Patents Represented by Attorney, Agent or Law Firm Edward F. Murphy
  • Patent number: 6695102
    Abstract: A single fluid valve device operable for setting an overall viscous damping level, magnetic damping strength, and low speed damping profile. A stationary, controllable magnetorheological fluid valve device comprising a first annular body having gap setting features and controllable passageways formed within the fluid valve device, and a second body disposed adjacent to the first annular body, wherein the second body comprises a magnetic field generating means contained therein. A twin-tube damping device comprising an outer member containing an outer volume of magnetorheological fluid, an inner member containing an inner volume of magnetorheological fluid, a stationary, controllable fluid valve device disposed within the outer member, a piston rod mounted for movement with respect to the inner and outer members, a piston assembly attached to the piston rod and a pressurized volumetric compliance means.
    Type: Grant
    Filed: December 31, 2002
    Date of Patent: February 24, 2004
    Assignee: Lord Corporation
    Inventors: Robert H. Marjoram, Michael J. Chrzan
  • Patent number: 6688689
    Abstract: A seat suspension system includes a first seat (e.g., a base) member and a second seat (e.g., a seat) member preferably overlying the first seat member. At least one spring (e.g., elastic or rubber) mount is interposed between the first and second seat member. The at least one elastic mount provides a projected elastic center spaced from (preferably located above) the second seat member such that the second seat member is pivotable about the projected elastic center. Embodiments describing seat suspension systems having a single focalized mount or a plurality of spaced apart, focalized mounts are included.
    Type: Grant
    Filed: June 24, 1999
    Date of Patent: February 10, 2004
    Assignee: Lord Corporation
    Inventor: Richard P. Thorn
  • Patent number: 6689516
    Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: February 10, 2004
    Assignee: Corning Incorporated
    Inventors: George Edward Berkey, Lisa Anne Moore, Michelle Diane Pierson
  • Patent number: 6683714
    Abstract: A birefringence minimizing fluoride crystal vacuum ultraviolet (“VUV”) optical lithography lens element is provided for use with lithography wavelengths<230 nm. The VUV lithography lens element has an optical axis encompassed by a lens perimeter with the fluoride crystal lens having a variation in crystallographic orientation direction which tilts away from the optical center axis towards the lens perimeter to provide minimal birefringence. The invention includes a birefringence minimizing fluoride crystal optical lithography lens blank with a variation in crystallographic orientation direction across the blank.
    Type: Grant
    Filed: October 31, 2001
    Date of Patent: January 27, 2004
    Assignee: Corning Incorporated
    Inventors: Gautam Meda, Michael Rivera, Michael W. Price
  • Patent number: 6682859
    Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content<0.5 weight percent. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
    Type: Grant
    Filed: November 28, 2001
    Date of Patent: January 27, 2004
    Assignee: Corning Incorporated
    Inventors: Lisa A. Moore, Charlene M. Smith
  • Patent number: 6673150
    Abstract: The invention provides a method of making UV<200 nm transmitting optical fluoride crystals for excimer laser lithography optics and a multicompartment container for growing optical fluoride crystals, comprising a number of graphite bowls that are placed on top of one another to form a stack and which have a central conical orifice in the bottom of each of them, and also comprising a seeding unit that has a central cylindrical orifice and is arranged under the lowermost bowl, characterized in the each bowl is fitted with a heat-removing device that is made in the form of a graphite cylinder with a central conical orifice, is mounted under the bottom of each bowl, and adjoins, with its other surface, the cover of the next bowl down, in which design the cover of each bowl, apart from the uppermost one, has a central conical orifice.
    Type: Grant
    Filed: April 16, 2002
    Date of Patent: January 6, 2004
    Assignee: Corning Incorporated
    Inventors: Evgeny A. Garibin, Aleksey A. Demidenko, Boris I. Kvashnin, Igor A. Mironov, Gury T. Petrovsky, Vladimir M. Reyterov, Aleksandr N. Sinev
  • Patent number: 6672575
    Abstract: A surface effect damper comprising a housing having a wall that defines a chamber, the housing having a first end, a second end and an axis; at least one contact element movable through the chamber between the housing ends in a first direction and in a second direction; and at least two damping elements substantially surrounding each contact element, each of the at least two damping elements being movable away from the axis and into frictional engagement with the wall as the at least one contact element is moved in a first direction and each of the at least two damping elements being movable toward the axis as the at least one contact element is moved in a second direction.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: January 6, 2004
    Assignee: Lord Corporation
    Inventors: Wallace C. Flower, Douglas A. Hodgson, Peter A. Masterson, Paul J. Bachmeyer
  • Patent number: 6669920
    Abstract: The present invention provides below 160 nm optical lithography crystal materials for VUV optical lithography systems and processes. The invention provides fluoride optical lithography crystals for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons. The present invention provides methods of making below 160 nm optical lithography crystal materials for below 160 nm VUV optical lithography systems and processes.
    Type: Grant
    Filed: November 20, 2001
    Date of Patent: December 30, 2003
    Assignee: Corning Incorporated
    Inventor: Robert W. Sparrow
  • Patent number: 6669298
    Abstract: A damper (20) for damping motion between two relatively moveable members, such as pivotal motion between components in office chairs (10). The damper (20) includes a outer member (22) having an internal recess (23) with a inner surface (24) and a crosswise oriented hole (30) intersecting the recess (23), and an inner member assembly (32) moveable relative to the outer member (22) having a shaft (34) with a resilient friction member (38) mounted thereon. The resilient friction member (38) frictionally engages the inner surface (24) in an interference fit relationship thereby radially precompressing the resilient friction member (38). The resilient friction member (38) preferably has one or more protrusions (40) that may be axially or radially oriented.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: December 30, 2003
    Assignee: Lord Corporation
    Inventors: Richard P. Thorn, Samson Beyene
  • Patent number: 6669536
    Abstract: The method of making optical fluoride crystal components provide optical components with beneficial final polished transmission surfaces for transmitting below 200 nm wavelengths of light, such as produced by excimer lasers and utilized in optical lithography. The invention utilizes colloidal silica soot in the polishing of optical fluoride crystal surfaces. This colloidal silica soot is a byproduct of chemical vapor deposition processing of fused silica or ultra low expansion glasses. The colloidal silica byproduct is referred to as “soot”. Retaining the same physical properties as the parent glass and having a spherical morphology, the colloidal silica soot is an ideal for final polishing applications of optical fluoride crystals, and particularly for optical fluoride crystals such as calcium fluoride which have high transmission levels to below 300 nm light such as produced by excimer lasers.
    Type: Grant
    Filed: December 11, 2000
    Date of Patent: December 30, 2003
    Assignee: Corning Incorporated
    Inventor: Robert Sabia
  • Patent number: 6667679
    Abstract: A temporary joint that includes a first discrete member having a first edge and a first movable coupling means; and a second discrete member having a second edge and a second movable coupling means. When it is necessary to form a joint between the first and second discrete members, the first and second edges are moved into abutment to define a binding edge. Then, the first and second movable coupling means are moved toward the binding edge; and the temporary joint is formed when the first and second movable coupling means are proximate the binding edge. The joint is broken by moving the first and second coupling means away from the binding edge. The first coupling means is comprised of a volume of a field responsive material and the second coupling means is a field producing means such as a magnet. A rigid joint is produced when the field producing supplies a field across the field responsive material.
    Type: Grant
    Filed: April 20, 2001
    Date of Patent: December 23, 2003
    Assignee: Lord Corporation
    Inventors: J. David Carlson, Lynn C. Yanyo
  • Patent number: 6659438
    Abstract: A mount with a first attachment member; a second attachment member spaced from the first attachment member; and resilient members joining the first and second attachment members, each of the resilient members having at least one void, the voids being collapsible under loading between a first open void condition where the mount has a first substantially constant stiffness, and a second collapsed condition where the voids are substantially closed, the mount having a second substantially constant stiffness when the voids are in the second collapsed condition.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: December 9, 2003
    Assignee: Lord Corporation
    Inventors: Robert J. Michael, Peter D. Howorth, Atle Larsen, Troy P. Herbst, Ulrich A. Kuester
  • Patent number: 6649326
    Abstract: The invention provides a UV below 200 nm lithography method. The invention includes providing a below 200 nm radiation source for producing <200-nm light, providing a plurality of mixed cubic fluoride crystal optical elements, with the fluoride crystals comprised of a combination of alkaline earth cations having different optical polarizabilities such as to produce an overall isotropic polarizability which minimizes the fluoride crystal spatial dispersion below 200 nm, transmitting <200-nm light through the cubic fluoride crystal optical elements, forming a lithography pattern with the light, reducing the lithography pattern and projecting the lithography pattern with the cubic fluoride crystal optical elements onto a UV radiation sensitive lithography printing medium to form a printed lithographic pattern. The invention includes making the mixed fluoride crystals and forming optical element therefrom.
    Type: Grant
    Filed: June 21, 2002
    Date of Patent: November 18, 2003
    Assignee: Corning Incorporated
    Inventors: Douglas C. Allan, Nicholas F. Borrelli, Charlene M. Smith, Robert W. Sparrow
  • Patent number: 6650108
    Abstract: A system and method for monitoring the composition of a magnetically permeable material, where the system comprises a first container containing a volume of magnetically permeable material; a flow path for flowing the magnetically permeable material out of the container; a sensor for determining the inductance of the magnetically permeable material; and a sensor for determining the density of the magnetically permeable material. The sensors for determining the density and inductance of the magnetically permeable material are flow connected to the flow path.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: November 18, 2003
    Assignee: Lord Corporation
    Inventors: J. David Carlson, Gary W. Adams
  • Patent number: 6640940
    Abstract: A system that includes a magnetically actuated motion control device comprising a housing defining a cavity and including a slot therethrough. A movable member is located within the cavity and is movable relative to the housing. A magnetic field generator located on either the housing or the movable member causes the housing to press against the movable member to develop a friction force.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: November 4, 2003
    Assignee: Lord Corporation
    Inventor: J. David Carlson
  • Patent number: 6632759
    Abstract: The present invention relates generally to UV (ultraviolet) photosensitive bulk glass, and particularly to batch meltable alkali boro-alumino-silicate glasses. The photosensitive bulk glass of the invention exhibits photosensitivity to UV wavelengths below 250 nm. The photosensitivity of the alkali boro-alumino-silicate bulk glass to UV wavelengths below 250 nm provide for the making of refractive index patterns in the glass. With a radiation source below 250 nm, such as a laser, refractive index patterns are formed in the glass. The inventive photosensitive optical refractive index pattern forming bulk glass allows for the formation of patterns in glass and devices which utilize such patterned glass.
    Type: Grant
    Filed: June 5, 2001
    Date of Patent: October 14, 2003
    Assignee: Corning Incorporated
    Inventors: Nicholas F. Borelli, George B. Hares, Charlene M. Smith
  • Patent number: 6630117
    Abstract: The present invention provides fluoride lens crystals for VUV optical lithography systems and processes. The invention provides a barium fluoride optical lithography crystal for utilization in 157 nm optical microlithography elements which manipulate below 193 nm optical lithography photons. The invention includes a barium fluoride crystalline material for use in dispersion management of below 160 nm optical lithography processes.
    Type: Grant
    Filed: May 25, 2000
    Date of Patent: October 7, 2003
    Assignee: Corning Incorporated
    Inventor: Robert W. Sparrow
  • Patent number: 6619073
    Abstract: The invention relates to optical glass having improved initial transmittance, formed by subjecting the glass to a hydrogen and/or deuterium treatment at a temperature, and for a duration of time sufficient to diffuse the hydrogen and/or deuterium into the glass.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: September 16, 2003
    Assignee: Corning Incorporated
    Inventors: Nicholas F. Borrelli, Daniel R. Sempolinski, Thomas P. Seward, Charlene M. Smith
  • Patent number: 6609406
    Abstract: A tool for reorienting a flange is disclosed. The tool reorients the flange from a first angle of orientation to a second angle of orientation and comprises a support member that further comprises a guide member; and a shoe maintained in a desired orientation by the support member. The shoe defines a reorienting surface, and the reorienting surface further comprising: a leading reorienting surface for progressively reorienting the flange to an intermediate angle of orientation between the first and second angles of orientation, and a trailing reorienting surface, the trailing reorienting surface being located proximate the guide member to define a reorienting gap therebetween, said reorienting gap adapted to permit passage of the flange therethrough, said flange being reoriented to the second angle as it exits the reorienting gap.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: August 26, 2003
    Assignee: Lord Corporation
    Inventor: Edward T. Staquet
  • Patent number: 6611185
    Abstract: A joint member for selectively joining first and second members, said joint member comprising a first coupling member comprising a volume of field responsive material and a second coupling member comprising a field generating member for selectively applying a field across the field responsive material, the joint member also comprising means for selectively moving the field responsive material toward and away from the field generating means.
    Type: Grant
    Filed: June 15, 2001
    Date of Patent: August 26, 2003
    Assignee: Lord Corporation
    Inventors: J. David Carlson, Mitzi R. Vernon, Lynn C. Yanyo