Abstract: A method for optimizing multiple process windows in a semiconductor manufacturing process is disclosed. The method comprises performing dependent variable composition on a plurality of dependent variables. Metrology data is joined with the dependent variables, and then a partial least squares regression is performed on the joined data set to obtain a prediction equation, and a variable importance prediction for each process window in a process window set. A set of product limited yield are derived, and the process window, set is adjusted, and the yields recalculated, until an optimal process window set is derived.

Abstract: Accordingly, in one embodiment of the invention, a method is provided for reducing stacking faults in an epitaxial semiconductor layer. In accordance with such method, a substrate is provided which includes a first single-crystal semiconductor region including a first semiconductor material, the first semiconductor region having a <110> crystal orientation. An epitaxial layer including the first semiconductor material is grown on the first semiconductor region, the epitaxial layer having the <110> crystal orientation. The substrate is then annealed with the epitaxial layer at a temperature greater than 1100 degrees Celsius in an ambient including hydrogen, whereby the step of annealing reduces stacking faults in the epitaxial layer.

Abstract: A test circuit for a serial link receiver includes a first current source coupled to a first input of the serial link receiver, and a second current source coupled to a second input of the serial link receiver. The first current source is symmetrically matched to the second current source. A first switch of the first current source is turned on to permit a charge-retaining mechanism thereof to be charged. A second switch of the first current source is turned on to permit the retained charge retained to be asserted on the first input. The charge turns on a control switch of the first current source, through which the charge is asserted on the first input. A charge-draining mechanism of the first current source is turned on to thereafter permit the charge to be drained in a controlled manner after the charge has been asserted.

Abstract: Measurement circuit components are included in an integrated circuit fabricated on a semiconductor substrate. These measurement circuits are connected to a voltage regulation circuit that provides the integrated circuit voltage source. These measurement circuits provide signals to control the voltage regulation circuit to adjust the voltage output to the integrated circuit based upon a measurement values obtained on the semiconductor device. These measurements include temperature and IR drop at locations on the semiconductor substrate, along with the frequency response of integrated circuit.

Abstract: A method for compensating for dynamic IR (voltage) drop for instruction execution. In a data processing system having a memory, and a central processing unit (CPU), where the CPU includes an adaptive power supply, a method is provided for determining the power required for instruction execution, adjusting power supplied by the adaptive power supply to the CPU to execute the instruction, and dispatching the instruction from the memory to the CPU for execution.

Abstract: A deep trench structure process for forming a deep trench in a silicon on insulator (SOI) substrate. The SOI substrate has a bulk silicon layer, a buried oxide (BOX) layer and an SOI layer. In the process, the trench fill is recessed only to a level within the SOI layer so as to avoid lateral etching of the BOX layer. The buried strap is then formed followed by the STI oxide.

Abstract: A design structure embodied in a machine-readable medium used in a design process may include a system for detecting a fault in a signal transmission path. Such system may include, for example, a hysteresis comparator including a latch having n-type field effect transistor (“NFET”) storage elements. The hysteresis comparator may be operable to detect a crossing of a reference voltage level by an input signal arriving from the signal transmission path such that when the comparator does not detect an expected crossing of the reference voltage level by the input signal, the fault is determined to be detected in the signal transmission path.

Abstract: An eyewidth of a data signal is determined by steps including: (a) recovering a phase of a clock from a data signal as a sampling clock; (b) shifting the phase of the sampling clock away from the first phase by a count multiplied by predetermined phase amount; (c) sampling the data signal with the shifted sampling clock phase to obtain sample data; d) determining whether the sample data contains error; (e) when the sample data does not contain error, recovering the phase of the clock from the data signal again for use as the first phase of the sampling clock, increasing the count value and repeating steps (b) through (e); and f) when the sample data contains error, determining the eyewidth based on the last shifted phase of the sampling clock prior to determining that the sample data contains error.

Abstract: A system is provided for detecting a fault in a signal transmission path. In one embodiment, the system can include a variable amplitude signal attenuator which is operable to modify an input signal by variably attenuating a signal voltage swing of the input signal. Desirably, the input signal is attenuated only when transitioning from a high signal voltage level towards a low signal voltage level d variably, such that a larger high-to-low signal voltage swing is attenuated more than a smaller high-to-low signal voltage swing. Desirably, a comparator, which may apply hysteresis to the output signals, may detect a crossing of a reference voltage level by the modified input signal. In this way, when the comparator does not detect an expected crossing of the reference voltage level by the modified input signal, a determination can be made that a fault exists in the signal transmission path.

Abstract: A method of forming an inductor. The method including: (a) forming a dielectric layer on a top surface of a substrate; after (a), (b) forming a lower trench in the dielectric layer; after (b), (c) forming a resist layer on a top surface of the dielectric layer; after (c), (d) forming an upper trench in the resist layer, the upper trench aligned to the lower trench, a bottom of the upper trench open to the lower trench; and after (d), (e) completely filling the lower trench and at least partially filling the upper trench with a conductor in order to form the inductor.

Abstract: Accordingly, in one embodiment of the invention, a method is provided for reducing stacking faults in an epitaxial semiconductor layer. In accordance with such method, a substrate is provided which includes a first single-crystal semiconductor region including a first semiconductor material, the first semiconductor region having a <110> crystal orientation. An epitaxial layer including the first semiconductor material is grown on the first semiconductor region, the epitaxial layer having the <110> crystal orientation. The substrate is then annealed with the epitaxial layer at a temperature greater than 1100 degrees Celsius in an ambient including hydrogen, whereby the step of annealing reduces stacking faults in the epitaxial layer.

Abstract: A method and apparatus for the non-contact electrical test of both opens and shorts in electronic substrates. Top surface electrical test features are exposed to an ionization source under ambient conditions and the subsequent charge build up is measured as a drain current by probes contacting corresponding bottom surface features. Opens are detected by an absence of a drain current and shorts are detected by turning off the ionization source and re-measuring the bottom surface probes with a varying bias applied to each probe in the array.

Abstract: A method and system for pad conditioning in an electrochemical mechanical planarization (eCMP) tool is disclosed. A polishing pad having a pad electrode is placed onto a platen of the eCMP tool. A conditioning disk, having a second electrode is placed on the polishing pad, such that the pad electrode and conditioning disk form an electrode pair. An electric potential is established between the conditioning disk and the pad electrode. This causes debris from the polishing pad to become ionized, and attracted to the conditioning disk. The conditioning disk is then removed from the eCMP tool, allowing the eCMP tool to resume operation on normal semiconductor wafers.

Abstract: A structure and method of forming an improved metal cap for interconnect structures is described. The method includes forming an interconnect feature in an upper portion of a first insulating layer; deposing a dielectric capping layer over the interconnect feature and the first insulating layer; depositing a second insulating layer over the dielectric capping layer; etching a portion of the second insulating layer to form a via opening, wherein the via opening exposes a portion of the interconnect feature; bombarding the portion of the interconnect feature for defining a gauging feature in a portion of the interconnect feature; etching the via gauging feature for forming an undercut area adjacent to the interconnect feature and the dielectric capping layer; depositing a noble metal layer, the noble metal layer filling the undercut area of the via gauging feature to form a metal cap; and depositing a metal layer over the metal cap.

Abstract: A high tensile stress capping layer on Cu interconnects in order to reduce Cu transport and atomic voiding at the Cu/dielectric interface. The high tensile dielectric film is formed by depositing multiple layers of a thin dielectric material, each layer being under approximately 50 angstroms in thickness. Each dielectric layer is plasma treated prior to depositing each succeeding dielectric layer such that the dielectric cap has an internal tensile stress.

Abstract: A design structure for an apparatus for programming an electronically programmable semiconductor fuse. The apparatus applies a programming current to a fuse link as a series of multiple pulses. Application of the programming current as a series of multiple short pulses provides a level of programming current sufficiently high to ensure reliable and effective electromigration while avoiding exceeding temperature limits of the fuse link.

Abstract: A structure and method of fabricating an interconnect structures with bi-layer metal cap is provided. In one embodiment, the method includes forming an interconnect feature in a dielectric material layer; and forming a bi-layer metallic cap on a top surface of the interconnect feature. The method further includes depositing a blanket layer of a dielectric capping layer, wherein the depositing covers an exposed surface of the dielectric material layer and a surface of the bi-layer metallic cap. The bi-layer metallic cap includes a metal capping layer formed on a conductive surface of the interconnect feature; and a metal nitride formed on a top portion of the metal capping layer. An interconnect structure is also described having an interconnect feature formed in a dielectric layer; a bi-layer metallic cap formed on a top portion of the interconnect feature; and a dielectric capping layer formed over the bi-layer metallic cap.

Abstract: According to the present invention, there is disclosed a thermal detection device and method of using the device for characterizing and monitoring the dependence of pattern density on thermal absorption of a semiconductor. One or more of the devices can be disposed on a die of a test wafer. The thermal detection device comprises a silicon substrate having a test structure located substantially in the center of the silicon substrate. Frame shaped structures of polysilicon, silicon and oxide, in various configurations, form a collocated arrangement on the silicon substrate. The test wafer is subjected to a rapid thermal process and the resistance of the at least one testing structure is measured and the measured resistance of the at least one test structure is tabulated to a thermal absorption value of the at least one die.

Abstract: A system and method for monitoring a semiconductor manufacturing process is disclosed. The system communicates with one or more process tools, and monitors each tool during a predetermined process window time. Errors and warnings are provided to users, allowing corrective action to be taken. Additionally, the system of the present invention can initiate automatic adjustment of the process tools to maintain an efficient manufacturing operation.

Abstract: A high tensile stress capping layer on Cu interconnects in order to reduce Cu transport and atomic voiding at the Cu/dielectric interface. The high tensile dielectric film is formed by depositing multiple layers of a thin dielectric material, each layer being under approximately 50 angstroms in thickness. Each dielectric layer is plasma treated prior to depositing each succeeding dielectric layer such that the dielectric cap has an internal tensile stress.