Patents Represented by Attorney Haynes Beffel & Wolfel
  • Patent number: 7196880
    Abstract: A spin valve device includes a non-magnetic enhancement layer adjacent an ultra thin free layer. The thickness of the free layer may be less than the mean free path of a conduction electron through the free layer. The GMR ratio is significantly improved for free layer thicknesses below 50 ?. The enhancement layer allows electrons to travel longer in their spin state before encountering scattering sites. The electronic properties of the enhancement layer material can be matched with the adjacent free layer without creating a low resistance shunt path. Because the free layer may be made ultra thin and the enhancement layer is formed of a nonmagnetic material, less magnetic field is required to align the free layer, allowing for improved data density. Also, the enhancement layer allows for effective bias point control by shifting sensor current density distribution.
    Type: Grant
    Filed: November 8, 2001
    Date of Patent: March 27, 2007
    Assignee: Western Digital (Fremont), Inc.
    Inventors: Geoff Anderson, Yiming Huai