Abstract: Provided is a method for regulating the concentration of water in the acid feed stream in a process for the production of HF by the reaction with a fluorine containing material, the method comprising: (a) providing an acid feed stream comprising bound water and free water; (b) estimating the concentration of bound water and free water in the acid feed stream by providing a probe in said feed stream; and (c) adjusting the concentration of free water in said process stream based on said estimating step.
Type:
Grant
Filed:
January 18, 2002
Date of Patent:
February 22, 2005
Assignee:
Honeywell International
Inventors:
Troy W. Francisco, Charles L. Redmon, Kenneth E. Creasy, John L. Welch, William A. Pepe
Abstract: The present invention provides compositions comprising an HFC component and a non-HFC component consisting essentially of methanol, having boiling points that are unexpectedly low and relatively constant, and uses thereof.
Type:
Grant
Filed:
June 3, 2002
Date of Patent:
September 14, 2004
Assignee:
Honeywell International, Inc.
Inventors:
Mary C. Bogdan, Gary M. Knopeck, Hang T. Pham, Rajiv R. Singh, Kane D. Cook
Abstract: Vinyl ether compounds having the formula:
R—O—X—O—CH═CH2
wherein R is a radical selected from R1—CnHm—, R1—CnHm—C(═O)—, R1—CnHm—CH[—O—X—O—CH═CH2—], R1—CnHm—CH[—O—X—O—CH═CH2—]C(═O)—, R1—CnHm—CH[—C(═O)—O—X—O—CH═CH2—], R1—CnHm—CH[—C(═O)—O—X—O—CH═CH2—]C(═O)—, R1—[CFCl—CF2—]pCH2— and HCFCl—CF2—, wherein R1 is hydrogen, an unsubstituted or substituted fluorinated aliphatic radical, an unsubstituted or substituted fluorinated cyclic aliphatic radical, an unsubstituted or substituted fluorinated aromatic radical, an unsubstituted or substituted fluorinated araliphatic radical, or an unsubstituted or substituted fluorinated heterocyclic rad
Type:
Grant
Filed:
May 11, 2001
Date of Patent:
June 1, 2004
Assignee:
Honeywell International Inc.
Inventors:
Russell F. Anderson, David E. Bradley, David Nalewajek, Haridasan K. Nair, Mariola J. Proszowski, Eugene V. Sitzman, Ellen L. Swan
Abstract: The present invention provides refrigerant blends which are replacements for chlorodifluoromethane(HCFC-22). The present blends have refrigeration characteristics which are similar to HCFC-22. The blends comprise from about 10 to about 90 weight percent of a first component selected from the group consisting of 1,1,1-trifluoroethane, difluoromethane, propane, and mixtures thereof; from about 1 to about 50 weight percent of a second component selected from the group consisting of hydrofluorocarbon having 1 to 3 carbon atoms, fluorocarbon having 1 to 3 carbon atoms, inorganic compound, and mixtures thereof having a boiling point at atmospheric pressure in the range from about −90 degrees C to less than −50 degrees C; and from about 1 to about 50 weight percent of a third component which is hydrofluorocarbon having 1 to 3 carbon atoms, other than 1,1,1-trifluoroethane, having a boiling point at atmospheric pressure in the range from about −50 degrees C to about 31 10 degrees C.
Abstract: A method is provided for making substantially ether-free alkali metal tetrakis(pentafluorophenyl) borate salts from tetrakis(pentafluorophenyl) borate magnesium bromide and converting the alkali metal tetrakis(pentafluorophenyl) borate salts to essentially ether-free trityl tetrakis(pentafluorophenyl) borate.
Abstract: Disclosed are methods of producing fluorinated alcohols which find particular use in the syntheses of pharmaceutical drugs. The methods comprise generally, the steps of (a) reacting a halogenated alkane with an alkyl vinyl ether to form an unsaturated halogenated aldehyde; (b) reducing the unsaturated halogenated aldehyde to form an unsaturated halogenated alcohol; and (c) reducing the unsaturated halogenated alcohol to form a fluorinated alcohol.
Abstract: Non-flammable sterilizing gas compositions of ethylene oxide and a flame suppressant comprising pentafluoroethane and heptafluoropropane are useful in the gaseous sterilization of heat and/or moisture sensitive materials. The sterilizing gas compositions are environmentally acceptable and are more efficient and safer to use than conventional sterilant gas mixtures.
Type:
Grant
Filed:
May 11, 2000
Date of Patent:
August 13, 2002
Assignee:
Honeywell International Inc.
Inventors:
Robert G. Richard, Barbara Ruth Decaire, Stephen Alan Conviser
Abstract: A method of etching comprising subjecting a material under plasma etching conditions to an etching composition comprising at least an etchant compound having the formula CXHCFZ
wherein:
x=3, 4 or 5;
2x≧z≧y;
and
y+z=2x+2;
and further including an etching composition which includes said etchant compound and a second material different from the etchant compound that enhances or modifies plasma etching.
Type:
Grant
Filed:
May 11, 2000
Date of Patent:
August 6, 2002
Assignee:
AlliedSignal Inc.
Inventors:
Timothy R. Demmin, Matthew H. Luly, Mohammed A. Fathimulla