Abstract: A technique for fast performance prediction of multivariable model predictive controllers (MPC) for large-scale spatially-distributed dynamic systems is provided. When operating an MPC for a two-dimensional sheetmaking process, the controller's performance can be separated into spatial performance and dynamic performance. The steady-state spatial performance for different sheet property modes is first predicted, thereafter, the dynamic performance is predicted on the basis of the steady-state actuator profiles. During the steady-state spatial performance prediction, the original MPC's cost function is approximated to be a steady-state cost function. Then the steady-state measurement profiles and the actuator profiles are calculated through the steady-state cost function. The actuator profiles in time series can be efficiently solved by minimizing the difference between the actuator profiles and the steady-state actuator profiles in the face of constraints.
Abstract: A high voltage power supply for use in a system such as a microfluidics system, uses a DC-DC converter in parallel with a voltage-controlled resistor. A feedback circuit provides a control signal for the DC-DC converter and voltage-controlled resistor so as to regulate the output voltage of the high voltage power supply, as well as, to sink or source current from the high voltage supply.
Abstract: Thermomechanical pulp is an important process for producing fibrous mass used in papermaking. A two-level control strategy that stabilizes and optimizes the refining process has been developed. The Stabilization layer consists of a multivariable model predicative range controller that regulates the refiner line operations. The Quality Optimization layer provides the pulp quality control as measured by an online pulp quality (freeness, fibre length) sensor. This control startegy leverages the natural decoupling in the process. The modular design technique is able to handle multiple refiner lines that empty into a common latency chest. A global optimizer is also used to integrate and coordinate the two layers for enhanced constraint handling.
Type:
Grant
Filed:
December 16, 2004
Date of Patent:
June 3, 2008
Assignee:
Honeywell International Inc.
Inventors:
Manpreet S. Sidhu, Richard J. Van Fleet, Michel R. Dion
Abstract: A manifold for connecting external capillaries to the inlet and/or outlet ports of a microfluidic device for high pressure applications is provided. The fluid connector for coupling at least one fluid conduit to a corresponding port of a substrate that includes: (i) a manifold comprising one or more channels extending therethrough wherein each channel is at least partially threaded, (ii) one or more threaded ferrules each defining a bore extending therethrough with each ferrule supporting a fluid conduit wherein each ferrule is threaded into a channel of the manifold, (iii) a substrate having one or more ports on its upper surface wherein the substrate is positioned below the manifold so that the one or more ports is aligned with the one or more channels of the manifold, and (iv) means for applying an axial compressive force to the substrate to couple the one or more ports of the substrate to a corresponding proximal end of a fluid conduit.
Abstract: A robust, non-aqueous, and oil-soluble organic peroxide oxidant is employed for oxidative desulfurization and denitrogenation of hydrocarbon feedstocks including petroleum fuels. Even at low concentrations, the non-aqueous organic peroxide oxidant is extremely active and fast in oxidizing the sulfur and nitrogen compounds in the hydrocarbon feedstocks without catalyst. Consequently, the oxidation reactions that employ the non-aqueous organic peroxide oxidant take place at substantially lower temperatures and shorter residence times than reactions in other oxidative desulfurization and denitrogenation processes. As a result, a higher percentage of the valuable non-sulfur and non-nitrogen containing components in the hydrocarbon feedstock are more likely preserved with the inventive process. Desulfurization and denitrogenation occur in a single phase non-aqueous environment so that no phase transfer of the oxidant is required.
Abstract: A compact and vacuum compatible magnetic-coil driven tiltable stage that is equipped with a high efficiency reflective coating can be employed as a scanner in EUV applications. The drive electronics for the scanner is fully in situ programmable and rapidly switchable.
Abstract: Employing collector optics that has a sacrificial reflective surface can significantly prolong the useful life of the collector optics and the overall performance of the condenser in which the collector optics are incorporated. The collector optics is normally subject to erosion by debris from laser plasma source of radiation. The presence of an upper sacrificial reflective surface over the underlying reflective surface effectively increases the life of the optics while relaxing the constraints on the radiation source. Spatial and temporally varying reflectivity that results from the use of the sacrificial reflective surface can be accommodated by proper condenser design.
Type:
Grant
Filed:
June 30, 2006
Date of Patent:
July 3, 2007
Assignee:
EUV LLC
Inventors:
Daniel A. Tichenor, Glenn D. Kubiak, Sung Hun Lee
Abstract: A detector to measure EUV intensity employs a linear array of photodiodes. The detector is particularly suited for photolithography systems that includes: (i) a ringfield camera; (ii) a source of radiation; (iii) a condenser for processing radiation from the source of radiation to produce a ringfield illumination field for illuminating a mask; (iv) a reticle that is positioned at the ringfield camera's object plane and from which a reticle image in the form of an intensity profile is reflected into the entrance pupil of the ringfield camera, wherein the reticle moves in a direction that is transverse to the length of the ringfield illumination field that illuminates the reticle; (v) detector for measuring the entire intensity along the length of the ringfield illumination field that is projected onto the reticle; and (vi) a wafer onto which the reticle imaged is projected from the ringfield camera.
Abstract: Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled. A method of removing carbon contaminants from a substrate surface that is housed within a vacuum chamber is also disclosed.
Type:
Grant
Filed:
May 24, 2004
Date of Patent:
December 12, 2006
Assignee:
EUV LLC
Inventors:
Leonard E. Klebanoff, Philip Grunow, Samuel Graham, Jr.
Abstract: Employing collector optics that have a sacrificial reflective surface can significantly prolong the useful life of the collector optics and the overall performance of the condenser in which the collector optics are incorporated. The collector optics are normally subject to erosion by debris from laser plasma source of radiation. The presence of an upper sacrificial reflective surface over the underlying reflective surface effectively increases the life of the optics while relaxing the constraints on the radiation source. Spatial and temporally varying reflectivity that results from the use of the sacrificial reflective surface can be accommodated by proper condenser design.
Type:
Grant
Filed:
January 16, 2004
Date of Patent:
July 25, 2006
Assignee:
EUV LLC
Inventors:
Daniel A. Tichenor, Glenn D. Kubiak, Sang Hun Lee
Abstract: A wavefront modulating optical element device employs two or more materials lithographically patterned with programmed thickness profiles. The spatially-varying thickness profiles are chosen to yield arbitrary relative phase-shift and attenuation upon transmission. The device can be designed to create arbitrary diffractive optical elements with specific applications including diffusers, arbitrary holographic optical elements, null-elements for wavefront compensation and control in interferometry.
Type:
Grant
Filed:
September 17, 2001
Date of Patent:
April 11, 2006
Assignee:
EUV LLC
Inventors:
Kenneth Alan Goldberg, Patrick P. Naulleau
Abstract: According to one embodiment, the present invention provides a system for determining wear of an electrical element. The system includes a current source, a voltmeter and a control unit. The control unit is operable to couple the current source and the voltmeter to a first spare electrical element in a device under test, determine a characteristic physical property of the first spare electrical element and determine a wear characteristic for a primary electrical element in the device under test based upon the characteristic physical property of the first spare electrical element.
Abstract: Techniques for rapidly characterizing reflective surfaces and especially multi-layer EUV reflective surfaces of optical components involve illuminating the entire reflective surface instantaneously and detecting the image far field. The technique provides a mapping of points on the reflective surface to corresponding points on a detector, e.g., CCD. This obviates the need to scan a probe over the entire surface of the optical component. The reflective surface can be flat, convex, or concave.