Abstract: The invention provides an apparatus to radiate a high-powered laser beam and a method for treating a surface of a base material by the high-powered laser beam in order to reduce contamination. Compared to a low-powered laser beam, a high-powered laser beam can be utilized to alleviate the generation of secondary dust ejected from the base material and remove contamination or dust, while forming a layer with lower adhesion attraction. For example, a diamond-like carbon layer can be formed over a carbon-based material layer by laser fusing surface treatment technique.

Abstract: A splash screen, and a process for making a splash screen, comprising a glass sheet, the glass sheet comprising, a substrate of soda lime silica glass having a coating deposited on at least at least a first surface, the coating comprising a corrosion-protection layer deposited directly on the first surface of the substrate, the corrosion-protection layer having a thickness in the range 24 nm to 125 nm and comprising pyrolytically deposited silica with intentional doping of 7 atom % or lower. The splash screen provides reduced moisture induced corrosion of the glass surface.

Abstract: A method includes forming a gate stack and an interlayer dielectric (ILD) over a substrate, wherein the interlayer dielectric is adjacent to the gate stack; forming an inhibitor covering the interlayer dielectric such that the gate stack is exposed from the inhibitor; performing a deposition process to form a conductive layer over the gate stack until the conductive layer starts to form on the inhibitor, in which the deposition process has a deposition selectivity for the gate stack with respect to the inhibitor; and performing an etching process to remove a portion of the conductive layer over the inhibitor.

Abstract: A method for making a pitting resistant carbon coating that includes a hydrogenated diamond-like coating (“H-DLC”). The H-DLC is relatively soft and elastic. Unlike hard and/or inelastic coatings in the prior art, the present coatings do not exhibit a loss of adhesion (delamination). A bonding layer may be deposited on a metallic substrate and the deposited H-DLC on the bonding layer.

Abstract: A substrate processing system for depositing film on a substrate includes a processing chamber defining a reaction volume. A showerhead includes a stem portion having one end connected adjacent to an upper surface of the processing chamber. A base portion is connected to an opposite end of the stem portion and extends radially outwardly from the stem portion. The showerhead is configured to introduce at least one of process gas and purge gas into the reaction volume. A plasma generator is configured to selectively generate RF plasma in the reaction volume. An edge tuning system includes a collar and a parasitic plasma reducing element that is located around the stem portion between the collar and an upper surface of the showerhead. The parasitic plasma reducing element is configured to reduce parasitic plasma between the showerhead and the upper surface of the processing chamber.

Abstract: Disclosed is a plasma processing apparatus capable of more accurately controlling plasma. The plasma processing apparatus includes a shower head provided within a processing chamber, in which a substrate accommodated therein is processed, to be faced to a mounting table for mounting the substrate and supply gas from a plurality of gas discharging holes provided on a facing surface that faces the mounting table toward a substrate in a shower pattern; a plurality of exhaust holes that passes through a surface located at an opposite side to the facing surface of the shower head; a circular plate-like body that is disposed parallel to the opposite surface in a exhaust space that communicates with the exhaust holes distributed at the opposite surface and made of a conductive material; and a moving unit configured to move the plate-like body to change a distance between the exhaust holes and the plate-like body.

Abstract: A nylon chain tensioning arm and nylon chain guide having diamond-like carbon coatings are provided. The diamond-like carbon coating is formed on the substrate by methods including physical vapor deposition, for example, by sputtering or chemical vapor deposition of coating systems composed of various combinations of amorphous carbon. A preferred method for applying the diamond-like carbon coating to the nylon substrate is a hybrid process of plasma-based ion implantation and deposition. The chain tensioning arm or guide may be formed from any number of plastics appropriate to the purpose, although a synthetic polymer, such as the aliphatic polyamide nylon, is the preferred material. The substrate may be a conventional nylon or may be a composite reinforced with glass or carbon fibers. The diamond-like carbon coating may be applied to the nylon substrate by vapor deposition, either directly to the chain-contacting surface or upon a primed surface formed on the substrate prior to deposition.

Abstract: Optical articles of zinc sulfide and zinc selenide with thick coatings of alumina are disclosed. The alumina coatings are deposited on the zinc sulfide and zinc selenide by a microwave assisted magnetron sputtering. In addition to alumina coatings, the optical articles may also include various polymer coatings.

Abstract: Invention for producing a relatively large uniformly aligned planar array of nanowires comprising: step 1) fabricating a template for producing nanowires in which the template comprises an alternating multilayer stack of thin film substrate layers and inert insulating thin film layers using atomic layer deposition; and step 2) fabricating a relatively large uniformly aligned planar array of nanowires by depositing atoms or molecules along the thin film substrate layers on at least one side of the template with the use of atomic layer deposition.

Abstract: A capping layer is formed over a hardmask layer to increase the etch resistance and overall performance of the hardmask layer. Embodiments include forming a hardmask layer over a substrate and forming a capping layer on the hardmask layer, the capping layer including a stack of at least two nanolayers.

Abstract: The present disclosure provides a multi-layer thermal protection material comprising: (i) a substrate layer; (ii) a reflection layer formed on the substrate layer; and (iii) an emission layer formed on the reflection layer and effective to convert thermal energy to photonic energy. The reflection layer comprises a porous scattering media effective to reflect photonic energy away from the substrate layer. The emission layer comprises a thermally emissive dopant incorporated into a thermal matrix material. The present disclosure also provides articles such as portions of hypersonic flight vehicles and turbine component parts that include coatings comprising the multi-layer protection material of the present disclosure. The present disclosure also provides methods of making and using the multi-layer thermal protection material and associated articles described herein.

Abstract: A method for fabricating a microarray of plural soft materials includes: vapor-depositing a first layer poly(para-xylylene) resin on a substrate, forming a first micro pattern in the poly(para-xylylene) resin; obtaining a substrate including a first microarray formed by pouring a first soft material solution, freeze-drying the first soft material to obtain a micro-arrayed substrate of the freeze-dried first soft material; vapor-depositing a second layer poly(para-xylylene) resin on the micro-arrayed substrate of the freeze-dried first soft material, forming a second micro pattern placed differently from the first micro pattern by penetrating the poly(para-xylylene) resin of the first and second layers, forming a second microarray on the substrate by pouring a second soft material solution; and forming a microarray of the first and second soft materials on the substrate by peeling off the poly(para-xylylene) resin of the first and second layers.

Abstract: Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.

Abstract: Disclosed is to a method for manufacturing a cobalt boride coating layer on the surface of iron-based metals by using a pack cementation process. In particular, the present invention relates to a method for manufacturing a cobalt boride coating layer by forming a composite coating layer on the surface of steels which is composed of an outmost layer having a composition of cobalt boride (Co2B) and an inner layer having a composition of iron-cobalt boride ((Fe,Co)2B). Since the cobalt boride coating layer is a compact coating layer having little defects such as pores, it can improve physical properties such as corrosion resistance, wear resistance and oxidation resistance of steels.

Abstract: A liquid ejection head includes a substrate and a flow path forming member. Energy generating elements that generate energy with which a liquid is ejected are formed on the substrate. The flow path forming member is disposed on the substrate and a flow path which encloses the energy generating elements is formed using the flow path forming member. Plural ejection ports that are in communication with the flow path are formed in the flow path forming member. A groove portion extending obliquely with respect to an X direction in which adjoining ejection ports are arranged is formed between the adjoining ejection ports in the flow path forming member.

Abstract: In a method for functionalizing a carbon nanotube surface, the nanotube surface is exposed to at least one vapor including at least one functionalization species that non-covalently bonds to the nanotube surface, providing chemically functional groups at the nanotube surface, producing a functionalized nanotube surface. A functionalized nanotube surface can be exposed to at least one vapor stabilization species that reacts with the functionalization layer to form a stabilization layer that stabilizes the functionalization layer against desorption from the nanotube surface while providing chemically functional groups at the nanotube surface, producing a stabilized nanotube surface. The stabilized nanotube surface can be exposed to at least one material layer precursor species that deposits a material layer on the stabilized nanotube surface.

Abstract: Methods of forming layers can comprise defining a plurality of discrete site-isolated regions (SIRs) on a substrate, forming a first layer on one of the discrete SIRs, forming a second layer on the first layer, measuring a lattice parameter or an electrical property of the second layer, The process parameters for the formation of the first layer are varied in a combinatorial manner between different discrete SIRs to explore the possible layers that can result in suitable lattice matching for second layer of a desired crystalline structure.

Abstract: An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Y4Al2O9, Er2O3, Gd2O3, Er3Al5O12, Gd3Al5O12 and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

Abstract: Methods and systems for coating articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature during the coating process, steps for providing intimate contact between the substrate and the support holding the substrate in order to maximize energy transfer, and/or steps for preparing gradient coatings. Methods for depositing high molecular weight polymeric coatings, end-capped polymer coatings, coatings covalently bonded to the substrate or one another, metallic coatings, and/or multilayer coatings are also disclosed. Deposition of coatings can be accelerated and/or improved by applying an electrical potential and/or through the use of inert gases.

Abstract: A method for making a chemical contrast pattern uses directed self-assembly of block copolymers (BCPs) and sequential infiltration synthesis (SIS) of an inorganic material. For an example with poly(styrene-block-methyl methacrylate) (PS-b-PMMA) as the BCP and alumina as the inorganic material, the PS and PMMA self-assemble on a suitable substrate. The PMMA is removed and the PS is oxidized. A surface modification polymer (SMP) is deposited on the oxidized PS and the exposed substrate and the SMP not bound to the substrate is removed. The structure is placed in an atomic layer deposition chamber. Alumina precursors reactive with the oxidized PS are introduced and infuse by SIS into the oxidized PS, thereby forming on the substrate a chemical contrast pattern of SMP and alumina. The resulting chemical contrast pattern can be used for lithographic masks, for example to etch the underlying substrate to make an imprint template.

Abstract: Forming a hardmask layer with an increased etch resistance based on alternating nanolayers of TiN with alternating residual stresses is disclosed. Embodiments include depositing a first nanolayer of TiN, and depositing a second nanolayer of TiN on the first nanolayer, wherein the first and second nanolayers have different residual stresses.

Abstract: A method is disclosed for fabricating high efficiency CIGS solar cells including the deposition of a multi-component metal precursor film on a substrate. The substrate is then inserted into a system suitable for exposing the precursor to a chalcogen to form a chalcogenide TFPV absorber. One or more Na precursors are used to deposit a Na-containing layer on the precursor film in the system. This method eliminates the use of dedicated equipment and processes for introducing Na to the TFPV absorber.

Abstract: A film deposition method, in which a film of a reaction product of a first reaction gas, which tends to be adsorbed onto hydroxyl radicals, and a second reaction gas capable of reacting with the first reaction gas is formed on a substrate provided with a concave portion, includes a step of controlling an adsorption distribution of the hydroxyl radicals in a depth direction in the concave portion of the substrate; a step of supplying the first reaction gas on the substrate onto which the hydroxyl radicals are adsorbed; and a step of supplying the second reaction gas on the substrate onto which the first reaction gas is adsorbed.

Abstract: A method for forming a thin film using radicals generated by plasma may include generating radicals of a reactant precursor using plasma; forming a first thin film on a substrate by exposing the substrate to a mixture of the radicals of the reactant precursor and a source precursor; exposing the substrate to the source precursor; and forming a second thin film on the substrate by exposing the substrate to the mixture of the radicals of the reactant precursor and the source precursor. Since the substrate is exposed to the source precursor between the formation of the first thin film and the formation of the second thin film, the rate of deposition may be improved.

Abstract: A coating structure and a method for forming the same where, by forming an aluminum oxide layer and a silicon dioxide layer between a product to be coated and a coating layer, durability, reliability and anti-corrosion of the coating layer can be improved and furthermore, product yield can also be improved. The coating structure formed on the surface of a product includes an aluminum oxide (Al2O3) layer formed on the surface of the product, a silicon dioxide (SiO2) layer formed on the surface of the aluminum oxide (Al2O3) layer, and a coating composition layer formed on the silicon dioxide (SiO2) layer.

Abstract: A method of treating silicon carbide fibers comprises phosphating heat treatment in a reactive gas so as to form a coating around each fiber for protection against oxidation. The coating comprises a surface layer of silicon pyrophosphate crystals and at least one underlying bilayer system comprising a layer of a phosphosilicate glass and a layer of microporous carbon.

Abstract: Methods of making components having calcium magnesium aluminosilicate (CMAS) mitigation capability include providing a component, applying an environmental barrier coating to the component, where the environmental barrier coating includes a CMAS mitigation composition selected from the group consisting of zinc aluminate spinel, alkaline earth zirconates, alkaline earth hafnates, rare earth gallates, beryl, and combinations thereof.

Abstract: In one aspect, cutting tools are described having coatings adhered thereto which, in some embodiments, can demonstrate desirable wear resistance and increased cutting lifetimes. A coated cutting tool described herein comprises a substrate and a coating adhered to the substrate, the coating having a multilayer structure including a plurality of structural units each comprising a bonding layer and an adjacent alumina layer, the alumina layer having a thickness of less than 0.5 ?m and the bonding layer having a thickness less than 1 ?m, the bonding layer comprising TiCN and TiAlOC.

Abstract: The present invention provides methods for making structures, including nanosized and microsized thin film structures that exhibit a high degree of smoothness useful for applications in microelectronics. Deposition processing of the invention utilize smoothing agents capable of selectively adjusting the relative rates of processes involved in thin film formation and growth to access enhanced nucleation densities resulting in smooth thin film structures, including ultrathin (e.g., <10 nm) smooth films.

Abstract: Refractory coatings for cutting tool applications and methods of making the same are described herein which, in some embodiments, permit incorporation of increased levels of aluminum into nitride coatings while reducing or maintaining levels of hexagonal phase in such coatings. Coatings and methods described herein, for example, employ cubic phase forming compositions for limiting hexagonal phase in nitride coatings of high aluminum content.

Abstract: A metamaterial includes a first continuous layer formed with a first material by atomic layer deposition (ALD), a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer, and a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer.

Abstract: The system of the present invention includes a conductive element, an electronic component, and a partial power source in the form of dissimilar materials. Upon contact with a conducting fluid, a voltage potential is created and the power source is completed, which activates the system. The electronic component controls the conductance between the dissimilar materials to produce a unique current signature. The system can also measure the conditions of the environment surrounding the system.

Abstract: A coated cutting tool includes a substrate and a PVD coating having an outermost zone C being a nitride, carbide, boride, or mixtures thereof, of Si and at least two additional elements selected from Al, Y, and groups 4, 5 or 6 of the periodic table and zone C is free from a compositional gradient of an average content of Si. Zone C has a laminar, aperiodic, multilayered structure with alternating individual layers X and Y having different compositions from each other. The coating further includes a zone A closest to the substrate, a transitional zone B, where zone A is essentially free from Si, zone B includes a compositional gradient of the average content of Si, and where the average content of Si is increasing towards zone C.

Abstract: A thin film forming method for forming a thin film on a workpiece accommodated within a reaction chamber includes a first operation of supplying a first source gas and a second source gas into the reaction chamber, and a second operation of stopping the supply of the first source gas, supplying the second source gas into the reaction chamber and setting an internal pressure of the reaction chamber higher than an internal pressure of the reaction chamber set in the first operation. The first operation and the second operation are alternately repeated a plurality of times.

Abstract: Technologies are generally described for a method and system configured effective to alter a defect area in a layer on a substrate including graphene. An example method may include receiving and heating the layer to produce a heated layer and exposing the heated layer to a first gas to produce a first exposed layer, where the first gas may include an amine. The method may further include exposing the first exposed layer to a first inert gas to produce a second exposed layer and exposing the second exposed layer to a second gas to produce a third exposed layer where the second gas may include an alane or a borane. Exposure of the second exposed layer to the second gas may at least partially alter the defect area.

Abstract: Methods and systems are provided for synthesis and deposition of chalcogenides (including Cu2ZnSnS4). Binary compounds, such as metal sulfides, can be deposited by alternating exposures of the substrate to a metal cation precursor and a chalcogen anion precursor with purge steps between.

Abstract: An apparatus including a bicycle wheel rim. At least a portion of the bicycle wheel rim can include a braking material. The braking material can have a roughness of about 1 micron to about 80 microns.

Abstract: A method for forming a thin film on a surface of an object to be processed by using an organic metal raw material gas within a processing chamber configured to exhaust air includes: hydrophobizing a surface of the processing chamber by introducing a hydrophobic gas into the processing chamber without the object to be processed accommodated in the processing chamber; and forming the thin film by introducing the organic metal raw material gas into the processing chamber with the object to be processed accommodated in the processing chamber.

Abstract: An optical article comprising a substrate and on at least one face of the substrate a multilayered antireflecting coating functioning in an interferential manner having antifog properties, said antireflecting coating including a last layer with a refractive index n?1.55 and a physical thickness of 120 nm or less directly deposited on a high refractive index layer (HI layer) having a refractive index n>1.55, and a thickness of less than 500 nm.

Abstract: Provided are methods of forming a material layer by chemically adsorbing metal atoms to a substrate having anions formed on the surface thereof, and a method of fabricating a memory device by using the material layer forming method. Accordingly, a via hole with a small diameter can be filled with a material layer without forming voids or seams. Thus, a reliable memory device can be obtained.

Abstract: A coated article includes a substrate and a first coating formed over at least a portion of the substrate. The first coating includes a mixture of oxides including oxides of at least two of P, Si, Ti, Al and Zr. A photoactive functional coating is formed over at least a portion of the first coating. In one embodiment, the functional coating includes titania.

Abstract: A method of tailoring conformality of a film deposited on a patterned surface includes: (I) depositing a film by PEALD or pulsed PECVD on the patterned surface; (II) etching the film, wherein the etching is conducted in a pulse or pulses, wherein a ratio of an etching rate of the film on a top surface and that of the film on side walls of the patterns is controlled as a function of the etching pulse duration and the number of etching pulses to increase a conformality of the film; and (III) repeating (I) and (II) to satisfy a target film thickness.

Abstract: A method of producing an inorganic multi-layered thin film structure includes providing a substrate. A patterned deposition inhibiting material layer is provided on the substrate. A first inorganic thin film material layer is selectively deposited on a region of the substrate where the deposition inhibiting material layer is not present using an atomic layer deposition process. A second inorganic thin film material layer is selectively deposited on the region of the substrate where the thin film deposition inhibiting material layer is not present using an atomic layer deposition process.

Abstract: A multilayer stack is described. The multilayer stack includes: (i) one or more inorganic barrier layers for reducing transport of gas or vapor molecules therethrough; (ii) an inorganic reactive layer disposed adjacent to one or more of the inorganic barrier layers, and the reactive layer capable of reacting with the gas or the vapor molecules; and (iii) wherein, in an operational state of the multilayer stack, the vapor or the gas molecules that diffuse through one or more of the inorganic barrier layers react with the inorganic reactive layer, and thereby allow said multilayer stack to be substantially impervious to the gas or the vapor molecules.

Abstract: A hardmask layer is formed with an increased etch resistance based on alternating nanolayers of TiN with alternating residual stresses. Embodiments include depositing a first nanolayer of TiN, and depositing a second nanolayer of TiN on the first nanolayer, wherein the first and second nanolayers have different residual stresses.

Abstract: Methods of making components having calcium magnesium aluminosilicate (CMAS) mitigation capability involving providing a component; applying an environmental barrier coating to the component, the environmental barrier coating having a separate CMAS mitigation layer including a CMAS mitigation composition selected from rare earth elements, rare earth oxides, zirconia, hafnia partially or fully stabilized with alkaline earth or rare earth elements, zirconia partially or fully stabilized with alkaline earth or rare earth elements, magnesium oxide, cordierite, aluminum phosphate, magnesium silicate, and combinations thereof.

Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self-limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film.

Abstract: A method for manufacturing a porous device with restrictive layer comprises the steps of providing a porous structure having a micro pore structure, flattening the porous carrier to form a surface, and forming a restrictive layer on the surface of the porous carrier, a method for manufacturing said restrictive layer includes forming a nickel-chromium alloy layer on the surface of the porous carrier, forming a copper metal layer on the nickel-chromium alloy layer, forming a nickel metal layer having a top surface on the copper metal layer, and processing said nickel-chromium alloy layer, said copper metal layer and said nickel metal layer to form a plurality of channels communicating with the micro pore structure and the top surface. The restrictive effect and damping effect can raise anti-vibration ability of the porous device itself by formation of dual restrictive structure composed of the micro pore structure and the channels.

Abstract: The present invention provides a process for the deposition of a iridium containing film on a substrate, the process comprising the steps of providing at least one substrate in a reactor; introducing into the reactor at least one iridium containing precursor having the formula: XIrYA, wherein A is equal to 1 or 2 and i) when A is 1, X is a dienyl ligand and Y is a diene ligand; ii) when A is 2, a) X is a dienyl ligand and Y is selected from CO and an ethylene ligand, b) X is a ligand selected from H, alkyl, alkylamides, alkoxides, alkylsilyls, alkylsilylamides, alkylamino, and fluoroalkyl and each Y is a diene ligand, and c) X is a dienyl ligand and Y is a diene ligand; reacting the at least one iridium containing precursor in the reactor at a temperature equal to or greater than 100° C.; and depositing an iridium containing film formed from the reaction of the at least one iridium containing precursor onto the at least one substrate.

Abstract: The invention relates to a method and apparatus for the application of a thin film coating of material onto a surface of an article which is to be exposed to aqueous conditions such as when in the sea or rivers. The invention allows for the formation of a coating which is resistant to fouling and which coating can be formed of materials which have significantly less adverse effect on the quality of the water in which the article is placed in comparison to conventional coating types.