Patents Represented by Attorney Arthur T. Fattibene & Fattibene Fattibene
  • Patent number: 5815310
    Abstract: An optical projection reduction system used in photolithography for the manufacture of semiconductor devices having a first mirror pair, a second field mirror pair, and a third mirror pair. Electromagnetic radiation from a reticle or mask is reflected by a first mirror pair to a second field mirror pair forming an intermediate image. A third mirror pair re-images the intermediate image to an image plane at a wafer. All six mirrors are spherical or aspheric and rotationally symmetrical about an optical axis. An annular ring field is obtained, a portion of which may be used in a step and scan photolithography system. In another embodiment, weak refracting elements are introduced to further reduce residual aberrations allowing a higher numerical aperture. In the catoptric embodiment of the present invention, a numerical aperture of 0.25 is obtained resulting in a working resolution of 0.03 microns with electromagnetic radiation having a wavelength of 13 nanometers.
    Type: Grant
    Filed: December 12, 1995
    Date of Patent: September 29, 1998
    Assignee: SVG Lithography Systems, Inc.
    Inventor: David M. Williamson
  • Patent number: 5757160
    Abstract: A stage used for positioning and aligning a wafer, as used in photolithography or microlithography in semiconductor manufacturing having a plurality of interferometer laser gauges placed on a movable wafer stage associated with a pair of stationary orthogonal return mirrors. A beam of light parallel to the X axes is directed through a penta prism to an interferometer laser gauges placed on the wafer stage near the wafer plane through a plurality of beamsplitters and fold mirrors. The present invention is less sensitive to rotation or twisting of the wafer stage and eliminates or reduces certain errors introduced by the rotation. Additionally, large stable return mirrors may be used, increasing the travel distance permitted by the wafer stage while reducing weight on the wafer stage. The wafer stage can be more accurately positioned and accommodate larger wafer sizes with improved positioning and alignment accuracies.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: May 26, 1998
    Assignee: SVG Lithography Systems, Inc.
    Inventor: Justin Kreuzer
  • Patent number: 5660273
    Abstract: A tray having wells or depressions therein for holding a medicament or material and an applicator for applying the medicament or material. The applicator well has one open end from which a portion of the applicator extends. A cover seals the medicament or material well and the applicator well and a portion of the applicator. In one embodiment, the cover is a thin sheet or film that adheres or is heat sealed to substantially the entire surface of the tray. The portion of the applicator extending beyond the applicator well is used to facilitate the removal of the cover whereby the extended portion of the applicator acts as a lever to pry the cover form the body of the tray. Additionally, packaging material required to form the tray can be substantially lessened in those cases where the applicator that is relatively large in comparison with the amount of material to be packaged. Therefore, a larger applicator that is easy to use is associated with the material without unnecessary packaging.
    Type: Grant
    Filed: July 13, 1994
    Date of Patent: August 26, 1997
    Assignee: Centrix, Inc.
    Inventor: John J. Discko, Jr.
  • Patent number: D421217
    Type: Grant
    Filed: August 9, 1996
    Date of Patent: February 29, 2000
    Assignee: Centrix, Inc.
    Inventor: John J. Discko, Jr.