Abstract: The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.
Type:
Grant
Filed:
June 11, 1996
Date of Patent:
January 19, 1999
Assignees:
Shipley Company, L.L.C., IBM Corporation
Inventors:
George G. Barclay, Michael F. Cronin, Ronald A. Dellaguardia, James W. Thackeray, Hiroshi Ito, Greg Breyta
Abstract: Methods for preparing uniformly sized polymer particles comprised of multi-functional monomers such as poly(1,4-butanediol diacrylate) and poly(1,6-hexanediol diacrylate) are disclosed. The particles are of a size, uniformity, and contan physical characteristics that make them ideally suitable for use as spacers in liquid crystal display devices.