Abstract: A method for defining, on the upper surface of a substrate, two self-aligned areas, including the steps of depositing a protective layer; depositing a covering layer; opening the protective and covering layers at a location substantially corresponding to the desired border of the two areas; forming a spacer along the side of the opening, this spacer having a rear portion against said border and an opposite front portion; opening the protective and covering layers behind the rear portion of the spacer; and removing the protection layer to reach the rear portion of the spacer; whereby two self-aligned areas are defined on either side of the spacer length.

Abstract: A monolithic component including two thyristors of a composite bridge connected to an A.C. voltage terminal by a common terminal corresponding to a common rear surface metallization forming an electrode of opposite biasing of each thyristor. An isolating wall separates a substrate in two portions, a first portion includes on its lower surface side an anode region and on its upper surface side a cathode region, the second portion includes on its lower surface side a cathode region and on its upper surface side an anode region. The isolating wall surrounding each of the components extending towards the main electrode on the side which carries no common metallization and including in this extended region an N-type area, the two areas being connected together to a common control terminal.

Abstract: A vertical Schottky diode including an N-type silicon carbide layer of low doping level formed by epitaxy on a silicon carbide substrate of high doping level. The periphery of the active area of the diode is coated with a P-type epitaxial silicon carbide layer. A trench crosses the P-type epitaxial layer and penetrates into at least a portion of the height of the N-type epitaxial layer beyond the periphery of the active area. The doping level of the P-type epitaxial layer is chosen so that, for the maximum voltage that the diode is likely to be subjected to, the equipotential surfaces corresponding to approximately ¼ to ¾ of the maximum voltage extend up to the trench.

Abstract: The present invention relates to a processor including at least one memory access unit for presenting a read or write address over an address bus of a memory in response to the execution of a read or write instruction; and an arithmetic and logic unit operating in parallel with the memory access unit and arranged at least to present data on the data bus of the memory while the memory access unit presents a write address. The processor includes a write address queue in which is stored each write address provided by the memory access unit waiting for the availability of the data to be written.

Abstract: An analog voltage pulse generator, including a first break-over component of Shockley diode type to activate a rising edge of a pulse on an output terminal and a second component of thyristor type to block the first component and deactivate the pulse.

Abstract: A method for producing an isolation region on a surface of a semiconductor substrate includes: forming and patterning a masking layer; forming an isolating layer so that a notch exists between an edge of the masking layer and the upper surface of the isolating layer; forming a filling layer over the masking layer and the isolating layer, so that it completely fills the notch; forming field protection spacers adjacent to the masking layer; partially removing the filling layer to expose the upper surface of the isolation layer, the notch remaining filled with a part of the filling layer; and selectively etching the isolating layer from its upper limit until this upper limit is substantially coplanar with the upper surface of the semiconductor substrate. A transistor may be produced in a semiconductor substrate, having a minimum gate length, a minimum width isolation region and wide field isolation region.