Patents Represented by Attorney Frederick J. Telecly, Jr.

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  • Gas dispersion disk for use in plasma enhanced chemical vapor deposition reactor
    Patent number: 4792378
    Abstract: A chemical vapor transport reactor gas dispersion disk (20) for counteracting vapor pressure gradients to provide a uniform deposition of material films on a semiconductor slice (37). The disk (20) has a number of apertures (22) arranged so as to increase in aperture area per unit of disk area when extending from the center of the disk (20) to its outer peripheral edge.
    Type: Grant
    Filed: December 15, 1987
    Date of Patent: December 20, 1988
    Assignee: Texas Instruments Incorporated
    Inventors: Alan D. Rose, Robert M. Kennedy, III