Abstract: Supplying gases towards the web as it separates from the drum in a plasma-enhanced chemical vapor deposition system reduces the sticking of the web to the drum, and thus prevents power supply dropouts. The gas supplied can form into a plasma that helps dissipate the static charge which builds onto the web as it rolls off of the drum. By reducing the arcing and power supply dropouts, the quality of the deposited layer formed in a deposition zone can be improved.

Abstract: In a rotational rod-fed electron-beam evaporation source used with sublimating rod material, the ingot rod can be free-standing with respect to the crucible. This means that the side of the ingot rod near the tip of the rod does not contact a cooling crucible. In this way, the system can be operated in a defocused position of the electron beam, and the sweep of the electron beam can go over the edge of the ingot rod tip. Using these features, a substantially radial sweep of the tip of an ingot rod that sweeps over the edge can produce a substantially flat evaporation pattern on the ingot rod, producing a good utilization of the expensive ingot rod material.

Abstract: A method of depositing a hard silicon oxide based film is provided by controllably flowing a gas stream including an organosilicon compound into a plasma. The organosilicon compound is preferably combined with oxygen and helium and at least a portion of the plasma is preferably magnetically confined adjacent to a substrate during the depositing, most preferably by an unbalanced magnetron. These silicon oxide based films may be reproducibly deposited on small or large substrates with preselected properties.

Abstract: Disclosed is a process for the flotation of a mineral concentrate comprising the steps of forming an aqueous slurry of a milled mineral ore containing particles of a desired mineral species and adding a flotation reagent which causes a desired variation in the flotation tendency of the desired mineral species present within the slurry so as to increase the efficiency of separation of that mineral species from the slurry relative to a situation where said flotation reagent is absent from the slurry. A stabilising agent is introduced to the slurry in an amount which creates electrochemical conditions conductive to separation of the desired mineral from the slurry and causes the destruction of a deleterious component from the slurry which consumes the flotation reagent thereby maintaining or improving the efficiency of separation of the desired mineral species from the slurry of milled ore.

Abstract: There is described an improvement in a process of dispersing/dissolving a gas in a body of aqueous liquid by dispersing/dissolving the gas in a stream of the liquid and introducing the stream into the body of liquid comprising introducing a quantity of non-ionic surfactant, anionic surfactant or mixtures thereof into the liquid thereby inhibiting coalescence of gas bubbles and enhancing dispersion/dissolution.

Abstract: A capsule for storing a propellant fluid, for example, helium under pressure comprises a hollow body which includes a frangible area. An anchor member attaches an arm to the frangible area such that when a force is applied to the arm, said force together with the helium under pressure will cause the frangible area to rupture outwardly of the hollow body thereby to release the helium.

Abstract: A sputtering system using an AC power supply in the range of 10 kHz to 100 kHz uses two rotatable cylindrical magnetrons. The rotatable cylindrical magnetrons, when used for depositing a dielectric layer onto a substrate, clean off dielectric material that is deposited onto the target. This prevents a dielectric layer on the target from acting like a capacitor and may help avoid arcing. Additionally, an impedance-limiting capacitor can be placed in series in the electrical path between the targets through the transformer so as to reduce arcing. This impedance-limiting capacitor has a value much larger than the capacitors used to couple the power supply to a target in radio frequency sputtering systems.

Abstract: A method of machining a blind slot 3 in a workpiece 2 comprises heating the surface of the workpiece 2 above its melting temperature with, for example, a beam of laser energy and directing at least two gas streams 5, 6 such that they together with the base of the slot 3, create a vortex having a predetermined rotational direction for removing molten material from the slot 3.

Abstract: Supplying gases towards the web as it separates from the drum in a plasma-enhanced chemical vapor deposition system reduces the sticking of the web to the drum, and thus prevents power supply dropouts. The gas supplied can form into a plasma that helps dissipate the static charge which builds onto the web as it rolls off of the drum. By reducing the arcing and power supply dropouts, the quality of the deposited layer formed in a deposition zone can be improved.

Abstract: A pressure reduction valve 2 includes a piston 12, a pressure regulating sub-chamber 50 and a movable means, preferably in the form of a second piston 12', which is activated by a filling nozzle 70 to prevent the flow of fluid between an inlet 8 and the regulating sub-chamber 50 thereby to allow the flow of fluid through the valve between an outlet 10 and an inlet 8. This allows a cylinder to be filled whilst the pressure reduction valve 2 is in situ.

Abstract: A multiple electrode plasma reactor power splitter and delivery system to provide balanced power to a plurality of powered electrodes by utilizing the properties of quarter wave length transmission lines. Each electrode is supplied power by a separate (2N+1).lambda./4 wavelength cable, where N=0,1,2 . . . , connected to a common point at a load matching network's output. The impedance transformation properties of these lines are also employed to convert the plasma load to one that is more efficiently matched into by a standard network. Also disclosed is a technique of splitting a single large active electrode into smaller active electrodes powered by the above distribution scheme in order to achieve maximum uniformity of the reactive plasma throughout the working volume.

Abstract: An apparatus for cutting a workpiece comprises optical means located in a single cutting head for splitting a beam of laser energy into two separate beams. The cutting head includes an inlet for oxygen under pressure and a nozzle for the outlet of the oxygen. At least one split beam is focused at a location above the surface of the workpiece such that when in use the area on the surface of the workpiece impinged by the split beam is greater than the area being impinged upon by the oxygen when leaving the nozzle.

Abstract: Simulation apparatus for displaying three-dimensional graphics including a device for emitting an aroma generating material in connection therewith and a dispensing apparatus for emitting the aroma generating material.

Abstract: The use of a telecentric system allows for minimizing the changes in the measured radiometric quantity as a result of defocus or tilt of the object under measurement or of the detector. In a preferred embodiment, a telecentric illuminating system is provided, which illuminates an object from a source. A telecentric receiving system receives reflections from the object and relays them to a detector. In another preferred embodiment, a telecentric system is also described that is appropriate for radiance or radiant intensity measurements.

Abstract: An elongated anode structure having multiple points to which electrons are attracted is provided. The anode can be constructed of multiple wire brushes that are attached to a metal rod. Use of the anode in magnetron systems significantly reduces dielectric material build-up and improves film uniformity in both dc reactive and non-reactive sputtering. Moreover, the anode reduces overheating and increases the operation time of magnetron systems undergoing reactive sputtering of dielectric materials. In one embodiment, the magnetron system has a cylindrical cathode and a pair of elongated anodes positioned parallel to and equidistance from the cathode. The anode structure is particularly suited for sputtering uniform films of dielectric materials, including silicon dioxide and silicon nitride.

Abstract: Two adjacent rotating cylindrical targets are used in a specific form of a vacuum sputtering system to deposit a film of material onto a substrate. Elongated anodes are provided on opposite sides and in between the targets in a manner to make more uniform the rate of deposition across the substrate.

Abstract: An array of hollow cathodes can be made by mounting a housing connected to a source of plasma precursor gas and to a source of power in a vacuum chamber, said housing having a plurality of uniformly spaced openings in a wall thereof into which a plasma can be generated. A substrate to be treated is mounted parallel to and spaced a preselected distance from said openings. In operation, a plurality of plasma torches is created extending from the openings which can plasma etch and remove coatings on said substrate.

Abstract: In one group of embodiments, two or more small anodes are spaced apart from one another in a magnetron, with some aspect of their electrical power being individually controlled in a manner to control a density profile across a plasma. In another group of embodiments, the same effect is obtained by mechanically moving one or more small anodes or anode masks. When used in a magnetron having either a rotating cylindrical cathode or a stationary planar cathode and designed to sputter films of material onto a substrate, the uniformity of the rate of deposition across the substrate is improved. Also, adverse effects of sputtering dielectric materials are reduced.

Abstract: Method and apparatus for performing a metallurgical process in which a carbonaceous material is converted to a reducing gas and a metal is melted in a main reactor, particulate coal is partially oxidized in a secondary reactor to form a particulate char and a calorific gas under conditions which minimize the formation of carbon monoxide, and at least part of the char and some of the calorific gas are introduced into the main reactor.

Abstract: A process for removal of iron from reduced titanium ores involves hydrometallurgical treatment with an aqueous solution through which an oxidising gas including oxygen and/or ozone is passed to oxidise metallised iron present within said reduced titanium ore.