Patents Represented by Attorney, Agent or Law Firm Hutchinson, Wheeler & Dittmar
  • Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles
    Patent number: 6184489
    Abstract: In a semiconductor device manufacturing apparatus that processing a substrate by applying a voltage to a gas to create a plasma, positively charged particles are trapped or guided at the instant that the cathode voltage is stopped, by an electrode to which is imparted a negative voltage, so as to prevent particles reaching the substrate.
    Type: Grant
    Filed: April 12, 1999
    Date of Patent: February 6, 2001
    Assignee: NEC Corporation
    Inventors: Natsuko Ito, Fumihiko Uesugi, Tsuyoshi Moriya