Abstract: A method for etching a dielectric film is provided herein. In accordance with the method, a device (201) is provided which comprises a first chamber (203) equipped with a first gas supply (209) and a second chamber (205) equipped with a second gas supply (215), wherein the second chamber is in communication with the first chamber by way of an acceleration grid (211) having a variable potential. The gas flow into the plasma chamber is oscillated between a first state in which the gas flow into the first chamber has the composition f11 and the gas flow into the second chamber has the composition f21, and a second state in which the gas flow into the first chamber has the composition f12 and the gas flow into the second chamber has the composition f22.

Abstract: A robotic arm assembly (101) is provided which comprises a hub (103), a first arm segment (105) which is attached to the hub, and a second arm segment (107) which is attached to the first arm segment such that said second arm segment can rotate at least partially about its longitudinal axis.