Patents Represented by Law Firm Fitxpstrick, Cella, Harper & Scinto
  • Patent number: 6023068
    Abstract: An apparatus for semiconductor device manufacture is disclosed, which apparatus includes first and second, different exposure systems each for forming an image of a circuit pattern on a substrate coated with a photosensitive material, and a stationary member for supporting the first and second exposure systems.
    Type: Grant
    Filed: November 5, 1997
    Date of Patent: February 8, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kazuo Takahashi