy and process having high electrical conductivity. An alloy consists of from 0.005 to 0.15% by weight Niobium, about 0.005 to 0.15% by weight Iron, 0.01 to 0.05% by weight phosphorus, and the balance copper.

Abstract: An iron/copper/chromium alloy material for a high-strength lead frame or pin grid array, which comprises 20 to 90% by weight of Cu and 2.5 to 12% by weight of Cr, with the balance being mainly iron, and which has an average grain size number of at least 10 in each of the iron/chromium phase and the copper phase, is prepared by continuous casting, cold-working, and aging.

Abstract: A contact forming material for a vacuum interrupter comprising: from 25% to 65% by weight of a highly conductive component comprising Ag and Cu, and from 35% to 75% by weight of an arc-proof component selected from the group consisting of Ti, V, Cr, Zr, Mo, W and their carbides and borides, and mixtures thereof wherein the highly conductive component of the contact forming material comprises (i) a first highly conductive component region composed of a first discontinuous phase having a thickness or width of no more than 5 micrometers and a first matrix surrounding the first discontinuous phase, and (ii) a second highly conductive component region composed of a second discontinuous phase having a thickness or width of at least 5 micrometers and a second matrix surrounding the second discontinuous phase, wherein the first discontinuous phase in the first highly conductive component region is finely and uniformly dispersed in the first matrix at intervals of no more than 5 micrometers, and wherein the amount of

Abstract: A method for the manufacture of copper base alloys having improved resistance to thermally induced softening is provided. The alloy composition is selected so that the alloy undergoes either a peritectic or eutectic transformation during cooling. The solidification rate is controlled so that the second phase forms as a uniform dispersion of a relatively small dispersoid. The dispersoid inhibits recrystallization resulting in an alloy less susceptible to softening at elevated temperatures.

Abstract: Disclosed herein is a wear-resistance aluminum bronze alloy comprising 4 to 15 wt % of Al, 0.1 to 10 wt % of Cr and the balance Cu, and optionally containing not more than 6 wt % of Ni and not more than 15 wt % of Mn.

Abstract: A highly corrosion-resistant amorphous Cu alloys with at least one element selected from the group of Ta and Nb and other Cu-Ta alloys with at least one element selected from the group of Nb, Ti and Zr, wherein the total content of alloying elements other than Cu ranges from 15 to 85 at %.

Abstract: An iron/copper/chromium alloy material for a high-strength lead frame or pin grid array, which comprises 20 to 90% by weight of Cu and 2.5 to 12% by weight of Cr, with the balance being mainly iron, and which has an average grain size number of at least 10 in each of the iron/chromium phase and the copper phase, is prepared by continuous casting, cold-working, and aging.

Abstract: The nuclear radiation metallic absorber contains a metallic copper alloy containing 0.05 to 50% of boron in weight, compared to the total alloy weight, preferably 0.05 to 10% boron in weight, compared to the total alloy weight. Moreover it may contain additional elements such as neutron absorbing elements, mechanical, physical and technological properties reinforcing elements, fibres or anti-corrosion elements.It may more specifically be used for neutron and .gamma. and X radiation absorption.

Abstract: A new copper-based alloy is described, the principle characteristic of which lies in having two different age-hardening temperature intervals corresponding to which significantly different electrical and mechanical characteristics are obtained from an alloy of the same composition; the alloy is composed, in parts by weight, of from 0.05 to 1% Mg, from 0.03 to 0.9% P and from 0.002 to 0.04% Ca, the remainder being Cu with possible very small additions of other alloying elements such as Sn, Zr, Mn and Li.

Abstract: A process for producing a dispersion hardened copper alloy includes admixing to a copper melt from 0.3 to 15 weight % of molybdenum to provide a mixture which is a melt; superheating the mixture to a temperature ranging from about 200.degree. C. to about 1000.degree. C. above the melting point of coper to provide a superheated melt; and subjecting the superheated melt to very rapid solidification at a cooling rate ranging from 104.degree. to 106.degree. C./sec. The above process produces dipsersion hardened copper alloy comprising copper and from 1 to 15 weight % of molybdenum which is present in the dispersion hardened copper alloy as particles having a diameter of less than 0.1 .mu.m embedded in the copper matrix. Such dispersion hardened copper alloys are useful for providing electrical conductors which are subjected to elevated temperatures, such as for providing spot welding electrodes, particularly for welding of zinc-galvanized sheet metal.

Abstract: The invention relates to a copper-chromium-titanium-silicon-alloy, which consists essentially of 0.10 to 0.50% chromiun; 0.01 to 0.25% titanium; silicon; the remainder being copper and the usual impurities, wherein the silicon content (a) is more than 0.1-times of the titanium content, (b) when the titanium content is up to 0.099% the silicon content is limited by the equation:Silicon content (%)=0.05%+0.5 titanium content (%),and (c) when the titanium content is more than 0.099%, the silicon content is limited by the equation:silicon (%)=0.149%-0.5% titanium content (%).Because of its excellent properties, the alloy is used as a material for electronic components, in particular semiconductor carriers for transistors, integrated circuits or the like, for plug connectors and parts for electrical systems for cars.

Abstract: A contact material for a vacuum circuit breaker of excellent current breaking property and voltage withstand capability can be made from an alloy composed of copper and boride of tantalum, or an alloy composed of copper, boride of tantalum and titanium, or an alloy composed of copper, chromium, and boride of tantalum.

Abstract: A contact forming material for a vacuum valve or vacuum circuit breaker comprising (a) a conductive material consisting of copper and/or silver, and (b) an arc-proof material consisting of chromium, titanium, zirconium, or an alloy thereof wherein the amount of said arc-proof material present in said conductive material matrix is no more than 0.35% by weight. This contact forming material is produced by a process which comprises the steps of compacting arc-proof material powder into a green compact, sintering said green compact to obtain a skeleton of the arc-proof material, infiltrating the voids of said skeleton with a conductive material, and cooling the infiltrated material. The contact forming material can provide contacts for a vacuum valve or vacuum circuit breaker which has excellent characteristics such as temperature rise characteristic and contact resistance characteristic.

Abstract: Copper alloy lead materials used in the fabrication of semiconductor devices such as ICs and LSIs are required to have a tensile strength of 40 kgf/mm.sup.2 or more, an elongation of 4% or more, an electrical conductivity of 50% IACS or more, and a softening point of 400.degree. C. or higher.The copper alloy lead material of the present invention exhibits even higher degrees of tensile strength and elongation and yet satisfy the values of electrical conductivity and softening point that are required for Cu alloy lead materials to be used with ordinary semiconductor devices. Therefore, the Cu alloy lead material of the present invention is applicable not only to ordinary semiconductor devices but also to those with higher packing densities while displaying equally superior performance.

Abstract: A highly conductive copper-based alloy containing 0.001 percent to 0.02 percent of tellurium, 0.05 percent to 0.3 percent of one element selected from iron and chromium, and 0 percent to 0.01 percent of phosphorous with the balance being copper and incidental impurities.

Abstract: A wire electrode for a spark-eroding system for erosion cutting of workpieces using intermittent electrical charges includes a core of a current-conducting material and a wire coating of a material with a lower evaporation temperature, for example zinc. The core consists of one of the following alloys according to DIN (German Industrial Standard) 17666:(a) Cu Mg 0.4;(b) Cu Fe 2P;(c) Cu Cr Zr;(d) Cu Zr.