Patents Represented by Attorney, Agent or Law Firm Gary Cary Ware & Freidenrich LLP
  • High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition
    Patent number: 5876573
    Abstract: A magnetron sputtering system is provided that uses cooling channels in the magnetron assembly to cool the target. The magnetron sputtering system also generates low pressure region in the magnetron assembly such that the backing plate sees a pressure differential much lower than atmospheric pressure. The backing plate is reduced in thickness and provides less of a barrier to the generated magnetic field.
    Type: Grant
    Filed: July 10, 1996
    Date of Patent: March 2, 1999
    Assignee: CVC, Inc.
    Inventors: Mehrdad M. Moslehi, Dorian Heimanson, Cecil J. Davis, Thomas R. Omstead