Abstract: A lithography apparatus including both a laser beam source and an electron beam column, where the electron beam column has a support(in one embodiment a window in the column housing) having an index of refraction n. The support, having a photocathode source material disposed on its remote surface, is located in some embodiments such that the internal angle of the incident laser beam is &thgr; with respect to a line perpendicular to the remote surface. The numerical aperture of the substrate(equal to nsin &thgr;) is greater than one in one embodiment, resulting in a high resolution spot size diameter incident on the photocathode source material at the remote surface. Incident energy from the laser beam thereby emits a corresponding high resolution electron beam from the photocathode source material. Electromagnetic lens components are disposed downstream in the electron beam column to demagnify the electron beam.

Abstract: A counter-rotating anamorphic prism pair assembly with variable spacing allows the simultaneous adjustment of a prism pair using an adjustment member to circularize in cross section a range of elliptical laser beam cross sections. A first prism rotates and translates towards or away from an incident laser beam while a second prism simultaneously rotates towards or away from the laser beam in a fixed counter-rotating relationship with the first prism. The degree of rotation and translation is determined by a mechanical linkage connecting the two prisms.